A protective device and a wafer edge corrosion machine provided with the same

Abstract

The utility model provides a kind of protective device, be set on the etching tank and cleaning tank of wafer edge etching machine, including open and close lid, driving device and water pan, the open and close lid is set in the top of the etching tank and cleaning tank, the driving device is set in the opposite side of the etching tank and cleaning tank, with corresponding the open and close lid connection, for control the opening and closing of the open and close lid, the outside of the driving device is equipped with protective cover, positive pressure ventilation device is equipped in the protective cover, the water pan is set in the top of the protective cover, cover between the etching tank and cleaning tank.The utility model has the beneficial effect of reducing the splashing and dripping of liquid, effectively reducing the corrosion and corrosion of wafer edge etching machine, ensuring the normal operation of electrical components, avoiding the corrosion of acid gas to driving device, realizing the monitoring of driving device and open and close lid, and simultaneously realizing the filtration of foreign matter and fragment residue on suction cup mechanical arm.

Description

Technical Field

[0001] This utility model belongs to the technical field of wafer edge etching machines, and in particular relates to a protective device and a wafer edge etching machine equipped with the protective device. Background Technology

[0002] During wafer fabrication, wafer edge etching machines are used to etch the wafer edges. A specialized suction cup robotic arm encloses the wafer, exposing only the edges to be etched and stripped, and carries the wafer sequentially through an etching tank and a cleaning tank. During processing, the acid in the etching tank splashes as it is sprayed, and the cleaning fluid in the cleaning tank also splashes during filling and bubbling. The wafer edge etcher itself can be corroded or rusted, potentially affecting the operation and lifespan of electrical components. Furthermore, the suction cup robotic arm drips liquid as it transfers the wafer between the etching and cleaning tanks, which can also damage the wafer edge etcher. Utility Model Content

[0003] To solve the above-mentioned technical problems, this utility model provides a protective device and a wafer edge etching machine equipped with the protective device, which effectively solves the technical problem that the wafer edge etching machine is easily corroded and rusted by splashed or dripping liquids, affecting the operation and life of electrical components, and overcomes the shortcomings of the prior art.

[0004] The technical solution adopted by this utility model is: a protective device, installed on the etching tank and cleaning tank of a wafer edge etching machine, comprising:

[0005] The opening and closing cover is located at the top of the corrosion tank and the cleaning tank;

[0006] A drive device is located on the opposite side of the corrosion tank and the cleaning tank and is connected to the corresponding opening and closing cover. It is used to control the opening and closing of the opening and closing cover. The drive device is provided with a protective cover, and a positive pressure ventilation device is provided inside the protective cover.

[0007] A water receiving tray is positioned above the protective cover, covering the area between the corrosion tank and the cleaning tank.

[0008] Furthermore, the positive pressure ventilation device includes a ventilation pipe, which is fixed inside the protective cover and has multiple ventilation holes.

[0009] Furthermore, the bottom of the water receiving tray is provided with a drain hole.

[0010] Furthermore, a filter screen is installed inside the water receiving tray.

[0011] Furthermore, the filter screen is equipped with a handle.

[0012] Furthermore, the upper part of the opposite side of the corrosion tank and the cleaning tank is provided with an upper edge, and the opening and closing cover is provided with a fixed shaft, which passes through the upper edge and is connected to the driving device.

[0013] Furthermore, the driving device includes a driving cylinder, which is disposed on the opposite side of the corrosion tank and the cleaning tank. The fixed end of the driving cylinder is hinged to the side wall of the corrosion tank and the cleaning tank, and the movable end of the driving cylinder is hinged to the fixed shaft.

[0014] Furthermore, the drive cylinder is equipped with a first detection sensor for detecting the stroke of the drive cylinder.

[0015] Furthermore, a second detection sensor is provided on the side of the upper edge near the opening and closing cover to detect the opening and closing state of the opening and closing cover.

[0016] This utility model also provides a wafer edge etching machine, including a protective device as described above.

[0017] The advantages and positive effects of this utility model are as follows: By adopting the above technical solution, the splashing and dripping of liquid are reduced, effectively reducing the corrosion and rust on the wafer edge etching machine, ensuring the normal operation of electrical components, extending service life, avoiding the corrosion of the drive device by acid gas, ensuring the normal operation of the drive device, realizing the monitoring of the drive device and the opening and closing cover, avoiding collision between the suction cup robotic arm and the opening and closing cover, ensuring the normal operation of the equipment, and at the same time realizing the filtering of foreign objects and debris residue on the suction cup robotic arm, which is easy to clean. The structure is simple and the operation is convenient. Attached Figure Description

[0018] The above and other objects, features, and advantages of this utility model will become more apparent from the more detailed description of the embodiments thereof in conjunction with the accompanying drawings. The drawings are provided to further illustrate the embodiments of this utility model and form part of the specification. They are used together with the embodiments of this utility model to explain the utility model and do not constitute a limitation thereof. In the drawings, the same reference numerals generally represent the same parts or steps.

[0019] Figure 1 This is a front view of a protective device according to an embodiment of the present utility model.

[0020] Figure 2 This is a top view of a protective device according to an embodiment of the present invention.

[0021] Figure 3 This is a schematic diagram of the connection of a protective device drive device according to an embodiment of the present invention.

[0022] Figure 4This is a schematic diagram of a protective device according to an embodiment of the present invention, showing the second detection sensor monitoring the opening and closing of the cover.

[0023] Figure 5 This is a schematic diagram of a protective device according to an embodiment of the present invention, showing the second detection sensor monitoring the opening and closing of the cover.

[0024] In the picture:

[0025] 1. Corrosion tank 2. Cleaning tank 3. Opening / closing cover

[0026] 4. Water tray 5. Protective cover 6. Air inlet

[0027] 7. Drain hole 8. Filter screen 9. Handle

[0028] 10. Top edge; 11. Fixed shaft; 12. Right-angle connector.

[0029] 13. Drive cylinder; 14. First hinge seat; 15. Second hinge seat

[0030] 16. First detection sensor; 17. Baffle plate; 18. Second detection sensor

[0031] 19. Connecting frame Detailed Implementation

[0032] This utility model provides a protective device and a wafer edge etching machine equipped with the protective device. The embodiments of this utility model will be described below with reference to the accompanying drawings.

[0033] In the description of the embodiments of this utility model, it should be understood that the terms "top," "bottom," etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model. In the description of this utility model, it should be noted that unless otherwise expressly specified and limited, the terms "set" and "connected" should be interpreted broadly. For example, it can refer to a fixed connection, a detachable connection, or an integral connection; it can refer to a direct connection or an indirect connection through an intermediate medium; it can refer to the internal communication of two elements. Those skilled in the art can understand the specific meaning of the above terms in this utility model through specific circumstances.

[0034] like Figure 1 , Figure 2 and Figure 3As shown, this utility model discloses a protective device installed on the etching tank 1 and cleaning tank 2 of a wafer edge etching machine. It includes a hinged cover 3, a drive device, and a water receiving tray 4. The hinged cover 3 is a split type, located at the top of the etching tank 1 and cleaning tank 2. Each hinged cover 3 has a through hole in its center. When the suction cup robotic arm places the wafer in the etching tank 1 or cleaning tank 2, the cover 3 can be closed easily, preventing acid or cleaning fluid from splashing during etching or cleaning. When the wafer needs to be transferred between the etching tank 1 and cleaning tank 2, the cover 3 can be opened without affecting the handling of the wafer. To facilitate control of the hinged cover 3's movement, drive devices are installed on opposite sides of the etching tank 1 and cleaning tank 2, with one drive device corresponding to each hinged cover 3. To prevent acid gas from corroding the drive device, a protective cover 5 is fixed to the outside of the drive device. To prevent acid gas from entering the protective cover 5 through gaps, a positive pressure ventilation device is installed inside the protective cover 5. Protective gas is introduced into the protective cover 5 to provide positive pressure protection and prevent acid gas from entering. To prevent the wafer from dripping corrosion liquid during transfer between the etching tank 1 and the cleaning tank 2, a water collection tray 4 is placed between the etching tank 1 and the cleaning tank 2, and the water collection tray 4 is fixed above the protective cover 5. Since foreign objects or debris easily adhere to the suction cup robotic arm, its surface needs to be rinsed with a water gun. When rinsing the suction cup robotic arm is required, rinsing can be performed above the water collection tray 4, and the rinsing liquid is collected directly into the water collection tray 4.

[0035] Specifically, the positive pressure ventilation device includes a ventilation pipeline, not shown in the figure. The ventilation pipeline is fixed to the bottom of the protective cover 5 and is arranged along the circumference of the protective cover 5. Multiple ventilation holes are opened on the ventilation pipeline, and the multiple ventilation holes are spaced apart along the length of the ventilation pipeline. An air inlet 6 is opened at the bottom of the protective cover 5 for introducing protective gas into the ventilation pipeline to provide positive pressure protection and prevent acid gas from entering through the gaps in the protective cover 5 and damaging the drive device, thus affecting the normal operation of the opening and closing cover 3.

[0036] Specifically, the bottom of the water receiving tray 4 is equipped with a drain hole 7 for draining liquid to prevent overflow. A drain valve is installed on the drain hole 7, but it is not shown in the figure.

[0037] Preferably, the water receiving tray 4 is equipped with a filter screen 8. When rinsing the suction cup robotic arm above the water receiving tray 4, foreign objects or debris on the suction cup robotic arm are flushed into the water receiving tray 4. By setting up the filter screen 8, foreign objects and debris can be filtered out, preventing blockage of the drain hole 7. By setting the filter screen 8 to be detachable, it is also convenient to clean foreign objects and debris. The specific connection method between the filter screen 8 and the water receiving tray 4 is not limited, as long as it is easy to disassemble. The filter screen 8 can be bolted to the water receiving tray 4, or the filter screen 8 can be placed directly in the slots around the water receiving tray 4.

[0038] Preferably, in order to facilitate handling the filter screen 8 and prevent foreign objects or debris from cutting hands, handles 9 are symmetrically fixed on both sides of the filter screen 8. The specific shape of the handles 9 is not limited.

[0039] Specifically, to facilitate the installation of the opening and closing cover 3, a protruding upper edge 10 is fixed to the upper part of the opposite side of the corrosion tank 1 and the cleaning tank 2. A fixing shaft 11 is fixed to one side of the opening and closing cover 3, and one end of the fixing shaft 11 near the upper edge 10 passes through the upper edge 10 and is connected to the drive device. A connecting bracket 19 is fixed on the fixing shaft 11, and the connecting bracket 19 is fixed to the opening and closing cover 3 with bolts.

[0040] Specifically, the driving device includes a driving cylinder 13, which is located on the opposite side of the corrosion tank 1 and the cleaning tank 2. The fixed end of the driving cylinder 13 is hinged to the side wall of the corrosion tank 1 and the cleaning tank 2 by a first hinge seat 14, and the movable end of the driving cylinder 13 is provided with a right-angle connector 12. One end of the right-angle connector 12 is hinged to a second hinge seat 15, and the other end of the right-angle connector 12 is fixedly connected to a fixed shaft 11.

[0041] Specifically, in order to monitor the operation of the drive cylinder 13 and ensure the normal operation of the opening and closing cover 3, a first detection sensor 16 is installed on the drive cylinder 13. The first detection sensor 16 is a magnetic switch sensor. A magnetic switch sensor is fixedly attached to both the fixed end and the movable end of the drive cylinder 13 to detect the stroke of the drive cylinder 13. Magnetic switch sensors are existing technology, and their specific structure will not be described in detail here.

[0042] Specifically, to further monitor the opening and closing state of the cover 3 and avoid collision interference between the suction cup robot and the cover 3 when handling wafers, a second detection sensor 18 is provided on the side of the upper edge 10 near the cover 3. A baffle 17 is fixed on the cover 3 near the upper edge 10. Two second detection sensors 18 are fixed on the upper edge 10, one for detecting the closed state of the cover 3. When the cover 3 is in the horizontally closed state, the baffle 17 blocks the second detection sensor 18. Figure 4 As shown. Another sensor is used to detect the open / closed state of the cover 3. When the cover 3 is in the vertically open state, the baffle 17 blocks the second detection sensor 18, as shown. Figure 5 As shown. Two second detection sensors 18 are located on both sides of the fixed shaft 11.

[0043] A wafer edge etching machine includes an etching tank 1 and a cleaning tank 2 mounted on its body, with a suction cup robot mounted above the etching tank 1 and the cleaning tank 2. Protective devices as described above are installed on the etching tank 1 and the cleaning tank 2.

[0044] Example 1: A protective device is installed on the etching tank 1 and cleaning tank 2 of a wafer edge etching machine, including a hinged cover 3, a drive device, and a water receiving tray 4. The hinged cover 3 is a split type and is installed on the top of the etching tank 1 and the cleaning tank 2. A hinged cover 3 is provided on the top of both the etching tank 1 and the cleaning tank 2. A through hole is provided in the center of the hinged cover 3. A drive device is installed on the opposite side of the etching tank 1 and the cleaning tank 2, with one drive device corresponding to each hinged cover 3. A protective cover 5 is fixed outside the drive device, and a positive pressure ventilation device is provided inside the protective cover 5. A water receiving tray 4 covers the space between the etching tank 1 and the cleaning tank 2, and the water receiving tray 4 is fixed above the protective cover 5. The positive pressure ventilation device includes a ventilation pipe. The ventilation pipe is fixed to the bottom of the protective cover 5 and is arranged along the circumference of the protective cover 5. Multiple ventilation holes are provided on the ventilation pipe, and the multiple ventilation holes are spaced apart along the length of the ventilation pipe. An air inlet 6 is provided at the bottom of the protective cover 5 for introducing protective gas into the ventilation pipe. A drain hole 7 is provided at the bottom of the water receiving tray 4, and a drain valve is installed on the drain hole 7. A slot is fixed around the inside of the water receiving tray 4, and a filter screen 8 is placed in the slot. Handles 9 are symmetrically fixed on both sides of the filter screen 8. A protruding upper edge 10 is fixed to the upper part of the opposite sides of the corrosion tank 1 and the cleaning tank 2. A fixing shaft 11 is fixed to one side of the opening / closing cover 3, and one end of the fixing shaft 11 near the upper edge 10 passes through the upper edge 10 and connects to the drive device. A connecting bracket 19 is fixed to the fixing shaft 11, and the connecting bracket 19 is bolted to the opening / closing cover 3. The driving device includes a driving cylinder 13, which is located on the opposite side of the corrosion tank 1 and the cleaning tank 2. The fixed end of the driving cylinder 13 is hinged to the side wall of the corrosion tank 1 and the cleaning tank 2 by a first hinge seat 14, and the movable end of the driving cylinder 13 is hinged to one end of the right-angle connector 12 by a second hinge seat 15. The other end of the right-angle connector 12 is fixedly connected to the fixed shaft 11.

[0045] In this embodiment, a first detection sensor 16 is installed on the drive cylinder 13. The first detection sensor 16 is configured as a magnetic switch sensor. A magnetic switch sensor is fixedly attached to both the fixed end and the movable end of the drive cylinder 13 to monitor the stroke of the drive cylinder 13.

[0046] Example 2: A protective device is installed on the etching tank 1 and cleaning tank 2 of a wafer edge etching machine, including a hinged cover 3, a drive device, and a water receiving tray 4. The hinged cover 3 is a split type and is installed on the top of the etching tank 1 and the cleaning tank 2. A hinged cover 3 is provided on the top of both the etching tank 1 and the cleaning tank 2. A through hole is provided in the center of the hinged cover 3. A drive device is installed on the opposite side of the etching tank 1 and the cleaning tank 2, with one drive device corresponding to each hinged cover 3. A protective cover 5 is fixed outside the drive device, and a positive pressure ventilation device is provided inside the protective cover 5. A water receiving tray 4 covers the space between the etching tank 1 and the cleaning tank 2, and the water receiving tray 4 is fixed above the protective cover 5. The positive pressure ventilation device includes a ventilation pipe. The ventilation pipe is fixed to the bottom of the protective cover 5 and is arranged along the circumference of the protective cover 5. Multiple ventilation holes are provided on the ventilation pipe, and the multiple ventilation holes are spaced apart along the length of the ventilation pipe. An air inlet 6 is provided at the bottom of the protective cover 5 for introducing protective gas into the ventilation pipe. A drain hole 7 is provided at the bottom of the water receiving tray 4, and a drain valve is installed on the drain hole 7. A slot is fixed around the inside of the water receiving tray 4, and a filter screen 8 is placed in the slot. Handles 9 are symmetrically fixed on both sides of the filter screen 8. A protruding upper edge 10 is fixed to the upper part of the opposite sides of the corrosion tank 1 and the cleaning tank 2. A fixing shaft 11 is fixed to one side of the opening / closing cover 3, and one end of the fixing shaft 11 near the upper edge 10 passes through the upper edge 10 and connects to the drive device. A connecting bracket 19 is fixed to the fixing shaft 11, and the connecting bracket 19 is bolted to the opening / closing cover 3. The driving device includes a driving cylinder 13, which is located on the opposite side of the corrosion tank 1 and the cleaning tank 2. The fixed end of the driving cylinder 13 is hinged to the side wall of the corrosion tank 1 and the cleaning tank 2 by a first hinge seat 14, and the movable end of the driving cylinder 13 is hinged to one end of the right-angle connector 12 by a second hinge seat 15. The other end of the right-angle connector 12 is fixedly connected to the fixed shaft 11.

[0047] In this embodiment, a second detection sensor 18 is provided on the side of the upper edge 10 near the opening / closing cover 3. A baffle 17 is fixed on the opening / closing cover 3 near the upper edge 10. Two second detection sensors 18 are fixed on the upper edge 10. One is used to detect the closed state of the opening / closing cover 3. When the opening / closing cover 3 is in a horizontally closed state, the baffle 17 blocks the second detection sensor 18. The other is used to detect the open state of the opening / closing cover 3. When the opening / closing cover 3 is in a vertically open state, the baffle 17 blocks the second detection sensor 18. The two second detection sensors 18 are located on both sides of the fixed shaft 11. By setting the second detection sensors 18, the opening / closing state of the opening / closing cover 3 can be accurately monitored.

[0048] Example 3: A protective device is installed on the etching tank 1 and cleaning tank 2 of a wafer edge etching machine, including a hinged cover 3, a drive device, and a water receiving tray 4. The hinged cover 3 is a split type and is installed on the top of the etching tank 1 and the cleaning tank 2. A hinged cover 3 is provided on the top of both the etching tank 1 and the cleaning tank 2. A through hole is provided in the center of the hinged cover 3. A drive device is installed on the opposite side of the etching tank 1 and the cleaning tank 2, with one drive device corresponding to each hinged cover 3. A protective cover 5 is fixed outside the drive device, and a positive pressure ventilation device is provided inside the protective cover 5. A water receiving tray 4 covers the space between the etching tank 1 and the cleaning tank 2, and the water receiving tray 4 is fixed above the protective cover 5. The positive pressure ventilation device includes a ventilation pipe. The ventilation pipe is fixed to the bottom of the protective cover 5 and is arranged along the circumference of the protective cover 5. Multiple ventilation holes are provided on the ventilation pipe, and the multiple ventilation holes are spaced apart along the length of the ventilation pipe. An air inlet 6 is provided at the bottom of the protective cover 5 for introducing protective gas into the ventilation pipe. A drain hole 7 is provided at the bottom of the water receiving tray 4, and a drain valve is installed on the drain hole 7. A slot is fixed around the inside of the water receiving tray 4, and a filter screen 8 is placed in the slot. Handles 9 are symmetrically fixed on both sides of the filter screen 8. A protruding upper edge 10 is fixed to the upper part of the opposite sides of the corrosion tank 1 and the cleaning tank 2. A fixing shaft 11 is fixed to one side of the opening / closing cover 3, and one end of the fixing shaft 11 near the upper edge 10 passes through the upper edge 10 and connects to the drive device. A connecting bracket 19 is fixed to the fixing shaft 11, and the connecting bracket 19 is bolted to the opening / closing cover 3. The driving device includes a driving cylinder 13, which is located on the opposite side of the corrosion tank 1 and the cleaning tank 2. The fixed end of the driving cylinder 13 is hinged to the side wall of the corrosion tank 1 and the cleaning tank 2 by a first hinge seat 14, and the movable end of the driving cylinder 13 is hinged to one end of the right-angle connector 12 by a second hinge seat 15. The other end of the right-angle connector 12 is fixedly connected to the fixed shaft 11.

[0049] In this embodiment, a first detection sensor 16 is installed on the drive cylinder 13. The first detection sensor 16 is configured as a magnetic switch sensor. A magnetic switch sensor is fixed to both the fixed end and the movable end of the drive cylinder 13 to detect the stroke of the drive cylinder 13. A second detection sensor 18 is provided on the side of the upper edge 10 near the opening / closing cover 3. A baffle 17 is fixed to the opening / closing cover 3 near the upper edge 10. Two second detection sensors 18 are fixed on the upper edge 10. One is used to detect the closed state of the opening / closing cover 3; when the opening / closing cover 3 is in a horizontally closed state, the baffle 17 blocks the second detection sensor 18. The other is used to detect the open state of the opening / closing cover 3; when the opening / closing cover 3 is in a vertically open state, the baffle 17 blocks the second detection sensor 18. The two second detection sensors 18 are located on both sides of the fixed shaft 11.

[0050] Simultaneously setting up a first sensor 16 and a second detection sensor 18 can monitor the action of the drive cylinder 13 and the opening and closing status of the cover 3 at the same time. This avoids the cover 3 from not moving properly and colliding with the suction cup robotic arm due to mechanical failure of the right-angle connector 12 or the fixed shaft 11 when the drive cylinder 13 is moving normally, thus ensuring the normal operation of the equipment.

[0051] The advantages and positive effects of this utility model are:

[0052] 1. By designing an opening and closing cover and a water receiving tray, the splashing and dripping of liquid are reduced, effectively reducing corrosion and rust on the wafer edge etching machine, ensuring the normal operation of electrical components, and extending their service life.

[0053] 2. By setting up a protective cover and introducing protective gas, the corrosion of the drive unit by acid gas is avoided, ensuring the normal operation of the drive unit.

[0054] 3. By setting up the first and second sensors, the driving device and the opening and closing cover are monitored, which avoids collisions between the suction cup robotic arm and the opening and closing cover and ensures the normal operation of the equipment.

[0055] 4. By setting up a filter, foreign objects and debris on the suction cup robotic arm can be filtered out, making it easier to clean.

[0056] The embodiments of this disclosure have been described in detail above with reference to the accompanying drawings. It should be noted that implementations not illustrated or described in the drawings or the main text of the specification are forms known to those skilled in the art and have not been described in detail. Furthermore, the definitions of the various components described above are not limited to the specific structures, shapes, or methods mentioned in the embodiments, and those skilled in the art can easily modify or substitute them.

[0057] The embodiments of this utility model have been described in detail above, but the content described is only a preferred embodiment of this utility model and should not be considered as limiting the scope of implementation of this utility model. All equivalent changes and improvements made in accordance with the claims of this utility model should still fall within the patent coverage of this utility model.

Claims

1. A protective device, installed on the etching tank and cleaning tank of a wafer edge etching machine, characterized in that, include: The opening and closing cover is located at the top of the corrosion tank and the cleaning tank; A drive device is located on the opposite side of the corrosion tank and the cleaning tank and is connected to the corresponding opening and closing cover. It is used to control the opening and closing of the opening and closing cover. The drive device is provided with a protective cover, and a positive pressure ventilation device is provided inside the protective cover. A water receiving tray is positioned above the protective cover, covering the area between the corrosion tank and the cleaning tank.

2. The protective device according to claim 1, characterized in that: The positive pressure ventilation device includes a ventilation pipeline, which is fixed inside the protective cover and has multiple ventilation holes.

3. A protective device according to claim 1 or 2, characterized in that: The bottom of the water receiving tray is provided with a drain hole.

4. A protective device according to claim 3, characterized in that: The water receiving tray is equipped with a filter screen.

5. A protective device according to claim 4, characterized in that: The filter screen is equipped with a handle.

6. A protective device according to any one of claims 1-2 and 4-5, characterized in that: The upper part of the opposite side of the corrosion tank and the cleaning tank is provided with an upper edge, and the opening and closing cover is provided with a fixed shaft, which passes through the upper edge and is connected to the driving device.

7. A protective device according to claim 6, characterized in that: The driving device includes a driving cylinder, which is disposed on the opposite side of the corrosion tank and the cleaning tank. The fixed end of the driving cylinder is hinged to the side wall of the corrosion tank and the cleaning tank, and the movable end of the driving cylinder is hinged to the fixed shaft.

8. A protective device according to claim 7, characterized in that: The drive cylinder is equipped with a first detection sensor for detecting the stroke of the drive cylinder.

9. A protective device according to claim 7 or 8, characterized in that: A second detection sensor is provided on the side of the upper edge near the opening and closing cover, for detecting the opening and closing state of the opening and closing cover.

10. A wafer edge etching machine, characterized in that: Includes a protective device as described in any one of claims 1-9.

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