CMP apparatus and internal chamber cleaning device

Abstract

The utility model provides a kind of CMP equipment internal chamber cleaning device and CMP equipment, belong to chemical mechanical polishing field, it includes cleaning pipeline and multiple cleaning spray heads, cleaning pipeline includes the pipeline main body in the chamber to be cleaned, the side of the inner wall of pipeline main body away from chamber is connected with multiple liquid injection branch pipes;Multiple cleaning spray heads are rotatably arranged in each liquid injection branch pipe, flow guide vane is further arranged in cleaning spray head, cleaning fluid flows into cleaning spray head from liquid injection branch pipe, and is sprayed from first liquid injection port, flow guide vane is located between liquid injection branch pipe and first liquid injection port, with the impact of cleaning fluid to flow guide vane, flow guide vane drives cleaning spray head to rotate around the axis of liquid injection branch pipe.Compared with prior art, the utility model solves the technical problem that the internal chamber of the existing CMP equipment cannot be self-cleaning.

Description

Technical Field

[0001] This utility model belongs to the field of chemical mechanical polishing, and more specifically, it relates to a cleaning device for the internal chamber of a CMP device. This utility model also relates to a CMP device equipped with the aforementioned cleaning device for the internal chamber of a CMP device. Background Technology

[0002] In semiconductor wafer manufacturing processes, chemical mechanical polishing (CMP) equipment serves as a core processing tool, undertaking the crucial task of global wafer planarization. Specifically, the core process of CMP achieves wafer surface planarization through the synergistic action of chemicals and mechanical processes. First, a polishing slurry containing nanoparticles and chemical reagents is sprayed from the equipment inlet onto the surface of a rotating polishing pad. The polishing head stably presses the wafer onto the polishing pad, and both rotate simultaneously at different speeds. Pressure and friction ensure thorough contact between the wafer surface and the polishing slurry. During this process, the chemical components of the polishing slurry soften the wafer surface material, while the nanoparticles on the polishing pad gradually remove these softened layers under mechanical friction, ultimately achieving an atomically smooth surface. Throughout the process, the equipment monitors the polishing status in real time using sensors. When a preset flatness or thickness target is detected, the polishing process automatically stops, and the polishing head is raised, completing the polishing cycle.

[0003] During CMP operations, slurry splashes or air-evaporated slurry crystallizes inside the chamber, causing environmental contamination and increasing the risk of process failure. During the grinding process, slurry splashes onto the surfaces of different components or the chamber walls, crystallizing over time and contaminating the overall chamber environment. This crystallization may then fall onto the polishing pads during subsequent processes, further increasing the risk of failure. Existing CMP equipment cleaning primarily targets specific components, such as the slurry arm, pad conditioner, and head, which are cleaned using specialized nozzles. However, other areas, such as the upper surfaces of these components and other parts of the chamber, are also prone to crystallization after a certain period of operation, causing environmental contamination. Therefore, there is an urgent need to design a cleaning mechanism to thoroughly clean the interior of the chamber. Utility Model Content

[0004] The purpose of this invention is to provide a cleaning device for the internal chambers of CMP equipment, so as to solve the technical problem that existing CMP equipment cannot achieve self-cleaning.

[0005] To achieve the above objectives, the technical solution adopted by this utility model is: to provide a CMP equipment internal chamber cleaning device, comprising:

[0006] The cleaning pipeline includes a pipeline body and a control valve. The pipeline body is located in the chamber to be cleaned and is arranged adjacent to the inner wall of the chamber to be cleaned. The control valve is located outside the chamber to be cleaned and is used to control the flow of cleaning fluid inside the pipeline body. Along its length, the side of the pipeline body away from the inner wall of the chamber is connected to multiple spray branch pipes.

[0007] Multiple cleaning nozzles are rotatably disposed in each of the spray branch pipes. One end of each cleaning nozzle is connected to and rotatably connected to the spray branch pipe, and the other end is provided with a first spray port. A guide vane is also provided inside the cleaning nozzle. The cleaning fluid flows into the cleaning nozzle from the spray branch pipe and is sprayed out from the first spray port. The guide vane is located between the spray branch pipe and the first spray port. As the cleaning fluid impacts the guide vane, the guide vane drives the cleaning nozzle to rotate around the axis of the spray branch pipe.

[0008] In one feasible implementation, the guide vanes are at least two that are evenly arranged around the axis of the spray branch pipe.

[0009] In one feasible implementation, the cleaning nozzle includes a connecting cylinder and a dispensing ball. The first spray nozzles are multiple and located on the dispensing ball. The dispensing ball has an inlet that communicates with the connecting cylinder. Each of the first spray nozzles is arranged at intervals around the axis of the connecting cylinder. The end of the connecting cylinder away from the dispensing ball is rotatably connected to the connecting cylinder.

[0010] In one feasible implementation, the cleaning nozzle further includes a sealing ring and a connecting bearing, the connecting bearing being used to form a rotational fit between the connecting cylinder and the spray branch pipe, the sealing ring being used to form a seal between the connecting cylinder and the spray branch pipe, and the sealing ring being located between the outer walls of the connecting cylinder and the spray branch pipe.

[0011] In one feasible implementation, the spray direction of each of the first spray nozzles is toward the cavity wall of the chamber to be cleaned and / or toward the direction away from the chamber to be cleaned.

[0012] In one feasible implementation, the axis of the spray branch pipe is perpendicular to the axis of the main pipe body.

[0013] In one feasible implementation, the sealing ring is made of sealing rubber, and the connecting bearing is configured as a thrust ball bearing or a deep groove ball bearing.

[0014] Compared with existing technologies, the beneficial effects of the CMP equipment internal chamber cleaning device provided by this utility model are as follows:

[0015] Firstly, by arranging and connecting multiple spray branch pipes near the inner wall of the cleaning pipeline, and in conjunction with a rotatable cleaning nozzle, the kinetic energy of the cleaning fluid flowing through the spray branch pipes and impacting the guide vanes of the cleaning nozzle is converted into mechanical rotational energy, thereby automatically driving the cleaning nozzle to rotate continuously around the axis of the spray branch pipes. This structure achieves the technical effect of rotating the nozzle without the need for an additional motor or transmission device. This effectively solves the technical problems of traditional fixed nozzles or rotating nozzles requiring external power, such as uneven cleaning coverage, cleaning dead zones, complex equipment structure, high cost, difficult maintenance, and reliability risks of electrical components in chemically corrosive environments. It achieves efficient, uniform, self-driven, simplified, and more durable cleaning of the inner wall of the chamber.

[0016] More specifically, by setting the guide vanes to at least two evenly arranged around the axis of the spray branch pipe, the impact force is distributed more evenly and symmetrically around the nozzle during the impact of the cleaning fluid on the vanes. This significantly reduces the vibration during nozzle rotation, ensuring smoother and more reliable rotation. This achieves the technical effects of improving nozzle rotation stability, extending the service life of rotating parts, and ensuring a uniform and regular spray trajectory. It also helps to solve the technical problems that may be caused by single-blade or asymmetrical blade designs, such as rotational imbalance, increased vibration, excessive wear, and unstable spray patterns.

[0017] Furthermore, the cleaning nozzle is specifically designed to include a connecting cylinder and a distribution ball. With the cleaning fluid flowing into the distribution ball, the cleaning fluid entering the nozzle is effectively distributed within the ball and simultaneously sprayed outwards in multiple directions through multiple nozzles arranged around the axis. This structure significantly increases the liquid coverage area and density per rotation, creating a more uniform and dense spray curtain. This effectively addresses the technical problems of limited coverage from a single nozzle or a small number of nozzles, low cleaning efficiency, and difficulty in forming a spray pattern that effectively covers the entire target area, thus improving cleaning efficiency and uniformity per unit time.

[0018] Furthermore, by installing a connecting bearing (forming a rotational fit) and a sealing ring (forming a seal between the outer walls) between the connecting cylinder and the spray branch pipe, the rotational support of the nozzle relative to the branch pipe is borne by the bearing, ensuring smooth and flexible rotation. Simultaneously, the sealing ring effectively prevents cleaning fluid from leaking from the rotational joint into the nozzle exterior or the chamber environment. This structural combination achieves a highly reliable seal at the rotational connection while ensuring the nozzle's free rotation function, preventing liquid leakage that could contaminate the equipment or reduce cleaning pressure. This effectively solves the technical problems of easy wear and leakage at the rotational connection, leading to cleaning fluid waste, reduced cleaning pressure, and contamination of other equipment components or the working environment, thus ensuring the airtightness and high efficiency of the cleaning process. Preferably, by specifying the material of the sealing ring as sealing rubber and the connecting bearing as a thrust ball bearing or a deep groove ball bearing, combined with the rotating connection structure of the nozzle, the sealing ring can achieve good elasticity and chemical compatibility, providing a reliable dynamic seal under rotating conditions. Simultaneously, the selected bearing type can effectively withstand the axial force (thrust ball bearing) or radial / axial combined load (deep groove ball bearing) generated during nozzle rotation, ensuring smooth and low-resistance rotation. This structural combination significantly improves the sealing durability and chemical resistance of the rotating connection, and enhances the load-bearing capacity and operational stability of the rotating mechanism. This helps solve the technical problems of easy aging and failure of seals, easy jamming or excessive wear of bearings, leading to nozzle rotation failure or leakage under the harsh chemical corrosion environment and long-term operating conditions of CMP equipment, thus extending the service life of key moving parts and the overall reliability of the device.

[0019] In addition to the aforementioned beneficial effects, this invention, by setting the axis of the spray branch pipe perpendicular to the axis of the main pipeline and coordinating with the main pipeline arrangement along the inner wall of the cavity, enables the spray branch pipe and the cleaning nozzles mounted on it to naturally extend vertically outward from the main pipeline, making the working position of the nozzles closer to the surface of the inner wall of the cavity. This structural combination optimizes the nozzle layout, minimizes the distance from the nozzle outlet to the cavity wall, improves the impact force and effectiveness of the cleaning fluid sprayed onto the cavity wall, and provides a stable support foundation for the main pipeline. This helps solve technical problems such as excessive spray distance, reduced impact force, and decreased cleaning effect due to unreasonable nozzle installation angles, or complex pipeline layouts and excessive space occupation, ensuring efficient near-wall cleaning and simple space utilization.

[0020] Another objective of this invention is to provide a CMP device, including the internal chamber cleaning device for CMP devices mentioned above.

[0021] Compared to existing technologies, the CMP equipment of this invention possesses all the advantages of the aforementioned internal chamber cleaning device for CMP equipment. It enables automated cleaning of critical internal chambers (such as polishing chambers and cleaning chambers) using this self-driven, efficient, uniform, compact, and reliable cleaning device. This integrated approach significantly enhances the cleaning and maintenance capabilities and efficiency of the CMP equipment itself, reduces downtime for manual cleaning, lowers maintenance costs, and ensures that the chambers are always clean to reduce wafer contamination and improve process yield. This effectively solves the technical problems of difficult and inefficient internal chamber cleaning in CMP equipment, incomplete cleaning affecting wafer processing quality, and long downtime caused by traditional cleaning methods. Ultimately, it improves the overall operating efficiency, production yield, and automation level of the CMP equipment. Attached Figure Description

[0022] To more clearly illustrate the technical solutions in the embodiments of this utility model, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort. In the drawings:

[0023] Figure 1 A schematic diagram showing the positional relationship between the internal chamber cleaning device of the CMP equipment and the CMP equipment chamber provided by this utility model;

[0024] Figure 2 This is a schematic diagram of the cleaning nozzle in the internal chamber cleaning device of the CMP equipment of this utility model;

[0025] Figure 3 This is a schematic diagram showing the connection relationship between the cleaning nozzle and the spray branch pipe in the internal chamber cleaning device of the CMP equipment of this utility model.

[0026] In the picture:

[0027] 1. Cleaning pipeline; 11. Pipeline body; 12. Spray branch pipe;

[0028] 2. Cleaning nozzle; 21. First spray nozzle; 22. Guide vane; 23. Connecting cylinder; 24. Separating ball; 25. Sealing ring; 26. Connecting bearing. Detailed Implementation

[0029] It should be noted that, unless otherwise specified, the embodiments and features described in these embodiments can be combined with each other.

[0030] In the description of this utility model, it should be noted that if terms such as "upper", "lower", "inner", "back" or indicating orientation or positional relationship appear, they are based on the orientation or positional relationship shown in the accompanying drawings and are only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.

[0031] Furthermore, in the description of this utility model, unless otherwise explicitly defined, the terms "installation," "connection," "joining," and "connector" should be interpreted broadly. For example, a connection can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model in light of the specific circumstances.

[0032] To make the technical problems, technical solutions, and beneficial effects of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.

[0033] Please refer to the following: Figures 1 to 3 The present invention provides a cleaning device for the internal chambers of CMP equipment. This CMP equipment internal chamber cleaning device includes a cleaning pipeline 1 and multiple cleaning nozzles 2. The cleaning pipeline 1 includes a pipeline body 11 and a control valve. The pipeline body 11 is located within the chamber to be cleaned, and is arranged adjacent to the inner wall of the chamber. The control valve is located outside the chamber to be cleaned and is used to control the flow of cleaning fluid inside the pipeline body 11. Along its length, the side of the pipeline body 11 away from the inner wall of the chamber is connected to multiple spray branch pipes 12. The multiple cleaning nozzles 2... Each cleaning nozzle 2 is rotatably mounted on a spray branch pipe 12. One end of the cleaning nozzle 2 is connected to and rotatably connected to the spray branch pipe 12, and the other end is provided with a first spray port 21. A guide vane 22 is also provided inside the cleaning nozzle 2. The cleaning liquid flows into the cleaning nozzle 2 from the spray branch pipe 12 and is sprayed out from the first spray port 21. The guide vane 22 is located between the spray branch pipe 12 and the first spray port 21. As the cleaning liquid impacts the guide vane 22, the guide vane 22 drives the cleaning nozzle 2 to rotate around the axis of the spray branch pipe 12.

[0034] Compared to existing technologies, the above embodiment, in its specific implementation, arranges and connects multiple spray branch pipes 12 adjacent to the inner wall of the cleaning pipeline 1, and coordinates with a rotatable cleaning nozzle 2. When the cleaning fluid flowing through the cleaning nozzle 2 impacts the guide vanes 22, the kinetic energy of the fluid is converted into mechanical rotational energy, thereby automatically driving the cleaning nozzle 2 to rotate continuously around the axis of the spray branch pipe 12. This structure achieves the technical effect of rotating the nozzle without the need for an additional motor or transmission device. It helps to solve the technical problems of uneven cleaning coverage, cleaning dead corners, complex equipment structure, high cost, difficult maintenance, and reliability risks of electrical components in chemically corrosive environments that exist with traditional fixed nozzles or rotating nozzles that require external power to drive. It achieves efficient, uniform, self-driven, simplified, and more durable cleaning of the inner wall of the chamber.

[0035] Based on the above embodiments, in some feasible embodiments, the guide vanes 22 are at least two evenly arranged around the axis of the spray branch pipe 12. During the process of the cleaning liquid impacting the vanes, the impact force is distributed more evenly and symmetrically in the circumference of the nozzle, thereby significantly reducing the vibration when the nozzle rotates, ensuring that the rotational motion is more stable and reliable, and achieving the technical effects of improving the rotational stability of the nozzle, extending the service life of rotating parts, and ensuring that the spray trajectory is uniform and regular. This helps to solve the technical problems of rotational imbalance, increased vibration, excessive wear, and unstable spraying mode that may be caused by single-blade or asymmetrical blade design.

[0036] Furthermore, for the cleaning nozzle 2, there is a more preferred embodiment. Specifically, the cleaning nozzle 2 includes a connecting cylinder 23 and a distributing ball 24. Multiple first spray nozzles 21 are located on the distributing ball 24, and the distributing ball 24 has an inlet communicating with the connecting cylinder 23. Each first spray nozzle 21 is arranged at intervals around the axis of the connecting cylinder 23. The end of the connecting cylinder 23 away from the distributing ball 24 is rotatably connected to the connecting cylinder 23. By specifically designing the cleaning nozzle 2 to include the connecting cylinder 23 and the distributing ball 24, and with the cleaning fluid flowing into the distributing ball 24, the cleaning fluid entering the nozzle can be effectively distributed inside the distributing ball 24 and sprayed simultaneously outwards in multiple directions through multiple nozzles arranged around the axis. This structure significantly expands the liquid coverage area and density of a single rotation, forming a more uniform and dense spray curtain. This helps solve the technical problems of limited coverage area of ​​a single nozzle or a small number of nozzles, low cleaning efficiency, and difficulty in forming a spray pattern that effectively covers the entire target area, thus improving the cleaning efficiency and uniformity per unit time.

[0037] In some feasible embodiments, the cleaning nozzle 2 further includes a sealing ring 25 and a connecting bearing 26, the connecting bearing 26 being used to form a rotational fit between the connecting cylinder 23 and the spray branch pipe 12, the sealing ring 25 being used to form a seal between the connecting cylinder 23 and the spray branch pipe 12, and the sealing ring 25 being located between the outer walls of the connecting cylinder 23 and the spray branch pipe 12.

[0038] In the specific implementation of the above embodiment, by setting a connecting bearing 26 (forming a rotational fit) and a sealing ring 25 (forming a seal between the outer walls) between the connecting cylinder 23 and the spray branch pipe 12, the rotational support of the nozzle relative to the branch pipe is borne by the bearing, ensuring flexible and smooth rotation. At the same time, the sealing ring 25 effectively prevents the cleaning fluid from leaking from the rotational joint to the outside of the nozzle or the chamber environment. This structural combination achieves a highly reliable seal at the rotational joint while ensuring the free rotation function of the nozzle, preventing liquid leakage from contaminating the equipment or reducing the cleaning pressure. This helps to solve the technical problems of easy wear and leakage at the rotational joint, leading to waste of cleaning fluid, drop in cleaning pressure, and contamination of other parts of the equipment or the working environment, thus ensuring the airtightness and high efficiency of the cleaning process.

[0039] Preferably, the sealing ring 25 is made of sealing rubber, and the connecting bearing 26 is configured as a thrust ball bearing or a deep groove ball bearing. This ensures that the sealing ring 25 has good elasticity and chemical compatibility, providing a reliable dynamic seal under rotational conditions. Simultaneously, the selected bearing type can effectively withstand the axial force (thrust ball bearing) or combined radial / axial load (deep groove ball bearing) generated during nozzle rotation, ensuring smooth and low-resistance rotation. This structural combination significantly improves the sealing durability and chemical resistance of the rotating connection, and enhances the load-bearing capacity and operational stability of the rotating mechanism. This helps solve the technical problems of easy aging and failure of seals, easy jamming or excessive wear of bearings, leading to nozzle rotation failure or leakage under the harsh chemical corrosion environment and long-term operating conditions of CMP equipment. It extends the service life of key moving parts and improves the overall reliability of the device.

[0040] In some feasible embodiments, the spray direction of each first spray nozzle 21 is towards the cavity wall of the chamber to be cleaned and / or away from the chamber to be cleaned. In specific implementation, this embodiment, by setting the spray direction of each first spray nozzle 21 towards the cavity wall of the chamber to be cleaned and / or away from the chamber to be cleaned, and in conjunction with the rotating nozzle, can achieve that the cleaning liquid can be directly and concentratedly sprayed to rinse the surface of the inner wall of the chamber, or can form a spray that diffuses into the internal space of the chamber. The above structure achieves the technical effect of simultaneously satisfying the powerful rinsing and cleaning of the inner wall of the chamber and the diffuse cleaning or rinsing liquid coverage of the internal space of the chamber (such as possible splash areas, corners, or upper components), thereby helping to solve the technical problem that a single spray direction cannot simultaneously meet the needs of powerful cleaning of the cavity wall and cleaning of the internal space of the chamber, resulting in cleaning blind spots, and achieving more comprehensive cleaning coverage of the internal space of the chamber (including the walls and space).

[0041] In some feasible embodiments, the axis of the spray branch pipe 12 is perpendicular to the axis of the main pipe body 11. This allows the spray branch pipe 12 and the cleaning nozzle 2 mounted thereon to naturally extend vertically outward from the main pipe, making the working position of the nozzle more suitable. This structure, combined with the optimized layout of the first spray port 21, maximizes the cleaning range of the cleaning fluid, thereby helping to solve technical problems such as excessive spray distance, reduced impact force, and decreased cleaning effect due to unreasonable nozzle installation angles, or complex pipe layouts and excessive space occupation. This ensures efficient near-wall cleaning and efficient space utilization.

[0042] Based on the same inventive concept, this utility model also proposes a CMP device, which includes the internal chamber cleaning device of the CMP device mentioned above.

[0043] Compared to existing technologies, the CMP equipment of this invention possesses all the advantages of the aforementioned internal chamber cleaning device for CMP equipment. It enables automated cleaning of critical internal chambers (such as polishing chambers and cleaning chambers) using this self-driven, efficient, uniform, compact, and reliable cleaning device. This integrated approach significantly enhances the cleaning and maintenance capabilities and efficiency of the CMP equipment itself, reduces downtime for manual cleaning, lowers maintenance costs, and ensures that the chambers are always clean to reduce wafer contamination and improve process yield. This effectively solves the technical problems of difficult and inefficient internal chamber cleaning in CMP equipment, incomplete cleaning affecting wafer processing quality, and long downtime caused by traditional cleaning methods. Ultimately, it improves the overall operating efficiency, production yield, and automation level of the CMP equipment.

[0044] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A cleaning device for the internal chambers of a CMP (Continuous Metallurgical Processing) device, characterized in that, include: The cleaning pipeline includes a pipeline body and a control valve. The pipeline body is located in the chamber to be cleaned and is arranged adjacent to the inner wall of the chamber to be cleaned. The control valve is located outside the chamber to be cleaned and is used to control the flow of cleaning fluid inside the pipeline body. Along its length, the side of the pipeline body away from the inner wall of the chamber is connected to multiple spray branch pipes. Multiple cleaning nozzles are rotatably disposed in each of the spray branch pipes. One end of each cleaning nozzle is connected to and rotatably connected to the spray branch pipe, and the other end is provided with a first spray port. A guide vane is also provided inside the cleaning nozzle. The cleaning fluid flows into the cleaning nozzle from the spray branch pipe and is sprayed out from the first spray port. The guide vane is located between the spray branch pipe and the first spray port. As the cleaning fluid impacts the guide vane, the guide vane drives the cleaning nozzle to rotate around the axis of the spray branch pipe.

2. The CMP equipment internal chamber cleaning device as described in claim 1, characterized in that, The guide vanes are at least two that are evenly arranged around the axis of the spray branch pipe.

3. The CMP equipment internal chamber cleaning device as described in claim 2, characterized in that, The cleaning nozzle includes a connecting cylinder and a dispensing ball. The first spray nozzle is a plurality of those provided on the dispensing ball, and the dispensing ball is provided with a liquid inlet communicating with the connecting cylinder. Each of the first spray nozzles is arranged at intervals around the axis of the connecting cylinder. The end of the connecting cylinder away from the dispensing ball is rotatably connected to the connecting cylinder.

4. The CMP equipment internal chamber cleaning device as described in claim 3, characterized in that, The cleaning nozzle also includes a sealing ring and a connecting bearing. The connecting bearing is used to form a rotational fit between the connecting cylinder and the spray branch pipe. The sealing ring is used to form a seal between the connecting cylinder and the spray branch pipe, and the sealing ring is located between the outer walls of the connecting cylinder and the spray branch pipe.

5. The CMP equipment internal chamber cleaning device as described in claim 3, characterized in that, The spray direction of each of the first spray nozzles is towards the cavity wall of the chamber to be cleaned and / or towards the direction away from the chamber to be cleaned.

6. The CMP equipment internal chamber cleaning device as described in claim 1, characterized in that, The axis of the spray branch pipe is perpendicular to the axis of the main pipeline body.

7. The CMP equipment internal chamber cleaning device as described in claim 4, characterized in that, The sealing ring is made of sealing rubber, and the connecting bearing is configured as a thrust ball bearing or a deep groove ball bearing.

8. A CMP device, characterized in that, Includes a CMP equipment internal chamber cleaning device as described in any one of claims 1 to 7.

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