A spaced support mobile semiconductor inspection rack

Abstract

The utility model discloses a kind of interval support mobile semiconductor detection support, it is related to semiconductor detection technical field.The detection support, comprising: support frame body is supported on the top of monitoring window by support piece, for movable support probe holder;Support frame body includes frame, first center strip and second center strip are spaced apart in frame, first center strip and second center strip are spaced apart with frame respectively;Bearing block and support piece are fixedly connected;Support piece is fixedly connected on chamber top cover;Probe holder includes barrel body connector and connecting block;Connecting block protrudes the side wall of barrel body connector, is provided with through hole, for continuously fixed in different positions with probe holder.Avoid the influence of the fluctuation of different deposition temperature of chamber to the detector head, probe holder etc. of monitoring equipment;Realize that probe holder can be installed and positioned at any position, test position is arbitrarily positioned, compatible with various size substrate and tray change.

Description

Technical Field

[0001] This utility model belongs to the field of semiconductor testing technology, and specifically relates to an interval-supported movable semiconductor testing bracket. Background Technology

[0002] MOCVD (Metal-Organic Chemical Vapor Deposition) equipment is a key piece of equipment for the research and production of compound semiconductor epitaxial materials. It is particularly suitable for the large-scale industrial production of functional structure materials of compound semiconductors and is a core semiconductor equipment that cannot be replaced by other semiconductor equipment.

[0003] The epitaxial growth of compound semiconductor thin films using MOCVD equipment typically involves the reaction of various source gases and carrier gases to form the film. Since thin film growth is a nanoscale process, process parameters (e.g., temperature, reflectivity, emissivity, and curvature) need to be precisely controlled. One of the core technologies is in-situ monitoring, including real-time monitoring or surveillance of temperature, film thickness, and warpage.

[0004] The epitaxial growth process of thin films on substrates using MOCVD equipment requires processing temperatures between 500°C and 1300°C. Therefore, monitoring equipment is typically located outside the reaction chamber to avoid the high temperatures, high pressures, and corrosive chemicals within the chamber. The detector head of the monitoring equipment is fixed to a probe holder and corresponds to the aperture-shaped quartz window 1 of the monitoring section at the top of the reaction chamber for non-contact monitoring of process parameters such as temperature, reflectivity, emissivity, and curvature, thereby precisely controlling the epitaxial film growth process.

[0005] In the prior art, the perforated quartz window 1 is a fixed porous structure, see [link to previous text]. Figure 1 To fix the size of the monitoring window and match it with the optical path channel size of the monitoring equipment, ensuring measurement accuracy and reducing the thermal impact of heat inside the cavity on the outside; however, different substrate sizes and changes in substrate size and position make it impossible to adjust the test position, and it is not compatible with various substrate and tray sizes (for example, some ideal monitoring positions are between adjacent holes in the fixed porous structure, which affects the monitoring process). Existing technologies have systems that use movable monitoring probes to adjust the position of the monitoring probe, but such systems involve motion structures, control systems, etc., significantly increasing costs and making the systems too complex for large-scale applications. Moreover, they also do not solve the problem of the fixed porous structure's hole type quartz window 1.

[0006] In addition, there are problems such as the probe head of the monitoring equipment being affected by different deposition temperatures in the chamber (processing temperature between 500℃ and 1300℃) and the probe measurement accuracy fluctuating greatly. The probe seat is also affected by heat and deforms greatly, affecting the probe installation position and reducing measurement accuracy.

[0007] It should be noted that this part of the present invention only provides background technology related to the present invention, and does not necessarily constitute prior art or known technology. Utility Model Content

[0008] The purpose of this invention is to overcome the problems of existing technologies, such as different substrate sizes, changes in substrate size and position, inability to adjust the test position, incompatibility with various substrate and tray sizes, and the impact of different deposition temperature fluctuations on the measurement accuracy of the detector head and probe holder of the monitoring equipment. This invention provides an interval-supported movable semiconductor testing bracket, which avoids the impact of different deposition temperature fluctuations on the detector head and probe holder of the monitoring equipment; it enables the probe holder to be installed and positioned at any location, allowing for arbitrary test position placement, and is compatible with various substrate and tray sizes.

[0009] To achieve the above objectives, this utility model provides an intermittently supported movable semiconductor testing bracket, comprising:

[0010] A support frame, supported at intervals by support members, is mounted on top of the monitoring window and is used to movably support one or more probe mounts. The support frame includes a frame, within which a first center strip and a second center strip are disposed. The first center strip and the second center strip are spaced apart and are respectively spaced apart from the frame. The support frame also includes a bearing block protruding from the frame. The bearing block and the support members are fixedly connected. The support members are fixedly connected to the top cover of the chamber.

[0011] The probe holder includes a cylindrical connector and a connecting block; the connecting block protrudes from the side wall of the cylindrical connector and is provided with a through hole for continuously fixing the probe holder at different positions.

[0012] Optionally, the monitoring window is supported at intervals of 2-20mm on top of the support members.

[0013] Optionally, the bearing block includes a first central bearing block, a second central bearing block, and an end bearing block, and the support member includes an end support member, a first central support member, and a second central support member; the first central bearing block and the first central support member are fixedly connected, the second central bearing block and the second central support member are fixedly connected, and the end bearing block and the end support member are fixedly connected.

[0014] Optionally, the top of the monitoring window is an integrated quartz window supported by a monitoring frame.

[0015] Optionally, the first central support block, the second central support block, and the end support block are provided with through holes and are fixedly connected to the support member by bolts.

[0016] Optionally, the first central support block and the second central support block are symmetrically spaced apart with respect to the horizontal axis of the deposition chamber center.

[0017] Optionally, the top surface of at least one of the probe holder's cylindrical connectors is an inclined top surface.

[0018] Optionally, the cross-sectional shape of the support member is one of square, circular, elliptical, hexagonal, or triangular.

[0019] Optionally, the first center strip and the second center strip are spaced apart by a distance of 5-50mm; the first center strip and the second center strip are spaced apart from the frame by a distance of 5-20mm.

[0020] Optionally, the fixed connection is one of welding, bolting, or riveting.

[0021] Beneficial effects:

[0022] This utility model provides a spaced-support movable semiconductor testing bracket. A first center strip and a second center strip are spaced apart, forming an uninterrupted continuous interval between them. The first and second center strips are also spaced apart from the frame, and the first center strip and the frame, as well as the second center strip and the frame, form uninterrupted continuous intervals. This uninterrupted continuous interval allows the probe holder to be moved and fixed at any position. By cooperating with the frame, the first center strip, and the second center strip of the support frame to form multiple uninterrupted continuous intervals, the probe holder can be moved and fixed at any position, providing a continuous field of view at any position. This overcomes the problems of existing technologies, such as different substrate sizes, changes in substrate size and position, inability to adjust the test position, and incompatibility with various substrate sizes and tray variations. The support frame is supported at intervals on top of the monitoring window by support members, keeping the support frame away from the monitoring window. This greatly reduces the possibility of deformation of the support frame due to heat (and less affected by fluctuations in different deposition temperatures within the chamber), and also avoids the impact of deformation of the monitoring window. At the same time, it facilitates convenient installation and fixation of the probe holder in any position. Based on the above structure, it overcomes the problems of existing technologies such as different substrate sizes, changes in substrate size and position, inability to adjust the test position, incompatibility with various substrate and tray sizes, and the impact of fluctuations in different deposition temperatures within the chamber on the measurement accuracy of the detector head and probe holder of the monitoring equipment. It can achieve a significant improvement in measurement accuracy, unaffected by different deposition chamber temperatures and unrestricted by different substrate sizes. Attached Figure Description

[0023] To more clearly illustrate the technical solutions of the embodiments of this utility model, the drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this utility model and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0024] Figure 1 This is a schematic diagram of a perforated quartz window in the prior art;

[0025] Figure 2 This is a schematic diagram of the structure of the spaced-support mobile semiconductor detection bracket provided in an embodiment of the present utility model;

[0026] Figure 3 This is a schematic diagram of the top structure of the monitoring window provided in an embodiment of the present utility model;

[0027] Figure 4 This is a schematic diagram of another probe holder provided in an embodiment of the present invention.

[0028] Explanation of reference numerals in the attached figures:

[0029] 1-Aperture quartz window; 2-Cavity top cover; 3-Monitoring window; 31-Integrated quartz window; 32-Monitoring frame; 4-Support frame; 41-Frame; 42-First center bar; 43-Second center bar; 44-First center support block; 45-Second center support block; 46-End support; 47-First center support; 48-Second center support; 49-End support block; 5-Probe mount; 50-Support crossbar; 51-Cylinder connector; 52-Connecting block. Detailed Implementation

[0030] In this utility model, unless otherwise stated, directional terms such as "up," "down," "left," and "right" are generally understood in conjunction with the accompanying drawings and the directions shown in actual applications.

[0031] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.

[0032] In this utility model, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0033] The endpoints and any values ​​of the ranges disclosed herein are not limited to the precise ranges or values, and should be understood to include values ​​close to these ranges or values. For numerical ranges, the endpoint values ​​of the ranges, the endpoint values ​​of the ranges and individual point values, and individual point values ​​can be combined with each other to obtain one or more new numerical ranges, which should be considered as specifically disclosed herein. The terms "optional" and "discretionary" mean that they may or may not be included (or may or may not be present).

[0034] To overcome the problems of existing technologies, such as varying substrate sizes and positions, inability to adjust the test position, incompatibility with substrates and trays of different sizes, and the impact of varying deposition temperatures on the measurement accuracy of the detector head and probe holder in the monitoring equipment, this invention is proposed based on further research.

[0035] Please refer to the reference. Figures 2 to 4 This utility model provides an intermittently supported movable semiconductor testing bracket, comprising:

[0036] A monitoring window 3, supported on the top cover 2 of the chamber and connected to the deposition chamber, is used to monitor the epitaxial film growth status on the substrate within the deposition chamber. By monitoring temperature, reflectivity, emissivity, and curvature, the epitaxial film growth process can be precisely controlled. The top of the monitoring window 3 is an integrated quartz window 31 supported by a monitoring frame 32. This integrated quartz window 31 provides a non-interval monitoring window, offering a continuous and uninterrupted field of view of the substrate within the monitoring chamber. The top cover 2 of the chamber is fixedly connected to a support structure. The fixed connection can be achieved through welding, bolting, or riveting.

[0037] The support frame 4 is supported on top of the monitoring window 3 by support members at intervals. It is used to movably support one or more probe seats 5 with an interval distance of 2-20mm. This interval distance can effectively reduce the thermal impact of temperature changes in the deposition chamber on the detection equipment and help reduce the deformation of the support frame 4.

[0038] The large window design of the integrated quartz window 31 facilitates continuous monitoring. However, it also increases the impact of heat within the deposition chamber on the upper part, making the support frame 4 more susceptible to thermal expansion and contraction. This increased deformation of the support frame 4 negatively impacts measurement accuracy. By using support members to periodically support the top of the monitoring window 3, the support frame 4 is moved away from the monitoring window 3, significantly reducing the thermal impact of heat conduction. This thermal impact is the primary source of heat, and this design greatly reduces the possibility of deformation of the support frame 4, thus improving measurement accuracy. Simultaneously, the space created between the monitoring window 3 and the support frame facilitates the movable fixing and disassembly of the probe holder 5, greatly reducing installation and maintenance difficulty. The monitoring window 3, with its window structure, is highly susceptible to thermal deformation, making it an unavoidable area of ​​significant deformation that affects measurement accuracy. The support members, resting on the chamber top cover 2, ensure the stability of the chamber top cover 2, thus preventing the support frame 4 from being affected by the deformation of the monitoring window 3, further enhancing measurement accuracy.

[0039] The support frame 4 includes a frame 41, which is a rectangular structure matching the main structure of the monitoring window 3. A first center strip 42 and a second center strip 43 are arranged within the frame 41. The first center strip 42 and the second center strip 43 are spaced apart, forming an uninterrupted continuous interval to facilitate unobstructed continuous monitoring of the epitaxial film growth on the substrate within the deposition chamber by the detector head. The interval distance is 5-50 mm, ensuring unobstructed detection of the detector head. The first center strip 42 and the second center strip 43 are spaced apart from the frame 41, forming an uninterrupted continuous interval between the first center strip 42 and the frame 41, and between the second center strip 43 and the frame 41. This uninterrupted continuous interval allows for the movable fixation of the probe holder 5 at any position. The interval distance is 5-20 mm, which can be used to fix the connecting device while preventing loosening due to excessive distance. The support frame 4 also includes a first central support block 44, a second central support block 45, and an end support block 49 protruding from the frame 41; the first central support block 44, the second central support block 45, and the end support block 49 are provided with through holes and are fixedly connected to the support members by bolts. The first central support block 44, the second central support block 45, and the end support block 49 can be rectangular, square, semi-circular, or other shapes.

[0040] The support components include end support components 46, a first central support component 47, and a second central support component 48. The support components can be rod-shaped, plate-shaped, or have cross-sections of square, circular, elliptical, hexagonal, triangular, etc., without limitation. Preferably, the support component is a circular support rod, and the support component is provided with structures such as holes for fixed connections. The end support components 46, the first central support component 47, and the second central support component 48 can be supported by a support crossbar 53 to increase the support strength. The support crossbar 53 can be rod-shaped, plate-shaped, or have cross-sections of square, circular, elliptical, hexagonal, triangular, etc., without limitation.

[0041] In the diagram, four end supports 46 are provided, located near the four ends of the frame 41, and are fixedly connected to the four end bearing blocks 49 of the support frame 4, so that the support frame 4 is supported at intervals on the top of the monitoring window 3. The support frame 4 spans the entire top of the monitoring window 3, with a large span in the length direction. The support frame 4 is prone to deformation in the length direction, which affects the measurement accuracy. The first central bearing block 44 and the first central support 47 are fixedly connected, and the second central bearing block 45 and the second central support 48 are fixedly connected, providing support from the central part of the support frame 4 in the length direction, effectively reducing the deformation of the support frame 4 and improving the structural stability of the support frame 4. Preferably, the first central bearing block 44 and the second central bearing block 45 are symmetrically spaced relative to the horizontal axis passing through the center of the sedimentation chamber, thereby achieving stable support in the easily deformable area near the center of the sedimentation chamber, further reducing the deformation risk of the support frame 4 and improving the measurement accuracy.

[0042] The above intervals refer to the fact that adjacent components do not directly contact each other. The interval distance can be determined according to actual needs such as heat insulation, detection path size, and the size of fixed connectors.

[0043] One or more probe holders 5 are provided and are movably supported on the support frame 4. The probe holder 5 includes a cylindrical connecting body 51 and a connecting block 52. The cylindrical connecting body 51 is provided with screw holes for fixed connection with the detector head (not shown) and for stable support of the detector head. The connecting block 52 protrudes from the side wall of the cylindrical connecting body 51 and is provided with through holes for bolts and other connecting parts to pass through the through holes. The probe holder 5 is fixed in different positions by the uninterrupted continuous intervals formed between the first center strip 42 and the frame 41, and between the second center strip 43 and the frame 41.

[0044] The integrated quartz window 31 provides a continuous and uninterrupted field of view for the substrate within the monitoring chamber. A first central strip 42 and a second central strip 43 are spaced apart, forming an uninterrupted continuous interval. The first central strip 42 and the second central strip 43 are also spaced apart from the frame 41, forming an uninterrupted continuous interval between the first central strip 42 and the frame 41, and between the second central strip 43 and the frame 41. This uninterrupted continuous interval allows the probe holder 5 to be moved and fixed at any position. The cooperation of the frame 41 of the support frame 4, the first central strip 42, and the second central strip 43 forms multiple uninterrupted continuous intervals, enabling the probe holder 5 to be moved and fixed at any position, providing a continuous field of view at any position. This overcomes the problems of existing technologies where substrate size varies, substrate size and position change, test position cannot be adjusted, and it is incompatible with various substrate sizes and tray variations. The support frame 4 is supported at intervals on top of the monitoring window 3 by support members, keeping the support frame 4 away from the monitoring window 3. This greatly reduces the possibility of deformation of the support frame 4 due to heat (and less affected by the fluctuation of different deposition temperatures in the chamber), and also avoids the impact of deformation of the monitoring window 3. At the same time, it facilitates the convenient installation and fixation of the probe holder 5 in any position. Based on the above structure, it overcomes the problems of existing technologies such as different substrate sizes, changes in substrate size and position, inability to adjust the test position, incompatibility with various sizes of substrates and trays, and the impact of different deposition temperature fluctuations in the monitoring equipment on the measurement accuracy of the detector head and probe holder. It can achieve a significant improvement in measurement accuracy, which is not affected by different deposition chamber temperatures and is not limited by different substrate sizes.

[0045] The preferred embodiments of this utility model have been described in detail above; however, this utility model is not limited thereto. Within the scope of the technical concept of this utility model, various simple modifications can be made to the technical solution of this utility model, including combining the various technical features in any other suitable manner. These simple modifications and combinations should also be considered as the content disclosed by this utility model and are all within the protection scope of this utility model.

Claims

1. A spaced-support movable semiconductor testing bracket, characterized in that, include: A support frame, supported at intervals by support members, is mounted on top of the monitoring window and is used to movably support one or more probe mounts. The support frame includes a frame, within which a first center strip and a second center strip are disposed. The first center strip and the second center strip are spaced apart and are respectively spaced apart from the frame. The support frame also includes a bearing block protruding from the frame. The bearing block and the support members are fixedly connected. The support members are fixedly connected to the top cover of the chamber. The probe holder includes a cylindrical connector and a connecting block; the connecting block protrudes from the side wall of the cylindrical connector and is provided with a through hole for continuously fixing the probe holder at different positions.

2. The spaced-support movable semiconductor testing bracket according to claim 1, characterized in that, The support is placed on top of the monitoring window at intervals of 2-20mm.

3. The spaced-support movable semiconductor testing bracket according to claim 1, characterized in that, The bearing block includes a first central bearing block, a second central bearing block, and an end bearing block; the support member includes an end support member, a first central support member, and a second central support member; the first central bearing block and the first central support member are fixedly connected, the second central bearing block and the second central support member are fixedly connected, and the end bearing block and the end support member are fixedly connected.

4. The spaced-support movable semiconductor testing bracket according to claim 1, characterized in that, The top of the monitoring window is an integrated quartz window supported by the monitoring frame.

5. The spaced-support movable semiconductor testing bracket according to claim 3, characterized in that, The first central support block, the second central support block, and the end support block are provided with through holes and are fixedly connected to the support member by bolts.

6. The spaced-support movable semiconductor testing bracket according to claim 3, characterized in that, The first central support block and the second central support block are symmetrically spaced apart with respect to the horizontal axis of the center of the deposition chamber.

7. The spaced-support movable semiconductor testing bracket according to claim 1, characterized in that, At least one of the probe holders has an inclined top surface on the top surface of the cylindrical connector.

8. The spaced-support movable semiconductor testing bracket according to claim 1, characterized in that, The cross-sectional shape of the support member is one of square, circular, elliptical, hexagonal, or triangular.

9. The spaced-support movable semiconductor testing bracket according to claim 1, characterized in that, The first center strip and the second center strip are spaced apart by a distance of 5-50mm; the first center strip and the second center strip are spaced apart from the frame by a distance of 5-20mm.

10. The spaced-support movable semiconductor testing bracket according to claim 1, characterized in that, The fixed connection is one of welding, bolting, or riveting.

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