A control host and treatment device for low temperature plasma therapy

By designing a modular functional unit and a stacked structure for the low-temperature plasma therapy control host, the shortcomings of existing host products have been solved, control stability and safety have been improved, and the needs of clinical applications have been met.

CN224356323UActive Publication Date: 2026-06-12BEIJING INST OF TECH

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
BEIJING INST OF TECH
Filing Date
2025-07-14
Publication Date
2026-06-12

AI Technical Summary

Technical Problem

Existing low-temperature plasma therapy systems lack the technology for product implementation, especially the technology for implementing the main unit product. This results in insufficient technical feasibility, product stability, and safety in clinical applications, failing to meet the needs of rapid clinical application.

Method used

A control host for cryogenic plasma therapy was designed, including multiple installation chambers within a housing, a control unit, an adjustment unit, and a high-voltage power supply separated by partition plates, input and output ports, and optimized internal space of the host through modular functional units and stacked structure design to reduce interference from the high-voltage power supply to the control unit. At the same time, an anti-electric shock device was set at the output end to improve safety.

Benefits of technology

The productization of the control host has been achieved, which has improved the control stability of the control unit and the safety of the device, ensured the life and health of patients, simplified the host structure and improved the reliability of operation.

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Abstract

The utility model discloses a control host computer and treatment device for low temperature plasma treatment, its scheme includes: casing, is provided with at least two mounting chamber in it, is separated through the support board between mounting chamber, is provided with control unit, adjusting unit and high voltage power supply in the casing, is provided with input and output in the casing lateral wall, and control unit is arranged in different mounting chamber with adjusting unit and high voltage power supply, input is used for power and gas source input, and output is used for output operating voltage and working gas, and adjusting unit is used for adjusting the voltage size of operating voltage and the flow size of working gas. The scheme introduces control host computer internal structure, connection relation etc.
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Description

Technical Field

[0001] This utility model relates to the field of medical device machinery, and in particular to a control host and treatment device for low-temperature plasma therapy. Background Technology

[0002] Low-temperature plasma, due to its low gas temperature and high electron temperature, is used in ENT surgery, wound care, dental root canal treatment, and tumor treatment. However, its clinical application has progressed slowly, and there are few products available for clinical use. Currently, only equipment for ENT surgery is widely used in clinical practice. Treatment systems for wound care, dental root canal treatment, and tumor treatment are still in the technology research and system methodology research stage, with few commercialized solutions, failing to meet the demand for rapid clinical application of low-temperature plasma and the expectations of patients.

[0003] Existing technologies mainly focus on the research of system composition and the development of plasma generators. For example, patent number CN113558757A discloses a treatment head that generates low-temperature plasma, but it only discloses the composition and structure of the treatment head and lacks the related technologies of the overall system composition and main unit structure. Another example is the invention patent CN117122402A, which discloses a plasma treatment system. The system mainly includes a power supply device, a host computer, a slave computer, a high-voltage control device, and a plasma generator. It discloses the system composition but does not disclose the structure of the main unit and lacks a specific solution for productization. In the invention patent CN114224526A, a dental root canal treatment device based on atmospheric pressure low-temperature plasma jet is disclosed. It discloses the composition and connection method of the plasma generator and the control host, but lacks the related technologies of the specific structure of each component.

[0004] In summary, existing technologies for low-temperature plasma therapy systems mainly focus on system composition and plasma generators, lacking technologies at the product implementation level, especially the implementation technology of the main unit. The application and clinical use of low-temperature plasma therapy systems involve the feasibility of technology, product stability, and product safety. Among these, product safety is the minimum requirement for medical devices, ensuring the basic protection of patients' life and health. Utility Model Content

[0005] In view of the above-mentioned defects or deficiencies in the prior art, the present invention provides a control host and treatment device for low-temperature plasma therapy.

[0006] To achieve the above objectives, the present invention provides a control host for low-temperature plasma therapy, comprising:

[0007] The housing has at least two mounting chambers inside, which are separated by a support plate;

[0008] A control unit, an adjustment unit, and a high-voltage power supply are provided inside the housing. An input terminal and an output terminal are provided on the side wall of the housing. The control unit, the adjustment unit, and the high-voltage power supply are located in different mounting chambers.

[0009] The input terminal is used for power and gas input, the output terminal is used for outputting working voltage and working gas, and the adjustment unit is used for adjusting the voltage of the working voltage and the flow rate of the working gas.

[0010] Preferably, the input terminal includes a working gas input port and a power input port, and the adjustment unit includes a first adjustment module and a second adjustment module;

[0011] The first adjustment module is disposed between the working gas input port and the output port, and the first adjustment module is used to control the flow rate of the working gas;

[0012] The power input port is connected to the second adjustment module and the control unit respectively. The control unit is connected to the high-voltage power supply control. The second adjustment module is used to control the voltage magnitude of the operating voltage output by the high-voltage power supply.

[0013] Preferably, the first adjustment module includes a first control knob, a first controller, a control switch, and a display screen;

[0014] The first controller, control switch, and display screen are installed on the pipeline connecting the working gas input port and output port. The first control knob is connected to the first controller and extends out of the housing. The control switch and display screen are connected to the control unit.

[0015] The control switch is used to control the on / off state of the working gas input, the first control knob is used to control the first controller to adjust the flow rate of the working gas, and the display screen is used to display the flow rate of the working gas.

[0016] Preferably, the second adjustment module includes a second control knob and a second controller;

[0017] The second control knob is connected to the second controller, the second controller is connected to the adjustment unit, the power input port is connected to the second controller, and the second control knob is used to control the second controller so that the control unit controls the voltage magnitude of the operating voltage output by the high voltage power supply.

[0018] Preferably, the control unit includes a central control module and an execution control module, wherein the central control module is controllably connected to the execution control module;

[0019] The central control module is connected to the first controller, and the execution control module is connected to the control switch.

[0020] Preferably, a human-machine interface is provided on the side wall of the housing, and the human-machine interface is connected to the central control module for control. The human-machine interface is used for setting working modes and working parameters.

[0021] Preferably, a power supply unit is further provided inside the housing, and the power supply unit is connected to the power input port;

[0022] The power supply unit is connected to the central control module, the execution control module and the display screen respectively, and the power supply unit is used to supply power at a specific voltage and power.

[0023] Preferably, a power switch is provided on the side wall of the housing, the power switch is connected to the control unit, and the power switch is used to control the start and stop of the control host.

[0024] Preferably, the output terminal includes a working gas output port and a working voltage output port, and an anti-electric shock device is provided at the working voltage output port to isolate current when it is accidentally connected to the working voltage output port.

[0025] To achieve the above objectives, this utility model also provides a low-temperature plasma therapy device, including the control host and treatment handle described above for low-temperature plasma therapy;

[0026] The treatment handle is connected to the output pipeline, the control host is used to provide the treatment handle with working voltage and working gas, and the treatment handle is used to generate plasma and output it.

[0027] Based on this, the beneficial effects of this utility model are as follows:

[0028] 1. The present invention discloses the internal structure of the control host for low-temperature plasma therapy, providing a product implementation solution. The internal modular functional units and stacked structural design, especially the high-voltage power supply and control unit, are respectively set in different chambers within the housing, which reduces the interference of the high-voltage power supply to the control unit and improves the control stability of the control unit. By optimizing the host structure, the overall structure of the host is simple and the operation is reliable.

[0029] 2. The present invention provides an anti-electric shock device at the output end. When the device is powered off and the user accidentally connects it, the anti-electric shock device can prevent current from flowing, improve the safety of the device and protect the life and health of the patient. Attached Figure Description

[0030] Other features, objects, and advantages of this application will become more apparent from the following detailed description of non-limiting embodiments with reference to the accompanying drawings:

[0031] Figure 1 This schematic diagram shows a front view of the control host of one embodiment of the present invention.

[0032] Figure 2 This schematic diagram shows a rear view of the control host according to one embodiment of the present invention.

[0033] Figure 3 A schematic diagram illustrating the internal structure of a control host according to one embodiment of the present invention;

[0034] Figure 4 This schematic diagram illustrates the working principle of the control host in one embodiment of the present invention.

[0035] Figure 5 A schematic diagram illustrating the structure of a low-temperature plasma therapy device according to one embodiment of the present invention;

[0036] Explanation of reference numerals in the attached drawings: 10-Housing, 101-Mounting chamber, 102-Support plate, 103-Front panel, 104-Rear panel, 105-Treatment handle, 20-Control unit, 201-Central control module, 202-Execution control module, 30-Adjustment unit, 301-First adjustment module, 3011-First control knob, 3012-First controller, 3013-Control switch, 3014-Display screen, 302-Second adjustment module, 3021-Second control knob, 3022-Second controller, 40-High voltage power supply, 50-Input terminal, 501-Working gas input port, 502-Power input port, 503-Equipotential port, 60-Output terminal, 601-Working gas output port, 602-Working voltage output port, 6021-Anti-electric shock device, 70-Human machine interface, 80-Power supply unit, 90-Power switch. Detailed Implementation

[0037] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0038] The terminology used in the embodiments of this application is for the purpose of describing particular embodiments only and is not intended to be limiting of this application. The singular forms "a," "the," and "the" as used in the embodiments of this application are also intended to include the plural forms unless the context clearly indicates otherwise.

[0039] It should be understood that although the terms first, second, third, etc., may be used to describe related structures in the embodiments of this application, these related structures should not be limited to these terms. These terms are only used to distinguish related structures from each other.

[0040] Depending on the context, the word "if" as used here can be interpreted as "when" or "when". Similarly, depending on the context, the phrase "if determined" can be interpreted as "when determined" or "when (the condition or event of the statement) is detected".

[0041] It should be noted that the directional terms such as "upper," "lower," "left," and "right" described in the embodiments of this application are used to describe the angles shown in the accompanying drawings and should not be construed as limiting the embodiments of this application. Furthermore, in the context, it should also be understood that when it is mentioned that an element is formed "upper" or "lower" of another element, it can not only be formed directly "upper" or "lower" of the other element, but also indirectly "upper" or "lower" of the other element through an intermediate element.

[0042] Figure 1 This schematic diagram shows a front view of the control host according to one embodiment of the present invention. Figure 2 This schematic diagram shows a rear view of the control host according to one embodiment of the present invention. Figure 3 This schematic diagram illustrates the internal structure of the control host according to one embodiment of the present invention, as shown below. Figure 1-3 As shown, a control host for low-temperature plasma therapy according to this utility model includes:

[0043] The housing 10 has at least two mounting chambers 101 therein, and the mounting chambers 101 are separated by a support plate 102.

[0044] A control unit 20, an adjustment unit 30, and a high-voltage power supply 40 are provided inside the housing 10. An input terminal 50 and an output terminal 60 are provided on the side wall of the housing 10. The control unit 20, the adjustment unit 30, and the high-voltage power supply 40 are located in different installation chambers 101.

[0045] Input terminal 50 is used for power and gas input, output terminal 60 is used for outputting working voltage and working gas, and adjustment unit 30 is used for adjusting the voltage of working voltage and the flow rate of working gas.

[0046] Specifically, the housing 10 includes a front panel 103 and a rear panel 104 disposed opposite to each other, with an input terminal 50 disposed on the rear panel 104 and an output terminal 60 disposed on the front panel 103.

[0047] At least one support plate 102 is provided in the housing 10, with its two ends detachably connected to the two side walls of the housing 10 for installation. The control unit 20 is placed in the mounting chamber 101 on the support plate 102, and the high-voltage power supply 40 is placed in the mounting chamber 101 below the support plate 102. This allows for the layered arrangement of the control unit 20 and the high-voltage power supply 40, which can avoid interference from the high-voltage power supply 40 when it is working, thus enabling the control unit 20 to control accurately.

[0048] The control unit 20 integrates a control algorithm, which can accept and process input commands and output working and interactive commands to the corresponding working parts.

[0049] The output voltage of the high-voltage power supply 40 is one of sinusoidal AC voltage, DC voltage, and pulsed DC voltage.

[0050] Furthermore, the input terminal 50 includes a working gas input port 501 and a power input port 502. The working gas input port 501 is used for the input of working gas, and the power input port 502 is used for the input of working voltage. The adjustment unit 30 includes a first adjustment module 301 and a second adjustment module 302.

[0051] The first regulating module 301 is located between the working gas input port 501 and the output port 60. The first regulating module 301 is used to control the flow rate of the working gas.

[0052] The power input port 502 is connected to the second adjustment module 302 and the control unit 20 respectively. The control unit 20 is connected to the high voltage power supply 40. The second adjustment module 302 is used to control the voltage magnitude of the working voltage output by the high voltage power supply 40.

[0053] Specifically, the first adjustment module 301 includes a first control knob 3011, a first controller 3012, a control switch 3013, and a display screen 3014. The first controller 3012, the control switch 3013, and the display screen 3014 are installed on the pipeline connecting the working gas input port 501 and the output port 60. The first control knob 3011 is connected to the first controller 3012 and extends out of the outer side of the housing 10, extending from the front panel 103. The control switch 3013 is used to control the on / off of the working gas input. The first control knob 3011 is used to control the first controller 3012 to adjust the flow rate of the working gas. The display screen 3014 is used to display the flow rate of the working gas.

[0054] When the control host is started, the control switch 3013 is turned on, so that the working gas input port 501 and the output port 60 are connected. The user rotates the first control knob 3011 to control the first controller 3012 to adjust the flow rate of the working gas in the pipeline. At the same time, the flow rate of the working gas can be displayed on the display screen 3014 for the user to view.

[0055] The second adjustment module 302 includes a second control knob 3021 and a second controller 3022. The second control knob 3021 is connected to the second controller 3022, and the second controller 3022 is controlled by the adjustment unit 30. The power input port 502 is connected to the second controller 3022. The second control knob 3021 is used to control the second controller 3022 so that the control unit 20 controls the voltage magnitude of the working voltage output by the high voltage power supply 40.

[0056] When the control host is started, the second controller 3022 adjusts the working voltage of the high voltage power supply 40 by rotating the second control knob 3021.

[0057] Furthermore, the control unit 20 includes a central control module 201 and an execution control module 202, with the central control module 201 and the execution control module 202 being control-connected.

[0058] The central control module 201 is connected to the first controller 3012, and the execution control module 202 is connected to the control switch 3013.

[0059] Specifically, the central control module 201 is used to receive and process input instructions, and output working and interactive instructions to the corresponding working equipment. The execution control module 202 is used to receive the instructions from the central control module 201, and after processing by the internal algorithm, execute the output and control the opening and closing of the high voltage power supply 40 and the opening and closing of the control switch 3013.

[0060] Furthermore, a human-machine interface 70 is provided on the side wall of the housing 10. The human-machine interface 70 is connected to the central control module 201 and is used for setting the working mode and working parameters.

[0061] Specifically, the human-machine interface 70 can be set on the front panel 103. The human-machine interface 70 is a touch screen that can display and control the working mode of the treatment system, namely, continuous working mode and intermittent working mode. It can also control the high voltage output voltage, high voltage frequency, power, working time and intermittent time in the corresponding mode. The high voltage output power display value is obtained by sampling and fitting the input voltage or output voltage of the high voltage power supply 40.

[0062] When the user adjusts the operating voltage of the high-voltage power supply 40 using the second control knob 3021, the change value can be viewed on the human-machine interface 70, thus assisting the user in adjustment.

[0063] Furthermore, a power supply unit 80 is also provided inside the housing 10, which can be specifically installed in the mounting chamber 101 on the support plate 102. The power supply unit 80 is connected to the power input port 502.

[0064] The power supply unit 80 is connected to the central control module 201, the execution control module 202 and the display screen 3014 respectively. The power supply unit 80 is used to supply power at specific voltage and power to realize the power consumption of various devices in the control host.

[0065] Furthermore, a power switch 90 is provided on the side wall of the housing 10, specifically on the front panel 103. The power switch 90 is connected to the control unit 20, specifically to the central control module 201. The power switch 90 is used to control the start and stop of the control host.

[0066] Furthermore, the output terminal 60 includes a working gas output port 601 and a working voltage output port 602. An anti-electric shock device 6021 is provided at the working voltage output port 602. The anti-electric shock device 6021 is used to isolate the current when it is accidentally connected to the working voltage output port 602.

[0067] Specifically, the output terminal 60 is used for connecting external devices. When the control host outputs working voltage and working gas, the external device can generate plasma to achieve treatment.

[0068] When an external device is connected to the output terminal 60, its working gas port is connected to the working gas output port 601. The two can be connected by a thread to reduce the risk of disconnection in the case of direct insertion.

[0069] The working voltage output port 602 has two interfaces: a positive terminal socket (not shown in the figure) and a ground terminal socket (not shown in the figure). Correspondingly, the external device also has two working voltage ports. At the same time, an anti-misinsertion device (not shown in the figure) is provided at the working voltage output port 602. This device can be an anti-misinsertion socket between the positive terminal socket and the ground terminal socket, and a protruding insertion post on the external device. Connection can only be achieved and current can flow when the two ports and the insertion post of the external device correspond to the sockets on the working voltage output port 602.

[0070] The anti-electric shock device 6021 is connected at both ends to the positive terminal and the ground terminal. Specifically, it is a high-voltage capacitor. Since electronic products automatically store a certain amount of residual electricity, if the user accidentally connects to the working voltage output port 602 after the main unit is turned off, the high-voltage residual electricity will be released, which will endanger personal safety. The high-voltage capacitor absorbs all the high-voltage residual electricity, achieving current isolation. Even if a misconnection occurs, no residual electricity will be released, thus protecting the user.

[0071] Furthermore, the input terminal 50 also includes an equipotential port 503, which is located on the rear panel 104. The equipotential port 503 is used to ensure that the conductive protection parts of each device are at the same potential when the host works in coordination or together with other devices, so as to avoid the patient from being shocked.

[0072] Furthermore, Figure 4 This diagram schematically illustrates the working principle of the control host according to one embodiment of the present invention. Figure 5 This schematic diagram illustrates the structure of a low-temperature plasma therapy device according to one embodiment of the present invention, as shown below. Figure 4 , 5 As shown:

[0073] This utility model also provides a low-temperature plasma therapy device, which includes the above-mentioned control host and a treatment handle 105;

[0074] The treatment handpiece 105 is detachably connected to the control host, specifically connected to the output terminal 60 via a pipeline. The control host is used to provide the treatment handpiece 105 with operating voltage and operating current, and the treatment handpiece 105 is used to generate plasma and output treatment.

[0075] Specifically, when the control host is started, its working principle is as follows:

[0076] The working gas enters from the gas input port and passes through the gas opening and closing section, the gas flow regulation section, and the gas flow display section in sequence along the pipeline. The working gas is then delivered to the treatment head connection port to achieve working gas output. During this process, the execution control section receives instructions from the central control section to control the control switch 3013 of the gas opening and closing section to open, thereby enabling the working gas to flow.

[0077] The working voltage is connected from the power input section, with one part supplied to the power supply unit 80 and the other part supplied to the execution control section and then to the high-voltage power supply 40. The power supply unit 80 adjusts the voltage to a suitable power and then supplies it to the central control section, the execution control section and the air flow display section to meet the power needs of each device. When the working voltage is output, the parameters are adjusted by the high-voltage regulation operation section, the central control section receives the adjustment signal and controls the execution control section to control the high-voltage regulation section to adjust the output of the working voltage of the high-voltage power supply section, and finally realizes the output of the working voltage at the treatment head connection port.

[0078] During the above control process, users can input commands in the interactive control section to select the motor operating mode and control the system operating parameters.

[0079] In summary, this utility model provides a solution for the commercialization of a control host by disclosing its working principle, structure, and device connection relationships. It also optimizes the internal space of the control host through modular functional units and a stacked structure design, avoiding mutual interference between devices. Furthermore, the inclusion of an anti-electric shock device 6021 reduces the risk of electric shock to users in case of accidental connection.

[0080] The above description is merely a preferred embodiment of this application. Those skilled in the art should understand that the scope of disclosure in this application is not limited to technical solutions formed by specific combinations of the above-described technical features, but should also cover other technical solutions formed by arbitrary combinations of the above-described technical features or their equivalents without departing from the above-described concept. For example, technical solutions formed by substituting the above features with (but not limited to) technical features with similar functions disclosed in this application.

Claims

1. A control host for cryogenic plasma therapy, characterized in that, include: The housing has at least two mounting chambers therein, which are separated by a support plate; A control unit, an adjustment unit, and a high-voltage power supply are provided inside the housing. An input terminal and an output terminal are provided on the side wall of the housing. The control unit, the adjustment unit, and the high-voltage power supply are located in different mounting chambers. The input terminal is used for power and gas input, the output terminal is used for outputting working voltage and working gas, and the adjustment unit is used for adjusting the voltage of the working voltage and the flow rate of the working gas.

2. The control host for low-temperature plasma therapy according to claim 1, characterized in that, The input terminal includes a working gas input port and a power input port, and the adjustment unit includes a first adjustment module and a second adjustment module; The first adjustment module is disposed between the working gas input port and the output port, and the first adjustment module is used to control the flow rate of the working gas; The power input port is connected to the second adjustment module and the control unit respectively. The control unit is connected to the high-voltage power supply control. The second adjustment module is used to control the voltage magnitude of the operating voltage output by the high-voltage power supply.

3. A control host for low-temperature plasma therapy according to claim 2, characterized in that, The first adjustment module includes a first control knob, a first controller, a control switch, and a display screen; The first controller, control switch, and display screen are installed on the pipeline connecting the working gas input port and output port. The first control knob is connected to the first controller and extends out of the housing. The control switch and display screen are connected to the control unit. The control switch is used to control the on / off state of the working gas input, the first control knob is used to control the first controller to adjust the flow rate of the working gas, and the display screen is used to display the flow rate of the working gas.

4. A control host for cryogenic plasma therapy according to claim 3, characterized in that, The second adjustment module includes a second control knob and a second controller; The second control knob is connected to the second controller, the second controller is connected to the adjustment unit, the power input port is connected to the second controller, and the second control knob is used to control the second controller so that the control unit controls the voltage magnitude of the operating voltage output by the high voltage power supply.

5. A control host for cryogenic plasma therapy according to claim 4, characterized in that, The control unit includes a central control module and an execution control module, and the central control module is controllably connected to the execution control module. The central control module is connected to the first controller, and the execution control module is connected to the control switch.

6. A control host for cryogenic plasma therapy according to claim 5, characterized in that, A human-machine interface is provided on the side wall of the housing. The human-machine interface is connected to the central control module and is used for setting the working mode and working parameters.

7. A control host for cryogenic plasma therapy according to claim 5, characterized in that, A power supply unit is also provided inside the housing, and the power supply unit is connected to the power input port; The power supply unit is connected to the central control module, the execution control module and the display screen respectively, and the power supply unit is used to supply power at a specific voltage and power.

8. A control host for cryogenic plasma therapy according to claim 1, characterized in that, A power switch is provided on the side wall of the housing. The power switch is connected to the control unit and is used to control the start and stop of the control host.

9. A control host for cryogenic plasma therapy according to claim 1, characterized in that, The output terminal includes a working gas output port and a working voltage output port. An anti-electric shock device is provided at the working voltage output port to isolate current when it is accidentally connected to the working voltage output port.

10. A low-temperature plasma therapy device, characterized in that, Includes a control unit and treatment handpiece for cryogenic plasma therapy as described in any one of claims 1-9; The treatment handle is connected to the output pipeline, the control host is used to provide the treatment handle with working voltage and working gas, and the treatment handle is used to generate plasma and output it.