A polishing sink can be evenly heated plasma polishing machine

Abstract

This invention provides a plasma polishing machine with a polishing tank that can be uniformly heated. It includes a housing and an integrally formed polishing tank disposed within the housing. The inner wall of the polishing tank has a first fixing hole and a second fixing hole spaced apart. A heating element for heating the liquid within the polishing tank is also connected inside the tank. One end of the heating element is inserted into the first fixing hole, and the other end is inserted into the second fixing hole, so that the heating element body is suspended within the polishing tank. In this invention, the suspended heating element within the polishing tank can uniformly heat the liquid. Furthermore, the negative electrode plate is circumferentially mounted on the inner wall of the polishing tank, allowing for uniform current distribution and ensuring that the electric field formed by the anode rod and the negative electrode plate uniformly covers the workpiece to be polished, enabling thorough polishing and deburring of the workpiece and improving the polishing efficiency of the machine.

Description

Technical Field

[0001] This utility model belongs to the technical field of plasma polishing machines, and in particular relates to a plasma polishing machine with a polishing water tank that can be heated evenly. Background Technology

[0002] The working principle of a plasma polishing machine is to adsorb metal ions that are detached from the workpiece by an electric current in the polishing liquid onto the surface of the workpiece. This results in a high current impact on the protrusions of the workpiece, which removes ions quickly. As the current flows, the unevenness changes continuously, gradually smoothing out the rough surface of the workpiece, thereby achieving a polishing effect that increases the gloss of the workpiece surface.

[0003] Currently, the heating method for the polishing water tank in plasma polishing machines is to install a heating tube on the inside of the polishing water tank and heat the water tank through the heating tube. This heating method results in uneven heating of the liquid in the polishing water tank, which affects the polishing effect.

[0004] Therefore, there is a need for a plasma polishing machine with a polishing tank that can be heated evenly. Utility Model Content

[0005] The main purpose of this invention is to provide a plasma polishing machine with a polishing tank that can be heated evenly, addressing the shortcomings of existing technologies.

[0006] To achieve the above objectives, the present invention provides the following technical solution:

[0007] A plasma polishing machine with a polishing water tank that can be uniformly heated includes a housing and an integrally formed polishing water tank disposed within the housing. The inner wall of the polishing water tank has a first fixing hole and a second fixing hole that are spaced apart. A heating tube for heating the liquid in the polishing water tank is also connected inside the polishing water tank. One end of the heating tube is inserted into the first fixing hole and the other end of the heating tube is inserted into the second fixing hole so that the heating tube body is suspended in the polishing water tank.

[0008] Preferably, the heating element is shaped as a U-shaped tube, a spiral tube, or a butterfly tube.

[0009] Preferably, a fixed frame is fixedly installed inside the housing, located on the upper surface of the polishing water tank. A plurality of slots are vertically spaced on one side of the fixed frame. A lifting assembly consisting of a plurality of lifting mechanisms is fixedly installed on the outer wall of one side of the fixed frame. The lifting mechanisms are corresponding to the slots. Each lifting mechanism includes a fixed frame fixedly connected to one side of the fixed frame. A guide rail is fixedly installed on the fixed frame along the height direction. A slide rail seat is slidably connected to the guide rail. The slide rail seat is fixedly connected to an insulating block. A driving component is also installed on the fixed frame to drive the insulating block to move up and down along the guide rail following the slide rail seat. A fixed groove communicating with the slots on one side of the fixed frame is opened on the insulating block. The fixed groove is connected to a clamping assembly that can extend into the polishing water tank through the slot. The clamping assembly can slide up and down along the guide rail together with the insulating block and the slide rail seat.

[0010] Preferably, the drive assembly includes a drive motor and a lead screw, one end of the lead screw is connected to the output shaft of the drive motor, and the other end of the lead screw passes through the insulating block and is connected to the fixing frame, and the lead screw is rotatably connected to the insulating block.

[0011] Preferably, microswitches are installed at the upper and lower ends of the fixing frame.

[0012] Preferably, the fixing frame is made of acid and alkali resistant plastic board.

[0013] Preferably, the clamp assembly includes an anode rod connected to the fixing groove, the anode rod being connected to a bracket for fixing the anode rod, and a plurality of circumferentially distributed hooks being fixedly connected to the bottom of the bracket, the hooks being able to extend into the polishing water tank, and a negative electrode plate connected thereto being installed along the inner wall of the polishing water tank.

[0014] Preferably, there are at least three lifting mechanisms, the number of clamping assemblies matches the number of lifting mechanisms, and the hooks on the clamping assemblies are evenly distributed inside the polishing water tank.

[0015] Compared with the prior art, the present invention will have at least the following beneficial effects:

[0016] One end of the heating element is inserted into the first fixing hole and the other end is inserted into the second fixing hole so that the heating element body is suspended in the polishing water tank, which can achieve uniform heating of the liquid in the polishing water tank.

[0017] The negative electrode plate is installed circumferentially around the inner wall of the polishing water tank, which allows the current to be distributed evenly and the electric field to be uniformly covered on the workpiece to be polished. This allows the workpiece to be fully polished and deburred, improving the polishing efficiency. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are merely exemplary embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort, wherein:

[0019] Figure 1 This is a schematic diagram of the structure of the plasma polishing machine with a polishing water tank that can be heated evenly according to the present invention.

[0020] Figure 2 This is a partial structural diagram of the internal structure of the plasma polishing machine with a polishing water tank that can be heated evenly according to the present invention.

[0021] Figure 3 for Figure 2 Cross-sectional view;

[0022] Figure 4 for Figure 2 Top sectional view;

[0023] Figure 5 for Figure 2 Another perspective illustration;

[0024] Figure 6 for Figure 2 Rear view of part of the structure;

[0025] Figure 7 for Figure 2 Side sectional view.

[0026] The reference numerals in the figures include:

[0027] 1. Housing; 2. Polishing water tank; 3. First fixing hole; 4. Second fixing hole; 5. Heating element; 6. Fixing frame; 7. Slot; 8. Fixing bracket; 9. Guide rail; 10. Slide rail seat; 11. Insulating block; 12. Drive motor; 13. Lead screw; 14. Micro switch; 15. Fixing slot; 16. Anode rod; 17. Bracket; 18. Hook; 19. Negative electrode plate; 20. Polishing power supply; 21. Observation door; 22. Magnetic switch; 23. Casters. Detailed Implementation

[0028] The technical solutions in the embodiments of this utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are merely exemplary embodiments of this utility model, and not the only embodiments.

[0029] like Figures 1 to 7As shown, a plasma polishing machine with a polishing water tank that can be heated evenly includes a housing 1 and an integrally formed polishing water tank 2 disposed in the housing 1. The integrally formed polishing water tank 2 does not require a welding process, which can save welding costs and avoid the possibility of water leakage caused by welding.

[0030] like Figure 3 , Figure 4 As shown, the inner wall of the polishing water tank 2 is provided with a first fixing hole 3 and a second fixing hole 4 spaced apart. A heating tube 5 for heating the liquid in the polishing water tank 2 is also connected inside the polishing water tank 2. One end of the heating tube 5 is inserted into the first fixing hole 3 and the other end of the heating tube 5 is inserted into the second fixing hole 4 so that the body of the heating tube 5 is suspended in the polishing water tank 2. In the prior art, by installing a heating tube or heating tube 5 on the inner wall of the polishing water tank 2 to heat the liquid inside, the liquid in the polishing water tank 2 near the heating tube or heating tube 5 will be locally heated, and the liquid in the entire polishing water tank 2 cannot be heated evenly, which will affect the polishing operation of the workpiece to be polished. In this embodiment, the two ends of the heating tube 5 are respectively inserted into the first fixing hole 3 and the second fixing hole 4 at the corresponding ends. In this way, the body of the heating tube 5 can be suspended and hung inside the polishing water tank 2 so that the liquid in the polishing water tank 2 can be heated evenly.

[0031] Furthermore, the heating tube 5 is shaped as a U-tube, a spiral tube, or a butterfly tube. The U-tube structure can be flexibly installed inside the polishing water tank 2, and the heat can be evenly distributed inside the U-tube to avoid local overheating. The spiral tube structure can increase the surface area and improve the heat exchange rate, which is beneficial to the heating of the liquid in the polishing water tank 2. The butterfly tube structure can increase the heat dissipation area, which is beneficial to the even heating of the liquid in the polishing water tank 2.

[0032] Furthermore, such as Figures 2 to 7As shown, a fixed frame 6 is fixedly installed inside the housing 1 on the upper surface of the polishing water tank 2. Several slots 7 are vertically spaced on one side of the fixed frame 6. A lifting assembly consisting of several lifting mechanisms is fixedly installed on the outer wall of one side of the fixed frame 6. The lifting mechanisms are arranged corresponding to the slots 7. Each lifting mechanism includes a fixed frame 8 fixedly connected to one side of the fixed frame 6. A guide rail 9 is fixedly installed on the fixed frame 8 along the height direction. A slide rail seat 10 is slidably connected to the guide rail 9. The slide rail seat 10 is fixedly connected to an insulating block 11. The insulating block 11 is used to isolate the electrode from other components inside the housing 1, preventing short circuits and thus ensuring the plasma polishing process. For safe operation of the machine, the fixed frame 8 is also equipped with a drive assembly that drives the insulating block 11 to move up and down along the guide rail 9 following the slide rail seat 10. The insulating block 11 has a fixed groove 15 that communicates with the slot 7 on one side of the fixed frame 6. The fixed groove 15 is connected to a clamp assembly that can extend into the polishing water tank 2 through the slot 7. The clamp assembly is used to place the workpiece to be polished. Under the drive of the drive assembly, the clamp assembly can slide up and down along the guide rail 9 together with the insulating block 11 along the slide rail seat 10. In this way, the relative height of the clamp assembly extending into the polishing water tank 2 can be adjusted according to the change of the liquid level in the polishing water tank 2.

[0033] The drive assembly includes a drive motor 12 and a lead screw 13. One end of the lead screw 13 is connected to the output shaft of the drive motor 12, and the other end of the lead screw 13 passes through the insulating block 11 and is connected to the fixing frame 8. The lead screw 13 and the insulating block 11 are rotatably connected. The drive motor 12 can be a geared motor or a stepper motor; considering cost, a geared motor is preferred. When the drive motor 12 is started, it drives the lead screw 13 to rotate. The rotation of the lead screw 13 causes the insulating block 11, which is rotatably connected to it, to move up and down along the guide rail 9 with the slide rail seat 10. During this process, the user can control the height of the insulating block 11 moving up and down along the guide rail 9 according to the height of the clamp assembly extending into the polishing water tank 2.

[0034] Furthermore, microswitches 14 are installed at the upper and lower ends of the fixing frame 8, respectively. Specifically, the microswitches 14 are used to control the movement of the insulating block 11 as it rises or falls along the lead screw 13. More specifically, when the insulating block 11 rises along the lead screw 13 and touches the microswitches 14 at the upper end of the fixing frame 8, the drive motor 12 stops running, flips the drive motor 12, and changes the rotation direction of the lead screw 13. At this time, the insulating block 11 falls along the lead screw 13 and drives the clamping assembly to fall, thereby moving the workpiece downward in the polishing water tank 2. When the insulating block 11 falls along the lead screw 13 and touches the microswitches 14 at the lower end of the fixing frame 8, the drive motor 12 stops running again and flips the drive motor 12 again, changing the rotation direction of the lead screw 13 again. At this time, the insulating block 11 rises along the lead screw 13 and drives the clamping assembly to rise, thereby moving the workpiece upward in the polishing water tank 2.

[0035] The fixed frame 6 is made of acid and alkali resistant plastic board. Using acid and alkali resistant plastic board can make it waterproof and protect the shell 1. In the actual installation of the plastic board, structural adhesive is needed to seal the splicing gap between the splicing fixed frame 6 and the fixed bracket 8 on the same side as the fixed frame 6.

[0036] In this embodiment, the plasma polishing machine utilizes the combined action of the anode and cathode (i.e., negative electrode plate 19) to form an electric field, driving plasma generation and movement. The generated plasma polishes and deburrs the surface of the workpiece. Therefore, the fixture assembly includes an anode rod 16 connected to the fixing groove 15. The anode rod 16 is connected to a bracket 17 for fixing the anode rod 16. Several circumferentially distributed hooks 18 are fixedly connected to the bottom of the bracket 17. The workpiece to be polished is hung on the hooks 18, which can extend into the polishing water tank 2. A negative electrode plate 19 connected to the negative electrode plate 19 is installed along the inner wall of the polishing water tank 2. During the generation process, sufficient current needs to be applied between the anode rod 16 and the cathode electrode of the polishing machine (i.e., the negative electrode plate 19) to ionize the liquid in the polishing water tank 2, thereby forming a plasma layer. In order to ensure that the current between the negative electrode plate 19 and the anode rod 16 can be evenly distributed in the polishing water tank 2, the negative electrode plate 19 is installed circumferentially around the inner wall of the polishing water tank 2. In this way, the current can be evenly distributed, and the electric field formed by the anode rod 16 and the negative electrode plate 19 can be evenly covered on the workpiece to be polished on the fixture assembly, so that the workpiece can be fully polished and deburred, thereby improving the polishing efficiency.

[0037] There are at least three lifting mechanisms, and the number of clamping assemblies matches the number of lifting mechanisms. The hooks 18 on the clamping assemblies are evenly distributed inside the polishing water tank 2. This setup allows for the polishing of at least three workpieces at a time, thereby improving the polishing rate and efficiency of the plasma polisher and increasing the efficiency of polishing and deburring the workpieces.

[0038] In the plasma polishing machine of this embodiment, a polishing power supply 20 is also provided, which is integrally set with the housing 1. The polishing power supply 20 is used to control the start and stop of the plasma polishing machine. Since it falls within the scope of the prior art, it will not be described in detail here.

[0039] like Figure 1 , Figure 7 As shown, in order to facilitate observation of the polishing inside the housing 1, an observation door 21 is provided on the fixed frame 6 and is integrated with it. The observation door 21 is made of PC transparent board, and a magnetic switch 22 is fixedly installed on the inner side of the observation door 21. When the workpiece polishing operation is performed, the observation door 21 is opened and the plasma polishing machine is automatically powered off to protect personal safety.

[0040] like Figure 1As shown, casters 23 are provided at the four corners of the bottom of the housing 1 to facilitate the movement of the plasma polisher.

[0041] The above description is merely a preferred embodiment of this utility model. The protection scope of this utility model is not limited to the above embodiments. All technical solutions falling within the scope of this utility model's concept are protected. It should be noted that for those skilled in the art, any improvements and modifications made without departing from the principle of this utility model should also be considered within the protection scope of this utility model.

Claims

1. A plasma polishing machine with a polishing water tank capable of uniform heating, comprising a housing (1) and an integrally formed polishing water tank (2) disposed within the housing (1), characterized in that, The inner wall of the polishing water tank (2) is provided with a first fixing hole (3) and a second fixing hole (4) spaced apart. The polishing water tank (2) is also connected to a heating tube (5) for heating the liquid in the polishing water tank (2). One end of the heating tube (5) is inserted into the first fixing hole (3) and the other end of the heating tube (5) is inserted into the second fixing hole (4) so ​​that the body of the heating tube (5) is suspended in the polishing water tank (2).

2. The plasma polishing machine with a uniformly heated polishing tank according to claim 1, characterized in that, The heating tube (5) is shaped like a U-tube, a spiral tube, or a butterfly tube.

3. The plasma polishing machine with a uniformly heated polishing tank according to claim 1, characterized in that, A fixed frame (6) located on the upper surface of the polishing water tank (2) is fixedly installed inside the housing (1). Several slots (7) are vertically spaced on one side of the fixed frame (6). A lifting assembly consisting of several lifting mechanisms is fixedly installed on the outer wall of one side of the fixed frame (6). The lifting mechanisms are correspondingly arranged with respect to the slots (7). Each lifting mechanism includes a fixed bracket (8) fixedly connected to one side of the fixed frame (6). A guide rail (9) is fixedly installed on the fixed bracket (8) along the height direction. A slide rail seat (10) is slidably connected to the guide rail (9). 10) Fixedly connected to the insulating block (11), the fixed frame (8) is also equipped with a driving component that drives the insulating block (11) to move up and down along the guide rail (9) following the slide rail seat (10). The insulating block (11) is provided with a fixing groove (15) that communicates with the slot (7) on one side of the fixed frame (6). The fixing groove (15) is connected to a clamping assembly that can extend into the polishing water tank (2) through the slot (7). The clamping assembly can slide up and down along the guide rail (9) together with the insulating block (11) and the slide rail seat (10).

4. The plasma polishing machine with a uniformly heated polishing tank according to claim 3, characterized in that, The drive assembly includes a drive motor (12) and a lead screw (13). One end of the lead screw (13) is connected to the output shaft of the drive motor (12), and the other end of the lead screw (13) passes through the insulating block (11) and is connected to the fixing frame (8). The lead screw (13) is rotatably connected to the insulating block (11).

5. The plasma polishing machine with a uniformly heated polishing tank according to claim 4, characterized in that, Microswitches (14) are installed at the upper and lower ends of the fixing frame (8).

6. The plasma polishing machine with a uniformly heated polishing tank according to claim 3, characterized in that, The fixing frame (6) is made of acid and alkali resistant plastic board.

7. The plasma polishing machine with a uniformly heated polishing tank according to claim 4, characterized in that, The clamp assembly includes an anode rod (16) connected to the fixing groove (15), the anode rod (16) being connected to a bracket (17) for fixing the anode rod (16), and a plurality of circumferentially distributed hooks (18) being fixedly connected to the bottom of the bracket (17). The hooks (18) can extend into the polishing water tank (2), and a negative electrode plate (19) connected thereto is installed along the inner wall of the polishing water tank (2).

8. The plasma polishing machine with a uniformly heated polishing tank according to claim 7, characterized in that, The number of lifting mechanisms is at least three, the number of clamping assemblies matches the number of lifting mechanisms, and the hooks (18) on the clamping assemblies are evenly distributed inside the polishing water tank (2).

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