A vacuum breaking assembly for use in a PVD apparatus and a PVD apparatus

Abstract

The application provides a breaking vacuum assembly applied to a PVD device and the PVD device, the breaking vacuum assembly applied to the PVD device comprising: a cover plate in communication with a breaking vacuum pipeline; a uniform air cover covering a front opening of the cover plate away from the breaking vacuum pipeline, the uniform air cover being provided with a plurality of uniformly arranged uniform air holes, and the uniform air cover and the cover plate surrounding a hollow uniform air cavity; a uniform air plate being located in the uniform air cavity, the uniform air plate being provided with a plurality of air guide grooves and a plurality of air guide holes, the air guide holes being located at the periphery of the air guide grooves, and the air guide grooves being in communication with the air guide holes; when the PVD device is broken, air flow enters the uniform air cavity from the breaking vacuum pipeline, is drained through the air guide grooves on the uniform air plate, and then flows out from each air guide hole to realize air flow dispersion, and the dispersed air flow enters a vacuum chamber of the PVD device uniformly through each uniform air hole on the uniform air cover. The scheme provided by the application can make the air flow during the breaking process enter the vacuum chamber uniformly, and the air flow cannot directly act on the surface of a silicon wafer, thereby reducing the risk of silicon wafer fragmentation, and further reducing the cost.

Description

Technical Field

[0001] This application belongs to the field of PVD equipment technology, and more specifically, relates to a void-breaking component and PVD equipment used in PVD equipment. Background Technology

[0002] In silicon wafer coating processes, after PVD (Physical Vapor Deposition) equipment has coated the silicon wafer in a vacuum chamber, air needs to be introduced to change the vacuum state to an atmospheric state. This transition process is commonly known in the industry as "air blasting." However, in currently common PVD equipment, because the airflow is directly connected to the vacuum chamber through a pipe, when the air blasting valve is opened, the airflow from the pipe outlet is directly injected. This leads to uneven airflow distribution and instability within the vacuum chamber, and the gas directly impacts the silicon wafer. At this point, the uneven airflow pressure acting on the silicon wafer surface easily causes the wafer to crack, increasing the risk of wafer breakage and leading to increased costs. Utility Model Content

[0003] The purpose of this application is to provide a cavitation breaking component for use in PVD equipment, so as to solve the technical problem of silicon wafer breakage caused by uneven airflow during cavitation in the prior art.

[0004] To achieve the above objectives, the technical solution adopted in this application is: to provide a vacuum breaking component for use in a PVD equipment, wherein the PVD equipment includes a vacuum chamber, and the vacuum breaking component for use in the PVD equipment includes:

[0005] Void pipe;

[0006] Cover plate, which is connected to the venting pipe;

[0007] A gas equalization hood covers the front opening of the cover plate away from the venting pipe. The gas equalization hood has multiple spaced-apart gas equalization holes. The gas equalization hood and the cover plate form a hollow gas equalization chamber; and...

[0008] A gas equalization plate is located in the gas equalization chamber. The gas equalization plate is provided with multiple air guide grooves and multiple air guide holes. The air guide holes are located around the air guide grooves, and the air guide grooves and air guide holes are connected.

[0009] In the process of breaking the vacuum in the PVD equipment, the airflow enters the gas equalization chamber through the breaking pipe, is guided by the gas guide groove on the gas equalization plate, and then flows out from each gas guide hole to achieve airflow dispersion. The dispersed airflow then enters the vacuum chamber evenly through each gas equalization hole on the gas equalization cover.

[0010] Optionally, the cover plate includes a cover plate body and a cover plate flange protruding forward from the cover plate body. The cover plate body is connected to the venting pipe, and the air distribution hood is fixedly connected to the cover plate flange to cover the front opening of the cover plate flange away from the cover plate body.

[0011] Optionally, the air distribution plate includes an air guiding plate and an air guiding side plate. The air guiding plate is opposite to the cover plate body, and the air guiding side plate extends backward from the outer edge of the air guiding plate. An air guiding groove is provided on the rear side of the air guiding plate facing the cover plate body, and an air guiding hole is provided on the air guiding side plate.

[0012] Optionally, the rear side of the air guide plate is provided with multiple forward-recessed air guide grooves, which are crisscrossed to form a grid, and each air guide groove is connected to an air guide hole at both ends.

[0013] Optionally, the air distribution plates are arranged in a centrally symmetrical or axisymmetric manner.

[0014] Optionally, the ratio of the area of ​​the air guiding plate to the area of ​​the air equalization hood is 0.2-0.8.

[0015] Optionally, the connection between the venting pipe and the cover plate body, the center of the gas equalization plate, and the center of the gas equalization hood are all located on the central axis of the gas equalization chamber.

[0016] Optionally, multiple air distribution holes are arranged in an array on the air distribution cover.

[0017] Optionally, the porosity of the gas equalization hood is 70%-90%.

[0018] This application also proposes a PVD device that includes the void-breaking component for use in PVD devices as described above.

[0019] The beneficial effects of the aeration assembly for PVD equipment provided in this application are as follows: Because a gas equalization hood is provided at the front opening of the cover plate, and the gas equalization hood has multiple spaced gas equalization holes, and a gas equalization plate is provided inside the gas equalization chamber, with interconnected gas guide grooves and gas guide holes, during aeration, the airflow flows into the gas equalization chamber through the aeration pipe. It is first guided by the gas guide grooves to the dispersed gas guide holes for diffusion. The diffused airflow is then further discharged from the gas equalization holes on the gas equalization hood. This allows the airflow to enter the vacuum chamber of the PVD equipment evenly without directly acting on the silicon wafer surface, thereby reducing the risk of silicon wafer breakage due to uneven airflow during aeration, effectively reducing the risk of fragmentation, and thus helping to reduce production costs. Attached Figure Description

[0020] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 This is a schematic diagram of the structure of the void-breaking component applied to a PVD equipment according to an embodiment of this application;

[0022] Figure 2 A rear view of a cavitation component applied to a PVD device, as provided in an embodiment of this application;

[0023] Figure 3 A top view of a cavitation-breaking component applied to a PVD equipment, as provided in an embodiment of this application;

[0024] Figure 4 An exploded view of a cavitation component used in a PVD device, as provided in an embodiment of this application;

[0025] Figure 5 This is a partial structural schematic diagram of the gas equalization hood provided in an embodiment of this application;

[0026] Figure 6 A rear view of the air distribution plate provided in an embodiment of this application;

[0027] Figure 7 This is a schematic diagram of the structure of the air distribution plate provided in an embodiment of this application.

[0028] Explanation of icon numbers: Detailed Implementation

[0029] To make the technical problems, technical solutions, and beneficial effects to be solved by this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and are not intended to limit the scope of this application.

[0030] It should be noted that when a component is referred to as being "fixed to" or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.

[0031] It should also be noted that the directional terms such as left, right, up, and down in the embodiments of this application are only relative concepts or are based on the normal use state of the product, and should not be considered as restrictive.

[0032] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0033] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0034] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0035] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain this application, and should not be construed as limiting this application.

[0036] This application provides a void-breaking component for use in PVD equipment.

[0037] Please see Figures 1 to 7In one embodiment, the aeration assembly used in a PVD device includes an aeration pipe 100, a cover plate 200, a gas equalization hood 300, and a gas equalization plate 400. Specifically, the cover plate 200 is connected to the aeration pipe 100. The gas equalization hood 300 covers the front opening of the cover plate 200 away from the aeration pipe 100, and the gas equalization hood 300 is provided with a plurality of spaced-apart gas equalization holes 310. The gas equalization hood 300 and the cover plate 200 form a hollow gas equalization cavity 500. The gas equalization plate 400 is located in the gas equalization cavity 500, and the gas equalization plate 400 is provided with a plurality of air guide grooves 410 and a plurality of air guide holes 420. The air guide holes 420 are located around the air guide grooves 410, and the air guide grooves 410 and the air guide holes 420 are connected. When the PVD equipment is ventilated, the airflow enters the gas equalization chamber 500 from the ventilation pipe 100, is guided by the gas guide groove 410 on the gas equalization plate 400, and then flows out from each gas guide hole 420 to achieve airflow dispersion. The dispersed airflow then enters the vacuum chamber evenly after passing through each gas equalization hole 310 on the gas equalization cover 300.

[0038] Based on this structural design, in this embodiment, a gas equalization hood 300 is provided at the front opening of the cover plate 200, and the gas equalization hood 300 is provided with multiple spaced gas equalization holes 310. At the same time, a gas equalization plate 400 is provided in the gas equalization chamber 500, and the gas equalization plate 400 is provided with interconnected gas guide grooves 410 and gas guide holes 420. In this way, when the air is broken, the airflow flows into the gas equalization chamber 500 through the breaking pipe 100, and is first guided by the gas guide grooves 410 to flow to the various dispersed gas guide holes 420 to achieve diffusion. The diffused airflow is then discharged from the various gas equalization holes 310 on the gas equalization hood 300, so that the airflow can enter the vacuum chamber of the PVD equipment evenly without directly acting on the silicon wafer surface. This reduces the breakage of the silicon wafer caused by uneven airflow during the breaking process, effectively reduces the risk of fragmentation, and thus helps to reduce production costs.

[0039] It should be noted that during the cavitation process in the PVD equipment, the gas flow rate can be adjusted by the cavitation valve. This gas filling method, which adjusts the airflow by the valve and works in conjunction with the uniform gas distribution of the cavitation component used in the PVD equipment, can better prevent high-speed airflow from impacting the silicon wafer surface, further reducing the risk of fragmentation and production costs.

[0040] Please see Figures 1 to 4In this embodiment, the cover plate 200 includes a cover plate body 210 and a cover plate flange 220 protruding forward from the cover plate body 210. The cover plate body 210 is connected to the venting pipe 100, and the gas equalization hood 300 is fixedly connected to the cover plate flange 220 to cover the front opening of the cover plate flange 220 away from the cover plate body 210. Specifically, the cover plate flange 220 and the outer edge of the cover plate body 210 are at a certain distance, that is, the area occupied by the gas equalization chamber 500 is smaller than the area of ​​the cover plate body 210. In this embodiment, both the cover plate body 210 and the cover plate flange 220 are rectangular, and correspondingly, the space occupied by the gas equalization chamber 500 is also cuboid. Of course, in other embodiments, the cover plate body 210 and the cover plate flange 220 can also be other shapes, which can be set according to actual needs. The shapes of the cover plate body 210 and the cover plate flange 220 or the gas equalization chamber 500 can be the same or different. The air distribution hood 300 and the cover flange 220 can be fixed by means of, but not limited to, bonding or screwing. The connection between the two should be sealed as much as possible to prevent airflow leakage from gaps and affecting the airflow uniformity. Furthermore, the outer edge of the air distribution hood 300 is preferably flush with the side of the cover flange 220 to save material and maintain aesthetics. Typically, to achieve better airflow uniformity, the connection between the venting pipe 100 and the cover body 210 is located in the middle of the cover body 210, that is, the air inlet for the airflow into the air distribution chamber 500 is located in the middle of the cover body 210. Furthermore, as... Figure 2 and Figure 3 As shown, the cavitation duct 100 specifically includes a connecting section 110 and a parallel section 120. The connecting section 110 is perpendicularly connected to the cover plate body 210, while the parallel section 120 is set parallel to the cover plate body 210, which can save the space occupied by the duct.

[0041] Please see Figure 4 , Figure 5 and Figure 7 In this embodiment, the air distribution plate 400 includes an air guiding plate 430 and an air guiding side plate 440. The air guiding plate 430 is opposite to the cover plate body 210, and the air guiding side plate 440 extends rearward from the outer edge of the air guiding plate 430. An air guiding groove 410 is provided on the rear side of the air guiding plate 430 facing the cover plate body 210, and an air guiding hole 420 is provided on the air guiding side plate 440. After the airflow enters the air distribution chamber 500 from the air inlet, it is blocked by the front air guiding plate 430. Then, the air guiding groove 410 guides the originally concentrated airflow to disperse and flow out from the various air guiding holes 420 on the surrounding air guiding side plates 440, thereby achieving the function of guiding the airflow direction and dispersing the airflow.

[0042] Furthermore, the air distribution plate 400 is preferably arranged in a centrally symmetrical or axially symmetrical manner, so that the airflow guided by the air distribution plate 400 can be more evenly dispersed. Specifically, as shown... Figure 6 and Figure 7As shown, in this embodiment, the space occupied by the air-distributing cavity 500 is specifically a cuboid, and the air-distributing plate 400 is specifically a frame with a vertical cross-section of a square. Thus, the airflow ejected from the air inlet can be discharged through the air guide holes 420 on the four mutually symmetrical air guide side plates 440, thereby achieving a better and more uniform airflow dispersion effect. However, this design is not limited to this. In other embodiments, the specific shape of the air-distributing plate 400 can be configured according to actual needs, especially to match the shape of the space occupied by the air-distributing cavity 500.

[0043] Specifically, such as Figure 6 and Figure 7 As shown, in this embodiment, to obtain a better air guiding and uniform effect, the rear side of the air guiding plate 430 is provided with multiple forward-concave air guiding grooves 410. The multiple air guiding grooves 410 are crisscrossed to form a grid, and each air guiding groove 410 has an air guiding hole 420 connected to both ends. Of course, in other embodiments, the number, distribution, and shape of the interconnected air guiding grooves 410 can be set according to actual needs. Here, the grid formed by the crisscrossing of multiple air guiding grooves 410 is a square grid. Therefore, the spacing between the air guiding holes 420 on each air guiding side plate 440 is consistent and also consistent with the side length of the square grid. Specifically, the air guiding hole 420 is elongated, and its width is basically consistent with the width of the air guiding groove 410. Of course, in other embodiments, the shape, number, and arrangement of the air guiding holes 420 can also be set according to actual needs, especially the shape formed by multiple air guiding grooves 410. Here, no special limitation is made.

[0044] Furthermore, such as Figure 4 As shown, the connection between the air-breaking pipe 100 and the cover plate body 210, the center of the air-dispersing plate 400, and the center of the air-dispersing hood 300 are all located on the central axis of the air-dispersing chamber 500. This allows for better uniform dispersion of the airflow. Furthermore, in this embodiment, the ratio of the area of ​​the air-guiding plate 430 to the area of ​​the air-dispersing hood 300 is preferably 0.2-0.8. It is understandable that the volume and distribution of the air guide plate 430 in the air equalization chamber 500 can affect the air equalization effect. If the air guide plate 430 is too small, its guiding and initial dispersion effect on the airflow will not be good enough, which will affect the air equalization effect of the air equalization hood 300. If the air guide plate 430 is too large, the airflow will be directed more to the edge area of ​​the air equalization chamber 500, resulting in more air coming out of the air equalization holes 310 on the edge area of ​​the air equalization hood 300, while less air comes out in the central area, and its air equalization effect is not good enough. Only when the area of ​​the air guide plate 430 is within a suitable preferred range can a better air equalization effect be obtained.

[0045] Furthermore, such as Figure 1 , Figure 4 and Figure 5As shown, in this embodiment, multiple air-uniforming holes 310 are arranged in an array on the air-uniforming cover 300. This array arrangement ensures that the spacing between each air-uniforming hole 310 is consistent, allowing the gas in the air-uniforming cavity 500 to be discharged more evenly from the air-uniforming cover 300, which is beneficial for further improving the airflow uniformity. However, this design is not limited to this. The arrangement of the numerous air-uniforming holes 310 on the air-uniforming cover 300 is mainly determined by the distribution state of the airflow in the air-uniforming cavity 500 after passing through the air-uniforming plate 400. Furthermore, the central axis of each air-uniforming hole 310 can be parallel to the central axis of the air-uniforming cavity 500, or it can have a certain angle, which can be determined according to the airflow distribution state. In addition to its ventilation function, the air-uniforming holes 310 with a certain bias in their central axis also have a certain airflow guiding function. After precise design, the air-uniforming function of the air-uniforming cover 300 can be further enhanced. In addition, the porosity of the air-uniforming cover 300 is preferably 70%-90%. It is understandable that although the more numerous and denser the distribution of the air distribution holes 310 on the air distribution cover 300, the better the airflow uniformity can be, too many air distribution holes 310 can also affect the overall strength of the air distribution cover 300, making the air distribution cover 300 unable to withstand excessively high gas pressure, which may lead to deformation or even cracking and damage. Within the aforementioned preferred porosity range, a better gas uniformity effect can be obtained within the appropriate strength of the air distribution cover 300.

[0046] This application also proposes a PVD device, which includes the aforementioned void-breaking component applied to the PVD device. The specific structure of the void-breaking component applied to the PVD device is as described in the above embodiments. Since this PVD device adopts all the technical solutions of all the above embodiments, it also has all the beneficial effects brought about by the technical solutions of the above embodiments, which will not be described in detail here.

[0047] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A break vacuum assembly for use in a PVD apparatus, the PVD apparatus comprising a vacuum chamber, characterized in that, The air-breaking component used in PVD equipment includes: Void pipe; A cover plate, which is connected to the venting pipe; A gas equalization hood covers the front opening of the cover plate away from the venting pipe. The gas equalization hood has multiple spaced-apart gas equalization holes. The gas equalization hood and the cover plate form a hollow gas equalization cavity; and... An air distribution plate is located in the air distribution cavity. The air distribution plate is provided with multiple air guide grooves and multiple air guide holes. The air guide holes are located around the air guide grooves, and the air guide grooves are connected to the air guide holes. When the PVD equipment is vented, the airflow enters the gas equalization chamber through the venting pipe, is guided by the gas guide groove on the gas equalization plate, and then flows out from each of the gas guide holes to achieve airflow dispersion. The dispersed airflow then enters the vacuum chamber evenly through each of the gas equalization holes on the gas equalization cover.

2. The break vacuum assembly for use in a PVD apparatus as claimed in claim 1, characterized in that The cover plate includes a cover plate body and a cover plate flange protruding forward from the cover plate body. The cover plate body is connected to the venting pipe. The air distribution hood is fixedly connected to the cover plate flange to cover the front opening of the cover plate flange away from the cover plate body.

3. The break vacuum assembly for use in a PVD apparatus as claimed in claim 2, characterized in that The gas distribution plate includes a gas guiding plate and a gas guiding side plate. The gas guiding plate is opposite to the cover plate body. The gas guiding side plate extends backward from the outer edge of the gas guiding plate. The gas guiding groove is provided on the rear side of the gas guiding plate facing the cover plate body. The gas guiding hole is provided on the gas guiding side plate.

4. The break vacuum assembly for use in a PVD apparatus as claimed in claim 3, characterized in that The rear side of the air guide plate is provided with a plurality of forward-recessed air guide grooves, which are crisscrossed to form a grid, and each air guide groove is connected to an air guide hole at both ends.

5. The break vacuum assembly for use in a PVD apparatus as claimed in claim 3, characterized in that, The air distribution plates are arranged in a centrally symmetrical or axially symmetrical manner.

6. The break vacuum assembly for use in a PVD apparatus as claimed in claim 3, characterized in that, The ratio of the area of ​​the air guiding plate to the area of ​​the air equalization hood is 0.2-0.

8.

7. The break vacuum assembly for use in a PVD apparatus as claimed in claim 2, wherein, The connection between the venting pipe and the cover plate body, the center of the gas equalization plate, and the center of the gas equalization hood are all located on the central axis of the gas equalization chamber.

8. The break vacuum assembly for use in a PVD apparatus according to any one of claims 1 to 7, characterized in that The multiple air-distributing holes are arranged in an array on the air-distributing cover.

9. The break vacuum assembly for use in a PVD apparatus as claimed in claim 8, characterized in that, The porosity of the gas equalization hood is 70%-90%.

10. A PVD apparatus, characterized by Includes the air-breaking component applied to PVD equipment as described in any one of claims 1 to 9.

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