Deposition apparatus

Abstract

The utility model discloses a deposition device, including the reaction chamber, the reaction chamber has the reaction cavity in, the reaction chamber upper portion is provided with the feed port for the single atom from top to bottom to enter the reaction cavity, the reaction chamber upper still is provided with the gas inlet and the gas outlet for the gas to go in and out, be provided with the deposition chamber for the single atom and powder mix in the reaction cavity, the deposition chamber is provided with the stirring mechanism for making the single atom with powder can mix even, the utility model discloses setting stirring mechanism continuously turns over the powder in the deposition chamber, the contact surface of dynamic adjustment powder and single atom / cluster particle, effectively solved the powder easy to conglomeration in the prior art, the low problem of coating efficiency, quality stability difference caused by uneven contact, ensure that powder surface evenly coats single atom / cluster, promote material performance consistency, the structure detachable design has strengthened the operation convenience and environmental adaptability.

Description

Technical Field

[0001] This utility model relates to the field of atomic layer deposition technology, and in particular to a deposition apparatus. Background Technology

[0002] In the field of materials preparation, the uniform deposition of single-atom or cluster particles on powder surfaces is a key technology for improving material performance and is widely used in catalysis, energy storage, and other fields. Currently, the main techniques for achieving powder coating include chemical vapor deposition (CVD), atomic layer deposition (ALD), and physical vapor deposition (PVD). The core of these techniques lies in enabling single-atom / cluster particles to fully contact the powder and complete the deposition through a gaseous atmosphere or physical action.

[0003] However, existing technologies have many limitations in practical applications: on the one hand, the powder dispersion effect is poor, especially small-diameter powders are prone to agglomeration, resulting in uneven contact between single-atom / cluster particles and the powder surface, low coating efficiency and poor product quality stability; on the other hand, the structure of existing equipment is mostly integrated, making it difficult to conveniently load and unload samples in special environments such as oxygen-free and low-humidity environments, which limits the coating treatment of easily oxidized powders. Utility Model Content

[0004] To address the shortcomings of the existing technology, the technical problem to be solved by this utility model is to provide a deposition device that increases the contact between single atoms and powder through a stirring mechanism, so that the powder is uniformly coated, while the various components of the device are easy to disassemble and assemble, and samples are easy to load and unload.

[0005] To solve the above-mentioned technical problems, the present invention provides a deposition device, including a reaction chamber, wherein the reaction chamber has a reaction cavity, and the upper part of the reaction chamber is provided with a feed inlet for single atoms to enter the reaction cavity from top to bottom. The reaction chamber is also provided with an inlet and an outlet for gas to enter and exit. The reaction cavity is provided with a deposition chamber for mixing single atoms and powder, and the deposition chamber is provided with a stirring mechanism for mixing single atoms and powder evenly.

[0006] Furthermore, the deposition chamber is disposed within the reaction chamber at a position corresponding to the feed inlet, and the opening of the deposition chamber faces the feed inlet to receive single atoms entering from the feed inlet.

[0007] Furthermore, the stirring mechanism includes a stirring rod, blades, and a rotary drive assembly; one end of the stirring rod extends into the deposition chamber, and the other end of the stirring rod extends out of the reaction chamber; the blades are disposed at the end of the stirring rod that extends into the deposition chamber; the rotary drive assembly is drively connected to the end of the stirring rod that extends out of the reaction chamber.

[0008] Furthermore, at least one first limiting surface is provided at one end of the stirring rod that extends into the sedimentation chamber, and a sleeve is fitted at one end of the stirring rod that extends into the sedimentation chamber, with the blade disposed on the outer periphery of the sleeve; a second limiting surface is formed on the sleeve that matches the at least one first limiting surface, and the first limiting surface and the second limiting surface cooperate with each other to restrict the sleeve from rotating circumferentially relative to the stirring rod.

[0009] Furthermore, a first sealing ring is provided around the stirring rod at the bottom of the reaction chamber corresponding to the position where the stirring rod passes through, and a sealing ring pressure ring is also provided at the bottom of the reaction chamber corresponding to the position where the stirring rod passes through to press the first sealing ring tightly against the bottom of the reaction chamber.

[0010] Furthermore, the reaction chamber is provided with a through hole through which the stirring rod passes, and the reaction chamber is also provided with a sealing ring groove around the outer periphery of the through hole. The first sealing ring is disposed in the sealing ring groove and the inner diameter of the first sealing ring matches the outer diameter of the stirring rod to surround the outer periphery of the stirring rod. The sealing ring pressure ring is disposed on the reaction chamber at a position corresponding to the sealing ring groove to press the first sealing ring against the bottom wall of the sealing ring groove.

[0011] Furthermore, the reaction chamber includes a chamber body with an opening at the top and an end cap covering the opening at the top of the chamber body; an assembly ring for sealing the end cap is provided at the upper end of the chamber body, the radial dimension of the assembly ring is greater than the radial dimension of the chamber body and protrudes out of the outer side of the chamber body, the wall thickness of the assembly ring is greater than the wall thickness of the chamber body, the end cap is provided on the upper end of the assembly ring, and a second sealing ring is provided between the end cap and the assembly ring.

[0012] Furthermore, the chamber has a split bottom wall and a side wall. The bottom wall has a first groove for inserting the side wall therein, and the bottom wall of the first groove also has a second groove for inserting the deposition chamber therein. The deposition chamber is fixed in the second groove by a fixing bolt.

[0013] Furthermore, the air inlet is located at the lower part of the reaction chamber to introduce protective gas into the reaction chamber from bottom to top, and the air outlet is located at the upper part of the reaction chamber to allow gas to flow out. The air inlet and the air outlet are arranged opposite each other in the radial direction.

[0014] Furthermore, it also includes a bracket for mounting the rotary drive assembly and the reaction chamber, wherein the bracket is detachably connected to both the rotary drive assembly and the reaction chamber.

[0015] The deposition device of this invention has at least the following beneficial effects: Through structural optimization and functional synergistic design, it brings about several significant benefits. Regarding mixing uniformity, the stirring mechanism (including stirring rod, blades, and rotary drive assembly) continuously agitates the powder in the deposition chamber through blade rotation, dynamically adjusting the contact surface between the powder and single-atom / cluster particles. This effectively solves the problems of low coating efficiency and poor quality stability caused by powder agglomeration and uneven contact in existing technologies, ensuring uniform coating of single atoms / clusters on the powder surface and improving the consistency of material properties. The detachable structural design enhances operational convenience and environmental adaptability: the chamber body adopts a split bottom wall and side wall design, and the deposition chamber is assembled in a groove by fixing bolts, facilitating the separate removal of samples or cleaning; the detachable connection (such as bolts or couplings) between the support and the reaction chamber and rotary drive assembly supports the entire reaction chamber being moved into an oxygen-free, low-humidity environment such as a glove box for operation, overcoming the limitations of integrated equipment for handling easily oxidized powders. In terms of sealing performance, the bottom of the reaction chamber is sealed by a sealing ring groove, a first sealing ring, and a pressure ring to seal the passage of the stirring rod. A second sealing ring is installed between the end cap and the assembly ring. Combined with the radial relative air path design of lower air intake and upper air exhaust, a stable protective airflow is formed, completely expelling air and preventing single atoms from reacting with air, thus ensuring a stable reaction environment. In addition, the limiting fit between the stirring rod and the blades, and the stable transmission of the drive components, ensure reliable power transmission, reduce vibration interference, and further improve the operational stability and practicality of the equipment. Attached Figure Description

[0016] The accompanying drawings, which are included to provide a further understanding of this application and form part of this application, illustrate exemplary embodiments and are used to explain this application, but do not constitute an undue limitation of this application. In the drawings:

[0017] Figure 1 This is a schematic diagram of the structure of an embodiment of the deposition apparatus of this utility model. Figure 1 ;

[0018] Figure 2 This is a cross-sectional structural schematic diagram of an embodiment of the deposition apparatus of this utility model;

[0019] Figure 3 This is a schematic diagram of the structure of the chamber, sedimentation chamber, and sleeve in one embodiment of the deposition apparatus of this utility model;

[0020] Figure 4 This is a schematic diagram of the cavity bottom wall in one embodiment of the deposition apparatus of this utility model;

[0021] Figure 5 This is a partial cross-sectional schematic diagram of the end cap, assembly ring, and second sealing ring in one embodiment of the deposition device of this utility model;

[0022] Figure 6This is a partial cross-sectional view of the stirring mechanism in one embodiment of the deposition apparatus of this utility model;

[0023] Figure 7 This is a cross-sectional schematic diagram of the sleeve, blades, and coupling in one embodiment of the deposition apparatus of this utility model;

[0024] Figure 8 This is a schematic diagram of the structure of an embodiment of the deposition apparatus of this utility model. Figure 2 ;

[0025] Figure 9 This is a schematic diagram of the structure of the chamber, the first support, and the stirring rod in one embodiment of the deposition apparatus of this utility model.

[0026] The meanings of the labels in the attached diagram are as follows:

[0027] Reaction chamber 1, chamber body 11, bottom wall 111, side wall 112, air inlet 113, air outlet 114, first groove 115, second groove 116, sealing ring groove 117, third fixing hole 118, perforation 119, end cap 12, feed inlet 121, fourth fixing hole 122, reaction chamber 2, sedimentation chamber 3, connecting lug 31, first fixing hole 32, stirring mechanism 4, stirring rod 41, first limiting surface 411, fourth limiting surface 412, blade 42, sleeve 43, second limiting surface 431, insertion hole 432, rotary motor 44, coupling 45, third limiting surface 451, assembly ring 5, second sealing ring 51, first sealing ring 6, sealing ring pressure ring 7, bracket 8, first frame 81, second frame 82, second fixing hole 83, fifth fixing hole 84. Detailed Implementation

[0028] To make the objectives, technical solutions, and advantages of this application clearer, the technical solutions of this application will be clearly and completely described below in conjunction with specific embodiments and corresponding drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0029] The following disclosure provides various embodiments or examples of different features for implementing this utility model. Specific examples of components and arrangements will be described below to simplify the utility model. Of course, these are merely examples and are not intended to limit the utility model. For example, in the following description, forming a first component above or on a second component may include embodiments where the first and second components are in direct contact, or embodiments where other components may be formed between the first and second components such that the first and second components are not in direct contact. Additionally, reference numerals and / or characters may be repeated in various instances of the utility model. Such repetition is for simplification and clarity and does not in itself indicate a relationship between the various embodiments and / or configurations.

[0030] Furthermore, spatial relation terms such as "below," "under," "below," "above," and "above" may be used herein to readily describe the relationship between one element or component and another element (or component) or component (or component) as shown in the figure. In addition to the orientations shown in the figure, spatial relation terms will encompass various different orientations of the device in use or operation. The device may be positioned in other ways (rotated 90 degrees or in other orientations) and will be interpreted accordingly through the spatial relation descriptors used herein.

[0031] Furthermore, the technical parts described in this utility model and the appended claims are mainly the improved technical parts of this utility model, and do not limit the object protected by this utility model to only having these technical parts. Other known necessary components (structures and / or methods) and / or non-essential components of the protected object, other than the technical parts described in this utility model and the appended claims, are not included in this utility model and the appended claims because they do not involve the improvement scope of this utility model. However, this does not mean that the object protected by this utility model does not possess these known components.

[0032] The present invention will be further described below with reference to the accompanying drawings.

[0033] Please refer to Figure 1 and Figure 2 The deposition apparatus of this invention includes a reaction chamber 1, which has a reaction cavity 2 inside. The upper part of the reaction chamber 1 is provided with a feed inlet 121 for single atoms or clusters to enter the reaction cavity 2 from top to bottom. The reaction chamber 1 is also provided with an air inlet 113 and an air outlet 114 for gas to enter and exit. A deposition chamber 3 is provided inside the reaction cavity 2 for mixing single atoms and powder. The deposition chamber 3 is provided with a stirring mechanism 4 for ensuring uniform mixing of single atoms or clusters with the powder.

[0034] Please refer to Figure 3 and Figure 4The reaction chamber 1 has a chamber body 11 with an opening at the top and an end cap 12 covering the opening at the top of the chamber body 11. The chamber body 11 and the end cap 12 together form a sealed reaction chamber 2. To facilitate assembly of the reaction chamber 1, the chamber body 11 has a detachable structure. Specifically, the chamber body 11 includes a split bottom wall 111 and a side wall 112. The bottom wall 111 is configured as a boss, and the upper end of the bottom wall 111 is recessed downward to form a first groove 115 for the side wall 112 to be inserted. The outer diameter of the side wall 112 matches the inner diameter of the first groove 115 to achieve an interference fit. The detachability of the chamber body 11 facilitates the removal of reaction products from the chamber body 11 and also facilitates the cleaning or maintenance of the chamber body 11.

[0035] Please refer to Figure 5 To enhance the sealing at the opening of the chamber 11, the end cap 12 is fitted to the upper opening of the chamber 11 via an assembly ring 5. Specifically, the outer diameter of the assembly ring 5 is greater than the radial dimension of the chamber 11 and protrudes beyond the outer side of the chamber 11. The inner diameter of the assembly ring 5 matches the inner diameter of the chamber 11 for a sealing fit. The wall thickness of the assembly ring 5 is greater than the wall thickness of the chamber 11 to enhance sealing. The end cap 12 covers the upper end of the assembly ring 5, and a second sealing ring 51 is provided between the end cap 12 and the assembly ring 5. A fourth fixing hole 122 is provided between the end cap 12 and the assembly ring 5, and a fourth fixing bolt can be fitted into the fourth fixing hole 122 to connect the end cap 12 and the assembly ring 5.

[0036] The feed inlet 121 is located on the upper part of the end cap 12 and communicates with the reaction chamber 2. The feed inlet 121 is used to introduce single atoms or clusters. The gas inlet 113 and the gas outlet 114 are both located on the side wall 112 of the chamber and communicate with the reaction chamber 2. In order to facilitate the formation of a natural upward airflow in the reaction chamber 2, so that the gas entering through the gas inlet 113 can more thoroughly push the original gas in the reaction chamber 2 out through the gas outlet 114 from bottom to top, the gas inlet 113 is located on the lower part of the side wall 112 to allow the protective airflow to be introduced into the reaction chamber 2 from bottom to top, and the gas outlet 114 is located on the upper part of the side wall 112 to allow the gas to flow out. The gas inlet 113 and the gas outlet 114 are arranged radially opposite to each other to form a more natural airflow path.

[0037] The deposition chamber 3 is disposed within the reaction chamber 2 at a position corresponding to the feed inlet 121. For example, in this embodiment, the deposition chamber 3 is cylindrical with an open top and is mounted on the bottom wall 111 of the chamber. When the deposition chamber 3 is mounted on the bottom wall 111 of the chamber, the opening of the deposition chamber 3 faces the feed inlet 121 to receive single atoms or clusters entering at the feed inlet 121. The bottom of the deposition chamber 3 extends radially outward to form a connecting lug 31 for connecting with the bottom wall 111 of the chamber. The bottom wall of the first groove 115 is recessed downward to form a second groove 116 for inserting the deposition chamber 3. The second groove 116 matches the shape of the deposition chamber 3 for insertion. The connecting lug 31 and the bottom wall 111 of the chamber share a first fixing hole 32, in which a first fixing bolt (not shown in the figure) can be installed to fix the deposition chamber 3 and the reaction chamber 1 together. This detachable connection allows the user to easily remove the deposition chamber 3 from the reaction chamber 1, making it easier to remove the reaction products from the deposition chamber 3 and to clean or repair the deposition chamber 3.

[0038] Please refer to Figure 6 and Figure 7The stirring mechanism 4 includes a stirring rod 41, blades 42, and a rotary drive assembly. The stirring rod 41 passes through the bottom wall 111 of the chamber and the deposition chamber 3, with one end of the stirring rod 41 extending into the deposition chamber 3 and detachably connected to the blades 42. The other end of the stirring rod 41 extends out of the reaction chamber 1 and is connected to the rotary drive assembly. Specifically, the end of the stirring rod 41 extending into the deposition chamber 3 has at least one first limiting surface 411, and the blades 42 are mounted on the end of the stirring rod 41 via a sleeve 43. The sleeve 43 has a second limiting surface 431 that matches the at least one first limiting surface 411. The first limiting surface 411 and the second limiting surface 431 cooperate to restrict the circumferential rotation of the sleeve 43 relative to the stirring rod 41. For example, in this embodiment, the end of the stirring rod 41 that extends into the sedimentation chamber 3 is radially recessed to form a first limiting groove, and the limiting groove also extends axially through the upper end of the stirring rod 41. One radial side of the limiting groove is configured as the first limiting surface 411. The sleeve 43 has an insertion hole 432 for inserting the stirring rod 41, the inner diameter of the insertion hole 432 matching the outer diameter of the stirring rod 41 to achieve an interference fit. The inner peripheral wall of the insertion hole 432 protrudes radially inward to form a limiting block that matches the first limiting groove, and one radial side of the limiting block is configured as the second limiting surface 431. When the sleeve 43 is fitted onto the end of the stirring rod 41, the limiting block is inserted into the first limiting groove, and the first limiting surface 411 and the second limiting surface 431 are tightly fitted together for limiting. As will be understood by those skilled in the art, the first limiting surface 411 is not limited to the first limiting groove formed on the stirring rod 41, and the second limiting surface 431 is not limited to the limiting block formed inside the sleeve 43. The purpose of the first limiting surface 411 and the second limiting surface 431 is to cooperate with each other to restrict the circumferential rotation of the sleeve 43 relative to the stirring rod 41. Based on this, the first limiting surface 411 and the second limiting surface 431 can also be formed in other ways, for example: a limiting block protruding from the end of the stirring rod 41, or a limiting groove formed by a recess inside the sleeve 43. The shape and number of the limiting block and the limiting groove are not limited, as long as they can achieve the function of circumferential limiting. The blades 42 are mounted on the outer peripheral wall of the sleeve 43. Several blades 42 can be configured, and these blades 42 are arranged in a circular, evenly spaced pattern around the central axis of the sleeve 43. The blades 42 located at the same height are grouped together, and the blades 42 can be configured to be arranged in several groups along the outer periphery of the sleeve 43 in a vertical direction.

[0039] The rotary drive assembly includes a rotary motor 44 and a coupling 45. The rotary motor 44 is located below the reaction chamber 1, and its output shaft extends out of the reaction chamber 1. It should be understood that the rotary drive assembly is not limited to the rotary motor 44 and coupling 45 described in this embodiment. It can also be a cylinder-driven assembly with a reducer or gear set to achieve rotary motion, or a screw drive to achieve rotation of the rotating components. Those skilled in the art can also utilize other known technologies to achieve the rotary drive effect. The output shaft of the rotary motor 44 and the end of the stirring rod 41 extend from both ends of the coupling 45 into the coupling 45 to achieve mutual connection. The coupling 45 has a third limiting surface 451 inside. The other end of the stirring rod 41 opposite the assembly end of the sleeve 43 has a fourth limiting surface 412 that limits and cooperates with the third limiting surface 451. When the third limiting surface 451 and the fourth limiting surface 412 are in close contact, the output shaft and the stirring rod 41 are in coaxial contact. The third limiting surface 451 and the fourth limiting surface 412 cooperate to restrict the relative circumferential rotation of the output shaft and the stirring rod 41. The coupling 45 is assembled outside the output shaft and the stirring rod 41 to connect them. In this embodiment, the end of the output shaft is radially recessed with a second limiting groove, and the third limiting surface 451 is formed on one radial side of the second limiting groove. Similar to the first limiting surface 411 and the second limiting surface 431 mentioned above, the formation of the third limiting surface 451 and the fourth limiting surface 412 is not limited to the structure in this embodiment, as long as they can play a circumferential limiting role.

[0040] Please refer to Figure 8 and Figure 9 Furthermore, the bottom of the reaction chamber 1 has a through hole 119 for the stirring rod 41 to pass through. The bottom of the reaction chamber 1 also has a sealing ring groove 117 surrounding the through hole 119. A first sealing ring 6 is provided inside the sealing ring groove 117, surrounding the stirring rod 41. The inner diameter of the first sealing ring 6 matches the outer diameter of the stirring rod 41. A sealing ring pressure ring 7 is also provided at the bottom of the reaction chamber 1 corresponding to the sealing ring groove 117. A third fixing hole 118 is provided between the sealing ring pressure ring 7 and the reaction chamber 1. A third fixing bolt (not shown in the figure) is provided in the third fixing hole 118 to connect the sealing ring pressure ring 7 and the reaction chamber 1.

[0041] Based on the above, the deposition apparatus of this utility model further includes a bracket 8 for mounting the reaction chamber 1 and the rotary drive assembly. Specifically, the bracket 8 includes a first frame 81 for mounting the reaction chamber 1 and a second frame 82 for mounting the rotary motor 44. The first frame 81 is U-shaped with an open bottom. A second fixing hole 83 is formed between the bottom wall 111 of the cavity and the first frame 81 at the position on the outer periphery of the side wall 112 of the cavity. A second fixing bolt is provided in the second fixing hole 83. The second frame 82 is located on the side of the first frame 81 away from the reaction chamber 1. The second frame 82 is Z-shaped with the opening facing downwards. A fifth fixing hole 84 is formed between the two end corners of the first frame 81 and the upper end face of the second frame 82. A fifth fixing bolt can be installed in the fifth fixing hole 84 to connect the first frame 81 and the second frame 82. The two end corners of the second frame 82 can be fixedly connected to the worktable surface. It should be emphasized that the shapes of the first frame 81 and the second frame 82 are not limited to the forms described in this embodiment. As long as they can satisfy the installation of the reaction chamber 1 and the rotary drive assembly, and achieve the detachable connection of the first frame 81 and the second frame 82, they are acceptable.

[0042] One embodiment of the deposition apparatus of this invention operates as follows: In the initial state, all components of the apparatus are assembled together, and powder for coating single atoms / clusters is pre-placed in the deposition chamber 3. When a reaction is required, the single atom generator or cluster generator is first connected to the feed inlet 121, and then protective gas is introduced into the reaction chamber 2 through the gas inlet 113. As the protective gas is continuously introduced, the air originally in the reaction chamber 2 is discharged from the gas outlet 114. When the protective gas fills the reaction chamber 2, the gas inlet 113 is closed. Next, single atoms or clusters are fed into the reaction chamber 2 through the protective gas from the feed inlet 121, and the single atoms / clusters then fall into the deposition chamber 3. The motor is started, and the output shaft of the motor rotates, driving the stirring rod 41 to rotate. The stirring rod 41 then drives the blades 42 to rotate, continuously stirring and agitating the powder and single atoms / clusters. This constant rotation adjusts the contact surface between the powder and the single atoms / clusters, ensuring that the powder evenly coats the outside of the single atoms / clusters. The protective gas prevents the single atoms / clusters from reacting with the air.

[0043] After coating, the single atoms / clusters are all located within the deposition chamber 3. To remove these samples, firstly, separate the second support 8 from the first support 8, then remove the coupling 45 from the stirring rod 41 and the output shaft, and finally separate the reaction chamber 1 from the second support 8. Place the entire reaction chamber 1 into a glove box, then disassemble the various parts of the reaction chamber 1 to remove the samples from the deposition chamber 3.

[0044] Compared with existing technologies, the deposition device of this invention brings significant benefits in many aspects through structural optimization and functional synergistic design. Regarding mixing uniformity, the stirring mechanism (including stirring rod, blades, and rotary drive assembly) continuously agitates the powder in the deposition chamber through blade rotation, dynamically adjusting the contact surface between the powder and single-atom / cluster particles. This effectively solves the problems of low coating efficiency and poor quality stability caused by powder agglomeration and uneven contact in existing technologies, ensuring uniform coating of single atoms / clusters on the powder surface and improving the consistency of material properties. The detachable structural design enhances operational convenience and environmental adaptability: the chamber body adopts a split bottom wall and side wall design, and the deposition chamber is assembled in a groove by fixing bolts, facilitating the separate removal of samples or cleaning; the detachable connections (such as bolts and couplings) between the support and the reaction chamber and rotary drive assembly support the entire reaction chamber being moved into an oxygen-free, low-humidity environment such as a glove box for operation, overcoming the limitations of integrated equipment for handling easily oxidized powders. In terms of sealing performance, the bottom of the reaction chamber is sealed by a sealing ring groove, a first sealing ring, and a pressure ring to seal the passage of the stirring rod. A second sealing ring is installed between the end cap and the assembly ring. Combined with the radial relative air path design of lower air intake and upper air exhaust, a stable protective airflow is formed, completely expelling air and preventing single atoms from reacting with air, thus ensuring a stable reaction environment. In addition, the limiting fit between the stirring rod and the blades, and the stable transmission of the drive components, ensure reliable power transmission, reduce vibration interference, and further improve the operational stability and practicality of the equipment.

[0045] The above embodiments only illustrate preferred implementations of this utility model, and their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this utility model, and these all fall within the protection scope of this utility model. Therefore, the protection scope of this utility model patent should be determined by the appended claims.

Claims

1. A deposition apparatus comprising a reaction chamber, characterized by: The reaction chamber has a reaction cavity, and the upper part of the reaction chamber is provided with a feed port for single atoms to enter the reaction cavity from top to bottom. The reaction chamber is also provided with an air inlet and an air outlet for gas to enter and exit. The reaction cavity is provided with a deposition chamber for mixing single atoms and powder. The deposition chamber is provided with a stirring mechanism for mixing single atoms and powder evenly.

2. The deposition apparatus of claim 1, wherein: The deposition chamber is located within the reaction chamber at a position corresponding to the feed inlet, with the opening of the deposition chamber facing the feed inlet to receive single atoms entering from the feed inlet.

3. The deposition apparatus of claim 1, wherein: The stirring mechanism includes a stirring rod, blades, and a rotary drive assembly; one end of the stirring rod extends into the deposition chamber, and the other end extends out of the reaction chamber; the blades are disposed at the end of the stirring rod that extends into the deposition chamber; the rotary drive assembly is drively connected to the end of the stirring rod that extends out of the reaction chamber.

4. The deposition apparatus of claim 3, wherein: The stirring rod has at least one first limiting surface at one end that extends into the sedimentation chamber, and a sleeve is fitted onto the end of the stirring rod that extends into the sedimentation chamber. The blades are disposed on the outer periphery of the sleeve. A second limiting surface is formed on the sleeve that matches the at least one first limiting surface. The first limiting surface and the second limiting surface cooperate with each other to restrict the sleeve from rotating circumferentially relative to the stirring rod.

5. The deposition apparatus of claim 3, wherein: A first sealing ring is provided around the stirring rod at the bottom of the reaction chamber corresponding to the position where the stirring rod passes through, and a sealing ring pressure ring is also provided at the bottom of the reaction chamber corresponding to the position where the stirring rod passes through to press the first sealing ring tightly against the bottom of the reaction chamber.

6. The deposition apparatus of claim 5, wherein: The reaction chamber is provided with a through hole through which the stirring rod passes. The reaction chamber is also provided with a sealing ring groove around the outer periphery of the through hole. The first sealing ring is disposed in the sealing ring groove and the inner diameter of the first sealing ring matches the outer diameter of the stirring rod to surround the outer periphery of the stirring rod. The sealing ring pressure ring is disposed on the reaction chamber at a position corresponding to the sealing ring groove to press the first sealing ring against the bottom wall of the sealing ring groove.

7. The deposition apparatus as claimed in claim 2, characterized in that: The reaction chamber includes a chamber body with an opening at the top and an end cap covering the opening at the top of the chamber body; an assembly ring for sealing the end cap is provided at the upper end of the chamber body, the radial dimension of the assembly ring is greater than the radial dimension of the chamber body and protrudes out of the outer side of the chamber body, the wall thickness of the assembly ring is greater than the wall thickness of the chamber body, the end cap is provided on the upper end of the assembly ring, and a second sealing ring is provided between the end cap and the assembly ring.

8. The deposition apparatus as claimed in claim 7, characterized in that: The chamber has a split bottom wall and a side wall. The bottom wall has a first groove for inserting the side wall therein. The bottom wall of the first groove also has a second groove for inserting the deposition chamber therein. The deposition chamber is fixed in the second groove by a fixing bolt.

9. The deposition apparatus as claimed in claim 1, characterized in that: The air inlet is located at the lower part of the reaction chamber to introduce protective gas into the reaction chamber from bottom to top, and the air outlet is located at the upper part of the reaction chamber to allow gas to flow out. The air inlet and the air outlet are arranged opposite each other in the radial direction.

10. The deposition apparatus as claimed in claim 5, characterized in that: It also includes a bracket for mounting the rotary drive assembly and the reaction chamber, the bracket being detachably connected to both the rotary drive assembly and the reaction chamber.

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