A polishing device for piezoelectric ceramic production

Abstract

This utility model discloses a polishing device for piezoelectric ceramic production, relating to the technical field of piezoelectric ceramic production equipment. It includes a working platform and a base fixedly installed on the upper part of the working platform. A motor is fixedly installed on the left side of the upper part of the working platform. An adjustment mechanism is provided on the upper part of the base. A rotating column is rotatably installed inside the base, and the left end of the rotating column is fixedly installed at the output end of the motor. The output end of the motor drives the rotating column inside the base. A first guide groove on the outer side of the rotating column drives the guide column at the lower end of the guide plate to move inward. The guide plate cooperates with a second guide groove on the upper part of the base, allowing the guide plate to move inward via the guide column. A support plate at the upper part of the guide plate drives the polisher to move inward, polishing the piezoelectric ceramic body. Adjusting the polishing mechanism and the self-adaptive clamping assembly allows for the processing of piezoelectric ceramics of different sizes, meeting diverse production needs and improving the versatility of the equipment.

Description

Technical Field

[0001] This utility model relates to the technical field of piezoelectric ceramic production equipment, specifically a polishing device for piezoelectric ceramic production. Background Technology

[0002] With the continuous development of electronic technology, piezoelectric ceramics are increasingly widely used in many fields, and the requirements for their surface quality and precision are also getting higher and higher. In the production of piezoelectric ceramics, the polishing process is crucial. However, existing polishing equipment has some significant problems in use.

[0003] Traditional polishing devices are often simple in structure and have a single, inflexible adjustment method for adjusting the polishing size, making it difficult to meet the polishing needs of piezoelectric ceramics of different sizes. They can usually only handle piezoelectric ceramics of specific specifications, which limits the flexibility and efficiency of production. They require frequent equipment changes or complex adjustments, increasing production costs and time. Traditional polishing devices can only polish products within a specific size range and cannot flexibly adapt to piezoelectric ceramics of different sizes, which limits the flexibility and efficiency of production.

[0004] For example, a polishing device for processing piezoelectric ceramics, as disclosed in announcement number CN214418489U, has a worktable fixed to the upper part of the frame. An inclined discharge channel is fixed to one side of the worktable, and a first cylinder is fixed to the other side. A pad is rotatably connected to the worktable via a fixing pin. The upper part of the pad has an extension edge, on which a discharge port and a limiting through hole are opened. A mounting plate is located inside the pad, and the mounting plate has multiple fixing holes. In use, the polishing device described above has a rigid and inflexible method for adjusting the polishing size, making it difficult to accurately and quickly adapt to diverse production needs. However, it also has other problems. Regarding clamping methods, some devices cannot provide sufficient stability, causing the piezoelectric ceramic to move during polishing, affecting the polishing effect. Overly tight clamping may cause indentations or damage to the surface of the piezoelectric ceramic. Traditional devices may cause uneven force on the ceramic surface due to uneven clamping force or improper clamping method, thus affecting the polishing effect and even causing the ceramic to crack or be damaged. Uneven clamping force can easily cause displacement and deformation of the piezoelectric ceramic, affecting the processing accuracy. The adaptability of clamping devices is poor and cannot meet the clamping requirements of piezoelectric ceramics of different shapes and sizes. The clamping operation is complicated and the clamping speed is slow, affecting the production progress. Utility Model Content

[0005] The purpose of this utility model is to provide a polishing device for the production of piezoelectric ceramics, so as to solve the problems mentioned in the background art, such as the rigid and inflexible way of adjusting the polishing size, the difficulty in accurately and quickly adapting to diverse production needs, the simple structure of clamping piezoelectric ceramics, the uneven force that easily damages the product, and the lack of protection that leads to surface defects, affecting quality and performance.

[0006] To achieve the above objectives, this utility model provides the following technical solution: a polishing device for piezoelectric ceramic production, comprising a working platform and a base fixedly installed on the upper part of the working platform; a motor is fixedly installed on the left side of the upper part of the working platform, and the motor is located at the left end of the base; an adjustment mechanism is provided at the upper end of the base; a rotating column is rotatably installed inside the base, and the left end of the rotating column is fixedly installed at the output end of the motor; a support frame is fixedly installed on the rear side of the upper part of the working platform, and a pneumatic compressor is fixedly installed on the upper end of the support frame; a fixing plate is fixedly installed on the upper end of the support frame; a clamping mechanism is provided on the upper end of the support frame; a push plate is fixedly installed at the output end of the pneumatic compressor, and the push plate is located at the left end of the fixing plate.

[0007] Furthermore, the adjustment mechanism includes a first guide groove on the outer side of the right end of the rotating column, and two first guide grooves are evenly distributed with the base as the center of symmetry. A second guide groove is provided on the upper end of the base, and two second guide grooves are evenly distributed with the base as the center of symmetry.

[0008] Furthermore, a guide plate is provided on the upper right side of the base, and two guide plates are evenly distributed with the base as the center of symmetry. The guide plates cooperate with the second guide groove, and a guide column is fixedly installed at the lower end of the guide plate.

[0009] Furthermore, the guide post cooperates with the first guide groove, a support plate is fixedly installed on the upper end of the guide plate, and a polisher is fixedly installed on the upper end of the support plate.

[0010] Furthermore, the clamping mechanism includes a clamping plate rotatably mounted on the upper end of a fixed plate, and two clamping plates are evenly distributed with the fixed plate as the center of symmetry.

[0011] Furthermore, a driving plate is rotatably mounted on the upper end of the push plate, and two driving plates are evenly distributed around the fixed plate as the center of symmetry, with the upper end of the driving plate rotatably mounted in the middle of the clamping plate.

[0012] Furthermore, a protective pad is attached to the lower left side of the clamping plate, and a piezoelectric ceramic body is provided at the lower end of the protective pad, with the piezoelectric ceramic body corresponding to the polisher.

[0013] Compared with the prior art, the beneficial effects of this utility model are:

[0014] 1. The motor output drives the rotating column inside the base. The first guide groove on the outside of the rotating column drives the guide column at the lower end of the guide plate to move inward. The guide plate cooperates with the second guide groove opened at the upper end of the base, so that the guide plate moves inward through the guide column. The support plate at the upper end of the guide plate drives the polisher to move inward, so that the inward movement polishes the piezoelectric ceramic body. Adjusting the polishing mechanism and the self-adaptive clamping assembly can handle piezoelectric ceramics of different sizes, meet diverse production needs, and improve the versatility of the equipment.

[0015] Furthermore, it significantly enhances size adaptability, enabling it to handle piezoelectric ceramics of various sizes, meet diverse production needs, greatly improve production efficiency, and save time with quick and accurate adjustments, increasing output. It also ensures the effectiveness of the flat polishing machine when processing large-sized flat surfaces, with good dimensional accuracy consistency. The piezoelectric ceramic-based vibration polishing device performs excellently when processing small-scale materials, improving processing accuracy.

[0016] Furthermore, it effectively enhances batch processing capabilities, provides technical support for large-scale production, can flexibly handle small-sized workpieces, expands the application range of the device, and provides stable clamping and precise polishing adjustments, reducing displacement and errors during the polishing process, ensuring the flatness and smoothness of the piezoelectric ceramic surface, improving product quality, quickly adapting to products of different sizes, reducing equipment adjustment time, and increasing output per unit time.

[0017] 2. The pneumatic compressor at the top of the support frame is started. The pneumatic compressor drives the push plate to move to the right. The upper part of the push plate drives the drive plate to rotate and drive the clamping plate. The clamping plate rotates with the upper part of the fixed plate and moves downward, so that the left end of the clamping plate clamps the piezoelectric ceramic body. The protective gasket prevents the surface of the piezoelectric ceramic body from being scratched. The adaptive clamping method avoids excessive compression and scratching of the piezoelectric ceramic surface, reduces the defect rate, and improves the product qualification rate.

[0018] Furthermore, stable clamping and precise polishing adjustments reduce displacement and errors during the polishing process, ensuring the flatness and smoothness of the piezoelectric ceramic surface, improving product quality, ensuring a smooth and flat product surface, preventing displacement during processing, ensuring processing accuracy, avoiding damage caused by excessive local stress, effectively protecting the surface, preventing surface scratches, improving product appearance quality, and preventing workpieces from flying out and causing personal injury. Attached Figure Description

[0019] Figure 1 This is a front-view three-dimensional structural schematic diagram of the present invention;

[0020] Figure 2 This is a three-dimensional structural diagram of the base of this utility model;

[0021] Figure 3 This is a schematic diagram of the three-dimensional structure of the rotating column of this utility model in half section.

[0022] Figure 4 This is a three-dimensional structural diagram of the guide column of this utility model;

[0023] Figure 5 This is a schematic diagram of the three-dimensional structure of the push plate of this utility model;

[0024] Figure 6 This is a schematic diagram of the three-dimensional structure of the clamping plate of this utility model.

[0025] In the diagram: 1. Working platform; 2. Base; 3. Motor; 4. Rotating column; 5. Support frame; 6. Pneumatic compressor; 7. Fixing plate; 8. Push plate; 9. First guide groove; 10. Second guide groove; 11. Guide plate; 12. Guide column; 13. Support plate; 14. Polisher; 15. Clamping plate; 16. Driving plate; 17. Protective pad; 18. Piezoelectric ceramic body. Detailed Implementation

[0026] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0027] Example 1: Please refer to Figures 1-6This utility model provides the following technical solution: A polishing device for piezoelectric ceramic production, comprising a working platform 1 and a base 2 fixedly installed on the upper end of the working platform 1; a motor 3 is fixedly installed on the left side of the upper end of the working platform 1, and the motor 3 is located at the left end of the base 2; an adjustment mechanism is provided on the upper end of the base 2; a rotating column 4 is rotatably installed inside the base 2, and the left end of the rotating column 4 is fixedly installed at the output end of the motor 3; a support frame 5 is fixedly installed on the rear side of the upper end of the working platform 1, and a pneumatic compressor 6 is fixedly installed on the upper end of the support frame 5; a fixing plate 7 is fixedly installed on the upper end of the support frame 5; a clamping mechanism is provided on the upper end of the support frame 5; and a push plate 8 is fixedly installed at the output end of the pneumatic compressor 6. At the left end of the fixed plate 7, the adjustment mechanism includes a first guide groove 9 on the outer side of the right end of the rotating column 4, and two first guide grooves 9 are evenly distributed with the base 2 as the center of symmetry. A second guide groove 10 is provided at the upper end of the base 2, and two second guide grooves 10 are evenly distributed with the base 2 as the center of symmetry. A guide plate 11 is provided on the right side of the upper end of the base 2, and two guide plates 11 are evenly distributed with the base 2 as the center of symmetry. The guide plate 11 and the second guide groove 10 cooperate with each other. A guide column 12 is fixedly installed at the lower end of the guide plate 11, and the guide column 12 cooperates with the first guide groove 9. A support plate 13 is fixedly installed at the upper end of the guide plate 11, and a polisher 14 is fixedly installed at the upper end of the support plate 13.

[0028] The motor 3 on the upper left side of the work platform 1 is started. The output end of the motor 3 drives the rotating column 4 inside the base 2. The first guide groove 9 on the outer side of the rotating column 4 drives the guide column 12 at the lower end of the guide plate 11 to move inward. The guide plate 11 cooperates with the second guide groove 10 opened at the upper end of the base 2, so that the guide plate 11 moves inward through the guide column 12. The support plate 13 at the upper end of the guide plate 11 drives the polisher 14 to move inward, so that the inward movement polishes the piezoelectric ceramic body 18.

[0029] The clamping mechanism includes a clamping plate 15 rotatably mounted on the upper end of a fixed plate 7, with two clamping plates 15 evenly distributed around the fixed plate 7 as the center of symmetry. A driving plate 16 is rotatably mounted on the upper end of a pushing plate 8, with two driving plates 16 evenly distributed around the fixed plate 7 as the center of symmetry. The upper end of the driving plate 16 is rotatably mounted in the middle of the clamping plate 15. A protective pad 17 is attached to the lower left side of the clamping plate 15, and a piezoelectric ceramic body 18 is provided at the lower end of the protective pad 17. The piezoelectric ceramic body 18 corresponds to the polisher 14.

[0030] The air compressor 6 at the upper end of the support frame 5 is started. The air compressor 6 drives the push plate 8 to move to the right. The upper end of the push plate 8 drives the drive plate 16 to rotate and drive the clamping plate 15. The clamping plate 15 rotates at the upper end of the fixing plate 7 and moves downward, so that the left end of the clamping plate 15 clamps the piezoelectric ceramic body 18. The protective pad 17 prevents the surface of the piezoelectric ceramic body 18 from being scratched.

[0031] In the description of this utility model, it should be noted that, unless otherwise explicitly specified and limited, the terms "connected" and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0032] Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A polishing device for piezoelectric ceramic production, comprising a working platform (1) and a base (2) fixedly installed on the upper end of the working platform (1); characterized in that The working platform (1) is fixedly installed with an electric motor (3) on the upper left side, and the electric motor (3) is located on the left side of the base (2). The upper end of the base (2) is provided with an adjustment mechanism. The base (2) is rotatably installed with a rotating column (4) inside, and the left end of the rotating column (4) is fixedly installed at the output end of the electric motor (3). The work platform (1) is fixedly installed with a support frame (5) on the upper rear side, and a pneumatic compressor (6) is fixedly installed on the upper end of the support frame (5). A fixed plate (7) is fixedly installed on the upper end of the support frame (5). A clamping mechanism is provided on the upper end of the support frame (5), and a push plate (8) is fixedly installed on the output end of the pneumatic compressor (6). The push plate (8) is located on the left end of the fixed plate (7).

2. The polishing device for piezoelectric ceramic production according to claim 1, characterized in that: The adjustment mechanism includes a first guide groove (9) on the outer side of the right end of the rotating column (4), and two first guide grooves (9) are evenly distributed with the base (2) as the center of symmetry. A second guide groove (10) is opened at the upper end of the base (2), and two second guide grooves (10) are evenly distributed with the base (2) as the center of symmetry.

3. The polishing device for piezoelectric ceramic production according to claim 2, characterized in that: A guide plate (11) is provided on the upper right side of the base (2), and two guide plates (11) are evenly distributed with the base (2) as the center of symmetry. The guide plate (11) cooperates with the second guide groove (10). A guide column (12) is fixedly installed at the lower end of the guide plate (11).

4. A polishing apparatus for producing piezoelectric ceramics according to claim 3, characterized in that: The guide post (12) cooperates with the first guide groove (9), and a support plate (13) is fixedly installed on the upper end of the guide plate (11), and a polisher (14) is fixedly installed on the upper end of the support plate (13).

5. A polishing apparatus for producing piezoelectric ceramics according to claim 1, characterized in that: The clamping mechanism includes a clamping plate (15) rotatably mounted on the upper end of a fixed plate (7), and two clamping plates (15) are evenly distributed with the fixed plate (7) as the center of symmetry.

6. A polishing apparatus for piezoelectric ceramic production according to claim 5, characterized in that: The upper end of the push plate (8) is rotatably mounted with a drive plate (16), and the drive plates (16) are evenly distributed with the fixed plate (7) as the center of symmetry, and the upper end of the drive plate (16) is rotatably mounted in the middle of the clamping plate (15).

7. A polishing apparatus for piezoelectric ceramic production according to claim 6, characterized in that: A protective pad (17) is attached to the lower left side of the clamping plate (15), and a piezoelectric ceramic body (18) is provided at the lower end of the protective pad (17), and the piezoelectric ceramic body (18) corresponds to the polisher (14).

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