An automatic cleaning nozzle holder for the reaction chamber of a semiconductor device

By designing an automatic cleaning nozzle holder for the reaction chamber of semiconductor equipment, and utilizing multi-angle spraying of cleaning liquid and stirring motor blades, the problems of cleaning dead angles and limited cleaning range in existing technologies have been solved, achieving all-round and efficient cleaning of the reaction chamber and ensuring the quality and stability of semiconductor production.

CN224444029UActive Publication Date: 2026-07-03SONGZHICHENG PRECISION TECH (SUZHOU) CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
SONGZHICHENG PRECISION TECH (SUZHOU) CO LTD
Filing Date
2025-07-10
Publication Date
2026-07-03

AI Technical Summary

Technical Problem

Existing methods for cleaning the reaction chamber of semiconductor equipment are difficult to achieve uniform cleaning, resulting in problems such as cleaning dead zones and limited cleaning range. The nozzle layout of the cleaning device is unreasonable, leading to low cleaning efficiency.

Method used

An automatic cleaning nozzle holder for the reaction chamber of a semiconductor device has been designed, comprising a tank, a water storage tank, a water pump, a water spray pump, and a water spray ball. By spraying cleaning liquid at multiple angles, combined with the stirring blades of a stirring motor, targeted cleaning is achieved, expanding the cleaning range and improving the uniformity of cleaning.

Benefits of technology

This enables comprehensive cleaning of the reaction chamber, improving cleaning effectiveness and efficiency, and ensuring the quality and stability of semiconductor production.

✦ Generated by Eureka AI based on patent content.

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Abstract

This utility model discloses an automatic cleaning nozzle holder for the reaction chamber of semiconductor equipment, specifically relating to the field of semiconductor equipment cleaning technology. It includes a tank with a detachable lid at the top. A water tank is welded to one outer wall of the tank and is made of durable metal. A water pipe is connected to the top of the water tank, and a water pump is detachably mounted on the outside of the water pipe via bolts. A spray pump is connected to the end of the water pump away from the water tank. The nozzle assembly's movement range covers the entire internal space of the reaction chamber, enabling comprehensive cleaning of the inner wall, electrodes, and other parts of the chamber, greatly expanding the cleaning range. The entire cleaning process is automatically controlled by a control system, significantly reducing the labor intensity of operators and improving production efficiency.
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