Etching device for integrated circuit production

Abstract

The utility model discloses an integrated circuit production is with corrosion device, including the reaction kettle for producing integrated circuit with high performance titanium silicon etching liquid, the reaction kettle top is provided with drive motor, drive motor drive connection has the screw rod, the screw rod is inserted to the inside of reaction kettle and is hinged to the bottom of reaction kettle, the screw rod screw thread connection has the promotion mixing material spare, the promotion mixing material spare sets up a plurality of liquid flow holes for liquid to pass, still sets up a plurality of material distributing blocks for dispersing liquid, drive motor drives the rotation of screw rod to drive the promotion mixing material spare elevating, thereby the promotion mixing material spare can along with the screw rod elevating to stir and tumble the primary solution and diluent of corrosion.

Description

Technical Field

[0001] This utility model relates to the field of etching liquid production technology, specifically an etching device for integrated circuit production. Background Technology

[0002] The etching solution used in integrated circuit production needs to be thoroughly mixed with the diluent. This dilution and mixing process is carried out in a reaction vessel. Since the diluent is sprayed from above, if a commonly used stirring shaft or horizontal stirring blade is used for stirring, it is difficult for the stock solution at the bottom to be fully mixed with the diluent at the top, resulting in a long mixing time and poor effect. Utility Model Content

[0003] To address the shortcomings of the prior art, this invention provides an etching device for integrated circuit manufacturing. This invention features a lifting and mixing component with flow holes and a material distribution block, which effectively agitates the raw materials at the upper and lower positions, resulting in more thorough material distribution and better mixing of the original solution and diluent at the bottom.

[0004] To achieve the above technical objectives, this utility model adopts the following technical solution: an etching device for integrated circuit production, comprising a reactor for producing high-performance titanium-silicon etching solution for integrated circuits, a drive motor is provided at the top of the reactor, the drive motor drives a lead screw connected to the reactor, the lead screw extends into the reactor and is hinged to the bottom of the reactor; the lead screw is threadedly connected to a lifting and mixing component, the lifting and mixing component has multiple flow holes for liquid to pass through, and multiple distribution blocks are provided for dispersing the liquid, the drive motor drives the lead screw to rotate to drive the lifting and mixing component to rise and fall, so that the lifting and mixing component can rise and fall along the lead screw to stir and tumble the original etching solution and the diluent.

[0005] The lifting and mixing component includes a circular plate with a threaded hole at its center for threaded connection with the lead screw; the panel on the circular plate is a through hole.

[0006] The material distribution blocks and the liquid flow holes are arranged alternately.

[0007] The material distribution block is a multi-faceted cone, the bottom surface of which is fixed to the circular plate, and the cone apex of which faces upward.

[0008] The multiple material distribution blocks have the same height but different bottom surfaces.

[0009] The bottom surfaces of the multiple material distribution blocks gradually decrease in size from the outside to the inside.

[0010] A notch is formed on the outer periphery of the circular plate.

[0011] The reactor is equipped with an upper bearing and a lower bearing. The top end of the lead screw is connected to the drive motor via a coupling. The upper and lower bearings are connected to the upper and lower parts of the lead screw, respectively. The reactor is also equipped with a bracket for mounting the drive motor.

[0012] The top of the reactor is also a spraying device, including a spray pipe and a nozzle. The spray pipe is also equipped with a connecting pipe for connecting to a diluent tank.

[0013] In summary, this utility model achieves the following technical effects:

[0014] This invention relates to a stirring device for circuit etching fluid used in integrated circuits. Specifically, a lifting and mixing component is installed inside the reaction vessel. This component, in conjunction with a lead screw, can move up and down. During this up-and-down movement, it can agitate the mixed materials. The mixed materials can flow through multiple flow holes, accelerating the stirring and mixing effect. The material distribution block can break up and disperse the materials that are about to come into contact with the lifting and mixing component, thus playing a role in stirring and mixing. The lifting and mixing component can stir up and down, allowing the materials at different positions to tumble better, thereby improving the mixing effect. Attached Figure Description

[0015] Figure 1 It is an etching device used in integrated circuit manufacturing;

[0016] Figure 2 This is a side view of the lifting and mixing component;

[0017] Figure 3 This is a 3D schematic diagram of the lifting mixing component.

[0018] Figure 4 This is a top view of the lifting and mixing components. Detailed Implementation

[0019] The present invention will be further described in detail below with reference to the accompanying drawings.

[0020] This specific embodiment is merely an explanation of the present utility model and is not intended to limit the present utility model. After reading this specification, those skilled in the art can make modifications to this embodiment without contributing any inventive step, but as long as they are within the scope of the claims of the present utility model, they are protected by patent law.

[0021] In the description of this utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this utility model and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this utility model.

[0022] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.

[0023] In this utility model, unless otherwise explicitly specified and limited, the terms "installation," "connection," "joining," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model according to the specific circumstances.

[0024] In this utility model, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0025] Example:

[0026] Figure 1This is an etching device for integrated circuit manufacturing, comprising a reactor 1 for producing a high-performance titanium-silicon etching solution for integrated circuits. A drive motor 3 is mounted on the top of the reactor 1, and the drive motor 3 drives a lead screw 2 connected to the reactor 1. The lead screw 2 extends into the reactor 1 and is hinged to the bottom of the reactor 1. A lifting and mixing component 4 is threadedly connected to the lead screw 2. The lifting and mixing component 4 has multiple flow holes 403 for liquid passage and multiple distribution blocks 404 for dispersing the liquid. The drive motor 3 drives the lead screw 2 to rotate, thereby driving the lifting and mixing component 4 to rise and fall. Thus, the lifting and mixing component 4 can rise and fall along the lead screw 2, thereby agitating and tumbling the original etching solution and the diluent.

[0027] This invention relates to a stirring device for a high-performance titanium-silicon etching solution for integrated circuits. Specifically, a lifting and mixing component 4 is installed inside the reactor. This component, in conjunction with a lead screw, can move up and down. During this up-and-down movement, it can agitate the raw materials. The raw materials can flow through multiple flow holes 403, accelerating the stirring and mixing effect. The material distribution block can break up and disperse the raw materials that are about to come into contact with the lifting and mixing component 4, thus playing a role in stirring and mixing. The lifting and mixing component can stir up and down, allowing the raw materials at the upper and lower positions to tumble better, thereby improving the mixing effect.

[0028] Figure 2 This is a side view of the lifting and mixing component. Figure 3 This is a 3D schematic diagram of the lifting and mixing components. Figure 4 This is a top view of the lifting mixing component 4, which includes a circular plate 401. A threaded hole 402 is opened in the center of the circular plate 401 for threaded connection with the lead screw 2. The panel opened on the circular plate 401 is in the form of a through hole.

[0029] This utility model features a circular plate structure that matches the cylindrical structure of a reactor. It utilizes threaded holes and lead screws to achieve lifting motion and allows the mixed raw materials to flow through the liquid outlet, which disperses the mixed raw materials and improves the mixing effect.

[0030] The material distribution block 404 and the liquid flow hole 403 are arranged alternately. After the material distribution block 404 disperses the raw material, it flows along the surface of the material distribution block into the nearby liquid flow hole, thereby achieving a better dispersion effect.

[0031] In this embodiment, the material distribution block 404 is a multi-faceted pyramid, the bottom surface of which is fixed to the circular plate 401, and the apex of which faces upward. Specifically, this embodiment is a quadrangular pyramid with a square bottom surface, and the apex is capable of dispersing the raw materials.

[0032] The material distribution blocks 404 have the same height but different bottom surfaces.

[0033] Furthermore, the bottom surface of the material distribution block 404 gradually decreases in size from the outside to the inside, which can cooperate with the flow hole to disperse the raw material.

[0034] A notch 405 is provided on the outer periphery of the circular plate 401 so that the raw material on the outer periphery of the circular plate can pass through smoothly.

[0035] like Figure 1 As shown, the reactor 1 is equipped with an upper bearing 7 and a lower bearing 8. The top end of the lead screw 2 is connected to the drive motor 3 through a coupling 6. The upper part and the bottom of the lead screw 2 are respectively connected to the upper bearing 7 and the lower bearing 8. The reactor 1 is also equipped with a bracket 5 for mounting the drive motor 3.

[0036] like Figure 1 As shown, the top of the reactor 1 is also a spraying device 9, including a spray pipe 901 and a nozzle 902. The spray pipe 901 is also provided with a connecting pipe 903 for connecting to the diluent tank.

[0037] The reactor is pre-filled with the original corrosive solution. During the lifting of the circular plate, the diluent is sprayed using a nozzle. The circular plate agitates the raw material, causing the liquid to tumble and mix better with the diluent.

[0038] The above description is merely a preferred embodiment of the present utility model and is not intended to limit the present utility model in any way. Any simple modifications, equivalent changes and alterations made to the above embodiments based on the technical essence of the present utility model shall fall within the scope of the technical solution of the present utility model.

Claims

1. An etching apparatus for integrated circuit manufacturing, comprising a reaction vessel (1) for producing a high-performance titanium-silicon etching solution for integrated circuits, characterized in that: The reactor (1) is equipped with a drive motor (3) at the top. The drive motor (3) drives a lead screw (2) which extends into the reactor (1) and is hinged to the bottom of the reactor (1). The lead screw (2) is threadedly connected to a lifting mixing component (4). The lifting mixing component (4) has multiple flow holes (403) for liquid to pass through and multiple distribution blocks (404) for dispersing liquid. The drive motor (3) drives the lead screw (2) to rotate to drive the lifting mixing component (4) to rise and fall. Thus, the lifting mixing component (4) can rise and fall along the lead screw (2) to stir and tumble the original corrosive liquid and the diluent.

2. The etching apparatus for integrated circuit manufacturing according to claim 1, characterized in that: The lifting mixing component (4) includes a circular plate (401), and a threaded hole (402) is opened in the center of the circular plate (401) for threaded connection with the lead screw (2); the panel opened on the circular plate (401) is in the form of a through hole.

3. The etching apparatus for integrated circuit manufacturing according to claim 2, characterized in that: The material distribution block (404) and the liquid flow hole (403) are arranged alternately.

4. The etching apparatus for integrated circuit manufacturing according to claim 2, characterized in that: The material distribution block (404) is a multi-faceted cone, the bottom surface of which is fixed on the circular plate (401), and the cone apex of which faces upward.

5. The etching apparatus for integrated circuit manufacturing according to claim 2, characterized in that: The multiple material distribution blocks (404) have the same height but different bottom surfaces.

6. The etching apparatus for integrated circuit manufacturing according to claim 5, characterized in that: The bottom surfaces of the multiple material distribution blocks (404) gradually decrease in size from the outside to the inside.

7. The etching apparatus for integrated circuit manufacturing according to claim 2, characterized in that: A notch (405) is provided on the outer periphery of the circular plate (401).

8. The etching apparatus for integrated circuit manufacturing according to claim 1, characterized in that: The reactor (1) is equipped with an upper bearing (7) and a lower bearing (8). The top end of the lead screw (2) is connected to the drive motor (3) through a coupling (6). The upper part and the bottom of the lead screw (2) are respectively connected to the upper bearing (7) and the lower bearing (8). The reactor (1) is also equipped with a bracket (5) for installing the drive motor (3).

9. The etching apparatus for integrated circuit manufacturing according to claim 1, characterized in that: The top of the reactor (1) is also a spraying device (9), including a spray pipe (901) and a nozzle (902). The spray pipe (901) is also provided with a connecting pipe (903) for connecting to the diluent tank.

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