A cleaning device for wafer transfer boxes
The clean water preparation system, which utilizes multi-stage filtration and electric field effects, solves the problem of residual impurities after wafer cell cleaning, achieves high-purity water treatment, and improves the yield of wafer cells.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- SEMIGLORY SEMICON MATERIAL (JIASHAN) CO LTD
- Filing Date
- 2025-07-31
- Publication Date
- 2026-07-24
AI Technical Summary
In the existing technology, soluble impurities still exist in the wafer cell after cleaning, resulting in a low yield of the wafer cell.
A clean water preparation system that includes activated carbon filtration and ion removal devices removes insoluble and soluble impurities from the water through multi-stage filtration and electric field action, forming sediment before filtration, thereby improving the cleanliness of the water.
It significantly removes insoluble and soluble impurities from water, improves the cleaning effect of wafer cells, and increases the yield of wafer cells.
Smart Images
Figure CN224542480U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of wafer box manufacturing technology, specifically to a cleaning device for wafer turnover boxes. Background Technology
[0002] As the critical dimensions in wafer manufacturing become smaller and the process complexity increases, the cleanliness of wafer cells has a greater impact on product yield. Wafer cell contamination causes huge losses every year. Therefore, wafer cells need to be cleaned during the manufacturing process to ensure that the finished wafer cells have a high degree of cleanliness. In the existing technology, the clean water used to clean wafer cells removes insoluble impurities, but some soluble impurities are still present. After cleaning the wafer cells, the yield of wafer cells is not high. Utility Model Content
[0003] To address the shortcomings of the prior art, this utility model proposes a cleaning device for wafer turnover boxes.
[0004] To achieve the above-mentioned technical effects, the present invention adopts the following solution:
[0005] A cleaning device for a wafer turnover box includes a cleaning tank and a clean water preparation device connected to the cleaning tank. The clean water preparation device includes a substrate, on which a processing tank and a water tank are fixedly mounted. An inlet is provided on one side wall of the processing tank. A first activated carbon filter is installed inside the processing tank. The first activated carbon filter is connected to the inlet via a raw water pipe. A first water pump is installed on the raw water pipe. The first activated carbon filter is connected to a second activated carbon filter via a first water supply pipe. A second water pump is installed on the first water supply pipe. The second activated carbon filter is connected to an ion removal device via a second water supply pipe. A third water pump is installed on the second water supply pipe. The ion removal device is connected to... The filter is connected to a water inlet via a fourth water supply pipe located at the upper end of the side wall of the water tank. A fourth water pump is installed on the fourth water supply pipe, and a water outlet with a valve is located at the lower end of the side wall of the water tank. The ion removal device includes a housing containing an insulating tube. Both ends of the insulating tube extend out of the housing and are connected to a second and a third water supply pipe, respectively. Two insertion holes are spaced apart along the length of the insulating tube. A positive electrode plate and a negative electrode plate are inserted into the two insertion holes, respectively. The positive and negative electrode plates are sealed to the insertion holes with epoxy resin. One end of the positive electrode plate is connected to the positive terminal of a power supply via a switch, and the other end of the positive electrode plate is connected to the negative terminal of the power supply.
[0006] In a preferred embodiment, the first activated carbon filter device and the second activated carbon filter device have the same structure. The first activated carbon filter device includes an adsorption box with a door on its front side. The upper end of the adsorption box has a first connection port connected to the raw water pipe. The side wall of the adsorption box has a second connection port near its lower end, which is connected to a first water supply pipe. A first shower head is installed at the top of the inner wall of the adsorption box and is connected to the first connection port. An adsorption rack is movably placed inside the adsorption box, located below the first shower head. A water collection trough is provided at the bottom of the adsorption box, and the second connection port is connected to the water collection trough. The lower end of the adsorption rack is placed at the bottom of the water collection trough. The adsorption rack includes two side plates that are set upright. Several placement slots are fixedly installed between the side plates from top to bottom. The bottom of the placement slots has several hollow holes, and several activated carbons are placed in the placement slots.
[0007] In a preferred embodiment, the filter includes an outer casing. A third connection port is located at the upper end of the outer casing and is connected to a third water supply pipe. A fourth connection port is located near the lower end of the side wall of the outer casing and is connected to a fourth water supply pipe. A filter frame is horizontally positioned in the middle of the outer casing and is vertically installed throughout. A filter screen is installed at the bottom of the filter frame. An insertion port is provided on one side wall of the outer casing. Two sliding grooves extend from the insertion port toward the interior of the outer casing. The two sliding grooves are located on two corresponding inner walls inside the outer casing. The filter frame is inserted into the outer casing from the insertion port along the sliding grooves.
[0008] In a preferred embodiment, a handle is installed on the outer side wall of the filter frame.
[0009] In a preferred embodiment, a transparent glass cover is provided at the top of the inner wall of the water tank, and several ultraviolet lamps are installed inside the transparent glass cover.
[0010] In a preferred embodiment, a second shower head is installed on the inner wall of the water tank, and the second shower head is connected to the water inlet.
[0011] Compared with existing technologies, the beneficial effects are:
[0012] This invention features a simple structure and convenient operation. Raw water is filtered through a first activated carbon filter to remove insoluble impurities and adsorb some of the sodium hypochlorite and other soluble substances that can be adsorbed by activated carbon. Then, it passes through a second activated carbon filter for further adsorption of sodium hypochlorite and other adsorbable soluble substances. After completion, the water is passed through an ion removal device. When energized, an electric field is created between the positive and negative electrodes, driving anions and cations in the water to collide and combine, forming insoluble precipitates. These precipitates are then removed by a filter, and the treated water is discharged into a water tank for storage. This invention effectively removes a large amount of insoluble and soluble impurities from water, improving the cleanliness of the water and increasing the yield rate of wafer cassettes after cleaning them. Attached Figure Description
[0013] Figure 1 This is a schematic diagram of the structure of this utility model;
[0014] Figure 2 This is a schematic diagram of the structure of the first activated carbon filtration device in this utility model;
[0015] Figure 3 This is a schematic diagram of the ion removal device in this utility model;
[0016] Figure 4 This is a schematic diagram of the filter structure in this utility model.
[0017] Reference numerals: 1. Substrate; 2. Processing tank; 3. Water tank; 4. Inlet; 5. Raw water pipe; 6. First water pump; 7. First activated carbon filter; 8. First water supply pipe; 9. Second water pump; 10. Second activated carbon filter; 11. Second water supply pipe; 12. Third water pump; 13. Ion removal device; 14. Third water supply pipe; 15. Filter; 16. Fourth water supply pipe; 17. Fourth water pump; 18. Second shower head; 19. Transparent glass cover; 20. Purple 21. External light; 22. Water outlet; 23. Adsorption box; 24. First connection port; 25. First shower head; 26. Second connection port; 27. Water collection tank; 28. Side plate; 29. Placement slot; 30. Hollow hole; 31. Activated carbon; 32. Outer shell; 33. Insulating tube; 34. Positive electrode plate; 35. Outer box; 36. Third connection port; 37. Fourth connection port; 38. Slide groove; 39. Filter frame; 40. Filter screen; 41. Handle; 42. Negative electrode plate; 43. Cleaning box. Detailed Implementation
[0018] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.
[0019] A cleaning device for a wafer turnover box includes a cleaning tank and a clean water preparation device connected to the cleaning tank. The clean water preparation device includes a substrate 1, on which a processing tank 2 and a water tank 3 are fixedly mounted. An inlet 4 is provided on one side wall of the processing tank 2. A first activated carbon filter 7 is installed inside the processing tank 2. The first activated carbon filter 7 is connected to the inlet 4 via a raw water pipe 5. A first water pump 6 is installed on the raw water pipe 5. The first activated carbon filter 7 is connected to a second activated carbon filter 10 via a first water supply pipe 8. A second water pump 9 is installed on the first water supply pipe 8. The second activated carbon filter 10 is connected to an ion removal device 13 via a second water supply pipe 11. A third water pump 12 is installed on the second water supply pipe 11. The ion removal device 13 is connected to a filter 15 via a third water supply pipe 14. The filter 15 is connected to the water inlet via the fourth water supply pipe 16. The water inlet is located at the upper end of the side wall of the water tank 3. A fourth water pump 17 is installed on the fourth water supply pipe. An outlet 21 is located at the lower end of the side wall of the water tank 3. The outlet 21 is equipped with a valve. The ion removal device 13 includes a housing 31. An insulating tube 32 is installed inside the housing 31. Both ends of the insulating tube 32 extend out of the housing 31 and are connected to the second water supply pipe 11 and the third water supply pipe 14, respectively. Two insertion holes are provided on the insulating tube 32 at intervals along its length. A positive electrode 33 and a negative electrode 42 are inserted into the two insertion holes and extend into the insulating tube. The positive electrode 33 and the negative electrode 42 are sealed to the insertion holes with epoxy resin. One end of the positive electrode 33 is connected to the positive terminal of the power supply via a switch, and the other end of the positive electrode 33 is connected to the negative terminal of the power supply.
[0020] Raw water enters the raw water pipe 5 through the inlet 4, and then passes through the first activated carbon filter 7 to adsorb insoluble impurities and some sodium hypochlorite and other dissolved substances that can be adsorbed by activated carbon. After that, it enters the second activated carbon filter 10 through the first water supply pipe 8 to further adsorb sodium hypochlorite and other dissolved substances that can be adsorbed by activated carbon. After filtration, it is transported to the ion removal device 13 through the second water supply pipe 11. When energized, an electric field is formed between the positive electrode 33 and the negative electrode 42. When the water flows through the insulating pipe 32, cations such as calcium and magnesium ions and anions such as sulfate and carbonate in the water move towards each other and collide under the action of the electric field, producing precipitates such as calcium carbonate and magnesium sulfate, thereby removing calcium and magnesium ions from the water and softening the water. The precipitate enters the filter 15 through the third water supply pipe 14 for filtration to remove the precipitate and obtain clean water after treatment. The clean water is sent into the water tank 3 through the fourth supply pipe.
[0021] In a preferred embodiment, the first activated carbon filter device 7 and the second activated carbon filter device 10 have the same structure. The first activated carbon filter device 7 includes an adsorption box 22, with a door on its front side. A first connection port 23 is located at the upper end of the adsorption box 22 and connects to the raw water pipe 5. A second connection port 25 is located near the lower end of the side wall of the adsorption box 22 and connects to the first water supply pipe 8. A first shower head 24 is installed at the top of the inner wall of the adsorption box 22. The nozzle 24 is connected to the first connection port 23. An adsorption rack is movably placed inside the adsorption box 22. The adsorption rack is located below the first shower head 24. A water collection tank 26 is provided at the bottom of the adsorption box 22. The second connection port 25 is connected to the water collection tank 26. The lower end of the adsorption rack is placed at the bottom of the water collection tank 26. The adsorption rack includes two side plates 27 that are set upright. A number of placement slots 28 are fixedly installed between the side plates 27 from top to bottom. The bottom of the placement slots 28 has a number of hollow holes 29. A number of activated carbon 30 are laid in the placement slots 28.
[0022] Several layers of activated carbon are placed on the adsorption rack. The first shower head 24 sprays water downwards, spreading the water flow and increasing the contact area between the water flow and the activated carbon. The impurities in the water are adsorbed by the multiple layers of activated carbon.
[0023] In a preferred embodiment, the filter 15 includes an outer casing 34. The upper end of the outer casing 34 has a third connection port 35 connected to a third water supply pipe 14. A fourth connection port 36 is located near the lower end of the side wall of the outer casing 34, connected to a fourth water supply pipe 16. A filter frame 38 is horizontally positioned in the middle of the outer casing 34 and vertically extends through it. A filter screen 39 is installed at the bottom of the filter frame 38. An insertion port is provided on one side wall of the outer casing 34. Two sliding grooves 37 extend from the insertion port toward the interior of the outer casing 34, with the two grooves 37 located on two corresponding inner walls of the outer casing 34. The filter frame 38 is inserted into the outer casing 34 from the insertion port along the sliding grooves 37.
[0024] Water flows down and passes through filter screen 39 to remove sediment. When too much sediment accumulates in filter frame 38, filter frame 38 can be pulled out from the inlet for cleaning. However, a transparent observation port can be provided on the side wall of outer box 34 to make it easy to observe the amount of sediment in filter frame 38.
[0025] In a preferred embodiment, a handle 40 is installed on the outer side wall of the filter frame 38.
[0026] In a preferred embodiment, a transparent glass cover 19 is provided on the top of the inner wall of the water tank 3, and a plurality of ultraviolet lamps 20 are installed inside the transparent glass cover 19 to kill bacteria in the water.
[0027] In a preferred embodiment, a second shower head 18 is installed on the inner wall of the water tank 3. The second shower head 18 is connected to the water inlet. The second shower head separates the water flow, which can improve the efficiency of the ultraviolet lamp 20 in killing bacteria in the water.
[0028] In the description of this utility model, it should be understood that the terms "upper", "lower", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the utility model product is in use, or the orientation or positional relationship commonly understood by those skilled in the art. They are only used to facilitate the description of this utility model and simplify the description, and are not intended to indicate or imply that the device or component referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model.
[0029] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this utility model, "a plurality of" means two or more, unless otherwise explicitly specified.
[0030] Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.
Claims
1. A cleaning device for a wafer turnover box, characterized in that, The system includes a cleaning tank and a clean water preparation device connected to the cleaning tank. The clean water preparation device includes a base plate on which a treatment tank and a water tank are fixedly mounted. An inlet is provided on one side wall of the treatment tank. A first activated carbon filter is installed inside the treatment tank. The first activated carbon filter is connected to the inlet via a raw water pipe. A first water pump is installed on the raw water pipe. The first activated carbon filter is connected to a second activated carbon filter via a first water supply pipe. A second water pump is installed on the first water supply pipe. The second activated carbon filter is connected to an ion removal device via a second water supply pipe. A third water pump is installed on the second water supply pipe. The ion removal device is connected to a filter via a third water supply pipe. The filter is connected to the water inlet via a fourth water supply pipe, which is located at the upper end of the side wall of the water tank. A fourth water pump is installed on the fourth water supply pipe. An outlet is located at the lower end of the side wall of the water tank, and the outlet is equipped with a valve. The ion removal device includes a housing, inside which is an insulating tube. The two ends of the insulating tube extend out of the housing and are connected to the second and third water supply pipes, respectively. Two insertion holes are spaced apart along the length of the insulating tube. A positive electrode plate and a negative electrode plate are inserted into the two insertion holes, respectively. The positive and negative electrode plates are sealed to the insertion holes with epoxy resin. One end of the positive electrode plate is connected to the positive terminal of the power supply via a switch, and the other end of the positive electrode plate is connected to the negative terminal of the power supply.
2. The cleaning apparatus for a wafer turnover box as described in claim 1, characterized in that, The first activated carbon filter device and the second activated carbon filter device have the same structure. The first activated carbon filter device includes an adsorption box with a door on the front side. The upper end of the adsorption box has a first connection port connected to the raw water pipe. The side wall of the adsorption box has a second connection port near the lower end, which is connected to the first water supply pipe. A first shower head is installed at the top of the inner wall of the adsorption box and is connected to the first connection port. An adsorption rack is movably placed inside the adsorption box, located below the first shower head. A water collection tank is provided at the bottom of the adsorption box, and the second connection port is connected to the water collection tank. The lower end of the adsorption rack is placed at the bottom of the water collection tank. The adsorption rack includes two side plates that are set upright. Several placement slots are fixedly installed between the side plates from top to bottom. The bottom of the placement slots has several hollow holes, and several activated carbons are placed in the placement slots.
3. The cleaning apparatus for a wafer turnover box as described in claim 1, characterized in that, The filter includes an outer casing with a third connection port at the top, which is connected to a third water supply pipe. A fourth connection port is located near the bottom of the side wall of the outer casing, which is connected to a fourth water supply pipe. A filter frame is horizontally positioned in the middle of the outer casing and is vertically installed through it. A filter screen is installed at the bottom of the filter frame. An insertion port is provided on one side wall of the outer casing, and two sliding grooves extend from the insertion port toward the inside of the outer casing. The two sliding grooves are located on two corresponding inner walls inside the outer casing. The filter frame is inserted into the outer casing from the insertion port along the sliding grooves.
4. The cleaning apparatus for a wafer turnover box as described in claim 3, characterized in that, The filter frame has a handle installed on its outer side wall.
5. The cleaning apparatus for a wafer turnover box as described in claim 1, characterized in that, The top of the inner wall of the water tank is covered by a transparent glass cover, and several ultraviolet lamps are installed inside the transparent glass cover.
6. The cleaning apparatus for a wafer turnover box as described in claim 1, characterized in that, A second shower head is installed on the inner wall of the water tank, and the second shower head is connected to the water inlet.