A centrifugal cleaning device

Abstract

The application relates to the technical field of cleaning devices, and particularly discloses a centrifugal cleaning device which comprises a rack, a centrifugal rotating disc, a driving assembly and cleaning spray heads, the centrifugal rotating disc is rotationally installed on the rack, the driving assembly is arranged at the bottom of the rack, the driving assembly is in transmission connection with the centrifugal rotating disc to drive the centrifugal rotating disc to rotate. The centrifugal rotating disc is provided with clamping assemblies which are arranged at intervals along the outer periphery of the centrifugal rotating disc and are used for fixing the parts to be cleaned. The cleaning spray heads are uniformly distributed on the inner periphery of the centrifugal rotating disc, the cleaning spray heads are arranged towards the clamping assemblies, and the spraying direction of the cleaning spray heads is radial spraying from the inner periphery to the outer periphery of the centrifugal rotating disc. The application has the effects of effectively penetrating the slits with the cleaning liquid and reducing the residual amount of particles in the parts to be cleaned.

Description

Technical Field

[0001] This application relates to the technical field of cleaning devices, and in particular to a centrifugal cleaning device. Background Technology

[0002] With the continuous development of semiconductor technology, the integration and performance requirements of chips are increasing. In chip packaging and testing (IPT) processes, chip size is gradually increasing, while the internal structure of the chip is becoming increasingly intricate. Specifically, the gaps between chips are getting smaller, the solder joint density is constantly increasing, and the size of liquid flow channels is also shrinking. While these changes improve chip performance and functional density, they also bring many challenges to the IPT process, especially in improving chip yield.

[0003] Cleaning is a crucial step in the chip packaging and testing process. It directly affects the cleanliness of the chip's surface and internal structure, thus impacting the chip's electrical performance and reliability. Currently, most cleaning equipment uses spray cleaning technology. This technology uses high-pressure nozzles to spray cleaning fluid onto the chip surface to remove impurities and residues. However, the slits and microchannels inside the chip are extremely small, making it difficult for spray cleaning fluid to penetrate these areas. The spray angle and pressure of the cleaning fluid are often insufficient to effectively cover and clean the internal surfaces when facing these tiny slits. This results in impurities and contaminants remaining inside these slits not being completely removed, thus affecting the chip's electrical connections and performance stability. Utility Model Content

[0004] To address the problem of ineffective spray cleaning in existing systems, this application provides a centrifugal cleaning device.

[0005] This application provides a centrifugal cleaning device, which adopts the following technical solution: A centrifugal cleaning apparatus, comprising: frame, A centrifugal turntable is mounted on a frame. Clamping components are provided on the centrifugal turntable and are spaced along the outer periphery of the centrifugal turntable. The clamping components are used to fix the items to be cleaned. The drive assembly is connected to the centrifugal disc drive and is used to drive the centrifugal disc to rotate. The cleaning nozzles are evenly distributed on the inner circumference of the centrifugal turntable, and are positioned facing the clamping assembly. The spray direction of the cleaning nozzles is radial spray from the inner circumference of the centrifugal turntable to the outer circumference.

[0006] By adopting the above technical solution, the centrifugal disc generates centrifugal force, and the cleaning nozzle sprays from the inner circumference to the outer circumference, so that the cleaning liquid penetrates the micro-slits of the part to be cleaned radially. This solves the problem of residue inside the slits caused by insufficient hydraulic pressure in traditional spraying, forming a uniform, continuous, and dead-angle-free liquid shear layer, which significantly reduces the probability of particle adhesion and improves cleanliness.

[0007] In some embodiments, the drive assembly includes a drive source, a drive wheel, and a driven wheel. The drive wheel is connected to the drive source for transmission. A rotating shaft is provided on the centrifugal turntable. The rotating shaft is coaxially fixed to the centrifugal turntable. The driven wheel is coaxially fixed to the rotating shaft. The drive wheel meshes with the driven wheel.

[0008] By adopting the above technical solution, precise speed transmission is achieved through the external meshing transmission of the "active wheel-passive wheel". The structure is compact, the transmission chain is short, the height dimension of the frame is reduced, the center of gravity of the whole machine is lowered, and the dynamic stability during high-speed rotation is improved.

[0009] In some embodiments, the rotating shaft includes a fixed part and a rotating part, the fixed part and the rotating part are coaxially arranged, the fixed part is fixedly connected to the frame, the rotating part and the fixed part rotate relative to each other, a nozzle turntable is provided on the rotating part, the nozzle turntable is coaxially arranged with the rotating part, and a cleaning nozzle is provided on the nozzle turntable.

[0010] In some embodiments, a groove is provided on the side wall of the rotating part, the groove is opened along the axial direction of the rotating shaft, and a protrusion is provided on the inner wall of the nozzle turntable, the protrusion slidingly engaging with the groove. By adopting the above technical solution, the groove and the protrusion work together to achieve torque transmission while allowing axial sliding, which facilitates quick disassembly and maintenance of the nozzle turntable.

[0011] In some embodiments, a retaining ring is fitted on the rotating part, the cleaning nozzle is installed on the retaining ring, a centrifugal hole is opened on the centrifugal turntable, the retaining ring passes through the centrifugal hole and is fixedly connected to the frame, the retaining ring and the rotating shaft rotate relative to each other, and the centrifugal turntable and the retaining ring rotate relative to each other. By adopting the above technical solution and setting a fixing ring, the cleaning nozzle and the part to be cleaned rotate relative to each other. The centrifugal force generated by the rotation of the part to be cleaned is used to achieve a thorough cleaning of the part to be cleaned, which helps to achieve a good cleaning effect.

[0012] In some embodiments, a water tank is provided at the bottom of the centrifugal turntable, and a water pipe is connected to the water tank. A first cavity is provided in the fixed part, and a second cavity is provided in the rotating part. The first cavity and the second cavity are connected, and the water pipe passes through the first cavity and the second cavity and is connected to the cleaning nozzle.

[0013] By adopting the above technical solution, the water pipe is embedded in the first cavity and the second cavity, which can minimize the entanglement of the water pipe with the rotating shaft, ensure a good spraying effect of the cleaning fluid, and reduce the risk of water pipe leakage.

[0014] In some embodiments, a baffle is provided on the outer periphery of the frame, the baffle is rotatably connected to the frame, and the side of the baffle away from the frame is inclined toward the direction of rotation. By adopting the above technical solution and setting up a baffle, the cleaning liquid ejected by centrifugation can be intercepted, and the inclined surface guides the droplets back to the drain hole, thereby achieving directional recycling of the cleaning liquid.

[0015] In some embodiments, a drain hole is provided on the frame, which is located above the water storage tank, and a filter screen is provided inside the water storage tank. By adopting the above technical solution, the filter screen dynamically intercepts particulate impurities, realizes the recycling of cleaning fluid, reduces chemical consumption, and utilizes gravity self-return without the need for additional pumping, thus saving energy and reducing costs.

[0016] In some embodiments, the clamping assembly includes resilient claws and a silicone pad, the silicone pad being attached to the inside of the resilient claws to cushion vibrations of the workpiece to be cleaned and prevent scratches. By adopting the above technical solution, the double protection of elastic claws and silicone pads can prevent the parts to be cleaned from shifting or being damaged at high speeds.

[0017] In some embodiments, a drying assembly is also included, which is mounted on the nozzle turntable and positioned toward the clamping assembly. By adopting the above technical solution, drying can be started immediately after cleaning, avoiding liquid residue, shortening the process waiting time, and realizing the integration of cleaning and drying.

[0018] Compared with the prior art, this application includes at least one of the following beneficial technical effects: 1. The component to be cleaned (chip / wafer) rotates with the centrifugal turntable, generating controllable centrifugal force. A ring of radially outward cleaning nozzles is arranged on the inner circumference of the turntable, so that the cleaning fluid passes through the slits of the component to be cleaned (chip / wafer) under the combined action of centrifugal force and jet pressure, thereby cleaning the slits of the component to be cleaned (chip / wafer). 2. The nozzles are evenly distributed 360° around the circumference. When the turntable rotates, the surface of each part to be cleaned (chip / wafer) experiences the same liquid velocity field. At the same time, the centrifugal force direction is always perpendicular to the surface of the part to be cleaned (chip / wafer), avoiding localized insufficient cleaning caused by changes in the spray angle. 3. The components to be cleaned (chips / wafers) are arranged symmetrically along the diameter of the turntable, so that the whole machine remains stable during long-term operation, reducing vibration and thus ensuring stable cleaning. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the overall structure of Embodiment 1 of this application.

[0020] Figure 2 This is the front view of Embodiment 1 of this application.

[0021] Figure 3 This is a structural schematic diagram of Embodiment 1 of this application.

[0022] Figure 4 This is the front view of Embodiment 2 of this application.

[0023] Figure 5 This is a schematic diagram of the cleaning nozzle in Embodiment 2 of this application.

[0024] Figure 6 This is a schematic diagram of the cleaning nozzle in Embodiment 3 of this application.

[0025] Figure 7 This is a schematic diagram of the centrifugal turntable mechanism in Embodiment 4 of this application.

[0026] Figure 8 This is a schematic diagram of the structure of Embodiment 4 of this application.

[0027] In the picture: 1. Frame; 2. Centrifugal turntable; 3. Clamping assembly; 31. Elastic claw; 4. Drive assembly; 41. Drive source; 42. Drive wheel; 43. Driven wheel; 44. Rotating shaft; 45. Fixing part; 451. First cavity; 46. Rotating part; 461. Second cavity; 462. Groove; 47. Nozzle turntable; 471. Protrusion; 5. Cleaning nozzle; 51. Fixing ring; 6. Water tank; 61. Water pipe; 7. Baffle; 8. Drying assembly; 9. Second nozzle; 91. Mounting bracket. Detailed Implementation

[0028] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them. All other embodiments obtained by those skilled in the art based on the embodiments of this application without creative effort are within the scope of protection of this application.

[0029] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the term "and / or" in this document is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent: A existing alone, A and B existing simultaneously, or B existing alone. Furthermore, the character " / " in this document, unless otherwise specified, generally indicates that the preceding and following related objects have an "or" relationship.

[0030] Reference Figure 1 and Figure 2This application provides a centrifugal cleaning device, including a frame 1, a centrifugal turntable 2, a drive assembly 4, and cleaning nozzles 5. The centrifugal turntable 2 is rotatably mounted on the frame 1. The drive assembly 4 is located at the bottom of the frame 1 and is connected to the centrifugal turntable 2 for driving the centrifugal turntable 2 to rotate. A clamping assembly 3 is provided on the centrifugal turntable 2, and the clamping assembly 3 is spaced along the outer circumference of the centrifugal turntable 2 to fix the parts to be cleaned. The cleaning nozzles 5 are evenly distributed on the inner circumference of the centrifugal turntable 2, facing the clamping assembly 3, and the spraying direction of the cleaning nozzles 5 is radial spraying from the inner circumference to the outer circumference of the centrifugal turntable 2.

[0031] In this application, the component to be cleaned can be a device-level chip or a 12-inch wafer-level POP package. The wafer is stacked in a 2.5D / 3D manner and then fixed to the centrifugal turntable 2 for cleaning. Further, in this embodiment, the number of clamping components 3 is even, and the number of components to be cleaned clamped on the clamping components 3 is also even when the centrifugal cleaning device is working. Both the clamping components 3 and the components to be cleaned are arranged in the diameter direction of the centrifugal turntable 2, and are symmetrically distributed with respect to the diameter of the centrifugal turntable 2. This ensures the dynamic balance of the centrifugal turntable 2 during rotation, making the centrifugal turntable 2 work stably.

[0032] Centrifugal force allows the cleaning solution to penetrate the tiny gaps in the parts being cleaned, solving the problem of traditional spraying being unable to reach narrow crevices and improving cleanliness. Radial spraying combined with centrifugal force enables the cleaning solution to penetrate the micro-gaps in the parts being cleaned, contributing to a better cleaning effect.

[0033] Specifically, in this embodiment, the drive assembly 4 includes a drive source 41, a drive wheel 42, and a driven wheel 43. The drive wheel 42 is connected to the drive source 41. A rotating shaft 44 is provided on the centrifugal turntable 2, and the rotating shaft 44 is coaxially fixed to the centrifugal turntable 2. The driven wheel 43 is coaxially fixed to the rotating shaft 44, and the drive wheel 42 meshes with the driven wheel 43. In this application, the drive source 41 is specifically a drive motor. The drive source 41 drives the drive wheel 42 to rotate, the drive wheel 42 drives the driven wheel 43 to rotate, thereby driving the rotating shaft 44 to rotate, and the rotating shaft 44 drives the centrifugal turntable 2 to rotate, thereby driving the workpiece to be cleaned to rotate. It is easy to understand that in this embodiment, the drive wheel 42 and the driven wheel 43 can be gears. In other embodiments, the drive assembly 4 can also be a synchronous belt drive, a chain drive, or other transmission methods, which are not limited here.

[0034] Furthermore, the rotating shaft 44 includes a fixed part 45 and a rotating part 46. The fixed part 45 and the rotating part 46 are coaxially arranged and fixedly connected to the frame 1. The rotating part 46 and the fixed part 45 are connected by a bearing, that is, the rotating part 46 and the fixed part 45 can rotate relative to each other. A nozzle turntable 47 is provided on the rotating part 46, and the nozzle turntable 47 is coaxially arranged with the rotating part 46. The cleaning nozzle 5 is provided on the nozzle turntable 47.

[0035] Reference Figure 3 A groove 462 is provided on the side wall of the rotating part 46. The groove 462 is opened along the axial direction of the rotating shaft 44 and extends to the top of the rotating shaft 44. A protrusion 471 is provided on the inner wall of the nozzle turntable 47, and the protrusion 471 slides in engagement with the groove 462. By engaging the groove 462 and the protrusion 471, the nozzle turntable 47 can be limited, so that the rotating part 46 can drive the nozzle turntable 47 to rotate synchronously when rotating, thereby achieving relative stillness between the cleaning nozzle 5 and the workpiece to be cleaned. In this embodiment, the groove 462 is specifically a dovetail groove, and the protrusion 471 is specifically a dovetail block.

[0036] Reference Figure 4 and Figure 5 In other embodiments, a fixing ring 51 is fitted onto the rotating part 46, the cleaning nozzle 5 is mounted on the fixing ring 51, and a centrifugal hole is formed on the centrifugal disc 2. The bottom end of the fixing ring 51 passes through the centrifugal hole and is fixedly connected to the frame 1. The fixing ring 51 and the rotating shaft 44 rotate relative to each other, and the centrifugal disc 2 and the fixing ring 51 also rotate relative to each other. Centrifugal force allows the cleaning fluid to penetrate the tiny gaps in the parts to be cleaned, solving the problem that traditional spraying cannot penetrate narrow gaps and improving cleanliness.

[0037] Furthermore, a water storage tank 6 is provided at the bottom of the centrifugal turntable 2, and a water pipe 61 is connected to the water storage tank 6. A first cavity 451 is formed in the fixed part 45, and a second cavity 461 is formed in the rotating part 46. The first cavity 451 and the second cavity 461 are connected. The water pipe 61 passes through the first cavity 451 and the second cavity 461 and is connected to the cleaning nozzle 5. By integrating the water pipe 61 inside the rotating shaft 44, the water pipe 61 can be prevented from getting tangled when the rotating shaft 44 rotates, thus achieving a better water supply effect.

[0038] Furthermore, a baffle 7 is provided on the outer periphery of the frame 1, and the baffle 7 is rotatably connected to the frame 1. The side of the baffle 7 away from the frame 1 is inclined towards the direction close to the rotating shaft 44. A drain hole (not shown in the figure) is provided on the frame 1, and the drain hole is located above the water storage tank 6. A filter screen is provided inside the water storage tank 6. By setting up the baffle 7 and the drain hole, the splashing of cleaning fluid during the cleaning process can be minimized, and the cleaning fluid is confined within the space enclosed by the baffle 7. The cleaning fluid then enters the water storage tank 6 through the drain hole, realizing the recovery of the cleaning fluid. The recovered cleaning fluid is then filtered through the filter screen, thereby realizing the recycling and reuse of the cleaning fluid and helping to reduce the waste of cleaning fluid.

[0039] In this embodiment, the clamping assembly 3 includes elastic claws 31 and silicone pads. The silicone pads are attached to the inner side of the elastic claws to cushion the vibration of the workpiece to be cleaned and prevent scratches. With the dual protection of the elastic claws and silicone pads, the workpiece to be cleaned can be prevented from shifting or being damaged at high speeds.

[0040] The centrifugal cleaning device provided in this application also includes a drying component 8, which is mounted on the nozzle turntable 47 and sleeved on the cleaning nozzle 5, facing the clamping component 3. Specifically, the drying component 8 is an annular air knife. Sleeving the cleaning nozzle 5, the drying component 8 dries the cleaned parts, integrating cleaning and drying functions, thus improving work efficiency.

[0041] Reference Figure 7 and Figure 8 It is not difficult to understand that in some embodiments, when the part to be cleaned is a 2.5 / 3D wafer, it can be fixed by a tray, chuck, gripper, or a combination of vacuum adsorption and other structures. In addition to the cleaning nozzle 55 that sprays radially from the inner circumference to the outer circumference of the centrifugal turntable 22, the centrifugal cleaning device also includes a second nozzle 9. One or more second nozzles 9 are provided. A mounting bracket 91 is fixedly installed on the frame 1, and the second nozzles 9 are mounted on the mounting bracket 91. The second nozzles 9 are connected to the water tank 6 through pipes. The second nozzles 9 are arranged along the axial direction of the centrifugal turntable 2 and face the clamping assembly 3. The second nozzles 9 spray the part to be cleaned from top to bottom, thereby enabling comprehensive cleaning of the part and reaching deep into the small horizontal crevices of the part to be cleaned, achieving a better cleaning effect. In this application, the structures of the cleaning nozzle 55 and the second nozzle 9 are prior art and will not be described in detail here.

[0042] The above are all preferred embodiments of this application, and are not intended to limit the scope of protection of this application. Therefore, all equivalent changes made in accordance with the structure, shape and principle of this application should be covered within the scope of protection of this application.

Claims

1. A centrifugal cleaning device, characterized in that, include: Rack (1), Centrifugal turntable (2) is provided on the frame (1). A clamping assembly (3) is provided on the centrifugal turntable (2). The clamping assembly (3) is arranged at intervals along the outer periphery of the centrifugal turntable (2). The clamping assembly (3) is used to fix the parts to be cleaned. The drive assembly (4) is connected to the centrifugal turntable (2) for driving the centrifugal turntable (2) to rotate; Cleaning nozzles (5) are evenly distributed on the inner circumference of the centrifugal turntable (2). The cleaning nozzles (5) are arranged facing the clamping assembly (3). The spraying direction of the cleaning nozzles (5) is radial spraying from the inner circumference of the centrifugal turntable (2) to the outer circumference.

2. The centrifugal cleaning device according to claim 1, characterized in that: The drive assembly (4) includes a drive source (41), a drive wheel (42), and a driven wheel (43). The drive wheel (42) is connected to the drive source (41) for transmission. A rotating shaft (44) is provided on the centrifugal turntable (2). The rotating shaft (44) is coaxially fixed to the centrifugal turntable (2). The driven wheel (43) is coaxially fixed to the rotating shaft (44). The drive wheel (42) meshes with the driven wheel (43).

3. The centrifugal cleaning device according to claim 2, characterized in that: The rotating shaft (44) includes a fixed part (45) and a rotating part (46). The fixed part (45) and the rotating part (46) are coaxially arranged. The fixed part (45) is fixedly connected to the frame (1). The rotating part (46) and the fixed part (45) rotate relative to each other. A nozzle turntable (47) is provided on the rotating part (46). The nozzle turntable (47) is coaxially arranged with the rotating part (46). The cleaning nozzle (5) is provided on the nozzle turntable (47).

4. The centrifugal cleaning device according to claim 3, characterized in that: The rotating part (46) has a groove (462) on its side wall, the groove (462) is opened along the axial direction of the rotating shaft (44), and the nozzle turntable (47) has a protrusion (471) on its inner wall, the protrusion (471) and the groove (462) are slidably engaged.

5. A centrifugal cleaning device according to claim 4, characterized in that: A fixing ring (51) is fitted on the rotating part (46), the cleaning nozzle (5) is installed on the fixing ring (51), a centrifugal hole is opened on the centrifugal turntable (2), the fixing ring (51) passes through the centrifugal hole and is fixedly connected to the frame (1), the fixing ring (51) rotates relative to the rotating shaft (44) and the centrifugal turntable (2) rotates relative to the fixing ring (51).

6. A centrifugal cleaning device according to claim 5, characterized in that: A water tank (6) is provided at the bottom of the centrifugal turntable (2), and a water pipe (61) is connected to the water tank (6). A first cavity (451) is provided in the fixed part (45), and a second cavity (461) is provided in the rotating part (46). The first cavity (451) and the second cavity (461) are connected. The water pipe (61) passes through the first cavity (451) and the second cavity (461) and is connected to the cleaning nozzle (5).

7. A centrifugal cleaning device according to claim 2, characterized in that: A baffle (7) is provided on the outer periphery of the frame (1). The baffle (7) is rotatably connected to the frame (1). The side of the baffle (7) away from the frame (1) is inclined toward the direction close to the rotating shaft (44).

8. A centrifugal cleaning device according to claim 6, characterized in that: The frame (1) is provided with a drain hole, which is located above the water storage tank (6). The water storage tank (6) is provided with a filter screen.

9. A centrifugal cleaning device according to claim 1, characterized in that: The clamping assembly (3) includes an elastic claw (31) and a silicone pad. The silicone pad is attached to the inner side of the elastic claw (31) to buffer the vibration of the workpiece to be cleaned and prevent scratches.

10. A centrifugal cleaning device according to claim 3, characterized in that: It also includes a drying assembly (8) mounted on the nozzle turntable (47) and positioned toward the clamping assembly (3).

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