Water circulation industrial constant temperature film washing machine

Abstract

The utility model discloses a kind of water circulation industrial constant-temperature film developing machine, including developing liquid tank, cleaning water tank, fixing liquid tank, waste liquid collecting tank and water circulation purification system, waste liquid in the developing liquid tank, cleaning water tank and fixing liquid tank is converged to waste liquid collecting tank;Water circulation purification system includes the pretreatment tank, low-temperature heating tank, condensing tank, cold water tank and water tank, water ring pump and refrigerator connected in turn by pipeline;Water ring pump is connected with low-temperature heating tank and condensing tank respectively;Refrigerator is connected with condensing tank and cold water tank respectively;Low-temperature heating tank is equipped with the liquid discharge port of concentrated waste liquid discharge;Water tank is communicated with developing liquid tank, cleaning water tank and fixing liquid tank respectively;The utility model maintains certain vacuum degree by water circulation system, water boiling point is reduced, cooperate low temperature of about 30 DEG C, and high-efficiency evaporation can be realized.Not only heating energy consumption is reduced, operating cost is saved, waste liquid concentration ratio can be greatly improved, and the processing capacity and expense of subsequent waste are reduced.

Description

Technical Field

[0001] This utility model belongs to the field of industrial film washing machines, specifically relating to a water-circulating industrial constant temperature film washing machine. Background Technology

[0002] In fields such as industrial X-ray inspection, printing plate making, and medical imaging, constant-temperature film processors are used to sequentially develop, fix, rinse, and dry developed films. However, this process generates large amounts of developing wastewater, fixing wastewater, and rinsing wastewater, which contains toxic organic matter and high concentrations of silver ions. Current technologies rely solely on distillation and condensation to recover a portion of the rinsing water, which cannot remove harmful components from the developing and fixing wastewater, consumes a large amount of water, and cannot deeply purify the rinsing wastewater. Furthermore, traditional atmospheric pressure evaporation requires vacuum evaporation at 100°C or higher, resulting in high operating costs and significant environmental risks, making it difficult to address issues such as pollution source reduction, water recycling, and lower treatment costs. Summary of the Invention

[0003] Purpose of the utility model: This utility model provides an industrial constant temperature film washing machine for ultra-concentrated treatment of developing and fixing waste liquids and for the recycling of water resources.

[0004] Utility Model Technical Solution: A water-circulating industrial constant-temperature film processor includes a developer tank, a cleaning water tank, a fixing tank, and a waste liquid collection tank. Waste liquid from the developer tank, cleaning water tank, and fixing tank is collected in the waste liquid collection tank. The system also includes a water circulation purification system. The water circulation purification system includes a pretreatment tank, a low-temperature heating tank, a condenser tank, a cold water tank, and a purified water tank, connected sequentially by pipelines. A water ring pump is connected to the low-temperature heating tank and the condenser tank via vacuum pipelines to provide and maintain a vacuum environment for them. A chiller is connected to the condenser tank and the cold water tank via refrigeration pipelines. The low-temperature heating tank has a drain outlet for discharging concentrated waste liquid. The condenser tank has a second drain outlet for discharging concentrated waste liquid. The purified water tank is connected to the developer tank, cleaning water tank, and fixing tank via pipelines.

[0005] Furthermore, the water circulation purification system also includes a vapor-liquid separator; the outlet of the water ring pump is connected to the vapor-liquid separator via a pipeline, the outlet of the vapor-liquid separator is connected to a cold water tank via a pipeline, and the cold water tank is connected to the cooling water inlet of the water ring pump via a pipeline. The vapor-liquid separator is used for secondary separation of the gas-liquid mixture drawn from the condenser by the water ring pump.

[0006] Furthermore, the pretreatment tank is equipped with a pH detection port and a regulator dispensing port; a pH sensor is installed at the pH detection port, and an automatic dosing device is connected to the regulator dispensing port.

[0007] Furthermore, a filter and a shut-off valve are sequentially installed in the pipeline connecting the pretreatment tank and the low-temperature heating tank.

[0008] Furthermore, a transfer pump is provided on the pipeline connecting the pretreatment tank and the low-temperature heating tank; the transfer pump pump sends the pretreated waste liquid into the low-temperature heating tank.

[0009] Furthermore, the low-temperature heating tank includes a heating device and a temperature controller, the heating device being electrically connected to the temperature controller; the temperature controller controls the heating temperature at 30°C; and is used to detect and control the temperature of the heating device.

[0010] Furthermore, an overflow manual ball valve is provided on the connecting pipe between the condenser and the cold water tank; used to manually drain excess condensate when the liquid level in the condenser is too high or during maintenance.

[0011] Furthermore, the temperature of the refrigeration unit controls the condenser tank and the cold water tank to be 20°C.

[0012] Furthermore, the water ring pump controls the vacuum level in the low-temperature heating tank and condenser to be -0.094 MPa.

[0013] Furthermore, a second delivery pump is installed on the pipeline connecting the cold water tank and the clean water tank; the second delivery pump delivers clean water into the clean water tank.

[0014] Furthermore, the connecting pipe between the purified water tank and the developing solution tank, the cleaning water tank and the fixing solution tank is equipped with a second filter and a second shut-off valve.

[0015] Furthermore, the operation of the industrial constant temperature wafer washing machine system is automatically regulated and controlled by a program.

[0016] Working Principle: This invention collects waste liquids from developing and fixing processes, then pre-treats them with pH adjustment and filtration. The waste liquid is then pumped into a low-temperature heating tank. A water ring pump creates a vacuum in both the heating and condensing tanks, resulting in an extremely low vacuum environment that significantly lowers the boiling point of water. The waste liquid evaporates at low temperature, separating water from contaminants. The resulting water vapor enters the condensing tank under pressure differential and is cooled into pure distilled water by a chiller. The recovered pure water is stored and reused in the developing tank, rinsing tank, and fixing tank, forming a water circulation system. Simultaneously, contaminants such as developers and fixers in the waste liquid are highly concentrated into a small amount of waste liquid, which can be periodically discharged for specialized treatment.

[0017] Beneficial effects: Compared with the prior art, the present invention has the following effects: I. This invention maintains the vacuum level of the water circulation system at -0.094 MPa, significantly reducing the boiling point of water to 30°C. Under these conditions, combined with a low temperature of around 30°C, efficient evaporation can be achieved. This greatly reduces heating energy consumption and significantly saves operating costs. The evaporation process is gentle and efficient, greatly increasing the concentration ratio of developer and fixer waste liquids, which can be concentrated to 5% of the original volume, achieving ultra-concentration and volume reduction of waste liquids, and greatly reducing the amount and cost of subsequent hazardous waste treatment. Second, the water vapor evaporated from the waste liquid is condensed into high-quality distilled water with high purity, meeting the water quality requirements for reuse in developing tanks, rinsing tanks, and fixing tanks. This forms a water recycling system, saving a significant amount of water resources and improving environmental protection standards. Third, the temperature of the recycled pure water is controllable, and it will not cause temperature fluctuations in the developing tank, cleaning water tank and fixing tank when reused, which helps to maintain a constant temperature environment in the developing process, thereby ensuring the stability and consistency of film developing quality. IV. This utility model can be automatically adjusted and controlled by a program, with a high degree of integration. It integrates pretreatment, evaporation, condensation and recovery, making it easy to operate, run smoothly, have a low failure rate and be easy to maintain. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the structure of this utility model; Figure 2 This is a schematic diagram of the planar structure of this utility model; List of labels in the attached diagram: 1. Developer tank; 2. Cleaning water tank; 3. Fixer tank; 4. Waste liquid collection tank; 5. Water circulation and purification system; 501. Pretreatment tank; 502. Low-temperature heating tank; 503. Condenser tank; 504. Cold water tank; 505. Clean water tank; 506. Water ring pump; 507. Refrigeration unit; 508. Gas-liquid separator; 6. Drain port one; 7. pH value detection port; 8. Conditioner dosing port; 9. Filter one; 10. Shut-off valve one; 11. Transfer pump one; 12. Overflow manual ball valve; 13. Drain port two; 14. Filter two; 15. Shut-off valve two; 16. Transfer pump two. Detailed Implementation

[0019] The present invention will be further explained below with reference to the accompanying drawings and specific embodiments. It should be understood that the following specific embodiments are only used to illustrate the present invention and are not intended to limit the scope of the present invention.

[0020] Please refer to Figures 1-2. A water-circulating industrial constant-temperature film processor includes a developer tank 1, a cleaning water tank 2, a fixer tank 3, and a waste liquid collection tank 4. Waste liquid from the developer tank 1, the cleaning water tank 2, and the fixer tank 3 is collected in the waste liquid collection tank 4. The processor also includes a water circulation purification system 5. The water circulation purification system 5 includes a pretreatment tank 501, a low-temperature heating tank 502, a condenser tank 503, a cold water tank 504, and a clean water tank 505, which are connected in sequence through pipelines.

[0021] The pretreatment tank 501 is equipped with a pH detection port 7 and a regulator dispensing port 8; a pH sensor is installed at the pH detection port 7, and an automatic dosing device is connected to the regulator dispensing port 8; both can be automatically adjusted and controlled by a program.

[0022] The pretreatment tank 501 and the low-temperature heating tank 502 are connected by a filter 9 and a shut-off valve 10 in sequence. The filter 9 is used to filter and intercept small amounts of suspended solids, particulate impurities, flocculent precipitates or other solid residues in the pretreated waste liquid. The shut-off valve 10 is used to completely isolate the pretreatment tank 501 from the subsequent system when maintenance, cleaning or equipment replacement is required, to prevent liquid leakage in the tank, ensure operational safety and control the flow rate.

[0023] A transfer pump 11 is installed on the pipeline connecting the pretreatment tank 501 and the low-temperature heating tank 502; the transfer pump 11 is used to pump the pretreated waste liquid into the low-temperature heating tank 502.

[0024] The low-temperature heating tank 502 includes a heating device and a temperature controller, both of which are existing technologies. The heating device and the temperature controller are electrically connected; the temperature controller controls the heating temperature at 30°C.

[0025] The low-temperature heating tank 502 is equipped with a drain port 6 for discharging concentrated waste liquid.

[0026] The condenser 503 is equipped with a drain port 213 for discharging concentrated waste liquid, which is used for further discharge of the remaining concentrated waste liquid.

[0027] The water ring pump 506 is connected to the low-temperature heating tank 502 and the condenser 503 respectively through vacuum pipelines, and is used to provide and maintain a vacuum environment for the low-temperature heating tank 502 and the condenser 503, with a vacuum degree of -0.094MPa.

[0028] The refrigeration unit 507 is connected to the condenser tank 503 and the cold water tank 504 respectively through refrigeration pipes; the refrigeration unit 507 controls the temperature of the condenser tank 503 and the cold water tank 504 to 20℃.

[0029] The water circulation purification system 5 also includes a vapor-liquid separator 508 for secondary separation of the gas-liquid mixture discharged from the condenser 503. The outlet of the water ring pump 506 is connected to the vapor-liquid separator 508 via a pipeline, and the outlet of the vapor-liquid separator 508 is connected to a cold water tank 504 via a pipeline. The cold water tank 504 is connected to the cooling water inlet of the water ring pump 506 via a pipeline. A second transfer pump 16 is installed on the pipeline connecting the cold water tank 504 and the purified water tank 505; the second transfer pump 16 delivers purified water to the purified water tank 505.

[0030] The connecting pipe between the clean water tank 505 and the developer tank 1, the cleaning water tank 2, and the fixer tank 3 is equipped with a second filter 14 and a second shut-off valve 15. The second filter 14 is used to intercept trace impurities that may be present after the condensation process. The second shut-off valve 15 can completely isolate the cold water tank 504 from the clean water tank 505 and the subsequent systems, which facilitates system maintenance and flow control.

[0031] The water purification tank 505 is connected to the developer tank 1, the cleaning water tank 2, and the fixer tank 3 via pipelines.

[0032] The operation of the industrial constant temperature wafer washing machine system of this utility model can be automatically adjusted and controlled by the program, which is all existing technology.

[0033] Specifically, after the developing, rinsing, and fixing processes are completed, the waste liquid from the developing tank 1, rinsing water tank 2, and fixing tank 3 is discharged into a unified waste liquid collection tank 4. The waste liquid is then piped into the pretreatment tank 501. The pH value is monitored in real time through the pH detection port 7, and acid or alkali is added through the adjusting agent inlet 8 to adjust the pH value of the waste liquid to a reasonable range suitable for subsequent treatment. After entering the pipeline, the pretreated waste liquid first passes through filter 9 to intercept suspended solids, particulate impurities, and other solid residues, protecting downstream equipment. The shut-off valve 10 on the pipeline can be opened, closed, or the flow rate adjusted as needed. The pretreated waste liquid is then pumped into the low-temperature heating tank 502 by the transfer pump 11. The water ring pump 506 is started, and the vacuum degree in the low-temperature heating tank 502 and the condenser tank 503 is drawn to and maintained at approximately -0.094 MPa through the vacuum pipeline. Under this vacuum, the boiling point of water is significantly reduced. The heating device inside the low-temperature heating tank 502, under the control of the temperature controller, begins heating, stabilizing the waste liquid temperature at 30°C. The waste liquid boils at this low temperature, causing a large amount of water to evaporate, while contaminants such as developer and fixer are continuously concentrated. The concentrated, high-concentration waste liquid is periodically discharged through the drain port 6 at the bottom of the tank for further treatment. The water vapor generated by evaporation enters the condenser tank 503 under pressure differential. The refrigerator 507 sets the temperature of the condenser tank 503 to 20°C, condensing the water vapor into liquid water. The liquid water enters the cold water tank through a pipeline. The condensed gas-liquid mixture enters the gas-liquid separator tank 508 through the water ring pump 506 for secondary separation. The separated pure liquid water flows from the liquid outlet of the gas-liquid separator into the cold water tank 504 through a pipeline; the separated gas is discharged from the gas outlet of the gas-liquid separator. The liquid water flowing into the cold water tank 504 is further cooled to 20°C by the refrigerator 507. Water in cold water tank 504 is pumped to clean water tank 505 by transfer pump 16. Finally, the high-purity clean water stored in clean water tank 505 is transported through the water supply pipeline. During transport, the water flows through filter 14 inside the pipeline for precision filtration, intercepting any trace impurities. Shut-off valve 15 on the pipeline is also used for maintenance isolation and flow control, returning the water to developer tank 1, cleaning water tank 2, and fixer tank 3 as the base water for preparing new solutions, thus forming a complete water circulation system.

Claims

1. A water-circulating industrial constant-temperature film processor, comprising a developer tank (1), a cleaning water tank (2), a fixing solution tank (3), and a waste liquid collection tank (4), wherein the waste liquid in the developer tank (1), the cleaning water tank (2), and the fixing solution tank (3) is collected in the waste liquid collection tank (4), characterized in that, It also includes a water circulation purification system (5); the water circulation purification system (5) includes a pretreatment tank (501), a low-temperature heating tank (502), a condenser (503), a cold water tank (504), a clean water tank (505), a water ring pump (506), and a chiller (507) connected in sequence by pipelines; the water ring pump (506) is connected to the low-temperature heating tank (502) and the condenser (503) respectively through vacuum pipelines, and is used to heat the low-temperature heating tank (502). The condenser (503) provides and maintains a vacuum environment; the refrigerator (507) is connected to the condenser (503) and the cold water tank (504) respectively through refrigeration pipes; the low temperature heating tank (502) is provided with a drain outlet (6) for discharging concentrated waste liquid, and the condenser (503) is provided with a drain outlet (13) for discharging concentrated waste liquid; the clean water tank (505) is connected to the developer tank (1), the cleaning water tank (2) and the fixer tank (3) respectively through pipes.

2. The water-circulating industrial constant-temperature wafer washer according to claim 1, characterized in that, The water circulation purification system (5) also includes a steam-water separator (508); the outlet of the water ring pump (506) is connected to the steam-water separator (508) through a pipeline, the outlet of the steam-water separator (508) is connected to the cold water tank (504) through a pipeline, and the cold water tank (504) is connected to the cooling water inlet of the water ring pump (506) through a pipeline.

3. The water-circulating industrial constant-temperature wafer washer according to claim 1, characterized in that, The pretreatment tank is equipped with a pH detection port (7) and a regulator dispensing port (8); a pH sensor is installed at the pH detection port (7), and an automatic dosing device is connected to the regulator dispensing port (8).

4. The water-circulating industrial constant-temperature wafer washer according to claim 1, characterized in that, The pretreatment tank (501) and the low-temperature heating tank (502) are connected by a filter (9) and a shut-off valve (10).

5. The water-circulating industrial constant-temperature wafer washer according to claim 1, characterized in that, A transfer pump (11) is installed on the pipeline connecting the pretreatment tank (501) and the low-temperature heating tank (502).

6. The water-circulating industrial constant-temperature wafer washer according to claim 1, characterized in that, The low-temperature heating tank (502) includes a heating device and a temperature controller, wherein the heating device is electrically connected to the temperature controller.

7. The water-circulating industrial constant-temperature wafer washer according to claim 1, characterized in that, An overflow manual ball valve (12) is provided on the connecting pipe between the condenser (503) and the cold water tank (504).

8. The water-circulating industrial constant-temperature wafer washer according to claim 1, characterized in that, A second delivery pump (16) is provided on the pipeline connecting the cold water tank (504) and the clean water tank (505); the delivery pump delivers clean water to the clean water tank.

9. The water-circulating industrial constant-temperature wafer washer according to claim 1, characterized in that, The water purification tank (505) is connected to the developer tank (1), the cleaning water tank (2) and the fixer tank (3) by a filter 2 (14) and a shut-off valve 2 (15).

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