Arsenic phosphorus trap cleaning device
Patent Information
- Application Number
- CN202522471865.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-11-21
- Publication Date
- 2026-11-03
- Estimated Expiration
- 2035-11-21
AI Technical Summary
Existing arsenic and phosphorus trap cleaning equipment occupies a large volume, requiring the production workshop to send the equipment for cleaning, which consumes transportation time and costs, and the cleaning is not thorough, lacking the synergistic effect of dynamic rinsing and ultrasonic oscillation.
Design an arsenic and phosphorus trap cleaning device that includes a cleaning platform, an ultrasonic oscillator, a rinsing tank, a storage tank, and a circulation tank. The device uses a lifting device to drive the cleaning equipment to rise and fall for rinsing, and combines an ultrasonic oscillator and a circulation pump to achieve dynamic cleaning fluid circulation. It is also used with heating wires and filters.
It achieves comprehensive cleaning of arsenic-phosphorus traps, improves cleaning cleanliness, reduces cleaning fluid consumption, and lowers production costs, making it suitable for mass production of semiconductor devices.
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Figure CN224926632U_ABST
Abstract
Description
Technical Field
[0001] This utility model relates to the field of semiconductor cleaning equipment technology, specifically to an arsenic phosphorus trap cleaning device. Background Technology
[0002] In the manufacturing process of semiconductor devices (such as compound semiconductor devices), the arsenic phosphate trap is a critical semiconductor structure, and its surface cleanliness directly affects the electrical performance and reliability of the device. If contaminants such as photoresist, metal ions, and particulate impurities remain on the surface of the arsenic phosphate trap, it can lead to problems such as device leakage and abnormal breakdown voltage. Therefore, the cleaning process is crucial.
[0003] Currently, in actual processing, in order to clean the corresponding parts, the cleaning equipment occupies a large volume, which leads to the production workshop having to send the parts to a specialized cleaning company for cleaning.
[0004] Such high transportation and packaging time results in excessively long cycles, high costs, and decreased productivity.
[0005] Incomplete cleaning: Most devices are cleaned only by fixed spraying or soaking, lacking the synergistic effect of dynamic rinsing and ultrasonic oscillation, making it difficult to remove stubborn impurities adhering to the surface of the arsenic and phosphorus trap.
[0006] To address the aforementioned issues, there is an urgent need to design an arsenic-phosphorus trap cleaning device that balances cleaning efficiency and resource utilization. Utility Model Content
[0007] This invention aims to solve the above-mentioned technical problems by providing an arsenic-phosphorus trap cleaning device.
[0008] To solve the above-mentioned technical problems, the technical solution provided by this utility model is as follows:
[0009] An arsenic-phosphorus trap cleaning device includes a cleaning table and an ultrasonic oscillator. The cleaning table is provided with a rinsing tank, a storage tank and a circulation tank in sequence.
[0010] The rinsing tank is equipped with a lifting device that drives the cleaning equipment to rise and fall for rinsing, and an ultrasonic oscillator is installed inside the rinsing tank.
[0011] A filter screen is snapped onto the storage tank;
[0012] Heating wires are installed in both the rinsing tank and the circulation tank;
[0013] A circulation pump is installed inside the circulation tank, and a connection port is installed on the outside of the cleaning platform, which can be connected to the inside of the cleaning equipment through a pipe, and the output end of the circulation pump is connected to the input end of the connection port.
[0014] Preferably, a partition is installed opposite to each other in the rinsing tank, and the partition divides the rinsing tank into a clean area and an isolation area, and the heating wire and ultrasonic oscillator are installed in the clean area.
[0015] Preferably, the lifting device includes a cylinder fixedly connected to the isolation area and a support plate in the clean area. Connecting frames are installed on both sides of the support plate, and a connecting plate is installed on the telescopic end of the cylinder, with the other end of the connecting frame connected to the connecting plate.
[0016] Preferably, the connecting frame has an n-shaped structure, and a support shaft is connected between the connecting frame and the partition. A movable ball is rotatably connected to one end of the support shaft near the partition.
[0017] Preferably, a protective top is installed on the cleaning table.
[0018] Preferably, a rinsing water gun and an air gun are installed on the outside of the cleaning station.
[0019] Preferably, the filter screen is fitted with clips at its four corners.
[0020] With the above structure, this utility model has the following advantages:
[0021] This invention provides a more thorough cleaning process. By using a lifting device to move the arsenic phosphorus trap up and down in the cleaning area, combined with the high-frequency vibration of the ultrasonic oscillator, it can remove stubborn impurities from the surface in all directions, solving the problem of incomplete cleaning by traditional fixed methods.
[0022] The circulation pump and connection port of this invention enable the cleaning fluid to circulate between the circulation tank and the cleaning equipment, reducing the amount of cleaning fluid used per use, lowering production costs, and meeting the requirements of green production.
[0023] The above overview is for illustrative purposes only and is not intended to be limiting in any way. In addition to the illustrative aspects, embodiments, and features described above, further aspects, embodiments, and features of the present invention will become readily apparent from the accompanying drawings and the following detailed description. Attached Figure Description
[0024] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0025] Figure 1 This is a schematic diagram of the structure of this utility model.
[0026] Figure 2This is an installation diagram of the lifting device of this utility model.
[0027] As shown in the figure: 1. Cleaning table; 101. Rinsing tank; 102. Storage tank; 103. Circulation tank; 2. Lifting device; 201. Support plate; 202. Connecting frame; 203. Connecting plate; 204. Support shaft; 205. Movable ball; 3. Filter screen; 301. Locking block; 4. Heating wire; 5. Connection port; 6. Protective top; 7. Partition; 8. Rinsing water gun; 9. Air gun. Detailed Implementation
[0028] The embodiments of this application are described in detail below. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.
[0029] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "joining" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.
[0030] The present invention will now be described in further detail in conjunction with the full text.
[0031] Combined with appendix Figure 1 and Figure 2 An arsenic and phosphorus trap cleaning device includes a cleaning platform 1 and an ultrasonic oscillator. The ultrasonic oscillator is existing technology and a 28kHz ultrasonic oscillator (model: KS-2800) can be selected. The cleaning platform 1 is provided with a rinsing tank 101, a storage tank 102, and a circulation tank 103 in sequence. This utility model can clean one set of arsenic and phosphorus traps at the same time. G4 - arsenic trap size: 750*500mm, phosphorus trap size: 600*400mm; K475 - two sets of arsenic traps with a size of 800*400mm, two sets of phosphorus traps with a size of 400*400mm. The internal dimensions of a single storage tank 102, cleaning area, and circulation tank 103 are 1200*1200*800mm, and the external dimensions are 3000*1350*900mm.
[0032] In a specific implementation of this utility model, a lifting device 2 for driving the cleaning equipment to rise and fall for rinsing is installed in the rinsing tank 101, and an ultrasonic oscillator is installed in the rinsing tank 101; a filter screen 3 is snapped onto the storage tank 102; heating wires 4 are installed in both the rinsing tank 101 and the circulation tank 103, and the ultrasonic oscillator can perform vibration cleaning, which can avoid the risk of fire, reduce smoke, and prevent external exhaust from affecting environmental protection and safety.
[0033] A circulation pump is installed inside the circulation tank 103. A connection port 5 is installed on the outside of the cleaning platform 1, which can be connected to the inside of the cleaning equipment through a pipe, and the output end of the circulation pump is connected to the input end of the connection port 5.
[0034] In a specific implementation of this invention, a partition 7 is installed opposite to the rinsing tank 101, dividing the rinsing tank 101 into a clean area and an isolation area. A leakage hole is provided in the partition 7. A heating wire 4 and an ultrasonic oscillator are installed in the clean area. The lifting device 2 includes a cylinder fixedly connected to the isolation area and a support plate 201 in the clean area. Connecting frames 202 are installed on both sides of the support plate 201. A connecting plate 203 is installed at the telescopic end of the cylinder, and the other end of the connecting frame 202 is connected to the connecting plate 203. The connecting frame 202 has an n-shaped structure. A support shaft 204 connects the connecting frame 202 and the partition 7. A movable ball 205 is rotatably connected to one end of the support shaft 204 near the partition 7.
[0035] Specifically, a protective top 6 is installed on the cleaning station 1.
[0036] Specifically, a water gun 8 and an air gun 9 are installed on the outside of the cleaning station 1. The air gun 9 has an air pressure of 0.3-0.5 MPa (drying time ≤2 min, residual moisture ≤0.1 g / m², to avoid water stains), and is connected to external compressed air (filtered at 0.1 μm, free of oil and impurities) for drying after cleaning. The water gun 8 has a water pressure of 0.2-0.4 MPa (based on the fact that this water pressure can wash away residual impurities and does not scratch the surface of the arsenic phosphate trap (hardness HV200), and tests show that the surface is undamaged under 0.4 MPa water pressure), and is connected to external pure water for secondary spraying after cleaning.
[0037] In a specific implementation of this utility model, the filter screen 3 is equipped with four corner clips 301. A rubber clip 301 is fixed at each of the four corners of the filter screen 3. The clip 301 is adapted to the slot of the storage groove 102, so as to realize the detachable installation of the filter screen 3, which is convenient for regular cleaning or replacement.
[0038] The working principle of this utility model:
[0039] Inject semiconductor-specific cleaning fluid, such as diluted hydrofluoric acid solution, into rinsing tank 101 and circulation tank 103, start heating wire 4, and stabilize the cleaning fluid temperature at 50°C using temperature controller.
[0040] The cylinder drives the connecting plate 203, connecting frame 202 and support plate 201 to rise, and places the arsenic phosphorus trap to be cleaned on the support plate 201. Specifically, the arsenic phosphorus trap can be fixedly connected to the support plate 201 by bolts or anti-corrosion wire clamps.
[0041] The ultrasonic oscillator at 28kHz and the cylinder are activated. The cylinder drives the connecting plate 203, connecting frame 202, and support plate 201 to move up and down at a speed of 5mm / s and a stroke of 80mm. The arsenic-phosphorus trap moves dynamically in the cleaning solution, achieving all-round cleaning in conjunction with ultrasonic vibration.
[0042] After cleaning, the arsenic-phosphorus trap can be placed on the filter screen 3 of the storage tank 102, and the cleaning solution will automatically fall into the storage tank 102.
[0043] The inlet of the arsenic-phosphorus trap can be connected via connection port 5, and the outlet of the arsenic-phosphorus trap can be directly connected to the circulation tank 103 via a pipeline to form a circulation pipeline. The circulation pump is started to deliver the clean cleaning solution in the circulation tank 103 to the internal cleaning area of the arsenic-phosphorus trap through connection port 5, thereby achieving cleaning solution circulation.
[0044] The device in this embodiment can effectively improve the cleaning cleanliness of arsenic phosphorus traps, increase the cleaning fluid utilization rate by more than 60%, and is safe and convenient to operate, making it suitable for the arsenic phosphorus trap cleaning process in the mass production of semiconductor devices.
[0045] The present invention and its embodiments have been described above. This description is not restrictive, and the embodiments shown throughout the text are only one of the embodiments of the present invention. The actual structure is not limited to this. In conclusion, if a person skilled in the art is inspired by this description and designs a similar structure and embodiment without departing from the inventive spirit of the present invention, such design should fall within the protection scope of the present invention.
Claims
1. An arsenic-phosphorus trap cleaning device, comprising a cleaning table (1) and an ultrasonic oscillator, characterized in that, The cleaning station (1) is provided with a rinsing tank (101), a storage tank (102) and a circulation tank (103) in sequence. The rinsing tank (101) is equipped with a lifting device (2) that drives the cleaning equipment to rise and fall for rinsing, and an ultrasonic oscillator is installed in the rinsing tank (101); A filter screen (3) is snapped onto the storage tank (102); Heating wires (4) are installed in both the rinsing tank (101) and the circulation tank (103); A circulation pump is installed in the circulation tank (103), and a connection port (5) that can be connected to the inside of the cleaning equipment through a pipe is installed on the outside of the cleaning platform (1), and the output end of the circulation pump is connected to the input end of the connection port (5).
2. The arsenic-phosphorus trap cleaning device according to claim 1, characterized in that: The rinsing tank (101) is equipped with a partition (7) which divides the rinsing tank (101) into a clean area and an isolation area. The heating wire (4) and the ultrasonic oscillator are installed in the clean area.
3. The arsenic-phosphorus trap cleaning device according to claim 2, characterized in that: The lifting device (2) includes a cylinder fixedly connected to the isolation area and a support plate (201) in the clean area. Connecting frames (202) are installed on both sides of the support plate (201). A connecting plate (203) is installed on the telescopic end of the cylinder and the other end of the connecting frame (202) is connected to the connecting plate (203).
4. The arsenic-phosphorus trap cleaning device according to claim 3, characterized in that: The connecting frame (202) has an n-shaped structure. A support shaft (204) is connected between the connecting frame (202) and the partition (7). A movable ball (205) is rolled on one end of the support shaft (204) near the partition (7).
5. The arsenic-phosphorus trap cleaning device according to claim 1, characterized in that: A protective top (6) is installed on the cleaning station (1).
6. The arsenic-phosphorus trap cleaning device according to claim 1, characterized in that: A rinsing water gun (8) and an air gun (9) are installed on the outside of the cleaning station (1).
7. The arsenic-phosphorus trap cleaning device according to claim 1, characterized in that: The filter screen (3) is equipped with clips (301) at its four corners.
