Nasal abutment implant (PEEK polyetheretherketone)
CN309264527SActive Publication Date: 2025-04-29SHANGHAI MUYUN ENTERPRISE DEVELOPMENT CO LTD
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Patent Information
- Application Number
- CN202430486222.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-01
- Publication Date
- 2025-04-29
- Estimated Expiration
- 2039-08-01
Smart Images
Figure 000003_ABST
Abstract
1. The name of the product of this design: nasal base prosthesis (PEEK polyetheretherketone). 2. Purpose of the product of this design: to repair nasal base bone defect and nasal base bone surface hypoplasia. 3. The design key point of this appearance design product lies in the shape. 4. The picture or photo that best illustrates the design points: three-dimensional picture.
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