Fully automatic mask alignment lithography equipment
CN309352870SActive Publication Date: 2025-06-24SHANGHAI TUSHUANG PRECISION EQUIP CO LTD
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Patent Information
- Application Number
- CN202430701850.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-06
- Publication Date
- 2025-06-24
- Estimated Expiration
- 2039-11-06
Smart Images
Figure 000001_ABST
Abstract
1. Name of the design product: Fully automatic mask alignment lithography equipment. 2. Use of the design product: This design is used for processing microelectronic devices. 3. Design key points of the design product: Lies in the shape. 4. Picture or photo that best shows the design key points: Front view. 5. The claimed design includes color. 6. Since the six views can fully and clearly express the structure of this application, the perspective view is omitted.
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