Dual chamber gas release test bench
CN309745016SActive Publication Date: 2026-01-23BEIJING VACUUM ELECTRONIC TECH CORP
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Patent Information
- Application Number
- CN202530394202.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-07
- Publication Date
- 2026-01-23
- Estimated Expiration
- 2040-07-07
Smart Images
Figure 000007_ABST
Abstract
1. The name of the design product: double cavity gas release test platform. 2. The use of the design product: for the test and verification of the outgassing rate of metal materials and low outgassing components and large equipment in vacuum, usually for large processing parts of semiconductor equipment. 3. The design points of the design product: the combination of shape and pattern. 4. The picture or photo that best shows the design points: perspective view 1.
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