skirt (pleated umbrella skirt)
CN309747759SActive Publication Date: 2026-01-27YOUYI (SHANGHAI) BRAND MANAGEMENT CO LTD
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Patent Information
- Application Number
- CN202530438402.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-25
- Publication Date
- 2026-01-27
- Estimated Expiration
- 2040-07-25
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Figure 000001_ABST
Abstract
1. Name of the product in this design: Half skirt (pleated umbrella skirt). 2. Intended use of this design: for wearing. 3. The key design features of this product are the combination of shape and pattern. 4. The image or photograph that best illustrates the design's key features: the front view. 5. The submitted views already include top view information, so the top view is omitted; the bottom surface of this design product is a part that is not easily seen or cannot be seen during use, so the bottom view is omitted. 6. Other situations requiring explanation: The clothing model in the design drawings is a supporting element and does not fall under the scope of the design for which protection is sought.
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