Exhaust gas treatment equipment (for semiconductor industry)
CN309859438SActive Publication Date: 2026-03-20ZHONGJIWEI (SHANGHAI) FILTRATION SYSTEM CO LTD
View PDF 0 Cites 0 Cited by
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-15
- Publication Date
- 2026-03-20
Smart Images
Figure 000007_ABST
Abstract
1. Name of the designed product: exhaust gas treatment equipment (for the semiconductor industry). 2. Use of the designed product: mainly used for the treatment of exhaust gas generated in the production process of the semiconductor industry (semiconductor, panel, solar energy, LED). 3. Design points of the designed product: the combination of shape and color. 4. Picture or photo that best shows the design points: perspective view 1. 5. The design includes color.
Need to check novelty before this filing date? Find Prior Art