Adjustable mask plate sample holder
CN309873231SActive Publication Date: 2026-03-27国成仪器(常州)有限公司
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-09-08
- Publication Date
- 2026-03-27
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Figure 000004_ABST
Abstract
1. The name of the design product: adjustable mask plate sample holder. 2. The use of the design product: the product is used in molecular beam epitaxy equipment to replace mask plate outside the vacuum, and the relative position of the mask plate and the sample can be adjusted with high precision through the displacement table. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: perspective view.
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