Atomic layer etching gas distribution ring (ALE)
CN309900989SActive Publication Date: 2026-04-07INST OF MICROELECTRONICS CHINESE ACAD OF SCI LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-25
- Publication Date
- 2026-04-07
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Figure 000006_ABST
Abstract
1. The name of the design product: atomic layer etching gas distribution ring (ALE). 2. The use of the design product: used in etching process, especially suitable for ALE atomic layer etching equipment process gas inlet uniformity. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: perspective view 1. 5. The left view, right view, rear view and front view are the same, omit the left view, right view and rear view. 6. Other circumstances that need to be explained Other explanation: I part enlarged view is a partial enlarged view in sectional view.
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