Gas mask (double canister half mask with quick-release buckle HF820QL)
CN309965475SActive Publication Date: 2026-05-05XIAMEN KECHUANGYI IND & TRADE CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- XIAMEN KECHUANGYI IND & TRADE CO LTD
- Filing Date
- 2025-09-30
- Publication Date
- 2026-05-05
Smart Images
Figure 000005_ABST
Abstract
1. Name of the product in this design: Gas mask (double canister half mask quick-release buckle HF820QL). 2. Purpose of this design: For use in gas masks. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: 3D view 1.
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