Atomic layer deposition apparatus
CN309970245SActive Publication Date: 2026-05-08XIAMEN YUNMAO TECH CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- XIAMEN YUNMAO TECH CO LTD
- Filing Date
- 2025-10-23
- Publication Date
- 2026-05-08
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Figure 000006_ABST
Abstract
1. The name of the design product: atomic layer deposition equipment. 2. The use of the design product: for preparing thin films with atomic precision on the surface of a substrate. 3. The design points of the design product: in shape. 4. The picture or photo that best shows the design points: perspective view 1. 5. The bottom surface of the design product is the part that is not easy to see or cannot be seen during use, and the top view is omitted.
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