Wafer cleaning machine (single-wafer integrated multi-process model)
CN309976845SActive Publication Date: 2026-05-12WEICHENG SEMICONDUCTOR EQUIPMENT (SUZHOU) CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- WEICHENG SEMICONDUCTOR EQUIPMENT (SUZHOU) CO LTD
- Filing Date
- 2025-11-11
- Publication Date
- 2026-05-12
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Figure 000003_ABST
Abstract
1. Name of the product in this design: Wafer Cleaning Machine (Single-Wafer Integrated Multi-Process Model). 2. Purpose of this design: For cleaning silicon carbide wafers and drying the wafers after cleaning. 3. The key design feature of this product is its shape. 4. The image or photograph that best illustrates the design's key points: 3D view 1.
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