Vacuum gauge (Pirani diffused silicon)
CN309988952SActive Publication Date: 2026-05-19ANHUI WAYEE SCI & TECH CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- ANHUI WAYEE SCI & TECH CO LTD
- Filing Date
- 2025-11-08
- Publication Date
- 2026-05-19
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Figure 000005_ABST
Abstract
1. Name of the product in this design: Vacuum Gauge (Pirani Diffused Silicon). 2. Purpose of this design: Primarily used for real-time monitoring of vacuum levels in enclosed spaces. 3. The key design features of this product are the combination of shape and pattern. 4. The image or photograph that best illustrates the design's key features: the front view.
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