Cloth (monogram pattern)
CN309994716SActive Publication Date: 2026-05-26BIEM L FDLKK GARMENT CO LTD
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Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Designs(China)
- Current Assignee / Owner
- BIEM L FDLKK GARMENT CO LTD
- Filing Date
- 2025-11-28
- Publication Date
- 2026-05-26
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Figure 000001_ABST
Abstract
1. Name of the product in this design: Cloth (Monogram). 2. Intended use of this design: for textile products. 3. The key design feature of this product is its pattern. 4. The image or photograph that best illustrates the design's key points: the front view. 5. The back of this design product is a part that is not easily seen or cannot be seen during use, so the rear view is omitted; this design product is a thin product, so the left view is omitted; this design product is a thin product, so the right view is omitted; this design product is a thin product, so the top view is omitted; this design product is a thin product, so the bottom view is omitted. 6. This design is a planar product with continuous four sides and no defined boundaries.
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