SCREEN AND ITS MANUFACTURING PROCESS

Abstract

A screen with - a TFT substrate (23, 24) and a color film substrate (22) which are opposite to each other, wherein on a surface of the TFT substrate (23, 24) facing the color film substrate (22) a number of pixel units are arranged, each of which comprises a first TFT element (23), a second TFT element (24) and a pixel zone, and wherein the pixel zone is a transparent area between the first TFT element (23) and the second TFT element (24); - each of the pixel units comprises a transparent reference potential layer arranged on a surface of the TFT substrate (23, 24) facing the color film substrate (22) and an impermeable deformation layer (26) arranged on the reference potential layer, wherein the deformation layer (26) and the reference potential layer are insulated from each other; - wherein the output electrode (233) of the first TFT element (23) of each pixel unit is electrically connected to the reference potential layer, and the output electrode (243) of the second TFT element (24) of each pixel unit is electrically connected to the deformation layer (26), so that the deformation layer (26) is subjected to the elastic deformation corresponding to the voltage difference around a part of the deformation layer (26) fixedly connected to the TFT substrate (23, 24) as a fixed axis, in dependence on its voltage difference with respect to the reference potential layer, in order to change the coverage area of ​​the deformation layer (26) at the pixel zone of each pixel unit; - a support element (29) is arranged between the TFT substrate (23, 24) and the color film substrate (22), the thickness of the support element (29) being greater than the distance between the highest point of the deformation layer (26) and the surface of the TFT substrate (23, 24) which occurs during the maximum deformation of the deformation layer (26), the transparent area of ​​the pixel zone being equal to the total area of ​​the pixel zone less the covering area of ​​the deformation layer (26) at the pixel zone.

Description

FIELD OF THE INVENTIONThe invention relates to the technical field of the display device, in particular to a screen and its production method.BACKGROUND OF THE INVENTIONLiquid crystal display devices (LCDs) are prevalent due to their low power consumption, large screen manufacturing simplification, and so forth.Typically, a present liquid crystal display device comprises a TFT substrate and a color film substrate which are opposed to each other, and a liquid crystal layer disposed between the TFT substrate and the color film substrate. In order to realize the control of the leakage light from the liquid crystal molecules of the liquid crystal layer, it is necessary that a common electrode is disposed on an inner surface of the color film substrate and an upper polarizer is disposed on an outer surface thereof, and an alignment layer is disposed on an inner surface of the TFT substrate and a lower polarizer is disposed on an outer surface thereof. Thus, the structure of the liquid crystal display device is complicated, resulting in high cost.US 5 781 331 A describes an optical shutter device comprising an illumination source and a first aperture plate positioned in a path of light of the illumination source. A cantilever fastener is disposed in the orifice plate of each orifice and includes at least two layers bonded together, one being an electrical resistive layer having a first coefficient of thermal expansion (TCE) and the second layer having a second TCE different than the first TCE. A proximal end of the bonded layers is attached to the orifice plate of each orifice, and a further part thereof covers the respective orifice at a position above. A control device applies signals to the first electrical resistive layer to cause heating of the first and second layers and resultant unequal expansion thereof. The expansion causes the cantilever closure to flex and moves the distal portion thereof to uncover the aperture which, when uncovered, enables it to be transilluminated.US 2010 / 0 053 727 A1 describes a flat screen display device which displays an image with the aid of a micro shutter electrode and a diffusely reflecting layer. Gray levels may be determined by an electrostatic force between the pixel electrode and the micro shutter electrode.WO 2012 / 165 745 A1 describes an optical display device with bistability, which includes a substrate, a precharge electrode unit that is disposed on the substrate and in which electric charge is precharged, a drive unit that is disposed on the substrate, is displaced stretched in one direction by thermal expansion and is bent with an initial state toward an upper direction, a shutter unit that is connected to the drive unit and that moves to cover the precharge electrode unit by the displacement of the drive unit, and a signal line that allows current to the drive unit.SUMMARY OF THE INVENTIONIn order to solve the above technical problem, the present invention provides a display screen which is simple in structure and inexpensive to manufacture.In order to achieve the object, the invention provides a technical solution as follows:A display screen comprising a TFT substrate and a color film substrate which are opposed to each other, wherein a number of pixel units each comprising a first TFT element, a second TFT element and a pixel region are arranged on a surface of the TFT substrate facing the color film substrate, and wherein the pixel region is a transparent region between the first TFT element and the second TFT element; wherein each of the pixel units comprises a reference transparent potential layer arranged on the surface of the TFT substrate facing the color film substrate and an opaque deformation layer arranged on the reference potential layer, wherein the deformation layer and the reference potential layer are insulated from each other, and wherein an output electrode of the first TFT element of each pixel unit is electrically connected to the reference potential layer and an output electrode of the second TFT element of each pixel unit is electrically connected to the deformation layer, wherein the deformation layer, depending on its voltage difference from the reference potential layer, can be subjected to elastic deformation corresponding to the voltage difference around a part of the deformation layer firmly connected to the TFT substrate as a fixed axis, in order to change the covering area of the deformation layer at the pixel zone of each pixel unit, wherein a supporting element is arranged between the TFT substrate and the color film substrate, wherein the thickness of the supporting element is greater than the distance between the maximum point of the deformation layer and the surface of the TFT substrate, which distance occurs during the maximum deformation of the deformation layer, wherein the transparent area of the pixel zone equals the total area of the pixel zone minus the coverage area of the deformation layer at the pixel zone.In addition, the present invention provides a manufacturing method of a display screen. The manufacturing method includes:providing a TFT substrate comprising a number of pixel units each comprising a first TFT element, a second TFT element and a pixel region;forming a first groove communicating with an output electrode of the first TFT element and a second groove communicating with an output electrode of the second TFT element on an insulating layer on an upper surface of the TFT substrate;forming a reference potential layer on the upper surface of the TFT substrate electrically connected to the output electrode of the first TFT element through the first groove;forming a deformation layer on the reference potential layer, which is electrically connected to the output electrode of the second TFT element via the second groove and insulated from the reference potential layer;providing a color film substrate and applying the color film substrate to the TFT substrate, wherein the deformation layer and the reference potential layer are located between the color film substrate and the TFT substrate;wherein the deforming layer around its part fixedly connected to the TFT substrate may be subjected to the different elastic deformation as a fixed axis to change the coverage area of the deforming layer at the pixel region between the first TFT element and the second TFT element of each pixel unit;wherein a support element is arranged between the TFT substrate and the color film substrate, wherein the thickness of the support element is greater than the distance between the highest point of the deformation layer and the surface of the TFT substrate which occurs during the maximum deformation of the deformation layer, wherein the transparent region of the pixel zone equals the total area of the pixel zone minus the covering area of the deformation layer at the pixel zone.As can be seen from the above technical solution, in the invention, a display screen and its manufacturing method are provided. The pixel unit of the flat panel display comprises a transparent reference potential layer arranged firmly on the surface of the TFT substrate facing the color film substrate, and an impermeable deformation layer arranged between the reference potential layer and the color film substrate, which deformation layer is insulated from the reference potential layer. The deformation layer may be subjected to elastic deformation corresponding to the stress difference around its part fixedly connected to the TFT substrate as a fixed axis. Thus, the voltage of the reference potential layer may be controlled by means of the first TFT element and the voltage of the deformation layer may be controlled by means of the second TFT element, so that the voltage difference between the deformation layer and the reference potential layer and thus the coverage area of the deformation layer at the pixel zone may be adjusted to adjust the light transmittance of the pixel zone.It can be seen that, owing to the omission of the liquid crystal materials in the flat screen, the adjustment of the light transmittance of the pixel zone can be achieved by means of the reference potential layer and the deformation layer. This simplifies the structure as compared with the conventional liquid crystal display. By eliminating the arrangement of the common electrode and the upper polarizer on the color film substrate and the arrangement of the alignment layer and the lower polarizer on the TFT substrate, the manufacturing process is simpler and thus the cost is low.BRIEF DESCRIPTION OF THE DRAWINGSIn order to explain embodiments of the invention or technical solutions in the prior art in more detail, the drawings required for the description of embodiments or the prior art are briefly presented. The drawings in the following description represent only the embodiments of the invention from which the person skilled in the art can obtain other drawings without inventive work. FIG. 1 ais a schematic structural diagram of a screen according to an embodiment of the invention; FIG. 1 bis a schematic structural diagram of the pixel unit of the screen of FIG. 1 ; FIG. 2 is a schematic illustration of the control principles for a display screen according to an embodiment of the invention; FIGS. 3-6 are schematic flow diagrams of the method of manufacturing a screen according to an embodiment of the invention.DETAILED DESCRIPTIONAs described in the background of the invention, in a liquid crystal display device of the present invention, the control of the output light is achieved by the deflection of the liquid crystal molecules of the liquid crystal layer. It is required that a common electrode is disposed on the inner surface of the color film substrate and an upper polarizer is disposed on the outer surface thereof, and an alignment layer is disposed on the inner surface of the TFT substrate and a lower polarizer is disposed on the outer surface thereof. Due to the complex structure of the liquid crystal display device, it results in high cost.The inventor has found that by arranging an opaque deformation layer and a reference potential layer at the pixel zone of the TFT substrate by means of the TFT elements of the TFT substrate, the voltage of the deformation layer and the reference potential layer and thus the different deformations of the deformation layer can be adjusted, i.e. the light transmittance of the pixel unit can be adjusted by means of the deformation layer. In this case, the control of the image displays is realized without liquid crystal materials.Based on the above-mentioned studies, the present invention provides a screen. The screen includes:a TFT substrate and a color film substrate which are opposed to each other, the TFT substrate comprising a first TFT element and a second TFT element, wherein a transparent region is located between the first TFT element and the second TFT element as a pixel region;a pixel unit disposed on a surface of the TFT substrate facing the film substrate and disposed on a surface of the pixel region, the pixel unit comprising a reference transparent potential layer disposed on the surface of the TFT substrate facing the color film substrate and an opaque deformation layer disposed on the reference potential layer, the deformation layer and the reference potential layer being insulated from each other;wherein an output electrode of the first TFT element is electrically connected to the reference potential layer and an output electrode of the second TFT element is electrically connected to the strain layer, so that the strain layer may be subjected to elastic deformation corresponding to the voltage difference depending on voltage difference therefrom to the reference potential layer around a part of the strain layer fixedly connected to the TFT substrate as a fixed axis to change the coverage area of the strain layer at the pixel region.In the screen of the invention, the voltage of the reference potential layer can be controlled by means of the first TFT element and the voltage of the deformation layer can be controlled by means of the second TFT element, so that the voltage difference between the deformation layer and the reference potential layer and thus the covering area of the deformation layer at the pixel zone can be adjusted to adjust the light transmittance of the pixel zone.It can be seen that, owing to the omission of the liquid crystal materials in the flat screen, the adjustment of the light transmittance of the pixel zone can be achieved by means of the reference potential layer and the deformation layer. This simplifies the structure as compared with the conventional liquid crystal display. By eliminating the arrangement of the common electrode and the upper polarizer on the color film substrate and the arrangement of the alignment layer and the lower polarizer on the TFT substrate, the manufacturing process is simpler and thus the cost is low.The basis of the invention is described above. Hereinafter, in conjunction with the drawings, in embodiments, the technical solutions of the embodiments of the invention will be clearly and fully described. However, the disclosed embodiments are only a part of the embodiments of the invention and not all the embodiments. Starting from the embodiments of the invention, the other embodiments, which can be obtained by the person skilled in the art without inventive work, fall within the scope of protection of the invention.In the following description, many specific details are set forth in order to fully understand the invention. However, the invention may be practiced otherwise than as illustrated herein. The skilled person can make similar developments without departing from the scope of the invention. Thus, the invention is not limited to the following disclosed embodiments.The invention will be explained in more detail in conjunction with drawings. In order to simplify the illustration, the schematic illustrations showing structures of the elements are not enlarged to scale in the explanation of the embodiments of the invention, and only examples that do not limit the scope of the invention. In addition, in practical production, a three-dimensional space of length, width and depth is to be contained.Based on the principles described above, a screen is provided according to the invention. As shown in FIG. 1 a, the display screen includes a TFT substrate 21 and a color film substrate 22 that are opposed to each other; and a pixel unit disposed on the surface of the TFT substrate 21 facing the film substrate 22.The color film substrate 22 includes a first substrate 221, and a black matrix 222 and a color light filter film 223 disposed on the surface of the first substrate facing the TFT substrate 21. The area to which black matrix 222 corresponds represents an opaque non-display zone. The screen preferably also comprises a transparent electrically conductive layer (not shown in FIG. 2 ) which is arranged on the surface of the color film substrate facing away from the TFT substrate and serves for protection against the static electricity and can be an ITO layer.The TFT substrate includes a second substrate 211, and a first TFT element 23 and a second TFT element 24 disposed on a surface of the second substrate 211 facing the color film substrate 22. The first TFT element includes a control electrode 231, an input electrode 232, and an output electrode 233. The second TFT element 24 includes a control electrode 241, an input electrode 242, and an output electrode 243.Between the first TFT element 23 and the second TFT element 24, there is a transparent region as a pixel region. The control electrode is a gate of the TFT element. The input electrode is a source of the TFT element. The output electrode is a drain of the TFT element.Referring to FIGS. 1 aand 1 b, the pixel unit includes a reference transparent potential layer 25 and an opaque deformation layer 26. the pixel unit is disposed on a surface of the pixel region, the reference potential layer 25 is disposed on a surface of the TFT substrate 21 facing the color film substrate 22, and the deformation layer 26 is disposed on the reference potential layer 23 and is insulated from the reference potential layer. The reference potential layer 25 is covered with a transparent insulating layer 27.The output electrode 233 of the first TFT element 23 is electrically connected to the reference potential layer 25 so that the voltage of the reference potential layer 25 is controlled by the output electrode 233. The output electrode 243 of the second TFT element 24 is electrically connected to the strain layer 26, so that the voltage of the strain layer 26 is controlled by the output electrode 243.The deformation layer 26 is an elastically deformable electrically conductive layer. If the voltages of the deformation layer 26 and the reference potential layer 25 are unequal, both electric field strengths are different, resulting in different electric field forces acting on the deformation layer 26. The deformation layer 26 may be subjected to elastic deformation corresponding to the voltage difference depending on the voltage difference thereof to the reference potential layer 25 around a part of the deformation layer firmly connected to the TFT substrate as a fixed axis to change the coverage area of the deformation layer at the pixel region.In order to prevent the deformation layer 26 from becoming detached, a protective layer 28 is also arranged on the surface of the connection region, so that the deformation layer is more firmly connected to the TFT substrate 21. The protective layer 28 comprises a material having high adhesion, as silicon dioxide.The TFT substrate 21 is fixedly connected to the color film substrate 22 through a support member 29. The thickness of the support member 29 is larger than the distance between the peak of the deformation layer 26 and the surface of the TFT substrate established at the maximum deformation of the deformation layer 26, so that there is sufficient space in a vertical direction for the elastic deformation of the deformation layer 26. The shape of the support member 29 may include a cylindrical structure, a cube structure, a ball structure, a cone structure, or a stair structure.In order to reduce air resistance, the pixel unit is a seal space whose pressure is lower than the standard atmospheric pressure, so that the resistance of the gas pressure preventing the movement of the deformation layer 26 is reduced. The seal space is filled only with an oxidation suppressing gas that is nitrogen, any inert gas, mixed gas of a plurality of inert gases, or mixed gas of nitrogen and one or more inert gases, in order to avoid aging of the forming layer 26 due to oxidation and thus ensure the longer life of the forming layer.In this embodiment, the deformation layer 26 may include, but is not limited to, titanium, copper, silver, or aluminum. The thickness of the deformation layer 26 is 1 nm to 10,000 nm inclusive. The determined thickness may be adjusted depending on the degree of deformation.Referring to Fig. 2, it shows the different transparences of three pixel units on the TFT substrate 21, and no voltages are applied to the reference potential layer 25 and the deformation layer 26 of the left pixel unit, thus the deformation layer 26 remains in the initial state and transmits part of the light. Voltages of opposite polarity are applied to the reference potential layer 25 and the middle pixel unit strain layer 26, so that the strain layer 26 completely covers the surface of the insulating layer 27 and does not transmit the light. Voltages of the same polarity are applied to the reference potential layer 25 and the deformation layer 26 of the right pixel unit, so that the deformation layer 26 tilts upward and elastically deforms and backlight can be passed. Thereby, the light transmittance can be adjusted by controlling the tilting amount of the deformation layer.From the above description, it is understood that the degree of deformation of the deformation layer can be adjusted by controlling the voltage difference between the deformation layer and the reference potential layer and the respective polarity, and thus the coverage area of the deformation layer at the pixel region, and thus the light transmittance, so that image representations having different gray levels are realized.As a result, the flat panel does not need liquid crystal materials. With the reference potential layer and the deformation layer, adjustment of the light transmittance of the pixel region can be achieved. This simplifies the structure as compared with the conventional liquid crystal displays. It is not necessary to arrange a common electrode and an upper polarizer on the color film substrate, and to arrange an alignment layer and a lower polarizer on the TFT substrate. Thus, the manufacturing process is simpler and the cost is low.In a further embodiment of the invention, a production method for the screen described above is provided, comprising the following method steps:Step S 11: Providing a TFT substrate 21, referring to FIG. 3.The TFT substrate 21 includes a second substrate 211, and a first TFT element 23 and a second TFT element 24 disposed on a surface of the second substrate 211. The first TFT element includes a control electrode 231, an input electrode 232, and an output electrode 233. The second TFT element 24 includes a control electrode 241, an input electrode 242, and an output electrode 243. The TFT substrate 21 further includes a passivation layer 212 covering the first TFT element 23 and the second TFT element 24.Step S 12: Forming a first groove A and a second groove B on the TFT substrate 21, with reference to FIG. 4.The first groove A and the second groove B may be formed by a process such as photolithography or laser etching. The first groove A communicates with the output electrode 233 of the first TFT element 23, and the second groove B communicates with the output electrode 243 of the second TFT element 24.Step S 13: forming a reference potential layer 25 on a surface of the TFT substrate 21, referring to FIG. 5 : The reference potential layer 25 is electrically connected to the output electrode 233 of the first TFT element 23 via the first groove A.First, a transparent electroconductive layer may be formed over the whole surface of the TFT substrate 21 with the material of the transparent electroconductive layer deposited in the groove A to make electrical connection with the output electrode 233. Thereafter, the transparent electroconductive layer is etched through a photolithography process to form the reference potential layer 25 having a certain shape.Step S 14: forming a deformation layer 26 on the reference potential layer 25, referring to FIG. 6, the deformation layer 26 is electrically connected to the output electrode 243 of the second TFT element 24 via the second groove B, the deformation layer being insulated from the reference potential layer.In this procedure, in order to ensure insulation between the strain layer 26 and the reference potential layer 25, an insulating layer 27 having a certain shape is first formed on the surface of the reference potential layer 25. A photoresist layer is applied to the insulating layer 27. After curing the photoresist, the deformation layer 26 is formed on the photoresist layer. By means of coating and etching process, the deformation layer is formed with a specific shape. When coated, the second groove B is filled with the material of the deformation layer 26 to establish the electrical connection between the deformation layer 26 and the output electrode 243 of the second TFT element 24. Finally, the photoresist is removed, so that the deformation layer 26 is fixed only via its part connected to the second groove B. As a result, the remaining part can elastically deform.In order to more firmly attach the strain layer 26 to the TFT substrate, a protective layer 28 is formed on the part of the strain layer connected to the TFT substrate. The protective layer 28 may be a silicon dioxide layer formed by deposition coating and etching process.Step S15: Providing a color film substrate 22 and abutting the color film substrate 22 on the TFT substrate 21, with the deformation layer 26 and the reference potential layer 25 being located between the color film substrate 22 and the TFT substrate 21, so that the screen structure is finally obtained as shown in Fig. 1.The deformation layer 26 may be subjected to the different elastic deformation around its part fixedly connected to the TFT substrate as a fixed axis to change the coverage area of the deformation layer at the pixel region between the first TFT element and the second TFT element.In order to avoid the light leakage at the edge, the part of the deformation layer 26 connected to the TFT substrate is covered by the projection of a black matrix 222 of the color film substrate 22 on the TFT substrate, i.e., the projection area of the deformation layer 26 on the TFT substrate is larger than an opening of the black matrix 222.Before the color film substrate 22 is attached to the TFT substrate 21, a transparent electroconductive layer may be formed on a surface of the color film substrate opposite to the TFT substrate to prevent the screen from being disturbed by static electricity.The color film substrate 22 and the TFT substrate 21 are densely arranged under low pressure to decrease the resistance to the deformation layer 26. Between the color film substrate 22 and the TFT substrate 21, an oxidation suppressing gas is filled to prevent oxidation of the deformation layer 26 and ensure the durability of the deformation layer 26.From the above description, it is understood that the display screen manufactured by the manufacturing method according to the embodiments of the invention does not need liquid crystal cells. In the manufacturing process, the planarization treatment of the liquid crystal layer is not required. It is not necessary to arrange a common electrode and an upper polarizer on the color film substrate, and to arrange an alignment layer and a lower polarizer on the TFT substrate. Thus, the manufacturing process is simpler and the cost is low.Note that, in the invention, the embodiments for the screen and the embodiments for the method focus differently, and the same and similar descriptions can be further explained with respect to each other. In the context, the terms "first" and "second" are used only to distinguish one element or handle from another element or handle and need not require or denote the practical relationship or sequence between these elements and these handles. The verbs in the invention "comprise", "contain" and the variation thereof mean that other elements and steps may be present in addition to the described elements and steps. The articles prior to the items "a" and "an" do not exclude the presence of a plurality of such items. In addition, the structure of the TFT element may be implemented as an a-Si amorphous silicon structure, LTPS low temperature polysilicon structure, or oxide semiconductor structure (e.g., IGZO).Although the spirit and principle of the invention will be described with reference to the specific embodiments, it should be understood that the invention is not limited to the disclosed embodiments. The division of the aspects does not mean that the features cannot be combined with each other in these aspects. The classification is used only for better description. The invention is intended to embrace all modifications and equivalents within the spirit and principle of the appended claims. The scope of the appended claims is to be accorded the broadest interpretation so as to encompass all variations as well as equivalent structures and functions.In addition, it should be noted that "comprising" and "having" do not exclude other elements or steps and "a" or "an" does not exclude a plurality. It should also be noted that features or steps that have been described with reference to one of the above exemplary embodiments can also be used in combination with other features or steps of other exemplary embodiments described above. Reference numerals in the claims should not be regarded as limitations.

Claims

A display screen comprising: a TFT substrate (23, 24) and a color film substrate (22) opposing each other, wherein a number of pixel units each comprising a first TFT element (23), a second TFT element (24) and a pixel region are arranged on a surface of the TFT substrate (23, 24) facing the color film substrate (22), and wherein the pixel region is a transparent region between the first TFT element (23) and the second TFT element (24); each of the pixel units comprises a reference transparent potential layer disposed on a surface of the TFT substrate (23, 24) facing the color film substrate (22), and an opaque deformation layer (26) disposed on the reference potential layer, the deformation layer (26) and the reference potential layer being insulated from each other; wherein the output electrode (233) of the first TFT element (23) of each pixel unit is electrically connected to the reference potential layer, and the output electrode (243) of the second TFT element (24) of each pixel unit is electrically connected to the deformation layer (26), so that the deformation layer (26) undergoes elastic deformation corresponding to the voltage difference by a part of the deformation layer (26) fixedly connected to the TFT substrate (23, 24) as a fixed axis depending on its voltage difference from the reference potential layer to change the coverage area of the deformation layer (26) at the pixel zone of each pixel unit; a support element (29) is arranged between the TFT substrate (23, 24) and the color film substrate (22), the thickness of the support element (29) being greater than the distance between the maximum point of the deformation layer (26) and the surface of the TFT substrate (23, 24) which occurs during the maximum deformation of the deformation layer (26), the transparent region of the pixel zone being equal to the total area of the pixel zone minus the covering area of the deformation layer (26) at the pixel zone.The display screen according to claim 1, wherein a protective layer covering the connection portion is used for fixing the connection portion.The screen of claim 1, wherein the shape of the support member (29) comprises a cylindrical structure, a cube structure, a spherical structure, a cone structure, or a stair structure.A display screen according to any one of claims 1 to 3, comprising a transparent electrically conductive layer disposed on the surface of said color film substrate (22) remote from said TFT substrate (23, 24) and for securing against said static electricity.The screen according to any one of claims 1 to 4, wherein the pixel unit is located in a sealing space whose pressure is not greater than the standard atmospheric pressure and which is filled only with an oxidation suppressing gas.The display panel of claim 5, wherein the oxidation suppressing gas is nitrogen, any inert gas, mixed gas of a plurality of inert gases, or mixed gas of nitrogen and one or more inert gases.The display screen according to any one of claims 1 to 6, wherein the material of the deformation layer (26) is titanium, copper, silver or aluminum.The display screen according to any one of claims 1 to 7, wherein the thickness of the deformation layer (26) is 1 nm to 10,000 nm inclusive.A manufacturing method for a display screen, comprising: providing a TFT substrate (23, 24) comprising a number of pixel units each comprising a first TFT element (23), a second TFT element (24), and a pixel region; forming a first groove communicating with the output electrode (233) of the first TFT element (23) and a second groove communicating with the output electrode (243) of the second TFT element (24) on the insulating layer on the surface of the TFT substrate (23, 24); forming a reference potential layer on the surface of the TFT substrate (23, 24) electrically connected to the output electrode (233) of the first TFT element (23) through the first groove; forming a deformation layer (26) on the reference potential layer electrically connected to the output electrode (243) of the second TFT element (24) via the second groove and insulated from the reference potential layer; providing a color film substrate (22) applied to the TFT substrate (23, 24), the deformation layer (26) and the reference potential layer being interposed between the color film substrate (22) and the TFT substrate (23, 24); wherein the deformation layer (26) can undergo the different elastic deformation as a fixed axis around its part fixedly connected to the TFT substrate (23, 24) to change the coverage area of the deformation layer (26) at the pixel region between the first TFT element (23) and the second TFT element (24) of each pixel unit; wherein a support element (29) is arranged between the TFT substrate (23, 24) and the color film substrate (22), wherein the thickness of the support element (29) is greater than the distance between the maximum point of the deformation layer (26) and the surface of the TFT substrate (23, 24) which occurs during the maximum deformation of the deformation layer (26), wherein the transparent region of the pixel zone equals the total area of the pixel zone minus the covering area of the deformation layer at the pixel zone.The manufacturing method according to claim 9, wherein a transparent electrically conductive layer is formed on a surface of the color film substrate (22) opposite to the TFT substrate (23, 24) before the color film substrate (22) is applied to the TFT substrate (23, 24).The manufacturing method according to claim 9, wherein the TFT substrate is densely arranged against the color film substrate (22), and oxidation suppressing gas is filled between the TFT substrate (23, 24) and the color film substrate (22).

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