Mask inspection device, vacuum sealing component and method for adjusting a mask inspection device

Abstract

The invention relates to a mask inspection device, a vacuum sealing component and a method for adjusting a mask inspection device. A mask inspection device according to the invention comprises a vacuum housing (106, 306, 406), an EUV camera (310, 410) attached to the vacuum housing (106, 306, 406), and a projection lens (460) arranged in a vacuum chamber (330, 430) of the vacuum housing for imaging at least a section of an EUV mask (470) onto an image sensor (311, 411) of the EUV camera, wherein a vacuum sealing component having a flexible wall section (103, 303) is arranged between the vacuum housing and the EUV camera or a camera mount (107, 307) of this EUV camera, and wherein this flexible wall section is arranged radially outside a central axis (140, 340) of the EUV camera or the camera mount.

Description

BACKGROUND OF THE INVENTION Area of ​​the invention

[0001] The invention relates to a mask inspection device, a vacuum sealing component and a method for adjusting a mask inspection device. State of the art

[0002] Microlithography is used to manufacture microstructured components, such as integrated circuits or LCDs. The microlithography process is carried out in a projection exposure system, which includes an illumination unit and a projection lens. The image of a mask (= reticulum) illuminated by the illumination unit is projected by the projection lens onto a substrate (e.g., a silicon wafer) coated with a photosensitive layer (photoresist) and positioned in the image plane of the projection lens. This transfers the mask structure onto the photosensitive coating of the substrate.

[0003] In the lithography process, unwanted defects on the mask have a particularly detrimental effect, as they can be reproduced with each exposure step, potentially rendering the entire production of semiconductor components unusable. Therefore, it is crucial to test the mask for sufficient imaging capability before its use in mass production. There is a need for quick and easy mask testing, ideally under conditions similar to those found in the projection exposure system. Mask inspection devices are known for this purpose. These devices contain an illumination system and a projection lens within a vacuum housing, where the illuminated area of ​​the mask is projected onto an image sensor of an EUV camera.

[0004] The mask inspection device must be adjusted to ensure a perfect image of the EUV mask on the image sensor. One possible approach involves implementing an EUV camera whose position relative to the imaging beam path of the projection lens, or to a vacuum housing containing it, can be adjusted discretely or continuously.

[0005] However, a practical problem is that the available installation space for providing the aforementioned position manipulation and update capability is relatively limited. In this context, it is particularly desirable that the adjustment mechanism required for position manipulation does not significantly increase the distance between the camera and the vacuum housing, in order to avoid defocusing during image generation.

[0006] The realization of the adjustability of a mask inspection device, taking into account existing installation space restrictions, therefore presents a demanding challenge in the context of the vacuum conditions to be ensured (i.e., maintaining existing pressure differences between the interior and exterior of the vacuum chamber).

[0007] DE 10 2023 110 173 B3 discloses, inter alia, a measuring device for inspecting a photomask, wherein the photomask is arranged in a sub-chamber of a vacuum chamber, wherein the sub-chamber has an opening over which a pellicle is stretched, sealing against a housing edge surrounding the opening.

[0008] DE 10 2023 110 174 B3 discloses inter alia a measuring device for the inspection of photomasks, wherein the EUV radiation source is arranged in a subchamber of a vacuum chamber, and wherein the subchamber has an outlet opening which is covered with a pellicle, the pellicle sealingly sealing against a housing rim surrounding the opening. SUMMARY OF THE INVENTION

[0009] Against the above background, it is an object of the present invention to provide a mask inspection device, a vacuum sealing component and a method for adjusting a mask inspection device, which enable adjustment while at least partially avoiding the problems described above.

[0010] This problem is solved according to the features of the dependent patent claims.

[0011] According to one aspect, the invention relates to a mask inspection device with a vacuum housing, an EUV camera attached to the vacuum housing and a projection lens arranged in a vacuum chamber of the vacuum housing for imaging at least a section of an EUV mask onto an image sensor of the EUV camera. - wherein a vacuum sealing component having a flexible wall section is arranged between the vacuum housing and the EUV camera or a camera mount of this EUV camera, and - wherein this flexible wall section is arranged radially outside a central axis of the EUV camera or camera mount.

[0012] In embodiments of the invention, the angle between a plane defined by the wall section and the central axis has a value in the range of 0° to 180°, in particular in the range of 45° to 135°, further in particular in the range of 80° to 100°, and further in particular in the range of 85° to 95°.

[0013] According to one embodiment, a plane defined by the wall section runs orthogonally to the central axis. In a preferred embodiment, the angle between a plane defined by the wall section and the central axis is therefore 90°.

[0014] The invention is based in particular on the concept of arranging a vacuum sealing component between the vacuum housing and the EUV camera or camera mount in a mask inspection device to enable adjustment of the EUV camera relative to the imaging beam path of the projection lens, such that a flexible wall section of the vacuum sealing component according to the invention is arranged essentially perpendicular to the central axis of the EUV camera or camera mount. As a result of this geometry of the inventive design, a significant saving of installation space is achieved in an axial direction with respect to the central axis, while simultaneously enabling the necessary actuation or positional manipulation of the EUV camera for adjustment by means of the flexible adjustment of the vacuum sealing component, while ensuring vacuum conditions.As described below, according to the invention, in particular during an adjustment, the EUV camera can be tilted relative to the vacuum housing by at least one axis orthogonal to the central axis, in particular by two axes orthogonal to each other and to the central axis.

[0015] The geometric arrangement according to the invention deliberately accepts a comparatively increased installation space in a lateral direction (i.e., in a plane perpendicular to the central axis) in order to achieve the aforementioned installation space savings in the axial direction. The invention also takes advantage of the fact that said installation space in the lateral direction is typically more tolerable.

[0016] Overall, the invention makes it possible to realize the adjustment ranges of the EUV camera required for adjustment, while largely maintaining the image distance between the camera and the optics of the projection lens with corresponding space savings, thus avoiding a significant increase in the installation space required by the adjustment mechanism used for position manipulation.

[0017] The phrase "plane defined by the wall section" is to be understood as follows: in the case of an annular or perforated disc geometry of the wall section, it refers to the plane in which the corresponding disc extends or which is spanned by this disc. In the case of a folded structure of the wall section, as described below in embodiments of the invention, the relevant plane is understood to be the plane that a wall section or a corresponding (annular or perforated disc) of an analogous design without this folded structure spans.

[0018] The central axis of the EUV camera can be perpendicular to a surface of an image sensor of the EUV camera, in particular to a surface of the image sensor for capturing EUV light. The central axis of the EUV camera can preferably be perpendicular to all surfaces of the EUV camera designed for capturing EUV light. The central axis can, for example, intersect a center of gravity of the EUV camera, which can have any geometry, such as cylindrical or cuboid.

[0019] According to one embodiment, the wall section has a folded structure extending around its central axis. The wall section can be designed as a bellows or a bellows-like structure.

[0020] According to one embodiment, the wall section is made of a metallic material, in particular stainless steel.

[0021] According to one embodiment, the wall section is made of a vacuum-compatible flexible material, in particular a vacuum-compatible rubber material.

[0022] According to one embodiment, the mask inspection device has an adjustment mechanism by which the position of the EUV camera relative to the vacuum housing can be adjusted.

[0023] According to one embodiment, this adjustability includes a translational displacement in the direction of the central axis, in particular with an adjustment range of at least 0.1 mm to 2 mm.

[0024] According to one embodiment, this adjustability includes a tilting about at least one axis orthogonal to the central axis, in particular about two axes orthogonal to each other and to the central axis.

[0025] According to one embodiment, this tilting can be realized at least up to an angle of 5°, in particular up to an angle of 10° to the central axis.

[0026] The invention further relates to a vacuum sealing component for use in a mask inspection device with the features described above, comprising a flexible wall section which extends around a central axis of the vacuum sealing component, wherein a first flange element for attachment to a first component is attached to the flexible wall section radially outside with respect to the central axis and a second flange element for attachment to a second component is attached radially inside with respect to the central axis.

[0027] The design of a vacuum sealing component according to the invention is also advantageous independently of the specific application in the mask inspection device according to the invention. According to a further aspect, the disclosure therefore also relates to a vacuum sealing component independent of this application, comprising a flexible wall section which extends around a central axis of the vacuum sealing component, wherein a first flange element for attachment to a first component is attached to the flexible wall section radially outside with respect to the central axis, and a second flange element for attachment to a second component is attached radially inside with respect to the central axis.

[0028] In embodiments of the vacuum sealing component, the angle between a plane defined by the wall section and the central axis has a value in the range of 0° to 180°, in particular in the range of 45° to 135°, further in particular in the range of 80° to 100°, further in particular in the range of 85° to 95°.

[0029] According to a preferred embodiment, a plane defined by the wall section is orthogonal to the central axis. In a preferred embodiment, the angle between a plane defined by the wall section and the central axis is therefore 90°.

[0030] According to one embodiment, the wall section has a folded structure extending around the central axis.

[0031] According to one embodiment, the wall section is made of a metallic material, in particular stainless steel.

[0032] According to one embodiment, the wall section is made of a vacuum-compatible rubber material.

[0033] The invention further relates to a method for adjusting a mask inspection device, wherein the mask inspection device comprises a vacuum housing, an EUV camera attached to the vacuum housing and a projection lens arranged in a vacuum chamber of the vacuum housing for imaging at least a section of an EUV mask onto an image sensor of the EUV camera. - wherein the mask inspection device is designed according to the features described above; and - whereby the position of the EUV camera is adjusted relative to the vacuum housing in order to align the EUV camera relative to the imaging beam path of the projection lens.

[0034] Further embodiments of the invention can be found in the description and the dependent claims.

[0035] The invention is explained in more detail below with reference to preferred embodiments and the accompanying illustrations. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] They show: Fig. 1 a schematic representation to illustrate an exemplary embodiment of the invention, which in particular shows a vacuum sealing component having a flexible wall section; Fig. 2 a schematic representation of part of the arrangement of Fig. 1 in top view; Fig. 3. A schematic representation to illustrate the mechanical connection of the arrangement of Fig. 1 to an EUV camera by implementing an adjustment mechanism; and Fig. 4-6 Schematic representation to illustrate a possible basic structure of a mask inspection device. DETAILED DESCRIPTION OF PREFERRED EXECUTION FORMS

[0037] In the following, an exemplary embodiment of the invention will first be described with reference to the schematic representations of Fig. 1 and Fig. 2 explained, whereby Fig. 1 a sectional view and Fig. 2 a top view of part of the arrangement of Fig. 1 shows.

[0038] In Fig. 1 and Fig. Figure 2 shows a vacuum sealing component, which has a flexible wall section 103 extending around a central axis of the vacuum sealing component designated "140". This central axis 140 runs along the z-axis in the coordinate system also shown. A first flange element 101 is attached to the flexible wall section 103 radially outside the central axis 140, and a second flange element 102 is attached radially inside the flexible wall section 103. The flange elements 101 and 102 serve to attach the component to a first component and a second component, respectively (here exemplified by fastening screws 104). Seals are designated by "105".

[0039] The application scenario envisaged in particular by the invention involves – as will be explained further below with reference to Fig. 3-6 described - in the first component by one (in Fig. 1. (only schematically partially indicated) vacuum housing 106 of a mask inspection device, and in the second component, a (also in Fig. 1. (Only indicated) camera mount 107 for an EUV camera of this mask inspection device. The vacuum sealing component according to the invention is thus located in the exemplary application scenario between a vacuum chamber 130 and an outer area 120 of a mask inspection device exposed to atmospheric pressure.

[0040] The material of the flexible wall section 103 is a vacuum-compatible (especially ultra-high vacuum-compatible) material. This material can be, in particular, a metallic material (e.g., stainless steel), whereby, to provide the flexibility required as described below, a [missing information] is used. Fig. 1. A suggested fold structure is formed on wall section 103. With reference to Fig. 2 The aforementioned wall section 103 then exhibits concentric folds with respect to the origin of the coordinate system drawn there or the central axis 140 running through it in the z-direction.

[0041] However, the invention is not limited to such a folded or bellows-like structure of the flexible wall section 103. In further embodiments, the flexible wall section 103 can also have a ring- or perforated disc-like geometry without such folds, in which case the required flexibility is provided by the material of the wall section 103 itself and / or by a sufficiently small thickness thereof. In addition to metallic materials, the use of vacuum-compatible rubber materials is also possible.

[0042] Based on Fig. Both 1-2 and the embodiments described below share a geometric arrangement that is particularly advantageous from an installation space perspective: Accordingly, as can be seen from both Fig. 1 as well as from Fig. 2 evident, one in Fig. 1 marked with “150” (and in Fig. 2. The plane 150 of the wall section 103 (corresponding to the xy-plane) is essentially perpendicular (in particular at an angle in the range of 80° to 100°) to the central axis of the arrangement designated "140". This achieves a significant saving of installation space in an axial direction with respect to the aforementioned central axis 140, while simultaneously enabling the flexible adjustment required for desired positional manipulation or adjustability of the components mounted on the flange elements 101, 102 relative to each other (i.e., in particular in the application scenario of the mask inspection device of the vacuum housing 106 and the camera mount 107) while ensuring vacuum conditions.

[0043] In embodiments, the angle between a plane 150 defined by the wall section 103 and the central axis 140 can have a value in the range of 0° to 180°, particularly in the range of 45° to 135°, further particularly in the range of 80° to 100°, further particularly in the range of 85° to 95°, and further particularly in the range of 90°. These angle specifications preferably refer to a configuration in which a tilting described below and realizable according to the invention has not yet been carried out and the wall section 103 is thus in a position as shown in the figure. Fig. 1 is shown.

[0044] The aforementioned position manipulation or adjustability can be achieved in up to five degrees of freedom, namely the translational degrees of freedom in the x, y and z directions as well as the rotational degrees of freedom R. x (corresponding to a tilting or rotation about the x-axis) and R y(corresponding to a tilting or rotation about the y-axis). In embodiments, this tilting can be realized, in particular, at least up to an angle of 5°, and especially up to an angle of 10° to the central axis.

[0045] The invention is not limited to a rotationally symmetrical design of the flexible wall section 103 and the flange elements 102, 102 as in Fig. 2 shown restricted, where, for example, an elliptic geometry is also possible.

[0046] Fig. Figure 3 shows a schematic representation to illustrate the mechanical connection of the assembly of Fig. 1. An EUV camera of a mask inspection device is connected using an adjustment mechanism. In comparison to... Fig. 1. Analogous or essentially functionally identical components are designated with reference numerals increased by “200”. Here, “310” designates an EUV camera of this mask inspection device, and the vacuum sealing component according to the invention is located between a vacuum chamber 330 and an outer area 320 of the mask inspection device exposed to atmospheric pressure.

[0047] According to Fig. 3 Several actuator units 308 are arranged between the EUV camera 310 and the vacuum housing 306. An adjustment mechanism is designated “309”. The EUV camera 310 and the vacuum housing 306 are held at a distance from each other by four actuator units 308, with the two in Fig. 3 visible actuator units 308 are spaced apart from each other in the X direction, and wherein the two in Fig. Three non-visible actuator units 308 are spaced apart from each other in the Y-direction. The actuator units 308 can be adjusted independently in length, thereby changing the distance between the EUV camera 310 and the vacuum housing 306. The actuator units 308 are arranged radially outside a vacuum sealing component, which has a flexible wall section 303 and is described below, so that the actuator units 308 are exposed to atmospheric pressure.

[0048] By appropriately controlling the actuator units 308, the position of the EUV camera 310 relative to the vacuum housing 306 can be adjusted. The EUV camera 310 can be tilted about the Y-axis by adjusting one of the two actuator units 308. Fig. The 3 visible actuator units 308 are extended and the other is shortened accordingly. The EUV camera 310 can be tilted around the X-axis by extending one of the two in Fig. The EUV camera 310 can be moved in the z-direction by extending or shortening all four actuator units 308 simultaneously. The actuator units 308 are connected by a Fig. 3 control units not shown are controlled.

[0049] The force acting between the EUV camera 310 and the vacuum housing 306 consists of the weight of the EUV camera 310 and the force resulting from the pressure difference between the vacuum pressure inside the vacuum chamber 330 and atmospheric pressure. The force resulting from the pressure difference significantly outweighs the weight, resulting in a total force equivalent to several tons. This entire force is transmitted via the actuator units 308. If the position of the EUV camera 310 relative to the vacuum housing 306 is to be changed, the actuator units 308 must overcome this force.

[0050] According to Fig. 3 is the vacuum sealing component having a flexible wall section 303, arranged between the vacuum housing 306 and a camera mount 307 of the EUV camera 310. This arrangement is radially outside a central axis of the EUV camera 310 or the camera mount 307 designated “340” geometrically such that a plane defined by the wall section 303 runs orthogonally to this central axis 340.

[0051] Fig. Figures 4-6 show schematic diagrams to illustrate a possible basic structure of a mask inspection device. Accordingly, a mask inspection device comprises, in particular, an illumination system 450 and a projection lens 460, wherein an EUV beam path 445 emanating from an EUV radiation source 440 is directed via the illumination system 450 onto an EUV mask 470. The illumination system 450 shapes the EUV radiation into a beam that illuminates an inspection area on the surface of the EUV mask 470 with uniform brightness. The inspection area 472, which is small in relation to the area of ​​the EUV mask 470, is shown in a diagram not to scale. Fig. Figure 5 illustrates this. The illuminated area 472 can, for example, have dimensions of 0.5 mm × 0.8 mm. The edge lengths of the EUV mask 470 can, for example, be between 100 mm and 200 mm. A field aperture is arranged in the illumination system 450, which limits the illuminated area to the examination field 472 on the surface of the EUV mask 470. A positioner 471 can move the EUV mask 470 in the horizontal plane to bring different examination fields 472 into the area of ​​the EUV beam path. The EUV mask 470 can, for example, have an aspect ratio between 1:1 and 1:3, preferably between 1:1 and 1:2, particularly preferably 1:1 or 1:2, and be substantially rectangular in shape.

[0052] The EUV beam path 445, reflected from the EUV mask 470, continues via the projection lens 460 to an EUV camera 410, which is equipped with an image sensor 411. The projection lens 460 projects the inspection field 472 of the EUV mask 470 onto the image sensor 411 of the EUV camera 410. The imaging beam path 445 strikes the image sensor 411 in the z-direction. The EUV radiation source 440, the illumination system 450, the EUV mask 470, the projection lens 460, and the image sensor 411 of the EUV camera 410 are arranged in a vacuum chamber 430, which is surrounded by a vacuum housing 406. During operation of the mask inspection system, a high vacuum is maintained in the vacuum chamber 430. The EUV camera 410 comprises a camera housing 412 which carries the image sensor 411. A rear part 413 of the camera housing 412 protrudes from the vacuum housing 406, while the image sensor 411 is exposed to the vacuum in the vacuum housing 406.

[0053] The EUV radiation source 440 is a plasma radiation source for generating EUV radiation with a wavelength of approximately 13.5 nm.

[0054] The mirrors of the 450 illumination system and the 460 projection lens are designed as EUV mirrors, exhibiting exceptionally high reflectivity for EUV radiation. The optical surface of the EUV mirrors can be formed by a highly reflective coating. This can be a multilayer coating, particularly one with alternating layers of molybdenum and silicon. Such a coating can reflect approximately 70% of the incident EUV radiation.

[0055] The projection lens 460 has a magnification factor of more than 100. In order to fully capture the image generated by the examination field 472 of the EUV mask 470, the area of ​​the image sensor 411 is larger than the area of ​​the examination field 472, corresponding to the magnification factor. The image sensor 411 can, for example, have dimensions on the order of 100 mm to 200 mm.

[0056] The camera housing 412 of the EUV camera 410 is equipped according to Fig. Figure 6 shows the image sensor 411 and an electronics unit 415. The electronics unit 415 controls the image sensor 411, and the EUV image data acquired by the image sensor 411 is processed and output as sensor data. The EUV camera 410 is supplied with electrical power via supply lines 418, the sensor data is transmitted, and a cooling device (not shown) is operated to cool components of the EUV camera 410 to a desired temperature.

[0057] A vacuum flange 414 is formed on the camera housing 412, extending uninterrupted around the circumference of the camera housing 412. A seal is designated 416. A connection between the EUV camera 410 and the vacuum housing 28 is established via the vacuum flange 414. In the assembled state, the rear side 413 of the camera housing 412, together with the vacuum housing 406, forms a section of the wall of the vacuum chamber 430.

[0058] Even though the invention has been described with reference to specific embodiments, numerous variations and alternative embodiments are apparent to the person skilled in the art, for example, through the combination and / or exchange of features of individual embodiments. Accordingly, it is understood to the person skilled in the art that such variations and alternative embodiments are included in the present invention, and that the scope of the invention is limited only to the extent of the appended claims and their equivalents.

Claims

[1] Mask inspection device, comprising a vacuum housing (106, 306, 406), an EUV camera (310, 410) attached to the vacuum housing (106, 306, 406) and a projection lens (460) arranged in a vacuum chamber (330, 430) of the vacuum housing (106, 306, 406) for imaging at least a section of an EUV mask (470) onto an image sensor (311, 411) of the EUV camera (310, 410), • wherein a vacuum sealing component having a flexible wall section (103, 303) is arranged between the vacuum housing (106, 306, 406) and the EUV camera (310, 410) or a camera mount (107, 307) of this EUV camera (310, 410), and • wherein this flexible wall section (103, 303) is arranged radially outside a central axis (140, 340) of the EUV camera (310, 410) or the camera mount (107, 307). [2] Mask inspection device according to claim 1, characterized by, that an angle between a plane (150, 350) defined by the wall section (103, 303) and the central axis (140, 340) has a value in the range of 0° to 180°. [3] Mask inspection device according to claim 1 or 2, characterized by , that an angle between a plane (150, 350) defined by the wall section (103, 303) and the central axis (140, 340) has a value in the range of 45° to 135°. [4] Mask inspection device according to any one of claims 1 to 3, characterized by , that an angle between a plane (150, 350) defined by the wall section (103, 303) and the central axis (140, 340) has a value in the range of 80° to 100°. [5] Mask inspection device according to any of the preceding claims, characterized by , that an angle between a plane (150, 350) defined by the wall section (103, 303) and the central axis (140, 340) has a value in the range of 85° to 95°. [6] Mask inspection device according to any of the preceding claims, characterized by , that a plane (150, 350) defined by the wall section (103, 303) runs orthogonally to the central axis (140, 340). [7] Mask inspection device according to one of the preceding claims, characterized by , that the wall section (103, 303) has a fold structure running around the central axis (140, 340). [8] Mask inspection device according to any one of claims 1 to 7, characterized by , that the wall section (103, 303) is made of a metallic material, in particular stainless steel. [9] Mask inspection device according to any one of claims 1 to 7, characterized by , that the wall section (103, 303) is made of a vacuum-compatible flexible material, in particular a vacuum-compatible rubber material. [10] Mask inspection device according to any of the preceding claims, characterized by, that it has an adjustment mechanism (309) by which the position of the EUV camera (310, 410) relative to the vacuum housing (106, 306, 406) can be adjusted. [11] Mask inspection device according to claim 10, characterized by , that this adjustability includes a translational displacement in the direction of the central axis (140, 340), in particular with an adjustment range of at least 0.1 mm to 2 mm. [12] Mask inspection device according to claim 10 or 11, characterized by , that this adjustability includes a tilting about at least one axis orthogonal to the central axis (140, 340), in particular about two axes orthogonal to each other and to the central axis (140, 340). [13] Mask inspection device according to claim 12, characterized by , that this tilting is achievable at least up to an angle of 5°, in particular up to an angle of 10° to the central axis (140, 340). [14] Vacuum sealing component for use in a mask inspection device according to one of the preceding claims, comprising • a flexible wall section (103, 303) which extends around a central axis (140, 340) of the vacuum sealing component, wherein a first flange element (101) for attachment to a first component is attached radially outside the flexible wall section (103, 303) with respect to the central axis (140, 340) and a second flange element (102) for attachment to a second component is attached radially inside the flexible wall section (103, 303) with respect to the central axis (140, 340). [15] Vacuum sealing component according to claim 14, characterized by , that an angle between a plane (150, 350) defined by the wall section (103, 303) and the central axis (140, 340) has a value in the range of 0° to 180°. [16] Vacuum sealing component according to claim 14 or 15, characterized by, that an angle between a plane (150, 350) defined by the wall section (103, 303) and the central axis (140, 340) has a value in the range of 45° to 135°. [17] Vacuum sealing component according to any one of claims 14 to 16, characterized by , that an angle between a plane (150, 350) defined by the wall section (103, 303) and the central axis (140, 340) has a value in the range of 80° to 100°. [18] Vacuum sealing component according to any one of claims 14 to 17, characterized by , that an angle between a plane (150, 350) defined by the wall section (103, 303) and the central axis (140, 340) has a value in the range of 85° to 95°. [19] Vacuum sealing component according to any one of claims 14 to 18, characterized by , that a plane (150, 350) defined by the wall section (103, 303) runs orthogonally to the central axis (140, 340). [20] Vacuum sealing component according to any one of claims 14 to 19, characterized by , that the wall section (103, 303) has a fold structure running around the central axis (140, 340). [21] Vacuum sealing component according to any one of claims 14 to 20, characterized by , that the wall section (103, 303) is made of a metallic material, in particular stainless steel. [22] Vacuum sealing component according to any one of claims 14 to 20, characterized by , that the wall section (103, 303) is made of a vacuum-compatible rubber material. [23] Method for adjusting a mask inspection device, wherein the mask inspection device comprises a vacuum housing (106, 306, 406), an EUV camera (310, 410) attached to the vacuum housing (106, 306, 406) and a projection lens (460) arranged in a vacuum chamber of the vacuum housing (106, 306, 406) for imaging at least a section of an EUV mask (470) onto an image sensor (311, 411) of the EUV camera (310, 410), - wherein the mask inspection device is configured according to any one of claims 1 to 13; and - wherein the position of the EUV camera (310, 410) relative to the vacuum housing (106, 306, 406) is adjusted in order to align the EUV camera (310, 410) relative to the imaging beam path of the projection lens (460).

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