Filter device for setting an atmosphere within a manufacturing plant, and manufacturing plant for an additive manufacturing process

Abstract

The present invention relates to a manufacturing plant FA which can be automated and is based on optical interaction, in particular a manufacturing plant for selective laser melting SLM, and an integratable filter device FV, in which through selective use of device elements a contamination of different particle residues within the manufacturing plant FA can be avoided and, in addition, a manufacturing atmosphere defined by a homogeneous process gas flow can be formed. Furthermore, the present invention relates to a manufacturing system for the automated manufacture of workpieces by irradiating a material to be processed which, with the aid of controlled adjustments of the process gas to be introduced into the manufacturing plant FA to the properties of the filter device FV, makes possible the aforementioned generation of the manufacturing atmosphere in particular irrespective of the used manufacturing materials.

Description

[0001] Filter device for adjusting an atmosphere within a production plant and production plant for an additive manufacturing process

[0002] The present invention relates to an automatable manufacturing system based on optical interaction, in particular a manufacturing system for selective laser melting (SLM), and an integrable filter device in which, through the selective insertion of device elements, contamination by various particle residues within the manufacturing system can be avoided and a manufacturing atmosphere defined by a homogeneous process gas flow can be created. Furthermore, the present invention relates to a manufacturing system for the automated production of workpieces by irradiating a material to be processed, which, with the aid of controlled adaptations of the process gas to be introduced into the manufacturing system to the properties of the filter device, enables the previously described generation of the manufacturing atmosphere, in particular independently of the manufacturing materials used.

[0003] Background of the invention

[0004] Due to increasingly complex work processes and the resulting requirement of current production facilities to be able to produce as precisely, automatically and on a large scale as possible, the production and processing of workpieces based on optical interaction processes has established itself as an effective and important working basis.

[0005] Generic known from the state of the art and based on optical

[0006] Interaction-based manufacturing systems, such as laser-induced and / or additive manufacturing systems, such as selective laser melting, usually comprise one or more high-intensity light sources that are coupled to a plurality of finely adjusted optical elements (lenses, mirrors, filters, etc.) that can be controlled automatically via a computer system. They thus allow a plastic effect on a desired workpiece or material by generating a condensed light beam that is focused on a specific manufacturing point.For example, a manufacturing plant using the selective laser melting process has at least one laser light source which, by means of software-supported optics, can focus a bundled laser beam onto powdered layers of materials to be processed and thus create an extremely effective, three-dimensional manufacturing process through local, layer-by-layer fusions.

[0007] Despite the continuous development of such manufacturing systems, the problem still arises in most such systems: due to particle residues falling off during the manufacturing process, such as rising spray particles, condensate, or smoke, the components required to transmit the optical processing beam can become contaminated or even damaged. This can lead to a reduction in exposure precision during ongoing manufacturing processes and, consequently, a deterioration in the quality of the workpiece being produced. In this respect, state-of-the-art manufacturing systems, for example, provide for the introduction of a gas stream into the process chamber of the manufacturing system to be used, so that any disruptive process byproducts can be effectively removed during individual manufacturing steps.Despite the aforementioned advantages, the use of simple gas inflows within a production facility has always been accompanied by a number of disadvantages. For example, the turbulent nature of the incoming gas flow often leads to the problem that portions of the particles being separated can also enter the supply circuit of the respective gas, which requires complex cleaning processes to prevent subsequent contamination from accumulated material residues, for example, in the case of planned material changes.In addition, the introduction mechanisms, such as valves or inlet openings, which are usually only locally connected to the working area of ​​the production plant, only cause an inhomogeneous distribution of the gas flow to be used, so that the cleaning quality varies locally within existing production plants and thus the effectiveness of the production process is demonstrably reduced.

[0008] Consequently, it is an object of the present invention to solve the above-mentioned problems of the prior art and, in particular, to provide a filter device compatible with optical interaction-based manufacturing systems, by means of which the risk of contamination within said manufacturing system can be effectively reduced, even when additional circulating gases are used. Furthermore, it is an object of the present invention, by using and adapting said filter device in a manufacturing system to be improved, in particular in a gas supply system of said manufacturing system, to equally optimize the flow properties of the gas to be used in such a way that not only can accruing manufacturing particles be effectively separated from the existing work area of ​​the manufacturing system, but a respective gas flow can also be individually adapted to any conditions existing within the manufacturing system.Detailed description of the invention.

[0009] To achieve the above-mentioned object, the features of the independent claims are proposed. The dependent claims relate to preferred embodiments of the present invention.

[0010] The filter device of the present invention can preferably comprise at least one distribution element for the surface introduction of a process gas flow, that is to say a gas which is usually introduced for production processes (e.g. hydrogen, helium, carbon dioxide, ethene or argon) into the working area of ​​the respective production plant, as well as a filter element for purifying the process gas to be introduced, preferably by avoiding material deposits within the gas supply lines to be used, which are preferably designed to initially improve the quality of the process gas flow to be used, in particular by intercepting potentially harmful material particles by the filter element, and to introduce the residue-free gas, by means of interaction with components of the distribution element, over as large an area as possible into the above-described working area.The present invention thus preferably forms an at least two-part device system which, with the aid of a first element (the filter element), is capable of preventing the penetration of harmful residual particles into the intended gas supply line (while still allowing gas supply), whereas a second element (the distribution element) simultaneously ensures the largest possible and thus highest-quality gas flow profile. Consequently, the present invention makes it possible, contrary to the prior art, to optimally guide an existing process gas flow through an existing construction process, both with regard to the material components of the process gas flow and its fluid-dynamic properties, thereby ensuring ideal quality properties of the workpiece to be manufactured.

[0011] The distribution element described can preferably initially comprise at least one perforated plate for the purposes mentioned above, which in particular enables the distribution element to fan out a process gas flow existing in the gas supply system and impinging on the filter device, preferably through repeated diffusion processes within the perforations in the perforated plate, for a large-area introduction into the work area of ​​the production plant. The general design of the perforated plate mentioned is not initially limited to a specific shape or geometry, but can initially be viewed as at least any type of three-dimensional structure that can realize a spatial redistribution of a gas flowing through it based on a plurality of perforations. The perforated plate is particularly preferably a perforated plate or a perforated sheet.

[0012] Accordingly, in a particularly preferred embodiment, the at least one perforated plate can be designed, for example, as an industrially manufactured, metallic, synthetic, or natural material (wood, carbon, etc.) perforated plate or as a perforated sheet, for example, in accordance with DIN 4185-2 and DIN 24041, which, through selectively introduced perforations, can induce a fluid-dynamic distribution effect and thus achieve a controllable broadening of the process gas flow to be used. In a further embodiment, however, preferably fabric-like or irregularly shaped materials, such as perforated polymer layers, lamella sheets, or various textiles, can also be used for this purpose to achieve a similar effect, so that, preferably, depending on the process gases to be used and the supporting production systems, an individually adapted distribution element can be used.

[0013] In order to be able to provide a process gas flow that is optimally adjusted for a respective work process, the properties of the perforated plate can also preferably be selectively adapted to the requirements of the respective production plant and / or the production processes to be carried out. For example, in a particularly preferred exemplary embodiment, at least the hole size of the existing perforations, their spatial distribution on the perforated plate and / or the thickness of the at least one perforated plate can be designed such that, by changing or adapting one of the above-mentioned features, a change in the process gas flow profile flowing into the work area can be generated, so that the properties of the process gas to be introduced can be actively influenced by the characteristics of the at least one perforated plate.

[0014] Based on these principles, the at least one perforated plate can be configured accordingly, by way of example, by means of the diffusion effects described above and features of the at least one perforated plate adapted to the circumstances of the respective production plant or the production process to be used (e.g. dimensions of the work area, speed of the gas flow to be introduced, quantity of material particles to be removed), not only to generate an increase in the process gas flow to be introduced into the work area, but also to generate a flow profile that is at least adapted to the respective production process. Preferably, the at least one perforated plate can thereby be configured such that, by flowing the process gas through the perforations of the perforated plate, in particular a temporally and / or spatially constant process gas flow is generated in the work area of ​​the production plant.In other cases, it may also be possible, for example, to create a laminar flow within the working area by adding the perforated plate, so that any turbulence within the process gas profile that might hinder the particle removal process can be effectively prevented. In this respect, a single element of the invention can generate a gas flow within a production facility that is far more optimized than the prior art, thereby increasing the corresponding production quality.

[0015] The filter element, which is also encompassed by the filter device and is to be used for particle filtration, can furthermore preferably be arranged in the vicinity of the distribution element, preferably on the distribution element itself or its at least one perforated plate, so that not only the smallest possible intrinsic volume of the present filter device is achieved, but equally the free space within the filter device which arises between the distribution element and the filter element and is thus potentially susceptible to particle residues can be reduced to a minimum.In a preferred embodiment, the filter element can particularly preferably be arranged on the side of the at least one perforated plate facing the respective process gas flow, so that the process gas flow generated by the perforated plate can preferably be introduced into the working area of ​​the production plant without interference and / or interaction.

[0016] In order to also be able to implement the above-described shielding functions of the filter device, the filter element can further comprise at least one filter medium designed for particle filtration, such as a filter fleece, a polymer filter, an antistatic filter fabric, or any other material usable as a particle filter, which at least allows the filter element to prevent the penetration of the latter material particles into the supply system to be protected, which integrates the filter device (valves, pipes, etc.). Thus, in a highly preferred embodiment, the filter medium can, for example, have at least one mechanical pore with a predefined pore size, through which material particles flowing through the filter device can be intercepted by the filter element and thus effectively separated from said supply system, particularly during the unpacking process.

[0017] In a preferred embodiment of the filter medium, this pore size can be particularly such that any material particles entering the inlet of the supply system (and thus the filter device implemented there) from the working area can be effectively intercepted or absorbed by the filter medium. In this case, the pore size can, for example, be designed such that the corresponding material particles are preferably completely blocked upon impact with the filter medium, for example, by making the pore size within the filter medium smaller than the size of the material particles to be absorbed (sieve effect), so that a nearly perfect performance level of the filter medium can be achieved.In a further embodiment, the above-mentioned pore size can also be selected in such a way that, in addition to absorbing the potentially harmful material particles, the process gas introduced into the working area of ​​the production facility can also preferably continue to pass through the filter medium to be used without interference, whereby the filter device preferably remains usable both in the active state (gas supply active) and in the inactive state of the supply system of the production facility (gas supply inactive). Further advantages of the mechanical filter structure thus created can also be achieved through further optimization of the process gas flow to be used.

[0018] For example, the previously described filter medium can be configured to further homogenize the process gas flow, preferably for inlet into the working area of ​​the production plant, based on the flow properties of the process gas flow flowing through the filter device, so that, in addition to the expansion of the process gas flow and the thus increased effective area of ​​the introduced process gas flow by means of the distribution element, the filter device can also create the most uniform gas flow profile possible.

[0019] For this purpose, the composition of the filter medium can, for example, be designed such that, as the process gas flows through the filter medium, a large number of collisions between the corresponding process gas particles and the materials (e.g., the pores) of the filter medium can occur. This, according to the law of diffusion, results in higher entropy and thus an equalization of the local gas particle density within the process gas. In this respect, in a highly preferred embodiment, the filter medium of the filter element can, in particular, also assume a dual role, not only efficiently protecting the integrated supply system of the production plant from penetrating material particles, but also equally realizing an improved, specifically homogenized flow through the work area.

[0020] The precise adaptation of the process gas profile by means of the filter medium can preferably be carried out in a similar way to the properties of the at least one perforated plate of the distribution element, in particular by adapting any structural properties of the filter medium to the flow properties of the process gas flow flowing through the filter device. For example, in a first preferred embodiment, at least the thickness and / or the pore size of the filter medium used can be designed such that, depending on the properties of the gas to be homogenized (e.g., velocity, pressure, cross-sectional area, or content of the gas flow), a homogenized process gas flow is formed in the working area of ​​the production plant. In a second embodiment, the pore geometry (e.g.,The filter medium must be adapted to the process gas flow (e.g. structural orientation of the pores, spatial distribution or density within the filter medium), for example by using specially selected materials, so that the above-mentioned homogenization can be achieved not only by establishing external but also internal properties of the filter medium.

[0021] Accordingly, it is evident that the features of the filter device, in particular the multifunctional distribution and filter elements that can be adapted to the properties of the process gas stream to be used, enable effective improvement of the process gas introduced into a production facility. This, in addition to efficiently preventing particle deposits within the respective gas supply system (and thus a potential risk of contamination), also equally includes optimization of the corresponding process gas flow. Furthermore, the filter device offers the advantage that, due to the small number of required device elements, a particularly compact design can be realized, so that the filter device can preferably be designed for integration into any type of production facility.

[0022] In a particularly preferred embodiment, the filter device can therefore also be designed in such a way that, due to its extremely compact shape, it can be present as an autonomous device and can be integrated individually or independently of the structure of the respective production plant into the production plant to be improved, or at least into the process gas supply system used therein.

[0023] In order to be able to ensure an extremely preferred improvement in the process gas flow as well as the contamination protection described above, the filter device can also preferably be designed to be directly integrated, i.e. preferably directly into the working area of ​​the respective production plant, so that in particular the fanning effects generated by the at least one perforated plate can also be introduced into said working area preferably without interaction.

[0024] Thus, in a particularly preferred embodiment of the present invention, the filter device can be designed to be integrated, for example, directly onto a component of the production plant defining the working area of ​​the production plant, for example a wall of a process chamber used by the production plant or at least one inlet of the gas supply system into the working area, whereby a maximum effect of the above-mentioned effects of the filter device is achieved.In further preferred embodiments, it may also be possible for a part of the filter device, for example the distribution element, particularly preferably however in particular the at least one perforated plate of the distribution element, to be designed to be connectable to the defining component of the production plant in such a way that the filter device, through integration into the respective production plant, can act as a functional component of the production plant (for example as a component of the previously described process chamber wall) or can even replace any components of the production plant, so that not only further material costs can be saved, but also the use of additional elements for adapting the filter device to the respective production plant can be avoided.

[0025] The integration of the filter device into the production system itself can also be achieved, in the preferred case, by means of detachable fastening processes, for example simple screw connections, tensioning based on mechanical, electrical, or pneumatic interactions (for example, by inserting clamping levers), or by means of fastening elements already present in the production system, such as guide rails compatible with the filter device. This has the particular advantage that the filter device can be easily attached and removed from the respective production system orthe associated gas supply system, an equally simple replacement of the filter device within the production plant is made possible, so that adaptation of the filter device to any changes within the production plant, for example in the event of a change in material or a change in the process gas, can preferably also be achieved by simply replacing the existing (i.e. the one currently integrated into the production plant) filter device with a newer, more compatible version.

[0026] In this respect, the filter device can preferably be configured accordingly, in the event of changes within the respective production plant, in particular when exchanging materials to be used, process gases or general work processes, to adapt the required process gas flow (preferably before starting the changed production process) to the new circumstances at least by replacing a filter device already integrated in the production plant with a new filter device adapted to the aforementioned changes (e.g. by using modified filter media or perforated plates), whereby a particularly cost-efficient and simple adaptation method is implemented.

[0027] In another highly preferred embodiment, it may also be possible for the aforementioned replacement process not to require the entire filter device to be replaced, but rather for only individual elements of the filter device to be designed to be replaceable, thereby further increasing the efficiency of said replacement process. For example, it may be possible for individual process changes within the production facility, such as simply replacing the materials to be used, to allow the actual process gas flow to remain unchanged, so that to maintain the desired filter device effects, only the enclosed filter element or its filter medium would need to be adapted to the new circumstances (for example, by adapting the pore sizes to the new material to be used).

[0028] In order to equally include this case in the capabilities of the present invention, in a further embodiment, the filter device can also be designed such that, in addition to or instead of the entire filter device, at least the distribution element (or its at least one perforated plate) and / or the filter element can be arranged interchangeably within the filter device, so that the filter device can be adapted to changes within the production plant, even by selectively replacing at least one of the above-mentioned elements.

[0029] A corresponding adaptation of the filter device or one of the elements comprised thereby can therefore preferably be understood below as at least replacing the device and / or said elements with an optimized version.

[0030] The advantages of the above-mentioned adaptation process arise in particular from the explicit requirements of the filter device within the respective production plant. For example, by simply replacing the filter element after a respective production process step, any material particles trapped by the filter medium can be efficiently removed from the production plant or the gas supply system without having to carry out further complex cleaning processes, thus enabling a particularly cost-effective cleaning mechanism to be implemented. In addition, simply replacing one of the previously described elements offers the possibility of adapting the features of at least the filter element and / or the distribution element specifically to a predefined event during the production process (e.g.the material particle size and the process gas properties to be used), so that a much more precise adaptation of the filter device to the properties of the respective production plant is possible.

[0031] The replacement process itself can also preferably be carried out manually, but in particularly preferred embodiments, it can also be automated. In this respect, the filter device can, for example, preferably be configured to expose at least part of the filter device during the replacement process for replacing the filter device and / or at least one of the aforementioned elements, so that a responsible operator can remove the element or device to be replaced and replace it with a new one.In a preferred embodiment, for example, one or more predefined insertion sections configured for inserting and removing the device elements can be implemented in the filter device, which remain accessible to the above-mentioned operator even after the filter device has been integrated into the respective production system and thus allow the operator to carry out the previously described replacement process, preferably at any time and without influencing the production process. In a further particularly preferred embodiment, however, it may also be possible for the above-mentioned replacement of the device orthe elements can be carried out not by a single operator, but equally by an automation also implemented in the production plant or the filter device, such as a change mechanism set up for automatic exchange, so that an adaptation of the filter device can preferably also be carried out fully, but at least semi-automatically.

[0032] Examples of such a replacement mechanism are generally not limited to a specific technical mode of operation, but can generally include any type of device that enables a partially or fully automated replacement process of the aforementioned elements. In this respect, the filter device can preferably be equipped with a mechanical replacement mechanism, such as a mechanical filter wheel or an additional robot arm, but in other cases also with devices based on pneumatic or electrical processes (e.g., electromagnets), so that the elements contained in the filter device can preferably be replaced in a manner that is preferably adapted to the respective production facility.In further preferred cases, it may also be possible for the aforementioned exchange mechanism to also comprise an internal memory for storing elements that have already been used, are to be reused and / or are to be exchanged, whereby the exchange process can preferably also be carried out completely autonomously, ie without external influence from an operator or a source separate from the production plant.In order to also ensure extremely precise positioning of the individual elements in the filter device and thus precise adjustment of the process gas flow flowing through the filter device, the filter device can also comprise at least one adjustable guide device (adjustable filter holder), preferably for the guided implementation and removal of the filter element and / or the distribution element in or from a working position provided for the working operation of the filter device.For example, the guide device can for this purpose include a mechanical connection between the introduction section already mentioned above and configured for the external introduction and removal of a device element and the latter working position, so that when an element to be replaced is introduced into the introduction section, the element can be introduced into the working position of the filter device, preferably in an automated manner, by means of the guide device.

[0033] In order to preferably equally ensure an exact alignment of the element to be introduced into the filter device, the guide device can also be designed in particular to guide at least the at least one perforated plate of the distribution element and / or the filter element for positioning at a respective working position only along a predefined, at least two-dimensional, but in a particularly preferred embodiment in particular one-dimensional direction, so that the above-mentioned elements in their preferred end position (the working position) are preferably present at all times in a predefined spatial orientation within the filter device.Accordingly, the previously described guide device can, for example, comprise at least one preferably horizontally oriented linear guide adapted to the device elements, such as a guide rail, a bearing, or any other type of guide mechanism, which allows the guide device to restrict the degrees of freedom of movement of one of the device elements inserted into the filter device and thus guide it particularly efficiently into the working position. The introduction itself can, as already mentioned, be carried out either manually by a processor or automatically by an internal changeover mechanism of the filter device or the respective production system.In addition, the guide device and / or the filter device can also include a fixing mechanism, for example a clamping device adapted to the respective device element or one of the releasable fixing options already described above, so that at least the filter element and / or the distribution element can preferably also be fixed automatically when the working position is reached.

[0034] Accordingly, it should be noted that the extremely simple and compact design of the filter device, combined with the effective adaptation of individual device elements to any changes made within the production facility (e.g., material or process gas changes), particularly through efficient replacement of at least one filter element and / or the distribution element of the filter device, ensures a particularly user-friendly and adaptable adaptation of the process gas flow to be introduced into the production facility. Furthermore, the simple and correspondingly cost-effective design of the filter device offers a number of expansion options.

[0035] Thus, as already described above, a minimal example of the claimed filter device to be integrated into the gas supply system of the production insert can at least provide for the positioning of the filter element designed for filtering and homogenization on the perforated plate of the distribution element, wherein the filter element or the filter medium comprised thereby can preferably be mounted upstream of the perforated plate with respect to the process gas flow to be improved. In this respect, the above-mentioned design can form a device system provided with at least two device elements (filter medium & perforated plate), in which a process gas flowing through the filter device is first homogenized by means of the filter medium and separated from the material particles accruing during the production process and then, through the interactions with the perforated plate, is distributed over a wide area, i.e.can be introduced as widely as possible into the working area of ​​the production plant.

[0036] In further embodiments of the filter device, however, it may also be possible for further device elements to be designed to be insertable into the filter device, so that the process gas to be processed is preferably further optimized.

[0037] Thus, in a further preferred embodiment, the distribution element of the claimed filter device can, for example, also be equipped with at least a second perforated plate, which can preferably be positioned equally upstream of the filter element in the filter device and is thus capable of initially adjusting the process gas flow to be processed even before it hits the filter element. The above-mentioned second perforated plate can optionally be designed equivalently to the first perforated plate of the filter device (for example, by using the same hole sizes, distributions, or plate dimensions), so that, for example, a symmetrically designed filter device and thus a particularly easy-to-define gas flow profile can be created.In a further embodiment, however, it is also possible that the features of the second perforated plate preferably explicitly differ from those of the first perforated plate and are instead defined by the properties of the process gas flow used (flow velocity, pressure, cross-sectional area, etc.) as well as the features of the downstream positioned filter element and the first perforated plate.

[0038] The latter embodiment has the particular advantage that, by means of the additional perforated plate incorporated into the filter device, the process gas flow entering the filter device can be adapted in advance to the interactions within the claimed filter device. For example, depending on the selection of the hole sizes, the distribution of individual perforations, or the thickness of the first perforated plate, the velocity or pressure of the process gas flow impinging on the filter device can be modified in such a way that optimal conditions can be created for the subsequent homogenization and fanning out of the process gas flow by means of the filter element and the first perforated plate, thereby further increasing the effectiveness of the claimed filter device.Accordingly, the second perforated plate of the distribution element can preferably be at least configured to (actively) vary the process gas flow impinging on the filter device by providing predefined features (e.g. distribution, size and length of the perforations) in such a way that an improved process gas profile can be generated which is optimized at least as a function of the features of the filter element and the first perforated plate and thus introduced into the working area of ​​the production plant.

[0039] In this respect, a further preferred embodiment of the present invention can also provide a filter device equipped with at least two perforated plates, wherein each of the introduced perforated plates contains different predefined features and can thus be used for different effects within the claimed filter device. Accordingly, it should be pointed out that the claimed filter device, both in this at least three-element form and in the previously described embodiment defined by two device elements, thus forms a complex structure comprising several interdependent device elements, in which the various features of the latter can be so closely related to one another that an optimized, i.e. preferably pure, homogenized and large-area process gas flow can be formed merely by adapting all of the device elements to one another.

[0040] Further advantages of the above-mentioned embodiment can also result from the positioning as well as the orientation and construction of the individual device elements within the claimed filter device.

[0041] For example, as already mentioned, the second perforated plate can preferably be positioned upstream of the filter element, so that the changes in the process gas flow flowing into the filter device generated by the second perforated plate can be used for improved homogenization by means of the filter element. In order to equally ensure the greatest possible effect of the second perforated plate, the second perforated plate can also preferably function in particular as an explicit gas inlet of the claimed filter device, so that the process gas to be introduced into the working area can preferably reach the filter device or the working area solely through the perforations inserted in the second perforated plate (and thus depending on their properties).For optimized dispersion of the ultimately purified and homogenized process gas, the first perforated plate can also be configured equivalently, preferably as a gas outlet of the claimed filter device, so that the processed process gas can preferably be introduced unhindered into the work area of ​​the respective production facility. Accordingly, for this purpose, the first perforated plate can also be designed to be integrated, for example, into a wall of a process chamber belonging to the production facility or at least into the gas inlet of the gas supply system of the production facility, whereby the process gas optimized by the filter device and discharged through the second perforated plate can be introduced directly into the work area.

[0042] In order to also enable the most precise process gas adjustment possible by means of a suitable arrangement of the various device elements, the at least two perforated plates of the claimed filter device can also be aligned, particularly preferably parallel to one another and, in a particularly preferred case, orthogonal to the flow direction of the process gas stream to be introduced. Such an orientation allows any shear currents within the process gas to be particularly effectively prevented, so that the effectiveness of the homogenization process by means of the filter element and the fanning out by the first perforated plate can be maximized.In addition, the above-mentioned orientation of the perforated plates enables, in particular, the claimed filter device to be designed as a rectilinear, functional flow chamber, so that not only can a flow profile be created between the two perforated plates that is isolated from or independent of the rest of the gas supply system, but the area formed by these two device elements (due to the preferably uniform and homogeneous flow) can also be ideally used to measure any process gas properties.In this respect, the claimed filter device can, in a particularly preferred embodiment, also preferably be configured to connect to at least one or a plurality of process gas sensors, for example for measuring the speed, the components or the pressure of the process gas used, or to integrate these into the flow path created by the filter device, so that an optimal analysis of the process gas to be introduced can be made possible by means of the filter device.

[0043] However, in the previously described embodiments, the filter element positioned between the two perforated plates can preferably still be attached to or contacted at least on the first perforated plate, so that it is effectively prevented that material particles to be captured by the filter medium enter an intermediate space formed by the filter device and thus can accumulate within the filter device.In a particularly preferred embodiment, however, the filter device can also preferably be configured such that the filter element in particular also fills the entire cavity generated by the two perforated plates within the filter device, whereby not only the above-mentioned material enrichment within the filter device is avoided, but equally any turbulences occurring at boundary layers (for example during the transition from air to solids) within the process gas can be effectively avoided.

[0044] To implement the features described above, in a first preferred embodiment, at least the dimensions of the filter element can preferably be configured such that it can be inserted into the aforementioned cavity of the filter device in a form-fitting manner. In a further embodiment, however, it may also be possible for not the dimensions of the filter element, but in particular those of the cavity formed by the perforated plates, to be designed to be adaptable, whereby preferably any shape and size of the filter element to be used can be integrated into the claimed filter device.

[0045] For the above-mentioned purpose, the filter device can preferably comprise, for example, an additional adjustment mechanism, for example a tensioning device connected to at least one of the two perforated plates, a tensioning arm, or an adjustable rail device, with which at least one of the perforated plates can be displaced or tilted along at least one axis and thus adjusted to the shape of the filter element to be used. In this respect, the filter device can be configured, for example, by the previously described adjustment mechanism to move the at least one displaceable perforated plate along the above-mentioned axis and thus preferably adjust the distance between the two perforated plates such that the filter element to be used can preferably be positioned precisely between the perforated plates.In further embodiments, the previously described regulating mechanism can also be used, in particular by bringing the at least one displaceable perforated plate closer to the other perforated plate, to clamp the at least one filter element to be used preferably between the two perforated plates, so that not only an extremely effective and cost-effective fixing method for inserting the filter element can be generated, but equally the replacement of the latter can be realized in a particularly simple and user-friendly manner by simply moving the at least one perforated plate away.

[0046] It can be seen below that with the aid of the above-mentioned and claimed filter device, a wide range of preferred advantages can be generated compared to conventional gas introduction processes introduced into production plants, which, due to the simultaneously compact and efficiently adaptable device elements of the filter device, can preferably be introduced into any type of production plant based on optical interaction processes.

[0047] Furthermore, a manufacturing system including the previously described filter device is also claimed, which equally has the above-mentioned advantages and is thus equally distinguishable from conventional manufacturing systems.

[0048] The claimed manufacturing system can at least equally comprise one or a plurality of manufacturing systems based on optical interactions in accordance with the definition described above, as well as one or more embodiments of the previously defined filter devices integrated into the manufacturing system. In this respect, the manufacturing system of the claimed manufacturing system can initially be regarded at least as a device comprising at least one light source (such as a laser, a high-power LED, or a solid-state radiator) for processing the workpiece materials and / or other materials, one or more optical elements generated by the light source and filtered by means of a series of optical elements (mirrors, lenses, optical filters, etc.).) defined light path and a working area defined for the manufacturing process and preferably separated from the external environment of the manufacturing plant, whereby the claimed manufacturing plant can preferably be identified with any conventional manufacturing plant based on optical interactions.

[0049] In a preferred embodiment, however, the corresponding manufacturing facility of the manufacturing system can also be configured in particular to be usable at least for the additive manufacturing of workpieces, such as using selective laser melting (SLM). In particular, the manufacturing facility based on optical interactions can preferably comprise at least one process chamber for this purpose, into which the workpiece materials and / or other materials required for workpiece production can be introduced and processed by exposure using the light source. In this respect, said process chamber can, in a particularly preferred case, also be configured such that, in particular, the interior of the process chamber can be used for the respective manufacturing processes and thus define the existing work area of ​​the manufacturing facility.

[0050] The process chamber itself can also preferably be designed to be completely or hermetically sealable, in particular in order to be able to meet the atmospheric conditions required for the SLM process, and in particular can be equipped with a number of chemical and / or mechanical control elements which enable the process chamber of the manufacturing system to generate and preferably dynamically adapt an atmosphere required for the manufacturing process and to be formed within the working area (for example by supplying certain process gases and setting a pressure to be created within the working area), whereby an extremely stable and error-free manufacturing process can be realized.

[0051] Specifically, the process chamber can, for example, comprise at least one gas inlet device coupled to a gas supply system of the production plant, by means of which the introduction of the process gases described above can be regulated and thus the aforementioned removal process of any material particle residues accumulating within the working area can be realized.Thus, in a particularly preferred embodiment, the gas inlet device mentioned can be equipped, for example, with a gas circuit for providing process gases to be introduced into the working area of ​​the production plant and at least the previously described gas supply system, for example a plurality of valves and gas supply lines connected to the process chamber and the gas circuit, which allow the gas inlet device to guide a predefined process gas or a process gas mixture into the interior of the process chamber via an inlet contacted with the process chamber and thus to adapt the working area of ​​the production plant to the atmospheric conditions of the respective production process.

[0052] In order to be able to equally use the process gas flow generated in the working area of ​​the production plant to remove any material particles that may arise, the process chamber may also comprise at least one gas outlet, such as a further, preferably adjustable gas valve or a gas connection device that is installed in the process chamber, with which the process gas flow introduced into the working area can be withdrawn from the process chamber again and thus a continuous process gas flow can be formed within the working area that is designed to entrain / absorb material particles that may arise during the production process.

[0053] The general shape and positioning of any gas inlets or outlets within the production facility, as well as the structuring of the aforementioned gas inlet device, can preferably vary depending on the production processes used and the operating procedures of the production facility. However, in a particularly preferred embodiment, at least the gas supply system or the gas supply lines encompassed therewith and used to introduce the process gas can preferably already be flat, i.e., with a comparatively large flow cross-section (for example, at least half the process chamber cross-section to be used), so that, on the one hand, the widest possible flow profile of the process gas is already formed in the gas supply system, but, on the other hand, the pressure accumulating within the gas supply system can also be effectively reduced.Furthermore, the above-described gas outlet of the process chamber can particularly preferably be positioned on a side wall of the process chamber, preferably close to the base area of ​​the latter, thereby generating the advantage that the process gas flow generated by the gas inlet device can be directed in particular close to the production area and thus close to the particle source to be removed (the machined workpiece).

[0054] In another particularly preferred embodiment, the process gas flow flowing through the work area of ​​the production plant can also comprise not just one, but preferably several process gas flows, which, depending on the selected production process, have different properties and can thus be used for different purposes. Thus, a preferred embodiment of the production plant can, for example, comprise at least one first primary process gas flow guided along the base area of ​​the work area, in particular for removing particle residues on said base area of ​​the work area, as well as a second secondary process gas flow spanning the entire process chamber, which can preferably be configured to remove further particle residues in the remaining entire process chamber.In this respect, the division of the process gas flow in the process chamber into several process gas streams in this way can generate the advantage that, depending on the regional strength and degree of contamination of the particle deposits accumulating in the work area, a flow profile can be created specifically tailored to the above-mentioned properties of the deposit. Accordingly, the primary process gas flow can, for example, preferably be equipped with a higher flow velocity than the secondary process gas flow in order to remove the material particles more frequently found at the bottom of the process chamber more quickly and efficiently. In contrast, the secondary process gas flow can preferably be designed as a slower, but much more extensive and, in a particularly preferred case, even continuous process gas flow, which can ensure extremely uniform particle removal.

[0055] The filter device designed to improve the process gas flow and protect the gas introduction system from possible material deposits can also preferably be integrated directly into the gas introduction system, i.e., into at least one valve of the gas introduction system, so that the process gas stream to be introduced into the work area of ​​the production plant preferably comes into direct contact with the filter device, flows through it, and can thus optimize its properties according to the principles already mentioned above. In order to further ensure the greatest possible effect of the filter device, the claimed filter device can also, in a preferred embodiment, be connected in particular directly to the process chamber of the production plant, so that the process gas stream optimized by the filter device can preferably be introduced into the work area without interaction.

[0056] Thus, in an extremely preferred embodiment, the filter device can, for this purpose, in particular, be designed to be integrated at least into one wall of the process chamber, so that the optimized process gas described above can preferably reach the process chamber directly after flowing through the filter device. More precisely, for this purpose, the at least one perforated plate of the filter device, which is configured to fan out the process gas flow, can preferably be designed to be insertable onto the above-mentioned wall of the process chamber, whereby said perforated plate can be used not only as a direct inlet for the process gas into the process chamber, but can also function as a functional component (i.e., at least as part) of the process chamber.

[0057] In this respect, a preferred inlet process of a process gas to be introduced into the working area of ​​the claimed production plant in the present invention can include an at least three-stage introduction mechanism. Thus, in a first step, selected process gas can be admitted through the gas inlet device, for example from the aforementioned gas circuit, into the gas supply system also included in the gas inlet device, so that the respective process gas can be guided towards the process chamber via the valves and gas supply lines included in the gas supply system. In a second preferred step, the introduced process gas can then be directed within the gas supply system to the gas inlet device which is fluidically connected to the gas inlet device (iefor example, integrated in the gas supply system) filter device and are consequently introduced into the filter device based on the gas flow generated by the gas inlet device, whereby the process gas flow can preferably be at least homogenised and fanned out by means of the implemented filter and distribution elements and thus can be optimised for flow through the work area of ​​the production plant. In a preferably final step, the optimised process gas can also be led out of the at least one perforated plate of the filter device and thus be guided into the process chamber of the respective production plant in an improved manner, so that a process gas flow can be formed which is preferably optimally adapted to the circumstances or conditions of the respective production process. Accordingly, the above-described combination of a gas supply system (orthe gas supply device used for this purpose) and the filter device preferably integrated in this, has the particular advantage that the gas supply system is not only effectively protected by the filter device against any material particle deposits, but the process gas flow guided through it can also be optimally aligned to the conditions within the process chamber.

[0058] In addition, as already described above, the extremely compact and preferably easily replaceable design of the claimed filter device enables particularly simple adaptation of the device features of the filter device to any changes to be made within the production plant.

[0059] Thus, as mentioned, it is possible, for example, that individual device elements of the filter device and / or the entire filter device itself in the integrated state can be easily replaced with a respective optimized version (with regard to the above-mentioned changes within the production plant), so that, for example, in the course of a material change or when changing the process gas to be used (or its properties), the filter device can be adapted to the new circumstances extremely effectively and cost-effectively. In addition, it may also be possible, in particular, for the gas inlet device implemented in the production plant to be configured to adjust the flow properties of the process gas stream to be introduced, preferably depending on the nature of the filter device, iein particular the features of the distribution element and / or the filter element, whereby the operation of the filter device can be further improved. In this respect, in a particularly preferred embodiment, the gas inlet device can also, for example, preferably be equipped with at least one or more control devices, which preferably allow the gas inlet device to selectively change predefined properties of the process gas flow to be introduced into the filter device and thus to adapt it to any new features of the filter device. For example, the at least one control device can preferably be designed to be coupled to the valves of the gas supply system, whereby the control device is able, for example, preferably upon receipt of a change signal, to change the above-mentioned properties of the process gas flow (e.g., the pressure, chemical components, etc.).) to new features of the filter device and thus achieve a process gas flow that is optimally aligned to the filter device in use at all times. Conversely, however, as already described above, the filter device can also be designed to be adaptable to the properties of the process gas to be introduced, thus creating a control system based on multiple adaptation options.

[0060] The precise adjustment process to be carried out by means of the control device can again vary depending on the production facility to be used and the production processes used there. In a first exemplary embodiment, however, it may at least be possible for the aforementioned adjustment of the process gas flow to be carried out, for example, by a manual activation signal, for example preferably by manually inputting the above-mentioned change signal to the control device. In this respect, for example, a processor who has already performed an adjustment to the filter device can, after completing the adjustment of the filter device, similarly transmit a predefined signal (the change signal) tailored to the performed adjustment to the control device, whereby the control device makes corresponding adjustments in the gas supply system.In other cases, it may also be possible for the changes carried out by the control device to be carried out preferably in an automated manner, for example by detecting any adjustments within the filter device by integrated sensors and using them, by means of automated data transmission, to generate an individual change signal (e.g. by using internal databases).

[0061] Furthermore, based on the above-mentioned properties of the claimed manufacturing plant and the filter device integrated therein, a series of method steps are claimed which can also be assigned to the claimed invention and are thus equally to be distinguished from method steps of conventional manufacturing plants or filter devices based on optical interactions.

[0062] More specifically, the claimed method steps relate to a method for adjusting an atmosphere within a manufacturing system based on optical interactions, in particular an SLM system, comprising at least one light source configured to manufacture a workpiece, a plurality of optical elements for controlling a light path emanating from the light source, and a process chamber defining a working area of ​​the manufacturing system, wherein the method steps may at least comprise:

[0063] Integrating a filter device according to the previously described

[0064] Features on at least one wall of the optical interaction-based manufacturing facility;

[0065] Generating a regulated process gas flow into the working area of ​​the process chamber by introducing a process gas stream passed through the filter device into the process chamber; and regulating the process gas flow by adjusting the nature of the distribution element and / or the filter element of the filter device.

[0066] In addition, other process steps also claimed may include at least the following activities:

[0067] - Regulating the process gas flow to be introduced into the filter device by means of a gas inlet device depending on the nature of the distribution element and / or the filter element of the filter device;

[0068] - Replacing the at least one perforated plate and / or the filter element before a material change in the production plant, wherein the replaced perforated plate and / or the filter element is adapted to the material to be used.

[0069] In a further advantageous embodiment, a manufacturing system is proposed for manufacturing a workpiece using a manufacturing system based on optical interaction, in particular an SLM system. The manufacturing system can comprise: an optical interaction-based manufacturing system with at least one light source configured to manufacture the workpiece and / or one or more optical elements for controlling a light path emanating from the light source and / or a process chamber defining a work area of ​​the manufacturing system; and at least one filter device. The filter device can be integrated on (or in) a wall of the process chamber.

[0070] The manufacturing system may also include a first sensor system. The first sensor system may be equipped with one or more sensors for detecting and / or determining the process variables (in particular the properties of the gas supplied or to be supplied into the process chamber).

[0071] A process gas supplied to the process chamber is first guided into the fluid chamber or an inlet area before flowing through the filter device into the process chamber. The first sensor can be arranged in the area of ​​the fluid chamber (or the inlet area) of the gas supply and / or upstream of the filter device. Thus, the first sensor can be arranged behind the filter device, protected from the influence of process byproducts (which may be present, for example, in the process chamber). In the area of ​​the fluid chamber (or the inlet area), the first sensor can thus reliably detect measured values ​​and / or process variables.

[0072] The manufacturing system may comprise a fluid chamber (or a gas inlet box or an inlet area) arranged adjacent, preferably directly adjacent, to the process chamber (i.e., the work area of ​​the manufacturing system or the construction space). The fluid chamber may be connected to the gas inlet device and thus to a gas circuit for providing process gas to be introduced into the work area of ​​the manufacturing system.

[0073] The fluid chamber preferably has a (substantially horizontally arranged) upper wall and one or more adjacent side walls. Particularly preferably, the filter device is formed as part of a wall of the fluid chamber and simultaneously as part of a wall of the process chamber. The sensors are preferably arranged at least on the upper wall and / or on at least one side wall of the fluid chamber. The sensors of the first sensor system can also be arranged on the upper wall and / or side wall in such a way that they protrude from the wall surface into the fluid chamber. This can further improve the measurement accuracy.

[0074] Advantageously, the fluid chamber can have a fluidic connection to a gas circuit (which can preferably have an internal filter system for processing the process gas and a pump for conveying the process gas) via a connecting opening.

[0075] In addition, the fluid chamber can have a stop wall positioned in front of the connection opening, which the process gas flowing into the fluid chamber can initially encounter after being discharged from the gas circuit, thus effectively reducing any turbulence in the process gas flow to be used within the fluid chamber. Advantageously, at least one sensor of the first sensor system can be arranged directly above the stop wall on the upper wall of the fluid chamber.

[0076] The advantageously arranged first sensor system can comprise one or more pressure sensors. The pressure sensors can be configured to detect the process pressure and / or the filter device differential pressure. Further advantageously, the sensor system can comprise one or more sensors for detecting the oxygen content in the fluid chamber / process chamber and / or for detecting the oxygen content in the filter region.

[0077] In addition, at least one sensor can be provided to detect the gas flow from the fluid chamber. Furthermore, at least one temperature sensor can be provided to detect or determine the gas temperature and / or the dew point of the process gas and / or the build chamber temperature.

[0078] In addition, a second sensor system can optionally be provided for determining the process variables, wherein this second sensor system is arranged outside the fluid chamber and can in particular be arranged in the process chamber.

[0079] Method steps for producing a component using a previously described manufacturing system can at least additionally comprise one or more of the following steps: regulating the process gas flow to be introduced into the filter device by means of a gas inlet device at least partially as a function of detection values ​​from the first sensor system; generating a regulated process gas flow into the working area of ​​the process chamber by introducing a process gas flow conducted through the filter device into the process chamber, at least partially as a function of detection values ​​from the first sensor system; regulating the process gas flow by adapting the nature of the distribution element and / or the filter element of the filter device, in particular by replacing the filter element at least partially as a function of detection values ​​from the first sensor system;Controlling the laser light source at least partially as a function of detection values ​​from the first sensor;

[0080] Short description of the characters

[0081] Figure 1: shows a cross-section of a manufacturing system based on optical interactions, specifically an SLM system, with a filter device integrated into a wall of the process chamber;

[0082] Figure 2: shows a three-dimensional cross-sectional view of the optical manufacturing system of Figure 1;

[0083] Figure 3: shows Figure 2 with additional flow lines to mark the primary and secondary process gas flows used in the manufacturing plant;

[0084] Figure 4: shows a further embodiment of a production plant integrated with the filter device as a three-dimensional cross-sectional drawing, wherein the production plant also comprises a flat gas supply device;

[0085] Figure 5: shows the production plant of Figure 4 in a vertically mirrored view;

[0086] Figure 6: shows a two-dimensional cross-sectional drawing of the filter device of Figures 4 and 5;

[0087] Figure 7 shows a further design of the production facility.

[0088] Detailed description of preferred embodiments

[0089] In the following, exemplary embodiments of the present invention are described in detail with reference to exemplary figures. The features of the exemplary embodiments can be combined in whole or in part, and the present invention is not limited to the described exemplary embodiments.

[0090] Figures 1 and 2 show a schematic embodiment of a first manufacturing plant FA based on optical interactions, specifically a manufacturing plant for selective laser melting, according to the claimed invention, in which a material to be processed (here shown as material layer 6) can be produced or processed by means of optical irradiation in a work area 4 of the manufacturing plant FA.

[0091] For this purpose, manufacturing systems, such as the manufacturing system FA shown in Figures 1 and 2, provide at least one (laser) light source which, via a control system coupled to the manufacturing system FA, generates a light beam modified for interaction with the material to be processed. This light beam is focused via a predefined light path onto the aforementioned material, which is usually positioned in the work area 4, using various optical elements, preferably integrated in a scanning head, such as focus or scattering lenses, mirrors, optical filters, etc. The processing or production of the material / workpiece thus illuminated by the focused light beam then takes place by means of local and preferably sequential plastic deformations of the material introduced into the work area 4.For example, in the SLM system shown, for the production of any three-dimensional workpiece, the material to be processed is first applied in powder form in a thin material layer 6 into the working area 4, preferably onto a vertically movable base plate, and is positioned by moving said base plate to a processing height corresponding to the light path of the light source.The material layer 6 to be processed is then locally remelted for processing by means of the above-mentioned light beam which, in the present production plant, is focused through the protective glass 10 onto the material layer 6 and, after solidification, forms a solid material layer onto which, in subsequent process steps and with the aid of a coater 8 which is also located in the production plant FA, additional material layers are again applied and these are repeatedly melted together with the aid of the focused light beam until a desired three-dimensional material shape (the workpiece) is obtained.

[0092] As already mentioned, however, due to the manufacturing process described above, the problem usually arises in state-of-the-art SLM systems that any process residues arising during production, such as smoke or material particles released into the atmosphere, can have a negative effect on the processing quality of the respective production system FA. For example, material deposits on the protective glass 10 or changing refractive indices within the production atmosphere can result in adverse refraction of the processed light beam. Furthermore, the equally existing penetration of material particles into any process gas supply systems forces an equally complex and costly cleaning of the latter, since otherwise, in the event of material changes, a high risk of contamination by residual particles must be assumed.In this respect, the device combination of the optical manufacturing system FA and the filter device FV as shown in Figures 1 and 2 is proposed to solve the above-mentioned problems.

[0093] According to the exemplary embodiment shown therein, the production system FA comprises, in particular, the work area 4, in which a material layer 6 to be introduced can be processed by means of the previously described production process and used to produce a preferably three-dimensional workpiece. In order to be able to generate an atmosphere required or at least advantageous for the production process, the work area 4 is further embedded in the preferably completely and hermetically sealable process chamber P, which completely encloses the work area 4 by the process chamber walls marked 2 and thus, in particular, allows process gases or atmospheric conditions (for example, a predetermined pressure) supplied to the work area 4 to be maintained within the process chamber P and thus in the production system FA.

[0094] To introduce these process gases, the production system FA in the present embodiment is equipped with two gas inlets, designated 12 and 13, which are let into the process chamber P and are connected to a gas circuit of the production system FA via two preferably separate, but in other cases also connected or even identical, gas inlet devices GV, and thus enable a plurality of predefined process gas flows to be introduced into the process chamber P. The process gas is preferably continuously conveyed in a circuit between the process chamber and a filter system for processing the process gas (gas circuit). In the illustrated embodiment, the process gas flows that can be introduced into the work area 4 of the production system FA in this way have important functions. The main task of the process gas flow is to remove welding fumes, condensate, and welding spatter from the process chamber.To maintain the oxygen concentration (e.g., <0.05% residual oxygen content), separate oxygen monitoring and flooding are preferably provided. A further requirement for the process gas flow system is that, with maximum condensate removal, etc., the powder bed must remain untouched to prevent powder from being conveyed into the filter system. In this respect, it should be understood that the flow characteristics of the process gases to be introduced (e.g., the flow profile, velocities, dimensions of the process gas, etc.) are important in the present invention for both the current (supply of the process gas) and the long-term technical quality assurance of the manufacturing process.

[0095] In addition, the process gas flows to be introduced through the two gas inlets 12 and 13 can also fundamentally differ from one another.

[0096] For this purpose, Figure 3 shows a schematic representation of the flow profiles admitted into the process chamber P through the gas inlets 12 and 13. In the exemplary embodiment shown, for example, a first process gas flow, also referred to as the primary process gas flow Fl, is generated by the gas inlet 12, which is stronger than the second gas inlet 13. Due to the gas inlet 12 being positioned near the bottom of the process chamber P, this first process gas flow is primarily guided along the base area of ​​the working area 4, marked A1, and can thus primarily occupy a volume in the vicinity of the material layer 6. This has the particular advantage that the primary process gas flow Fl, positioned near the material layer 6, already enables the removal (or suction) of welding fumes and welding spatter immediately after they arise.In this respect, the primary process gas flow Fl in the present invention initially forms a main flow with which a large part of the process residues arising, such as welding fumes, condensate and welding spatter, can be removed.

[0097] The secondary process gas flow F2 introduced from the second gas inlet 13, however, can differ from the previously described primary process gas flow Fl in such a way that the former can extend as extensively as possible, i.e. preferably over the entire, but at least over an upper portion A2 of the process chamber P, whereby any residues that cannot be reached by the primary process gas flow Fl, for example smoke rising upwards, are efficiently captured by the secondary process gas flow F2.In this respect, the two process gas flows Fl and F2 admitted into the process chamber P thus form two flow profiles in the present invention that can be distinguished from one another and are preferably designed to fulfill different tasks, thereby generating the advantage that by selectively adapting each of the above-mentioned flows, an individual improvement of the particle cleaning mechanism generated thereby can be realized.

[0098] For the renewed removal of the previously described process gas streams Fl and F2, the process chamber P is also equipped with a gas outlet 11 positioned opposite the gas inlets 12 and 13, which in particular enables the primary and secondary process gas streams Fl and F2 to be led out of the process chamber P and thus also allows the material particles captured by said gas streams to be removed from the work area 4 of the production system FA. For this purpose, the gas outlet 11 can preferably also be equipped with a predefined negative pressure, which in particular allows the production system FA to remove a preset amount of process gas per unit of time from the process chamber P and thus preferably to maintain the process gas concentration in the work area 4 at a constant level.In further preferred embodiments, it may also be possible for the gas outlet to be coupled to a recycling system in which the process gas discharged from the process chamber can be cleaned and then fed back into the gas circuit of the aforementioned gas supply device GV.

[0099] In order to further improve the flow profile of the secondary process gas stream F2, in the exemplary embodiment of the production plant shown in Figures 1 to 3, the gas inlet 13 is equipped with a preferred embodiment of the filter device FV, which is also claimed. Accordingly, in the present illustration, at least the secondary gas stream F2 already shown is formed by means of the filter device FV or is more precisely defined by it.

[0100] In further embodiments, however, it may also be possible for further gas inlets, such as the gas inlet 12, to be equipped with a filter device FV, so that the positioning of the latter does not have to be limited to this one embodiment.

[0101] In this case, the filter device FV is particularly integrated into the side wall 2' of the process chamber. More precisely, in the present case, the integrated filter device FV itself forms at least one side wall 2' of the process chamber P after integration into the process chamber P, so that the filter device FV can be regarded as an integral component of the illustrated production system FA. This consequently has the particular advantage that the extremely large effective or gas inlet area of ​​the filter device FV can generate a particularly flat process gas profile, which, due to the direct contact with the work area 4, can also be guided into the process chamber P as unhindered as possible.

[0102] Functionally, the illustrated filter device FV is also explicitly composed of the three-element form already described above in the illustrated embodiment: A filter element 18 is positioned between two perforated plates 14 and 16, shown here as perforated plates, which, equivalent to the said perforated plates, occupies the size of the side wall 2' and is thus functionally designed over the entire side wall 2'.In the present case, the filter element 18 is designed in particular as a replaceable filter fabric, for example an at least two-dimensional filter fleece, with a predefined mechanical porosity of pore size M and a filter width of length D3, which makes it possible, depending on the aforementioned features of the filter element 18, both to absorb process residues entering the filter device FV into the filter fabric and, due to the diffusive properties of the pores embedded in the filter element, to efficiently homogenize the process gas flowing through the filter device FV. Accordingly, the filter element 18 orThe filter fabric encompassed thereby in the present invention is particularly designed such that, due to specifically adapted features (such as the above-mentioned pore size M, the filter width D3, but also other properties, such as the density of the filter fabric), it can perform the above-mentioned dual task and thus function both as a homogenized and as an efficient particle filter. For this purpose, for example, at least the pore size M of the filter element 18 can be selected to be smaller than the particle size of the material used. In addition, it is also possible for the filter element 18 to be equipped with a specific, predefined pore pattern that favors the homogenization of a gas flowing through. The perforated plates 14 and 16 of the filter device FV are also in surface contact with the filter element 18 in the form shown.In this respect, the filter device FV in the present case forms a rectilinear fluid chamber in which both the filter element 18 and the two perforated plates 14 and 16 are aligned parallel to each other and in particular orthogonal to the process gas flow to be introduced into the working area, whereby a particularly uniform distribution of the process gas can be achieved and the occurrence of adverse shear forces can be effectively prevented.

[0103] The first perforated plate 14, which is oriented towards the inside of the process chamber and functions equally as such, further has the width D1 and is equipped with predefined perforations LI, such as punched holes, which allow the perforated plate 14 to fan out the process gas previously homogenized by the filter element 18 downstream and thus preferably to introduce it directly into the process chamber P. The above-mentioned properties of the perforated plate 14 are preferably adapted at least to the previously described features of the filter element 18 (such as the pore size M and the filter width D3), so that the process gas flow passing through the filter element 18 to the perforated plate 14 can preferably be processed optimally.

[0104] The second perforated plate 16 positioned upstream of the filter element 18 also has a similarly predefined width D2 and perforation L2, which differ from those of the first perforated plate 14, but in certain embodiments may also be identical. In this case, the second perforated plate 16 functions, in particular, as a fanning element positioned upstream and connected to the gas supply system (not shown) of the previously described gas supply device GV, through which the process gas provided by the gas supply device GV first impinges on the filter device FV and distributes it as evenly as possible along the filter element 18 through the perforations L2.

[0105] In this respect, the interaction processes within the present filter device FV initially provide that a specific process gas stream provided by the gas supply device GV impinges on the perforated plate 16 connected to the gas supply device GV (or its gas supply system) and is homogenized by the perforations L2 due to the interactions. The process gas stream then reaches the filter element 18 (which is preferably a filter fleece), which further homogenizes the process gas stream so that a preferably uniform gas flow profile is generated after exiting the filter element. The further flow of the homogenized gas through the perforated plate 14 further expands the previously described gas flow profile so that ultimately the (secondary) process gas stream, which preferably fills the entire process chamber, can be guided into the working area 4.The main task of the filter element 18 during the construction process is thus the homogenization of the process gas flow. The process gas flows through the filter element along a first direction. Furthermore, the filter element is also used as a filter or protection against mixing with powder residues, namely during the unpacking (unpacking process) of the workpiece or construction job. This causes the particles to be blocked / filtered along a second direction, which is preferably opposite to the first direction. Since powder can be whirled up during the unpacking process, the filter element 18 is intended to prevent the powder, for example, from getting from the process chamber into the provision area (in particular gas circuit, box, etc.) of the secondary flow. The filter element 18 is thus provided as a type of membrane. The process gas is passed through one side of the filter element 18 (iethe side facing away from the process chamber) is allowed to pass through (with the advantage of homogenising the flow when it is introduced into the process chamber), and in addition, during the unpacking process, no powder can enter the feed elements / boxes of the secondary flow from the opposite direction (ie out of the process chamber and thus through the side facing the process chamber) because these are blocked by the filter element 18.

[0106] In this respect, it is evident that the present filter device forms a device system with several interdependent and mutually adapted device elements which, due to the multifunctional properties of said device elements, enable the generation of a process gas flow directed to the working area 4 and selectively adjustable and thus, in comparison to the prior art, create improved atmospheric conditions within the process chamber P to be used.

[0107] Figures 4 and 5 also show a further embodiment of the claimed production system FA. The embodiment illustrated in these figures differs from the production system shown in Figures 1 to 3 in particular in that the perforated plates 14 and 16 in this case are not provided with perforations extending across the entire plate, but rather, these perforations differ spatially. For example, the perforated plate 14 in this case has a first perforation LI formed in the lower half of the perforated plate 14 and designated LI, whereas the upper half of the plate is provided with a second perforation L4.The two perforations LI and L4 can differ, in particular, in the hole size used, the distribution of the perforations, their density, or even in the width of the plate used, which in particular generates the advantage that the process gas flow profile generated by the perforated plate 14 can be adjusted even more selectively (i.e., by combining various, spatially separated properties of the perforated plate 14). Furthermore, it may also be possible for part of the perforated plate to have no perforations at all.For example, Figure 4 shows that the perforated plate 16 of the illustrated filter device FV contains an upper portion in which no perforations have been introduced at all, so that the process gas stream introduced into the filter device FV through the gas supply device GV can only enter the filter device FV through a lower portion of the perforated plate 16. Accordingly, in the present case, a selective local recess of any perforations or other features within the filter device FV generates an efficient gas inflow, which can further increase the effectiveness of the filter device FV.

[0108] Furthermore, Figures 4 and 5 show a preferred embodiment of the gas supply device GV connected to or integrated with the filter device FV. More precisely, the above-mentioned figures show a portion of the gas supply system comprising the gas supply device GV, which in the present embodiment was implemented as a flat flow chamber 20. The size of the described flow chamber 20, particularly in the vicinity of the filter device FV, is adapted to the size of the filter device FV and is preferably the same size as the perforated plate 16 contacted therewith. This extremely flat design of the gas supply system has the particular advantage that the process gas flow to be introduced into the filter device FV can be widely dispersed even before entering the perforated plate 16 and can thus be admitted flatly into the filter device FV.In addition, this prevents excessive pressure build-up within the gas supply system.

[0109] In order to further provide the process gas to be used, the illustrated gas supply system is further connected to a gas circuit (which preferably has an internal filter system for processing the process gas and a pump for conveying the process gas) via a connecting opening 22. Furthermore, a stop wall (not shown) positioned in front of the connecting opening 22 is mounted in the illustrated fluid chamber. The process gas flowing into the fluid chamber initially encounters this stop wall after being discharged from the gas circuit, thus effectively reducing any turbulence in the process gas flow to be used within the present gas supply system.

[0110] In order to continue to be able to efficiently control the inlet of the process gas, the gas supply device GV, as already mentioned above, can further comprise at least one control device for adapting the properties of the process gas to be introduced through the gas circuit. In this respect, the gas supply device can be configured for this purpose, in particular, to adapt the properties of the process gas fed from the gas circuit, in particular the flow rate, the pressure, or the components of the process gas, to the conditions of the filter device or, in general, to the properties of the production plant, so that further selective control of the process gas flow profile to be generated can also be realized by adjusting the gas supply device GV.

[0111] Figure 6 also shows again a two-dimensional cross-sectional profile of the filter device FV already shown in Figures 4 and 5.

[0112] As can be seen here, in this case too, the two perforated plates 14 and 16 and the filter element 18 form a device system oriented parallel to one another and orthogonal to the process gas flow direction, so that the process gas flow can be guided as efficiently as possible from the fluid chamber 20 through the filter device FV into the process chamber P. In addition, the clamp-like positioning of the two perforated plates 14 and 16 offers the possibility of designing the filter element 18 in particular so that it is particularly easy to replace.

[0113] For example, in the present embodiment, the filter element 18, designed as a filter fabric, can simply be inserted into the cavity between the two perforated plates 14 and 16 and removed again to adjust any process properties. The perforated plates 14 and 16 thus serve both as an element for fluid processing the process gas stream to be introduced and as a holding device for the replaceable filter element 18, thereby enabling an extremely simple and cost-effective replacement process for the filter element 18.In this respect, it is possible, for example, for a processor to replace the above-mentioned filter element 18 to simply open the process chamber P via a door or a movable wall, as symbolically shown in Figure 1, and manually remove a used filter element between the perforated plates 14 and 16 or insert a new filter element to be used into it, so that the filter element 18 can be replaced quickly and efficiently. In further embodiments, it may also be possible for other device elements of the filter device FV, such as the perforated plates 14 and 16, to be designed to be interchangeable, so that the filter device FV can preferably also be designed to be entirely modular.

[0114] In a further embodiment, according to Figure 7, which is based on one or a combination of the previously mentioned embodiments, a further improvement of the described device and the manufacturing method is achieved by advantageously adapting the sensors for detecting the process parameters and / or the gas properties. In known systems, the sensors (especially the oxygen sensors) are positioned directly in the process chamber and thus exposed to welding fumes, condensate, and powder. This not only reduces the service life of the sensors, but also can make process control less accurate over time and deteriorate component quality.

[0115] Therefore, in a further development of the described device in Figure 7, it is proposed to arrange the sensor system (preferably with one or more of the sensors S1, S2, S3) upstream of the filter element 18 (relative to the flow direction during the production of a component) and / or upstream (relative to the flow direction during the production of a component) of the perforated plates 16. The sensor system can therefore preferably be arranged in the fluid chamber 20. The arrangement of at least two sensors S1 and S2 opposite one another and on the upper side of the fluid chamber 20 and a further sensor S3 on a side wall of the fluid chamber has proven particularly advantageous.

[0116] Particularly advantageously, the sensors are arranged on the top side (on the upper cover) of the fluid chamber 20. Alternatively, the sensors can also be arranged on the top side and on a side surface of the fluid chamber 20. This arrangement therefore makes it possible to very precisely detect the supplied gas, which is passed through the fluid chamber 20, through the filter element 18 into the process chamber P, for example, to determine the oxygen content and / or moisture content.

[0117] In a further development, the gas pressure can also be determined by the sensors arranged on (or in) the fluid chamber 20. As shown in Figure 7, the filter device FV (with at least one perforated plate 16 and the filter element 18) is designed as part of a wall of the fluid chamber 20 and, at the same time, as part of a wall of the process chamber P.

[0118] Positioning the first sensor (partially or preferably completely) in the fluid chamber 20 (gas inlet box) and thus behind the filter element (and in particular behind the filter fleece or membrane) as viewed from the process chamber allows for an increase in the service life of the sensor and, at the same time, optimized / more precise process control. Optionally, a second sensor can also be arranged in the process chamber.

[0119] This protects the sensors from process by-products, resulting in a longer service life. In addition to the oxygen sensors, other sensors such as humidity or pressure sensors (particularly advantageously at least one oxygen partial pressure sensor and / or one nitrogen partial pressure sensor) can also be positioned there. It is therefore proposed to use the filter element 18 with a multiple function, namely to shield the sensor system (with one or more sensors SI, S2, S3) from contamination from the process chamber P (build chamber) and, at the same time, as an element that prevents harmful residual particles from penetrating upstream into the provided gas supply line (while still allowing gas supply), whereby the provided distribution element simultaneously ensures the largest possible and thus highest-quality gas flow profile.In addition, this arrangement protects the first sensor system from contamination or damage during the unpacking process. Therefore, particles accruing during the production of the component (workpiece) are blocked by the filter medium, and particles accruing during the unpacking process are also blocked by the filter medium in order to protect the first sensor system. The advantageously arranged (first) sensor system can comprise one or more pressure sensors. The pressure sensors can be configured to detect the process pressure and / or the filter differential pressure. Further advantageously, the sensor system comprises a sensor for detecting the oxygen content in the process chamber and / or in the region of the filter. In addition, a sensor can be provided for detecting the gas flow. Furthermore, a temperature sensor can be provided for detecting the gas temperature and / or the dew point of the process gas and / or the build chamber temperature.Thus, the first sensor system (preferably with sensors S1, S2, S3) is located behind the filter device, protected from the influence of process byproducts from the process chamber. The gas supplied to the process chamber P is therefore first directed into the fluid chamber 20 before flowing through the filter element 18 into the process chamber P. In the fluid chamber 20, process variables and / or gas properties can thus be detected by the first sensor system.

[0120] Existing features, components, and specific details may be exchanged and / or combined to create further embodiments, depending on the required application. Any modifications within the scope of the knowledge of the person skilled in the art are implicitly disclosed in this description.

[0121] LIST OF REFERENCE SYMBOLS

[0122] Process chamber walls 2

[0123] Material layer 6

[0124] Work area 4

[0125] Coater 8

[0126] Protective glass 10

[0127] Gas outlet 11

[0128] Gas inlets 12; 13

[0129] Distribution element 13

[0130] Perforated plates 14; 16

[0131] Filter element 18

[0132] Flow chamber, fluid chamber 20

[0133] Connection opening 22

[0134] Floor area Al

[0135] Share A2

[0136] Width Dl

[0137] Thickness D2

[0138] Filter width D3

[0139] Production plant FA

[0140] Filter device FV

[0141] Perforations, Perforations LI; L2; L4

[0142] Pore ​​size, porosity M

[0143] Process Chamber P

[0144] Sensors SI, S2, S3

Claims

PATENT CLAIMS Filter device (FV) for adjusting an atmosphere in a manufacturing system (FA) based on optical interactions, in particular an SLM system, comprising at least one light source configured to manufacture a workpiece, a plurality of optical elements for controlling a light path emanating from the light source, and a process chamber (P) defining a working area (4) of the manufacturing system (FA), with: - a distribution element (13) for the flat introduction of a process gas flow into the working area (4) of the production plant (FA), wherein the distribution element (13) comprises at least one perforated plate (14; 16) and; - at least one filter element (18) for homogenizing the process gas flow; wherein the filter element (18) is arranged on at least one perforated plate (14; 16) of the distribution element (13); and the filter device (FV) is designed to be integrated into at least one wall (2') of the process chamber (P). The filter device (FV) according to claim 1, wherein the filter device (FV) comprises at least two perforated plates (14; 16); and at least one of the perforated plates (14; 16) of the distribution element (13) and / or the filter element (18) is designed to be replaceable. The filter device (FV) according to at least one of the preceding claims, wherein the filter element (18) comprises a filter medium configured for particle filtration; wherein the filter medium has a porosity (M) with a predefined pore size; and the pore size of the filter medium is configured such that: process gas to be conducted through the distribution element (13) is allowed to pass through, and particles accruing during the manufacture of the workpiece are blocked by the filter medium and / or particles accruing during the unpacking process are blocked by the filter medium. The filter device (FV) according to at least claim 3, wherein the filter element (18) is configured to homogenize and / or filter the process gas flow to be conducted through the distribution element (13) by adapting at least the thickness (D3) and / or the pore size of the filter medium used.The filter device (FV) according to at least one of the preceding claims, wherein the filter device (FV) comprises at least a first perforated plate (14) and a second perforated plate (16); wherein the first perforated plate (14) of the distribution element (13) is designed as an inlet of the process gas into the filter device (FV) and the second perforated plate (16) is designed as an outlet of the process gas from the filter device (FV) into the process chamber (P) of the production plant (FA); and wherein. at least the second perforated plate (16) in the wall (2') of the Process chamber (P) is designed to be integrable. The filter device (FV) according to at least one of the preceding claims, wherein at least two perforated plates (14; 16) of the distribution element (13) are aligned parallel to one another, so that the distribution element (13) forms a rectilinear fluid chamber; and wherein the filter element (18) fills a cavity of the distribution element (13) provided by the at least two perforated plates (14; 16).The filter device (FV) according to at least one of the preceding claims, wherein the distribution element (13) comprises an adjustable filter holder for the guided positioning of at least one of the perforated plates (14; 16) and / or the filter element (18) to a working position on the filter device (FV); wherein the filter holder is configured to guide the at least one perforated plate (14; 16) and / or the filter element (18) along at least one predefined direction for positioning to the working position and to fix it in the working position. The filter device (FV) according to at least one of the preceding claims, wherein the at least one perforated plate (14; 16) is configured to vary the flow behavior of the process gas stream by adjusting at least the thickness (D1; D2) and / or the size of the perforations (L1; L2; L4) located in the perforated plate (14; 16).

9. The filter device (FV) according to at least one of the preceding claims, wherein the filter element (18) is designed as an antistatic filter fabric.

10. Manufacturing system for manufacturing a workpiece with a manufacturing system (FA) based on optical interaction, in particular an SLM system, comprising: - a manufacturing system (FA) based on optical interaction, comprising at least one light source configured to manufacture the workpiece, a plurality of optical elements for controlling a light path emanating from the light source, and a process chamber (P) defining a working area (4) of the manufacturing system (FA); and - at least one filter device (FV) according to claim 1; wherein the at least one filter device (FV) is designed to be integrated on a wall (2) of the process chamber (P).

11. The manufacturing system according to claim 10, wherein the optical interaction-based manufacturing system (FA) further comprises a gas inlet device (GV) for generating and / or introducing a process gas into the working area (4) of the process chamber (P); wherein the gas inlet device (GV) is fluidically connected to the filter device (FV); and the gas inlet device (GV) is configured to introduce process gas into the filter device (FV) and to filter the process gas through the at least one perforated plate (14; 16) of the filter device (FV) into the working area (4) of the process chamber (P).

12. The manufacturing system according to claim 11, wherein the gas inlet device (GV) is configured to adapt the flow characteristic of the process gas stream based on the nature of the distribution element (13) and / or the filter element (18).

13. The manufacturing system according to at least one of the preceding claims, wherein the optical interaction-based manufacturing system (FA) comprises a primary process gas flow (F1) guided along the base area of ​​the work area (4) for removing particle residues on the base area and a planar secondary process gas flow (F2) for removing particle residues in the process chamber (P); and wherein the process gas flow introduced into the work area (4) of the manufacturing system (FA) through the filter device (FV) forms at least the secondary gas flow (F2).

14. A method for adjusting an atmosphere within a manufacturing system (FA) based on optical interaction, in particular an SLM system, comprising at least one light source configured to manufacture a workpiece, a plurality of optical elements for controlling a light path emanating from the light source, and a process chamber (P) defining a working area (4) of the manufacturing system (FA), the method comprising at least one of the steps: - integrating a filter device (FV) according to claim 1 into at least one wall (2') of the production plant (FA); - generating a regulated process gas flow into the working area (4) of the process chamber by introducing a process gas flow passed through the filter device (FV) into the process chamber (P); - Regulating the process gas flow by adjusting the nature of the distribution element (13) and / or the filter element (18) of the filter device (FV), in particular by replacing the filter element (18). The method according to claim 14 further comprises at least one of the following steps: - regulating the process gas flow to be introduced into the filter device (FV) by means of a gas inlet device (GV) depending on the nature of the distribution element (13) and / or the filter element (18) of the filter device (FV); - replacing the at least one perforated plate (14; 16) and / or the filter element (18) before a material change of the production plant (FA), wherein the replaced perforated plate (14; 16) and / or the filter element (18) is adapted to the replaced material.

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