The invention discloses a
coating deposition process for an
implant, and relates to the technical field of
implant coating preparation, and the
deposition process comprises the following steps: S1, base material pretreatment: placing a base material in a deionized water
mixed solution for ultrasonic cleaning, adopting low-temperature
plasma purification treatment, utilizing high-energy particles of
plasma to bombard the base material, and using the high-energy particles of the
plasma to bombard the base material; the preparation method comprises the following steps: removing surface and internal impurities, introducing active groups, forming a nanoscale rough interface with the
surface roughness Ra of 50-200nm on the surface of a base material through a chemical
etching process and
femtosecond laser etching synergistic process, and carrying out
vacuum drying on the base material; s2,
metal gasification: placing a
metal tantalum raw material in an upstream heating zone of the
reaction chamber; the
chemical vapor deposition (CVD) technology is adopted,
osseointegration can be promoted, the
infection risk can be reduced, the method is suitable for porous implantation instruments of the orthopedics department, the dental department and the like, the obtained
coating technology is compatible with a complex base
material structure, the clinical
curative effect and the
life quality of a patient are improved, large-scale production is supported, and development of a new material industry chain is promoted.