Interference-free spectral reflection measurement

Abstract

The present invention relates to a method and a corresponding device for reflection measurement (5) on a surface of an object (1) to be measured. The method comprises: recording multiple individual reflection measurements at multiple different measurement positions (20) on the surface of the object (1) to be measured, with one individual reflection measurement (5) being recorded at each measurement position from the multiple different measurement positions (20); and determining a resulting reflection measurement (72) on the basis of at least one subset of individual reflection measurements (5) from the multiple individual reflection measurements (5) that have been recorded. Determining a resulting reflection measurement (72) can include, for example, determining an average value on the basis of the individual reflection measurements (5) contained in the subset. The individual reflection measurements (5) and the resulting reflection measurement (72) are spectral reflection measurements.

Description

[0001]Applicant: Rodenstock GmbH "Interference-free spectral reflectance measurement" Our reference: R 3392WO - hy / br Title: Interference-free spectral reflectance measurement Description The present invention relates to a method and a device for reflectance measurement on the surface of an object. Optical methods for the contactless measurement of an object by irradiating light onto the object and detecting the light reflected by an optically active surface of the object are known in the literature. It is an object of the present invention to provide a method and a corresponding device for reflectance measurement that deliver improved measurement results. This object is achieved by a method and a device for reflectance measurement having the features specified in the independent claims.According to a first aspect, a method for measuring reflection on a surface of an object to be measured is provided, the method comprising: recording a plurality of individual reflection measurements at a plurality of different measurement positions on the surface of the object to be measured, wherein in each case an individual reflection measurement is recorded at a measurement position from the plurality of different measurement positions; and determining a resulting reflection measurement based on at least a subset of individual reflection measurements from the plurality of recorded individual reflection measurements, wherein the individual reflection measurements and the resulting reflection measurement are spectral reflection measurements, i.e. reflection measurements that contain reflection values ​​for a plurality of wavelengths in a discrete or continuous spectral range. The spectral range can, for example, be a range in the visible and / or UV range.Other spectral ranges are also possible. The method for reflectance measurement according to the first aspect provides an improved measurement method, wherein this measurement method is based on a large number of individual reflection measurements recorded at different positions on the surface of the object to be measured. Based on the recorded reflection measurements, a resulting (e.g., averaged) reflection measurement is provided. Analogous to integral calculus in analysis, an abstraction can thus take place through a suitable calculation of the individual reflection measurements, and a new integral spectral quantity (the resulting reflection measurement) can be introduced and calculated, which better describes a property of the object to be measured. The new quantity cannot, in principle, be detected with the naked eye or with any imaging method; rather, it is calculated from the individual reflection measurements.A particular advantage of this approach is the obtaining of a largely interference-free or interference-reduced reflection measurement, in particular the obtaining of a spectrum recorded in reflection that exhibits low, reduced, or largely no interference. The interference can occur, for example, due to a variation in the refractive index and / or due to other side effects. For example, in the case of a coating, such as a hard lacquer coating, the interference can occur due to the (perfectly) matched refractive index of the coating. A further advantage of the reflection measurement method according to the first aspect is that there is no need to arrange the object to be measured in a specific position and / or orientation. This significantly simplifies and accelerates the measurement process.In principle, it is sufficient to calculate the resulting reflection measurement based on at least two recorded individual reflection measurements. An improved and, in particular, statistically reliable result is achieved with an increasing number of measurements. The positions of the different individual reflection measurements (i.e., the measurement positions) can be selected appropriately. For a rotationally symmetric object (such as an optical lens), the measurement positions can be arranged radially within a specified angular range (which can also encompass 360°). However, depending on the object, different arrangements of measurement positions are possible, such as linear arrangements, grid-like arrangements, etc.The plurality of individual reflection measurements can thus comprise at least two individual reflection measurements recorded at two different positions (measurement positions) on the surface. The number of recorded individual reflection measurements at different measurement positions is preferably at least 5, 10, 20, or more than 20. At least a subset of the recorded individual reflection measurements can be selected for determining the resulting reflection measurement. The subset can comprise at least two of the recorded individual reflection measurements. It is also possible to use the entirety of the recorded individual reflection measurements for determining the resulting reflection measurement; in this case, the selected subset is then identical to the set of all recorded individual reflection measurements. The method for reflection measurement according to the first aspect can be applied, for example, in the analysis of coatings.For example, the reflection measurement method can be applied to the analysis of multilayer or multi-layer systems, such as interferometric multilayer or multi-layer systems. The reflection measurement method can be significantly advantageous in this case, as it enables a reflection measurement to be obtained that best describes the coating or the multilayer or multi-layer system and from which, for example, the wavelength-related positions and / or reflection heights of extreme values ​​such as minima and maxima can be clearly read or recognized. The reflection measurement method can also be advantageously applied to the analysis of transparent or at least partially transparent coatings that have been applied to a paint system with at least one paint layer. The interference visible in the reflection measurement arises from the differences in refractive index in the overall system.In such a case, it is virtually impossible to capture the actual position of extreme points of a reflection measurement using a state-of-the-art method. For example, a coating layer (e.g., a hard coating layer) can be applied to at least one surface of an object (e.g., an optical lens, especially a spectacle lens) using a dipping process. Typically, the coating layer applied in this way exhibits a wedge-shaped variation in thickness across the object. In this case, the interference is primarily shifted by the coating thickness and thus by the wedge-shaped progression or "wedgeness" of the coating thickness. Particularly in a coating system with at least two coating layers, no trivial interference pattern is formed; rather, a beat pattern can result due to the interference modulations caused by the individual coating layers.With multiple layers of paint, the resulting interference pattern can be very complex. Using the reflection measurement method, any object can be measured in reflection, whereby the method is preferably suitable for optical objects and particularly preferably for lenses, in particular spectacle lenses. In particular, the object to be measured can be at least partially transparent. This means that the object to be measured does not have to be transparent over the entire extent of the surface to be measured, but can, for example, have at least one non-transparent region (such as a non-transparent edge region). Furthermore, it is not necessary for complete transparency. In addition to a first surface to be measured, the object to be measured can have a second surface (rear surface) opposite the first surface. The first and / or the second surface can orcan be optically effective surfaces. For example, the first surface to be measured can be the front or back surface of an optical lens, such as a spectacle lens. In general, when measuring reflection on an object with a front and a back surface, it is important to ensure that no back-reflected rays from the other surface impair or falsify the measurements when measuring on one of the two surfaces. In the case of a non-transparent object or an object with a non-negligible absorption capacity, the low transmission of the object can already lead to any back reflections being attenuated to such an extent that they are no longer detected when measuring on the front surface.In the case of a transparent object, the following options are available to the person skilled in the art, among others: - pre-treatment of the transparent object to be measured, and / or - measuring systems specially adapted to the measurement situation, and / or - use of a specially designed object, and / or - taking into account the additionally detected retro-reflected rays from the respective rear surface. Pre-treatment methods known to the person skilled in the art include, for example, roughening or matting the respective rear surface in order to achieve diffuse scattering behavior, which prevents the occurrence of bundled, detectable back reflections. This can be further optimized by optionally subsequently blackening the roughened or matted rear surface. Such blackening can be achieved, for example, by applying black ink or by affixing black adhesive tape. It is also possible to apply a reflection-reducing layer without prior roughening or matting.Matting is applied to suppress disruptive back-side reflections during individual reflection measurements. In general, this type of pre-treatment can be carried out either over the entire back surface, or it can be carried out selectively, particularly at those positions where measurements are to be taken on the front. The pre-treatment can also be automated. The use of a specially designed object is understood to mean, for example, the use of an object (such as a lens and in particular a spectacle lens) which has a higher radius of curvature on one of the two surfaces than on the other surface. This ensures that back reflections occurring on the other surface do not coincide with the reflections to be measured on the front surface.Alternatively or additionally, a lens (such as a spectacle lens) with a prismatic effect can be used, which also creates a different, generally non-parallel beam path between the front side reflections to be detected and the interfering reflections on the respective back side. In this way, the interfering back reflections are largely no longer detected. The consideration of the additionally detected back-reflected rays means that these are either known, systematic in nature, and / or determinable, or were determined prior to measurements on the front side and can subsequently be subtracted from the front side measurements.In this way, for example, if the nature of the back surface is known, for example if a coating applied to the back surface and its reflection behavior is known, the additional signals reflected back from the back surface and also detected can be subtracted. With an uncoated back surface, the additional signals reflected back from the back surface and also detected can represent a systematic deviation. Once the deviation has been determined once, these additional measurements can be subtracted. For a reflection measurement, light from a light source is shone onto a measuring position on the (first) surface of the object to be measured. The light can be light in the visible range and / or in the UV range, for example. The incident light is at least partially reflected by the surface to be measured.At least a portion of the reflected light is detected by a detector, with the reflection signal being recorded with spectral resolution. Based on the detected signal, reflection values ​​for several wavelengths in a predetermined or predeterminable spectral range are determined or obtained. The predetermined or predeterminable spectral range can, for example, correspond to the spectral range of the light emitted by the light source or be a sub-range of this spectral range. A reflection measurement therefore contains reflection values ​​for several wavelengths and provides a reflection spectrum that describes or represents the reflection value as a function of wavelength. Each of the individual reflection measurements is thus a spectral reflection measurement. Calculating a resulting reflection measurement involves calculating a resulting reflection value for several wavelengths in a (discrete or continuous) wavelength interval (spectral interval).Thus, the resulting reflection measurement is also a spectral reflection measurement, which provides a resulting reflection spectrum. In the context of the present application, light is understood to mean any form of electromagnetic radiation. The light used for the measurement can, for example, be white or visible light and / or light in the UV range and / or light in another spectral range (wavelength range). For example, the light can be in a spectral range from 380 nm to 800 nm or from 400 nm to 780 nm.However, other and / or narrower spectral ranges can also be used, for example, ultraviolet light (UV-C: 100 to 280 nm, UV-B: 280 to 315 nm and / or UV-A: 315 to 380 nm), violet light (380 to 450 nm), blue light (450 to 495 nm), green light (495 to 570 nm), yellow light (570 to 590 nm), orange light (590 to 620 nm), red light (620 to 750 nm), infrared light (IR-A: 780 to 1400 nm and / or IR-B: 1400 to 3000 nm), or mixtures thereof. The method can be applied to any spectral range, and the selection of a suitable subrange of electromagnetic radiation depends on the specific measurement situation. For example, for the characterization of ophthalmic lenses and coatings applied to their surface(s), it is particularly advantageous to carry out the characterization in the UV range or in the visible spectral range, possibly extended to the UV range and / or the IR range.The use of light with components in the UV range can be advantageous because, on the one hand, particularly high-refractive index coating materials exhibit high dispersion in the UV range, and on the other hand, UV radiation is absorbed (e.g., completely) by many plastic lenses, so that reflection signals in the UV range largely contain no interfering back reflections from the rear side. This improves the signal-to-noise ratio, the calculation, and / or the meaningfulness of the resulting reflection measurement. Furthermore, the requirements regarding any necessary auxiliary treatment of the object to be measured (e.g., by blackening and / or matting) and / or the use of auxiliary components (e.g., an additional prism) can be reduced. It is also possible to dispense with such auxiliary treatments and / or auxiliary components entirely.A single reflection measurement can be adapted to a signal-to-noise ratio suitable for the measurement situation by varying the exposure time and / or specifying a number of multiple measurements to be performed at a specific measurement position. The term "calculating" within the meaning of the present application also includes determining, estimating, determining, etc. Calculating based on reflection measurements (such as single reflection measurements) includes calculating based on the reflection measurements, calculating based on reflection measurements subjected to preprocessing, etc. Preprocessing can include, for example, smoothing, filtering, noise reduction, color correction, interpolation, and / or other corrections. Calculating a resulting reflection measurement can be performed, for example, using any method for determining an average value, i.e., any weighted or unweighted averaging.Likewise, determining an individual reflection measurement based on a plurality of individual reflection measurements can be performed by any weighted or unweighted averaging of measurements. "Averaging" or "method for determining an average value" within the meaning of the present application refers to any mathematical method by which at least one integral ("averaged") reflection value is calculated for at least one wavelength from a plurality of individual reflection values ​​from the individual reflection measurements or individual reflection measurements. The reflection values ​​used to calculate the averaged reflection value can each have a different weighting during the averaging. It is also possible for two or more, for example, all, reflection values ​​to have the same weighting during the averaging. The averaging can be arithmetic, geometric, harmonic, quadratic, etc.Averaging. As described above, the individual reflection measurements or the individual reflection measurements can be preprocessed before averaging. Preferably, several averaged reflection values ​​are determined for several wavelengths each. In this way, an integral or averaged reflection spectrum can be obtained. Calculating a resulting reflection measurement based on the individual reflection measurements contained in the subset can, for example, be carried out by a weighted arithmetic average of a plurality of individual reflection values ​​from the individual reflection measurements contained in the subset, wherein the weightings of the weighted arithmetic average optionally depend on the arrangement of the measurement position of the respective reflection measurement on the surface of the object to be measured and / or on the wavelength of the reflected light of the respective reflection measurement.An exemplary arithmetic averaging can be done according to formula (1), according to which the reflection value. !( " ) the reflection measurement resulting from # individual reflection measurements for a specific wavelength " the arithmetically calculated mean of the reflection values $ ( " ) the # individual reflection measurements for the wavelength ", where the individual reflection values ​​are each weighted % $ ( " ) be weighted: In formula (1): " is the wavelength of the reflected light; # is the number of individual reflection measurements; 1 is the 1st individual reflection measurement; $ ( " ) the reflection value of the 1st single reflection measurement for the wavelength "; % $ ( " ) the weighting of the 1st individual reflection measurements for the wavelength "; and !( " )the arithmetically calculated mean of the reflection values ​​from # individual reflection measurements. The weighting % $ (") the reflection values ​​of the respective individual reflection measurements can be weighted differently. For example, reflection measurements taken at different positions on the surface of the object to be measured can be weighted differently. For % $ (") = % $ ∀ " , a central single reflection measurement, 1 = 4 , can be weighted higher than a single reflection measurement near the edge, 1 = 5, where %6 ( " ) = %6, %7 ( " )= %7 and %6> %7∀ ". A "central single reflection measurement" is understood to be a single reflection measurement taken at a measurement position positioned essentially centrally on the surface of the measured object. A "near-edge" single reflection measurement is understood to be a single reflection measurement taken at a measurement position near the edge of the surface of the measured object. This allows a resulting measurement to be obtained that essentially corresponds to the perception of an observer viewing the object centrally. Alternatively or additionally, the weightings can vary depending on the wavelength of the reflected light. For wavelength-dependent weightings % $ ( " ) ≠ % $ , that is, for % $ ( "9 ) ≠ % $ ( " : ) ∀; < , for example, for individual reflection measurements, spectral subranges can be weighted differently depending on the wavelength. In this way, if, for example, a spectral pattern of interference with increased interference in the UV range is known, these can be taken into account less strongly by using a lower weighting. In one example, % $ ( " ) = 1 ∀1 ∈ { 0, … , for an arithmetic average. In this case, formula (1) can be represented as formula (2) as follows: In another example, calculating the resulting reflection measurement may comprise the following steps: determining the respective maximum reflection value and the respective minimum reflection value of all the individual reflection measurements contained in the subset for each wavelength of a given spectral range; and calculating a weighted average for the respective wavelength from the maximum and minimum reflection values ​​determined for this wavelength. The weightings may be different or the same. Thus, the maximum reflection value determined for a specific wavelength and the minimum reflection value determined for this wavelength may have different or equal weights when calculating the average. The weightings may also be the same for all wavelengths or be wavelength-dependent. The reflection values ​​calculated in this way for the different wavelengths then represent the resulting reflection measurement.An advantage of this method is that individual reflection measurements that only differ slightly are not given excessive weight. Before and / or during or upon determination of the resulting reflection measurement and / or the individual (e.g., averaged) reflection values ​​forming the resulting reflection measurement, a correction of one, several, or each individual reflection measurement can take place. The method for measuring reflection on a surface can accordingly comprise a correction of at least one of the individual reflection measurements contained in the subset and / or the resulting reflection measurement. The correction can, for example, be normalization, calculation, filtering, smoothing, noise reduction, color correction, and / or another correction. The corrections can be different for the individual reflection measurements.The correction of the recorded individual reflection measurement and / or the reflection values ​​forming the individual reflection measurement can, for example, comprise calculating and / or normalizing with a recorded reflection standard. Alternatively or additionally, the correction can comprise spectral adjustment or filtering of the recorded individual reflection measurement and / or the resulting reflection measurement. The spectral adjustment can, for example, be performed by clipping unwanted measured values ​​from an undesired spectral range. In such a case, formula (1) can be rewritten as formula (3) as follows: where a standardization or consideration of a reflection standard for the reflection value $ ( " ) The function: δM(λ) = O 1, if " to be considered0 , sonstrepresents a selection function or exclusion function, by means of which individual reflection values ​​outside a selected range can be ignored for the calculation of the resulting (e.g., averaged) reflection value. In this way, the above-mentioned corrections can be taken into account when calculating the resulting reflection measurement and / or when calculating a reflection value (e.g., averaged) that forms the resulting reflection measurement. Since the normalization K $ ( " ) can be dependent on the individual reflection measurement, individual reflection measurements can be standardized differently or recorded taking into account different reflection standards. Using the selection function δ M(λ) spectral ranges of the individual reflection measurement can be excluded or filtered from the formation of the averaged reflection value, depending on the respective individual reflection measurement, since for reflection values ​​at the wavelength λ to be excluded, the corresponding δ M ( λ ) = 0 can be chosen if $ (") should not be taken into account for this single reflection measurement. As a possible example of such a selection function, the function P QR ( " ) = nm be elected, which It is ensured that in the calculation of the resulting reflection measurement (for example, in the averaging), only reflection values ​​are taken into account whose corresponding wavelengths are not in the UV range. Other selection functions are also possible. Alternatively or additionally, the correction can comprise smoothing the resulting reflection measurement and / or at least one of the individual reflection measurements contained in the subset. Suitable smoothing methods are known to a person skilled in the art. Exemplary smoothing methods are low-pass filter methods, such as Chebyshev filters, or polynomial fitting methods. Other corrections are also possible, such as interpolation. The recording of an individual reflection measurement at a specific measurement position can therefore comprise: recording a plurality of individual reflection measurements at this measurement position and determining a resulting individual reflection measurement, for example, using aAveraging the individual reflection measurements recorded at the measurement position; and / or determining a resulting individual reflection measurement based on an interpolation of the individual reflection measurement recorded at this measurement position. As described above, a subset of individual reflection measurements can be selected from the plurality of recorded individual reflection measurements, wherein the selection can be made according to different criteria. For example, the method for reflection measurement can comprise a selection of the subset of individual reflection measurements from the plurality of recorded individual reflection measurements, wherein the selection is made taking into account the recording position of the respective individual reflection measurement; and / or the selection is made such that individual reflection measurements that were detected as outliers are excluded. For example, an operator can specify or select which individual reflection measurements are used for calculating theresulting reflection measurement (e.g., for averaging). Such a selection can be presented to the operator, for example, by displaying a list of numbered or otherwise marked individual reflection measurements. Alternatively or additionally, the selection can be made by displaying a graphic representation in which an exemplary object is shown in plan view, superimposed with the positions of the recorded individual reflection measurements. The selection of which individual reflection measurements are to be selected or taken into account for the calculation of the resulting reflection measurement (e.g., for averaging) (i.e., the selection of the subset) can also be computer-implemented and made automatically, for example, based on the object to be measured. For example, in the case of a spectacle lens, the surface of which is to be measured in reflection has at least a partial area withan anti-reflective coating and at least one partial area with a mirror coating, the selection can be made such that the measurement positions are selected so that both partial areas can be characterized. The subset can thus comprise at least one measurement position, preferably several measurement positions in the partial area with an anti-reflective coating and at least one measurement position, preferably several measurement positions in the partial area with the mirror coating. This also applies to other optical lenses and / or to partial areas that differ with regard to other properties (such as transparency, refractive index, etc.). The selection of the subset of individual reflection measurements can also be made taking into account the recording position of the respective individual measurement. For example, precisely those measurements can be selected that were recorded exactly opposite each other (for example in the radial direction).For example, if a clock is represented, the individual reflection measurements at 0 o'clock and 6 o'clock, 3 o'clock and 9 o'clock, etc. can be selected. Alternatively or additionally, an outlier analysis can be carried out to automatically exclude those individual measurements that were detected as outliers when forming the resulting measurement. By selecting a subset of individual reflection measurements that are used to determine the resulting reflection measurement from the multitude of recorded individual reflection measurements according to one or more of the above criteria, it is possible to improve the accuracy of the reflection measurement. The method for reflection measurement can further comprise performing a comparison between an expected deviation and a measured deviation between different individual reflection measurements and optionally issuing an error message if the measured deviation is higher than the expected deviation.The expected deviation can have been determined or estimated based on previous measurements and / or simulations and / or theoretical or mathematical considerations and / or empirical values. For example, it can be checked whether the thickness profile caused by a pull-out direction in a dip coating process and the resulting differences between at least two individual reflection measurements taken along the pull-out direction agree with the expected deviation. In the event of a discrepancy, an error message can be issued. The measuring positions for the individual reflection measurements can be fixed. It is also possible to freely select at least some of the measuring positions or all of the measuring positions for the individual reflection measurements. The method for reflection measurement can accordingly comprise specifying or determining the measuring positions at which the plurality of individual reflection measurements are taken.For example, an operator can specify the measuring positions at which individual reflection measurements are to be recorded. This specification can be made arbitrarily. Alternatively or additionally, the specification can be made by selecting an arrangement of measuring positions for recording individual reflection measurements from a group of predetermined (e.g., stored) possible arrangements. Alternatively or additionally, a computer-implemented, automatic and / or selected decision based on the object to be measured can be made as to the measuring positions at which individual reflection measurements are to be recorded. For example, the selection can be made in such a way that no repeat measurements are taken. The selection can also be made in such a way that at least one, preferably several measuring positions take place in a specific direction of the object to be measured. For example, in the case of an object that has a wedge-shaped change in the thickness of the object and / orthe thickness of at least one coating of the object, at least one measurement position parallel to the wedge direction can be selected. Additionally or alternatively, the measurement positions at which individual reflection measurements are to be recorded can be automatically determined based on markings or other features inherent in the object. The method for reflection measurement can further comprise (automatic) determining the actual position and / or orientation of the object to be measured based on at least one characteristic feature of the object to be measured. The method for reflection measurement can further comprise detecting at least one characteristic feature of the object to be measured. The at least one characteristic feature of the object to be measured (i.e., the at least one feature that characterizes the object to be measured) can be internal (i.e., inside the object to be measured) and / or external (for example, ona surface and / or an edge area of ​​the object to be measured). Example characteristic features that are applied internally are permanent engravings of an optical lens to be measured, such as a spectacle lens to be measured. Example characteristic features that are applied externally are notches, elevations, printed markings, barcodes and / or other markings. The notches, elevations, markings, etc. can be applied, for example, to the edge or an edge area of ​​an optical lens, such as a spectacle lens, or to another surface. Characteristic features can also be features that are inherent in the object to be measured, such as certain structures, textures, shapes, etc. The position and / or orientation of the object to be measured can be determined by recording and / or recognizing and / or evaluating at least one image which contains internal and / or externalcontains or represents characteristic features of the object to be measured. Alternatively or additionally, in the case of an external characteristic feature, the position and / or orientation of the object to be measured can also be determined by tactile methods using at least one sensor (for example, by "feeling" the respective feature). After the actual position and / or orientation of the object to be measured has been determined, the object to be measured can be brought into a predetermined (for example, predefined) position and / or orientation. The method for reflection measurement can accordingly further comprise: (automatically) bringing the object to be measured into a predetermined position and / or orientation based on the actual position and / or orientation of the object to be measured; and / or (automatically) converting an arrangement of the measurement positions of the individual reflection measurements to the actual position and / or orientation of theThe object to be measured can be brought into a predetermined position and / or orientation, for example, by translation and / or rotation of the object (for example, around an axis through its center). For example, a spectacle lens can be rotated until at least one characteristic feature (such as the permanent engraving of a spectacle lens and / or a notch on the edge of a spectacle lens) is oriented or aligned at a predetermined location and / or in a predetermined direction or axial position. In this way, it can be ensured that the arrangement of the measurement positions of the individual reflection measurements is always identical, regardless of the original insertion orientation of the object to be measured, and, for example, that the measurement position of the first individual reflection measurement is always in a fixed relationship to a characteristic feature of the object to be measured. Based on theA computer-implemented conversion can also be carried out on the recorded position and / or orientation of the object to be measured, such that the arrangement of the positions of the individual reflection measurements is automatically or computer-based converted to the actual position or orientation of the object to be measured, also under the condition that the arrangement of the positions of the individual reflection measurements is always identical, regardless of the insertion orientation of the object to be measured, and, for example, the position of the first individual reflection measurement is always in a fixed relationship to a characteristic feature of the object to be measured. The individual measurements (such as individual reflection measurements, individual-individual reflection measurements, etc.) and / or the resulting reflection measurement can be stored in a suitable storage device. After the reflection measurement has been carried out, the object can be subjected to post-treatment.Post-treatment can, for example, include removing a previously applied anti-reflective layer and / or removing an adhesive tape and / or performing a cleaning operation, etc. The post-treatment can be automated. According to a second aspect, a device for measuring reflection on a surface of an object to be measured is proposed. The device for measuring reflection comprises: a holder for the object to be measured; a reflection detection unit, which is designed to record an individual reflection measurement by irradiating a measurement position on the surface of the object to be measured with light (measuring light) and detecting at least a portion of the light reflected by the object during the irradiation; and a computing unit, wherein the device for measuring reflection is designed such that the object to be measured can be moved relative to the reflection detection unit, so thatIndividual reflection measurements can be recorded at a plurality of different measurement positions on the surface of the object to be measured with the reflection detection unit; and the computing unit is designed to calculate a resulting reflection measurement based on at least a subset of individual reflection measurements from the plurality of recorded individual reflection measurements, wherein the individual reflection measurements and the resulting reflection measurements are spectral reflection measurements. Furthermore, the aforementioned preferred embodiments and / or the aforementioned advantages also apply analogously to this device. In particular, the device for reflection measurement can be a device that is designed or configured to carry out the method for reflection measurement according to one of the above-mentioned aspects and examples. As described in connection with the method for reflection measurement, the calculation of aresulting reflection measurement, calculating an average value based on the individual reflection measurements contained in the subset. The receptacle for the object to be measured can be any receptacle designed to receive the object to be measured. The receptacle can, for example, consist of a base or support plate or comprise a base or support plate. Alternatively and / or additionally, the receptacle can contain a holder for the object to be measured. The reflection detection unit can have at least one light source for irradiating the object with light (measurement light). As described in connection with the method for reflection measurement, the light source can, for example, be a light source designed to emit or provide light in the visible range and / or in the UV range. Furthermore, the reflection detection unit can have at least one detector for detecting at least part of the light emitted by the objectduring irradiation, wherein the detected reflection signal is recorded with spectral resolution. The light source can be a suitable light source and can comprise one or more LEDs, lamps (for example, white light lamps), lasers (such as tunable lasers or lasers with frequency doubling), etc. In a further development, the light or emitted radiation emitted by the light source has the same intensity regardless of the wavelength of the emitted light or emitted radiation. By means of such a light source with wavelength-independent intensity of the emitted light or emitted radiation, any objects could advantageously be measured very well, since this would ensure an optimized signal-to-noise ratio through a correspondingly optimal utilization of the dynamic range of the detector. As a modification of this, a light source would also be conceivable in which theThe intensity of the emitted light or radiation is wavelength-dependent and, for example, the intensity of emitted radiation from the UV range differs from the intensity of emitted light from the visible spectral range, i.e. the intensity of emitted radiation in the UV range could be greater (or smaller) than the intensity of emitted light from the visible spectral range. Such a light source would have the advantage that it could be used to measure objects with a high reflectivity in the UV range (visible spectral range) without having to reduce the exposure time accordingly, which particularly benefits the signal-to-noise ratio of the measurement in the spectral range with a lower or not so high reflectivity. The relative movement of the object to be measured can cause a movement of the object to be measured while the object is at rest.Reflection detection unit, a movement of the reflection detection unit while the object is at rest, or a movement of both the object to be measured and the reflection detection unit. For example, the object can be at rest during the recording of the individual reflection measurements and the reflection detection unit can be moved relative to the stationary object. The relative movement of the reflection detection unit to the stationary object can in particular comprise a change in the horizontal and / or vertical position of the reflection detection unit with respect to the center of the object. The reflection detection unit is preferably moved from a first position for recording an individual reflection measurement after the individual reflection measurement has been recorded to a further position for recording an individual reflection measurement, wherein the movement can, for example, take place automatically. Preferably, theBefore recording a single reflection measurement, the reflection detection unit is brought as close as possible to, or into direct contact with, the object's surface. This is particularly advantageous for reflection measurements with focused light. For such measurements, a distance specified by the measuring system must generally be strictly maintained. For measuring devices with parallel light, however, maintaining a specified (e.g., short) distance between the reflection detection unit and the surface to be measured is of secondary importance. After recording a single reflection measurement, the distance between the reflection detection unit and the object's surface can be increased, at least to the extent that no accidental damage (such as scratching) to the surface occurs while moving the reflection detection unit to the next position. Alternatively, the reflection detection unit can be designed to be static, particularly stationary.and the relative movement can occur by moving the object. Here, too, the distance between the surface of the object and the reflection detection unit can advantageously increase during the movement between the individual positions in order to prevent damage to the surface in this embodiment as well. A combination of a movement of the object to be measured and the reflection detection unit is also possible. The computing unit can comprise at least one computer processor and / or at least one specialized programmable logic and / or at least one computer and / or a computer cloud, etc. The recording and optionally processing of the individual reflection measurements and the determination and optionally further processing of the resulting reflection measurement can take place as described above in connection with the method for reflection measurement according to the first aspect and the examples. The computing unit canBe part of a control unit of the device for reflection measurement or be connected to a control unit by means of a suitable data connection. In order to realize the relative movement between the object to be measured and the reflection detection unit, the device for reflection measurement can comprise a suitable actuator unit and a corresponding control unit. In particular, the device for reflection measurement can comprise: an actuator unit which is designed to move the holder and / or the reflection detection unit; and a control unit which is designed to send control commands to the actuator unit in order to realize a movement of the object to be measured relative to the reflection detection unit. The actuator unit can comprise one or more actuators. In the context of the present application, an actuator is understood to mean a drive unit which sends control commands (for example in the form ofelectrical signals) from a control unit into mechanical movement and optionally other physical quantities (such as pressure and / or temperature). As described above, the actuator unit can be designed to realize a relative movement of the object to be measured relative to the reflection unit. For this purpose, the actuator unit can be designed to move only the holder for the object, only the reflection unit, or both the holder and the reflection unit, wherein the movement can comprise a translation in at least one direction and / or a rotation about at least one rotation axis. Exemplary actuators comprise motors, such as stepper motors. The control unit can be designed to control and / or regulate the actuator unit and optionally other units of the device for reflection measurement (such as reflection unit, computing unit, etc.). Furthermore, theThe control unit may comprise the above-described computing unit for determining a resulting reflection measurement and / or further computing units for determining further relevant data. The control unit may further comprise further units, such as a memory unit, an input unit for inputting data, an output unit for outputting data (such as information and / or commands), a communication unit for communicating data both from and to the control unit and / or to the individual units of the control unit, and / or to other units. The communication between the individual units of the control unit and / or external units may take place via suitable interfaces. The device for reflection measurement may further comprise at least one memory unit for temporarily or permanently storing data. For example, the at least one memory unit may store the recordedStore individual reflection measurements and / or the resulting reflection measurement. The data can be stored in a suitable form, such as in one or more files, in a database, in a data cloud, etc. The storage unit can, for example, comprise at least one hard disk, cloud storage, or other suitable storage. The storage unit can be part of the control unit or connected to the control unit via a suitable data connection. The device for reflectance measurement can further comprise at least one input unit for entering data (such as information and / or commands). The input unit can, for example, comprise a computer mouse and / or a computer keyboard and / or a touch-sensitive screen and / or another suitable input unit. The input unit can be part of the control unit or connected to theControl unit. Furthermore, the device for reflection measurement can comprise an output unit for outputting data (such as information and / or commands). The output unit can comprise, for example, at least one computer screen for outputting or displaying text and / or images and / or graphics, and / or at least one loudspeaker for outputting audio data. The output unit can be a component of the control unit or connected to the control unit by means of a suitable data connection. The device for reflection measurement can further comprise a communication unit for the wired and / or wireless transmission of data (such as information and / or commands), for example from the control unit to other units (such as reflection detection unit, storage unit, actuator unit, etc.) and / or in the reverse direction. The communication unit can be a component of theThe device can be a control unit or connected to the control unit by means of a suitable data connection. The device can further comprise a position detection unit which is configured to determine the actual position and / or orientation of the object to be measured in the device for reflection measurement. As described in connection with the method for reflection measurement, the actual position and / or orientation of the object to be measured in the device for reflection measurement can be determined based on at least one characteristic feature of the object. The position detection unit can be a component of the control unit or connected to the control unit by means of a suitable data connection. The position detection unit can accordingly comprise at least one detector for detecting or capturing at least one characteristic feature of the object to be measured. As described above, the positionand / or orientation of the object to be measured can be determined, for example, on the basis of at least one recorded image of the object. The position detection unit can accordingly have at least one camera in order to photographically record and / or evaluate the object to be measured with regard to its characteristic features in order to determine its position and / or orientation. Optionally, the camera can comprise a light source, preferably a light source that emits as neutral a light as possible (white light), particularly preferably a standard light source that emits a light spectrum similar to daylight. Furthermore, the position detection unit can have an evaluation unit that is configured to evaluate the at least one image recorded by the camera and to determine the position and / or orientation of the object therefrom based on at least one characteristic feature of the object. As described above, the at least one characteristicFeature can be an internal or external feature of the object. The evaluation unit can be a component of the computing unit described above or can be implemented as a stand-alone module. Instead of or in addition to the camera, the position detection unit can comprise a further sensor for detecting at least one feature characterizing the object, based on which the position and / or orientation of the object to be measured can be determined. The sensor can, for example, be a sensor that can recognize or detect or "feel" a notch on the edge of the object. Based on the position and / or orientation of the object determined by the position detection unit, the actual position and / or orientation of the object can, as described above, optionally be corrected by means of alignment (including, for example, translation and / or rotation), or the actual position or orientation determined in this way can be determined using software.be taken into account as a correction value. The device for reflection measurement can further comprise at least one user interface, which is designed or configured to display data (such as information and / or commands) and / or to enable the input of data (such as information and / or commands). The user interface can be implemented in suitable software. The user interface can be part of the input unit and / or the output unit. The user interface can, for example, be implemented as a graphical user interface or comprise a graphical user interface. The information can, for example, be information regarding the recorded individual reflection measurements and / or regarding the resulting reflection measurement determined on the basis of the recorded individual reflection measurements and / or information regarding the state of the device for reflection measurement and / orError warnings and / or other relevant information can be included. The recorded individual reflection measurements can, for example, be displayed in a reflection wavelength representation. Alternatively or additionally, the positions (measurement positions) of the individual reflection measurements can be displayed in a top view representation of the measured object. If a camera is available, the top view representation can optionally also be a recorded, real image of the object, in which the positions of the individual reflection measurements are plotted as an overlay. Optionally, the user interface can be configured to provide or enable one or more of the following functions: - Selecting the individual reflection measurements to be considered for calculating the resulting measurement; and / or - Displaying and / or editing (e.g., activating, deactivating, modifying, etc.) weightings or weighting factorsand / or standardizations for the individual reflection measurements; - displaying, editing (such as excluding (for example, by cutting off, removing, deactivating, etc.) and / or adding (for example, by recording, activating, etc.) spectral sub-ranges of one or more individual reflection measurements and / or the resulting reflection measurement; and / or - calculating and / or displaying color values ​​according to the standard for one or more individual reflection measurements and / or for the resulting reflection measurement. The color values ​​calculated for the individual reflection measurements can optionally be converted into RGB color values. Furthermore, in a plan view of the measured object, the positions of the respective individual reflection measurements can be colored or marked according to the color values ​​determined at this position (such as RGB color value). The device for reflection measurement can have a holder for holding at least oneReference object, such as for holding a sample or an optical lens of a reflection standard. In this way, the measurements performed can be standardized with a reflection standard in order to determine the intensity of the incident light and, if necessary, to standardize it. Exemplary standardizations were described above in connection with the method for reflection measurement. The device for reflection measurement can further comprise a pretreatment device (pretreatment station) in which a pretreatment of the object to be measured takes place or can take place before the individual reflection measurements are carried out. The pretreatment can be, for example, a cleaning of the object to be measured and / or a treatment of the rear surface not to be measured. The treatment of the rear surface can be, for example, a matting or roughening of at least a partial area of ​​the rear surface not to be measured and / or an application of aanti-reflective layer that prevents unwanted back reflections and / or a blackening of at least a portion of the rear surface not to be measured, wherein the blackening occurs, for example, after matting or roughening. The device for reflection measurement can further comprise a post-treatment device (post-treatment station) that is designed to subject the object to a post-treatment after the reflection measurement has been carried out. The post-treatment can, for example, comprise removing a previously applied anti-reflective layer and / or removing an adhesive tape and / or performing a cleaning operation, etc. The post-treatment can, for example, be automated. The device for reflection measurement is particularly suitable for integration into a production line. Furthermore, the device for reflection measurement can be at least partially automated. In particular, the object to be measured and optionally pre-treatedbe automatically transported to the reflection measurement device (for example, by means of a suitable transport device, such as a roller conveyor). Furthermore, the reflection measurement device can be automatically loaded with an object to be measured. This can be done by means of a suitable manipulator. Likewise, the reflection measurement(s) can be carried out automatically and / or, after the reflection measurement has been carried out, the object to be measured can be automatically unloaded from the device. The reflection measurement device can accordingly have a loading unit designed to position the object to be measured in the receptacle and / or an unloading unit designed to remove the object to be measured from the receptacle. The loading unit and / or the unloading unit can also be implemented as separate units (for example, in a production line).The loading unit and / or unloading unit can be connected to the control unit by means of a suitable data connection and controlled and / or regulated accordingly by the control unit. Embodiments of the method for reflection measurement and the device for reflection measurement are described below by way of example with reference to the accompanying figures. Individual elements of the described embodiments are not limited to the respective embodiment. Rather, elements of the embodiments can be combined with one another as desired, and new embodiments can be created as a result. They show: Figure 1: a reflection wavelength representation of an exemplary reflection measurement of a spectacle lens, recorded using a method according to the prior art; Figure 2: a schematic representation of a spectacle lens with two positions for recording individual reflection measurements; Figure 3a: a schematic representation of a spectacle lens with afirst exemplary arrangement of positions for recording individual reflection measurements; Figure 3b: a schematic representation of a spectacle lens with a second exemplary arrangement of positions for recording individual reflection measurements; Figure 3c: a schematic representation of a spectacle lens with a third exemplary arrangement of positions for recording individual reflection measurements; Figure 3d: a schematic representation of a spectacle lens with a fourth exemplary arrangement of positions for recording individual reflection measurements; Figure 3e: a schematic representation of a spectacle lens with a fifth exemplary arrangement of positions for recording individual reflection measurements; Figure 3f: a schematic representation of a spectacle lens with a sixth exemplary arrangement of positions for recording individual reflection measurements; Figure 3g: a schematic representation of a spectacle lens with a seventh exemplaryArrangement of positions for recording individual reflection measurements; Figure 3h: a schematic representation of a spectacle lens with an eighth exemplary arrangement of positions for recording individual reflection measurements; Figure 4: a schematic sectional drawing of a first exemplary device for reflection measurement; Figure 5: a schematic sectional drawing of a second exemplary device for reflection measurement; Figure 6: a schematic sectional drawing of a third exemplary device for reflection measurement; Figure 7: a reflection wavelength representation of an exemplary reflection measurement of a spectacle lens based on a plurality of individual reflection measurements; and Figure 8: Schematic drawing of an exemplary user interface. Figure 1 shows a reflection wavelength representation of an exemplary reflection measurement 71 of a spectacle lens, recorded using a method according to the prior art. On the abscissa isthe wavelength in [nm] and on the ordinate the reflection value R in [%] measured using a state-of-the-art method. The percentage refers to the (percentage) proportion of reflected light in relation to the incident light. The reflection measurement exhibits high interference or a high interference modulation. In particular, the position of the local minimum in the wavelength interval between 400 nm and 440 nm as well as the position of the local maximum in the wavelength interval between 440 nm and 500 nm cannot be determined either in relation to the wavelength value or in relation to the reflection value due to the high interference modulation. Figure 2 shows a schematic representation of a spectacle lens 1 with two positions (measurement positions) 20 on the surface of the spectacle lens 1 to be measured for recording individual measurements. The two measurement positions 20 lie on a straight line that runs through the center of the spectacle lens. Based on theA resulting reflection measurement is determined from the individual reflection measurements recorded in the measuring positions 20, as described above. Figures 3a to 3h show schematic representations of a spectacle lens 1 with different exemplary arrangements 20 of positions (measurement positions) on the surface of the spectacle lens to be measured for recording individual reflection measurements. Based on the individual reflection measurements recorded in the measuring positions 20 shown in Figures 3a to 3h, a resulting reflection measurement is determined, as described above. Figure 3a shows a schematic representation of a spectacle lens 1 with an arrangement of four measuring positions 20 for recording individual measurements. The spectacle lens 1 further has two engravings 30 as preferred, internal, characteristic features. As described above, the actual location and / or position of the spectacle lens can be determined based on the engravings 30 and, if applicable, further features and / or information.in the reflection measurement device. In Figure 3a, the four measuring positions 20 are arranged near the edge of the spectacle lens, with two of the measuring positions 20 lying on the straight line connecting the engravings 30 and two of the measuring positions 20 lying on a straight line that is perpendicular to the straight line connecting the engravings 30 and runs through the center between the engravings 30. Figure 3b shows a schematic representation of a spectacle lens 1 with an arrangement of eight measuring positions 20 for recording individual measurements, wherein the spectacle lens 1 additionally has a notch 31 as a preferred, external, characterizing feature. The measuring positions 20 are arranged essentially in a circle along or near the edge of the spectacle lens 1, with two of the measuring positions facing each other in the radial direction. Figure 3c shows a schematic representation of a spectacle lens 1 with an arrangement of nine measuring positions20 for recording individual measurements, wherein the positions 20 were selected such that a plurality of individual measurements (seven in the specific example) are recorded along the extraction direction 40 of a previous dip-coating process of the spectacle lens 1 in order to characterize the thickness profile present along the extraction direction 40. Furthermore, two of the measuring positions 20 are arranged on a straight line which runs through the center of the spectacle lens 1 and is substantially perpendicular to the extraction direction 40. Figure 3d shows a schematic representation of a spectacle lens 1 with an arrangement of sixteen positions (measurement positions) 20 for recording individual measurements, which are arranged essentially in a circle along or near the edge of the spectacle lens. The spectacle lens 1 additionally has a plurality of notches 31 as an external, characteristic feature. Figures 3e and 3f each show a schematic representation of aSpectacle lens 1 with an arrangement of several measuring positions 20 for recording individual measurements. The arrangements of measuring positions 20 shown in Figures 3f and 3e each comprise a plurality of measuring positions 20 arranged in a circle along or near the edge of the spectacle lens 1 and a plurality of measuring positions 20 arranged along a first straight line passing through the center of the spectacle lens 1. The arrangement shown in Figure 3e further comprises a plurality of measuring positions 20 arranged along a second straight line passing through the center of the spectacle lens 1, wherein the second straight line is substantially perpendicular to the first straight line. Figure 3g shows a schematic representation of a spectacle lens 1 with an arrangement of positions (measurement positions) 20 for recording individual measurements, which essentially follow an imaginary spiral shape. Figure 3h shows a schematic representation of aSpectacle lens 1 with an arrangement of positions (measurement positions) 20 for recording individual measurements, which are largely arbitrary and do not follow any particular, in particular no geometric, shape, and are arranged such that individual measurements are recorded at a wide variety of locations on the spectacle lens 1. Such an arrangement can be particularly advantageous if both the orientation of the spectacle lens to be measured and the exact positions of the recording positions of individual measurements, in particular with respect to a reference point of the spectacle lens to be measured, such as a characterizing internal and / or external feature, are secondary and the primary aim is merely to ensure that a plurality of measurement positions are available, distributed over the surface of the spectacle lens to be measured. The number and arrangements of measurement positions 20 are not limited to the number and arrangements shown in Figures 2 to 3h.For example, a different (e.g., higher or lower) number of measuring positions can be provided. Alternatively or additionally, the measuring positions can be arranged differently. For example, the measuring positions can be arranged in an elliptical or other suitable shape. Furthermore, the distances between the individual measuring positions can vary. Furthermore, instead of or in addition to the notches 31 and / or the engravings 30, the spectacle lens 1 can have other elements that can serve as characteristic features of the spectacle lens 1. The surface of the spectacle lens 1 to be measured can be an already finished, optically effective surface of the spectacle lens. The other surface, which lies opposite the surface of the spectacle lens to be measured, can also be an already finished, optically effective surface, or a surface that is not yet completely machined (as in a semi-finished spectacle lens product or blank). TheThe surface can be the front or the back surface of the spectacle lens. Furthermore, instead of a spectacle lens 1, there can be another optical lens or another object that is at least partially reflective. Figure 4 shows a schematic sectional drawing of a first exemplary device 5 for reflection measurement. The device for reflection measurement 5 is designed to carry out a method according to the above aspects and examples. With the exemplary device for reflection measurement, it is particularly possible to carry out an interference-reduced or essentially interference-free reflection measurement of an object. The device for reflection measurement 5 has a holder 51 for a spectacle lens 1 as a preferred object to be measured, a reflection detection unit 52 and a control unit 54. To change the relative position between the reflection detection unit 52 and the object 1 to be measured, the device 5 hasThis embodiment has an actuator 53 which is suitable for receiving control commands from the control unit 54 and converting them into a mechanical movement. In this embodiment, the mechanical movement results in the reflection detection unit 52 being moved relative to the object 1 to be measured. The degrees of freedom of the relative movement are shown as three axes of movement drawn in dashed lines. Figure 5 shows a schematic sectional drawing of a second exemplary device 5 for reflection measurement. The structure of the device for reflection measurement shown in Figure 5 is similar to the structure of the device for reflection measurement shown in Figure 4. For the description of the individual components, reference is therefore made to the description of Figure 4. As with the device 5 shown in Figure 4, in the device shown in Figure 5 for changing the relative position between the reflection detection unit 52 and the object 1 to be measured,An actuator 53' is used for the object to be measured (spectacle lens 1), which actuator is suitable or designed to receive control commands from the control unit 54 and to convert them into a mechanical movement. In contrast to the device 5 in Figure 4, this movement results in the object 1 to be measured being moved relative to the reflection detection unit 52. The degrees of freedom of the relative movement are shown as three axes of movement drawn in dashed lines. Figure 6 shows a schematic sectional drawing of a third exemplary device for reflection measurement 5. The structure of the device for reflection measurement shown in Figure 5 is similar to the structure of the devices for reflection measurement shown in Figures 4 and 5. For the description of the individual components, reference is therefore made to the description of Figures 4 and 5. The device for reflection measurement 5 shown in Figure 6 additionally comprises a position detection unit 55for detecting a position and / or orientation of the object 1 to be measured (for example, a spectacle lens). The detection of the position and / or orientation of the object 1 to be measured can be carried out as described above based on at least one characteristic feature of the object (such as the notch 31 and / or the engravings 30). In this example, the position detection unit 55 comprises a camera in combination with a light source. The object 1 illuminated by the light source is detected by the camera. The recorded image is then processed in the control unit 54 or in the position detection unit 55 itself in order to determine the position and / or orientation of the object 1 to be measured. Figure 7 shows a reflection-wavelength representation of an exemplary reflection measurement of a spectacle lens based on a plurality of individual reflection measurements. The wavelength in [nm] is shown on the abscissa and theReflection value R is plotted in [%], wherein the reflection value R was measured using an exemplary method for reflection measurement based on a large number of individual reflection measurements. In particular, Figure 7 shows a reflection wavelength representation of a large number of individual reflection measurements taken at different positions on the surface of a spectacle lens with an anti-reflective coating to be measured in reflection (dotted black lines), as well as the interference-free or interference-reduced resulting reflection measurement 72 calculated therefrom using the method described above (thick solid black line). The reflection measurement 71, generated using a prior art method, as already shown in Figure 1, was additionally plotted as a thin black line superimposed. It can be seen that the resulting measurement 72 from the method described above (thick solid black line)represents a significant improvement over a measurement 71 according to a prior art method (thin solid black line). Figure 8 shows a schematic drawing of an exemplary user interface 6. The user interface 6 has the following sections: a first section for displaying reflection wavelength representations 61 of the recorded individual reflection measurements and / or for displaying a reflection wavelength representation 61 of an interference-free or interference-reduced resulting reflection measurement calculated from the individual reflection measurements using the method described above; a second section for displaying a plan view representation 62 of the object measured in reflection, from which the positions of the respective individual measurements emerge; and a third section for displaying a representation 63 of the individual reflection measurements (column "Measurement") and the resulting measurement(Box "Result") with the respective calculated color values ​​(column "Reflection Color"). In the example shown in Figure 8, the individual measurement positions and corresponding individual reflection measurements are identified by different patterns. However, it is possible to use other patterns and / or markings. Preferred embodiments of the invention have been described above using examples. Individual elements of the described embodiments are not limited to the respective embodiment. Rather, elements of the embodiments can be combined with one another as desired, and new embodiments can be created thereby. Furthermore, individual features can be modified. For example, other suitable arrangements of measurement positions, other suitable characteristic features, other suitable actuators, other suitable calculation methods of a resulting reflection measurement and / or methods for determining andif necessary, correcting the position of the object to be measured, etc. The object to be measured can also be any object that can be measured in a reflection configuration. List of reference symbols 1 Spectacle lens (exemplary object to be measured) 5 Device for reflection measurement 6 Operator interface 20 Measurement positions 30 Engraving 31 Notch (exemplary characteristic feature) 40 Extension direction 51 Receptacle 52 Reflection detection unit 53, 53' Actuator 54 Control unit 55 Position detection unit 61 Reflection wavelength representation(s) of a reflection measurement 62 Top view representation of the object measured in reflection 71 Reflection wavelength representation of a reflection measurement (prior art) 72 Resulting reflection measurement

Claims

Applicant: Rodenstock GmbH "Interference-free spectral reflection measurement" Our reference: R 3392WO - hy / br Patent claims 1. A method for measuring reflection on a surface of an object (1) to be measured, the method comprising: recording a plurality of individual reflection measurements at a plurality of different measurement positions (20) on the surface of the object (1) to be measured, wherein an individual reflection measurement is recorded at each measurement position from the plurality of different measurement positions (20); and calculating a resulting reflection measurement (72) based on at least a subset of individual reflection measurements from the plurality of recorded individual reflection measurements, wherein the individual reflection measurements and the resulting reflection measurements are spectral reflection measurements. 2.A method for measuring reflection according to claim 1, wherein calculating a resulting reflection measurement (72) comprises calculating an average value based on the individual reflection measurements contained in the subset.

3. A method for measuring reflection according to claim 2, wherein calculating an average value is performed by a weighted arithmetic averaging of a plurality of individual reflection values from the individual reflection measurements contained in the subset, wherein the weightings of the weighted arithmetic averaging depend on / on the arrangement of the measurement position (20) of the respective individual reflection measurement on the surface of the object (1) to be measured; and / or on the wavelength of the reflected light of the respective individual reflection measurement. 2 4. A method for reflectance measurement according to one of the preceding claims, wherein calculating the resulting reflectance measurement (72) comprises: determining the respective maximum reflectance value and the respective minimum reflectance value of all of the individual reflectance measurements contained in the subset for each wavelength of a predetermined spectral range; and calculating a weighted average for the respective wavelength from the maximum and minimum reflectance values determined for this wavelength.

5. A method for reflectance measurement according to one of the preceding claims, further comprising: correcting at least one of the individual reflectance measurements contained in the subset and / or the resulting reflectance measurement (72). 6.A method for measuring reflection according to one of the preceding claims, further comprising selecting the subset of individual reflection measurements from the plurality of recorded individual reflection measurements, wherein the selection is made taking into account the recording position of the respective individual reflection measurement; and / or the selection is made such that individual reflection measurements that were detected as outliers are excluded.

7. A method for measuring reflection according to one of the preceding claims, further comprising performing a comparison between an expected deviation and a measured deviation between different individual reflection measurements and optionally outputting an error message if the measured deviation is higher than the expected deviation.

8. A method for measuring reflection according to one of the preceding claims, further comprising specifying or determining the measuring positions (20). 3 at which the plurality of individual reflection measurements are recorded.

9. A method for reflection measurement according to one of the preceding claims, further comprising determining the actual position and / or orientation of the object (1) to be measured based on at least one characteristic feature (30, 31) of the object (1) to be measured.

10. A method for reflection measurement according to claim 9, further comprising bringing the object (1) to be measured into a predetermined position and / or orientation based on the actual position and / or orientation of the object (1) to be measured; and / or converting an arrangement of the measurement positions (20) of the individual reflection measurements to the actual position and / or orientation of the object (1) to be measured.

11. A device for reflection measurement (5) on a surface of an object (1) to be measured, the device comprising: a holder (51) for the object (1) to be measured;a reflection detection unit (52) which is designed to record an individual reflection measurement by irradiating a measuring position (20) on the surface of the object (1) to be measured with light and detecting at least a portion of the light reflected by the object (1) during the irradiation; and a computing unit, wherein the device for reflection measurement (5) is designed such that the object (1) to be measured can be moved relative to the reflection detection unit (52) so that individual reflection measurements at a plurality of different measuring positions (20) on the surface of the object (1) to be measured can be recorded with the reflection detection unit (52); and the computing unit is designed to calculate a resulting reflection measurement (72) based on at least a subset of; Calculate 4 individual reflection measurements from the plurality of recorded individual reflection measurements, wherein the individual reflection measurements and the resulting reflection measurements are spectral reflection measurements.

12. The reflection measurement device (5) according to claim 11, further comprising a light source configured to provide light in the visible spectral range and / or in the UV range.

13. The reflection measurement device according to claim 11 or 12, wherein calculating a resulting reflection measurement (72) comprises calculating an average value based on the individual reflection measurements contained in the subset. 14.The reflection measurement device (5) according to any one of claims 11 to 13, further comprising: an actuator unit (53, 53') configured to move the receptacle (51) and / or the reflection detection unit (52); and a control unit (54) configured to send control commands to the actuator unit (53, 53') in order to implement a movement of the object (1) to be measured relative to the reflection detection unit (52).

15. The reflection measurement device (5) according to any one of claims 11 to 14, further comprising a position detection unit (55) configured to determine the actual position and / or orientation of the object (1) to be measured in the reflection measurement device (5). 16.The reflection measurement device (5) according to one of claims 11 to 15, further comprising a holder configured to hold at least one reference object; and / or a pretreatment device in which the object (1) to be measured is pretreated before the individual reflection measurements are taken.

17. The reflection measurement device (5) according to one of claims 11 to 16. 5 wherein the device is designed to carry out the method for reflection measurement according to one of claims 1 to 10.

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