Power supply assembly for generating a plasma, and plasma process system

Abstract

The invention relates to a power supply assembly (1) having: a) a plurality of microwave power supplies (2a, 2b, 2c, 2d, 2n), each of which is designed to generate a microwave power signal with an output of ≥ 100 W and a frequency of ≥ 300 MHz in order to generate a plasma (7) in a plasma process chamber (6), and b) a base (3) with an upper face (3a) and a lower face (3b), wherein c) the microwave power supplies can be arranged on the upper face (3a) of the base (3) as an assembly (2), d) the upper face (3a) of the base (3) has plug contacts (4), e) the microwave power supplies have mating plug elements (5) which match the plug contacts (4), f) the mating plug elements of the microwave power supplies are plugged onto the plug contacts of the base and can be mechanically secured, g) one, in particular a plurality, of the microwave power supplies can be separated from the base individually, in particular while said microwave power supply / supplies and / or one or a plurality of other microwave power supplies are being operated, and h) the base is designed such that the base is connected to the plasma process chamber and can be separated therefrom without having to separate the assembly (2) of microwave power supplies from the base.

Description

[0001] Power supply arrangement for generating a plasma and plasma process system

[0002] Description:

[0003] The present invention relates to a power supply arrangement for generating a plasma in a plasma process chamber.

[0004] Furthermore, the invention relates to a plasma process system comprising a plasma process chamber, a plurality of applicators arranged in the plasma process chamber for coupling in microwave power to generate the plasma, and a power supply arrangement connected to the applicators.

[0005] Such plasma process systems are known, for example, from the semiconductor industry for atomic layer-precise material buildup, coating and / or etching. Products such as microprocessors, memory, power semiconductors, photovoltaic modules and displays are manufactured in this way. Typical arrangements are described, for example, in US 10,971,413 B2 or US 10,707,058 B2. These require a power supply arrangement suitable for supplying microwave power to the applicators. Since a large number of applicators are often provided and these are arranged in very different geometric configurations, the cabling of the power supply is often very complex, confusing and error-prone. If a power supply fails, the entire system is therefore often out of service for an extended period, which can result in very high costs, particularly in the manufacture of the aforementioned products.

[0006] It is therefore an object of this invention to provide a power supply arrangement and a plasma processing system that can be maintained easily and quickly.

[0007] The object is achieved by a power supply arrangement according to claim 1 and / or a plasma process system according to claim 15.

[0008] Accordingly, a power supply arrangement is disclosed, comprising: a) a plurality of microwave power supplies, each designed to generate a microwave power signal with a power > 100 W and a frequency > 300 MHz for generating a plasma in a plasma process chamber, b) a base plate having a top side and a bottom side, wherein the base plate is particularly designed such that the top side can be arranged facing away from the plasma process chamber and the bottom side can be arranged facing the plasma process chamber, c) wherein the microwave power supplies can be arranged as a composite on the top side of the base plate, and in particular are, d) wherein the base plate has plug contacts on its top side, e) wherein the microwave power supplies have matching mating plug elements for the plug contacts,f) wherein the microwave power supplies with their mating plug-in elements can be plugged onto the plug contacts of the base plate and mechanically secured, and in particular are, g) wherein one, in particular several, of the microwave power supplies can be separated from the base plate individually, and in particular while these and / or one or more others are in operation, h) wherein the base plate is designed to be attached with its underside to a plasma process chamber top and to be mechanically matched to the plasma process chamber such that the microwave power signals can be guided into the plasma process chamber via several applicators arranged on the plasma process chamber, i) wherein the base plate is designed such that it can be connected to and separated from the plasma process chamber without the combination of microwave power supplies having to be separated from the base plate.

[0009] This allows the microwave power supplies to be replaced quickly and easily, both individually and in combination with the base plate. The base plate does not have to be flat. It can also be curved, e.g. convex or concave. It can also have other shapes. It is designed to be arranged next to the plasma process chamber and to be separable from it. It will therefore generally be designed differently for different plasma process chambers. Furthermore, the terms "top" and "bottom" of the base plate should not be interpreted to mean that the top side must always be horizontal and aligned with the sky, or that the bottom side must always be horizontal and aligned with the earth.Rather, the orientation should be defined based on the plasma chamber, with the base plate being designed so that the top side faces away from the plasma process chamber and the bottom side faces the plasma process chamber. However, it is often the case that the top side is the side that points horizontally upwards and the bottom side also points horizontally downwards.

[0010] Microwave power supplies can be designed as so-called semiconductor-based power amplifiers, also called solid-state power amplifiers (SSPAs) or solid-state power generators (SSPGs). Unlike magnetron arrays and / or tube amplifiers, semiconductor-based power amplifiers have the advantage of being highly efficient and small and compact, making them particularly well-suited for this power supply arrangement. At the same time, frequency, phase, pulse duration, and output power can be adjusted particularly well and precisely. This is particularly true for multiple SSPGs individually, as well as for synchronized groups of SSPGs, especially for all of them.

[0011] In one aspect, the power supply assembly includes a housing adapted to enclose the assembly of microwave power supplies.

[0012] This allows the microwave power supply system to be protected from environmental influences and unintentional operator intervention. At the same time, such a housing can also serve as a shield against electrical and / or electromagnetic fields.

[0013] In one aspect, the power supply arrangement comprises a controller configured to control the microwave power supplies.

[0014] The controller can be integrated into one of the microwave power supplies. This makes the power supply assembly even more compact and easier to maintain.

[0015] The control can also be located outside the microwave power supplies, but inside the housing.

[0016] The control system can also be divided into two parts, such that several, especially all, individual SSPGs have their own control system. This can then automatically ensure individual control. A higher-level SSPG group control system can assume hierarchically superior functions or control individual SSPGs as needed.

[0017] The individual controls can continue to function without the group controls, for example in the event of a failure, and thus maintain the process.

[0018] However, if an individual control system fails, only this SSPG and no other SSPGs fail.

[0019] The control can also be located outside the microwave power supplies and outside the housing.

[0020] In one aspect, one, in particular several, preferably all microwave power supplies have a communication port for connection to the controller.

[0021] In one aspect, the housing includes one or more of the following connectors:

[0022] - Supply connection for connecting supply power e.g. AC IM mains supply and / or DC power,

[0023] - Connections for communication, in particular digital communication, for connection to the control system and in particular a signal for synchronisation,

[0024] - Connection for coolant.

[0025] This allows the connections to be disconnected before the housing is opened or removed or an SSPG is removed from the system.

[0026] In one aspect, the microwave power supplies are AFT-capable. "AFT-capable" here refers to the ability to automatically adjust the output frequency of the microwave power according to predefined parameters. A predefined parameter can, for example, be a limit value for the reflected power. This allows for individual power adjustment for several, particularly all, power supplies.

[0027] With AFT, the frequency, in particular, can be controlled such that the largest possible portion of the available microwave power is coupled into the plasma process and the smallest possible portion is reflected. Such an AFT-capable microwave power supply is described, for example, in patent application DE 10 2021 129 565 A1. In one aspect, several, in particular all, microwave power supplies can be individually controlled in terms of their frequency. This allows for individual power adjustment for several, in particular all, power supplies. This can be achieved, in particular, by the control system, preferably by a central control system.

[0028] Accordingly, an individual AFT by several, especially all, SSPGs is possible, but an AFT for a group of SSPGs is also advantageous.

[0029] In one aspect, several, in particular all, microwave power supplies can be individually controlled in terms of their power. This allows for individual power adjustment for several, in particular all, power supplies, thus influencing the power distribution and thus the distribution of the plasma in the plasma process chamber. This can be achieved, in particular, by the control system, preferably by a central control system.

[0030] In one aspect, several, in particular all, microwave power supplies can be individually controlled in terms of their phase relative to another microwave power supply. This allows for individual power adjustment for several, in particular all, power supplies, thus influencing the power distribution and thus the distribution of the plasma in the plasma process chamber. This can be achieved, in particular, by the control system, preferably by a central control system.

[0031] In one aspect, the microwave power supplies are pulseable. Pulses can be set from >1 Hz to 20 MHz. The mark-to-space ratio can be set from 0% to 100%. Pulses can have different output powers. This allows multi-level pulses to be realized. Pulses can be provided as pulse packets, so-called "bursts." The pulses of individual microwave power supplies can be synchronized with one another. The pulses can also have a sequence. This makes it possible to individually adjust the power for several, in particular all, power supplies, and thus influence the power distribution and thus the distribution of the plasma in the plasma process chamber. This can be done in particular by the controller, preferably by a central controller. In one aspect, the plug contacts of the base plate are designed to enable the connection of a microwave line.This increases flexibility and instead of arranging a microwave power supply, microwave power from a remote microwave power supply can be introduced via a microwave line.

[0032] In one aspect, the plug contacts of the base plate have a protective device that protects the plug contacts when no mating plug element is connected. Such a protective device is disclosed, for example, in patent application DE 10 2022 111 955 A1 as an "opening constriction device." The aforementioned application is hereby incorporated by reference in its entirety into the present application. Such a protective device reduces contamination when the microwave power supply is unplugged; this simplifies handling when changing a microwave power supply. Furthermore, electromagnetic fields are reduced.

[0033] In one aspect, the power supply arrangement is configured to supply microwave power to a microwave processing arrangement located on the process chamber side, e.g., an antenna array. An antenna array is defined as an arrangement with multiple applicators.

[0034] In one aspect, the base plate comprises metal, in particular aluminum and / or copper. It is preferably made of one of these materials or a combination of several of the aforementioned materials. This allows for good stability. Furthermore, good heat distribution can be achieved.

[0035] In one aspect, one, in particular several, preferably all, microwave power supplies have a water connection for cooling fluid. This allows the microwave power supplies to be removed separately from the water.

[0036] In one aspect, the base plate has a cable routing. Thus, the plug contacts of the base plate do not need to be congruent with the applicators in the plasma chamber, but can be routed to a different location. This allows more freedom for the arrangement of the power supplies. In one aspect, the base plate has a power combiner, also

[0037] This is called a 'combiner' or 'coupler'. This allows the power from multiple power supplies connected to this combiner to be directed to one applicator.

[0038] In one aspect, the base plate includes a power splitter. This allows power from a power supply connected to this splitter to be distributed to multiple applicators.

[0039] In one aspect, the base plate includes electronic components, such as inductors, capacitors, attenuators, and / or filters. This allows the design to be further simplified and made very compact.

[0040] Also disclosed is a plasma processing system comprising: a) a plasma processing chamber, preferably with a substrate carrier arranged therein for placing a substrate for processing with a plasma, b) a plurality of applicators arranged in the processing chamber for coupling in microwave power to generate the plasma, c) a power supply arrangement as described above, connected to the applicators.

[0041] With such a plasma process system, the microwave power supplies can be changed particularly quickly and easily, during operation of the plasma process, without having to interrupt this operation.

[0042] Description of the drawing(s):

[0043] The following drawings schematically illustrate exemplary embodiments. They show:

[0044] Fig. la, lb each show a power supply arrangement;

[0045] Fig. 2a, 2b each show a plasma process system;

[0046] Fig. 3 Detail area of ​​the plasma process system with plug contacts;

[0047] Fig. 4 Detail of the plasma process system with couplers in the

[0048] base plate;

[0049] Fig. 5, 6 Detail area of ​​the plasma processing system with splinters in the base plate. Fig. 1a shows a first embodiment of a power supply assembly 1. Fig. 1b shows the same embodiment of a power supply assembly 1 in an exploded view. Fig. 2a, 2b each show an embodiment of a plasma processing system 16, each with a power supply assembly 1 and a plasma processing chamber 6. The same reference symbols have been used for the same components. A plasma processing system 16 comprises:

[0050] - a plasma process chamber 6, preferably with a

[0051] Substrate carrier 19 for placing a substrate 21 for processing with a plasma 7,

[0052] - several applicators 8, arranged in the process chamber 6 for coupling microwave power to generate the plasma 7,

[0053] - a power supply arrangement 1 connected to the applicators 8. The power supply arrangement 1 comprises: several microwave power supplies 2a, 2b, 2c, 2d, . . . 2n, each designed to generate a microwave power signal with a power > 100 W and a frequency > 300 MHz for generating a plasma 7 in a plasma processing chamber 6. A substrate carrier 19 is arranged in the plasma processing chamber 6, with a substrate 21 deposited thereon. The substrate 21 is processed by the plasma during operation. Etching, coating, or surface modification can occur.

[0054] The power supply assembly 1 further comprises a baseplate 3 with a top side 3a and a bottom side 3b. The baseplate 3 is designed such that the top side 3a can be arranged facing away from the plasma chamber 6 and the bottom side 3b can be arranged facing the plasma chamber 6. The baseplate is flat here. However, this is not absolutely necessary, as already described above.

[0055] The microwave power supplies 2a, 2b, 2c, 2d, . . . 2n are arranged as a composite 2 on the upper side 3a of the base plate 3.

[0056] The base plate 3 has plug contacts 4 on its top side 3a.

[0057] The microwave power supplies 2a, 2b, 2c, 2d, . . . 2n have mating plug elements 5 that match the plug contacts 4. The microwave power supplies 2a, 2b, 2c, 2d, . . . 2n can be plugged onto the plug contacts 4 of the base plate 3 with their mating plug elements 5 and mechanically secured.

[0058] One, in particular several, of the microwave power supplies 2a, 2b, 2c, 2d, . . . 2n can each be separated individually from the base plate 3, and in particular while these and / or one or more others are in operation, which is also called hot-plug capability.

[0059] The base plate 3 is designed here to be attached with its underside 3b to a plasma process chamber top side 6a and to be mechanically matched to the plasma process chamber 6 in such a way that the microwave power signals can be guided into the plasma process chamber 6 via several applicators 8 arranged on the plasma process chamber 6.

[0060] The base plate 3 is designed such that it can be connected to and separated from the plasma process chamber 6 without the assembly 2 of the microwave power supplies 2a, 2b, 2c, 2d, . . . 2n having to be separated from the base plate 3.

[0061] The power supply arrangement 1 in Fig. 2b has a housing 11 which is suitable for enclosing the assembly 2 of the microwave power supplies 2a, 2b, 2c, 2d, . . . 2n.

[0062] The power supply arrangement 1 has a controller 20. This controller can be arranged inside the housing 11 with the microwave power supplies 2a, 2b, 2c, 2d, . . . 2n or outside. This controller 20 is configured to control the microwave power supplies 2a, 2b, 2c, 2d, . . . 2n. For this purpose, the microwave power supplies 2a, 2b, 2c, 2d, . . . 2n each have a communication port 17 for connection to the controller 20.

[0063] The plasma process chamber top 6a of a plasma process chamber 6 can be a lid of the plasma process chamber 6, which is firmly and vacuum-tightly attached to the plasma process chamber 6. The base plate 3 is easily removable without causing the plasma chamber 6 to leak, i.e., without changing the pressure in the plasma process chamber 6. The underside 3b of the base plate 3 and the plasma process chamber top 6a thus represent a quick-release coupling. This allows the assembly 2 to be changed without having to change the conditions, such as the vacuum in the plasma process chamber 6. The housing 11 can have one or more of the following connections:

[0064] - Supply connection for connecting supply power e.g. mains supply and / or DC power,

[0065] - Communication ports for connection to the controller,

[0066] - Connection for coolant.

[0067] This allows the connections to be disconnected before the case is opened or removed.

[0068] The plug contacts 4 of the base plate 3 can enable a connection of microwave cables 12.

[0069] Fig. 3 shows a detailed view of the plug contacts 4 and the mating plug element 5. The plug contacts 4 of the base plate 3 can have a protective device 10 that protects the plug contacts 4 when no mating plug element 5 is connected.

[0070] One, in particular several, preferably all, microwave power supplies 2a, 2b, 2c, 2d, . . . 2n have a water connection 18 for cooling liquid.

[0071] Figs. 4, 5, and 6 each show detailed areas of the plasma processing system with combiners 13, splitters 14, or electronic components 15 in the base plate 3. Cable guides 22 in the base plate 3 are also shown.

[0072] Even if these cable guides 22 in the base plate 3 are only shown in arrangements together with combiners 13, splitters 14, or electronic components 15 in the base plate 3, this does not necessarily mean that these cable guides 22 can only be provided together with such components. A base plate 3 is also possible in which a cable guide 22 is provided without a combiner 13, splitter 14, or electronic components 15.

[0073] The electronic components 15 may include, for example, inductors, capacitors, attenuators, delay lines and / or filters.

Claims

Claims:

1. Power supply arrangement (1), comprising: a) a plurality of microwave power supplies (2a, 2b, 2c, 2d, . . . 2n), each designed to generate a microwave power signal with a power > 100 W and a frequency > 300 MHz for generating a plasma (7) in a plasma process chamber (6), b) a base plate (3) with a top side (3a) and a bottom side (3b), c) wherein the microwave power supplies (2a, 2b, 2c, 2d, . . . 2n) can be arranged as a composite (2) on the top side (3a) of the base plate (3), d) wherein the base plate (3) has plug contacts (4) on its top side (3a), e) wherein the microwave power supplies (2a, 2b, 2c, 2d, . . . 2n) have matching mating plug elements (5) to the plug contacts (4), f) wherein the microwave power supplies (2a, 2b, 2c, 2d, . . .2n) with their mating plug elements (5) onto the plug contacts (4) of the base plate (3) and can be mechanically fastened, g) wherein one, in particular several, of the microwave power supplies (2a, 2b, 2c, 2d, . . . 2n) can be separated individually from the base plate (3), and in particular while these and / or one or more others are in operation, h) wherein the base plate (3) is designed to be attached with its underside (3b) to a plasma process chamber top side (6a) and to be mechanically matched to the plasma process chamber (6) such that the microwave power signals can be guided into the plasma process chamber (6) via several applicators (8) arranged on the plasma process chamber (6), i) wherein the base plate (3) is designed such that it can be connected to and separated from the plasma process chamber (6) without the assembly (2) of the microwave power supplies (2a, 2b, 2c, 2d, . . .2n ) must be separated from the base plate (3).

2. Power supply arrangement (1) according to claim 1, wherein the microwave power supplies (2a, 2b, 2c, 2d - 2n) are designed as semiconductor-based power amplifiers.

3. Power supply arrangement (1) according to one of the preceding claims, comprising a housing (11) suitable for surrounding the assembly (2) of microwave power supplies (2a, 2b, 2c, 2d, . . . 2n).

4. Power supply arrangement (1) according to claim 3, wherein the housing (11) has one or more of the following terminals: - Supply connection for connecting supply power e.g. AC IM mains supply and / or DC power, - Connections for communication, in particular digital communication, for connection to the control system and in particular a signal for synchronisation, - Connection for coolant.

5. Power supply arrangement (1) according to one of the preceding claims, wherein the microwave power supplies (2a, 2b, 2c, 2d - 2n) are AFT-capable.

6. Power supply arrangement (1) according to one of the preceding claims, wherein the power supply arrangement (1) has a controller (20) which is designed to control the microwave power supplies (2a, 2b, 2c, 2d, . . . 2n).

7. Power supply arrangement (1) according to one of the preceding claims, wherein one, in particular several, preferably all microwave power supplies have a communication connection for connection to the controller.

8. Power supply arrangement (1) according to one of the preceding claims, wherein several, in particular all, microwave power supplies (2a, 2b, 2c, 2d, . . . 2n) are individually controllable in their frequency.

9. Power supply arrangement (1) according to one of the preceding claims, wherein several, in particular all, microwave power supplies (2a, 2b, 2c, 2d - 2n) are individually controllable in their power.

10. Power supply arrangement (1) according to one of the preceding claims, wherein the microwave power supply(s) (2a, 2b, 2c, 2d - 2n) are pulseable and in particular the pulses of individual microwave power supplies are synchronizable with one another.

11. Power supply arrangement (1) according to claim 10, wherein the pulses can be set from >1 Hz to 20 MHz and / or the pulse-pause ratio can be set from 0% to 100%.

12. Power supply arrangement (1) according to one of the preceding claims, wherein the plug contacts (4) of the base plate (3) have a protective device (10) which protects the plug contacts (4) when no mating plug element (5) is connected.

13. Power supply arrangement (1) according to one of the preceding claims, wherein the base plate (3) comprises one or more of the following components: - Cable routing (20), - Combiners (13), - splinters (14), - electronic components (15).

14. Power supply arrangement (1) according to one of the preceding claims, wherein one, in particular several, preferably all, microwave power supplies (2a, 2b, 2c, 2d, . . . 2n) have / have a water connection for cooling liquid.

15. Plasma process system (16), comprising: a) a plasma process chamber (6), preferably with a substrate carrier (19) arranged therein for placing a substrate (21) for processing with a plasma (7), b) a plurality of applicators (8), arranged in the process chamber (6) for coupling in microwave power to generate the plasma (7), c) a power supply arrangement (1) according to one of the preceding claims, connected to the applicators (8).

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