Gas supply nozzle for substrate processing apparatus

JP1731676SActive Publication Date: 2025-12-15KOKUSAI DENKI KK
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Patent Information

Application Number
JP2022011412D
Authority / Receiving Office
JP · JP
Patent Type
Designs
Current Assignee / Owner
Filing Date
2022-05-30
Publication Date
2025-12-15
Estimated Expiration
2047-05-30

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Abstract

The present invention relates to a gas supply nozzle used in a substrate processing apparatus for processing substrates held in multiple stages in the vertical direction inside a reaction tube.
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