Flow Control Valve

Abstract

The article of the present design is a thin flow control valve used to control the vacuum pressure in a process chamber of a semiconductor manufacturing device, etc. The article is composed of a circular flange portion that forms the outer periphery of the flow path, multiple valve bodies that extend and retract from the flange portion toward the center of the flow path, and a drive mechanism that drives the valve bodies to extend and retract. The article cleans the gas flow by concentrically opening and closing the flow path with the multiple valve bodies, and when fully closed, forms a pore-like void in the center of the flow path.

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