Substrate processing device management system, substrate processing device management method and substrate processing device management program

Abstract

To enable an administrator to easily and properly grasp priority levels of investigation in a short time when there is a plurality of requests to investigate a plurality of substrate processing devices.SOLUTION: A substrate processing device management system 2 gathers a plurality of pieces of processing information representing operations or states related to processing on substrates from each of a plurality of substrate processing devices 1. For each substrate processing device 1, a degree of abnormality of the substrate processing device 1 is calculated as an abnormality score based upon invariant relation among the plurality of pieces of processing information and the plurality of pieces of processing information gathered from the substrate processing device 1. A management device 4 accepts a request to investigate abnormality from each substrate processing device 1. When two or more requests to investigate are accepted, abnormality scores of the substrate processing devices which correspond to the requests to investigate are acquired. Based upon the plurality of acquired abnormality scores, priority level information, associated with priority levels, to be replied to the two or more requests to investigate are presented to the administrator.SELECTED DRAWING: Figure 1

Description

Technical Field

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[0001] The present invention relates to a substrate processing apparatus management system, a substrate processing apparatus management method, and a substrate processing apparatus management program used for managing a plurality of substrate processing apparatuses.

Background Art

[0002] Substrate processing apparatuses are used to perform various processes on various substrates such as substrates for flat panel displays (FPDs) used in liquid crystal display devices or organic EL (Electro Luminescence) display devices, semiconductor substrates, optical disk substrates, magnetic disk substrates, magneto-optical disk substrates, photomask substrates, ceramic substrates, or solar cell substrates. In a substrate processing apparatus, for example, a series of processes are performed on a substrate according to a predetermined processing procedure (recipe). In order to prevent the occurrence of substrate processing defects caused by abnormalities in the substrate processing apparatus, a data processing system for determining abnormalities in the substrate processing apparatus has been proposed (see, for example, Patent Document 1).

[0003] In that data processing system, a plurality of physical quantities related to the substrate processing apparatus are measured during the processing of the substrate, and a plurality of time-series data are generated by arranging the measurement results in time series. The plurality of time-series data includes data on physical quantities such as the flow rate of the processing liquid discharged from the nozzle and the pressure inside the chamber. An evaluation value is calculated by comparing each time-series data with predetermined reference data. Based on the calculated evaluation value, it is determined whether there is an abnormality in the time-series data.

Prior Art Documents

Patent Documents

[0004]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0005] Multiple substrate processing units are installed in multiple locations around the world, for example. Maintenance work on each substrate processing unit is performed by local maintenance personnel assigned to that unit. Based on the abnormality detection results from the data processing system described above, the maintenance personnel can determine whether or not an abnormality has occurred in the substrate processing unit.

[0006] Maintenance workers may sometimes be unable to identify the cause of an abnormality in a circuit board processing machine. In such cases, the maintenance worker requests a detailed investigation of the circuit board processing machine under their responsibility from the manager who oversees multiple machines. The manager, upon receiving the investigation request, conducts various investigations of the circuit board processing machine in question. The manager also provides specific work instructions to the maintenance worker who requested the investigation, based on the investigation results.

[0007] When multiple maintenance workers request investigations into multiple PCB processing units, it becomes difficult for managers to investigate all of them simultaneously. In this case, managers must prioritize the investigations of the multiple PCB processing units. To properly determine the investigation priorities, it is necessary to understand the extent of the abnormalities in the multiple PCB processing units being investigated. To understand the extent of the abnormalities in multiple PCB processing units, an initial investigation must be conducted for each unit. This initial investigation includes, for example, the analysis of past time-series data and interviews with maintenance workers. Thus, the initial investigation is complex. Consequently, after receiving multiple investigation requests, it takes a long time for managers to actually begin the investigation for each request.

[0008] The object of the present invention is to provide a substrate processing apparatus management system, a substrate processing apparatus management method, and a substrate processing apparatus management program that enable a manager to easily, appropriately, and quickly determine the priority of investigations when multiple investigation requests are received for multiple substrate processing apparatuses. [Means for solving the problem]

[0009] (1) A substrate processing apparatus management system according to one aspect of the present invention is a substrate processing apparatus management system used to manage a plurality of substrate processing apparatuses, comprising: an information collection unit that collects a plurality of processing information from each substrate processing apparatus that indicates an operation or state related to the processing of a substrate; a score calculation unit that calculates the degree of abnormality of each substrate processing apparatus as an abnormality score based on the invariant relationship between the plurality of processing information and the plurality of processing information collected from the substrate processing apparatus; a request reception unit that receives an investigation request regarding an abnormality from each substrate processing apparatus; a score acquisition unit that acquires two or more abnormality scores calculated for each of the two or more substrate processing apparatuses that have sent an investigation request to the request reception unit; and a priority presentation unit that presents priority information regarding the priority of responding to two or more investigation requests based on the two or more abnormality scores acquired by the score acquisition unit.

[0010] In this substrate processing equipment management system, the degree of abnormality of each of the multiple substrate processing equipment is calculated as an abnormality score. When there are two or more requests for investigation of two or more substrate processing equipment, priority information based on the abnormality scores of the two or more requested substrate processing equipment is presented. The abnormality score is calculated based on the invariant relationships between multiple processing information. Therefore, managers of multiple substrate processing equipment can easily, appropriately, and quickly grasp the priority of investigation for the multiple substrate processing equipment for which investigation requests have been made.

[0011] (2) The priority information includes two or more abnormal scores obtained by the score acquisition unit, and the priority presentation unit may present the two or more abnormal scores obtained by the score acquisition unit in association with two or more substrate processing devices. In this case, the administrators of multiple substrate processing devices can easily grasp the degree of abnormality of two or more substrate processing devices for which an investigation has been requested, based on the presented abnormal scores.

[0012] (3) The substrate processing apparatus management system may further include a score transmission unit that transmits the abnormal score calculated by the score calculation unit to the substrate processing apparatus corresponding to the abnormal score. In this case, the abnormal score can be stored in each substrate processing apparatus. This makes it possible to analyze abnormalities based on the abnormal score in each substrate processing apparatus.

[0013] (4) The substrate processing apparatus management system may further include an alarm transmission unit that determines whether the abnormal score calculated for each substrate processing apparatus exceeds a predetermined threshold, and if the abnormal score exceeds the threshold, sends an alarm to the substrate processing apparatus corresponding to that abnormal score. In this case, the occurrence of an abnormality exceeding a predetermined level can be easily detected in each substrate processing apparatus.

[0014] (5) The information collection unit may repeatedly accumulate and reset multiple processing information collected at regular intervals, and the score calculation unit may calculate the degree of abnormality of each substrate processing device as an abnormality score based on the invariant relationships between the multiple processing information and the multiple processing information generated by the substrate processing device and accumulated by the information collection unit. In this case, the influence of noise and other factors generated when each processing information is collected on the abnormality score is reduced.

[0015] (6) For multiple processing information, multiple combinations of two different processing information are defined, and each combination includes a first processing information and a second processing information. The score calculation unit generates a first predicted processing information for each combination, based on the second processing information collected under predetermined conditions, and calculates the degree of deviation between the generated first predicted processing information and the first processing information actually collected by the data collection unit as the first deviation. For each combination, the score calculation unit generates a second predicted processing information for each combination, based on the first processing information collected under predetermined conditions, and calculates the degree of deviation between the generated second predicted processing information and the second processing information actually collected by the data collection unit as the second deviation. An anomaly score may be calculated based on multiple first deviations and multiple second deviations calculated for each of the multiple combinations. In this case, it becomes possible to calculate an anomaly score for each piece of processing information actually collected, based on its invariant relationship with other pieces of processing information.

[0016] (7) The score calculation unit may calculate an abnormality score by summing the multiple first deviations and multiple second deviations calculated for each of the multiple combinations. In this case, the degree of abnormality of each substrate processing device can be easily calculated.

[0017] (8) Each of the multiple combinations may be assigned a predetermined weight according to the relationship between the combination and multiple types of abnormal states of the substrate processing device, and the score calculation unit may calculate multiple first deviations and multiple second deviations based on the multiple combinations and the multiple weights.

[0018] In this case, by referring to an anomaly score calculated based on multiple first deviations and multiple second deviations, the degree of anomaly in each substrate processing device can be more accurately determined.

[0019] (9) Multiple processing information may include at least one physical quantity from among the following: the amount of fluid supplied to the substrate, the temperature of the fluid supplied to the substrate, the concentration of the processing liquid supplied to the substrate, the temperature of the processing chamber in which the substrate is housed, the pressure inside the processing chamber in which the substrate is housed, the pressure of the gas discharged from the processing chamber in which the substrate is housed, and the moving speed of the substrate being transported by the robot. In this case, an anomaly score is calculated based on one or more physical quantities obtained in the substrate processing apparatus.

[0020] (10) The multiple processing information may include information about at least one of the following: a drive pulse signal that drives a robot that transports substrates, an output signal from a detector provided on the robot that transports substrates, and an open / close signal given to a control valve. In this case, an abnormality score is calculated based on one or more signals used in the substrate processing apparatus.

[0021] (11) Each substrate processing apparatus is a substrate cleaning apparatus that cleans a substrate using a cleaning solution, and the multiple processing information may include at least one of the following: the amount of cleaning solution supplied to the substrate, the temperature of the cleaning solution supplied to the substrate, and the concentration of the cleaning solution supplied to the substrate. In this case, if there are multiple requests for investigation of multiple substrate cleaning apparatuses, the priority of the investigation will be appropriately determined.

[0022] (12) A substrate processing apparatus management method according to another aspect of the present invention is a substrate processing apparatus management method used to manage a plurality of substrate processing apparatuses, comprising the steps of: collecting a plurality of processing information from each substrate processing apparatus that indicates an operation or state related to processing a substrate; calculating an abnormality score for each substrate processing apparatus based on the invariant relationship between the plurality of processing information and the plurality of processing information collected from the substrate processing apparatus; receiving an investigation request regarding an abnormality from each substrate processing apparatus; obtaining two or more abnormality scores calculated for each of the two or more substrate processing apparatuses that have sent an investigation request; and presenting priority information regarding the priority of responding to the two or more investigation requests based on the two or more abnormality scores obtained in the acquisition step.

[0023] In the substrate processing apparatus management method, for each of a plurality of substrate processing apparatuses, the degree of abnormality of the substrate processing apparatus is calculated as an abnormality score. When there are two or more investigation requests for two or more substrate processing apparatuses, priority information based on the abnormality scores of the two or more substrate processing apparatuses for which the investigation requests were made is presented. The abnormality score is calculated based on an invariant relationship between a plurality of pieces of processing information. Therefore, managers of a plurality of substrate processing apparatuses can easily and appropriately grasp the investigation priorities for the plurality of substrate processing apparatuses for which investigation requests were made in a short time.

[0024] (13) A substrate processing apparatus management program according to still another aspect of the present invention is a substrate processing apparatus management program that causes a computer to execute a process of managing a plurality of substrate processing apparatuses using an information analysis apparatus. The information analysis apparatus includes an information collection unit that collects a plurality of pieces of processing information indicating operations or states related to the processing of substrates from each substrate processing apparatus, and a score calculation unit that calculates, as an abnormality score, the degree of abnormality of each substrate processing apparatus based on an invariant relationship between a plurality of pieces of processing information and the plurality of pieces of processing information collected from the substrate processing apparatus. The process of managing a plurality of substrate processing apparatuses includes a process of receiving an investigation request regarding abnormality from each substrate processing apparatus, a process of acquiring two or more abnormality scores respectively calculated for two or more substrate processing apparatuses that transmitted the investigation request, and a process of presenting priority information regarding the priorities for responding to the two or more investigation requests based on the two or more abnormality scores acquired by the acquisition process.

[0025] According to the substrate processing apparatus management program, when there are two or more investigation requests for two or more substrate processing apparatuses, priority information based on the abnormality scores of the two or more substrate processing apparatuses for which the investigation requests were made is presented. The abnormality score is calculated based on an invariant relationship between a plurality of pieces of processing information. Therefore, managers of a plurality of substrate processing apparatuses can easily and appropriately grasp the investigation priorities for the plurality of substrate processing apparatuses for which investigation requests were made in a short time.

Effect of the Invention

[0026] According to the present invention, when there are multiple investigation requests for a plurality of substrate processing apparatuses, the administrator can easily and appropriately grasp the priority order of the investigations in a short time.

Brief Description of the Drawings

[0027] [Figure 1] It is a diagram for explaining the configuration of a substrate processing apparatus management system according to the first embodiment. [Figure 2] It is a block diagram for explaining the functional configuration of a substrate processing apparatus management system according to the first embodiment. [Figure 3] It is a diagram for explaining a specific calculation example of the degree of divergence. [Figure 4] It is a diagram for explaining a specific calculation example of the abnormality score. [Figure 5] It is a flowchart showing an example of the processing executed in each of the plurality of substrate processing apparatuses in FIG. 1. [Figure 6] It is a flowchart showing an example of the processing executed in the information analysis apparatus in FIG. 1. [Figure 7] It is a flowchart showing an example of the processing executed in the management apparatus in FIG. 1. [Figure 8] It is a diagram for explaining the functional configuration of a substrate processing apparatus management system according to the second embodiment. [Figure 9] It is a diagram showing an example of a plurality of weights stored in the weight storage unit in FIG. 8.

Modes for Carrying Out the Invention

[0028] Hereinafter, a substrate processing apparatus management system, a substrate processing apparatus management method, and a substrate processing apparatus management program according to one embodiment of the present invention will be described with reference to the drawings. In the following description, "substrate" refers to semiconductor substrates, substrates for FPDs (Flat Panel Displays) such as liquid crystal display devices or organic EL (Electro Luminescence) display devices, substrates for optical discs, substrates for magnetic discs, substrates for magneto-optical discs, substrates for photomasks, ceramic substrates, or substrates for solar cells.

[0029] 1. First Embodiment <1> Configuration and operation of the PCB processing unit management system (1) Overall structure Figure 1 is a diagram illustrating the configuration of a substrate processing apparatus management system according to the first embodiment. As shown in Figure 1, the substrate processing apparatus management system 2 according to this embodiment mainly consists of an information analysis device 3 and a management device 4, and is used to manage multiple (five in this example) substrate processing apparatuses 1. In the following description, when distinguishing between the five substrate processing apparatuses 1 shown in Figure 1, the five substrate processing apparatuses 1 will be referred to as substrate processing apparatuses 1A, 1B, 1C, 1D, and 1E, respectively. In this embodiment, substrate processing apparatuses 1A to 1E are assumed to have the same configuration.

[0030] (2) One example of the configuration of the substrate processing apparatus 1A As shown in Figure 1, the substrate processing apparatus 1A is a so-called batch-type substrate cleaning apparatus and includes a processing tank 11, a substrate holding unit 12, a lifting device 13, a cleaning solution generating device 14, a concentration meter 20, a transport robot 30, and a control device 40. In addition to the above-mentioned components, the substrate processing apparatus 1A is also provided with a display device, an audio output device, and an operation unit (not shown).

[0031] The substrate holding section 12 is configured to hold multiple substrates W. The processing tank 11 is configured to accommodate the multiple substrates W held by the substrate holding section 12. A cleaning solution for cleaning the substrates W is stored in the processing tank 11.

[0032] The lifting device 13 supports the substrate holder 12 so that it can move vertically, and moves the substrate holder 12 vertically under the control of the control device 40. This allows the lifting device 13 to immerse the multiple substrates W held by the substrate holder 12 in the cleaning solution stored in the processing tank 11, and to lift the multiple substrates W immersed in the cleaning solution from the processing tank 11. The multiple substrates W are cleaned by being immersed in the cleaning solution. The lifting device 13 is also equipped with a motor (not shown) as a power source for moving the substrate holder 12 vertically.

[0033] The cleaning solution generating device 14 includes a storage tank 14a and an agitator (such as a bubbling device) not shown. A chemical supply pipe 91, a pure water supply pipe 92, an additional chemical supply pipe 93, and a drain pipe 94 are connected to the storage tank 14a. Each of the multiple pipes (91 to 94) is provided with a valve. Each valve is a control valve whose opening degree can be adjusted by the control device 40.

[0034] The chemical supply pipe 91 guides the chemical solution supplied from a chemical supply system (not shown) to the storage tank 14a when a valve provided in the chemical supply pipe 91 is opened. The flow rate (amount supplied per unit time) of the chemical solution supplied to the storage tank 14a through the chemical supply pipe 91 changes according to the degree to which the valve provided in the chemical supply pipe 91 is opened.

[0035] The pure water supply pipe 92 guides pure water supplied from a pure water supply system (not shown) to the storage tank 14a when a valve provided in the pure water supply pipe 92 is opened. The flow rate (amount supplied per unit time) of pure water supplied to the storage tank 14a through the pure water supply pipe 92 changes according to the degree to which the valve provided in the pure water supply pipe 92 is opened.

[0036] In this way, a predetermined amount of chemical solution and pure water is stored in the storage tank 14a of the cleaning solution generation device 14. Furthermore, within the storage tank 14a, the stored chemical solution and pure water are mixed by a stirring mechanism (not shown) to produce the cleaning solution to be stored in the treatment tank 11. As the chemical solution, BHF (buffered hydrofluoric acid), DHF (dilute hydrofluoric acid), hydrofluoric acid, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, acetic acid, oxalic acid, or ammonia can be used.

[0037] The additional chemical supply pipe 93 guides the chemical supplied from a chemical supply system (not shown) to the storage tank 14a when a valve provided on the chemical supply pipe 91 is opened. The supply of chemical to the storage tank 14a through the additional chemical supply pipe 93 will be described later. The drain pipe 94 discharges some or all of the cleaning solution stored in the cleaning solution generating device 14 to the outside of the substrate processing device 1A when a valve provided on the drain pipe 94 is opened.

[0038] A liquid supply pipe 15 is further connected to the storage tank 14a. The liquid supply pipe 15 is provided to connect the processing tank 11 and the cleaning liquid generation device 14. A pump 16 and a valve 17 are also provided on the liquid supply pipe 15. The valve 17 is a control valve whose opening degree can be adjusted by the control device 40. When the valve 17 is opened while the pump 16 is operating, the cleaning liquid stored in the storage tank 14a is supplied into the processing tank 11. The flow rate (amount supplied per unit time) of the cleaning liquid supplied from the storage tank 14a to the processing tank 11 changes according to the opening degree of the valve 17.

[0039] A liquid discharge pipe 18 is connected to the bottom of the processing tank 11. A valve 19 is provided on the liquid discharge pipe 18. The valve 19 is a control valve whose opening degree can be adjusted by the control device 40. When the valve 19 is opened, a portion of the cleaning liquid stored in the processing tank 11 is discharged from the substrate processing device 1A through the liquid discharge pipe 18. The flow rate (discharge rate per unit time) of the cleaning liquid discharged from the processing tank 11 changes according to the opening degree of the valve 19. When cleaning multiple substrates W, cleaning liquid is supplied to the processing tank 11 from the cleaning liquid generator 14, and the cleaning liquid inside the processing tank 11 is discharged through the liquid discharge pipe 18.

[0040] The concentration meter 20 detects the concentration of the cleaning solution in the storage tank 14a in response to a command from the control device 40 and provides the detection result to the control device 40. The transport robot 30 transports multiple substrates W, which are held by the substrate holding unit 12, at a position above the processing tank 11. The control device 40 consists of, for example, a CPU (central processing unit) and memory, and controls the operation of the lifting device 13, the operation of the transport robot 30, and the opening degrees of the valves 17 and 19. The memory of the control device 40 stores a first management program, which will be described later.

[0041] Furthermore, the control device 40 provides feedback control to the amount of chemical solution supplied to the storage tank 14a based on the detection result of the chemical solution concentration provided by the concentration meter 20, so that the chemical solution concentration of the cleaning solution stored in the storage tank 14a is within a predetermined range. For example, if the chemical solution concentration of the cleaning solution detected by the concentration meter 20 is lower than a predetermined range, the control device 40 supplies additional chemical solution to the cleaning solution generator 14 through an additional chemical solution supply pipe 93 from a chemical solution supply system (not shown).

[0042] Furthermore, the control device 40 has an emergency stop function that stops the operation of the substrate processing device 1A if a person enters a predetermined space inside the substrate processing device 1A or if a predetermined detector (for example, a concentration meter 20) installed inside the substrate processing device 1A is not functioning.

[0043] (3) Processing information Each substrate processing apparatus 1 is defined with multiple pieces of processing information indicating the operation or state related to the processing of the substrate W in the substrate processing apparatus, as information for managing abnormalities in the substrate processing apparatus 1. These processing pieces of information are transmitted from the control device 40 of each substrate processing apparatus 1 to the information analysis device 3 of the substrate processing apparatus management system 2 at predetermined intervals, as shown by the thick solid arrows in Figure 1.

[0044] As shown in the outlet in Figure 1, the processing information transmitted from the substrate processing apparatus 1A to the information analysis apparatus 3 includes: a. chemical solution concentration, b. chemical solution supply amount, c. concentration detection input signal, d. concentration detection output signal, e. motor rotation speed, f. power supplied to the motor, g. additional chemical solution amount, h. chemical solution supply valve opening, and i. cleaning solution discharge valve opening.

[0045] "a. Chemical concentration" indicates the chemical concentration of the cleaning solution in the storage tank 14a as detected by the concentration meter 20. "b. Chemical supply amount" indicates the flow rate (amount supplied per unit time) of the cleaning solution supplied from the chemical supply pipe 91 to the storage tank of the cleaning solution generator 14. "b. Chemical supply amount" can be detected, for example, by installing a flow meter in the chemical supply pipe 91.

[0046] In the substrate processing apparatus 1A, the concentration of the cleaning solution is detected when the control device 40 commands the concentration meter 20 to detect the concentration. "c. Concentration detection input signal" is the command signal for concentration detection given from the control device 40 to the concentration meter 20. "d. Concentration detection output signal" is a signal indicating the detection result of the chemical solution concentration output from the concentration meter 20 in response to the command from the control device 40.

[0047] "e. Motor rotation speed" is the rotation speed of the motor provided in the lifting device 13, and can be calculated, for example, by detecting the rotation speed of the motor using a rotation speed sensor. "f. Power supplied to the motor" is the amount of power supplied to the motor provided in the lifting device 13, and can be calculated, for example, by detecting the current supplied to the motor using an ammeter.

[0048] "g. Additional chemical amount" indicates the amount of additional chemical supplied per unit time from the additional chemical supply pipe 93 to the storage tank 14a so that the chemical concentration of the cleaning solution stored in the storage tank 14a is within a predetermined range. "g. Additional chemical amount" can be detected, for example, by installing a flow meter in the additional chemical supply pipe 93. "h. Chemical supply valve opening" indicates the opening of the valve installed in the chemical supply pipe 91. "i. Cleaning solution discharge valve opening" indicates the opening of the valve installed in the drain pipe 94.

[0049] (4) Basic operation of the information analysis device 3 The information analysis device 3 is, for example, a server and includes a CPU and memory. The information analysis device 3 collects multiple processing information transmitted from each substrate processing device 1. In the information analysis device 3, multiple combinations of two different processing information are predetermined for the multiple processing information transmitted from each substrate processing device 1 to the information analysis device 3.

[0050] Here, we assume that the substrate processing device 1 is operating ideally according to a predetermined processing procedure (recipe). In this case, a predetermined invariant relationship (hereinafter referred to as the invariant relationship) is maintained between the two processing information components that make up each combination.

[0051] On the other hand, consider a scenario where substrate processing is performed against the intention due to an abnormality occurring in the substrate processing device 1. In this case, the relationship between two processing information components constituting at least one of the multiple combinations deviates from an invariant relationship.

[0052] Therefore, the information analysis device 3 calculates multiple deviation degrees, which represent the degree of discrepancy between the relationships between multiple combinations of the multiple processing information actually collected and the multiple invariant relationships predetermined for those multiple processing information. Furthermore, based on the calculated multiple deviation degrees, the information analysis device 3 calculates the degree of abnormality of the substrate processing device 1 as an abnormality score. A specific example of the method for calculating the abnormality score will be described later.

[0053] Furthermore, the information analysis device 3 transmits the calculated anomaly score to each substrate processing device 1, as shown by the thick dashed arrow in Figure 1. The transmission of the anomaly score is performed each time the information analysis device 3 calculates an anomaly score. At this time, each substrate processing device 1 stores the anomaly score transmitted from the information analysis device 3.

[0054] Furthermore, the information analysis device 3 determines whether the abnormal score for each substrate processing device 1 exceeds a predetermined first threshold. If the abnormal score exceeds the first threshold, the information analysis device 3 sends an alarm to the substrate processing device 1 corresponding to that abnormal score. In the example in Figure 1, the information analysis device 3 sends alarms to substrate processing devices 1D and 1E among the substrate processing devices 1A to 1E, as indicated by the wavy dotted arrows. At this time, the substrate processing devices 1D and 1E that receive the alarm output an alarm.

[0055] In this embodiment, the abnormality score (degree of abnormality) is lower for abnormalities that do not require a prompt response by maintenance personnel, and higher for abnormalities that require a prompt response by maintenance personnel. A state with a low abnormality score is one in which all of the processing conditions fall within the range predicted to be normal based on the invariant relationships corresponding to each of the above combinations.

[0056] On the other hand, a high abnormality score includes, for example, a state in which the temporal change in "a. chemical solution concentration" is significantly larger than the temporal change predicted based on the temporal change in "b. chemical solution supply amount" (hereinafter referred to as the first abnormal state). The continuation of the first abnormal state leads to processing failures of the substrate W due to the inability to adjust the chemical solution concentration of the cleaning solution, generation of harmful gases, and damage to the components of the substrate processing apparatus 1.

[0057] Furthermore, a high abnormality score includes, for example, a state in which the time from the time of the command to detect the concentration in the concentration meter 20 to the time of the output of the chemical solution concentration from the concentration meter 20 is significantly long (hereinafter referred to as the second abnormal state). The continuation of the second abnormal state leads to processing defects in the substrate W, generation of harmful gases, and damage to the components of the substrate processing apparatus 1 due to the inability to perform appropriate feedback control over the chemical solution concentration.

[0058] Furthermore, a high abnormality score includes, for example, a state where "f. Power supplied to the motor" is significantly larger than the predicted value (hereinafter referred to as the third abnormal state). In the third abnormal state, there is a high probability that an unexpected load is acting on the motor. Therefore, the persistence of the third abnormal state will cause failure of the operating parts including the motor, failure of the substrate W to be transported, and damage to the components of the substrate processing device 1.

[0059] Furthermore, a high abnormality score includes, for example, a state where "g. Amount of additional chemical solution" fluctuates beyond the predicted range (hereinafter referred to as the fourth abnormal state). In the fourth state, it is difficult to maintain a constant concentration of the cleaning solution. Therefore, the continuation of the fourth abnormal state will cause processing failures of the substrate W.

[0060] Furthermore, a high abnormality score includes, for example, a state in which the temporal changes of "h. chemical supply valve opening" and "i. cleaning solution discharge valve opening" differ significantly from the temporal changes predicted from "a. chemical concentration" and "b. chemical supply amount" (hereinafter referred to as the fifth abnormal state). When the substrate processing apparatus 1A is in the fifth abnormal state, it is considered that the substrate processing apparatus 1A is either stopped by the emergency stop function or in a state where it should be stopped by its own mechanism.

[0061] (5) Basic operation of control device 4 The management device 4 is, for example, a personal computer and includes a CPU and memory. The management device 4 also includes a display unit 4a and an operation unit 4b and is used by an administrator to manage multiple board processing devices 1.

[0062] Multiple maintenance workers, each responsible for a different substrate processing unit 1, can easily understand the degree of abnormality in their respective unit by checking the abnormality score transmitted from the information analysis device 3. Furthermore, each maintenance worker can understand that a serious abnormality has occurred in their assigned substrate processing unit 1 when the unit receives an alarm.

[0063] However, even if each maintenance worker can grasp the degree of abnormality in the substrate processing device 1, they may not be able to identify the cause of the abnormality. In this case, the maintenance worker will request the supervisor to conduct a detailed investigation of the substrate processing device 1.

[0064] As a result, as shown by the thick dashed arrows in Figure 1, investigation requests are sent from some (in this example, substrate processing devices 1A, 1C, 1E) or all of the substrate processing devices 1 to the management device 4. Furthermore, as shown by the thick dotted arrows in Figure 1, an abnormality score is sent from the one or more substrate processing devices 1 (in this example, substrate processing devices 1A, 1C, 1E) that sent the investigation request to the management device 4.

[0065] As a result, the management device 4 can easily and quickly determine the priority of investigations based on the abnormality scores received along with the investigation requests, even if, for example, investigation requests are received from multiple substrate processing devices 1 at the same time. In other words, the administrator can determine the priority of investigations based on the multiple abnormality scores of the substrate processing devices 1A, 1C, and 1E that have requested investigations.

[0066] In addition, in the management device 4, each investigation request received from one or more substrate processing devices 1 is excluded from the prioritization process each time a detailed investigation of the substrate processing device 1 corresponding to that investigation request is carried out.

[0067] <2> Functional configuration of the substrate processing equipment management system 2 Figure 2 is a block diagram illustrating the functional configuration of the substrate processing apparatus management system 2 according to the first embodiment. As shown in Figure 2, the information analysis device 3 includes an information collection unit 31, a score calculation unit 32, a score transmission unit 33, and an alarm transmission unit 34. The memory of the information analysis device 3 stores a second management program for managing multiple substrate processing apparatuses 1. The components (31-34) of the information analysis device 3 in Figure 2 are realized by the CPU of the information analysis device 3 executing the second management program stored in the memory. Note that some or all of the components (31-34) of the information analysis device 3 may be realized by hardware such as electronic circuits.

[0068] Furthermore, the management device 4 includes a request reception unit 41, a score acquisition unit 42, and a score presentation unit 43. The memory of the management device 4 stores a third management program for managing multiple board processing devices 1. The components (41-43) of the management device 4 in Figure 2 are realized by the CPU of the management device 4 executing the third management program stored in the memory. Note that some or all of the components (41-43) of the management device 4 may be realized by hardware such as electronic circuits.

[0069] As described above, multiple processing information is transmitted from each of the multiple substrate processing devices 1 to the information analysis device 3 at predetermined intervals (see the thick solid arrows in Figure 2). The information collection unit 31 of the information analysis device 3 collects the multiple processing information transmitted from each substrate processing device 1 and provides it to the score calculation unit 32.

[0070] The score calculation unit 32 of the information analysis device 3 calculates an abnormality score for each substrate processing device 1 based on a plurality of processing information corresponding to each substrate processing device 1, and provides the calculated abnormality score to the score transmission unit 33 and the alarm transmission unit 34.

[0071] The score transmission unit 33 of the information analysis device 3 transmits the abnormal score calculated by the score calculation unit 32 to the substrate processing device 1 corresponding to that abnormal score (see the thick dashed arrow in Figure 2). In each substrate processing device 1, the abnormal score transmitted from the score transmission unit 33 is stored in association with a time such as the calculation time, transmission time, or reception time of the abnormal score.

[0072] The alarm transmission unit 34 of the information analysis device 3 determines whether the abnormal score calculated for each substrate processing device 1 exceeds the first threshold. If the abnormal score exceeds the first threshold, the alarm transmission unit 34 sends an alarm to the substrate processing device 1 corresponding to that abnormal score (substrate processing devices 1D and 1E in the example of Figure 2) (see the wavy dotted arrow in Figure 2).

[0073] In each substrate processing device 1, a request for investigation regarding an abnormality in the substrate processing device 1 is transmitted to the management device 4 based on operations performed by a maintenance worker. In addition, the abnormality score stored in the substrate processing device 1 is transmitted to the management device 4.

[0074] The request reception unit 41 of the management device 4 receives investigation requests transmitted from one or more substrate processing devices 1 (in the example of Figure 2, substrate processing devices 1A, 1C, 1E) (see the thick dashed arrow in Figure 2). The score acquisition unit 42 of the management device 4 acquires abnormal scores transmitted along with the investigation requests from one or more substrate processing devices 1 (in the example of Figure 2, substrate processing devices 1A, 1C, 1E) (see the thick dotted arrow in Figure 2). The score display unit 43 of the management device 4 displays each of the one or more abnormal scores acquired by the score acquisition unit 42 on the display unit 4a, associating each of them with the substrate processing device 1 corresponding to that abnormal score.

[0075] In the example shown in Figure 2, the anomaly scores for the substrate processing units 1A, 1C, and 1E, which were requested for investigation, are "264," "210," and "322," respectively. This allows the administrator to easily understand the degree of anomaly in the substrate processing units 1E, 1A, and 1C. Furthermore, it is clear that the administrator should proceed with a detailed investigation in the order of substrate processing units 1E, 1A, and 1C.

[0076] Furthermore, if multiple abnormal scores are calculated for multiple uninvestigated substrate processing devices 1 for which investigation requests have been sent, the score display unit 43 may determine the priority of the investigation based on those abnormal scores and display the determined priority on the display unit 4a.

[0077] <3> Specific examples of calculating anomaly scores As described above, the substrate processing device management system 2 defines multiple combinations of two different processing information. A deviation degree is calculated for each combination in order to calculate the anomaly score. Figure 3 is a diagram illustrating a specific example of deviation degree calculation. Here, we will explain an example of deviation degree calculation corresponding to the combination of "e. motor rotation speed" and "f. power supplied to the motor" in Figure 1. In the following explanation, the data for "e. motor rotation speed" will be referred to as "e" data as appropriate, and the data for "f. power supplied to the motor" will be referred to as "f" data as appropriate.

[0078] To calculate the degree of deviation, reference data based on the invariant relationship between "e. motor rotation speed" and "f. power supplied to the motor" is required. Therefore, the information analysis device 3 stores "e" data and "f" data when the substrate processing device 1 is operating ideally according to the recipe, before the actual processing of the substrate W in each substrate processing device 1.

[0079] These ideal "e" and "f" data are obtained, for example, based on multiple processing information transmitted from each substrate processing device 1 when it is actually operating normally. Alternatively, the ideal "e" and "f" data may be generated through simulation or the like.

[0080] The upper part of Figure 3 shows an example of the time-dependent changes in ideal "e" and "f" data in graph form. In the "e" data graph, the horizontal axis represents time, and the vertical axis represents the motor's rotational speed. In the "f" data graph, the horizontal axis represents time, and the vertical axis represents the amount of electricity supplied to the motor installed in the lifting device 13 in Figure 1 (supplied power). The horizontal axis (time axis) is common to both the "e" data graph and the "f" data graph.

[0081] As can be seen from the two graphs in the upper part of Figure 3, the power supplied to the motor increases at a nearly constant rate as the motor's rotational speed increases. These relationships are maintained invariantly under the condition that the substrate processing device 1 operates ideally. Therefore, these relationships (invariant relationships) are pre-stored as correlation information in the information analysis device 3.

[0082] In this state, each substrate processing device 1 processes the substrate W, and the actual "e" data and "f" data are collected by the information collection unit 31 of the information analysis device 3. In the middle section of Figure 3, an example of the time-dependent changes in the actually collected "e" data and "f" data is shown in a graph.

[0083] When actual "e" data is collected, the score calculation unit 32 predicts "f" data based on pre-stored correlation information. Similarly, when actual "f" data is collected, the score calculation unit 32 predicts "e" data based on pre-stored correlation information. The lower part of Figure 3 shows a graph illustrating an example of the time-dependent changes in the predicted "e" and "f" data based on the correlation information. In the graph in the lower part of Figure 3, the predicted "e" and "f" data are shown as solid lines, while the actually collected "e" and "f" data are shown as dotted lines.

[0084] When the substrate processing device 1 is operating ideally, the actual "e" data and the predicted "e" data will match or nearly match. Similarly, the actual "f" data and the predicted "f" data will match or nearly match. However, if an abnormality occurs in the substrate processing device 1, there is a high probability that the actual "e" data and the predicted "e" data will diverge. Similarly, there is a high probability that the actual "f" data and the predicted "f" data will diverge. The degree of this divergence is considered to be greater the greater the degree of abnormality in the substrate processing device 1, and smaller the less severe the abnormality in the substrate processing device 1.

[0085] Therefore, in this embodiment, the difference between the data of the processing information actually collected and the data of the processing information predicted is calculated as the degree of deviation. In the example in Figure 3, the score calculation unit 32 calculates the difference between the actual "e" data and the predicted "e" data as the degree of deviation when calculating the degree of deviation at a certain point in time. The score calculation unit 32 also calculates the difference between the actual "f" data and the predicted "f" data as the degree of deviation.

[0086] Figure 4 is a diagram illustrating a specific example of calculating the anomaly score. The score calculation unit 32 calculates the deviation degree for all combinations of the multiple processing information. Figure 4 shows the multiple deviation degrees calculated for all combinations of the multiple processing information. Once all deviation degrees have been calculated, the score calculation unit 32 calculates the sum of the calculated multiple deviation degrees as the anomaly score.

[0087] <4> A series of processes performed in each of the multiple substrate processing devices 1 Figure 5 is a flowchart showing an example of the processing performed in each of the multiple substrate processing devices 1 shown in Figure 1. The series of processes shown in Figure 5 are started when the power to each substrate processing device 1 is turned on and the CPU of the control device 40 executes the first management program.

[0088] First, the control device 40 transmits a plurality of processing information acquired inside the substrate processing device 1 to the information analysis device 3 at predetermined intervals (step S10). The transmission process of the plurality of processing information, which begins in step S10, is repeated at predetermined intervals until the power to the substrate processing device 1 is turned off. When transmitting the plurality of processing information, the control device 40 may store the transmitted plurality of processing information in association with the transmission time.

[0089] Next, the control device 40 determines whether or not it has received an abnormal score from the information analysis device 3 (step S11). If the control device 40 does not receive an abnormal score, it proceeds to the process in step S13, which will be described later. On the other hand, if the control device 40 has received an abnormal score, it stores the received abnormal score in association with the time of its reception (step S12).

[0090] Next, the control device 40 determines whether or not it has received an alarm from the information analysis device 3 (step S13). If the control device 40 has not received an alarm, it proceeds to step S15, which will be described later. On the other hand, if the control device 40 has received an alarm, it outputs an alarm using the display device or audio output device of the substrate processing device 1 (step S14). The processes in steps S11 and S12 described above may be performed after the process in step S14.

[0091] Next, the control device 40 determines whether or not it has received a command to send an investigation request to the management device 4 (step S15). A command to send an investigation request is given to the control device 40, for example, by a maintenance worker operating the control unit of the substrate processing device 1. If the control device 40 does not receive a command to send an investigation request, it proceeds to the process of step S17, which will be described later. On the other hand, if the control device 40 has received a command to send an investigation request, it sends the investigation request and the abnormal score stored at the time closest to the present to the management device 4 (step S16). In step S16, the control device 40 may also send to the management device 4 a plurality of abnormal scores stored up to a predetermined time (for example, several hours) before the present, along with their reception times.

[0092] Next, the control device 40 determines whether or not it has received a work instruction from the management device 4 to perform a specific task on the substrate processing device 1 (step S17). If the control device 40 does not receive a work instruction, it proceeds to step S19, which will be described later. On the other hand, if the control device 40 has received a work instruction, it presents the received work instruction to the maintenance worker, for example, using a display device provided by the substrate processing device 1 (step S18).

[0093] Subsequently, the control device 40 determines whether or not it has received a termination command to stop the operation of the substrate processing device 1 (step S19). If the control device 40 does not receive a termination command, it proceeds to the process in step S11. On the other hand, if the control device 40 has received a termination command, it terminates the series of processes.

[0094] <5> A series of processes performed in the information analysis device 3 Figure 6 is a flowchart showing an example of the process performed in the information analysis device 3 shown in Figure 1. The series of processes shown in Figure 6 are started when the power to the information analysis device 3 is turned on and the CPU of the information analysis device 3 executes the second management program.

[0095] First, the information collection unit 31 in Figure 2 starts collecting multiple processing information transmitted from each of the multiple substrate processing devices 1 (step S20). The collection process of multiple processing information started in step S20 is repeated at predetermined intervals until the power to the information analysis device 3 is turned off.

[0096] Next, the score calculation unit 32 in Figure 2 selects one substrate processing device 1 from among the one or more substrate processing devices 1 from which processing information has been collected in step S20 that has not had an abnormal score calculated (step S21).

[0097] Next, the score calculation unit 32 calculates multiple deviations for the selected substrate processing device 1 from the collected processing information (step S22). The score calculation unit 32 also calculates an abnormal score for the substrate processing device 1 based on the calculated deviations and transmits the calculated abnormal score to the substrate processing device 1 (step S23).

[0098] Next, the alarm transmission unit 34 in Figure 2 determines whether the abnormal score calculated in step S23 exceeds the first threshold (step S24). If the abnormal score does not exceed the first threshold, the alarm transmission unit 34 proceeds to the process in step S26, which will be described later. On the other hand, if the abnormal score exceeds the first threshold, the alarm transmission unit 34 sends an alarm to the substrate processing device 1 (step S25).

[0099] Next, the score calculation unit 32 determines whether or not there are any substrate processing devices 1 for which multiple processing information has been collected and no abnormal score has been calculated (step S26). If there are substrate processing devices 1 for which no abnormal score has been calculated, the score calculation unit 32 proceeds to the process in step S21. On the other hand, if there are no substrate processing devices 1 for which no abnormal score has been calculated, the score calculation unit 32 determines whether or not it has received a termination command to stop the operation of the information analysis device 3 (step S27). If the score calculation unit 32 has not received a termination command, it proceeds to the process in step S21. On the other hand, if the score calculation unit 32 has received a termination command, it terminates the series of processes.

[0100] <6> A series of processes executed in the management device 4 Figure 7 is a flowchart showing an example of the process performed in the management device 4 shown in Figure 1. The series of processes shown in Figure 7 are started when the power to the management device 4 is turned on and the CPU of the management device 4 executes the third management program.

[0101] First, the request receiving unit 41 in Figure 2 determines whether or not it has received a request for investigation from at least one of the multiple substrate processing devices 1 (step S30). If the request receiving unit 41 does not receive a request for investigation, it proceeds to the process in step S33, which will be described later. On the other hand, if the request receiving unit 41 has received a request for investigation from at least one substrate processing device 1, it accepts the received request for investigation (step S31).

[0102] As described above, when the substrate processing device 1 sends an investigation request to the management device 4, the abnormal score is also sent from the substrate processing device 1 to the management device 4 along with the investigation request. As a result, the score acquisition unit 42 in Figure 2 receives and acquires the abnormal score that is sent along with the investigation request (step S32). The investigation request and abnormal score acquired at this time are stored in the memory of the management device 4.

[0103] Next, the score display unit 43 in Figure 2 determines whether or not it has received a command to start investigating the substrate processing apparatus 1 (step S33). The command to start investigating is given to the score display unit 43, for example, by an administrator operating the operation unit 4b of the management device 4. If the score display unit 43 does not receive a command to start investigating, it proceeds to the process in step S30. On the other hand, if the score display unit 43 has received a command to start investigating, it determines whether or not there are multiple substrate processing apparatus 1 to be investigated (step S34).

[0104] If there is only one substrate processing device 1 to be investigated, the score display unit 43 proceeds to the process in step S36 described later. On the other hand, if there are multiple substrate processing devices 1 to be investigated (uninvestigated substrate processing devices 1), the score display unit 43 displays the abnormal score of each substrate processing device 1 to be investigated on the display unit 4a, associating it with the substrate processing device 1 (step S35). The score display unit 43 may also display the abnormal score of only one substrate processing device 1 to be investigated on the display unit 4a. Furthermore, the score display unit 43 may determine the priority order for investigation of multiple uninvestigated substrate processing devices 1 for which an investigation request has been received, based on multiple abnormal scores. In this case, the score display unit 43 may display the determined priority order on the display unit 4a.

[0105] Subsequently, the CPU of the management device 4 performs an investigation process on one of the one or more substrate processing devices 1 that are under investigation, in response to the operation of the control unit 4b by the administrator (step S36). The CPU of the management device 4 also transmits work instructions to the substrate processing device 1 to the maintenance worker based on the results of the investigation process (step S37).

[0106] Next, the CPU of the management device 4 determines whether or not it has received a termination command to stop the operation of the management device 4 (step S38). If the CPU of the management device 4 does not receive a termination command, it proceeds to the process in step S30. On the other hand, if the CPU of the management device 4 receives a termination command, it terminates the series of processes.

[0107] In step S36, the investigation request and abnormal score for the substrate processing device 1 that underwent the investigation process are erased from the memory of the management device 4 upon completion of the investigation process. Alternatively, in step S36, the substrate processing device 1 that underwent the investigation process is removed from the list of candidates for investigation.

[0108] Furthermore, in step S38, if there are any substrate processing devices 1 among the one or more substrate processing devices 1 that have not been investigated, the investigation request for those devices is stored in the memory of the management device 4. Alternatively, in step S38, substrate processing devices 1 that have been investigated but have not yet undergone investigation remain as candidates for investigation.

[0109] <7> Effects of the first embodiment In the management device 4 described above, when there are two or more requests for investigation of two or more substrate processing devices 1, the degree of abnormality of the two or more substrate processing devices 1 that have been requested for investigation is displayed as an abnormality score on the display unit 4a. In this case, the administrator can easily grasp the degree of abnormality of the two or more substrate processing devices 1 that have been requested for investigation based on the displayed abnormality score. Furthermore, the abnormality score is calculated based on the invariant relationship between multiple processing information. Therefore, the administrator can easily and appropriately grasp the priority of investigation for the multiple substrate processing devices 1 that have been requested for investigation in a short amount of time.

[0110] Furthermore, in the above-described substrate processing device management system 2, the abnormal score calculated by the information analysis device 3 is transmitted to the substrate processing device 1 corresponding to that abnormal score. In each substrate processing device 1, the abnormal score corresponding to that device is stored in chronological order. This allows maintenance workers in charge of each substrate processing device 1 to easily check the changes in the abnormal score stored in that device over time.

[0111] 2. Second Embodiment Among the various combinations of processing information described above, some combinations should be given particular importance when determining the degree of abnormality in the substrate processing device 1, while others do not require such importance.

[0112] For example, considering the first abnormal state, the combination of "a. drug concentration" and "b. drug supply amount" is a combination that is highly relevant in calculating the abnormality score in order to avoid the continuation of the first abnormal state. Similarly, considering the second abnormal state, the combination of "c. concentration detection input signal" and "d. concentration detection output signal" is a combination that is highly relevant in calculating the abnormality score in order to avoid the continuation of the second abnormal state. On the other hand, combinations of processing information that do not require consideration of the first to fifth abnormal states are combinations that are less relevant in calculating the abnormality score.

[0113] In the substrate processing apparatus management system 2 according to the first embodiment, the deviation is the difference between the data of the processing information actually collected and the data of the processing information predicted. Therefore, the deviation calculated in the above embodiment does not take into account the multiple types of abnormal states of the substrate processing apparatus 1, which should be given more weight when calculating the abnormality score. Accordingly, the substrate processing apparatus management system according to the second embodiment has the following configuration.

[0114] The differences between the substrate processing apparatus management system according to the second embodiment and the substrate processing apparatus management system 2 shown in Figure 2 according to the first embodiment will be explained. Figure 8 is a diagram illustrating the functional configuration of the substrate processing apparatus management system according to the second embodiment. As shown in Figure 8, in the substrate processing apparatus management system 2 according to this embodiment, the information analysis device 3 includes a weight storage unit 39 as a functional unit, in addition to the components (31 to 34) described in the first embodiment. The weight storage unit 39 is realized by the CPU of the information analysis device 3 according to the second embodiment executing a second management program stored in memory. The weight storage unit 39 may also be realized by hardware such as an electronic circuit.

[0115] The weight storage unit 39 stores multiple weights corresponding to multiple combinations of multiple processing information. Figure 9 is a diagram showing an example of the multiple weights stored in the weight storage unit 39 of Figure 8. In this embodiment, six abnormality levels, from "Level 1" to "Level 6," are set for multiple types of abnormal states that may occur in the substrate processing apparatus 1. The six abnormality levels are arranged in the order of "Level 1," "Level 2," "Level 3," "Level 4," "Level 5," and "Level 6," with the degree of abnormality increasing in that order. In addition, a weight of a magnitude corresponding to the abnormality level of each abnormal state is assigned to combinations of processing information that are highly related to each abnormal state.

[0116] Specifically, the highest level, "Level 6," is set for the fifth abnormal state. Then, a weight of "6" is assigned to the combinations (8 combinations) of "a. chemical concentration," "b. chemical supply amount," "h. chemical supply valve opening," and "i. cleaning fluid discharge valve opening" that are highly related to the fifth abnormal state.

[0117] Furthermore, the second highest level, "Level 5," is set for the first abnormal state. Then, a weight of "5" is assigned to the combinations (two combinations) of "a. Drug concentration" and "b. Drug supply amount" that are highly correlated with the first abnormal state.

[0118] Furthermore, the third abnormal state is assigned the third highest level, "Level 4". Then, a weight of "4" is assigned to the combinations (two combinations) of "e. Motor rotation speed" and "f. Power supplied to the motor" that are highly correlated with the third abnormal state.

[0119] Furthermore, the fourth highest level, "Level 3," is set for the second abnormal state. Then, a weight of "3" is assigned to the combinations (two combinations) of "c. Concentration detection input signal" and "d. Concentration detection output signal" that are highly related to the second abnormal state.

[0120] Furthermore, the fourth abnormal state is assigned the fifth highest level, "Level 2". Then, a weight of "2" is assigned to the four combinations of "a. Drug concentration", "b. Drug supply amount", and "g. Drug additional amount" that are highly related to the fourth abnormal state.

[0121] Furthermore, the lowest "Level 1" is assigned to abnormal states other than the 1st to 5th abnormal states. Then, a weight of "1" is assigned to multiple combinations of unrelated processing information for multiple abnormal states, including the 1st to 5th abnormal states.

[0122] The score calculation unit 32 in Figure 8, similar to the score calculation unit 32 in Figure 2, calculates the difference between the actually collected processing information data and the predicted processing information data for each of the multiple combinations of processing information. Furthermore, the score calculation unit 32 in Figure 8 calculates the deviation degree for each combination of the multiple processing information by multiplying the calculated difference value by the weight assigned to that combination, based on the multiple weights stored in the weight storage unit 39. In addition, once all deviation degrees have been calculated, the score calculation unit 32 in Figure 8 calculates the sum of the calculated deviation degrees as the anomaly score.

[0123] Thus, in the substrate processing apparatus management system 2 according to the second embodiment, the abnormality score is calculated based on a deviation degree that includes a weighting amount corresponding to the abnormality level. As a result, the administrators of multiple substrate processing apparatuses 1 can more appropriately grasp the degree of abnormality of each substrate processing apparatus 1 by referring to the calculated abnormality score.

[0124] 3. Other Embodiments (1) In the substrate processing apparatus management system 2 according to the above embodiment, the information collection unit 31 may repeatedly accumulate and reset the collected processing information at predetermined intervals. Alternatively, the information collection unit 31 may provide the score calculation unit 32 with the processing information accumulated up to just before the reset at predetermined intervals. In this case, the score calculation unit 32 calculates an abnormal score based on the multiple accumulated processing information. In this case, the influence of noise and other factors generated during the collection of each processing information on the abnormal score is reduced.

[0125] (2) In the substrate processing apparatus management system 2 according to the above embodiment, the series of processes performed by the information analysis device 3 may be performed by the management device 4. Alternatively, the series of processes performed by the information analysis device 3 may be performed by any of the multiple substrate processing apparatuses 1. In this case, the information analysis device 3 becomes unnecessary.

[0126] (3) In the substrate processing apparatus management system 2 according to the above embodiment, the information analysis device 3 may receive investigation requests from multiple substrate processing apparatuses 1 and transmit the received investigation requests and the abnormal scores corresponding to those investigation requests to the management device 4.

[0127] (4) In the substrate processing apparatus management system 2 according to the above embodiment, it is not necessary for the information analysis device 3 to transmit abnormal scores to the multiple substrate processing apparatuses 1. In this case, the management device 4 that receives an investigation request from any of the multiple substrate processing apparatuses 1 may obtain the abnormal score of the substrate processing apparatus 1 that received the investigation request from the information analysis device 3.

[0128] (5) In the above embodiment, the multiple substrate processing apparatuses 1A to 1E have the same configuration, but the present invention is not limited thereto. Some or all of the multiple substrate processing apparatuses 1A to 1E may have different configurations. Also, at least one of the multiple substrate processing apparatuses 1A to 1E may be a single-wafer type substrate cleaning apparatus instead of a batch type, or it may have a configuration that performs processing other than cleaning.

[0129] (6) The multiple processing information may include, in addition to or in place of the multiple specific examples described in the above embodiment, at least one physical quantity from among the temperature of the fluid supplied to the substrate W, the temperature of the processing chamber in which the substrate W is housed, the pressure inside the processing chamber in which the substrate W is housed, the pressure of the gas discharged from the processing chamber in which the substrate W is housed, and the moving speed of the substrate being transported by the robot.

[0130] Furthermore, the multiple processing information may include information about at least one of the following: a drive pulse signal that drives the robot that transports the substrate W, and an output signal of a detector provided on the robot that transports the substrate W.

[0131] (7) In the substrate processing apparatus management system 2 according to the above embodiment, the score calculation unit 32 may further calculate the integral value of the abnormal score by repeatedly accumulating and resetting the abnormal score at predetermined intervals. In this case, the alarm transmission unit 34 may determine whether the integral value of the abnormal score exceeds a predetermined second threshold. If the integral value of the abnormal score exceeds the second threshold, the alarm transmission unit 34 may transmit an alarm to the substrate processing apparatus 1 corresponding to the integral value of the abnormal score. In this case, maintenance workers for each substrate processing apparatus 1 can grasp the occurrence of abnormalities in the substrate processing apparatus 1 under their responsibility with greater accuracy.

[0132] 4. Correspondence between each component of the claim and each part of the embodiment The following describes examples of the correspondence between each component of the claims and each element of the embodiments, but the present invention is not limited to the following examples. Various other elements having the configuration or function described in the claims can also be used as each component of the claims.

[0133] In the above embodiment, the substrate processing apparatus 1, 1A to 1E are examples of multiple substrate processing apparatuses, the substrate processing apparatus management system 2 is an example of a substrate processing apparatus management system, the information collection unit 31 is an example of an information collection unit, the score calculation unit 32 is an example of a score calculation unit, and the request reception unit 41 is an example of a request reception unit.

[0134] Furthermore, the score acquisition unit 42 is an example of a score acquisition unit, the score presentation unit 43 is an example of a priority presentation unit, the multiple abnormal scores and investigation priorities of multiple substrate processing devices 1 are examples of priority information, the score transmission unit 33 is an example of a score transmission unit, the alarm transmission unit 34 is an example of an alarm transmission unit, and the information analysis device 3 is an example of an information analysis device. [Explanation of symbols]

[0135] 1,1A~1E…Substrate processing device, 2…Substrate processing device management system, 3…Information analysis device, 4…Management device, 4a…Display unit, 4b…Operation unit, 11…Processing tank, 12…Substrate holding unit, 13…Lifting device, 14…Cleaning solution generation device, 14a:Storage tank, 15…Liquid supply pipe, 16…Pump, 17,19…Valves, 18…Liquid discharge pipe, 20…Concentration meter, 30…Transport robot, 31…Information collection unit, 32…Score calculation unit, 33…Score transmission unit, 34…Alarm transmission unit, 39…Weight memory unit, 40…Control device, 41…Request reception unit, 42…Score acquisition unit, 43…Score presentation unit, 91…Chemical solution supply pipe, 92…Pure water supply pipe, 93…Additional chemical solution supply pipe, 94…Drainage pipe, W…Substrate

Claims

1. A substrate processing apparatus management system used to manage a plurality of substrate processing apparatuses, an information collecting unit that collects a plurality of pieces of processing information indicating operations or states related to substrate processing from each of the substrate processing apparatuses; a score calculation unit that calculates, for each substrate processing apparatus, a degree of abnormality of the substrate processing apparatus as an abnormality score based on the invariant relationship between the plurality of pieces of processing information and the plurality of pieces of processing information collected from the substrate processing apparatus; a request receiving unit that receives an investigation request for the abnormality from each substrate processing apparatus; a score acquiring unit that acquires two or more abnormality scores calculated for two or more substrate processing apparatuses that have sent investigation requests to the request receiving unit; a priority presentation unit that presents priority information regarding the priority order in which the two or more investigation requests should be responded to based on the two or more abnormality scores acquired by the score acquisition unit.

2. the priority order information includes two or more abnormality scores acquired by the score acquisition unit, 2 . The substrate processing apparatus management system according to claim 1 , wherein the priority order presenting unit presents the two or more abnormality scores acquired by the score acquiring unit in association with the two or more substrate processing apparatuses, respectively.

3. 3. The substrate processing apparatus management system according to claim 1, further comprising a score transmitting unit that transmits the abnormality score calculated by the score calculating unit to the substrate processing apparatus corresponding to the abnormality score.

4. A substrate processing apparatus management system as described in any one of claims 1 to 3, further comprising an alarm sending unit that determines whether the abnormality score calculated for each substrate processing apparatus exceeds a predetermined threshold value, and sends an alarm to the substrate processing apparatus corresponding to the abnormality score if the abnormality score exceeds the threshold value.

5. the information collecting unit repeatedly accumulates and resets the plurality of pieces of processing information collected every time a certain period of time elapses; A substrate processing apparatus management system as described in any one of claims 1 to 4, wherein the score calculation unit calculates, for each substrate processing apparatus, the degree of abnormality of the substrate processing apparatus as the abnormality score based on an invariant relationship between the multiple pieces of processing information and multiple pieces of processing information generated by the substrate processing apparatus and accumulated by the information collection unit.

6. A plurality of combinations of two different pieces of processing information are determined for the plurality of pieces of processing information; each combination includes first processing information and second processing information; The score calculation unit for each combination, based on the second processing information collected under predetermined conditions, the first processing information predicted under the predetermined conditions is generated as first predicted processing information, and a degree of deviation between the generated first predicted processing information and the first processing information actually collected by the data collecting unit is calculated as a first deviation degree; for each combination, based on the first processing information collected under the predetermined conditions, the second processing information predicted under the predetermined conditions is generated as second predicted processing information, and a degree of deviation between the generated second predicted processing information and the second processing information actually collected by the data collecting unit is calculated as a second deviation degree; 6. The substrate processing apparatus management system according to claim 1, wherein the abnormality score is calculated based on a plurality of first deviation degrees and a plurality of second deviation degrees calculated for each of the plurality of combinations.

7. The substrate processing apparatus management system according to claim 6 , wherein the score calculation unit calculates, as the abnormality score, a sum of the plurality of first deviation degrees and the plurality of second deviation degrees calculated for the plurality of combinations.

8. a predetermined weight is assigned to each of the plurality of combinations according to a relationship between the combination and a plurality of types of abnormal states of the substrate processing apparatus; 8. The substrate processing apparatus management system according to claim 6, wherein the score calculation unit calculates the plurality of first deviation degrees and the plurality of second deviation degrees based on the plurality of combinations and the plurality of weights.

9. 9. The substrate processing apparatus management system according to claim 1, wherein the plurality of processing information includes at least one physical quantity selected from the group consisting of a supply amount of fluid supplied to the substrate, a temperature of the fluid supplied to the substrate, a concentration of the processing liquid supplied to the substrate, a temperature inside the processing chamber in which the substrate is accommodated, a pressure inside the processing chamber in which the substrate is accommodated, a pressure of gas exhausted from the processing chamber in which the substrate is accommodated, and a moving speed of the substrate transported by a robot.

10. A substrate processing apparatus management system as described in any one of claims 1 to 9, wherein the plurality of processing information includes information regarding at least one of a drive pulse signal that drives a robot that transports a substrate, an output signal of a detector provided on the robot that transports the substrate, and an opening / closing signal given to a control valve.

11. Each substrate processing apparatus is a substrate cleaning apparatus that cleans a substrate using a cleaning liquid, A substrate processing apparatus management system according to any one of claims 1 to 10, wherein the plurality of processing information includes at least one of the amount of cleaning liquid supplied to the substrate, the temperature of the cleaning liquid supplied to the substrate, and the concentration of the cleaning liquid supplied to the substrate.

12. 1. A substrate processing apparatus management method used to manage a plurality of substrate processing apparatuses, comprising: collecting a plurality of pieces of processing information from each of the substrate processing apparatus indicative of operations or conditions related to processing of the substrate; calculating, for each substrate processing apparatus, a degree of abnormality of the substrate processing apparatus as an abnormality score based on the invariant relationships among the plurality of pieces of processing information and the plurality of pieces of processing information collected from the substrate processing apparatus; receiving a request for investigation of the abnormality from each substrate processing apparatus; acquiring two or more abnormality scores calculated for the two or more substrate processing apparatuses that have sent the investigation requests; and presenting priority information regarding the priorities for responding to the two or more investigation requests based on the two or more abnormality scores obtained by the obtaining step.

13. A substrate processing apparatus management program that causes a computer to execute a process for managing a plurality of substrate processing apparatuses using an information analysis apparatus, The information analysis device an information collecting unit that collects a plurality of pieces of processing information indicating operations or states related to substrate processing from each of the substrate processing apparatuses; a score calculation unit that calculates, for each substrate processing apparatus, a degree of abnormality of the substrate processing apparatus as an abnormality score based on the invariant relationship between the plurality of pieces of processing information and the plurality of pieces of processing information collected from the substrate processing apparatus; The process of managing the plurality of substrate processing apparatuses includes: A process of receiving an investigation request regarding an abnormality from each substrate processing apparatus; A process of acquiring two or more abnormality scores calculated for two or more substrate processing apparatuses that have sent an investigation request; and a process of presenting priority information regarding priorities for responding to the two or more investigation requests based on the two or more abnormality scores obtained by the obtaining process.

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