Composition

Abstract

An alkali-soluble material-containing composition, a cured film, and a method for producing the same.

Description

[Technical field]

[0001] The present invention relates to an alkali-soluble material-containing composition. The present invention also relates to a method for producing a cured film using the composition, a cured film formed from the composition, a photoconversion device including the cured film, and a display device including the photoconversion device. [Background technology]

[0002] The black matrix for color filters used in color display devices is formed by mixing a light-shielding black pigment such as carbon black with an alkali-soluble resin to form a resist composition, which is then applied, exposed, developed, and patterned. For example, in liquid crystal display elements, the black matrix is ​​used to prevent light leakage from between non-switching pixels and maintain high contrast. In addition, when exposed to light, amorphous silicon and oxide semiconductors generate leakage current due to photoexcitation, so the black matrix layer blocks light from reaching the thin film transistor portion, thereby suppressing leakage current (Patent Document 1). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] JP 2018-203599 A Summary of the Invention [Problem to be solved by the invention]

[0004] Surprisingly, the inventors have found that there are one or more significant problems for which improvement is desired, as listed below. To provide a composition capable of forming a cured film having an upper portion exhibiting oil repellency and a lower portion exhibiting oil philicity; Providing a patternable composition to create banks that are oleophobic at the top of the bank and oleophilic at the bottom of the bank; providing a patternable composition that, after bank formation, is preferably oleophobic at the top of the bank and oleophilic at the bottom of the bank and at the side of the bank at the opening; To provide a bank that is oleophilic to ink at the bank opening, preferably capable of filling the bank opening with ink without gaps, and that is oleophobic to ink at the bank top, preferably capable of suitably repelling ink at the bank top, and / or to provide a patternable composition for forming said bank, wherein said ink is preferably a quantum dot-containing ink, more preferably said ink is an acrylic monomer-containing ink, and even more preferably said ink is free of solvent; To provide a composition that can be cured and patterned at lower temperatures than conventional compositions; providing a composition comprising a pigment that does not adversely affect patterning, preferably said pigment being a black pigment; Providing compositions that can be patterned with high resolution; To provide a composition capable of achieving a thicker film as a partition material for a display device; To provide a composition containing a black pigment, which can preferably achieve a thicker film as a partition material for a display device; To provide a composition which can be developed with a low-concentration alkaline developer other than an organic developer, taking into consideration the environmental load. [Means for solving the problem]

[0005] As a result of extensive investigation, the present inventors have (I) Alkali-soluble material (II) a first surfactant; and (III) a second surfactant different from the first surfactant; and We have found a composition comprising:

[0006] In another aspect, the present invention provides a method for producing a composition comprising: applying the composition to a substrate to form a coating; Heating the coating film; The present invention relates to a method for producing a cured film comprising the steps of:

[0007] In another aspect, the present invention relates to a cured film produced or capable of being produced by the above method.

[0008] In another aspect, the present invention provides a method for producing a composition comprising: A polymer (A) derived from an alkali-soluble material; A first surfactant; a second surfactant different from the first surfactant; The present invention relates to a cured film comprising the above-mentioned compound.

[0009] In another aspect, the present invention relates to a photoconversion device comprising the above-mentioned cured film.

[0010] In another aspect, the present invention relates to a display device comprising the above-mentioned cured film or the above-mentioned photoconversion device. Effect of the Invention

[0011] According to the present invention, one or more of the following advantages can be achieved. To provide a composition capable of forming a cured film having an upper portion exhibiting oil repellency and a lower portion exhibiting oil philicity; Providing a patternable composition to create banks that are oleophobic at the top of the bank and oleophilic at the bottom of the bank; providing a patternable composition that, after bank formation, is preferably oleophobic at the top of the bank and oleophilic at the bottom of the bank and at the side of the bank at the opening; To provide a bank that is oleophilic to ink at the bank opening, preferably such that the bank opening can be filled with ink without gaps, and that is oleophobic to ink at the bank top, preferably such that the bank top can suitably repel ink, and / or to provide a patternable composition for forming said bank, wherein said ink is preferably a quantum dot-containing ink, more preferably said ink is an acrylic monomer-containing ink, and even more preferably said ink is free of solvent; To provide a composition that can be cured and patterned at lower temperatures than conventional compositions; Providing a composition containing a pigment that does not adversely affect patterning, preferably the pigment is a black pigment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0012] Further advantages of the present invention will become apparent from the following detailed description, although it should be understood that the above summary and the following details are intended to be illustrative of the invention and are not intended to limit the invention as claimed.

[0013] [Definition] In this specification, unless otherwise specified, the symbols, units, abbreviations and terms have the following meanings. In this specification, unless otherwise specified, the singular includes the plural, and "a" or "the" means "at least one." In this specification, unless otherwise specified, a concept may be expressed by a plurality of kinds, and when an amount (e.g., mass % or mole %) is described, the amount means the sum of the plurality of kinds. "And / or" includes all combinations of elements and also includes the use of a single element.

[0014] In the present specification, when a numerical range is indicated using ~ or -, it includes both endpoints and the units are the same. For example, 5 to 25 mol % means 5 mol % or more and 25 mol % or less.

[0015] In this specification, (meth)acrylate means, in accordance with common general knowledge, an acrylate, a methacrylate, or a mixture of an acrylate and a methacrylate. In this specification, a monomer refers to a monomeric unit that can form a polymer (including an oligomer) by reacting with another monomer. In this specification, the polymer may be in the form of an oligomer, and the mass average molecular weight of the polymer is not particularly limited, but is preferably 1,000 to 100,000, and more preferably 2,000 to 30,000. Here, the mass average molecular weight is the styrene-equivalent mass average molecular weight determined by gel permeation chromatography.

[0016] In this specification, alkyl means a group in which one arbitrary hydrogen has been removed from a linear or branched saturated hydrocarbon, and includes linear alkyl and branched alkyl, and cycloalkyl means a group in which one hydrogen has been removed from a saturated hydrocarbon containing a cyclic structure, and optionally includes a linear or branched alkyl in the cyclic structure as a side chain.

[0017] In this specification, aryl refers to a group obtained by removing one arbitrary hydrogen from an aromatic hydrocarbon, alkylene refers to a group obtained by removing two arbitrary hydrogens from a linear or branched saturated hydrocarbon, and arylene refers to a hydrocarbon group obtained by removing two arbitrary hydrogens from an aromatic hydrocarbon.

[0018] In this specification, "C x~y ", "C x ~C y " and "C x " refers to the number of carbons in a molecule or substituent. For example, C 1~6 Alkyl refers to an alkyl having 1 to 6 carbon atoms (methyl, ethyl, propyl, butyl, pentyl, hexyl, etc.). In addition, as used herein, fluoroalkyl refers to an alkyl group in which one or more hydrogen atoms have been replaced with fluorine, and fluoroaryl refers to an aryl group in which one or more hydrogen atoms have been replaced with fluorine.

[0019] In the present specification, when a polymer has multiple types of repeating units, these repeating units are copolymerized. The copolymerization may be alternating copolymerization, random copolymerization, block copolymerization, graft copolymerization, or a mixture thereof. In this specification, % means % by mass, and ratio means mass ratio.

[0020] In this specification, the unit of temperature is Celsius. For example, 20 degrees means 20 degrees Celsius. The additive refers to a compound having that function (for example, in the case of a base generator, it is a compound that generates a base). The compound may be dissolved or dispersed in a solvent and added to the composition. In one embodiment of the present invention, such a solvent is preferably contained in the composition of the present invention as the solvent (VI) or another component.

[0021] <Composition> The composition according to the invention comprises (I) an alkali-soluble material; (II) a first surfactant; and (III) a second surfactant different from the first surfactant; and The present invention relates to a method for producing a semiconductor device comprising the steps of: In one aspect of the invention, the invention is a method for producing a composition comprising the steps of: (I) an alkali-soluble material as described above; (II) a first surfactant; and (III) a second surfactant different from the first surfactant; In another embodiment of the present invention, the present invention comprises the above-mentioned (I) alkali-soluble material, (II) a first surfactant, and (III) a second surfactant different from the first surfactant.

[0022] The composition according to the present invention is preferably a film-forming composition, more preferably a cured film-forming composition. The composition according to the present invention is preferably a photosensitive composition, more preferably a negative-type photosensitive composition. Preferably, the composition according to the invention comprises: (IV) a colorant (preferably an organic and / or inorganic colorant, more preferably an organic and / or inorganic black colorant); (V) a polymerization initiator, and / or (VI) Solvent The composition further comprises: The composition according to the present invention exerts a better effect when a film having a thickness of 100 μm or less is formed, but is preferably a negative type photosensitive composition for thick films, which exerts a further effect when a thick film is formed.

[0023] (I) Alkali-soluble materials The composition according to the present invention comprises an alkali-soluble material. The alkali-soluble material is an alkali-soluble monomer, an alkali-soluble polymer or a mixture thereof. The alkali-soluble material preferably has a partial structure having an acid group. The acid group is preferably an acid group having an acid dissociation constant (pKa) of 7 or less, more preferably -OH, -COOH, -SO3H, -OSO3H, -PO3H2, -OPO3H2, -CONHSO2, -SON2NHSO2-, and particularly preferably -COOH. By having such an acid group, preferably a carboxy group, the solubility of the alkali-soluble material in a low-concentration developer can be effectively improved.

[0024] When the alkali-soluble material is an alkali-soluble monomer, the alkali-soluble monomer is preferably a compound containing one or more (meth)acryloyloxy groups, more preferably two or more. Preferably, the alkali-soluble material is a compound containing two or more (meth)acryloyloxy groups and / or an alkali-soluble polymer. More preferably, the alkali-soluble material comprises a compound containing two or more (meth)acryloyloxy groups, and even more preferably, the alkali-soluble material further comprises an alkali-soluble polymer.

[0025] Compounds containing two or more (meth)acryloyloxy groups A compound containing two or more (meth)acryloyloxy groups may be referred to as a (meth)acryloyloxy group-containing compound for the sake of simplicity. Here, the (meth)acryloyloxy group is a general term for an acryloyloxy group and a methacryloyloxy group. This compound is a compound that can form a crosslinked structure by reacting with an acryloyl group-containing compound or an alkali-soluble polymer. Here, in order to form a crosslinked structure, a compound containing two or more reactive groups, acryloyloxy groups or methacryloyloxy groups, is necessary, and it is preferable to contain three or more acryloyloxy groups or methacryloyloxy groups in order to form a higher-order crosslinked structure.

[0026] As such a compound containing two or more (meth)acryloyloxy groups, an ester obtained by reacting (α) a polyol compound having two or more hydroxyl groups with (β) two or more (meth)acrylic acids is preferably used. The (α) polyol compound may be a compound having a basic skeleton of a saturated or unsaturated aliphatic hydrocarbon, an aromatic hydrocarbon, a heterocyclic hydrocarbon, a primary, secondary or tertiary amine, an ether, etc., and having two or more hydroxyl groups as a substituent. The polyol compound may contain other substituents, such as a carboxy group, a carbonyl group, an amino group, an ether bond, a thiol group, a thioether bond, etc., within the scope of not impairing the effects of the present invention.

[0027] Preferred polyol compounds include alkyl polyols, aryl polyols, polyalkanolamines, cyanuric acid, and dipentaerythritol. Here, when the (α) polyol compound has three or more hydroxyl groups, it is not necessary that all of the hydroxyl groups react with (meth)acrylic acid, and they may be partially esterified. That is, the ester may have unreacted hydroxyl groups. Examples of such esters include tris(2-acryloxyethyl)isocyanurate, dipentaerythritol hexa(meth)acrylate, tripentaerythritol octa(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, trimethylolpropane triacrylate, polytetramethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, ditrimethylolpropane tetraacrylate, tricyclodecane dimethanol diacrylate, 1,9-nonanediol diacrylate, 1,6-hexanediol diacrylate, and 1,10-decanediol diacrylate. Among these, tris(2-acryloxyethyl)isocyanurate and dipentaerythritol hexaacrylate are preferred from the viewpoint of reactivity and the number of crosslinkable groups. In addition, in order to adjust the shape of the pattern to be formed, two or more of these compounds can be combined. Specifically, it is preferred to combine a compound containing three (meth)acryloyloxy groups with a compound containing two (meth)acryloyloxy groups.

[0028] From the viewpoint of reactivity, it is preferable that such a compound has a smaller molecule than the alkali-soluble polymer, and therefore the molecular weight is preferably 2,000 or less, and more preferably 1,500 or less.

[0029] The content of the (meth)acryloyloxy group-containing compound is adjusted depending on the type of polymer or acryloyloxy group-containing compound used, and is preferably 5 to 99.9 mass%, more preferably 30 to 70 mass%, based on the total mass of the composition excluding the solvent. When combined with an alkali-soluble polymer, it is preferably 5 to 1000 mass%, more preferably 10 to 800 mass%, based on the total mass of the alkali-soluble polymer, from the viewpoint of compatibility with the alkali-soluble polymer. When a low-concentration developer is used, it is preferably 30 to 800 mass%. In addition, these (meth)acryloyloxy group-containing compounds may be used alone or in combination of two or more kinds.

[0030] Alkali-soluble polymer It is desirable to select an alkali-soluble polymer that is soluble in an organic solvent such as propylene glycol monomethyl ether acetate (hereinafter referred to as PGMEA) and is water-soluble, and that dissolves in an alkali developer before exposure. The alkali-soluble polymer preferably has a structural portion having an acid group, and more preferably is a polymer obtained by copolymerizing a structural portion having an acid group with a structural portion not having an acid group. Here, the acid group is preferably an acid group having an acid dissociation index (pKa) of 7 or less, more preferably -OH, -COOH, -SO3H, -OSO3H, -PO3H2, -OPO3H2, -CONHSO2, -SON2NHSO2-, and particularly preferably -COOH. By having such an acid group, preferably a carboxy group, the solubility of the alkali-soluble polymer in a low-concentration developer can be effectively improved.

[0031] The alkali-soluble polymer used in the present invention (which may be in the form of an oligomer) preferably comprises an acryloyl group. Preferably, the alkali-soluble polymer is a (meth)acrylic polymer, a siloxane polymer, a siloxane (meth)acrylic polymer, or a mixture thereof. The alkali-soluble polymer used in the present invention is not particularly limited, but is preferably selected from polysiloxanes and (meth)acrylic polymers that contain siloxane bonds in the main skeleton. Among these, it is more preferable to use a (meth)acrylic polymer from the viewpoint of being suitable for use in low-temperature processes. More preferably, it is an acrylic polymer.

[0032] The alkali dissolution rate of an alkali-soluble polymer is measured and calculated as follows, using a 0.03 mass % aqueous solution of KOH (potassium hydroxide) as the alkaline solution. The alkali-soluble polymer is diluted to 35% by mass in PGMEA and dissolved by stirring at room temperature for 1 hour. In a clean room with a temperature of 23.0±0.5°C and humidity of 50±5.0%, 1 cc of the prepared alkali-soluble polymer solution is dropped onto the center of a 4-inch, 525 μm-thick silicon wafer using a pipette, and spin-coated to a thickness of 2±0.1 μm. The solvent is then removed by heating on a hot plate at 100°C for 90 seconds. The thickness of the coating is measured using a spectroscopic ellipsometer (JA Woollam). Next, the silicon wafer with this film was gently immersed in a 6-inch glass petri dish containing 100 ml of 0.03% by mass KOH aqueous solution adjusted to 23.0±0.1°C, and then left to stand, and the time until the coating film disappeared was measured. The dissolution rate was calculated by dividing the time until the film disappeared at a portion 10 mm inside from the edge of the wafer. If the dissolution rate is significantly slow, the wafer was immersed in the KOH aqueous solution for a certain period of time, and the film thickness was measured, and the dissolution rate was calculated by dividing the change in film thickness before and after immersion by the immersion time. The above measurement method was performed five times, and the average of the obtained values ​​was taken as the dissolution rate of the alkali-soluble polymer. Preferably, the alkali-soluble polymer is one in which, in the measurement and calculation of the alkali dissolution rate, the coating film at a portion 10 mm inward from the wafer edge dissolves and disappears in a 0.03 mass % KOH aqueous solution within 10 minutes.

[0033] (Polysiloxane) The alkali-soluble polymer may contain a siloxane (Si-O-Si) bond as the main skeleton. In the present invention, a polymer containing a siloxane bond as the main skeleton is called a polysiloxane. The skeleton structure of polysiloxane can be classified into a silicone skeleton (the number of oxygen atoms bonded to a silicon atom is 2), a silsesquioxane skeleton (the number of oxygen atoms bonded to a silicon atom is 3), and a silica skeleton (the number of oxygen atoms bonded to a silicon atom is 4) according to the number of oxygen atoms bonded to the silicon atom. In the present invention, any of these may be used. The polysiloxane molecule may contain a combination of a plurality of these skeleton structures. Preferably, the polysiloxane used in the present invention contains a silsesquioxane skeleton. Polysiloxane generally has a silanol group or an alkoxysilyl group. Such silanol group and alkoxysilyl group refer to hydroxyl group and alkoxy group that are directly bonded to silicon that forms siloxane skeleton. Here, silanol group and alkoxysilyl group have the effect of promoting the curing reaction when forming a cured film using the composition, and are also considered to contribute to the reaction with silicon-containing compound described later. Therefore, it is preferable that polysiloxane has these groups.

[0034] (acrylic polymer) The acrylic polymer suitable for use in the present invention can be selected from commonly used acrylic polymers, such as polyacrylic acid, polymethacrylic acid, alkyl polyacrylate, alkyl polymethacrylate, etc. As an example, the acrylic polymer used in the present invention preferably contains a repeating unit containing an acryloyl group, and preferably, the acrylic polymer has a structural portion having an acid group. Here, the acid group is preferably an acid group having an acid dissociation index (pKa) of 7 or less, more preferably -OH, -COOH, -SO3H, -OSO3H, -PO3H2, -OPO3H2, -CONHSO2, -SON2NHSO2-, and particularly preferably -COOH. By having such an acid group, preferably a carboxy group, the solubility of the alkali-soluble polymer in a low-concentration developer can be effectively improved.

[0035] The polymerized unit containing an acid group (e.g., a carboxy group, etc.) is not particularly limited as long as it is a polymerized unit containing an acid group in a side chain, but is preferably a polymerized unit derived from an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof.

[0036] The polymer unit containing an alkoxysilyl group may be any polymer unit containing an alkoxysilyl group in a side chain, and is preferably a polymer unit derived from a monomer represented by the following formula (B). X B -(CH2) a -Si(OR B ) b (CH3) 3-b (B) In the formula, X B is a vinyl group, a styryl group, or a (meth)acryloyloxy group, and R B is a methyl group or an ethyl group, a is an integer of 0 to 3, and b is an integer of 1 to 3.

[0037] The polymer preferably contains a polymer unit containing a hydroxyl group, which is derived from a hydroxyl-containing unsaturated monomer.

[0038] The weight average molecular weight of the alkali-soluble polymer, preferably the acrylic polymer, according to the present invention is not particularly limited, but is preferably 1,000 to 40,000, more preferably 2,000 to 30,000. Here, the weight average molecular weight is the styrene-equivalent weight average molecular weight determined by gel permeation chromatography. The number of acid groups is generally 40 to 190 mgKOH / g, more preferably 60 to 150 mgKOH / g, in terms of solid content acid value, from the viewpoint of enabling development with a low-concentration alkaline developer and achieving both reactivity and storage stability.

[0039] In addition, when the composition according to the present invention is a photosensitive composition, a cured film is formed through coating, exposure, and development on a substrate. At this time, it is necessary that the solubility of the exposed and unexposed parts differs, and the coating film in the unexposed parts should have a certain level of solubility in a developer. For example, if the dissolution rate of the coating film after prebaking in a 2.38 mass % KOH aqueous solution (hereinafter, sometimes referred to as alkaline dissolution rate or ADR; details will be described later) is 50 Å / sec or more, it is considered possible to form a pattern by exposure-development. However, since the solubility required varies depending on the average film thickness of the cured film to be formed and the development conditions, an alkali-soluble polymer should be appropriately selected according to the development conditions. Although this will vary depending on the type and amount of photosensitizer and silanol condensation catalyst contained in the composition, for example, if the average film thickness is 0.1 to 100 μm (1,000 to 1,000,000 Å), the dissolution rate in a 2.38 mass % KOH aqueous solution is preferably 50 to 20,000 Å / sec, and more preferably 100 to 10,000 Å / sec.

[0040] The polysiloxane and acrylic polymer used in the present invention are not particularly limited, but for example, the polysiloxanes, acrylic polymers, etc. described in WO 2021 / 018927 can be suitably used. The alkali-soluble polymer may be one type or a mixture of two or more types. A combination of an acrylic polymer and a polysiloxane, two or more types of acrylic polymers, two or more types of polysiloxanes, etc. may also be used. In a preferred embodiment, from the viewpoint of forming a film and forming a cured film at low temperature, the alkali-soluble polymer used in the present invention is a mixture of one or more acrylic polymers, more preferably two acrylic polymers. More preferably, the alkali-soluble polymer is selected from two acrylic polymers that are soluble in an organic solvent such as PGMEA, are water-soluble, and are dissolved in an alkaline developer before exposure, and more preferably, both of the two acrylic polymers have a structural portion having an acid group, and are polymers obtained by copolymerizing a structural portion having an acid group and a structural portion not having an acid group. Here, the acid group is preferably an acid group having an acid dissociation index (pKa) of 7 or less, more preferably -OH, -COOH, -SO3H, -OSO3H, -PO3H2, -OPO3H2, -CONHSO2, -SO2NHSO2- from the viewpoint of effectively improving the solubility of the alkali-soluble polymer in a low-concentration developer, and particularly preferably -COOH.

[0041] The total content of the alkali-soluble materials (I) in the composition is preferably 5 to 99.9 mass %, and more preferably 70 to 90 mass %, based on the total mass of the composition excluding the solvent.

[0042] (II) First Surfactant The composition according to the present invention comprises a first surfactant (II). In the present invention, the first surfactant (II) is not particularly limited as long as it realizes at least one of the effects of the present invention, but from the viewpoint of enabling the provision of a composition in which at least the lower part of the film to be formed exhibits lipophilicity, preferably at least the bank bottom or the bank bottom and the bank side part of the opening, and enabling the provision of a patternable composition, the first surfactant (II) is preferably a lipophilic surfactant, more preferably a fluorine-free surfactant, and more preferably a fluorine-free nonionic surfactant, anionic surfactant, amphoteric surfactant, or a mixture thereof. In a preferred embodiment of the present invention, from the viewpoint of providing a composition capable of producing a bank that exhibits more effective oleophilicity to QD ink at least at the bottom of the bank, or at the bottom of the bank and the side of the bank at the opening, preferably the (II) first surfactant is a nonionic surfactant that does not contain fluorine, and more preferably the (II) first surfactant is a polyoxyethylene alkyl ether such as polyoxyethylene lauryl ether, polyoxyethylene oleyl ether, or polyoxyethylene cetyl ether, a polyoxyethylene fatty acid diester, a polyoxyethylene fatty acid monoester, a polyoxyethylene polyoxypropylene block polymer, an acetylene glycol derivative such as acetylene alcohol, acetylene glycol, a polyethoxylate of acetylene alcohol, or a polyethoxylate of acetylene glycol, an organic siloxane surfactant, a silicon-based surfactant, or a mixture thereof. The oleophilic surfactant, for example a fluorine-free surfactant, can be suitably selected from known available materials. As such known and available materials, for example, silicone surfactants manufactured by DIC Corporation, SOILNON AF-800 (Nicca Chemical), Glide ZG400 (Evonik Industries), AKS-10 (Shin-Etsu Chemical), etc. can be suitably used.

[0043] Preferably, in the present invention, the term "bank" refers to a partition or black matrix arranged between each display pixel of an optical display device and dividing the display pixels, such as those described in JP 2021-075660 A, WO 2017 / 138607 A, and JP 2018-203599 A.

[0044] (III) A second surfactant The composition according to the present invention comprises a second surfactant (III). In the present invention, the second surfactant (III) is not particularly limited as long as it realizes at least one of the effects of the present invention. However, from the viewpoint of providing a composition in which the upper part of the film to be formed exhibits oil repellency, preferably a patternable composition exhibiting oil repellency at the top of the bank, the second surfactant (III) is preferably an oil repellent surfactant, more preferably a fluorine-based surfactant or a surfactant containing fluorine, and from the viewpoint of better oil repellency, a surfactant containing fluorine is even more preferable. Even more preferably, it is a nonionic surfactant, an anionic surfactant, an amphoteric surfactant, or a mixture thereof containing fluorine. The surfactant exhibiting oil repellency, for example, a surfactant containing fluorine, can be suitably selected from known available materials. As such known available materials, for example, fluorine-containing surfactants manufactured by Daikin Industries, Ltd. and Surflon (AGC Seimi Chemical Co., Ltd.), a surfactant having a perfluoroalkyl group, can be suitably used. In one preferred embodiment of the present invention, from the viewpoint of providing a composition capable of producing a bank that exhibits more effective oil repellency against QD ink at the top of the bank, the second surfactant (III) is preferably a fluorine-containing nonionic surfactant.

[0045] Without being bound by theory, from the viewpoint of providing a composition capable of producing a bank that exhibits more effective oil repellency against QD ink at the top of the bank, the molecular weight of the (III) second surfactant may preferably be lower than that of the (II) first surfactant and the (I) alkali-soluble polymer.

[0046] (II) a first surfactant and (III) a second surfactant In the present invention, the composition according to the present invention comprises a (II) first surfactant and a (III) second surfactant. The (II) first surfactant and the (III) second surfactant are not particularly limited as long as they achieve at least one of the effects of the present invention. However, from the viewpoint of providing a patternable composition that exhibits lipophilicity at least at the bottom of the bank or at the bottom of the bank and the side of the bank at the opening, and that exhibits oil repellency at the top of the bank, the (II) first surfactant is preferably a surfactant that does not contain fluorine, and is preferably a fluorine-containing nonionic surfactant, anionic surfactant, amphoteric surfactant, or a mixture thereof, and the (III) second surfactant is a surfactant that contains fluorine, and is preferably a fluorine-containing nonionic surfactant, anionic surfactant, amphoteric surfactant, or a mixture thereof.

[0047] Without being bound by theory, it is believed that by using a combination of a second surfactant exhibiting oil repellency and a first surfactant exhibiting lipophilicity, a distribution of the surfactants occurs in the film thickness direction after the composition is applied or baked, such that the second surfactant exhibiting oil repellency is distributed in greater amounts near the film surface, and the first surfactant exhibiting lipophilicity is relatively more distributed outside the film surface, for example, near the substrate of the film. It is believed that by optionally exposing and developing this film and then curing it, the upper part (the top of the bank when the bank is formed) becomes oil-repellent and the lower part (the bottom of the bank when the bank is formed) becomes lipophilic. Here, in one preferred embodiment, from the viewpoint of providing a composition capable of producing a bank that exhibits more effective oleophilicity to QD ink at least at the bottom of the bank or at the bottom of the bank and the side portions of the bank at the opening, and more effective oleophobicity to QD ink at the top of the bank, preferably (II) the first surfactant is a fluorine-free nonionic surfactant, and more preferably (II) the first surfactant is a polyoxyethylene alkyl ether such as polyoxyethylene lauryl ether, polyoxyethylene oleyl ether, polyoxyethylene cetyl ether, or a polyoxyethylene fatty acid diester, polyoxyethylene fatty acid monoester, polyoxyethylene polyoxypropylene block polymer, acetylene alcohol, acetylene glycol, a polyethoxylate of acetylene alcohol, an acetylene glycol derivative such as polyethoxylate of acetylene glycol, an organic siloxane surfactant, a silicone-based surfactant, or a mixture thereof. Preferably, the second surfactant (III) is a fluorine-containing nonionic surfactant.

[0048] In a preferred embodiment of the present invention, from the viewpoint of providing a composition capable of forming a bank that exhibits more effective oleophilicity to QD ink at the bank bottom, or at the bank bottom and the bank side of the opening, and more effective oleophobicity to QD ink at the bank top, the mass ratio of the (II) first surfactant to the (III) second surfactant ((II) first surfactant:(III) second surfactant) is preferably 1:1000 to 99:10, more preferably 1:100 to 5:1, even more preferably 1:50 to 2:1, and most preferably 1:20 to 1:1. By keeping the ratio within the above range, it is possible to provide a composition capable of forming a bank that exhibits more effective oleophilicity to QD ink at the bank bottom, or at the bank bottom and the bank side of the opening, and more effectively oleophobicity to QD ink at the bank top.

[0049] In a preferred embodiment of the present invention, from the viewpoint of providing a composition capable of producing a bank that exhibits more effective oleophilicity to QD ink at the bottom of the bank, or at the bottom of the bank and the side of the bank at the opening, and more effective oleophobicity to QD ink at the top of the bank, the content of the (II) first surfactant is preferably 0.001 to 5 mass%, more preferably 0.01 to 1 mass%, even more preferably 0.02 to 0.5 mass%, and most preferably 0.03 to 0.3 mass%, based on the total mass of the alkali-soluble material, and the content of the (III) second surfactant is preferably 0.05 to 10 mass%, more preferably 0.1 to 5 mass%, even more preferably 0.2 to 1 mass%, and most preferably 0.3 to 0.5 mass%, based on the total mass of the alkali-soluble material.

[0050] In the present invention, the average film thickness is determined by measuring the film thickness at three to five points using a stylus-type surface profiler manufactured by ULBAC, and averaging the measured values. The viscosity of the composition according to the present invention is preferably 0.1 to 10,000 cP, and more preferably 1.0 to 8,000 cP, where the viscosity is measured at 25° C. using a rotational viscometer.

[0051] (IV) Coloring agents The composition according to the present invention may comprise a (IV) colorant. Preferably, the (IV) colorant is an organic and / or inorganic colorant, more preferably, an organic and / or inorganic black colorant, even more preferably, an organic black colorant, even more preferably, the colorant is a black colorant consisting of a mixture of two or more organic colorants, and even more preferably, the (IV) colorant is a mixture of red, blue and green organic colorants mixed to give a black color.

[0052] When the black colorant used in the present invention is an organic colorant or pigment, it is preferable to combine two or more organic colorants or pigments. A black colorant can be obtained by mixing each color such as red, green, and blue. The organic colorant or pigment is selected from those having structures such as azo, phthalocyanine, quinacridone, benzimidazolone, isoindolinone, dioxazine, indanthrene, and perylene. A preferred combination of pigments includes, for example, a combination of one or more selected from the group consisting of CI Pigment Orange 43, CI Pigment Orange 64, and CI Pigment Orange 72, and one or more selected from the group consisting of CI Pigment Blue 60, CI Pigment Green 7, CI Pigment Green 36, and CI Pigment Green 58, and more preferably a combination of one selected from the group consisting of CI Pigment Orange 43, CI Pigment Orange 64, and CI Pigment Orange 72, and CI Pigment Blue 60. This combination may further be combined with other organic pigments.

[0053] The content of the colorant (IV) is preferably from 3 to 80% by mass, and more preferably from 5 to 50% by mass, based on the total mass of the alkali-soluble material. The content of the colorant is based on the mass of the pigment itself. In other words, although the colorant may be obtained in a dispersed state using a dispersant, in this case, the mass of the colorant does not include anything other than the pigment.

[0054] The colorant used in the present invention may be used in combination with a dispersant, such as an organic compound-based dispersant such as the polymer dispersant described in JP-A-2004-292672.

[0055] (V) Polymerization initiator The composition according to the present invention may contain a polymerization initiator. The polymerization initiator may be one that generates an acid, a base or a radical when exposed to radiation, or one that generates an acid, a base or a radical when exposed to heat. In the present invention, the reaction starts immediately after radiation exposure, and the reheating step performed after radiation exposure and before the development step can be omitted. Therefore, the former is preferred in terms of shortening the process and costs, and a photoradical generator is more preferred.

[0056] The photoradical generator can improve the resolution by strengthening the shape of the pattern or increasing the contrast of development. The photoradical generator used in the present invention is a photoradical generator that releases radicals when irradiated with radiation. Here, examples of radiation include visible light, ultraviolet light, infrared light, X-rays, electron beams, α rays, and γ rays.

[0057] The amount of the photoradical generator to be added varies depending on the type of active substance generated by the decomposition of the photoradical generator, the amount generated, the required sensitivity, and the dissolution contrast between the exposed and unexposed parts, but is preferably 0.001 to 50% by mass, more preferably 0.01 to 30% by mass, based on the total mass of the alkali-soluble polymer. If the amount added is less than 0.001% by mass, the dissolution contrast between the exposed and unexposed parts may be too low, and the addition effect may not be obtained. On the other hand, if the amount added of the photoradical generator is more than 50% by mass, cracks may occur in the coating film formed, or coloring due to the decomposition of the photoradical generator may become significant, so that the colorless transparency of the coating film may decrease. In addition, if the amount added is large, the thermal decomposition of the photoradical generator may cause deterioration of the electrical insulation of the cured product or gas emission, which may cause problems in the subsequent process. In addition, the resistance of the coating film to a photoresist stripper such as one based on monoethanolamine may decrease.

[0058] Examples of photoradical generators include azo-based, peroxide-based, acylphosphine oxide-based, alkylphenone-based, oxime ester-based, and titanocene-based initiators. Among them, alkylphenone-based, acylphosphine oxide-based, and oxime ester-based initiators are preferred, and 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1-{4-[4-(2-hydroxy-2-methylpropionyl)benzyl]phenyl}-2-methylpropan-1-one, and 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1-one are preferred. 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-1-butanone, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]-1-butanone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide, 1,2-octanedione, 1-[4-(phenylthio)-2-(O-benzoyloxime)], ethanone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-1-(O-acetyloxime), and the like.

[0059] (VI) Solvent The composition according to the present invention may contain a solvent. The solvent is not particularly limited as long as it can uniformly dissolve or disperse the above-mentioned alkali-soluble material, surfactant, and components added as necessary. Examples of the solvent that can be used in the present invention include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether, diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether, ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate, and propene glycol monomethyl ether and propylene glycol monoethyl ether. Examples of the solvent include propylene glycol monoalkyl ethers, propylene glycol alkyl ether acetates such as PGMEA, propylene glycol monoethyl ether acetate, and propylene glycol monopropyl ether acetate, aromatic hydrocarbons such as benzene, toluene, and xylene, ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone, alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin, esters such as ethyl lactate, ethyl 3-ethoxypropionate, and methyl 3-methoxypropionate, and cyclic esters such as γ-butyrolactone. Among these, from the viewpoints of availability, ease of handling, and solubility of alkali-soluble materials, it is preferable to use propylene glycol alkyl ether acetates or esters and alcohols having a straight or branched chain with an alkyl group having 4 or 5 carbon atoms. From the viewpoints of coatability and storage stability, it is preferable that the solvent ratio of alcohol is 5 to 80%.

[0060] The solvent content of the composition according to the present invention can be adjusted arbitrarily depending on the method of applying the composition. For example, when applying the composition by spray coating, the solvent content of the composition can be 90% by mass or more. In addition, in the case of slit coating used for applying to large substrates, the solvent content is usually 60% by mass or more, preferably 70% by mass or more. The properties of the composition of the present invention do not change significantly depending on the amount of the solvent.

[0061] (VII) Additives The composition according to the present invention may contain additives (VII) other than the above-mentioned components, if necessary. Such additives are at least one of a developer dissolution promoter, a scum remover, an adhesion enhancer, a polymerization inhibitor, an antifoaming agent, a third surfactant different from the first and second surfactants, a sensitizer, a crosslinking agent, a hardener, or a mixture thereof. As the developer dissolution promoter, for example, 4-hydroxybutyl acrylate can be suitably used. The content of the additive (VII) is preferably 5% by mass or less, more preferably 1% by mass or less. In one preferred embodiment, the additive (VII) is not included, that is, the content is 0% by mass.

[0062] The scum remover adjusts the solubility of the formed film in the developer and prevents scum from remaining on the substrate after development. Crown ethers can be used as such additives. The crown ether with the simplest structure has the general formula (-CH2-CH2-O-) n Of these, those in which n is 4 to 7 are preferred in the present invention. Crown ethers are sometimes called x-crown-y-ethers, with the total number of atoms constituting the ring being x and the number of oxygen atoms contained therein being y. In the present invention, crown ethers with x=12, 15, 18, or 21 and y=x / 3, and benzo- and cyclohexyl-condensates thereof are preferred. More preferred examples of crown ethers are 21-crown-7 ether, 18-crown-6 ether, 15-crown-5 ether, 12-crown-4 ether, dibenzo-21-crown-7 ether, dibenzo-18-crown-6 ether, dibenzo-15-crown-5 ether, dibenzo-12-crown-4 ether, dicyclohexyl-21-crown-7 ether, dicyclohexyl-18-crown-6 ether, dicyclohexyl-15-crown-5 ether, and dicyclohexyl-12-crown-4 ether. In the present invention, among these, 18-crown-6-ether and 15-crown-5-ether are most preferred. The content is preferably 0.05 to 15% by mass, more preferably 0.1 to 10% by mass, based on the total mass of the alkali-soluble material.

[0063] The adhesion enhancer has the effect of preventing the pattern from peeling off due to stress applied after baking when a cured film is formed using the composition according to the present invention. As the adhesion enhancer, imidazoles and silane coupling agents are preferable, and among imidazoles, 2-hydroxybenzimidazole, 2-hydroxyethylbenzimidazole, benzimidazole, 2-hydroxyimidazole, imidazole, 2-mercaptoimidazole, and 2-aminoimidazole are preferable, and 2-hydroxybenzimidazole, benzimidazole, 2-hydroxyimidazole, and imidazole are particularly preferable.

[0064] The silane coupling agent is preferably a known one, and examples thereof include an epoxy silane coupling agent, an amino silane coupling agent, and a mercapto silane coupling agent. Specifically, 3-glycidoxypropyl trimethoxysilane, 3-glycidoxypropyl triethoxysilane, N-2-(aminoethyl)-3-aminopropyl trimethoxysilane, N-2-(aminoethyl)-3-aminopropyl triethoxysilane, 3-aminopropyl trimethoxysilane, 3-aminopropyl triethoxysilane, 3-ureidopropyl triethoxysilane, 3-chloropropyl triethoxysilane, 3-mercaptopropyl trimethoxysilane, and 3-isocyanate propyl triethoxysilane are preferred. These can be used alone or in combination, and the amount of addition is preferably 0.05 to 15 mass% based on the total mass of the alkali-soluble material.

[0065] Also, as the silane coupling agent, a silane compound or a siloxane compound having an acid group can be used. Examples of the acid group include a carboxy group, an acid anhydride group, and a phenolic hydroxyl group. When a monobasic acid group such as a carboxy group or a phenolic hydroxyl group is included, it is preferable that a single silicon-containing compound has a plurality of acid groups.

[0066] Specific examples of such silane coupling agents include those represented by formula (C): X n Si(OR 3 ) 4-n (C) In this case, X or R 3 A combination of multiple polymerization units having different groups can be used.

[0067] In the formula, R 3 Examples of the alkyl group include a hydrocarbon group, for example, an alkyl group such as a methyl group, an ethyl group, an n-propyl group, an isopropyl group, and an n-butyl group. 3 There are multiple R 3 may be the same or different.

[0068] Examples of X include those having an acid group such as a phosphonium, borate, carboxy, phenol, peroxide, nitro, cyano, sulfo, or alcohol group, as well as those in which the acid group is protected with an acetyl, aryl, amyl, benzyl, methoxymethyl, mesyl, tolyl, trimethoxysilyl, triethoxysilyl, triisopropylsilyl, or trityl group, and an acid anhydride group.

[0069] Of these, R 3 Preferred are those having a methyl group as X and a carboxylic acid anhydride group as X, for example, an acid anhydride group-containing silicone. More specifically, a compound represented by the following formula (X-12-967C (trade name, Shin-Etsu Chemical Co., Ltd.)) or a polymer containing a corresponding structure at the end or side chain of a silicon-containing polymer such as silicone is preferred. [ka] Also preferred are compounds in which an acid group such as a thiol, phosphonium, borate, carboxy, phenol, peroxide, nitro, cyano, or sulfo group is added to the end of a dimethyl silicone. Examples of such compounds include the compounds represented by the following formula (X-22-2290AS and X-22-1821 (both trade names, Shin-Etsu Chemical Co., Ltd.)). [ka]

[0070] When the silane coupling agent contains a silicone structure, if the molecular weight is too large, the compatibility with the polysiloxane contained in the composition becomes poor, the solubility in the developer is not improved, reactive groups remain in the film, and chemical resistance to the post-processing process cannot be maintained, etc., and there is a possibility of adverse effects. Therefore, the mass average molecular weight of the silane coupling agent is preferably 5000 or less, more preferably 4000 or less. The content of the silane coupling agent is preferably 0.01 to 15 mass% based on the total mass of the alkali-soluble polymer.

[0071] As the polymerization inhibitor, nitrone, nitroxide radical, hydroquinone, catechol, phenothiazine, phenoxazine, hindered amine and their derivatives, as well as ultraviolet absorbers, can be added. Among them, methylhydroquinone, catechol, 4-t-butylcatechol, 3-methoxycatechol, phenothiazine, chlorpromazine, phenoxazine, and hindered amines such as TINUVIN 144, 292, and 5100 (BASF), and ultraviolet absorbers such as TINUVIN 326, 328, 384-2, 400, and 477 (BASF) are preferred. These can be used alone or in combination, and the content is preferably 0.01 to 20% by mass based on the total mass of the alkali-soluble material.

[0072] As a defoaming agent, alcohol (C 1~18 ), higher fatty acids such as oleic acid and stearic acid, higher fatty acid esters such as glycerin monolaurate, polyethers such as polyethylene glycol (PEG) (Mn200 to 10,000) and polypropylene glycol (PPG) (Mn200 to 10,000), silicone compounds such as dimethyl silicone oil, alkyl-modified silicone oil, and fluorosilicone oil, and organosiloxane surfactants, the details of which are given below. These can be used alone or in combination, and the content is preferably 0.1 to 3 mass% based on the total mass of the alkali-soluble material.

[0073] If necessary, a sensitizer can be added to the composition of the present invention. Sensitizers preferably used in the composition according to the present invention include coumarin, ketocoumarin and derivatives thereof, thiopyrylium salts, acetophenones, and the like, specifically, p-bis(o-methylstyryl)benzene, 7-dimethylamino-4-methylquinolone-2, 7-amino-4-methylcoumarin, 4,6-dimethyl-7-ethylaminocoumarin, 2-(p-dimethylaminostyryl)-pyridylmethyl iodide, 7-diethylaminocoumarin, 7-diethylamino-4-methylcoumarin, 2,3,5,6-1H,4H-tetrahydro-8-methylquinolizino-<9,9a,1-gh>coumarin, 7-diethylamino-4-trifluoromethylcoumarin, 7-dimethylamino-4-trifluoromethylcoumarin, 7-amino-4-trifluoro ... Examples of sensitizing dyes include tetrahydroquinolizino-<9,9a,1-gh>coumarin, 7-ethylamino-6-methyl-4-trifluoromethylcoumarin, 7-ethylamino-4-trifluoromethylcoumarin, 2,3,5,6-1H,4H-tetrahydro-9-carboethoxyquinolizino-<9,9a,1-gh>coumarin, 3-(2'-N-methylbenzimidazolyl)-7-N,N-diethylaminocoumarin, N-methyl-4-trifluoromethylpiperidino-<3,2-g>coumarin, 2-(p-dimethylaminostyryl)-benzothiazolylethyl iodide, 3-(2'-benzimidazolyl)-7-N,N-diethylaminocoumarin, 3-(2'-benzothiazolyl)-7-N,N-diethylaminocoumarin, and pyrylium salts and thiopyrylium salts represented by the following chemical formulas. The addition of the sensitizing dye enables patterning using an inexpensive light source such as a high-pressure mercury lamp (360 to 430 nm). The content of the sensitizing dye is preferably 0.05 to 15% by mass, more preferably 0.1 to 10% by mass, based on the total mass of the alkali-soluble material. [ka]

[0074] In addition, a compound containing an anthracene skeleton can also be used as the sensitizer. Specific examples include compounds represented by the following formula: [ka] In the formula, R 31 each independently represents a substituent selected from the group consisting of an alkyl group, an aralkyl group, an allyl group, a hydroxyalkyl group, an alkoxyalkyl group, a glycidyl group, and a halogenated alkyl group, R 32 each independently represents a substituent selected from the group consisting of a hydrogen atom, an alkyl group, an alkoxy group, a halogen atom, a nitro group, a sulfonic acid group, a hydroxyl group, an amino group, and a carboalkoxy group; Each k is independently an integer selected from 0 and 1 to 4.

[0075] When such a sensitizer having an anthracene skeleton is used, the content thereof is preferably 0.01 to 5% by mass based on the total mass of the alkali-soluble polymer.

[0076] If necessary, a crosslinking agent may be added to the composition of the present invention. Examples of the crosslinking agent include melamine compounds having a methylol group or an alkoxymethyl group, and isocyanate compounds. Specific examples of melamine compounds among the crosslinking agents include Nikalac MW-390, Nikalac MW-100LM, Nikalac MX-750LM, Nikalac MX-270, and Nikalac MX-280, which have imino groups, methylol groups, and methoxymethyl groups. Examples of the isocyanate compound include X-12-9659 or KBM-9659, X-12-9659 or KBM-585 (Shin-Etsu Chemical Co., Ltd.). Also preferred are polymers containing these structures or polymers in which a part of these structures is substituted with a silicone group.Other than silane compounds, Karenz AOI, Karenz MOI-BM, Karenz MOI-BP, Karenz BEI, Karenz MT (Showa Denko K.K.), hexamethylene diisocyanate, cyclohexane diisocyanate, etc. can be mentioned. The content of the crosslinking agent is preferably 1 to 80 mass %, more preferably 5 to 50 mass %, and more preferably 10 to 30 mass %, based on the total mass of the alkali-soluble material. They can be used alone or in combination of two or more kinds.

[0077] <Method of forming a cured film> The method for forming a cured film according to the present invention comprises a coating step of coating a substrate with the composition to form a coating film, and a heating step of the coating film. In the present invention, "on a substrate" includes a case where the composition is directly applied to the substrate, and a case where the composition is applied to the substrate via one or more intermediate layers. Preferably, the method for producing a cured film further comprises a step of exposing the coating film to light and a step of developing the coating film. More preferably, the method for producing a cured film according to the present invention comprises a step of applying the composition to a substrate to form a coating film, a step of exposing the coating film to light, a step of developing the coating film, and a step of heating the coating film, in this order, and further preferably includes a pre-bake step after the application step and before the exposure step. The method for forming a cured film of the present invention will be described below in the order of steps.

[0078] (1)Coating process First, the composition is applied to a substrate. The coating film of the composition in the present invention can be formed by any method conventionally known as a coating method for photosensitive compositions. Specifically, the method can be selected from dip coating, roll coating, bar coating, brush coating, spray coating, doctor coating, flow coating, spin coating, slit coating, and the like. As the substrate to which the composition is applied, a suitable substrate such as a silicon substrate, a glass substrate, or a resin film can be used. Various semiconductor elements may be formed on these substrates as necessary. When the substrate is a film, gravure coating can also be used. If desired, a drying step can be separately provided after the coating. If necessary, the coating step can be repeated once or twice or more to form the coating film having a desired thickness.

[0079] (2) Pre-bake process After forming a coating film by applying the composition, the coating film is preferably prebaked (preheated) in order to dry the coating film and reduce the amount of solvent remaining in the coating film. The prebaking step can be carried out at a temperature of generally 40 to 150° C., preferably 50 to 100° C., for 10 to 300 seconds, preferably 30 to 120 seconds, when using a hot plate, or for 1 to 30 minutes when using a clean oven.

[0080] (3) Exposure process After the coating film is formed, the surface of the coating film is irradiated with light if desired. The light source used for the light irradiation can be any light source that has been conventionally used in pattern formation methods. Examples of such light sources include high-pressure mercury lamps, low-pressure mercury lamps, metal halide lamps, xenon lamps, laser diodes, LEDs, etc. Ultraviolet rays such as g-rays, h-rays, and i-rays are usually used as the irradiating light. Except for ultrafine processing such as semiconductors, light of 360 to 430 nm (high-pressure mercury lamps) is generally used for patterning of several μm to several tens of μm. The energy of the irradiating light varies depending on the light source and the thickness of the coating film, but is generally 5 to 2000 mJ / cm. 2 , preferably 10 to 1000 mJ / cm 2 The irradiation light energy is 10 mJ / cm 2 If it is lower than 2000mJ / cm, sufficient resolution may not be obtained. 2 If it is higher than this, the exposure becomes excessive, which may cause halation.

[0081] A general photomask can be used to irradiate light in a pattern. Such a photomask can be arbitrarily selected from known ones. The environment during irradiation is not particularly limited, but generally, the ambient atmosphere (air) or nitrogen atmosphere may be used. In addition, when a film is formed on the entire surface of the substrate, the entire surface of the substrate may be irradiated with light. In the present invention, the patterned film also includes the case where a film is formed on the entire surface of the substrate.

[0082] (4) Post-exposure baking process After exposure, post-exposure baking can be performed as necessary to promote the interpolymer reaction in the film by the reaction initiator generated at the exposed area. This heating process is different from the heating process (6) described later, and is not performed to completely harden the coating film, but is performed so that only the desired pattern remains on the substrate after development and the other parts can be removed by development. Therefore, it is not essential to the present invention.

[0083] When performing post-exposure heating, a hot plate, oven, furnace, or the like can be used. The heating temperature should not be excessively high because it is undesirable that the acid generated in the exposed region by light irradiation diffuses to the unexposed region. From this viewpoint, the range of the heating temperature after exposure is preferably 40°C to 150°C, more preferably 60°C to 120°C. In order to control the curing speed of the composition, stepwise heating can be applied as necessary. In addition, the atmosphere during heating is not particularly limited, but can be selected from in an inert gas such as nitrogen, under vacuum, under reduced pressure, in oxygen gas, and the like, for the purpose of controlling the curing speed of the composition. In addition, the heating time is preferably a certain amount or more in order to maintain a higher uniformity of the temperature history in the wafer surface, and is preferably not excessively long in order to suppress the diffusion of the generated acid. From this viewpoint, the heating time is preferably 20 seconds to 500 seconds, more preferably 40 seconds to 300 seconds.

[0084] (5)Developing process After exposure, if necessary, post-exposure heating is performed, and then the coating film is developed. Any developer used in the development of photosensitive compositions can be used as the developer used in the development. Preferred developers include alkaline developers that are aqueous solutions of alkaline compounds such as tetraalkylammonium hydroxide, choline, alkali metal hydroxide, alkali metal metasilicate (hydrate), alkali metal phosphate (hydrate), aqueous sodium carbonate solution, ammonia, alkylamine, alkanolamine, and heterocyclic amine, and particularly preferred alkaline developers are aqueous solutions of tetramethylammonium hydroxide, potassium hydroxide, sodium hydroxide, and sodium carbonate. These alkaline developers may further contain water-soluble organic solvents such as methanol and ethanol, or surfactants, as necessary. In the present invention, development can be performed using a developer with a lower concentration than the 2.38% by mass TMAH developer that is normally used as a developer. Examples of such a developer include a 0.05 to 1.5 mass % TMAH aqueous solution, a 0.1 to 2.5 mass % sodium carbonate aqueous solution, a 0.01 to 1.5 mass % potassium hydroxide aqueous solution, etc. The development time is usually 10 to 300 seconds, and preferably 30 to 180 seconds. The developing method can be selected from conventionally known methods. Specific examples include immersion (dip) in a developer, paddle, shower, slit, cap coat, spray, etc. This development can provide a pattern. After development with a developer, it is preferable to wash with water.

[0085] (6)Heating process The coating film is cured by heating. The heating device used in the heating step can be the same as that used in the post-exposure heating described above. The heating temperature in this heating step is not particularly limited as long as it is a temperature at which the coating film can be cured, and can be arbitrarily determined. However, when polysiloxane is used, if silanol groups remain in the polysiloxane, the chemical resistance of the cured film may become insufficient, or the dielectric constant of the cured film may become high. From this viewpoint, the heating temperature is generally selected to be relatively high. However, the composition according to the present invention can be cured at a relatively low temperature. Specifically, it is preferable to cure by heating at 350°C or less, and in order to keep the residual film rate after curing high, the curing temperature is more preferably 300°C or less, and particularly preferably 250°C or less. On the other hand, in order to promote the curing reaction and obtain a sufficient cured film, the curing temperature is preferably 70°C or more, and more preferably 80°C or more. In addition, the heating time is not particularly limited, and is generally 10 minutes to 24 hours, preferably 20 minutes to 3 hours. In addition, this heating time is the time after the temperature of the pattern film reaches the desired heating temperature. Usually, it takes several minutes to several hours for the pattern film to reach a desired temperature from the temperature before heating.

[0086] The cured film thus formed exhibits the effects of the present application as long as it has an average thickness of 100 μm or less, and is preferably a film having an average thickness of 5 to 100 μm. More preferably, it is 5 to 25 μm, and even more preferably, it is 8 to 20 μm. The optical density (OD) of the cured film is preferably 1.5 or more, more preferably 2 or more, on average, at a wavelength of 400 to 700 nm. Here, the optical density is measured using a Spectrophotometer CM-5 (Konica Minolta). The cured film according to the present invention has excellent light-shielding properties and can be used as a partition material for display devices. Since the cured film according to the present invention can be made thick, it can be suitably used for quantum dots and organic electroluminescence devices, which require a thicker partition material.

[0087] In another aspect, the present invention relates to a cured film produced or capable of being produced by the above method.

[0088] In another aspect, the present invention provides a method for producing a composition comprising: A polymer (A) derived from an alkali-soluble material; A first surfactant; a second surfactant different from the first surfactant; The present invention relates to a cured film comprising the above-mentioned compound. Preferably, the cured film is patterned, more preferably a patterned bank. Preferably, the polymer (A) has a network-like crosslinked structure, and more preferably is a polymer derived from the above-mentioned (I) alkali-soluble material and (V) polymerization initiator. Preferably, the cured film further comprises a colorant. More preferably, the colorant is an organic colorant and / or an inorganic colorant, and even more preferably, the colorant is an organic and / or inorganic black colorant.

[0089] In another aspect, the invention relates to a photoconversion device comprising the cured film.

[0090] In another aspect, the invention relates to a display device comprising the cured film or the photoconversion device.

[0091] Preferred embodiments are listed below. [Embodiment 1] (I) Alkali-soluble material (II) a first surfactant; and (III) a second surfactant different from the first surfactant; and Consisting of Alternatively, the composition essentially consists of the above-mentioned (I) alkali-soluble material, (II) a first surfactant, and (III) a second surfactant different from the first surfactant. Or, a composition comprising the above (I) alkali-soluble material, (II) a first surfactant, and (III) a second surfactant different from the first surfactant. Preferably, the composition is a cured film-forming composition. Preferably, the composition is a photosensitive composition. More preferably, the composition is a negative-acting photosensitive composition. Preferably, the composition comprises: (IV) a colorant, preferably the colorant is an organic and / or inorganic colorant, more preferably the colorant is an organic and / or inorganic black colorant; (V) a polymerization initiator, and / or (VI) Solvent The composition further comprises: Preferably, (I) the alkali-soluble material has a structural portion having an acid group, where the acid group is preferably one having an acid dissociation constant (pKa) of 7 or less, more preferably -OH, -COOH, -SOH, -OSOH, -POH, -OPOH, -CONHSO, -SONHSO-, and even more preferably -COOH.

[0092] [Embodiment 2] (II) the first surfactant is a lipophilic surfactant, preferably a fluorine-free surfactant, more preferably a fluorine-free nonionic surfactant, an anionic surfactant, an amphoteric surfactant, or a mixture thereof; (III) The composition according to embodiment 1, wherein the second surfactant is a surfactant exhibiting oil repellency, preferably a fluorosurfactant or a surfactant containing fluorine exhibiting oil repellency, more preferably a surfactant containing fluorine, and even more preferably a nonionic surfactant containing fluorine, an anionic surfactant containing fluorine, an amphoteric surfactant containing fluorine, or a mixture thereof. Preferably, (II) the first surfactant is a fluorine-free nonionic surfactant, and more preferably, (II) the first surfactant is a polyoxyethylene alkyl ether such as polyoxyethylene lauryl ether, polyoxyethylene oleyl ether, or polyoxyethylene cetyl ether, a polyoxyethylene fatty acid diester, a polyoxyethylene fatty acid monoester, a polyoxyethylene polyoxypropylene block polymer, an acetylene glycol derivative such as acetylene alcohol, acetylene glycol, a polyethoxylate of acetylene alcohol, or a polyethoxylate of acetylene glycol, an organic siloxane surfactant, a silicone surfactant, or a mixture thereof. Preferably, the second surfactant (III) is a fluorine-containing nonionic surfactant.

[0093] [Embodiment 3] The composition according to embodiment 1 or 2, wherein the mass ratio of the first surfactant (II) to the second surfactant ((II) first surfactant:(III) second surfactant) is 1:1000 to 99:10, preferably 1:100 to 5:1, more preferably 1:50 to 2:1, and most preferably 1:20 to 1:1.

[0094] [Embodiment 4] The composition according to any one of embodiments 1 to 3, wherein the content of the (II) first surfactant is 0.001 to 5 mass%, preferably 0.01 to 1 mass%, more preferably 0.02 to 0.5 mass%, and most preferably 0.03 to 0.3 mass%, based on the total mass of the (I) alkali-soluble material, and the content of the (III) second surfactant is 0.05 to 10 mass%, preferably 0.1 to 5 mass%, more preferably 0.2 to 1 mass%, and most preferably 0.3 to 0.5 mass%, based on the total mass of the (I) alkali-soluble material.

[0095] [Embodiment 5] (IV) The composition of any one of embodiments 1 to 4, further comprising a colorant. Preferably, the (IV) colorant is an organic and / or inorganic black colorant, more preferably an organic black colorant, even more preferably a black colorant consisting of a mixture of two or more organic colorants, even more preferably a mixture of red, blue and green organic colorants mixed to produce a black color.More preferably, the (IV) colorant is an organic black colorant consisting of a mixture of organic colorants selected from the group consisting of azos, phthalocyanines, quinacridones, benzimidazoles, isoindolines, dioxazines, indanthrenes, and perylenes, and most preferably, the organic black colorant is a mixture of one or more selected from the group consisting of CI Pigment Orange 43, CI Pigment Orange 64, and CI Pigment Orange 72, combined with one or more selected from the group consisting of CI Pigment Blue 60, CI Pigment Green 7, CI Pigment Green 36, and CI Pigment Green 58. The content of the colorant (IV) is preferably 3 to 80 mass %, more preferably 5 to 50 mass %, based on the total mass of the alkali-soluble material.

[0096] [Embodiment 6] (I) The composition according to any one of embodiments 1 to 5, wherein the alkali-soluble material is a compound containing two or more (meth)acryloyloxy groups and / or an alkali-soluble polymer. Preferably, the compound containing two or more (meth)acryloyloxy groups is an ester obtained by reacting (α) a polyol compound having two or more hydroxyl groups with (β) two or more (meth)acrylic acids. Preferably, the (α) polyol compound is a compound having a basic skeleton such as a saturated or unsaturated aliphatic hydrocarbon, an aromatic hydrocarbon, a heterocyclic hydrocarbon, a primary, secondary, or tertiary amine, an ether, or the like, and having two or more hydroxyl groups as substituents. Preferably, the (α) polyol compound further contains one or more substituents selected from the group consisting of a carboxy group, a carbonyl group, an amino group, an ether bond, a thiol group, and a thioether bond. Preferably, the (α) polyol compound is selected from the group consisting of alkyl polyols, aryl polyols, polyalkanolamines, cyanuric acid, and dipentaerythritol. Here, when the (α) polyol compound has three or more hydroxyl groups, it is not necessary that all of the hydroxyl groups react with (meth)acrylic acid, and they may be partially esterified. That is, the ester may have unreacted hydroxyl groups. Such esters are one or a mixture of two or more selected from tris(2-acryloxyethyl)isocyanurate, dipentaerythritol hexa(meth)acrylate, tripentaerythritol octa(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, trimethylolpropane triacrylate, polytetramethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, ditrimethylolpropane tetraacrylate, tricyclodecane dimethanol diacrylate, 1,9-nonanediol diacrylate, 1,6-hexanediol diacrylate, and 1,10-decanediol diacrylate. Preferred are tris(2-acryloxyethyl)isocyanurate, dipentaerythritol hexaacrylate, or a combination thereof. More preferred is a combination of a compound containing three (meth)acryloyloxy groups and a compound containing two (meth)acryloyloxy groups. Preferably, the molecular weight of the compound containing two or more (meth)acryloyloxy groups is 2,000 or less, and more preferably 1,500 or less. The content of the compound containing two or more (meth)acryloyloxy groups is preferably 5 to 99.9 mass %, more preferably 30 to 70 mass %, based on the total mass of the composition excluding the solvent. Preferably, the alkali-soluble polymer is selected from the group consisting of (meth)acrylic polymers, siloxane polymers, siloxane (meth)acrylic polymers, and mixtures thereof. The alkali dissolution rate of an alkali-soluble polymer is measured and calculated as follows, using a 0.03% by mass KOH aqueous solution as the alkaline solution. The alkali-soluble polymer is diluted to 35% by mass in PGMEA and dissolved by stirring at room temperature for 1 hour. In a clean room with a temperature of 23.0±0.5°C and humidity of 50±5.0%, 1 cc of the prepared alkali-soluble polymer solution is dropped onto the center of a 4-inch, 525 μm-thick silicon wafer using a pipette, and spin-coated to a thickness of 2±0.1 μm. The solvent is then removed by heating on a hot plate at 100°C for 90 seconds. The thickness of the coating is measured using a spectroscopic ellipsometer (JA Woollam). Next, the silicon wafer with this film was gently immersed in a 6-inch glass petri dish containing 100 ml of 0.03% by mass KOH aqueous solution adjusted to 23.0±0.1°C, and then left to stand, and the time until the coating film disappeared was measured. The dissolution rate was calculated by dividing the time until the film disappeared at a portion 10 mm inside from the edge of the wafer. If the dissolution rate is significantly slow, the wafer was immersed in the KOH aqueous solution for a certain period of time, and the film thickness was measured, and the dissolution rate was calculated by dividing the change in film thickness before and after immersion by the immersion time. The above measurement method was performed five times, and the average of the obtained values ​​was taken as the dissolution rate of the alkali-soluble polymer. A preferable alkali-soluble polymer is one in which, when the alkali dissolution rate is measured and calculated, the coating film at a portion 10 mm inside from the edge of the wafer is dissolved and disappears in a 0.03 mass % KOH aqueous solution within 10 minutes.

[0097] [Embodiment 7] The composition according to any one of embodiments 1 to 6, wherein (I) the alkali-soluble material comprises a compound containing two or more (meth)acryloyloxy groups.

[0098] [Embodiment 8] (I) The composition of embodiment 7, wherein the alkali-soluble material further comprises an alkali-soluble polymer. The content of the compound containing two or more (meth)acryloyloxy groups is preferably 5 to 1000 mass %, more preferably 10 to 800 mass %, based on the total mass of the alkali-soluble polymer.

[0099] [Embodiment 9] (VI) The composition of any one of the preceding embodiments, further comprising a solvent. Preferably, the (VI) solvent is selected from the group consisting of ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; propylene glycol monoalkyl ethers such as propylene glycol monomethyl ether and propylene glycol monoethyl ether; PGMEA; and propylene glycol monoethyl ether acetate. The solvent may be one or a combination of propylene glycol alkyl ether acetates such as propylene glycol monopropyl ether acetate, aromatic hydrocarbons such as benzene, toluene, and xylene, ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, and cyclohexanone, alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin, esters such as ethyl lactate, ethyl 3-ethoxypropionate, and methyl 3-methoxypropionate, and cyclic esters such as γ-butyrolactone, and more preferably selected from propylene glycol alkyl ether acetates, esters, and alcohols having a straight or branched chain with an alkyl group having 4 or 5 carbon atoms. The solvent preferably contains 5 to 80% by mass of alcohol.

[0100] [Embodiment 10] (VII) The composition of any one of embodiments 1 to 9, further comprising an additive. Preferably, the (VII) additive is a developer dissolution promoter (preferably a compound having a hydroxyl group, more preferably a monomer, polymer or a mixture thereof having a hydroxyl group), a scum remover, an adhesion enhancer, a polymerization inhibitor, a defoamer, a third surfactant different from the first and second surfactants, a sensitizer, a crosslinker, a hardener, or a mixture thereof.

[0101] [Embodiment 11] A method for producing a cured film, comprising the steps of: applying the composition according to any one of embodiments 1 to 10 to a substrate to form a coating film; and heating the coating film. Preferably, the method for producing a cured film further comprises a step of exposing the coating film to light and a step of developing the coating film. More preferably, the method for producing a cured film further comprises a step of applying the composition according to any one of embodiments 1 to 10 to a substrate to form a coating film, a step of exposing the coating film to light, a step of developing the coating film, and a step of heating the coating film, in this order, and further preferably further comprises a pre-baking step after the application step and before the exposure step.

[0102] [Embodiment 12] 12. A cured film produced or capable of being produced by the method of embodiment 11.

[0103] [Embodiment 13] A polymer (A) derived from an alkali-soluble material; A first surfactant; a second surfactant different from the first surfactant; A cured film comprising: Preferably, the polymer (A) derived from an alkali-soluble material has a network-like crosslinked structure. Preferably, the cured film is patterned, and more preferably, the cured film is a patterned bank. Preferably, the cured film further comprises a colorant. More preferably, the colorant is an organic colorant and / or an inorganic colorant, and even more preferably, the colorant is an organic and / or inorganic black colorant. More preferably, the polymer (A) is (I) an alkali-soluble material; and (V) a polymerization initiator. It is a polymer derived from

[0104] [Embodiment 14] The cured film according to embodiment 12 or 13, having an average film thickness of 0.1 to 100 μm, preferably 1 to 50 μm, more preferably 1 to 25 μm, and further preferably 5 to 20 μm.

[0105] [Embodiment 15] The cured film according to any one of embodiments 12 to 14, wherein the upper portion of the cured film is oil-repellent and the lower portion is lipophilic. Preferably, the cured film is patterned, more preferably, the cured film is a patterned bank.

[0106] [Embodiment 16] A photoconversion device comprising the cured film according to any one of embodiments 12 to 15.

[0107] [Embodiment 17] A display device comprising the cured film according to any one of embodiments 12 to 15, or the photoconversion device according to embodiment 16.

[0108] [Embodiment 18] (II) a first surfactant; and (III) a second surfactant different from the first surfactant; (I) Use in a composition comprising an alkali-soluble material. Preferably, the composition is a photosensitive composition, more preferably a negative-acting photosensitive composition. Preferably, the composition comprises: (IV) a colorant, preferably an organic and / or inorganic colorant, more preferably an organic and / or inorganic black colorant; (V) a polymerization initiator, and / or (VI) Solvent The composition further comprises: Preferably, (II) the first surfactant is a fluorine-free surfactant, more preferably a fluorine-free nonionic surfactant, anionic surfactant, amphoteric surfactant or a mixture thereof, and (III) the second surfactant is a fluorine-containing surfactant.

[0109] The present invention will be described in more detail below with reference to examples and comparative examples, but the present invention is not limited to these examples and comparative examples.

[0110] <Comparative Example 1> A PGMEA solution containing 100 parts by mass of a mixture of acrylic polymer A (Shin-Nakamura Chemical Co., Ltd.) and acrylic polymer B (Natoco Co., Ltd.) in a mass ratio of 3:1 was added with 3.0 parts by mass each of polymerization initiator A (ADEKA Corporation "NCI-831") and polymerization initiator B (IGM Resins BV "Omnirad 784"), 143 parts by mass of dipentaerythritol hexaacrylate (Shin-Nakamura Chemical Co., Ltd. "A-DPH") as a (meth)acryloyloxy group-containing compound, 47 parts by mass of additive A (thiol monomer "KarenzMT PE-1", Showa Denko K.K.), 39 parts by mass of colorant A (black colorant, Toyo Color Co., Ltd.), and 4.5 parts by mass of fluorine-containing surfactant A (Daikin Industries, Ltd.), and further added with PGMEA to prepare a solution with a solids ratio of 35% by mass, thereby obtaining the composition of Comparative Example 1.

[0111] <Comparative Examples 2 to 5> Compositions of Comparative Examples 2 to 5 are prepared in the same manner as in Comparative Example 1, except that the compositions are changed as shown in Table 1. [Table 1]

[0112] <Examples 1 to 6> Compositions of Examples 1 to 6 are prepared in the same manner as in Comparative Example 1, except that the compositions are changed as shown in Table 2. [Table 2] In Tables 1 and 2, (Meth)acryloyloxy group-containing compound A: Dipentaerythritol hexaacrylate "A-DPH" (Shin-Nakamura Chemical Co., Ltd.) Acrylic polymer A: Acrylic random polymer made from carboxyl acid monomer and monomer containing at least one aromatic ring group (Shin-Nakamura Chemical Co., Ltd.). Acrylic polymer B: 2-Propenoic acid, 2-methyl-, polymer with 2-hydroxyethyl 2-methyl-2-propenoate, 2-isocyanatoethyl 2-propenoate and methyl 2-methyl-2-propenoate (Natoco Co., Ltd.) Polymerization initiator A: "NCI-831" (ADEKA Corporation) Polymerization initiator B: “Omnirad784” (IGM Resins BV) Additive A: Thiol monomer A "KarenzMT PE-1" (Showa Denko K.K.). Colorant A: Black pigment (Toyo Color Co., Ltd.) Surfactant A: Fluorine-containing surfactant (Daikin Industries, Ltd.). As the surfactant A, for example, Surflon (AGC Seimi Chemical Co., Ltd.), which is a surfactant having a perfluoroalkyl group, can also be used. Surfactant B: Silicone-based surfactant (DIC Corporation). For example, a silicone-based surfactant such as SOILNON AF-800 (Nicca Chemical) can also be used as surfactant B. Surfactant C: "Glide ZG400" (Evonik Industries).

[0113] (Pattern creation) Each of the obtained compositions is applied onto a glass substrate by spin coating (MS-A100, MIKASA), and after application, it is pre-baked on a hot plate (HHP-411V, AS ONE) at 60°C for 90 seconds to adjust the average film thickness to 10 μm. It is exposed using an i-line exposure machine (NES2W-ghi06, Nikon), and a hole pattern of 54x160 and 200x200 μm is created using a 0.03 mass% KOH aqueous solution as a developer. The patterned substrate is placed in an oven (DP-200, Yamato) at 85°C and heated for 30 minutes to promote the hardening of the polymer. The pattern is confirmed to be free of residues using an optical microscope (MX61A, OLYMPUS) and SEM (JSM-7100, JEOL).

[0114] (Optical density measurement) To measure the optical density, a substrate without a pattern is prepared. In the exposure process, the entire substrate is exposed without using a photomask. The other steps are to prepare a film using the same process procedure as for pattern preparation. The transmission spectrum is measured using a spectrophotometer (CM-5, KONICA MINOLTA) and the average OD value at wavelengths of 400 to 650 nm is calculated.

[0115] (Surface free energy measurement) To measure the surface free energy, a substrate without a pattern is prepared. In the exposure process, the entire substrate is exposed without using a photomask. The other steps are similar to the process procedure for pattern production to produce a film. The prepared substrate is placed in a contact angle meter (DropMaster700, Kyowa) and the contact angles of distilled water and 3 μL of diiodomethane are measured. The surface free energy is calculated from the Owens-Wendt theoretical formula and the obtained contact angle value.

[0116] (Ink Creation) Ink A is prepared by mixing the materials described in Table 3 below. The ink can also be prepared using the materials and methods described in, for example, WO 2021 / 116139. [Table 3] In the table, the method for preparing the monomer mixture is as follows. 1,6-Hexanediol diacrylate (HDDA) is purified by passing it through a molecular sieve before use. Next, 2 g of the purified HDDA and 8 g of lauryl acrylate (LA, viscosity: 4.0 cP, BP: 313.2°C) are mixed in a glass vial (HDDA:LA=2:8) to obtain a monomer mixture. (Ink spreading test) A drop of ink A is placed on a hole pattern with a size of 54x160μm using an inkjet printer (Dimatix DMP-2831, FujiFilm), and the spreading of the ink is evaluated using an optical microscope and SEM. For a hole pattern of size 200x200μm, 10, 20, 40, and 60 drops of ink A are placed, and the spread of the ink is observed using an optical microscope (VK-X1000, KEYENCE) and SEM (JSM-7100, JEOL). In the evaluations of Tables 1 and 2, if the ink does not spread and maintains the droplet shape on the pattern (i.e., if the ink is repelled), it is judged as OK, and if the droplet cannot be maintained, it is NG. If the droplet shape is maintained inside the hole, it is NG, and if the ink spreads inside the hole without becoming a droplet, it is judged as OK.

Claims

1. (I) an alkali-soluble material; (II) a first surfactant; and (III) a second surfactant different from the first surfactant; and A composition comprising:

2. 2. The composition of claim 1, wherein (II) the first surfactant is a surfactant that exhibits lipophilic properties, and (III) the second surfactant is a surfactant that exhibits oil-repellent properties.

3. 3. The composition according to claim 1, wherein the mass ratio of the first surfactant (II) to the second surfactant (III) ((II) first surfactant:(III) second surfactant) is 1:1000 to 99:

10.

4. 3. The composition according to claim 1, wherein the content of the first surfactant (II) is 0.001 to 5% by mass based on the total mass of the alkali-soluble material (I).

5. The composition according to claim 1 or 2, further comprising (IV) a colorant.

6. The composition according to claim 1 or 2, wherein the alkali-soluble material (I) is a compound containing two or more (meth)acryloyloxy groups and / or an alkali-soluble polymer.

7. The composition according to claim 1 or 2, wherein (I) the alkali-soluble material comprises a compound containing two or more (meth)acryloyloxy groups.

8. The composition of claim 7, wherein (I) the alkali-soluble material further comprises an alkali-soluble polymer.

9. 3. The composition of claim 1 or 2, further comprising (VI) a solvent.

10. A step of applying the composition according to claim 1 or 2 to a substrate to form a coating film; heating the coating film; A method for producing a cured film comprising the steps of:

11. A cured film produced or capable of being produced by the method of claim 10.

12. A polymer (A) derived from an alkali-soluble material; a first surfactant; and a second surfactant different from the first surfactant; A cured film comprising:

13. The cured film according to claim 12, having an average film thickness of 0.1 to 100 μm.

14. 14. The cured film according to claim 12 or 13, wherein an upper portion of the cured film is oil-repellent and a lower portion is lipophilic.

15. A photoconversion device comprising the cured film according to claim 12 or 13.

16. A display device comprising the cured film according to claim 12 or 13.