Display device and manufacturing method thereof

Abstract

To provide a display device having a transmissive area and a manufacturing method thereof.SOLUTION: A display device 1 includes a first substrate 10 and a display unit 10. The display unit 10 includes a display area 100 and a transmissive area 1A. The display unit 10 includes an auxiliary layer 118 arranged corresponding to the transmissive area 1A and a second electrode 130 arranged corresponding only to the display area 100. The auxiliary layer 118 includes a first material and a third material, and the second electrode 130 includes a second material. The first material and the second material satisfy the following formula 1. The auxiliary layer 118 includes a first area and a second area interposed between the first area and the first substrate. The concentration of the first material in the first area is different from the concentration of the first material in the second area. In the formula 1 of ST2-ST1>0 mJ / m2, ST1 is the surface energy of the first material at 25°C, and ST2 is the surface energy of the second material at 25°C.SELECTED DRAWING: Figure 2

Description

[Technical field]

[0001] The present invention relates to a display device, specifically a display device having a transmissive region, and a manufacturing method thereof. [Background technology]

[0002] Recently, the uses of display devices have become more diverse, and the thickness and weight of display devices have become thinner and lighter, allowing the range of use to become wider.

[0003] For example, research is ongoing to realize transparency or translucency in display devices. Specifically, there are attempts to form a transparent display device by making a thin film transistor or a display panel inside the device transparent.

[0004] To realize a transparent display device, it is necessary to optimize various variables such as the composition, arrangement, thickness, etc. of various materials such as a substrate, an electrode, an insulating film, a capping film, etc. For example, in the case of an organic light emitting display device, a number of conductive films and insulating films containing different materials are stacked, which reduces optical properties and makes it difficult to obtain desired transmittance or transparency. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] Korean Patent Publication No. 10-2012-0044876 Summary of the Invention [Problem to be solved by the invention]

[0006] To solve the above problems, an embodiment of the present invention provides a display device with high transmittance for external light and a method for manufacturing the same, and can provide a display device in which a common electrode is not substantially formed in a transmissive region.

[0007] The technical problems that the present invention aims to solve are not limited to the above-mentioned technical problems, and other technical problems not mentioned will be clearly understood by a person having ordinary skill in the art from the description of the present invention. [Means for solving the problem]

[0008] According to an embodiment of the present invention, there is provided a display device comprising: a first substrate; and a display unit; The display unit includes a display area and a transmissive area. the display unit includes an auxiliary layer disposed in correspondence with the transmissive region and a second electrode disposed in correspondence with only the display region; the auxiliary layer includes a first material and a third material; the second electrode comprises a second material; The first material and the second material satisfy the following formula 1, the auxiliary layer includes a first region and a second region interposed between the first region and the first substrate, a concentration of the first material in the first region and a concentration of the first material in the second region are different from each other; ST2-ST1>0mJ / m 2 <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is the surface energy of the second material at 25°C.

[0009] In the embodiment, the second electrode may be absent in the transmissive area.

[0010] In the embodiment, the first region may include a location of maximum concentration of the first material.

[0011] In the above embodiment, the auxiliary layer further includes a third region; the third region is interposed between the second region and the first substrate, The concentration of the first material in the second region and the concentration of the first material in the third region may be different from each other.

[0012] In the above example, ST1 is 0 mJ / m 2 Exceeding 30mJ / m 2 It may be the following.

[0013] In the embodiment, the molecular weight of the first material may be 1500 or less.

[0014] In such embodiments, the second material may include magnesium (Mg), silver (Ag), aluminum (Al), lithium (Li), calcium (Ca), indium (In), or any combination thereof.

[0015] In the embodiment, the molecular weight of the third material may be 1500 or less.

[0016] According to another embodiment of the present invention, there is provided a display device comprising a first substrate and a display unit, The display unit includes a display area and a transmissive area. the display unit includes an auxiliary layer disposed corresponding to the transmissive region, and a second electrode disposed corresponding to the display region and the transmissive region, the auxiliary layer includes a first material and a third material; the second electrode comprises a second material; The first material and the second material satisfy the following formula 1, the auxiliary layer includes a first region and a second region interposed between the first region and the first substrate, a concentration of the first material in the first region and a concentration of the first material in the second region are different from each other; ST2-ST1>0mJ / m 2 <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is the surface energy of the second material at 25°C.

[0017] In the embodiment, a first portion of the second electrode is disposed corresponding to the display area; a second portion of the second electrode is disposed in correspondence with the transmissive region; The thickness T of the first portion 1 and the thickness T of the second portion 2 satisfies the following formula 2. T 1 >T 2 <Formula 2>

[0018] In the above embodiment, T 2 may be greater than 0 nm and equal to or less than 1 nm.

[0019] In the embodiment, the first region may include a location of maximum concentration of the first material.

[0020] In the above embodiment, the auxiliary layer further includes a third region; the third region is interposed between the second region and the first substrate, The concentration of the first material in the second region and the concentration of the first material in the third region may be different from each other.

[0021] In the above example, ST1 is 0 mJ / m 2 Greater than 30mJ / m 2 The following is the result.

[0022] In the embodiment, the molecular weight of the first material may be 1500 or less.

[0023] In such embodiments, the second material may include magnesium (Mg), silver (Ag), aluminum (Al), lithium (Li), calcium (Ca), indium (In), or any combination thereof.

[0024] In the embodiment, the molecular weight of the third material may be 1500 or less.

[0025] According to an embodiment of the present invention, a method for manufacturing a display device includes the steps of: providing a first substrate; providing a display unit on the first substrate, the display unit including a display area and a transmissive area; The step of providing a display unit includes: providing a first material on the display area and the transmissive area, providing a third material only on the transmissive area, and then removing the first material on the display area to provide an auxiliary layer disposed corresponding to the transmissive area; and providing a second electrode; the auxiliary layer includes a first material and a third material; the second electrode comprises a second material; The first material and the second material satisfy the following formula 1, ST2-ST1>0mJ / m 2 <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is the surface energy of the second material at 25°C.

[0026] In said embodiment, said third material may be provided by evaporation using a fine metal mask.

[0027] In such an embodiment, the second electrode may be provided by evaporating the second material using an open mask. Effect of the Invention

[0028] According to various exemplary embodiments of the present invention, a display device having a relatively high transmittance and a manufacturing method thereof may be provided, in which a common electrode is not substantially formed in a transmissive region.

[0029] However, the above-mentioned effects are merely examples, and the effects of the embodiments will be described in detail below. [Brief description of the drawings]

[0030] [Figure 1]1 is a structural diagram illustrating a display device according to an embodiment of the present invention; [Diagram 2] 1 is a cross-sectional view illustrating a display device according to an embodiment of the present invention. [Diagram 3] 1 is a plan view illustrating a display device according to an embodiment of the present invention; [Figure 4] 3 is a cross-sectional view illustrating a display device according to another embodiment of the display device of FIG. 2. FIG. [Diagram 5] FIG. 5 is a cross-sectional view showing the display portion of FIG. 4 in further detail. [Figure 6] 1 is a cross-sectional view illustrating a display device according to another embodiment of the present invention. [Figure 7] FIG. 11 is a plan view illustrating a display device according to another embodiment of the present invention. [Figure 8] 7 is a cross-sectional view illustrating a display device according to another embodiment of the display device of FIG. 6. [Figure 9] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 10] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 11] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 12] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 13] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 14] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 15] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 16] 1A to 1C are cross-sectional views illustrating a method for manufacturing a display device according to an embodiment of the present invention. [Figure 17] 1 is a block diagram illustrating a schematic configuration of an electronic device according to an embodiment of the present invention. [Figure 18A] 1 is a perspective view illustrating an electronic device according to an embodiment of the present invention. [Figure 18B] 1 is a perspective view illustrating an electronic device according to an embodiment of the present invention. [Figure 19] 1 is a graph showing transmittance versus wavelength for Example 1 and Comparative Examples 1 and 2. [Figure 20] 1 is a graph showing transmittance versus wavelength for Example 2 and Comparative Examples 3 and 4. [Figure 21] 1 is a diagram showing the results of elemental analysis by depth using X-ray photoelectron spectroscopy (XPS) in Example 2 and Comparative Example 3. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0031] The present invention can be modified in various ways and can have various embodiments. In the following, several embodiments are illustrated in the drawings and described in detail. The effects and features of the present invention, and the apparatus or method for achieving them, will become clear by referring to the embodiments described in detail together with the drawings. However, the present invention is not limited to the embodiments described below, and can be embodied in various forms.

[0032] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the description with reference to the drawings, the same or corresponding components are designated by the same reference numerals, and redundant description thereof will be omitted.

[0033] In the following examples, the terms "first", "second" and the like are not used in a limiting sense but are used to distinguish one component from another component.

[0034] In the following examples, singular expressions include plural expressions unless the context clearly indicates otherwise.

[0035] In the following examples, terms such as "comprise" or "have" mean the presence of a feature or component described in the specification, but do not preclude the possibility that one or more other features or components may be added.

[0036] In the following examples, when a part such as a film, region, component, etc. is said to be on or above another part, this does not only include the case where it is directly on the other part, but also the case where another film, region, component, etc. is interposed therebetween.

[0037] In the drawings, the size of components may be exaggerated or reduced for convenience of explanation. For example, the size and thickness of each component shown in the drawings are arbitrarily shown for convenience of explanation, and the present invention is not necessarily limited to what is shown in the drawings.

[0038] When an embodiment can be implemented differently, the order of certain steps may be different than that described. For example, two steps described in succession may be performed substantially simultaneously or may be performed in the reverse order from that described.

[0039] In the following examples, when a membrane, region, component, etc. is said to be connected, this includes not only the case where the membrane, region, component, etc. are directly connected, but also the case where another membrane, region, component, etc. is interposed between the membrane, region, component, and they are indirectly connected. For example, in this specification, when a membrane, region, component, etc. is electrically connected, this includes not only the case where the membrane, region, component, etc. are directly electrically connected, but also the case where another membrane, region, component, etc. is interposed between them and they are indirectly electrically connected.

[0040] FIG. 1 is a cross-sectional view illustrating a display device according to an embodiment of the present invention.

[0041] 1, a display device 1 according to an embodiment of the present invention includes a first substrate 10 and a display unit 20. The display unit 20 includes a display area 100 where an image is displayed and a transmissive area 200 through which external light is transmitted. In the display device 1, external light is incident by transmitting through the first substrate 10 and the display unit 20.

[0042] In the display unit 20, an image is displayed through the display area 100, and external light is transmitted through the transmissive area 100. A user U can see an external image through the transmissive area 200. That is, the display device 1 is implemented as a display in which the display area 100 and the transmissive area 200 have different transmittances.

[0043] As an embodiment, a front emission type display device in which a user U positioned on the side where an image is realized can observe an image outside the first substrate 10 will be described as an example, but the display device of the present invention is not limited thereto. As another embodiment, the display device of the present invention may be a rear emission type realized in the direction from the display unit 20 to the first substrate 10.

[0044] By not disposing a thin film transistor, a capacitor, etc. in the transmissive region 100, the external light transmittance in the transmissive region 100 is increased, and as a result, the external light transmittance of the display device is increased and distortion caused by interference of the transmissive image by the thin film transistor, the capacitor, etc. is prevented.

[0045] The display device 1 further includes a second substrate opposed to the first substrate 10. In this case, the display unit 20 is provided between the first substrate 10 and the second substrate.

[0046] The second substrate is formed of a transparent glass or plastic substrate, and allows an image from the display unit 20 to be displayed, while blocking the penetration of outside air and moisture into the display unit 20. The first substrate 10 and the second substrate are connected at their edges by a sealant, and the space between the first substrate 10 and the second substrate is sealed. A moisture absorbent or a filler is placed in the space. Alternatively, the space is sealed by forming a thin film second substrate on the first substrate 10 and the display unit 20. In this case, both the first substrate 10 and the second substrate are provided to be flexible.

[0047] In the following, an organic light emitting display device will be described as an example of a display device 1 according to an embodiment of the present invention, but the display device of the present invention is not limited thereto. In other embodiments, various types of display devices such as an inorganic light emitting display device and a quantum dot light emitting display device may be used.

[0048] 2 and 3 are a cross-sectional view and a plan view showing a display device 1A according to an embodiment of the present invention, in which FIG 3 is a plan view showing adjacent first pixels PX1, for example, a first red pixel Pr, a first green pixel Pg, and a first blue pixel Pb, and FIG 2 is a cross-sectional view taken along line A-A' in FIG 3.

[0049] 2, the display unit 20 includes a display area 100 where an image is displayed and a transmissive area 200 adjacent thereto through which external light is transmitted. Here, the external light is external light that is distinct from the light emitted by the light emitting element EL1 of the first pixel PX1. The external light may also be ambient light or light emitted by other electronic elements.

[0050] The transmissive region 200 does not include any element containing an opaque material, but includes only a substantially transparent auxiliary layer, insulating film, etc., and can transmit an image from outside the display device 1A as it is.

[0051] The transmissive region 200 transmits a first external light 61 and a second external light 62. The first external light 61 is external light transmitted from the outside of the display unit 20 toward the outside of the first substrate 10. The second external light 62 is external light transmitted from the outside of the first substrate 10 to the outside of the display unit 20. Since elements and wiring are arranged to bypass the transmissive region 200, no elements and wiring are arranged in the transmissive region 200. The transmissive region 200 does not include at least a fourth insulating film 15. The insulating film 14 arranged in the transmissive region 200 includes a transparent insulating material.

[0052] The display area 100 includes a light-emitting area 102 and a circuit area 101. A first pixel PX1 is disposed in the display area 100. A light-emitting element EL1 of the first pixel PX1 is disposed in the light-emitting area 102. A pixel circuit of the first pixel PX1, which is electrically connected to the light-emitting element EL1 and includes a thin-film transistor TR1, is disposed in the circuit area 101. The circuit area 101 and the light-emitting area 102 do not overlap, so that the light-emitting element EL1 and the pixel circuit are disposed adjacent to each other without overlapping. The circuit area 101 is not limited to having one thin-film transistor TR1 disposed therein as shown in the figure, but further includes a number of thin-film transistors and capacitors, and further includes wiring such as scan lines, data lines, and power lines connected thereto.

[0053] The thin film transistor TR1 includes a semiconductor layer 111 on a buffer film 11, a gate electrode 112, a source electrode 113, and a drain electrode 114. A first insulating film 12 between the semiconductor layer 111 and the gate electrode 112 can function as a gate insulating film, and a second insulating film 13 between the gate electrode 112 and the source electrode 113 and the drain electrode 114 can function as an interlayer insulating film.

[0054] The light-emitting element EL1 includes a first electrode 116 on a third insulating film 14 covering the thin-film transistor TR1, a second electrode 130 facing the first electrode 116, and an intermediate layer 117 between the first electrode 116 and the second electrode 130.

[0055] The edge of the first electrode 116 is covered by the fourth insulating film 15, and the center of the first electrode 116 is exposed. The fourth insulating film 15 is provided so as to cover the display region 100, but is not necessarily provided so as to cover the entire display region 100. It is sufficient if the fourth insulating film 15 can cover at least a part of the display region 100, particularly only the edge of the first electrode 116.

[0056] An auxiliary layer 118 is provided on the third insulating layer 14 corresponding to the transmissive region 200 exposed through the fourth insulating layer 15. That is, the auxiliary layer 118 is disposed so as not to overlap with the intermediate layer 117.

[0057] The thickness of the auxiliary layer 118 may be 1 nm or more and 2,000 nm or less. The thickness of 8 may be, but is not limited to, 1 nm to 50 nm. If the thickness satisfies this range, the effect of patterning the second electrode can be sufficiently obtained, as described below, while the transmittance of the transmissive region 200 is secured to be relatively high.

[0058] The auxiliary layer 118 includes a first material and a third material.

[0059] A second electrode 130 is provided on the intermediate layer 117. The second electrode 130 is disposed corresponding to only the display area 100, and is not disposed in the transmissive area 200.

[0060] The second electrode 130 includes a second material.

[0061] The first material and the second material satisfy the following formula 1, ST2-ST1>0mJ / m 2 <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is the surface energy of the second material at 25°C.

[0062] The first material is applied to the entire surface (i.e., both the display area 100 and the transmissive area 200) using a dry process and / or a wet process to form a first layer. Specifically, in the dry process, deposition is performed on the entire surface using an open mask, and in the wet process, coating is performed on the entire surface.

[0063] Next, the third material is evaporated using a fine metal mask so as to correspond only to the transmissive region 200, thereby forming a second layer.

[0064] Then, the first material arranged corresponding to the display area 100 can be removed. Specifically, the entire surface is subjected to a plasma treatment, for example, a plasma heat treatment, to remove the first material exposed on the surface, thereby forming the auxiliary layer 118. Since the third material is deposited to correspond to the transmissive area 200, the transmissive area 200 remains in a state in which the first material and the third material are not removed even when the plasma treatment is performed. During the above process, the first material is diffused from the first layer in the direction of the second layer, so that the interface between the first layer and the second layer disappears. At the same time, the concentration of the first material is increased on one side of the auxiliary layer 118, specifically, on the side farther from the first substrate 10.

[0065] Then, the second material is deposited on both the display area 100 and the transmissive area 200 using an open mask. At this time, the surface energies of the first material and the second material are controlled to be different from each other, so that the second material is not substantially deposited on the area where the first material is disposed. That is, the second material is relatively well deposited on the intermediate layer 117, but is relatively poorly deposited on the auxiliary layer 118 including the first material. Therefore, since the auxiliary layer 118 including the first material is disposed corresponding to the transmissive area 200, the second electrode 130 including the second material is not substantially provided in the transmissive area 200, but is disposed only corresponding to the display area 100.

[0066] 2 and 3, the auxiliary layer 118 is disposed in the area where the second electrode 130 should not be disposed, and the auxiliary layer 118 is not disposed in the area where the second electrode 130 should be disposed. As a result, when the second material is evaporated, even if the second material is evaporated in both the display area 100 and the transmissive area 200 of all pixels using an open mask, the metal is evaporated substantially only on the exposed surface of the intermediate layer 117 and not substantially on the surface of the auxiliary layer 118, so that the effect of patterning the second electrode 130 is obtained.

[0067] In order to increase the transmittance of the transmissive region 200, the second electrode 130 should not be substantially disposed in the transmissive region 200. When a fine metal mask is used to form the second electrode 130 disposed only in the display region 100, the deposition temperature is high, and the fine metal mask deforms over long-term use. This creates very unstable process factors, such as problems such as shadow phenomena. However, the display device 1 according to the embodiment of the present invention is advantageous in process because the patterning effect of the second electrode 130 is automatically obtained as described above.

[0068] Furthermore, since the second electrode 130 is not substantially disposed in the transmissive region 200, the transmittance of the transmissive region 200 is improved. That is, the second electrode is disposed corresponding to only the display region 100, and the second electrode 130 does not exist in the transmissive region 200, and the transmittance of the transmissive region 200 is improved.

[0069] In an embodiment, the auxiliary layer 118 includes a first region and a second region. The second region is interposed between the first region and the first substrate 10. That is, the second region and the first region are sequentially disposed along a direction from the first substrate 10 toward the display unit 20.

[0070] The concentration of the first material in the first region is different from the concentration of the first material in the second region. Specifically, the concentration of the first material in the first region is higher than the concentration of the first material in the second region. More specifically, the first region includes a maximum concentration position of the first material.

[0071] In another embodiment, the auxiliary layer 118 further includes a third region. The third region is provided between the second region and the first substrate 10. That is, the third region, the second region, and the first region are sequentially arranged along a direction from the first substrate 10 toward the display unit 20.

[0072] The concentration of the first material in the second region is different from the concentration of the first material in the third region. Specifically, the concentration of the first material in the second region is lower than the concentration of the first material in the first region and the concentration of the first material in the third region. More specifically, the concentration of the first material gradually decreases from one surface of the auxiliary layer 118 along the other surface opposite to the one surface, and then gradually increases again, but is not limited thereto.

[0073] The auxiliary layer 118 is formed by providing a first material to form a first layer, and then providing a third material on the first layer to form a second layer. Immediately after the auxiliary layer 118 is formed, an interface between the first layer and the second layer may exist. However, over time, the first material diffuses from the first layer toward the second layer, and the interface between the first layer and the second layer disappears or becomes less visible. Finally, the auxiliary layer 118 exhibits an appearance in which the first material and the second material are either homogeneous or heterogeneous mixed, thereby exhibiting a concentration profile of the first material, as described above.

[0074] In one embodiment, ST2-ST1 is 30 mJ / m 2 More specifically, 50 mJ / m 2 If the above range is satisfied, the second material is not substantially deposited on the first material.

[0075] Specifically, ST1 is 0 mJ / m 2 Greater than 30mJ / m 2 If this range is satisfied, the second material is not substantially deposited on the first material. Specifically, ST1 is 20 mJ / m or less. 2 These include, but are not limited to, the following:

[0076] In one embodiment, the first material is an organic compound. Specifically, the first material is a fluorine-containing organic compound. More specifically, the first material is an organic compound with a relatively high fluorine content.

[0077] For example, the first material contains 20 at % or more of fluorine. If this range is satisfied, the surface energy of the first material is low enough that the second material is not substantially deposited on the first material. The fluorine content of the first material is obtained by analyzing the first material using X-ray photoelectron spectroscopy (XPS). Specifically, the first material may contain 50 at % or more of fluorine, but is not limited thereto.

[0078] For example, as described above, the first material is made of an organic compound, and the first material includes a fluorine-containing silane compound, a fluorine-based polymer compound, or any combination thereof.

[0079] The fluorine-containing silane compound is, for example, trichloro(1H,1H,2H,2H-perfluorodecyl)silane, trichloro(1H,1H,2H,2H-perfluoro-n-octyl)silane, triethoxy-1H,1H,2H,2H-perfluorodecyl ... cylsilane, 1H,1H,2H,2H-Nonafluorohexyltriethoxysilane, 1H,1H,2H,2H-Tridecafluoro-n-octyltriethoxysilane, 1H,1H,2H,2H-Heptadecafluorodecyltrimethoxysilane rimethoxysilane), 1H,1H,2H,2H-Nonafluorohexyltrimethoxysilane, Trimethoxy(1H,1H,2H,2H-perfluoro-n-octyl)silane, 1,1,1-Trifluoro-3-(trimethoxysilyl)propane ilyl)propane}, (Triethylsilyl)trifluoromethane}, Triethoxy[5,5,6,6,7,7,7-heptafluoro-4,4-bis(trifluoromethyl)heptyl]silane}, Trichloro(3,3,3-trifluoropropyl)silaneExamples of silanes include, but are not limited to, dimethoxy(methyl)(3,3,3-trifluoropropyl)silane, dichloro(methyl)(3,3,3-trifluoropropyl)silane, and dichloro(methyl)(3,3,3-trifluoropropyl)silane.

[0080] The fluorine-based polymer compound may be poly(hexafluoropropylene oxide), polytetrafluoro-co-hexafluoropropylene, poly(decafluorooctyl acrylate), poly(tetrafluoro-3-(heptafluoropropoxy)propyl acrylate, poly(tetrafluoro-3-(heptafluoroethoxy)propyl acrylate), poly(tetrafluoroethylene), tetrafluoroethylene hexafluoropropylene vinylidene fluoride, fluoride), poly(undecafluorohexylacrylate), poly(nonafluoropentyl acrylate), poly(tetrafluoro-3-(trifluoromethoxy)propyl acrylate), poly(pentafluorovinyl propionate), poly(heptafluorobutyl acrylate), poly(trifluorovinyl acetate), poly(1,1,1,3,3,3-hexafluoroisopropyl acrylate),3-hexafluoroisopropyl acrylate), poly(octafluoropentyl acrylate), poly(methyl3,3,3-trifluoropropyl siloxane), poly(2,2,3,3,4,4,4-heptafluorobutyl methacrylate), poly(pentafluoropropyl acrylate), poly(2,2,3,3,3-pentafluoropropyl acrylate), Examples of suitable fluoropolymers include, but are not limited to, poly(2-heptafluorobutoxy)ethylacrylate, poly(chlorotrifluoroethylene) and poly(1,1,1,3,3,3-hexafluoroisopropyl methaacrylate).

[0081] More specifically, the molecular weight of the first material may be 1500 or less, but is not limited thereto.

[0082] The greater the difference between ST2 and ST1, the more likely it is that the second material will not be substantially deposited on the first material, so that ST2 must be less than 30 mJ / m 2 or ST2 may be 100 mJ / m 2 It may be more than this, but is not limited to this.

[0083] In one embodiment, the second material is an inorganic compound, particularly a metal-containing inorganic compound.

[0084] For example, the second material includes magnesium (Mg), silver (Ag), aluminum (Al), lithium (Li), calcium (Ca), indium (In), or any combination thereof. Specifically, the second material includes Mg, Ag, Al, or any combination thereof.

[0085] In one embodiment, the third material has a molecular weight of 1500 or less, and the third material is made of an organic compound.

[0086] For example, the third material is selected from organic compounds used to form the various functional layers included in the intermediate layer 117, but is not limited thereto. Specifically, the third material may include a compound commonly used in a hole transport layer or a hole injection layer, such as an aromatic amine compound or a conductive polymer compound.

[0087] More specifically, the third material may be M-MTDATA, TDATA, 2-TNATA, NPB (NPD), β-NPB, TPD, Spiro-TPD, Spiro-NPB, methylated-NPB, TCTA (4,4',4"-tris(N-carbazolyl)triphenylamine), PANI / DBSA (Polyaniline / Dodecylbenzenesulfonic acid), PEDOT / PSS (Poly(3,4-ethylenedioxythiophene) / Poly(4-styrenesulfonate), PEDOT / PSS / PFI (Poly(3,4-ethylenedioxythiophene / Poly(4-styrenesulfonate) / perfluoroionomer), PANI / CSA (Polyaniline / Camphor sulfonic acid), PANI / PSS (Polyaniline / Poly(4-styrenesulfonate)), and any combination thereof.

[0088] TIFF2025020337000002.tif166170

[0089] The first pixel PX1 may be, for example, a first red pixel Pr, a first green pixel Pg, and a first blue pixel Pb, but the present invention is not limited thereto and any color combination is possible as long as it can realize white light by combination.

[0090] Fig. 4 is a cross-sectional view showing a display device 1B according to another embodiment of the display device of Fig. 2. Fig. 5 is a cross-sectional view showing the display unit 20 of Fig. 4 in more detail.

[0091] As described above, the auxiliary layer 118 is disposed only in the transmissive region 200. Meanwhile, the second electrode 103 is disposed corresponding to both the display region 100 and the transmissive region 200, unlike FIG.

[0092] 5, when the second material is evaporated using an open mask, the first portion 130a of the second electrode 130 is disposed on the intermediate layer 117 in correspondence with the display area 100, and the second portion 130b of the second electrode 130 is disposed on the auxiliary layer 118 in correspondence with the transmissive area 200. 1 and the thickness T of the second portion 130b 2 satisfies the following formula 2. T 1 >T 2 <Formula 2>

[0093] Since the formula 2 is satisfied, the decrease in transmittance caused by the second portion 130b can be reduced.

[0094] Here, T 1 means the average thickness of the second electrode in all the first portions, and T 2 means the average thickness of the second electrode in all second portions, where the area in which the second material is deposited as an open mask consists of the sum of all first portions and all second portions.

[0095] However, the above does not exclude the case where the second electrode is deposited in a part of the transmissive region 200 by agglomeration, and the second electrode may be deposited in the transmissive region 200 in an island shape.

[0096] Specifically, T 2 is greater than 0 nm and less than or equal to 1 nm. More specifically, T 2 is greater than 0 nm and equal to or less than 0.1 nm. If this range is satisfied, the second electrode 130 is not substantially disposed in the transmissive region 200.

[0097] Each component has the same or similar function as the corresponding component in the embodiment of FIG. 2 and FIG. 3 described above, so a detailed description thereof will be omitted.

[0098] 6 and 7 are a cross-sectional view and a plan view showing a display device 2A according to another embodiment of the present invention, in which FIG 7 is a plan view showing adjacent first pixels PX1, for example, a first red pixel Pr, a first green pixel Pg, and a first blue pixel Pb, and FIG 6 is a cross-sectional view taken along line A-A' of FIG 7.

[0099] Unlike the display device 1A shown in Figures 2 and 3, in the display device 2A shown in Figures 6 and 7, the circuit region 101 and the light-emitting region 102 included in the display region 100 are arranged so as to overlap each other in a plane.

[0100] In addition, adjacent transmissive regions 200 of a plurality of first pixels PX1, for example, the first red pixel Pr, the first green pixel Pg, and the first blue pixel Pb, can be connected to each other to form a common transmissive region 200. In this case, the area of ​​the transmissive region 200 is larger than that in the embodiments of Figures 2 and 3. This can increase the transmittance of the display device 2A.

[0101] Each component has the same or similar function as the corresponding component in the embodiment of FIG. 2 and FIG. 3, so a detailed description thereof will be omitted.

[0102] FIG. 8 is a cross-sectional view that illustrates a display device 2B according to another embodiment of the display device of FIG.

[0103] As described above, the auxiliary layer 118 is disposed only in the transmissive region 200. Meanwhile, the second electrode 103 is disposed corresponding to both the display region 100 and the transmissive region 200, unlike FIG.

[0104] When the second material is evaporated using an open mask, a first portion 130a of the second electrode 130 is disposed on the intermediate layer 117 in correspondence with the display area 100, and a second portion 130b of the second electrode 130 is disposed on the auxiliary layer 118 in correspondence with the transmissive area 200. The thickness of the first portion 130a is equal to a first thickness T 1 and the thickness of the second portion 130b is represented by a second thickness T 2 The second thickness T is 2 and the first thickness T 1 satisfies the following formula 2, T 1 >T 2 <Formula 2> In the above formula 2, T 1 is the thickness of the second electrode in the display area, T 2 is the thickness of the second electrode in the transmissive region.

[0105] Since the formula 2 is satisfied, the decrease in transmittance caused by the second portion 130b can be suppressed.

[0106] Specifically, T 2 is greater than 0 nm and less than 1 nm. More specifically, T 2 is greater than 0 nm and equal to or less than 0.1 nm. If this range is satisfied, the second electrode 130 is not substantially disposed in the transmissive region 200.

[0107] Each component has the same or similar function as the corresponding component in the embodiment of FIGS. 2 to 4 described above, so a detailed description thereof will be omitted.

[0108] 9 to 16 are cross-sectional views showing a method for manufacturing a display device 1A according to an embodiment of the present invention.

[0109] 9 to 16, a manufacturing method of a display device 1A according to one embodiment of the present invention includes the steps of providing a first substrate and providing a display unit on the first substrate, the display unit including a display area and a transmissive area, the step of providing the display unit includes the steps of providing an auxiliary layer arranged corresponding to the transmissive area by providing a first material on the display area and the transmissive area and providing a third material only on the transmissive area, and then removing the first material on the display area, and providing a second electrode, the auxiliary layer including a first material and a third material, and the second electrode including a second material, and an explanation of the first material and the second material is as described above.

[0110] A method for manufacturing a display device 1A according to an embodiment of the present invention will now be described in detail with reference to the drawings.

[0111] 9, a buffer film 11 is provided on a first substrate 10, and a pixel circuit including a thin film transistor TR1 is provided on the buffer film 11.

[0112] The first substrate 10 includes a glass material, a ceramic material, a metal material, a plastic material, or a material having flexible or bendable properties.

[0113] The buffer film 11 functions to block the penetration of impurity elements through the first substrate 10 and to flatten the surface. x ) and / or silicon oxide (SiO x The buffer film 11 may be omitted.

[0114] A semiconductor layer 111 of the first pixel PX1 of the display device 1A is provided on the buffer layer 11. The semiconductor layer 111 may include various materials. For example, the semiconductor layer 111 may include an inorganic semiconductor material such as amorphous silicon or crystalline silicon. As another example, the semiconductor layer 111 may include an oxide semiconductor or an organic semiconductor material.

[0115] A first insulating film 12 is provided on the buffer film 11 so as to cover the semiconductor layer 111, and a gate electrode 112 of the first pixel PX1 is provided on the first insulating film 12.

[0116] The first insulating film 12 is made of SiO 2 , SiN x , SiON, Al 2 O 3 , TiO 2 , Ta 2 O 5 , HfO 2 , ZrO 2 The first insulating film 12 is formed in a single layer or in multiple layers of one or more insulating films selected from the group consisting of SiO 2 , BST, and PZT. The first insulating film 12 is also an inorganic insulating film.

[0117] The gate electrode 112 is formed of various conductive materials. For example, the gate electrode 112 is formed of one or more materials selected from aluminum (Al), platinum (Pt), palladium (Pd), silver (Ag), magnesium (Mg), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir), chromium (Cr), lithium (Li), calcium (Ca), molybdenum (Mo), titanium (Ti), tungsten (W), and copper (Cu) in a single layer or multiple layers. For example, the gate electrode 112 is formed of three layers of Mo / Al / Mo or Ti / Al / Ti. A second insulating film 13 is provided on the first insulating film 12 so as to cover the gate electrode 112, and a source electrode 113 and a drain electrode 114 of the first pixel PX1 are provided on the second insulating film 13 and are electrically connected to the semiconductor layer 111 through contact holes.

[0118] The second insulating film 13 is also an inorganic insulating film. 2 , SiN x , SiON, Al 2 O 3 , TiO 2 , Ta 2 O 5 , HfO 2 , ZrO 2, BST, PZT, or the like, may be formed as a single layer or multiple layers. In another embodiment, the second insulating film 13 may be an organic insulating film.

[0119] The source electrode 113 and the drain electrode 114 are formed of various conductive materials. For example, the source electrode 113 and the drain electrode 114 are formed of a single layer or multiple layers of one or more materials selected from aluminum (Al), platinum (Pt), palladium (Pd), silver (Ag), magnesium (Mg), gold (Au), nickel (Ni), neodymium (Nd), iridium (Ir), chromium (Cr), lithium (Li), calcium (Ca), molybdenum (Mo), titanium (Ti), tungsten (W), and copper (Cu). For example, the source electrode 113 and the drain electrode 114 are formed of two or more layers. The structure of the thin film transistor TR1 is not necessarily limited to that shown in the drawing, and it goes without saying that various types of thin film transistor structures are applicable.

[0120] A third insulating film 14 is provided so as to cover the thin film transistor TR1 of the first pixel PX1.

[0121] The third insulating film 14 is formed of a single-layer or multi-layer organic insulating film with a flattened upper surface. The third insulating film 14 includes general-purpose polymers (PMMA, PS), polymer derivatives having a phenol group, acrylic polymers, imide polymers, aryl ether polymers, amide polymers, fluorine polymers, p-xylene polymers, vinyl alcohol polymers, and blends thereof. For example, the third insulating film 14 includes polyimide, polyamide, acrylic resin, etc.

[0122] Generally, the surface energy of the compound contained in the third insulating film 14 is 100 mJ / m 2Therefore, if the second material is directly deposited on the third insulating film 14 using an open mask in both the display area 100 and the transmissive area 200 without forming the auxiliary layer 118 in the transmissive area 200, the effect of patterning the second electrode 130 cannot be obtained at all because the surface energy of the compound contained in the third insulating film 14 is the same as or similar to the surface energy of the second material.

[0123] A first electrode 116 of the light-emitting element EL1 electrically connected to the thin film transistor TR1 of the first pixel PX1 is provided on the third insulating film 14. The first electrode 116 is provided corresponding to the display region 100.

[0124] When the light emitting element EL1 is a front light emitting element, the first electrode 116 is formed of a reflective electrode. The reflective electrode includes a reflective layer containing Ag, Mg, Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, or a compound thereof, and a transparent or semi-transparent electrode layer formed on the reflective layer. When the light emitting element EL1 is a rear light emitting element, the first electrode 116 is formed of ITO, IZO, ZnO, or In. 2 O 3 and is composed of transparent or semi-transparent electrodes.

[0125] 9, the buffer film 11, the first insulating film 12, the second insulating film 13, and the third insulating film 14 are provided to cover both the display region 100 and the transmissive region 200, respectively. However, the embodiment of the present invention is not limited thereto, and at least one of the buffer film 11, the first insulating film 12, the second insulating film 13, and the third insulating film 14 may have an opening (not shown) at a position corresponding to the transmissive region 200, thereby further increasing the external light transmission efficiency of the transmissive region 200.

[0126] External light is perceived by a user by passing through the transmissive region 200. Therefore, only a transparent insulating film or the like is disposed in the transmissive region 200, and the transmittance of the transmissive region 200 can be increased by minimizing reflection occurring at the boundary surface of the film disposed in the transmissive region 200.

[0127] The interface reflection increases as the difference in refractive index between adjacent layers increases. According to an embodiment, the buffer layer 11, the first insulating layer 12, the second insulating layer 13, and the third insulating layer 14 are all single layers having substantially the same refractive index. By configuring the buffer layer 11, the first insulating layer 12, the second insulating layer 13, and the third insulating layer 14 arranged in the transmissive region 200 to have the same refractive index, the interface reflection occurring between layers can be minimized and the transmittance of the transmissive region 200 can be increased.

[0128] 10, a fourth insulating film 15 is provided on the third insulating film 14 to cover the edge of the first electrode 116. The fourth insulating film 15 is formed of a single layer or multiple layers of an inorganic insulating film or an organic insulating film.

[0129] The fourth insulating film 15 is arranged to cover the display region 100 of the display device 1A, but is not necessarily arranged to cover the entire display region 100; it is sufficient for it to cover at least a portion of it, in particular the edge of the first electrode 116 of the first pixel PX1.

[0130] The fourth insulating film 15 may have a first opening 15a exposing at least a portion of the first electrode 116 of the first pixel PX1, and a second opening 15b located at a position corresponding to the transmissive region 200. Since the fourth insulating film 15 is not located in the transmissive region 200, the external light transmittance efficiency of the transmissive region 200 is further increased.

[0131] Referring to FIG. 11, a first layer 118a including a first material is provided on the entire surface of the first substrate 10 (i.e., the fourth insulating film 15, the first electrode 116 exposed through the first opening 15a of the first pixel PX1, and the third insulating film 14 exposed through the second opening 15b).

[0132] In one embodiment, the first material is provided by a dry process, for example blanket deposition using an open mask. In another embodiment, the first material is coated over the entire surface using a wet process.

[0133] Referring to FIG. 12, a second layer 118b including a third material is provided on the first layer 118a exposed through the second opening 15b.

[0134] In one embodiment, the third material is provided only in the transmissive region 200 using a mask having an opening M11 corresponding to the transmissive region 200 of the display device 1A, for example, a fine metal mask (FMM). M is used for deposition.

[0135] Referring to FIG. 13, the auxiliary layer 118 can be formed by removing the first layer 118a disposed corresponding to the display area 100. As shown in FIG.

[0136] In one embodiment, the first layer 118a is removed by performing a plasma treatment, for example, a plasma heat treatment, on the entire surface. The auxiliary layer 118 is completed by removing the first layer 118a. Since the third material is deposited to correspond to the transmissive region 200, the transmissive region 200 remains in a state in which the first material and the third material are not removed even when the plasma treatment is performed. During the process, the first material is diffused from the first layer toward the second layer, so that the interface between the first layer and the second layer disappears. At the same time, the concentration of the first material is high on one side of the auxiliary layer 118, specifically, on the side farther from the first substrate 10. As a result, even if the second electrode is immediately formed without the process of removing the second layer 118b, patterning is possible due to the surface energy difference between the first material and the second material.

[0137] Referring to FIG. 14, an intermediate layer 117 is provided on the first electrode 116 exposed through the first opening 15a of the first pixel PX1.

[0138] The intermediate layer 117 includes a light-emitting layer that emits light, and further includes at least one functional layer selected from a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL). However, the present embodiment is not limited thereto, and various functional layers may be further disposed on the first electrode 116.

[0139] The light emitting layer is a red light emitting layer, a green light emitting layer, or a blue light emitting layer, or the light emitting layer has a multi-layer structure in which a red light emitting layer, a green light emitting layer, and a blue light emitting layer are stacked to emit white light, or has a single layer structure containing a red light emitting material, a green light emitting material, and a blue light emitting material.

[0140] In one embodiment, the intermediate layer 117 is provided only in the light emitting region 102 using a mask, for example a fine metal mask (FMM), having an opening M21 corresponding to the light emitting region 102 of the display device 1A.

[0141] In another embodiment, of the intermediate layer 117, the light-emitting layer is provided only in the light-emitting region 102 using an FMM (Fine Metal Mask) having an opening M21 corresponding to the light-emitting region 102 of the display device 1A, and the other functional layers are provided on the entire surface of the first substrate 10 using an open mask.

[0142] In an embodiment of the present invention, the transmissive area 200 of the display device 1A is at least not provided with a light-emitting layer.

[0143] Referring to FIG. 15, in one embodiment, a second electrode 130 is provided on the intermediate layer 117 or on the intermediate layer 117 and the auxiliary layer 118 .

[0144] The second electrode 130 is provided by depositing the second material using an open mask. At this time, the surface energies of the first material of the auxiliary layer 118 and the second material of the second electrode 130 are controlled differently from each other, so that the second material is not substantially provided in the transmissive region 200 where the first material is provided. That is, the second material is easily deposited on the intermediate layer 117, but is difficult to deposit on the auxiliary layer 118 including the first material. Therefore, since the auxiliary layer 118 including the first material is disposed corresponding to the transmissive region 200, the second electrode 130 including the second material is not substantially provided in the transmissive region 200 and is disposed only corresponding to the display region 100. Referring to FIG. 16, a second substrate is aligned on the top of the first substrate 10, and then the first substrate 10 and the second substrate are bonded together.

[0145] The second substrate comprises a glass material, a ceramic material, a metal material, a plastic material, or a material having flexible or bendable properties.

[0146] A black matrix BM and a color filter CF are disposed on the surface of the second substrate facing the first substrate 10. The color filter CF is disposed so as to correspond to the light-emitting region 102 of the display device 1A. The black matrix BM is disposed so as to correspond to an area excluding the light-emitting region 102 and the transmissive region 200 of the display device 1A. In other words, the black matrix (BM) is not disposed in the transmissive region 200 of the display device 1A.

[0147] Although not shown, a protective layer is further disposed on the second electrode 130 before bonding the second substrate to the first substrate 10. The protective layer may be a single layer or multiple layers of an inorganic film and / or an organic film.

[0148] Although not shown, various functional layers may be further provided on the upper surface of the second substrate, such as an anti-reflection layer that minimizes reflection on the upper surface of the second substrate, and an anti-contamination layer that prevents contamination such as a user's handprint (e.g., a fingerprint).

[0149] In another embodiment, instead of the second substrate described above, a thin film encapsulation layer is disposed on the first substrate 10. The thin film encapsulation layer includes an inorganic encapsulation layer made of at least one inorganic material and an organic encapsulation layer made of at least one organic material. In some embodiments, the thin film encapsulation layer has a structure in which a first inorganic encapsulation layer / an organic encapsulation layer / a second inorganic encapsulation layer are stacked.

[0150] Since the auxiliary layer 118 is formed first and then the second electrode 130 is formed, various modifications in the process are possible.

[0151] The display device 1 is embodied as an electronic device 1000 such as a mobile phone, a videophone, a smart phone, a smart pad, a smart watch, a tablet PC, a notebook computer, a computer monitor, a television, a digital broadcasting terminal, a PDA (Personal Digital Assistant), a PMP (Portable Multimedia Player), a head mounted display device (HMD), or a vehicle navigation system.

[0152] Fig. 17 is a block diagram showing a schematic configuration of an electronic device according to an embodiment of the present invention, and Fig. 18A and Fig. 18B are perspective views showing a schematic configuration of an electronic device according to an embodiment of the present invention.

[0153] 17, an electronic device 1000 includes a processor 1010, a memory device 1020, a storage device 1030, an input / output device 1040, a power supply 1050, and a display device 1060. In this case, the display device 1060 may correspond to the display device 1 of FIG 1. The electronic device 1000 may further include a number of ports capable of communicating with a video card, a sound card, a memory card, a USB device, etc., or communicating with other systems.

[0154] In one embodiment, the electronic device 1000 is embodied as a television as shown in Fig. 18A. In another embodiment, the electronic device 1000 is embodied as a smartphone as shown in Fig. 18B. However, these are merely examples, and the electronic device 1000 is not limited thereto. Next, with reference to FIG. 19, the presence or absence of the second electrode 130 depending on the presence or absence of the first layer 118a will be described.

[0155] The graph displayed in Comparative Example 1 is a transmittance graph of Sample 1. Sample 1 is a glass substrate having a thickness of 0.5 mm. The graph displayed in Comparative Example 2 is a transmittance graph of Sample 2. Sample 2 is a substrate in which a 9 nm thick AgMg thin film is formed by evaporating AgMg (weight ratio = 10:1) on a 0.5 mm thick glass substrate. The graph displayed in Example 1 is a transmittance graph of Sample 3. Sample 3 is a substrate manufactured by forming a first layer containing a first material to a thickness of 10 nm on a 0.5 mm thick glass substrate, and then evaporating AgMg to a thickness of 9 nm. The closer the transmittance graph is to that of Comparative Example 1, the less the second electrode is formed.

[0156] 19, it can be seen that the graph of the example is significantly closer to the graph of Comparative Example 1 than the graph of Comparative Example 2. This confirms that the second electrode is not substantially formed by forming the auxiliary layer.

[0157] Next, with reference to FIG. 20, the presence or absence of the second electrode 130 depending on the presence or absence of the second layer 118b containing the third material will be described.

[0158] The graph displayed in Comparative Example 3 is a transmittance graph of Sample 4. Sample 4 is a substrate in which a second layer containing a third material is formed to a thickness of 152 nm on a glass substrate having a thickness of 0.5 mm. The graph displayed in Comparative Example 4 is a transmittance graph of Sample 5. Sample 5 is a substrate in which a first layer containing a first material is formed to a thickness of 10 nm on a glass substrate having a thickness of 0.5 mm, and then a second layer containing a third material is formed to a thickness of 152 nm. The graph displayed in Example 2 is a transmittance graph of Sample 6. Sample 6 is a substrate in which a first layer containing a first material is formed to a thickness of 10 nm on a glass substrate having a thickness of 0.5 mm, and then a second layer containing a third material is formed to a thickness of 152 nm, and then AgMg (weight ratio = 10:1) is evaporated to form a 9 nm thick AgMg thin film. The closer the transmittance graph is to Comparative Example 4, the less the second electrode is formed.

[0159] 20, it can be seen that the graph of Example 2 is almost similar to the graph of Comparative Example 4. This confirms that the second electrode is not substantially formed on the auxiliary layer without a separate process of removing the second layer.

[0160] Next, with reference to FIG. 21, the distribution of the first material within the auxiliary layer 118 will be described.

[0161] (a) is the XPS result of sample 4, and (b) is the XPS result of sample 6. Comparing (a) and (b), it can be confirmed that the concentration of fluorine is high on one side of the auxiliary layer 118, specifically on the side farther from the organic substrate. The fluorine originates from the first material. (b) shows that the first layer 118a is formed as the first material on the glass substrate, and then the second layer 118b is formed as the third material. It can be predicted that the first material is diffused and the concentration of the first material is high on the side of the auxiliary layer 118 farther from the glass substrate. Since the first material is present in a sufficiently high concentration on the surface of the auxiliary layer 118, it can be confirmed that the second electrode is patterned.

[0162] Thus, the present invention has been described based on the embodiments shown in the drawings, but these are merely illustrative, and those skilled in the art will understand that various modifications and changes to the embodiments are possible. Therefore, the technical scope of the present invention should be determined by the technical ideas of the claims. [Explanation of symbols]

[0163] 1 Display device 10 First board 11 Buffer film 12 First insulating film 13 Second insulating film 14 Third insulating film 15 Fourth insulating film 20 Display section 1A display device 61 First Outdoor Light 62 Second Pane 100 display area 101 Circuit area 102 Light-emitting area 111 Semiconductor layer 112 Gate electrode 113 Source Electrode 114 Drain electrode 116 1st electrode 117 Middle Class 118 Auxiliary layer 130 2nd electrode 200 Transparent area TR1 Thin Film Transistor PX1 1st pixel EL1 light emitting element

Claims

1. A first substrate and a display unit, The display unit includes a display area and a transmissive area. The display unit includes: an auxiliary layer disposed corresponding to the transmissive region; and a second electrode disposed apart from the auxiliary layer and corresponding only to the display region; the auxiliary layer includes a first material and a third material; the first material is disposed on a surface of the auxiliary layer; the second electrode comprises a second material; The first material and the second material satisfy the following formula 1, The auxiliary layer includes a first region and a second region interposed between the first region and the first substrate. Including, a concentration of the first material in the first region and a concentration of the first material in the second region are different from each other; ST2-ST1>0mJ / m ２ <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is the surface energy of the second material at 25° C.

2. The display device according to claim 1 , wherein the second electrode is not present in the transmissive region.

3. The display of claim 1 , wherein the first region includes a location having a maximum concentration of a first material.

4. The auxiliary layer further includes a third region, the third region is interposed between the second region and the first substrate, The display device according to claim 1 , wherein a concentration of the first material in the second region and a concentration of the first material in the third region are different from each other.

5. ST1 is 0 mJ / m ２ Greater than 30 mJ / m ２ 2. The display device according to claim 1, wherein:

6. The display device according to claim 1 , wherein the first material has a molecular weight of 1,500 or less.

7. The display device of claim 1 , wherein the second material comprises magnesium (Mg), silver (Ag), aluminum (Al), lithium (Li), calcium (Ca), indium (In), or any combination thereof.

8. The display device according to claim 1 , wherein the third material has a molecular weight of 1,500 or less.

9. A first substrate and a display unit are included. The display unit includes a display area and a transmissive area. the display unit includes an auxiliary layer disposed in correspondence with the transmissive region, and a second electrode disposed in correspondence with the display region and a portion of the transmissive region in which the auxiliary layer is disposed, the auxiliary layer includes a first material and a third material; the first material is disposed on a surface of the auxiliary layer; the second electrode comprises a second material; The first material and the second material satisfy the following formula 1, the auxiliary layer includes a first region and a second region interposed between the first region and the first substrate, a concentration of the first material in the first region and a concentration of the first material in the second region are different from each other; ST2-ST1>0mJ / m ２ <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is the surface energy of the second material at 25° C.

10. a first portion of the second electrode is disposed in correspondence with the display area; a second portion of the second electrode is disposed in correspondence with the transmissive region; The thickness T1 of the first portion and the thickness T2 of the second portion satisfy the following Equation 2: T １ >T ２ <Formula 2> The display device according to claim 9.

11. The display device according to claim 10 , wherein T2 is greater than 0 nm and equal to or less than 1 nm.

12. 10. The display of claim 9, wherein the first region includes a location having a maximum concentration of a first material.

13. The auxiliary layer further includes a third region, the third region is interposed between the second region and the first substrate, The display device according to claim 9 , wherein a concentration of the first material in the second region and a concentration of the first material in the third region are different from each other.

14. ST1 is 0 mJ / m ２ Greater than 30 mJ / m ２ The display device according to claim 9 , wherein:

15. The display device according to claim 9 , wherein the first material has a molecular weight of 1500 or less.

16. The display device of claim 9 , wherein the second material comprises magnesium (Mg), silver (Ag), aluminum (Al), lithium (Li), calcium (Ca), indium (In), or any combination thereof.

17. The display device according to claim 9 , wherein the third material has a molecular weight of 1500 or less.

18. Providing a first substrate; providing a display unit on the first substrate, the display unit including a display area and a transmissive area; The step of providing a display unit includes: providing a first material on the display area and the transmissive area, providing a third material only on the transmissive area, and then removing the first material on the display area to provide an auxiliary layer disposed corresponding to the transmissive area; and providing a second electrode. the auxiliary layer includes a first material and a third material; the second electrode comprises a second material; The first material and the second material satisfy the following formula 1, ST2-ST1>0mJ / m ２ <Formula 1> In the above formula 1, ST1 is the surface energy of the first material at 25° C. ST2 is a surface energy of the second material at 25° C. A method for manufacturing a display device.

19. The method for manufacturing a display device according to claim 18 , wherein the third material is provided by vapor deposition using a fine metal mask.

20. The method of claim 18 , wherein the second electrode is provided by evaporating the second material using an open mask.

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