Exposure apparatus

Abstract

To provide a technique capable of accurately drawing a pattern even in a case where distortion occurs in a support member of an exposure head by movement of a stage.SOLUTION: An exposure apparatus 100 has a base 1, a stage 2, a stage moving mechanism 3, a gantry 4, an exposure head 51, a displacement sensor 6, and a control part 9. The stage 2 is capable of holding a substrate W, and supported by the base 1. The stage 2 is moved in Y-direction for the base 1. The gantry 4 is fixed to the base 1. The exposure head 51 is supported by the gantry 4. The displacement sensor 6 measures a displacement amount of the support member 4 for the base 1 in Y-direction and X-direction. A correction part of the control part 9 corrects an exposure position at which the exposure head 51 performs exposure by using a displacement amount measured by the displacement sensor 6.SELECTED DRAWING: Figure 1

Description

[Technical field]

[0001] The subject matter disclosed herein relates to an exposure apparatus. [Background technology]

[0002] For example, exposure apparatuses that perform direct writing by irradiating light are known as a method for forming a pattern on a substrate such as a semiconductor wafer or a glass substrate. This type of exposure apparatus holds a substrate on which a photosensitive layer such as a resist is formed on a stage, and moves the stage in the main scanning direction relative to a base. The exposure apparatus also writes a predetermined pattern on the photosensitive layer by emitting a pattern light from an exposure head according to the position of the stage in the main scanning direction.

[0003] In an exposure apparatus, the exposure head is generally supported by a support member such as a gantry fixed to a base. The stage is configured to move relative to the base. In this case, when the stage is moved, the load distribution of the entire apparatus changes, which may cause distortion of the support member. If distortion occurs in the support member, the exposure head may be displaced, causing the exposure position to shift.

[0004] For example, Patent Document 1 discloses a stage device that detects the yaw angle of a Y stage relative to a gantry section. In this stage device, a photodetector is attached to the center of the front end of the stage, and a laser emitter that irradiates laser light onto the photodetector is attached at the middle position of the gantry section. The photodetector and laser emitter constitute a measuring means that measures positional deviation relative to the Y axis, and are arranged so that the optical axis of the laser light emitted from the laser emitter coincides with the moving direction (Y direction) of the Y stage when the Y stage is at a reference position. Then, the amount of positional deviation in a direction perpendicular to the optical axis is detected from the light intensity distribution detected by the photodetector. [Prior art documents] [Patent documents]

[0005] [Patent Document 1] JP 2007-115720 A Summary of the Invention [Problem to be solved by the invention]

[0006] However, in the case of Patent Document 1, the photodetector moves together with the Y stage, so the photodetector itself vibrates, etc. This makes it difficult to detect the position of the gantry part with high accuracy. In addition, there are restrictions such as the inability to detect the position of the gantry part in the Y direction.

[0007] An object of the present invention is to provide a technique that can perform exposure with high accuracy even if a support member for an exposure head is distorted due to movement of the stage. [Means for solving the problem]

[0008] In order to solve the above problem, a first aspect is an exposure apparatus comprising: a stage capable of holding a base and a substrate and supported on the base; a moving mechanism for moving the stage in a first direction relative to the base; a support member fixed to the base; an exposure head supported on the support member; a displacement sensor for measuring an amount of displacement of the support member relative to the base in at least one of the first direction or a second direction intersecting the first direction; and a correction unit for correcting an exposure position at which the exposure head exposes using the amount of displacement measured by the displacement sensor.

[0009] A second aspect is the exposure apparatus of the first aspect, wherein the displacement sensor is attached to the support member, and the displacement sensor detects the position of a detection object fixed to the base.

[0010] A third aspect is the exposure apparatus of the first aspect, wherein the displacement sensor is attached to the base, and the displacement sensor detects the position of a detection body fixed to the support member.

[0011] A fourth aspect is the exposure apparatus of the first or second aspect, wherein the displacement sensor is an optical sensor.

[0012] A fifth aspect is the exposure apparatus of the fourth aspect, in which the optical sensor detects light reflected by a mirror fixed to the support member or the base.

[0013] A sixth aspect is the exposure apparatus of the first or second aspect, wherein the displacement sensor is a linear encoder.

[0014] A seventh aspect is the exposure apparatus of the first or second aspect, wherein the displacement sensor is a stylus sensor.

[0015] An eighth aspect is an exposure apparatus of the first or second aspect, wherein the correction unit calculates the displacement amount of the exposure head using the displacement amount measured by the displacement sensor and a relational equation between the displacement amount of the support member and the displacement amount of the exposure head.

[0016] A ninth aspect is an exposure apparatus of the first or second aspect, wherein the displacement sensor has a first displacement sensor and a second displacement sensor, and the correction unit corrects the exposure position based on the amount of displacement measured by the first displacement sensor and the second displacement sensor.

[0017] A tenth aspect is the exposure apparatus of the ninth aspect, wherein the first displacement sensor and the second displacement sensor are arranged asymmetrically with respect to the center of the support member.

[0018] An eleventh aspect is the exposure apparatus of the tenth aspect, in which the exposure head is disposed between the first displacement sensor and the second displacement sensor. Effect of the Invention

[0019] According to the exposure apparatus of the first to eleventh aspects, the amount of displacement of the support member relative to the base is measured, and the exposure position is corrected according to the amount of displacement. Therefore, even if the support member is distorted due to the movement of the stage, exposure can be performed with high accuracy.

[0020] According to the exposure apparatus of the sixth aspect, the displacement can be measured without being affected by air fluctuations, and therefore it is more advantageous than an optical sensor.

[0021] According to the seventh aspect of the exposure apparatus, the stylus sensor detects the displacement by physical contact, so it can measure the displacement almost in real time. In addition, it is more advantageous than the optical sensor because it can measure the displacement without being affected by air fluctuations.

[0022] According to the exposure apparatus of the eighth aspect, the exposure position can be appropriately corrected using the displacement amount of the exposure head.

[0023] According to the exposure apparatus of the ninth aspect, when the support member is deformed, the translational component of the exposure head and the rotational component around the exposure head can be detected from the displacement amounts measured by the first displacement sensor and the second displacement sensor, respectively. This makes it possible to improve the correction accuracy compared to the case where the exposure position is corrected using the displacement amount at one point.

[0024] According to the exposure apparatus of the ninth aspect, when the support member is deformed, the translational component of the exposure head and the rotational component around the exposure head can be detected from the displacement amounts measured by the first displacement sensor and the second displacement sensor, respectively. This makes it possible to improve the correction accuracy compared to the case where the exposure position is corrected using the displacement amount at one point.

[0025] According to the exposure apparatus of the tenth aspect, it is possible to distinguish between rotational deformation, translational deformation, and bending deformation of the support member based on the measurement results of the two displacement sensors, thereby improving the accuracy of correcting the exposure position. [Brief description of the drawings]

[0026] [Figure 1] 1 is a front view of an exposure apparatus according to an embodiment. [Diagram 2] 1 is a side view of an exposure apparatus according to an embodiment. [Diagram 3] FIG. 2 is a block diagram showing a control unit shown in FIG. [Figure 4] 13 is a diagram showing a schematic diagram of a state in which a gantry is deformed in the Y direction due to movement of a stage. FIG. [Diagram 5] FIG. 13 is a diagram showing a schematic diagram of a state in which a gantry is deformed in the X direction due to movement of a stage. [Figure 6] 1A to 1C are diagrams illustrating main deformation patterns of a gantry. [Figure 7] 10 is a diagram illustrating an arrangement of a first displacement sensor and a second displacement sensor relative to a gantry, and a schematic diagram illustrating measurement results of a displacement amount for each of main deformation patterns. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0027] Hereinafter, an embodiment of the present invention will be described with reference to the accompanying drawings. Note that the components described in the embodiment are merely examples, and are not intended to limit the scope of the present invention. In the drawings, the dimensions and numbers of each part may be exaggerated or simplified as necessary for ease of understanding.

[0028] In order to facilitate understanding of the positional relationships of the elements in each drawing, an XYZ Cartesian coordinate system is appropriately provided in which the X-axis and Y-axis directions are horizontal and the Z-axis direction is vertical. The direction toward the +Z side is upward, and the direction toward the -Z side is downward.

[0029] <1. Embodiment> Fig. 1 is a front view of an exposure apparatus 100 according to an embodiment. Fig. 2 is a side view of the exposure apparatus 100 according to an embodiment. The exposure apparatus 100 is an apparatus that draws a pattern by irradiating light onto the upper surface of a substrate W on which a layer of a photosensitive material such as resist has been formed. The substrate W is, for example, a semiconductor substrate, a printed circuit board, a substrate for a color filter, a glass substrate for a flat panel display used in a weather display device or a plasma display device, or a substrate for an optical disk.

[0030] The exposure apparatus 100 includes a base 1 , a stage 2 , a stage moving mechanism 3 , a gantry 4 , an exposure unit 5 , a displacement sensor 6 , and a controller 9 .

[0031] The base 1 is a member that supports each element provided in the exposure apparatus 100, and has a rectangular shape when viewed from above. Specifically, the base 1 supports a stage 2, a stage moving mechanism 3, a gantry 4, an exposure unit 5, and a displacement sensor 6 from below.

[0032] The stage 2 has an upper surface that holds the substrate W. The substrate W is placed on the upper surface of the stage 2 in a horizontal position. A plurality of suction holes are formed in the upper surface of the stage 2. The stage 2 can fix the substrate W to the upper surface of the stage 2 by applying a negative pressure (suction pressure) to the suction holes. Note that a chuck that grips the periphery of the substrate W may be provided on the upper surface of the stage 2, and the substrate W may be fixed by the chuck.

[0033] The stage moving mechanism 3 is a mechanism that moves the stage 2 in the main scanning direction (Y-axis direction), the sub-scanning direction (X-axis direction), and the rotation direction (rotation direction around the Z axis (θ-axis direction)). The stage moving mechanism 3 has a support plate 31, a sub-scanning mechanism 32, a base plate 33, a main scanning mechanism 34, and a rotation mechanism 35.

[0034] The support plate 31 is disposed below the stage 2 and rotatably supports the stage 2. The base plate 33 is disposed below the support plate 31 and supports the support plate 31 and the sub-scanning mechanism 32. The sub-scanning mechanism 32 moves the support plate 31 in the sub-scanning direction, that is, the X direction, relative to the base plate 33. The main scanning mechanism 34 moves the base plate 33 in the main scanning direction, that is, the Y direction, relative to the base 1. The sub-scanning mechanism 32 and the main scanning mechanism 34 are, for example, a linear motor mechanism including a linear motor and a guide, or a ball screw mechanism including a rotary motor, a ball screw, and a guide. The rotation mechanism 35 is provided on the support plate 31 and rotates the stage 2 about a rotation axis A extending in the Z direction. The operations of the sub-scanning mechanism 32 and the main scanning mechanism 34 are controlled by the control unit 9.

[0035] The gantry 4 is fixed to the base 1. The gantry 4 has two support columns 41 and a beam 43. The support column 41 has a lower portion fixed to the base 1 and extends in the Z direction. The two support columns 41 are disposed at an interval in the X direction. The beam 43 connects the upper portions of the two support columns 41 and extends in the X direction. In this example, the stage 2 and the base plate 33 of the stage moving mechanism 3 are disposed between the two support columns 41 in the X direction. And the beam 43 is disposed above the stage 2.

[0036] The gantry 4 supports an exposure unit 5 and a displacement sensor 6. Each exposure head 51 of the exposure unit 5, which will be described later, and the displacement sensor 6 are fixed to the -X side surface of a beam portion 43 of the gantry 4. The gantry 4 is an example of a "support member".

[0037] The exposure unit 5 has one or more exposure heads 51. In this example, three exposure heads 51 are arranged along the X-axis direction. Each exposure head 51 has a spatial light modulator 510. The spatial light modulator 510 modulates laser light based on strip data corresponding to a drawing pattern.

[0038] The exposure unit 5 has a light irradiation section 53. The light irradiation section 53 irradiates the exposure head 51 with laser light. In detail, the light irradiation section 53 has a laser driving section 531, a laser oscillator 533, and an illumination optical system 535. By operation of the laser driving section 531, the laser oscillator 533 emits laser light to the illumination optical system 535. The illumination optical system 535 changes the magnification of the laser light incident from the laser oscillator 533, and uniformizes the light amount distribution. The laser light emitted from the illumination optical system 535 is irradiated onto the spatial light modulator 510 of each exposure head 51.

[0039] The spatial light modulator 510 spatially modulates the laser light irradiated from the light irradiation unit 53 on a channel-by-channel basis, and reflects necessary light that contributes to drawing a pattern and unnecessary light that does not contribute to drawing a pattern in different directions. Note that spatially modulating light means changing the spatial distribution (amplitude, phase, polarization, etc.) of light. The exposure head 51 irradiates the modulated laser light onto the substrate W moving directly below the exposure head 51. As a result, the drawing pattern is exposed onto the unprocessed substrate W.

[0040] The spatial light modulator 510 may be, for example, a grating type optical element such as a GLV (Grating Light Valve, a registered trademark of Silicon Light Machines, Inc.) or a DMD (Digital Mirror Device).

[0041] The displacement sensor 6 is a device that measures the amount of displacement of the gantry 4 relative to the base 1. Hereinafter, the amount of displacement of the gantry 4 relative to the base 1 will be simply referred to as the "amount of displacement of the gantry 4" unless otherwise specified.

[0042] 1 and 2, the displacement sensor 6 has a first displacement sensor 61 and a second displacement sensor 62. The first displacement sensor 61 and the second displacement sensor 62 are capable of measuring the displacement amounts of the gantry 4 in the Y direction and the X direction, as described below. The stage 2, the stage moving mechanism 3, and each exposure head 51 are positioned between the first displacement sensor 61 and the second displacement sensor 62 in the X direction. The first displacement sensor 61 and the second displacement sensor 62 transmit the measured displacement amounts of the gantry 4 to the control unit 9.

[0043] The exposure apparatus 100 has two connecting members 63 that support the first displacement sensor 61 and the second displacement sensor 62. The connecting members 63 are members that extend in the Z direction. The two connecting members 63 are made of, for example, metal plates and are members with high rigidity. The upper parts of the two connecting members 63 are fixed to the beam part 43 of the gantry 4. The first displacement sensor 61 and the second displacement sensor 62 are fixed to the lower parts of the two connecting members 63, respectively. The first displacement sensor 61 and the second displacement sensor 62 are fixed to the beam part 43 of the gantry 4 via the two connecting members 63. Therefore, the first displacement sensor 61 and the second displacement sensor 62 can measure the displacement amount of the beam part 43 relative to the base 1. Each exposure head 51 is located between the two connecting members 63 in the X direction.

[0044] The first displacement sensor 61 and the second displacement sensor 62 are, for example, optical sensors. That is, the first displacement sensor 61 and the second displacement sensor 62 measure the displacement amount of the detection body by irradiating light from a light source toward the detection body and detecting the light reflected by the detection body with a detector. In this example, the exposure apparatus 100 has four mirrors 611, 613, 621, and 623 fixed to the upper surface of the base 1 as the detection body.

[0045] The mirror 611 is positioned away from the first displacement sensor 61 on the -Y side. The first displacement sensor 61 measures the displacement amount of the gantry 4 in the Y direction by detecting light reflected by the mirror 611. The mirror 613 is positioned away from the first displacement sensor 61 on the +X side. The first displacement sensor 61 measures the displacement amount of the gantry 4 in the X direction by detecting light reflected by the mirror 613.

[0046] The mirror 621 is positioned away from the second displacement sensor 62 on the -Y side. The second displacement sensor 62 measures the displacement amount of the gantry 4 in the Y direction by detecting light reflected by the mirror 621. The mirror 623 is positioned away from the second displacement sensor 62 on the -X side. The second displacement sensor 62 measures the displacement amount of the gantry 4 in the X direction by detecting light reflected by the mirror 623.

[0047] The positional relationship between the first displacement sensor 61 and the mirrors 611 and 613 is not limited to the above description. For example, the mirror 611 may be located on the +Y side of the first displacement sensor 61, and the mirror 613 may be located on the -X side of the first displacement sensor 61. The same applies to the mirrors 621 and 623.

[0048] 3 is a block diagram showing the configuration of the control unit 9 shown in FIG. The control unit 9 includes a processor such as a CPU (Central Processing Unit) and a storage unit 99. The storage unit 99 is electrically connected to the processor, and specifically includes a storage device such as a RAM (Random Access Memory) or a hard disk. The processor executes a program stored in the storage unit 99 to function as an irradiation control unit 91, a stage control unit 93, a drawing control unit 95, and a driver 97. Some of the functions of the control unit 9 may be realized in hardware by a dedicated circuit.

[0049] The irradiation control unit 91 controls the light irradiating unit 53 of the exposure unit 5 to cause the light irradiating unit 53 to emit a line beam of light to the exposure head 51. The stage control unit 93 controls the stage moving mechanism 3 to move the stage 2 relative to the exposure head 51. The drawing control unit 95 controls the driver 97 based on the drawing recipe stored in the storage unit 99 and position information of the stage 2 to apply a drive voltage from the driver 97 to the spatial light modulator 510. As a result, the control unit 9 causes the spatial light modulator 510 to modulate the line beam of light so as to correspond to the drawing pattern.

[0050] In the drawing recipe, for example, pattern data indicating a drawing pattern to be formed on the substrate W and various conditions for drawing (such as the amount of light emitted from the exposure unit 5 and the moving speed of the stage 2) are described in a predetermined data format. The pattern data is, for example, data obtained by rasterizing CAD data generated using CAD (computer aided design), and position information on the substrate W to be irradiated with light is recorded in pixel units. In addition, the position information of the stage 2 is data measured by a length measuring device (not shown). The length measuring device is, for example, an interference type laser length measuring device, or a linear encoder provided in the main scanning mechanism 34.

[0051] The drawing control unit 95 also has a correction unit 951. The correction unit 951 corrects the exposure position at which each exposure head 51 exposes by controlling the driver 97 using the displacement amount of the gantry 4 measured by the first displacement sensor 61 and the second displacement sensor 62. Next, the function of the correction unit 951 will be described.

[0052] FIG. 4 is a diagram showing a schematic diagram of the gantry 4 deforming in the Y direction due to the movement of the stage 2. FIG. 5 is a diagram showing a schematic diagram of the gantry 4 deforming in the X direction due to the movement of the stage 2. When a pattern is drawn on the substrate W in the exposure apparatus 100, as shown in FIG. 4, the stage movement mechanism 3 moves the stage 2 in the Y direction (main scanning direction) for each exposure head 51 from a movement start position shown by a dashed line. As a result, a strip-shaped area extending in the Y direction is exposed on the upper surface of the substrate W. In addition, the stage 2 is moved in the X direction (sub-scanning direction) by an amount corresponding to the width of the strip-shaped area. By repeating such stage movement in the Y direction and stage movement in the X direction, a pattern is drawn on the entire upper surface of the substrate W.

[0053] Here, when the stage 2 is moved in the Y direction, the load distribution of the entire exposure apparatus 100 changes. This may cause distortion of the gantry 4. For example, in the example shown in FIG. 4, the beams 43 of the gantry 4 are deflected to the +Y side while the stage 2 is moving in the Y direction. Also, in the example shown in FIG. 5, the beams 43 of the gantry 4 are shifted in the X direction while the stage 2 is moving in the Y direction. When distortion occurs in the gantry 4 in this way, the positions of the exposure heads 51 fixed to the gantry 4 are displaced from their predetermined positions, causing the exposure positions of the exposure heads 51 to shift.

[0054] In this embodiment, while the stage 2 moves in the Y direction, the drawing control unit 95 acquires the displacement amounts of the gantry 4 in the X direction and the Y direction detected by the first displacement sensor 61 and the second displacement sensor 62. Note that, as shown in Fig. 4 and Fig. 5, when a displacement occurs in the gantry 4, the first displacement sensor 61 and the second displacement sensor 62 also displace according to the displacement of the gantry 4. Therefore, the first displacement sensor 61 and the second displacement sensor 62 can appropriately measure the displacement amounts of the gantry 4 in the X direction and the Y direction.

[0055] The correction unit 951 of the drawing control unit 95 acquires the displacement amount of each exposure head 51 from the measured displacement amount of the gantry 4. Then, the correction unit 951 corrects the exposure position of the exposure head 51 using the acquired displacement amount of each exposure head. In this way, while drawing is being performed in the exposure apparatus 100, that is, while the stage 2 is moving in the Y direction, the correction unit 951 corrects the exposure position using the displacement amount measured by the displacement sensor 6. That is, the correction unit 951 corrects the position at which each exposure head 51 irradiates the pattern light in accordance with the displacement amount.

[0056] When the correction unit 951 obtains the displacement amount of each exposure head 51 from each measured displacement amount, the correction unit 951 may use a relational expression indicating the relationship between the displacement amount of the gantry 4 and the displacement amount of the exposure head 51. This relational expression is obtained in advance and stored in the storage unit 99. For example, such a relational expression may be obtained by providing a displacement sensor in each exposure head 51 and obtaining the actually measured displacement amount of the exposure head 51 and the displacement amount measured by each of the first displacement sensor 61 and the second displacement sensor 62. In addition, the relational expression may be calculated from the correspondence between the movement at the positions of the first displacement sensor 61 and the second displacement sensor 62 and the movement of each exposure head 51 by structural simulation. In addition, various methods such as a table, regression, machine learning, or deep learning can be used as a method for constructing the relational expression.

[0057] Furthermore, when correcting the exposure position, for example, the timing at which the spatial light modulator 510 is turned on and off may be changed according to the amount of displacement depending on the position of the stage 2, or the pattern data may be expanded or contracted according to the amount of displacement.

[0058] As described above, according to this embodiment, the displacement sensor 6 measures the amount of displacement of the gantry 4 relative to the base 1, and the exposure position of the exposure head 51 is corrected using the amount of displacement. As a result, even if the gantry 4 is displaced relative to the base 1 due to the movement of the stage 2, the exposure position is corrected according to the amount of displacement, so exposure can be performed with high accuracy. In addition, it is possible to increase the rigidity of the gantry 4 in order to suppress distortion of the gantry 4 due to the movement of the stage 2, but in this case, problems such as an increase in the manufacturing cost of the apparatus, an increase in the transportation cost of the apparatus, and limitations on the installation location may occur. According to the exposure apparatus 100 of this embodiment, such problems can be avoided.

[0059] Moreover, in the X direction, the exposure head 51 is disposed between the first displacement sensor 61 and the second displacement sensor 62. With this configuration, when the gantry 4 is deformed, the first displacement sensor 61 and the second displacement sensor 62 can detect the translation component of each exposure head 51 in the X direction or the Y direction and the rotation component around each exposure head 51, respectively. This allows the exposure position to be corrected according to each of the translation component and the rotation component of each exposure head 51, thereby improving the correction accuracy compared to the case where the exposure position is corrected using the displacement amount at one point.

[0060] In this embodiment, the first displacement sensor 61 and the second displacement sensor 62 are arranged symmetrically with respect to the center of the gantry 4 in the X direction. That is, the measurement position of the first displacement sensor 61 and the measurement position of the second displacement sensor 62 are equidistant from the center of the gantry 4 in the X direction. However, the first displacement sensor 61 and the second displacement sensor 62 may be arranged asymmetrically with respect to the center of the gantry 4. Hereinafter, with reference to Figs. 6 and 7, advantages of asymmetrically arranging the first displacement sensor 61 and the second displacement sensor 62 will be described.

[0061] Fig. 6 is a diagram showing a schematic diagram of the main deformation patterns of the gantry 4. Fig. 6(A) is a top view showing the gantry 4 that has undergone rotational (torsional) deformation, Fig. 6(B) is a top view showing the gantry 4 that has undergone translational (tilting) deformation, and Fig. 6(C) is a top view showing the gantry 4 that has undergone bending deformation. Note that in Figs. 6(A) to (C), the gantry 4 (beam section 43) in an undeformed state is shown by a dashed line, and the gantry 4 (beam section 43) in a deformed state is shown by a solid line.

[0062] As shown in Fig. 6(A), in the case of rotational deformation, the +X side end and -X side end of the gantry 4 are displaced by approximately the same amount in the opposite directions in the Y direction. Also, as shown in Fig. 6(B), in the case of translational deformation, the +X side end, -X side end, and central part in the X direction of the gantry 4 are displaced approximately equally in the +Y direction (or the opposite direction). Furthermore, in the case of bending deformation, as shown in Fig. 6(C), the closer to the center C of the gantry 4 in the X direction, the greater the displacement to the +Y side.

[0063] FIG. 7 is a diagram that shows the arrangement of the first displacement sensor 61 and the second displacement sensor 62 relative to the gantry 4, and the measurement results of the displacement amount in the Y direction for each main deformation pattern. FIG. 7(A) is a diagram that shows the measurement results of the displacement amount when the first displacement sensor 61 and the second displacement sensor 62 are arranged symmetrically with respect to the center C of the gantry 4. When the two sensors are arranged symmetrically, the measurement results of the two sensors are in the opposite directions in the case of rotational deformation, and in the same direction in the case of translational deformation and bending deformation. Therefore, it is possible to distinguish the case of rotational deformation from the case of translational deformation or the case of rotational deformation from the measurement results. On the other hand, in the case of translational deformation and bending deformation, the measurement results of the two sensors show almost the same displacement amount. Therefore, it is difficult to distinguish the case of translational deformation from the case of bending deformation from the measurement results.

[0064] FIG. 7(B) is a diagram showing a schematic diagram of a measurement result of a displacement amount when the first displacement sensor 61 and the second displacement sensor 62 are arranged asymmetrically with respect to the center C of the gantry 4. In this example, the second displacement sensor 62 is arranged closer to the center C of the gantry 4 than the first displacement sensor 61. Even when the two sensors are arranged asymmetrically, the measurement results of the two sensors are in the opposite directions to each other in the case of rotational deformation, and in the same direction in the case of translational deformation and bending deformation. Therefore, it is possible to distinguish between the case of rotational deformation and the case of translational deformation or rotational deformation from the measurement results. Furthermore, in the case of bending deformation, the measurement results of the two sensors show different displacement amounts. Therefore, it is possible to distinguish between the translational deformation and the bending deformation from the measurement results.

[0065] FIG. 7C is a diagram showing a schematic diagram of the measurement result of the displacement amount when the first displacement sensor 61 and the second displacement sensor 62 are arranged asymmetrically with respect to the center C of the gantry 4 and arranged on the same side with respect to the center C. In this example, the two sensors are arranged on the +X side with respect to the center C. In this arrangement, the measurement results of the two sensors indicate the same direction in the Y direction in any deformation. However, when the measurement results of the two sensors are compared, in the case of rotational deformation, the measurement result of the first sensor 61 indicates a larger displacement amount, in the case of translational deformation, the measurement results of the two sensors indicate almost the same displacement amount, and in the case of bending deformation, the measurement result of the second sensor 62 indicates a larger displacement amount. In this way, it is possible to distinguish whether the deformation is rotational deformation, translational deformation, or bending deformation from the measurement result.

[0066] As described above, when the first displacement sensor 61 and the second displacement sensor 62 are arranged asymmetrically with respect to the center C of the gantry 4, three main deformation patterns can be distinguished from the measurement results. This makes it possible to improve the accuracy of correcting the exposure position.

[0067] <2. Modification> Although the embodiment has been described above, the present invention is not limited to the above, and various modifications are possible.

[0068] For example, in the above embodiment, the first displacement sensor 61 and the second displacement sensor 62 are fixed to the beam portion 43 via the connecting member 63, but they may be fixed to the support portion 41 instead of the beam portion 43.

[0069] Furthermore, the first displacement sensor 61 and the second displacement sensor 62 may be fixed to the base 1. In this case, the mirrors 611, 613, 621, and 623, which are the detection bodies, may be fixed to the gantry 4 via a connecting member 63 or the like.

[0070] In addition, in the above embodiment, the first displacement sensor 61 and the second displacement sensor 62 are configured to measure the amount of displacement of the gantry 4 in the X direction and the Y direction, but they may also be configured to measure the amount of displacement in the Z direction.

[0071] In the above embodiment, the first displacement sensor 61 and the second displacement sensor 62 are optical sensors, but they may be linear encoders. In this case, it is more advantageous than using optical sensors in that the displacement can be measured without being affected by air fluctuations.

[0072] The first displacement sensor 61 and the second displacement sensor 62 may be stylus sensors. Stylus sensors detect displacement by physical contact, so they can measure displacement almost in real time. They are also more advantageous than optical sensors in that they can measure displacement without being affected by air fluctuations.

[0073] Although the present invention has been described in detail, the above description is merely illustrative in all respects, and the present invention is not limited thereto. It is understood that countless variations not illustrated can be envisioned without departing from the scope of the present invention. The configurations described in the above embodiments and variations can be appropriately combined or omitted as long as they are not mutually contradictory. [Explanation of symbols]

[0074] 1: Base 2: Stage 3: Stage movement mechanism 4: Gantry (support member) 6: Displacement sensor 9: Control section 51: Exposure head 61: First displacement sensor 62: Second displacement sensor 100: Exposure equipment 611, 613, 621, 623: Mirror 951: Correction section W: Substrate

Claims

1. An exposure apparatus comprising: Foundation and a stage capable of holding a substrate and supported by the base; a moving mechanism that moves the stage relative to the base in a first direction; A support member fixed to the base; an exposure head supported by the support member; a displacement sensor that measures a displacement amount of the support member relative to the base in at least one of the first direction and a second direction intersecting the first direction; a correction unit that corrects an exposure position at which the exposure head performs exposure, using the displacement amount measured by the displacement sensor; An exposure apparatus comprising:

2. 2. The exposure apparatus according to claim 1, The displacement sensor is attached to the support member, The displacement sensor detects the position of a detection object fixed to the base.

3. 2. The exposure apparatus according to claim 1, The displacement sensor is attached to the base, The displacement sensor detects the position of a detection object fixed to the support member.

4. 3. The exposure apparatus according to claim 1, An exposure apparatus, wherein the displacement sensor is an optical sensor.

5. 5. The exposure apparatus according to claim 4, The optical sensor includes: an exposure apparatus that detects light reflected by a mirror fixed to the support member or the base;

6. 3. The exposure apparatus according to claim 1, An exposure apparatus, wherein the displacement sensor is a linear encoder.

7. 3. The exposure apparatus according to claim 1, An exposure apparatus, wherein the displacement sensor is a stylus sensor.

8. 3. The exposure apparatus according to claim 1, An exposure apparatus, wherein the correction unit calculates the amount of displacement of the exposure head using the amount of displacement measured by the displacement sensor and a relational expression between the amount of displacement of the support member and the amount of displacement of the exposure head.

9. 3. The exposure apparatus according to claim 1, the displacement sensor includes a first displacement sensor and a second displacement sensor, The correction unit corrects the exposure position based on the amount of displacement measured by the first displacement sensor and the second displacement sensor.

10. 10. The exposure apparatus according to claim 9, An exposure apparatus, wherein the first displacement sensor and the second displacement sensor are disposed asymmetrically with respect to a center of the support member.

11. 11. The exposure apparatus according to claim 10, An exposure apparatus, wherein the exposure head is disposed between the first displacement sensor and the second displacement sensor.

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