Punching device, gas discharge device, and gas discharge method

Abstract

To prevent ignition of contained gas when an exhaust hole is made in a pipe.SOLUTION: A punching device includes: a sealing portion that is attached to an outer side surface of a pipe portion and surrounds a to-be-processed portion that is a part of the pipe portion; a first processing unit that can reduce a thickness of the to-be-processed portion by cutting; a second processing unit that punches the to-be-processed portion by shearing by means of the first processing unit; and an attachment portion to which the first processing unit and the second processing unit are detachably attached. Inside of the sealing portion and outside of the sealing portion are airtightly sealed.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a drilling device, a gas discharge device, and a gas discharge method.

Background Art

[0002] In the construction and inspection of nuclear power plants, pipe cutting and removal operations may be performed. Inside the in-core structures installed in the pressure vessel of a nuclear power plant and the pipes connected to the pressure vessel, for example, there may be a risk of being filled with hydrogen gas generated by radiolysis. If the inside of the pipe is filled with hydrogen gas, there is a risk of it developing into a fire or the like, so it may be necessary to confirm the gas components inside the pipe. Furthermore, when a combustible gas or the like is confirmed inside the pipe, it may be necessary to dilute it with an inert gas or the like and then discharge it. Conventionally, in pipe cutting and removal operations associated with construction and inspection, as a method of providing exhaust holes in the pipe, cutting using a blade and a drill can be cited (for example, Patent Document 1).

Prior Art Documents

Patent Documents

[0003]

Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] In the method of providing an exhaust hole in a pipe by the above-described cutting process, there is a risk of sparks being generated during the cutting process. Therefore, when the concentration of hydrogen gas contained in the encapsulated gas inside the pipe is greater than the ignition concentration, there is a risk of the encapsulated gas igniting due to the sparks generated during the cutting process. In this case, there was a risk that the operation of providing an exhaust hole in the pipe could not be performed safely.

[0005] The present invention has been made in consideration of the above points, and one of its objects is to provide a drilling device, a gas discharge device, and a gas discharge method that can suppress the ignition of the contained gas when an exhaust hole is provided in a pipe.

Means for Solving the Problems

[0006] (1) One aspect of the present invention is a drilling device that is attached to the outer surface of a pipe section, includes a sealed section that surrounds a processed section which is a part of the pipe section, a first processing section capable of thinning the thickness of the processed section by cutting, a second processing section that punches the processed section cut by the first processing section by shearing, and a mounting section to which the first processing section and the second processing section are detachably attached, and the inside and outside of the sealed section are hermetically sealed.

[0007] (2) One aspect of the present invention is the drilling device according to (1) above, wherein the sealed section has a through-hole penetrating the sealed section, and nitrogen gas can be supplied to the inside of the sealed section through the through-hole.

[0008] (3) One aspect of the present invention is the drilling device according to (1) or (2) above, wherein the outer surface of the processed section faces one side in the processing direction which is the direction in which the processed section is drilled, and the first processing section includes a drill member that cuts the processed section, a drill holding section that holds the drill member and is movable in the processing direction, and a first restricting section that restricts the amount of movement of the drill holding section to the other side in the processing direction.

[0009] (4) One aspect of the present invention is the drilling device according to any one of (1) to (3) above, wherein the second processing section includes a rod member that punches the processed section by shearing, a rod holding section that holds the rod member and is movable in the processing direction, and a second restricting section that restricts the amount of movement of the rod holding section to the other side in the processing direction.

[0010] (5) One aspect of the present invention is the drilling device described in (4) above, wherein a blade portion protruding toward the other side in the processing direction is provided on the surface of the rod member facing the other side in the processing direction, and the angle formed by the surface of the rod member facing the other side in the processing direction and the direction orthogonal to the processing direction is 5° or more and 45° or less.

[0011] (6) One aspect of the present invention is a gas discharge device including the drilling device according to any one of (1) to (5) above, a flow path through which the gas inside the sealing portion flows, a measuring portion provided in the flow path for measuring a first concentration which is the concentration of hydrogen gas contained in the gas, a gas storage portion provided in the flow path for storing the gas, and a valve provided in the flow path for adjusting the flow rate of the gas flowing through the flow path. The flow path has a supply flow path connecting the inside of the sealing portion and each of the measuring portion and the gas storage portion, and a first discharge flow path for discharging the gas from the gas storage portion to the atmospheric atmosphere. The valve has a first valve disposed in the first discharge flow path.

[0012] (7) One aspect of the present invention is the gas discharge device described in (6) above, wherein the supply flow path has a first flow path connected to the inside of the sealing portion, a second flow path connecting the first flow path and the measuring portion, and a third flow path connecting the first flow path and the gas storage portion, and the valve has a second valve disposed in the first flow path, a third valve disposed in the second flow path, and a fourth valve disposed in the third flow path.

[0013] (8) One aspect of the present invention is the gas discharge device described in (6) or (7) above, further including a nitrogen gas supply portion provided in the flow path for supplying nitrogen gas to the gas storage portion. The flow path has a first nitrogen gas supply flow path connecting the nitrogen gas supply portion and the gas storage portion, and a second discharge flow path for discharging a diluted gas in which the concentration of hydrogen gas is diluted by the nitrogen gas from the gas storage portion to the atmospheric atmosphere.

[0014] (9) One aspect of the present invention is the gas discharge device described in (8) above, wherein the valve has a fifth valve disposed in the first nitrogen gas supply flow path.

[0015] (10) One aspect of the present invention is the gas discharge device described in (8) or (9) above, wherein the flow path has a second nitrogen gas supply flow path connecting the nitrogen gas supply unit and the inside of the sealed unit.

[0016] (11) One aspect of the present invention is the gas discharge device described in any one of (6) to (10) above, which includes an identification unit for identifying substances contained in the gas inside the sealed unit.

[0017] (12) One aspect of the present invention is attached to the outer surface of the piping part, a sealed part surrounding a processed part which is a part of the piping part, a first processing part capable of thinning the thickness of the processed part by cutting, a second processing part for punching the processed part cut by the first processing part by shearing, a mounting part to which the first processing part and the second processing part are detachably attached, a nitrogen gas supply part for supplying nitrogen gas into the sealed part, a flow path through which the gas inside the sealed part flows, a measuring part provided in the flow path for measuring a first concentration which is the concentration of hydrogen gas contained in the gas, a gas storage part provided in the flow path for storing the gas, a valve provided in the flow path for adjusting the flow rate of the gas flowing through the flow path, A gas discharge method for discharging gas in a piping section by means of a gas discharge device that includes a sealed section and in which the inside and the outside of the sealed section are hermetically sealed, the method having a drilling step of drilling the workpiece and a discharging step of discharging the gas in the piping section into the atmosphere, the drilling step including a first nitrogen gas supply step of supplying nitrogen gas from a nitrogen gas supply section into the sealed section, a cutting step of thinning the thickness of the workpiece by a first processing section, and a shearing step of drilling the workpiece by a second processing section, the flow path having a supply flow path connecting the inside of the sealed section to each of the measurement section and the gas storage section, and a first discharge flow path for discharging the gas from the gas storage section into the atmosphere, the valve having a first valve disposed in the first discharge flow path, the discharging step including a measurement step of measuring the first concentration by the measurement section, and a first discharge step of discharging the gas stored in the gas storage section into the atmosphere through the first discharge flow path when the first concentration measured by the measurement section is equal to or lower than a second concentration that is a predetermined concentration.

[0018] (13) One aspect of the present invention is the gas discharge method according to (12) above, wherein the flow path has a first nitrogen gas supply flow path connecting the nitrogen gas supply section and the gas storage section, and a second discharge flow path for discharging a diluted gas in which the concentration of hydrogen gas is diluted by the nitrogen gas from the gas storage section into the atmosphere, and the discharging step includes a second nitrogen gas supply step of supplying nitrogen gas from the nitrogen gas supply section to the gas storage section when the first concentration is greater than the second concentration, and a second discharge step of discharging the diluted gas into the atmosphere through the second discharge flow path.

[0019] (14) One aspect of the present invention is the gas discharge method according to (13) above, wherein the gas discharge device includes an identification section for identifying a substance contained in the gas inside the sealed section, and the discharging step has an identification step of identifying a substance contained in the gas inside the sealed section by the identification section before the first discharge step and the second discharge step.

Advantages of the Invention

[0020] According to the present invention, it is possible to provide a drilling device, a gas discharge device, and a gas discharge method that can suppress the ignition of the contained gas when an exhaust hole is provided in a pipe.

Brief Description of the Drawings

[0021]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Figure 9

Figure 10

Figure 11

Figure 12

Embodiments for Carrying Out the Invention

[0022] In each drawing, the Z-axis is shown as appropriate. The Z-axis direction is the machining direction in which the drilling device drills the workpiece. In the present embodiment, the Z-axis direction is the vertical direction. The Z-axis direction may not be the vertical direction. In the following description, the side in the machining direction toward which the arrow of the Z-axis points (+Z side) is referred to as the "upper side" or "one side of the machining direction", and the side opposite to the side toward which the arrow of the Z-axis points in the machining direction (-Z side) is referred to as the "lower side" or "the other side of the machining direction".

[0023] Figure 1 is a schematic diagram showing the gas discharge device 10 of the present embodiment. The gas discharge device 10 is a gas discharge device that forms an exhaust hole 93b in the workpiece 93a of the piping section 90 including the piping valve 92 and discharges the contained gas G, which is the gas inside the piping section 90 flowing into the flow path 40 through the exhaust hole 93b, into the atmosphere. In the present embodiment, the first concentration D1, which is the concentration of hydrogen gas contained in the gas discharged by the gas discharge device 10 into the atmosphere, is equal to or less than the second concentration D2, which is a concentration that can suppress the gas from igniting. The gas discharge device 10 includes a drilling device 20, a flow path 40, a measurement unit 61, an oxygen concentration measurement unit 62, a gas storage unit 63, a filter 64, a nitrogen gas supply unit 65, an identification unit 67, and a pressure gauge 68. Each of the measurement unit 61, the oxygen concentration measurement unit 62, the gas storage unit 63, the filter 64, the nitrogen gas supply unit 65, the identification unit 67, and the pressure gauge 68 is provided in the flow path 40.

[0024] Figure 2 is a first cross-sectional view showing the drilling device 20 of the present embodiment. Figure 3 is a second cross-sectional view showing the drilling device 20 of the present embodiment. Figure 4 is a cross-sectional view showing the rod member 31c of the present embodiment. Figure 5 is a view of the rod member 31c of the present embodiment as seen from below. Figure 6 is a third cross-sectional view showing the drilling device 20 of the present embodiment. The drilling device 20 is a machining device that forms an exhaust hole 93b in the workpiece 93a of the piping section 90 by machining. As shown in Figure 2, the drilling device 20 includes a sealing portion 21, a mounting portion 22, and a first machining portion 25. The drilling device 20 also includes a second machining portion 30. Figure 3 shows a state in which the second machining portion 30 is installed instead of the first machining portion 25.

[0025] In the present embodiment, the piping section 90 has a pipe 91 extending in a direction intersecting the processing direction and a pipe valve 92 connected to the pipe 91. In the present embodiment, the piping section 90 is made of metal. The pipe 91 is connected to the in-vessel structure installed in the pressure vessel of the nuclear power plant and the pressure vessel. The pipe valve 92 can adjust the flow rate of the fluid flowing inside the pipe 91. The pipe valve 92 has a pipe valve main body section 92a and a lid section 93. The pipe valve main body section 92a is hollow. The pipe valve main body section 92a is connected to the pipe 91. The pipe valve main body section 92a opens upward.

[0026] The lid section 93 is plate-shaped and extends in a direction orthogonal to the processing direction. The lid section 93 is fixed to the upper end of the pipe valve main body section 92a. The lid section 93 closes the opening of the pipe valve main body section 92a. The lid section 93 has a processed section 93a. The processed section 93a is a part of the piping section 90. The outer surface of the processed section 93a faces upward, that is, one side in the pressurizing direction (+Z side). As shown in FIG. 6, in the present embodiment, the exhaust hole 93b, which is a hole drilled by the drilling device 20, is a hole that penetrates the processed section 93a in the processing direction. The exhaust hole 93b may be formed in other parts of the piping section 90 such as the pipe 91. The pipe valve 92 has a flange section 93d. The flange section 93d extends in a direction orthogonal to the processing direction. When viewed from the processing direction, the flange section 93d is substantially annular.

[0027] The attachment section 22 is configured such that the first processing section 25, the second processing section 30, and the sealing section 21 can be attached. In the present embodiment, the attachment section 22 is fixed to the piping section 90. The attachment section 22 does not have to be fixed to the piping section 90. As shown in FIG. 2, the attachment section 22 has a first attachment section 22a, a second attachment section 22b, a connection shaft section 22d, a nut 22e, a third attachment section 22g, and a first shaft section 22h. Also, as shown in FIG. 3, the attachment section 22 has a fourth attachment section 23a and a second shaft section 23b. In the present embodiment, the attachment section 22 is made of metal.

[0028] As shown in FIG. 2, the first attachment portion 22a has a recess that fits into the flange portion 93d. Thereby, the first attachment portion 22a is fixed to the piping portion 90. The attachment portion 22 has a plurality of first attachment portions 22a. Each first attachment portion 22a is arranged at intervals along the outer peripheral surface of the flange portion 93d. Each first attachment portion 22a is arranged surrounding the portion to be processed 93a. The second attachment portion 22b is plate-shaped and extends in a direction orthogonal to the pressing direction. The second attachment portion 22b is arranged above each of the piping portion 90 and the first attachment portion 22a. When viewed from the pressing direction, the second attachment portion 22b overlaps the portion to be processed 93a.

[0029] The connection shaft portion 22d is rod-shaped and extends in the pressing direction. In the present embodiment, the attachment portion 22 has a plurality of connection shaft portions 22d. The lower ends of the respective connection shaft portions 22d are fixed to different first attachment portions 22a. In each connection shaft portion 22d, it is arranged surrounding the portion to be processed 93a. The upper portion of each connection shaft portion 22d is formed as a hole portion (not shown) that axially penetrates the second attachment portion 22b. A male thread is formed on the outer peripheral surface of the upper portion of each connection shaft portion 22d. The nut 22e is screwed onto the male thread of each connection shaft portion 22d.

[0030] The third attachment portion 22g is plate-shaped and extends in a direction orthogonal to the pressing direction. The third attachment portion 22g is arranged above the second attachment portion 22b. The third attachment portion 22g is fixed to the second attachment portion 22b by a fastening member such as a screw. The third attachment portion 22g can be removed from the second attachment portion 22b by removing the fastening member. The third attachment portion 22g is detachably attached to the second attachment portion 22b. The first shaft portion 22h is columnar and extends in the processing direction. The lower end of the first shaft portion 22h is fixed to the third attachment portion 22g. When viewed from the pressing direction, the first shaft portion 22h is arranged at a position shifted from the portion to be processed 93a. A support member 22j is fixed to the outer peripheral surface of the first shaft portion 22h. The outer diameter of the support member 22j is larger than the outer diameter of the first shaft portion 22h.

[0031] As shown in FIG. 3, the fourth attachment portion 23a is plate-shaped and extends in a direction orthogonal to the pressing direction. The fourth attachment portion 23a is disposed above the second attachment portion 22b. The fourth attachment portion 23a is fixed to the second attachment portion 22b by a fastening member such as a screw. The fourth attachment portion 23a can be removed from the second attachment portion 22b by removing the fastening member. The fourth attachment portion 23a is detachably attached to the second attachment portion 22b.

[0032] The sealing portion 21 is cylindrical and extends in the processing direction. The sealing portion 21 is open at the lower side. In the present embodiment, the sealing portion 21 is made of metal. The sealing portion 21 is disposed between a plurality of connection shaft portions 22d. In the processing direction, the sealing portion 21 is disposed between the lid portion 93 and the second attachment portion 22b. The upper end of the sealing portion 21 is fixed to the second attachment portion 22b by a plurality of screws 22f. The lower end of the sealing portion 21 is in contact with the lid portion 93 in the pressing direction. The sealing portion 21 surrounds the workpiece portion 93a. When the nut 22e is tightened onto a male screw (not shown) of each connection shaft portion 22d from above, the sealing portion 21 is pressed against the lid portion 93 by the second attachment portion 22b. Thereby, the sealing portion 21 is attached to the outer surface of the piping portion 90. The inside and the outside of the sealing portion 21 are hermetically sealed.

[0033] The sealing portion 21 has a through hole 21a. The through hole 21a is a hole that penetrates the sealing portion 21. A second nitrogen gas supply passage 45, which will be described later, passes through the sealing portion 21. The second nitrogen gas supply passage 45 is connected to a nitrogen gas supply portion 65, which will be described later. Thereby, nitrogen gas Gn can be supplied into the sealing portion 21 through the through hole 21a.

[0034] The first processing portion 25 is a cutting processing device capable of reducing the thickness of the workpiece portion 93a by cutting. The first processing portion 25 is detachably attached to the attachment portion 22. The first processing portion 25 includes a cutting portion 26, a drill holding portion 28, and a first restricting portion 29.

[0035] In this embodiment, the cutting part 26 is, for example, an electric drill. The cutting part 26 may be a cutting processing device other than an electric drill. The cutting part 26 is disposed above the piping part 90. The cutting part 26 has a cutting main body part 26a and a drill member 26c. The cutting main body part 26a holds the drill member 26c and rotates the drill member 26c. The cutting main body part 26a is connected to an external power source (not shown) and power is supplied from the external power source.

[0036] The drill member 26c cuts the work part 93a. The drill member 26c is rod-shaped and extends in the machining direction. The upper end of the drill member 26c is held by the cutting main body part 26a. When viewed from the machining direction, the drill member 26c overlaps the work part 93a. A spiral blade part (not shown) is formed on the outer peripheral surface of the lower part including the lower end of the drill member 26c. When the cutting main body part 26a rotates the drill member 26c with the lower end of the drill member 26c in contact with the outer surface of the work part 93a, the work part 93a is cut. Thereby, the first processing part 25 can reduce the thickness of the work part 93a. In this embodiment, the outer diameter of the lower end side part of the drill member 26c is 10 mm. The outer diameter of the lower end side part of the drill member 26c may be smaller than 10 mm or may be larger than 10 mm. Note that when the outer surface of the work part 93a is cut by the drill member 26c, sparks may be generated.

[0037] The drill holder 28 holds the cutting part 26. Thereby, the drill holder 28 holds the drill member 26c. The drill holder 28 is disposed above the third mounting part 22g. The drill holder 28 has two protruding parts 28a and a lever 28d.

[0038] Each protruding portion 28a protrudes in a direction orthogonal to the processing direction. The protruding portions 28a are arranged at intervals in the processing direction. Each protruding portion 28a is provided with a hole portion 28b that penetrates the protruding portion 28a in the pressing direction. The first shaft portion 22h is passed through the hole portions 28b in the pressing direction. A support member 22j is arranged between the protruding portions 28a. An elastic member 22k that can be elastically deformed in the pressing direction is arranged between the support member 22j and the upper protruding portion 28a. In the present embodiment, the elastic member 22k is a coil spring. The elastic member 22k contacts both the support member 22j and the upper protruding portion 28a. Thereby, it is possible to suppress the downward movement of the drill holding portion 28 due to gravity. As described above, the first shaft portion 22h is fixed to the third attachment portion 22g. Further, the third attachment portion 22g is detachably attached to the second attachment portion 22b. Thereby, the drill holding portion 28 is detachably attached to the attachment portion 22.

[0039] The lever 28d is fixed to the side surface of the drill holding portion 28. When an operator or the like who cuts the workpiece 93a by the first processing portion 25 grabs the lever 28d and applies a downward force to the lever 28d, the elastic member 22k is elastically deformed by compression, so the drill holding portion 28 moves downward. When an operator or the like grabs the lever 28d and applies an upward force to the lever 28d, the drill holding portion 28 moves upward. Thereby, the drill holding portion 28 is movable in the pressing direction. Therefore, the drill member 26c is movable in the pressing direction.

[0040] The first restricting portion 29 restricts the amount of movement of the drill member 26c downward, that is, to the other side (-Z side) in the processing direction. In the present embodiment, the first restricting portion 29 has a columnar restricting portion 29a and an annular restricting portion 29b. The columnar restricting portion 29a is columnar and extends in the pressing direction. The upper end of the columnar restricting portion 29a is fixed to the drill holding portion 28. In the present embodiment, the distance between the lower end of the columnar restricting portion 29a and the lower end of the drill holding portion 28 is adjustable. When the drill holding portion 28 moves downward by a predetermined amount, the columnar restricting portion 29a contacts the third attachment portion 22g. Thereby, the amount of downward movement of the drill member 26c held by the drill holding portion 28 can be restricted.

[0041] The annular restricting portion 29b is annular and surrounds the drill member 26c. The annular restricting portion 29b is fixed to the drill member 26c. The annular restricting portion 29b is disposed above the third mounting portion 22g. In the present embodiment, the distance between the lower end of the annular restricting portion 29b and the lower end of the drill holding portion 28 is adjustable. When the drill holding portion 28 moves downward by a predetermined amount, the annular restricting portion 29b contacts the third mounting portion 22g. Thereby, the downward movement amount of the drill member 26c held by the drill holding portion 28 can be restricted. Therefore, the first restricting portion 29 can restrict the downward movement amount of the drill member 26c. Thus, the thickness of the workpiece portion 93a after being cut by the first processing portion 25 can be accurately adjusted. Thereby, it is possible to suppress the drill member 26c from penetrating the workpiece portion 93a in the processing direction by the cutting process of the first processing portion 25. In the present embodiment, the thickness of the workpiece portion 93a after being cut by the first processing portion 25 is preferably 1 mm or more and 2 mm or less. Note that the configuration of the first restricting portion 29 is not limited to the configuration of the present embodiment. For example, the first restricting portion 29 may have only one of the columnar restricting portion 29a and the annular restricting portion 29b.

[0042] The second processing portion 30 is a shearing device capable of punching the workpiece portion 93a by shearing. The second processing portion 30 is detachably attached to the attachment portion 22. As shown in FIG. 3, the second processing portion 30 includes a shearing portion 31, a rod holding portion 33, and a second restricting portion 34.

[0043] The shearing part 31 is disposed above the piping part 90. The shearing part 31 has a shearing main body part 31a and a rod member 31c. The shearing main body part 31a holds the rod member 31c. The rod member 31c shears the workpiece part 93a. More specifically, the rod member 31c punches a workpiece part 93a, which has been thinned by cutting with the first machining part 25, by shearing. The rod member 31c is rod-shaped and extends in the machining direction. The upper end of the rod member 31c is held by the shearing main body part 31a. When viewed from the machining direction, the rod member 31c overlaps with the workpiece part 93a.

[0044] As shown in FIG. 4, the surface facing the lower side of the rod member 31c is inclined with respect to the direction orthogonal to the processing direction. As shown in FIG. 5, the surface facing the lower side of the rod member 31c is planar. A blade portion 31d is formed at the lower edge of the surface facing the lower side of the rod member 31c as shown in FIG. 4. The blade portion 31d tapers downward. The tip angle θr, which is the angle formed by the direction orthogonal to the processing direction and the surface facing the lower side of the rod member 31c, is 5° or more and 45° or less. It is more preferable that the tip angle θr is 10° or more and 20° or less. When the rod member 31c is pressed downward in a state where the blade portion 31d of the rod member 31c is in contact with the workpiece 93a, the workpiece 93a is perforated by shear processing. Thereby, an exhaust hole 93b is formed in the workpiece 93a. Further, as described above, since the tip angle θr is 5° or more and 45° or less, the force applied to the chip of the workpiece 93a can be released in a direction inclined with respect to the processing direction. Therefore, the upper end portion 31e, which is the upper end of the surface facing the lower side of the rod member 31c in the workpiece 93a and the portion facing the pressing direction are not perforated, and the state of being connected to the lid portion 93 is maintained. As a result, since the chip of the workpiece 93a formed by the shear processing is connected to the lid portion 93, it is possible to suppress the chip from falling inside the pipe portion 90. When the workpiece 93a is sheared by the rod member 31c, since the frictional heat between the rod member 31c and the workpiece 93a is small, it is possible to suppress the generation of sparks. In the present embodiment, the outer diameter of the tip side portion of the rod member 31c is 9 mm. The outer diameter of the tip side portion of the rod member 31c may be smaller than the outer diameter of the tip side portion of the drill member 26c. Thereby, the rod member 31c can be inserted into the hole formed in the workpiece 93a by the cutting process of the first processing portion 25. Therefore, the workpiece 93a whose thickness has been reduced by the cutting process of the first processing portion 25 can be sheared.

[0045] As shown in FIG. 3, the rod holding portion 33 holds the shearing portion 31. More specifically, the rod holding portion 33 holds the shearing main body portion 31a. Thereby, the rod holding portion 33 holds the rod member 31c. The rod holding portion 33 is disposed above the fourth mounting portion 23a. The rod holding portion 33 is fixed to the fourth mounting portion 23a by a fastening member such as a screw (not shown). As described above, the fourth mounting portion 23a is detachably attached to the second mounting portion 22b. Thereby, the second processing portion 30 is detachably attached to the mounting portion 22. In the present embodiment, the rod holding portion 33 is a hydraulic jack. The rod holding portion 33 is movable in the processing direction with respect to the shearing portion 31. Thereby, the rod holding portion 33 is movable in the processing direction with respect to the rod member 31c. When the rod member 31c is pressed against the workpiece portion 93a by the rod holding portion 33, the workpiece portion 93a is perforated by shearing, and the exhaust hole 93b is formed.

[0046] The second restricting portion 34 is annular and surrounds the rod member 31c. The second restricting portion 34 is fixed to the rod member 31c. The second restricting portion 34 is disposed above the fourth mounting portion 23a. When the rod holding portion 33 moves downward by a predetermined amount, the second restricting portion 34 comes into contact with the fourth mounting portion 23a. Thereby, the amount of movement of the lower side of the rod member 31c, that is, the other side (-Z side) in the processing direction can be restricted.

[0047] As shown in FIG. 6, when the exhaust hole 93b is formed in the workpiece portion 93a, the rod holding portion 33 is removed from the fourth mounting portion 23a. At this time, the rod member 31c is disposed above the exhaust hole 93b. Thereby, since the inside of the piping portion 90 and the inside of the sealing portion 21 are connected via the exhaust hole 93b, the contained gas G, which is the gas inside the piping portion 90, flows into the inside of the sealing portion 21.

[0048] According to this embodiment, the drilling device 20 is attached to the outer surface of the pipe portion 90, and includes a sealing portion 21 that surrounds a workpiece portion 93a which is a part of the pipe portion 90, a first processing portion 25 capable of reducing the thickness of the workpiece portion 93a by cutting, a second processing portion 30 that drills the workpiece portion 93a cut by the first processing portion 25 by shearing, and a mounting portion 22 to which the first processing portion 25 and the second processing portion 30 are detachably attached. Therefore, since the exhaust hole 93b can be formed by shearing the workpiece portion 93a, it is possible to suppress the generation of sparks when the exhaust hole 93b is formed, as compared with the case where the exhaust hole 93b is formed by cutting. Thus, even if the pipe portion 90 is filled with the combustible contained gas G, it is possible to suppress the ignition of the contained gas G using such sparks as an ignition source. Therefore, the safety of the operation of providing the exhaust hole 93b in the pipe portion 90 can be enhanced.

[0049] Also, in this embodiment, the exhaust hole 93b can be formed by the shearing process of the second processing portion 30 with respect to the workpiece portion 93a whose thickness has been reduced by the cutting process of the first processing portion 25. Therefore, compared with the case where the exhaust hole 93b is formed by the shearing process of the second processing portion 30 without reducing the thickness of the workpiece portion 93a by the first processing portion 25, the shearing force required to drill the workpiece portion 93a in the shearing process can be reduced. Thus, since an increase in the strength required for the second processing portion 30 can be suppressed, simplification and miniaturization of the configuration of the second processing portion 30 can be achieved.

[0050] Also, in this embodiment, since the thickness of the workpiece portion 93a is reduced by the cutting process of the first processing portion 25, it is possible to suppress an increase in the man-hours for reducing the thickness of the workpiece portion 93a, as compared with the case where the thickness of the workpiece portion 93a is reduced by, for example, grinding.

[0051] Also, in the present embodiment, the inside and the outside of the sealed portion 21 are hermetically sealed. Therefore, it is possible to suppress the leakage of the contained gas G discharged from the exhaust hole 93b to the outside of the sealed portion 21. As a result, it is possible to suppress the leakage of the contained gas G, which may ignite and may have an adverse effect on the human body, to the outside of the sealed portion 21. Therefore, the safety of the operation of drilling the piping portion 90 can be enhanced.

[0052] According to the present embodiment, the sealed portion 21 has a through hole 21a penetrating the sealed portion 21, and nitrogen gas Gn can be supplied to the inside of the sealed portion 21 through the through hole 21a. Therefore, the exhaust hole 93b can be formed in the workpiece portion 93a in a state where the air inside the sealed portion 21 is replaced with nitrogen gas Gn. Thereby, even when the first concentration D1 of the contained gas G is greater than the second concentration D2, the first concentration D1 of the contained gas G discharged into the sealed portion 21 through the exhaust hole 93b can be diluted with the nitrogen gas Gn. Therefore, even if the drill member 26c accidentally penetrates the workpiece portion 93a when performing cutting by the first processing portion 25, it is possible to suppress the ignition of the contained gas G using the spark generated by the cutting as an ignition source. Therefore, the safety of the operation of drilling the piping portion 90 can be more suitably enhanced.

[0053] The outer surface of the workpiece portion 93a faces upward, that is, one side in the processing direction (+Z side), and the first processing portion 25 includes a drill member 26c that cuts the workpiece portion 93a, a drill holding portion 28 that holds the drill member 26c and is movable in the processing direction, and a first regulating portion 29 that regulates the amount of movement of the drill holding portion 28 downward, that is, to the other side in the processing direction (-Z side). Therefore, since the first regulating portion 29 can regulate the position where the drill member 26c can move downward, it is easy to suppress the drill member 26c from penetrating the workpiece portion 93a. As a result, it is easy to suppress the formation of the exhaust hole 93b in the workpiece portion 93a by the cutting process. Therefore, it is possible to more suitably suppress the ignition of the contained gas G using the spark generated during the cutting process as an ignition source.

[0054] In addition, in the present embodiment, as described above, since the drill member 26c can regulate the position where it can move downward, it is easy to make the thickness of the machined portion 93a after cutting to a predetermined thickness. Thereby, it is possible to more preferably suppress an increase in the shearing force applied to the machined portion 93a for drilling the machined portion 93a. Therefore, since it is possible to more preferably suppress an increase in the strength required for the second machining portion 30, it is possible to more preferably simplify and reduce the size of the configuration of the second machining portion 30.

[0055] According to the present embodiment, the second machining portion 30 includes a rod member 31c that punches the machined portion 93a by shearing, a rod holding portion 33 that holds the rod member 31c and is movable in the machining direction, and a second regulating portion 34 that regulates the amount of movement of the rod holding portion 33 downward, that is, to the other side (-Z side) in the machining direction. Therefore, since the second regulating portion 34 can regulate the position where the rod member 31c can move downward, it is possible to suppress the rod member 31c from entering too far into the inside of the pipe portion 90. Thereby, it is possible to suppress the pieces of the machined portion 93a formed by the shearing process from falling inside the pipe portion 90. Therefore, it is possible to preferably suppress the hydrogen gas contained in the encapsulated gas G from igniting due to the kinetic energy when the pieces of the machined portion 93a fall.

[0056] According to the present embodiment, a blade portion 31d protruding downward is provided on the lower side of the rod member 31c, that is, the surface facing the other side (-Z side) in the processing direction. The tip angle θr, which is the angle formed by the surface facing the lower side of the rod member 31c and the direction orthogonal to the processing direction, is 5° or more and 45° or less. When the tip angle θr is less than 5°, when the rod member 31c shears the workpiece 93a, the direction of the shearing force applied to the workpiece 93a is too downward. Therefore, the chips of the workpiece 93a are likely to fall inside the pipe portion 90. As a result, as described above, the hydrogen gas contained in the encapsulated gas G is likely to ignite. Further, when the tip angle θr is greater than 45°, the angle formed by the surface facing the lower side of the rod member 31c and the surface facing the upper side of the lid portion 93 becomes too large, so that the shearing force applied to the workpiece 93a becomes too small. Therefore, it is difficult to punch the workpiece 93a by shearing. On the other hand, in the present embodiment, since the tip angle θr is 5° or more and 45° or less, it is possible to suppress the direction of the shearing force applied to the workpiece 93a from being too downward, and it is possible to suppress the shearing force applied to the workpiece 93a from becoming too small. Therefore, it is possible to suppress the chips of the workpiece 93a from falling inside the pipe portion 90, and it is possible to easily form the exhaust hole 93b.

[0057] The flow path 40 is a flow path through which the gas inside the sealing portion 21, that is, the encapsulated gas G and gases such as nitrogen gas Gn flow. As shown in FIG. 1, the flow path 40 includes a supply flow path 41, a first discharge flow path 42, a first nitrogen gas supply flow path 43, a second discharge flow path 44, a second nitrogen gas supply flow path 45, a fourth flow path 46, and a fifth flow path 47. In the path of the flow path 40, a valve 50, a measurement unit 61, an oxygen concentration measurement unit 62, a gas storage unit 63, a filter 64, a nitrogen gas supply unit 65, a receiver tank 66, an identification unit 67, and a pressure gauge 68 are arranged.

[0058] The valve 50 can switch between opening and closing each flow path of the flow path 40. When the valve 50 is in the closed state, the flow of gases such as the encapsulated gas G and the nitrogen gas Gn is suppressed. When the valve 50 is in the open state, the flow of gases such as the encapsulated gas G and the nitrogen gas Gn is allowed. Thereby, the flow of gases such as the encapsulated gas G or the nitrogen gas Gn flowing through the flow path 40 can be adjusted. The gas discharge device 10 has a plurality of valves 50. In the present embodiment, the gas discharge device 10 has 13 valves 50. The plurality of valves 50 include a first valve 50a, a second valve 50b, a third valve 50c, a fourth valve 50d, a fifth valve 50e, a sixth valve 50f, a seventh valve 50g, an eighth valve 50h, a ninth valve 50i, a tenth valve 50j, an eleventh valve 50k, a twelfth valve 50m, and a thirteenth valve 50n.

[0059] The measurement unit 61 measures a first concentration D1, which is the concentration of hydrogen gas contained in the encapsulated gas G, that is, the gas inside the sealed portion 21. The oxygen concentration measurement unit 62 measures the concentration of oxygen gas contained in the encapsulated gas G. As the measurement unit 61 and the oxygen concentration measurement unit 62, a gas chromatograph can be used.

[0060] The gas storage unit 63 is a container that stores the encapsulated gas G. The gas storage unit 63 has a first gas storage unit 63a and a second gas storage unit 63b. The filter 64 is a filter that removes foreign substances such as dust contained in gases such as the encapsulated gas G discharged from the gas storage unit 63 to the atmospheric atmosphere. The nitrogen gas supply unit 65 supplies nitrogen gas Gn to the inside of the gas storage unit 63 and the sealed portion 21. The receiver tank 66 is a container that stores the nitrogen gas Gn supplied from the nitrogen gas supply unit 65 to the inside of the sealed portion 21.

[0061] The identification unit 67 is a measuring instrument that identifies the substances contained in the encapsulated gas G. In the present embodiment, the identification unit 67 can measure radioactive isotopes of krypton such as krypton 85 that may be contained in the encapsulated gas G. The pressure gauge 68 measures the atmospheric pressure of the encapsulated gas G inside the sealed portion 21.

[0062] Next, the configuration of each flow path included in the flow path 40 will be described. In the description of each flow path, the "one end" refers to the upstream end in the flow direction of the gas such as the encapsulated gas G or the nitrogen gas Gn, and the "other end" refers to the downstream end in the flow direction of the gas such as the encapsulated gas G or the nitrogen gas Gn.

[0063] The supply flow path 41 connects the inside of the sealing portion 21 to each of the measurement portion 61 and the gas storage portion 63. One end of the supply flow path 41 is disposed inside the sealing portion 21. The other end of the supply flow path 41 is connected to each of the measurement portion 61 and the gas storage portion 63. The supply flow path 41 is a flow path that supplies the encapsulated gas G inside the sealing portion 21 to each of the measurement portion 61 and the gas storage portion 63. The supply flow path 41 has a first flow path 41a, a second flow path 41b, and a third flow path 41c.

[0064] The first flow path 41a connects the inside of the sealing portion 21 to each of the second flow path 41b and the third flow path 41c. One end of the first flow path 41a is disposed inside the sealing portion 21. The other end of the first flow path 41a is connected to one end of the second flow path 41b and one end of the third flow path 41c. The second valve 50b and the thirteenth valve 50n are disposed in the first flow path 41a. When the second valve 50b and the thirteenth valve 50n are in the open state, the encapsulated gas G inside the sealing portion 21 flows into the second flow path 41b and the third flow path 41c. When at least one of the second valve 50b and the thirteenth valve 50n is in the closed state, it is possible to suppress the flow of the encapsulated gas G inside the sealing portion 21 into the second flow path 41b and the third flow path 41c.

[0065] The second flow path 41b connects the first flow path 41a and the measurement portion 61. One end of the second flow path 41b is connected to the other end of the first flow path 41a. The other end of the second flow path 41b is connected to the measurement portion 61. The oxygen concentration measurement portion 62 and the third valve 50c are disposed in the second flow path 41b. The third valve 50c is disposed upstream of the oxygen concentration measurement portion 62 in the second flow path 41b. When the third valve 50c is in the open state, the encapsulated gas G flows into the oxygen concentration measurement portion 62 and the measurement portion 61. When the third valve 50c is in the closed state, it is possible to suppress the flow of the encapsulated gas G into the oxygen concentration measurement portion 62 and the measurement portion 61.

[0066] The third flow path 41c connects the first flow path 41a and the gas storage portion 63. One end of the third flow path 41c is connected to the other end of the first flow path 41a. The other end of the third flow path 41c is connected to the gas storage portion 63. More specifically, the other end of the third flow path 41c is connected to the first gas storage portion 63a. A fourth valve 50d is disposed in the third flow path 41c. When the fourth valve 50d is in the open state, the encapsulated gas G in the gas storage portion 63 flows in. When the third valve 50c is in the closed state, it is possible to suppress the encapsulated gas G in the gas storage portion 63 from flowing in.

[0067] The first discharge flow path 42 is a flow path for discharging the encapsulated gas G stored in the gas storage portion 63 to the atmospheric atmosphere. One end of the first discharge flow path 42 is connected to a portion of the third flow path 41c upstream of the fourth valve 50d. The other end of the first discharge flow path 42 is disposed in the atmospheric atmosphere. A first valve 50a and a filter 64 are disposed in the first discharge flow path 42. The filter 64 is disposed downstream of the first valve 50a in the first discharge flow path 42. When the first valve 50a is in the open state, the encapsulated gas G stored in the gas storage portion 63 is discharged to the atmospheric atmosphere. When the first valve 50a is in the closed state, it is possible to suppress the encapsulated gas G stored in the gas storage portion 63 from being discharged to the atmospheric atmosphere.

[0068] The first nitrogen gas supply flow path 43 connects the nitrogen gas supply portion 65 and the gas storage portion 63. One end of the first nitrogen gas supply flow path 43 is connected to the nitrogen gas supply portion 65. The other end of the first nitrogen gas supply flow path 43 is connected to the gas storage portion 63. The first nitrogen gas supply flow path 43 is a flow path for supplying nitrogen gas Gn from the nitrogen gas supply portion 65 to the gas storage portion 63. The first nitrogen gas supply flow path 43 has a main flow path 43a, a first branch flow path 43b, and a second branch flow path 43c. A fifth valve 50e is disposed in the first nitrogen gas supply flow path 43. In the present embodiment, the gas discharge device 10 has two fifth valves 50e. One fifth valve 50e is disposed in the first branch flow path 43b, and the other fifth valve 50e is disposed in the second branch flow path 43c.

[0069] The main flow path 43a connects the nitrogen gas supply unit 65 to each of the first branch flow path 43b and the second branch flow path 43c. One end of the main flow path 43a is connected to the nitrogen gas supply unit 65. The other end of the main flow path 43a is connected to one end of the first branch flow path 43b and one end of the second branch flow path 43c. The nitrogen gas Gn flowing into the main flow path 43a from the nitrogen gas supply unit 65 flows into the first branch flow path 43b and the second branch flow path 43c.

[0070] The first branch flow path 43b connects the main flow path 43a to the first gas storage unit 63a. One end of the first branch flow path 43b is connected to the other end of the main flow path 43a. The other end of the first branch flow path 43b is connected to the first gas storage unit 63a. The first branch flow path 43b is a flow path that supplies the nitrogen gas Gn flowing through the main flow path 43a to the first gas storage unit 63a. One of the fifth valves 50e is disposed in the first branch flow path 43b. When one of the fifth valves 50e is in the open state, the nitrogen gas Gn is supplied to the first gas storage unit 63a. When one of the fifth valves 50e is in the closed state, it is possible to suppress the supply of the nitrogen gas Gn to the first gas storage unit 63a.

[0071] The second branch flow path 43c connects the main flow path 43a to the second gas storage unit 63b. One end of the second branch flow path 43c is connected to the other end of the main flow path 43a. The other end of the second branch flow path 43c is connected to the second gas storage unit 63b. The second branch flow path 43c is a flow path that supplies the nitrogen gas Gn flowing through the main flow path 43a to the second gas storage unit 63b. The other of the fifth valves 50e is disposed in the second branch flow path 43c. When the other of the fifth valves 50e is in the open state, the nitrogen gas Gn is supplied to the second gas storage unit 63b. When the other of the fifth valves 50e is in the closed state, it is possible to suppress the supply of the nitrogen gas Gn to the second gas storage unit 63b.

[0072] The second discharge flow path 44 connects the second gas storage portion 63b and the first discharge flow path 42. One end of the second discharge flow path 44 is connected to the second gas storage portion 63b. The other end of the second discharge flow path 44 is connected to a portion of the first discharge flow path 42 upstream of the first valve 50a. A sixth valve 50f is disposed in the second discharge flow path 44. When the sixth valve 50f is in the open state, a dilution gas Gd, which will be described later and has its hydrogen gas concentration diluted by the nitrogen gas Gn stored in the second gas storage portion 63b, is discharged into the atmospheric atmosphere. The second discharge flow path 44 is a flow path for discharging the dilution gas Gd from the gas storage portion 63 to the atmospheric atmosphere. When the sixth valve 50f is in the closed state, it is possible to suppress the discharge of the dilution gas Gd into the atmospheric atmosphere.

[0073] The second nitrogen gas supply flow path 45 connects the nitrogen gas supply portion 65 and the inside of the sealing portion 21. One end of the second nitrogen gas supply flow path 45 is connected to the nitrogen gas supply portion 65. The other end of the second nitrogen gas supply flow path 45 is disposed inside the sealing portion 21. The second nitrogen gas supply flow path 45 is a flow path for supplying the nitrogen gas Gn from the nitrogen gas supply portion 65 to the inside of the sealing portion 21. A receiver tank 66, an eighth valve 50h, a ninth valve 50i, and a tenth valve 50j are disposed in the second nitrogen gas supply flow path 45. The eighth valve 50h, the receiver tank 66, the ninth valve 50i, and the tenth valve 50j are arranged in this order from the upstream side to the downstream side of the second nitrogen gas supply flow path 45. When the eighth valve 50h, the ninth valve 50i, and the tenth valve 50j are in the open state, the nitrogen gas Gn is supplied to the inside of the sealing portion 21. When at least one of the eighth valve 50h, the ninth valve 50i, and the tenth valve 50j is in the closed state, it is possible to suppress the supply of the nitrogen gas Gn to the inside of the sealing portion 21.

[0074] The fourth flow path 46 connects the inside of the sealed portion 21 and the pressure gauge 68. One end of the fourth flow path 46 is disposed inside the sealed portion 21. The other end of the fourth flow path 46 is connected to the pressure gauge 68. A twelfth valve 50m is disposed in the fourth flow path 46. When the twelfth valve 50m is in the open state, the encapsulated gas G is supplied to the pressure gauge 68. Thereby, the pressure of the encapsulated gas G inside the sealed portion 21 can be measured by the pressure gauge 68. When the twelfth valve 50m is in the closed state, supply of the encapsulated gas G to the pressure gauge 68 can be suppressed.

[0075] The fifth flow path 47 connects the inside of the sealed portion 21 and the identification unit 67. One end of the fifth flow path 47 is disposed inside the sealed portion 21. The other end of the fifth flow path 47 is connected to the identification unit 67. An eleventh valve 50k is disposed in the fifth flow path 47. When the eleventh valve 50k is in the open state, the encapsulated gas G is supplied to the identification unit 67. Thereby, the substance contained in the encapsulated gas G can be identified by the identification unit 67. When the eleventh valve 50k is in the closed state, supply of the encapsulated gas G to the identification unit 67 can be suppressed.

[0076] FIG. 7 is a schematic diagram showing a first flow path state C1 of the gas discharge device 10 of the present embodiment. FIG. 8 is a schematic diagram showing a second flow path state C2 of the gas discharge device 10 of the present embodiment. FIG. 9 is a schematic diagram showing a third flow path state C3 of the gas discharge device 10 of the present embodiment. FIG. 10 is a schematic diagram showing a fourth flow path state C4 of the gas discharge device 10 of the present embodiment. FIG. 11 is a schematic diagram showing a fifth flow path state C5 of the gas discharge device 10 of the present embodiment. In the gas discharge device 10, by appropriately setting each of the plurality of valves 50 to an open state or a closed state, the flow path 40 can be configured into each of a first flow path state C1, a second flow path state C2, a third flow path state C3, a fourth flow path state C4, and a fifth flow path state C5.

[0077] In the first flow path state C1 shown in FIG. 7, the second valve 50b is in a closed state. Each valve other than the second valve 50b may be in a closed state or an open state. In the first flow path state C1, it is possible to suppress the internal gas G inside the hermetic portion 21 from flowing into the second flow path 41b and the third flow path 41c. Thereby, it is possible to suppress the internal gas G from being discharged into the atmospheric atmosphere.

[0078] In the second flow path state C2 shown in FIG. 8, the second valve 50b, the third valve 50c, the fourth valve 50d, the eleventh valve 50k, the twelfth valve 50m, and the thirteenth valve 50n are in an open state. The first valve 50a, the sixth valve 50f, and the seventh valve 50g are in a closed state. The eighth valve 50h, the ninth valve 50i, and the tenth valve 50j may be in a closed state or an open state.

[0079] In the second flow path state C2, the internal gas G is stored inside the first gas storage portion 63a of the gas storage portion 63. Further, the internal gas G flows into the measurement portion 61. In the second flow path state C2, since the first valve 50a is in a closed state, it is possible to suppress the internal gas G stored in the gas storage portion 63 from being discharged into the atmospheric atmosphere. Also, the substance contained in the internal gas G can be identified by the identification unit 67. Furthermore, the pressure of the internal gas G inside the hermetic portion 21 can be measured by the pressure gauge 68.

[0080] In the third flow path state C3 shown in FIG. 9, the third valve 50c and the fourth valve 50d are in an open state. The first valve 50a, the second valve 50b, the fifth valve 50e, the sixth valve 50f, the seventh valve 50g, and the thirteenth valve 50n are in a closed state. The eighth valve 50h, the ninth valve 50i, the tenth valve 50j, the eleventh valve 50k, and the twelfth valve 50m may be in a closed state or an open state.

[0081] In the third flow path state C3, the first concentration D1, which is the concentration of hydrogen gas contained in the encapsulated gas G, can be measured by the measurement unit 61. Also, since the second valve 50b is in the closed state, it is possible to suppress the supply of the encapsulated gas G to the measurement unit 61 and the gas storage unit 63. Therefore, it is possible to suppress a deviation between the first concentration D1 of the encapsulated gas G stored in the gas storage unit 63 and the first concentration D1 measured by the measurement unit 61. Further, since the first valve 50a is in the closed state, it is possible to suppress the encapsulated gas G stored in the gas storage unit 63 from being discharged into the atmospheric atmosphere.

[0082] In the fourth flow path state C4 shown in FIG. 10, the first valve 50a and the fourth valve 50d are in the open state. The second valve 50b, the fifth valve 50e, the sixth valve 50f, the seventh valve 50g, and the thirteenth valve 50n are in the closed state. The third valve 50c, the eighth valve 50h, the ninth valve 50i, the tenth valve 50j, the eleventh valve 50k, and the twelfth valve 50m may be in the closed state or in the open state.

[0083] In the fourth flow path state C4, when the first concentration D1 of the encapsulated gas G measured by the measurement unit 61 in the third flow path state C3 is less than or equal to the second concentration D2, the encapsulated gas G stored in the gas storage unit 63 is discharged into the atmospheric atmosphere. In this embodiment, when the first concentration D1 of the encapsulated gas G is less than the second concentration D2, even if there is an ignition source such as a spark around the encapsulated gas G, the encapsulated gas G does not ignite. In the fourth flow path state C4, since the second valve 50b is in the closed state, it is possible to suppress the supply of the encapsulated gas G to the measurement unit 61 and the gas storage unit 63. Therefore, it is possible to suppress a deviation between the first concentration D1 of the encapsulated gas stored in the gas storage unit 63 and the first concentration D1 measured by the measurement unit 61. In this embodiment, the second concentration D2 is 4% by weight.

[0084] In the fifth flow path state C5 shown in FIG. 11, the first valve 50a, the fifth valve 50e, the sixth valve 50f, and the seventh valve 50g are in the open state. The second valve 50b, the fourth valve 50d, and the thirteenth valve 50n are in the closed state. The third valve 50c, the eighth valve 50h, the ninth valve 50i, the tenth valve 50j, the eleventh valve 50k, and the twelfth valve 50m may be in the closed state or the open state.

[0085] In the fifth flow path state C5, when the first concentration D1 of the encapsulated gas G measured by the measurement unit 61 in the third flow path state C3 is greater than the second concentration D2, nitrogen gas Gn is supplied to the gas storage unit 63. More specifically, nitrogen gas Gn is supplied from the nitrogen gas supply unit 65 to each of the first gas storage unit 63a and the second gas storage unit 63b. Thereby, the concentration of hydrogen gas in the encapsulated gas G stored in each of the first gas storage unit 63a and the second gas storage unit 63b can be diluted. Therefore, in the gas storage unit 63, a diluted gas Gd in which the first concentration D1 is smaller than the second concentration D2 can be generated.

[0086] Also, in the fifth flow path state C5, since the first valve 50a, the sixth valve 50f, and the seventh valve 50g are in the open state, the diluted gas Gd stored in the gas storage unit 63 can be discharged into the atmospheric atmosphere through the second discharge flow path 44 and the first discharge flow path 42. In the fifth flow path state C5, since the seventh valve 50g is in the open state, the encapsulated gas G stored in the first gas storage unit 63a can be divided and stored in each of the first gas storage unit 63a and the second gas storage unit 63b. Thereby, since the atmospheric pressure of the encapsulated gas G in the first gas storage unit 63a and the second gas storage unit 63b can be reduced, nitrogen gas Gn can be easily supplied from the nitrogen gas supply unit 65 to each of the first gas storage unit 63a and the second gas storage unit 63b through the first nitrogen gas supply flow path 43. Therefore, in the gas storage unit 63, the diluted gas Gd can be stably generated.

[0087] In the fifth flow path state C5, since the fourth valve 50d is in the closed state, it is possible to suppress the enclosed gas G before the concentration of the hydrogen gas contained in the first gas storage unit 63a is diluted from being discharged into the atmospheric atmosphere through the first discharge flow path 42. Further, in the fifth flow path state C5, since the second valve 50b is in the closed state, it is possible to suppress the enclosed gas G inside the sealed unit 21 from being supplied to the measurement unit 61 and the gas storage unit 63. Therefore, it is possible to suppress a deviation between the first concentration D1 of the enclosed gas stored in the gas storage unit 63 and the first concentration D1 measured by the measurement unit 61.

[0088] In the second flow path state C2, the third flow path state C3, the fourth flow path state C4, and the fifth flow path state C5, when the eighth valve 50h, the ninth valve 50i, and the tenth valve 50j are opened, nitrogen gas Gn can be supplied into the sealed unit 21. Thereby, since the first concentration D1 of the enclosed gas G inside the sealed unit 21 can be decreased, in the second flow path state C2, the first concentration D1 of the enclosed gas G supplied to the gas storage unit 63 can be reduced.

[0089] According to the present embodiment, the gas discharge device 10 includes a flow path 40 through which the enclosed gas G, that is, the gas inside the sealed unit 21, flows, a measurement unit 61 that measures a first concentration D1 which is the concentration of hydrogen gas contained in the enclosed gas G, a gas storage unit 63 that stores the enclosed gas G, and a valve 50 capable of adjusting the flow rate of the enclosed gas G flowing through the flow path 40. The flow path 40 has a supply flow path 41 that connects the inside of the sealed unit 21 to each of the measurement unit 61 and the gas storage unit 63, and a first discharge flow path 42 that discharges the enclosed gas G from the gas storage unit 63 to the atmospheric atmosphere. The valve 50 has a first valve 50a disposed in the first discharge flow path 42. Therefore, when the first concentration D1 of the enclosed gas G measured by the measurement unit 61 is less than or equal to the second concentration D2, by opening the first valve 50a, the enclosed gas G that has no risk of ignition and is stored in the gas storage unit 63 can be discharged into the atmospheric atmosphere. Further, when the first concentration D1 of the enclosed gas G is greater than the second concentration D2, by closing the first valve 50a, it is possible to suppress the enclosed gas G that has a risk of ignition from being discharged into the atmospheric atmosphere. Therefore, it is possible to suppress the enclosed gas G discharged into the atmospheric atmosphere from igniting.

[0090] According to the present embodiment, the supply channel 41 has a first channel 41a connected to the inside of the sealing part 21, a second channel 41b connecting the first channel 41a and the measurement part 61, and a third channel 41c connecting the first channel 41a and the gas storage part 63. The valve 50 has a second valve 50b disposed in the first channel 41a, a third valve 50c disposed in the second channel 41b, and a fourth valve 50d disposed in the third channel 41c. Therefore, when the exhaust hole 93b is formed in the workpiece 93a by the drilling device 20, at least the second valve 50b can be closed to configure the channel 40 into the first channel state C1. Thereby, as described above, it is possible to suppress the encapsulated gas G flowing into the inside of the sealing part 21 through the exhaust hole 93b from being discharged into the atmospheric atmosphere through the channel 40. Therefore, it is possible to suppress the encapsulated gas G, the substance contained therein not being identified by the identification part 67, from being discharged into the atmospheric atmosphere. Thereby, it is possible to suppress the substance having an adverse effect on the human body from being discharged into the atmospheric atmosphere. Also, it is possible to suppress the encapsulated gas G, the first concentration D1 of which has not been measured by the measurement part 61, from being discharged into the atmospheric atmosphere. Thereby, it is possible to suppress the encapsulated gas G, which may ignite, from being discharged into the atmospheric atmosphere.

[0091] Also, in the present embodiment, by setting the first valve 50a to the closed state and the second valve 50b, the third valve 50c, and the fourth valve 50d to the open state, the flow path 40 can be configured into the second flow path state C2. Therefore, the encapsulated gas G inside the sealed portion 21 can be supplied to the measurement unit 61 and the gas storage unit 63 as described above. As a result, the encapsulated gas G can be stored in the gas storage unit 63. Further, the first concentration D1 of the encapsulated gas G having the same concentration as the encapsulated gas G stored in the gas storage unit 63 can be measured by the measurement unit 61. Thus, when the first concentration D1 measured by the measurement unit 61 is less than or equal to the second concentration D2, the encapsulated gas G stored in the gas storage unit 63 can be discharged into the atmospheric atmosphere. Also, when the first concentration D1 measured by the measurement unit 61 is greater than the second concentration D2, it is possible to suppress discharging the encapsulated gas G stored in the gas storage unit 63 directly into the atmospheric atmosphere. Therefore, it is possible to more preferably suppress discharging the encapsulated gas G that may ignite into the atmospheric atmosphere.

[0092] Also, in the present embodiment, after supplying the encapsulated gas G inside the sealed portion 21 to the measurement unit 61 and the gas storage unit 63, by setting the second valve 50b to the closed state, the third flow path state C3 and the fourth flow path state C4 can be configured, which can suppress the encapsulated gas G inside the sealed portion 21 from flowing into the second flow path 41b through the first flow path 41a. Thereby, it is possible to suppress the encapsulated gas G inside the sealed portion 21 from being discharged into the atmospheric atmosphere through the second flow path 41b and the first discharge flow path 42.

[0093] According to the present embodiment, the gas discharge device 10 includes a nitrogen gas supply unit 65 that supplies nitrogen gas Gn to the gas storage unit 63. The flow path 40 includes a first nitrogen gas supply flow path 43 that connects the nitrogen gas supply unit 65 and the gas storage unit 63, and a second discharge flow path 44 that discharges the diluted gas Gd in which the concentration of hydrogen gas is diluted by the nitrogen gas Gn from the gas storage unit 63 to the atmospheric atmosphere. Therefore, when the first concentration D1 of the contained gas G measured by the measurement unit 61 is greater than the second concentration D2, by supplying nitrogen gas Gn to the gas storage unit 63, a diluted gas Gd in which the first concentration D1 is less than or equal to the second concentration D2 can be generated. Furthermore, the diluted gas Gd can be discharged to the atmospheric atmosphere. Therefore, it is possible to suppress the ignition of the diluted gas Gd discharged to the atmospheric atmosphere.

[0094] According to the present embodiment, the valve 50 has a fifth valve 50e disposed in the first nitrogen gas supply flow path 43. Therefore, when nitrogen gas Gn is not supplied to the gas storage unit 63, by closing the fifth valve 50e, it is possible to suppress the supply of unnecessary nitrogen gas Gn to the gas storage unit 63. Therefore, an increase in the usage amount of nitrogen gas Gn can be suppressed.

[0095] According to the present embodiment, the flow path 40 has a second nitrogen gas supply flow path 45 that connects the nitrogen gas supply unit 65 and the inside of the sealing unit 21. Therefore, since the nitrogen gas supply unit 65 can supply nitrogen gas Gn to each of the inside of the gas storage unit 63 and the sealing unit 21, compared with the case where the gas discharge device 10 separately includes a nitrogen gas supply unit that supplies nitrogen gas Gn to each of the inside of the gas storage unit 63 and the sealing unit 21, the configuration of the gas discharge device 10 can be simplified. Therefore, an increase in the manufacturing cost of the gas discharge device 10 can be suppressed.

[0096] According to the present embodiment, the gas discharge device 10 includes an identification unit 67 that identifies the substances contained in the contained gas G inside the sealing unit 21. Therefore, when the identification unit 67 identifies that the contained gas G contains substances that have an adverse effect on the human body and the environment, it is possible to suppress the discharge of the contained gas G to the atmospheric atmosphere.

[0097] FIG. 12 is a flowchart showing the gas discharge method of the present embodiment. The gas discharge method of the present embodiment is a gas discharge method for discharging the contained gas G, that is, the gas in the piping section 90, by the gas discharge device 10. As shown in FIG. 12, the gas discharge method of the present embodiment includes a drilling step P1 of drilling the processed portion 93a of the piping section 90 and a discharging step P2 of discharging the contained gas G into the atmospheric atmosphere.

[0098] In the drilling step P1, an exhaust hole 93b is formed in the piping section 90 by drilling the processed portion 93a. Thereby, the contained gas G in the piping section 90 is discharged into the inside of the sealing portion 21. The drilling step P1 includes a first nitrogen gas supply step S01, a cutting step S02, and a shearing step S03.

[0099] In the first nitrogen gas supply step S01, nitrogen gas Gn is supplied from the nitrogen gas supply section 65 into the inside of the sealing portion 21. In the first nitrogen gas supply step S01, the eighth valve 50h, the ninth valve 50i, and the tenth valve 50j shown in FIG. 1 are in an open state. Thereby, nitrogen gas Gn is supplied from the nitrogen gas supply section 65 into the inside of the sealing portion 21 through the second nitrogen gas supply flow path. Therefore, the air inside the sealing portion 21 can be replaced with nitrogen gas Gn. When the air inside the sealing portion 21 is replaced with nitrogen gas Gn, the first nitrogen gas supply step S01 ends. Note that, in each of the cutting step S02 and the shearing step S03, nitrogen gas Gn may be supplied from the nitrogen gas supply section 65 into the inside of the sealing portion 21.

[0100] In the cutting step S02, the thickness of the workpiece portion 93a is reduced by the first machining portion 25. As described above, the first machining portion 25 reduces the thickness of the workpiece portion 93a by cutting using the drill member 26c. Also, as described above, by appropriately adjusting the distance between the lower end of the first regulating portion 29 and the lower end of the drill holding portion 28, the thickness of the workpiece portion 93a after cutting can be accurately adjusted. By these means, it is possible to suppress the drill member 26c from penetrating the workpiece portion 93a in the machining direction by the cutting by the first machining portion 25. Incidentally, as described above, in the cutting step S02, the thickness of the workpiece portion 93a after being cut by the first machining portion 25 is preferably 1 mm or more and 2 mm or less. When the cutting is performed until the thickness of the workpiece portion 93a reaches a predetermined thickness, the cutting step S02 ends.

[0101] In the shearing step S03, the workpiece portion 93a is perforated by the second machining portion 30. As described above, the second machining portion 30 perforates the workpiece portion 93a by shearing using the rod member 31c. Thereby, the exhaust hole 93b is formed in the workpiece portion 93a. When the exhaust hole 93b is formed in the workpiece portion 93a, the encapsulated gas G in the piping portion 90 is discharged into the interior of the sealing portion 21 through the exhaust hole 93b. When the exhaust hole 93b is formed in the workpiece portion 93a, the shearing step S03 ends. When the shearing step S03 ends, the perforating step P1 ends.

[0102] In the discharging step P2, the encapsulated gas G, that is, the gas in the piping portion 90, is discharged into the atmospheric atmosphere. As shown in FIG. 12, the discharging step P2 includes an identification step S04, a measurement step S05, a first discharging step S07, a second nitrogen gas supply step S08, and a second discharging step S09.

[0103] In the identification step S04, the identification unit 67 identifies the substances contained in the encapsulated gas G inside the sealed unit 21. The identification step S04 is a step performed before the first discharge step S07 and the second discharge step S09. In the identification step S04, the flow path 40 is configured in the second flow path state C2 shown in FIG. 8. Thereby, in the identification step S04, it is possible to suppress the encapsulated gas G from being discharged into the atmospheric atmosphere. When the identification unit 67 identifies that the encapsulated gas G contains a substance that has an adverse effect on the human body, such as krypton 85, although not shown, in this embodiment, the discharge step P2 is terminated. Thereby, it is possible to suppress the discharge of substances that have an adverse effect on the human body into the atmospheric atmosphere. When it is identified that the encapsulated gas G does not contain a substance that has an adverse effect on the human body, the measurement step S05 is performed. In the identification step S04, the encapsulated gas G is supplied to the measurement unit 61 and the gas storage unit 63.

[0104] In the measurement step S05, the measurement unit 61 measures the first concentration D1, which is the concentration of hydrogen gas contained in the encapsulated gas G. In the measurement step S05, the flow path 40 is configured in the third flow path state C3 shown in FIG. 9. Thereby, in the measurement step S05, it is possible to suppress the encapsulated gas G from being discharged into the atmospheric atmosphere. Also, as described above, since the second valve 50b is in the closed state, it is possible to suppress the encapsulated gas G inside the sealed unit 21 from being supplied to the measurement unit 61 and the gas storage unit 63. Therefore, it is possible to suppress a deviation between the first concentration D1 of the encapsulated gas stored in the gas storage unit 63 and the first concentration D1 measured by the measurement unit 61. When the measurement unit 61 measures the first concentration D1 of the encapsulated gas G, the measurement step S05 ends.

[0105] In the first discharge step S07, the encapsulated gas G stored in the gas storage unit 63 is discharged into the atmosphere. As shown in FIG. 12, the first discharge step S07 is a step that is performed when the first concentration D1 of the encapsulated gas G measured by the measurement unit 61 in the measurement step S05 is less than or equal to the second concentration D2 (S06). In the first discharge step S07, the flow path 40 is configured in the fourth flow path state C4 shown in FIG. 10. Thereby, in the first discharge step S07, the encapsulated gas G with the first concentration D1 less than or equal to the second concentration D2 stored in the gas storage unit 63 can be discharged into the atmosphere through the first discharge flow path 42. Further, since the second valve 50b is in the closed state, it is possible to suppress the encapsulated gas G inside the sealing unit 21 from being supplied to the gas storage unit 63. Therefore, since it is possible to suppress a deviation between the first concentration D1 of the encapsulated gas G discharged into the atmosphere and the first concentration D1 measured by the measurement unit 61, it is possible to suppress the encapsulated gas G having the first concentration D1 greater than the second concentration D2 from being discharged into the atmosphere.

[0106] In the second nitrogen gas supply step S08, nitrogen gas Gn is supplied from the nitrogen gas supply unit 65 to the gas storage unit 63. As shown in FIG. 12, the second nitrogen gas supply step S08 is a step that is performed when the first concentration D1 of the encapsulated gas G measured by the measurement unit 61 in the measurement step S05 is greater than the second concentration D2 (S06). In the second nitrogen gas supply step S08, the flow path 40 is configured in the fifth flow path state C5 shown in FIG. 11. Thereby, as described above, nitrogen gas Gn is supplied from the nitrogen gas supply unit 65 to each of the first gas storage unit 63a and the second gas storage unit 63b, and in the gas storage unit 63, a dilution gas Gd having the first concentration D1 less than the second concentration D2 can be generated.

[0107] In the second discharge step S09, the dilution gas Gd is discharged into the atmosphere through the second discharge channel 44. In the second discharge step S09, the channel 40 is configured in the fifth channel state C5 shown in FIG. 11. Thereby, as described above, the dilution gas Gd stored in the gas storage unit 63 is discharged into the atmosphere through the second discharge channel 44 and the first discharge channel 42. In the second discharge step S09, since the second valve 50b is in the closed state, it is possible to suppress the supply of the internal gas G inside the sealing unit 21 to the gas storage unit 63. Therefore, it is possible to suppress the discharge of the gas with the first concentration D1 being higher than the second concentration D2 into the atmosphere. Further, it is possible to suppress the discharge of the internal gas G inside the sealing unit 21 into the atmosphere through the first discharge channel 42.

[0108] In the subsequent steps, the measurement step S05, the first discharge step S07, the second nitrogen gas supply step S08, and the second discharge step S09 are repeatedly performed until the discharge of the internal gas G inside the piping unit 90 is completed. When the discharge of the internal gas G inside the piping unit 90 is completed, the discharge operation of the internal gas G ends.

[0109] According to the present embodiment, the gas discharge method includes a drilling step P1 of drilling the work piece 93a, and a discharge step P2 of discharging the internal gas G, that is, the gas inside the piping unit 90, into the atmosphere. The drilling step P1 includes a first nitrogen gas supply step S01 of supplying nitrogen gas Gn from the nitrogen gas supply unit 65 into the sealing unit 21, a cutting step S02 of thinning the thickness of the work piece 93a by the first processing unit 25, and a shearing step S03 of drilling the work piece 93a by the second processing unit 30. Therefore, in the drilling step P1, an exhaust hole 93b can be formed in the work piece 93a by the shearing process in the shearing step S03. Therefore, as described above, it is possible to suppress the generation of sparks when the exhaust hole 93b is formed as compared with the case where the exhaust hole 93b is formed by cutting. Thereby, it is possible to suppress the ignition of the internal gas G using such a spark as an ignition source. Therefore, the safety of the operation in the drilling step P1 can be improved.

[0110] Also, in the present embodiment, in the cutting step S02, since the thickness of the workpiece portion 93a is reduced by cutting, as described above, compared to the case where the thickness of the workpiece portion 93a is reduced by, for example, grinding, an increase in the man-hour of the cutting step S02 can be suppressed.

[0111] Also, in the present embodiment, since the cutting step S02 is performed after replacing the air inside the sealed portion 21 with nitrogen gas Gn in the first nitrogen gas supply step S01, as described above, even if the drill member 26c accidentally penetrates the workpiece portion 93a in the cutting step S02, ignition of the contained gas G can be suppressed with the sparks generated by cutting as an ignition source. Therefore, the safety of the operation in the cutting step S02 can be more suitably enhanced.

[0112] According to the present embodiment, the discharging step P2 includes a measuring step S05 of measuring the first concentration D1 by the measuring unit 61, and a first discharging step S07 of discharging the contained gas G stored in the gas storage unit 63 into the atmospheric atmosphere through the first discharge channel 42 when the first concentration D1 measured by the measuring unit 61 is less than or equal to the second concentration D2. Therefore, in the first discharging step S07, by opening the first valve 50a, the contained gas G that has no risk of ignition and is stored in the gas storage unit 63 can be discharged into the atmospheric atmosphere. Also, when the first concentration D1 of the contained gas G measured by the measuring unit 61 in the measuring step S05 is greater than the second concentration D2, by closing the first valve 50a, discharging of the contained gas G that has a risk of ignition into the atmospheric atmosphere can be suppressed. Therefore, ignition of the contained gas G discharged into the atmospheric atmosphere can be suppressed.

[0113] According to this embodiment, when the first concentration D1 of the contained gas G measured by the measurement unit 61 is greater than the second concentration D2, the discharge process P2 includes a second nitrogen gas supply process S08 of supplying nitrogen gas Gn from the nitrogen gas supply unit 65 to the gas storage unit 63, and a second discharge process S09 of discharging the dilution gas Gd into the atmosphere through the second discharge channel 44. Therefore, in the second nitrogen gas supply process S08, by supplying nitrogen gas Gn to the gas storage unit 63, as described above, a dilution gas Gd with the first concentration D1 being less than or equal to the second concentration D2 can be generated. Accordingly, in the second discharge process S09, the dilution gas Gd with the first concentration D1 being less than or equal to the second concentration D2 can be discharged into the atmosphere. Therefore, it is possible to suppress the contained gas G that may ignite from being directly discharged into the atmosphere.

[0114] According to this embodiment, before the first discharge process S07 and the second discharge process S09, the discharge process P2 includes an identification process S04 of identifying the substance contained in the contained gas G inside the sealed unit 21 by the identification unit 67. Therefore, as described above, it is possible to suppress the contained gas G whose contained substance has not been identified by the identification unit 67 from being discharged into the atmosphere in the first discharge process S07 and the second discharge process S09. Therefore, it is possible to suppress the contained gas G that may contain substances that have an adverse effect on the human body from being discharged into the atmosphere.

[0115] Although the embodiments of the present invention have been described above, the present invention is not limited to the above embodiments, and various modifications can be made without departing from the spirit of the present invention.

Description of Reference Numerals

[0116] 20... Perforating device, 21... Sealing part, 21a... Through hole, 22... Mounting part, 25... First processing part, 26c... Drill member, 28... Drill holding part, 29... First regulating part, 30... Second processing part, 31c... Rod member, 33... Rod holding part, 34... Second regulating part, 40... Flow path, 41... Supply flow path, 41a... First flow path, 41b... Second flow path, 41c... Third flow path, 42... First discharge flow path, 43... First nitrogen gas supply flow path, 44... Second discharge flow path, 45... Second nitrogen gas supply flow path, 50... Valve, 50a... First valve, 50b... Second valve, 50c... Third valve, 50d... Fourth valve, 50e... Fifth valve, 61... Measuring part, 63... Gas storage part, 65... Nitrogen gas supply part, 67... Identification part, 90... Pipe part, 93a... Workpiece, D1... First concentration, D2... Second concentration, G... Encapsulated gas (gas), Gd... Dilution gas, Gn... Nitrogen gas, P1... Perforating process, P2... Discharge process, S01... First nitrogen gas supply process, S02... Cutting process, S03... Shearing process, S04... Identification process, S05... Measuring process, S07... First discharge process, S08... Second nitrogen gas supply process, S09... Second discharge process

Claims

1. A sealing part attached to the outer surface of the piping part and surrounding a processed part that is a part of the piping part, A first processing part capable of thinning the thickness of the processed part by cutting, A second processing part for punching the processed part cut by the first processing part by shearing, An attachment part to which the first processing part and the second processing part are detachably attached, Comprising: A punching device in which the inside and the outside of the sealing part are hermetically sealed.

2. The sealing part has a through-hole penetrating the sealing part, The punching device according to claim 1, wherein nitrogen gas can be supplied to the inside of the sealing part through the through-hole.

3. The outer surface of the processed part faces one side in the processing direction, which is the direction in which the processed part is punched, The first processing part: A drill member for cutting the processed part, A drill holding part that holds the drill member and is movable in the processing direction, A first restricting part for restricting the amount of movement of the drill holding part to the other side in the processing direction, The punching device according to claim 1, comprising:

4. The second processing part: A rod member for punching the processed part by shearing, A rod holding part that holds the rod member and is movable in the processing direction, A second restricting part for restricting the amount of movement of the rod holding part to the other side in the processing direction, The punching device according to claim 3, comprising:

5. A blade part protruding toward the other side in the processing direction is provided on the surface of the rod member facing the other side in the processing direction, The angle formed by the surface of the rod member facing the other side in the processing direction and the direction orthogonal to the processing direction is 5° or more and 45° or less. The punching device according to claim 4.

6. The punching device according to any one of claims 1 to 4, A flow path through which the gas inside the sealing part flows, A measuring part provided in the flow path for measuring a first concentration, which is the concentration of hydrogen gas contained in the gas, A gas storage part provided in the flow path for storing the gas, A valve provided in the flow path for adjusting the flow rate of the gas flowing through the flow path, Comprising: The flow path has a supply flow path connecting the inside of the sealing part to each of the measuring part and the gas storage part, and a first discharge flow path for discharging the gas from the gas storage part to the atmospheric atmosphere, The valve has a first valve disposed in the first discharge flow path. A gas discharge device.

7. The supply flow path has a first flow path connected to the inside of the sealed portion, a second flow path connecting the first flow path and the measurement portion, and a third flow path connecting the first flow path and the gas storage portion. The gas discharge device according to claim 6, wherein the valve has a second valve disposed in the first flow path, a third valve disposed in the second flow path, and a fourth valve disposed in the third flow path.

8. The gas discharge device according to claim 6, further comprising a nitrogen gas supply unit provided in the flow path for supplying nitrogen gas to the gas storage portion. The flow path has a first nitrogen gas supply flow path connecting the nitrogen gas supply unit and the gas storage portion, and a second discharge flow path for discharging a dilution gas in which the concentration of hydrogen gas is diluted by the nitrogen gas from the gas storage portion to the atmospheric atmosphere. The gas discharge device according to claim 6.

9. The gas discharge device according to claim 8, wherein the valve has a fifth valve disposed in the first nitrogen gas supply flow path.

10. The gas discharge device according to claim 8, wherein the flow path has a second nitrogen gas supply flow path connecting the nitrogen gas supply unit and the inside of the sealed portion.

11. The gas discharge device according to claim 6, further comprising an identification unit for identifying a substance contained in the gas inside the sealed portion.

12. A sealed portion attached to the outer surface of the piping portion and surrounding a processed portion that is a part of the piping portion, a first processing portion capable of thinning the thickness of the processed portion by cutting, a second processing portion for punching the processed portion cut by the first processing portion by shearing, a mounting portion to which the first processing portion and the second processing portion are detachably mounted, a nitrogen gas supply unit for supplying nitrogen gas into the sealed portion, a flow path through which the gas inside the sealed portion flows, a measurement unit provided in the flow path for measuring a first concentration that is the concentration of hydrogen gas contained in the gas, a gas storage portion provided in the flow path for storing the gas, a valve provided in the flow path for adjusting the flow rate of the gas flowing through the flow path, and includes A gas discharge method for discharging the gas in the piping portion by a gas discharge device in which the inside and the outside of the sealed portion are hermetically sealed, comprising a punching step of punching the processed portion and a discharging step of discharging the gas in the piping portion to the atmospheric atmosphere. The punching step includes a first nitrogen gas supply step of supplying nitrogen gas from the nitrogen gas supply unit into the sealed portion. A cutting process of thinning the thickness of the workpiece by the first processing unit, A shearing process of perforating the workpiece by the second processing unit, and The flow path has a supply flow path connecting the inside of the sealing part to each of the measurement part and the gas storage part, and a first discharge flow path for discharging the gas from the gas storage part to the atmospheric atmosphere. The valve has a first valve disposed in the first discharge flow path. The discharging process includes a measurement process of measuring the first concentration by the measurement unit, and when the first concentration measured by the measurement unit is less than or equal to a second concentration which is a predetermined concentration, a first discharging process of discharging the gas contained in the gas storage part to the atmospheric atmosphere through the first discharge flow path. A gas discharging method.

13. The flow path has a first nitrogen gas supply flow path connecting the nitrogen gas supply part and the gas storage part, and a second discharge flow path for discharging a diluted gas in which the concentration of hydrogen gas is diluted by the nitrogen gas from the gas storage part to the atmospheric atmosphere. and The discharging process includes a second nitrogen gas supply process of supplying nitrogen gas from the nitrogen gas supply part to the gas storage part when the first concentration is greater than the second concentration, and a second discharging process of discharging the diluted gas to the atmospheric atmosphere through the second discharge flow path. The gas discharging method according to claim 12.

14. The gas discharging device includes an identification unit for identifying a substance contained in the gas inside the sealing part, and the discharging process has an identification process of identifying a substance contained in the gas inside the sealing part by the identification unit before the first discharging process and the second discharging process. The gas discharging method according to claim 13.

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