Nanocomposite coating material for rollers of secondary battery electrode manufacturing equipment and manufacturing system thereof

Abstract

To provide a novel coating material having heat resistance, seizure resistance, durability, chemical resistance, low friction, and releasability applied to a base material, and to provide a manufacturing method and manufacturing system for such a coating material.SOLUTION: A ternary nanocomposite coating material comprising C-F-H or C-F-Si applied to a base material is disclosed.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a nanocomposite coating material for a roller of a secondary battery electrode manufacturing facility and a manufacturing system thereof.

[0002] This application claims the priority of Korean Patent Application No. 10-2023-0167831, filed with the Korean Intellectual Property Office on November 28, 2023, the disclosure of which is incorporated herein by reference in its entirety.

Background Art

[0003] Parts of combustion engines such as rolling rollers, dies, pins for removing dies, pistons, tappets, cylinder heads, shafts, and motor members require seizure resistance. In particular, after the high-temperature molten metal has solidified, the die must be removed from the inside of the die without seizure when the product is taken out. Since combustion engine parts are also members that are rubbed at high temperatures, a surface with high-temperature seizure resistance is required, and motor members also require high-temperature seizure resistance due to frictional heat. In addition, large rollers used in secondary battery manufacturing equipment roll slurry-type substances, and in this case, durability, chemical resistance, low friction, mold release properties, seizure resistance, and heat resistance are required.

[0004] In order to have such characteristics, Patent Document 1: Korean Registered Patent No. 10-1709538 proposes a method of coating a DLC (Diamond-Like-Carbon) on the roller surface. However, DLC is weak against heat and it is difficult to apply it to rollers for hot rolling, and it is necessary to provide a better coating material that satisfies the above characteristics.

[0005] In addition, rollers attached to secondary battery electrode manufacturing equipment, as large rollers weighing up to 5 tons, include the problem that, unlike coating small members, they must be coated uniformly over a large area.

Prior Art Documents

Patent Documents

[0006] [Patent Document 1] Republic of Korea Patent Registration Bulletin No. 10-1709538 [Summary of the Invention] [Problems to be Solved by the Invention]

[0007] An object of the present invention is to provide a new coating material having heat resistance, anti-seizure property, durability, chemical resistance, low friction property, and mold release property, and a manufacturing method and a manufacturing system for such a coating material. [Means for Solving the Problems]

[0008] According to the above object, the present invention provides a ternary nanocomposite coating material containing C-F-Si or C-F-H.

[0009] That is, the present invention includes a C-F-H ternary nanocomposite coating layer as a coating material for a roller of a secondary battery electrode manufacturing facility. The ternary nanocomposite coating layer is formed by additionally supplying reducing hydrogen in addition to the C component and the F component during the formation process. The formation of F in the coating layer is 0 to 20 at%, but it is a gradient coating layer that contains more F components toward the surface side, has a contact angle of 90° or more, and has a high hardness characteristic of 17 to 27 GPa. The present invention provides a coating material for a roller of a secondary battery electrode manufacturing facility.

[0010] That is, the present invention provides a coating material for a roller of a secondary battery electrode manufacturing facility, which includes a ternary nanocomposite coating layer of C-F-Si; the ternary nanocomposite coating layer is formed by additionally supplying reducing hydrogen in addition to the C component, F component, and Si component during the formation process, and the formation of F in the coating layer is 0 to 20 at%, but it is a gradient coating layer that contains more F component towards the surface side, has a contact angle of 90° or more, and has a high hardness characteristic of 17 to 27 GPa.

[0011] Further, the present invention provides a coating system that enables uniform coating over a large area. For this purpose, it includes a large chamber into which a base material (coated body) is loaded, an ion source applied to the chamber, and a raw material supply unit that supplies the ion source with C, F, Si, or C, F, H as raw materials respectively, and provides a nanocomposite coating system that coats the base material with a ternary nanocomposite coating material containing C-F-Si or C-F-H in a CVD process.

[0012] In the above, in order to uniformly coat a large area in the large chamber, it is necessary to form a high-density plasma. Therefore, by arranging permanent magnets or electromagnets of the ion source, a magnetic field is formed so that the plasma is concentrated in a predetermined space.

[0013] In the above, in order to strongly attract the generated plasma and electrons to the base material side, it includes a power supply device, and a high bias voltage of 50 to 500 V is applied to the base material.

[0014] In the above, the jig for fixing the base material is configured to be rotatable and rotates during the coating process.

[0015] In the above, a cylinder sputtering device including a Cr cylinder target is mounted in the chamber so that a Cr-based buffer layer is formed on the surface of the base material before coating with the ternary nanocomposite material.

[0016] The present invention also provides a method for forming a ternary nanocomposite coating material containing C-F-Si or C-F-H using the coating system. In the raw material supply part of the ion source, hydrocarbon gas, F gas, SiH 4 , Si 2 H 6 , or SiH 2 Cl 2 Among them, one or more are supplied. To form a reducing atmosphere, hydrogen (H 2 ) is additionally supplied. Electric power of 500 - 2000 V and 0.3 - 1.8 A is applied to the ion source, and a bias voltage of 50 - 500 V is applied to the base material to form a ternary nanocomposite coating material containing C-F-Si.

[0017] The present invention also provides a method for forming a ternary nanocomposite coating material containing C-F-H. In the raw material supply part of the ion source, hydrocarbon gas and F gas are supplied. Additionally, to form a reducing atmosphere, hydrogen (H2) is additionally supplied. Electric power of 500 - 2000 V and 0.3 - 1.8 A is applied to the ion source, and a bias voltage of 50 - 500 V is applied to the jig to which the base material is fixed to form a ternary nanocomposite coating material containing C-F-H.

[0018] Before forming the ternary nanocomposite coating material, plasma cleaning is performed on the base material. An inert gas (such as Ar) is passed through the raw material supply part of the ion source, and electric power of 500 - 2000 V and 0.3 - 1.8 A is applied to the ion source, and a bias voltage of 50 - 500 V is applied to the base material.

[0019] After the plasma cleaning and before forming the ternary nanocomposite coating material, a Cr-based buffer layer is formed using a sputtering device including a Cr cylinder target. 5 - 20 A and 300 - 1000 V are applied to the sputtering device, and a bias voltage of 80 - 500 V is applied to the base material, and the process is carried out while flowing an inert gas and / or nitrogen (N 2 ).

[0020] As described above, the plasma cleaning is performed for 30 to 300 minutes, the buffer layer formation process is performed for 40 to 200 minutes, and the ternary nanocomposite coating material formation process is performed for 240 to 780 minutes.

[0021] As described above, the ternary nanocomposite coating material increases the content of the F component toward the surface side to enhance the releasability and anti-burnishing property.

[0022] As described above, the buffer layer is a gradient layer formed in the order of Cr / CrN / CrN 2 / CrN 2 (N component enhanced) / CrCH.

Advantages of the Invention

[0023] The ternary nanocomposite coating material containing C-F-Si according to the present invention exhibits a high hardness characteristic of 17 to 27 GPa, the bonding strength of the coating material is 20 N or more, showing excellent durability, a low friction coefficient of 0.12 or less, a contact angle of 90° or more, and excellent anti-burnishing property, releasability, and chemical resistance.

[0024] That is, according to the present invention, since the ternary nanocomposite coating material can be formed on the surface of the base material and the continuous process can be performed without long-term maintenance, the productivity of the in-line type manufacturing equipment is improved.

[0025] In addition, the ternary nanocomposite coating material according to the present invention has an electrical resistance of 10 5 ~10 8 Ω, preventing the generation of static electricity and arcing during operation or rest, and preventing the sticking of foreign substances.

[0026] In addition, since the ternary nanocomposite coating material manufacturing system according to the present invention does not generate defects on the surface of the coating material due to arcing, which was a problem with existing ion sources, the surface illuminance of the product is good and the quality is improved.

Brief Description of the Drawings

[0027]

Figure 1

Figure 2

Figure 3

Figure 4

Figure 5

Figure 6

Figure 7

Figure 8

Mode for Carrying Out the Invention

[0028] Hereinafter, the correct embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0029] The nanocomposite coating material of the present invention can exhibit anti-burnishing properties, heat resistance, chemical resistance, mold release properties, low friction properties, and durability, and can be applied to rolling rollers, molds, ejector pins, combustion engine parts (such as pistons, tappets, cylinder heads, shafts, etc.), motor members, rollers for secondary battery manufacturing equipment, and the like. When the above-described physical properties are required, the nanocomposite coating material of the present invention can be applied to various articles. The following examples will be described in detail particularly with respect to rollers for secondary battery manufacturing equipment, but the same coating technology is applicable when other articles such as molds are used as the base material, and it must be an easy technique for those skilled in the art to replace the base material.

[0030] Rollers used in secondary battery manufacturing equipment include those for cold rolling, hot rolling, and guiding. In equipment for continuously processing electrode materials using rollers to manufacture electrodes, the durability, anti-burnishing properties, heat resistance, chemical resistance, mold release properties, and low friction properties of the rollers directly affect the maintenance cycle and also affect the performance of the final product, the electrode. Therefore, the physical properties of the rollers as described above ultimately lead to the price competitiveness of the battery.

[0031] As shown in the example of FIG. 6, corrosion occurs on the surface of a conventional roller, resulting in burnishing to the mating material, and wear marks also remain on the products produced thereby. The present invention proposes a ternary nanocomposite coating material containing C-F-Si as shown in FIG. 1, as a coating material having properties enhanced compared to conventional nitride-based coatings. FIG. 1 shows a cross-sectional view of the state in which a buffer layer (2) is formed on a base material (1), a top layer (3) is formed on the buffer layer, and a ternary nanocomposite coating material is formed.

[0032] That is, as shown in FIG. 2, a ternary nanocomposite coating material containing an F component capable of enhancing mold release properties, anti-burnishing properties, and corrosion resistance and an Si component capable of enhancing amorphous properties, heat resistance, and corrosion resistance is designed based on a C component that can exhibit high hardness, low friction, and chemical resistance.

[0033] The roller before coating is originally made mostly of chrome steel, and in order to strengthen the adhesion of the nanocomposite coating material of the present invention, it is advantageous to form a Cr-based buffer layer. The buffer layer contains one or more of Cr, CrN, and Cr-N-C. Such a buffer layer configuration can also be applied to other articles (such as combustion engine parts, motor parts, press dies, die-cast dies, die members such as ejector pins) made of a base material containing chrome steel.

[0034] The buffer layer is formed to a thickness of 20 to 200 nm, and the ternary nanocomposite coating material containing C-F-Si is desirably formed to a thickness of 1 to 5 μm.

[0035] The formation of such a nanocomposite coating material for a roller in a secondary battery manufacturing facility requires a large manufacturing system due to the large size of the roller. As the manufacturing facility, including the chamber, becomes larger, a method capable of forming a uniform coating over a large area is required. A uniform coating over a large area is similarly required for large dies and rolling rollers in addition to rollers in secondary battery manufacturing facilities. In the case of small members such as combustion engine parts and ejector pins, a large number are loaded, so the requirement for a large-area uniform coating is the same.

[0036] Figure 3 illustrates a manufacturing system for a ternary nanocomposite coating material for a roller in a secondary battery manufacturing facility according to the present invention.

[0037] A roller (20) weighing approximately 5 tons includes a roller with a functional surface Lf at the center and a shaft extending from the center thereof toward both ends. The chamber (10) capable of loading a roller with a total length of about 3 m is also enlarged, and in order to reduce the manufacturing cost per unit, a larger chamber is desirable because a coating layer cannot be formed on a large number of products in a single coating.

[0038] The ends of both shafts of the roller are fixed to rotatable jigs (500), and the jigs are composed of conductors and also serve as electrical connection parts capable of applying a strong bias voltage to the roller.

[0039] Since the weight of the roller is about 5 tons and it is heavy, the structure in which both ends of the shaft are supported by the bottom and ceiling surfaces of the chamber is more stable than supporting both ends of the shaft in the air. That is, the jigs are arranged on the bottom and ceiling surfaces of the chamber, the rollers are arranged vertically, and are rotated by a turntable type jig (500) during the process. Such a fixing configuration of the base material is similarly applied to rolling rollers and molds. A large number of other small members are radially fixed to a large rotating jig, and the jig includes a member such as a latch.

[0040] As a means of forming a C-F-Si ternary nanocomposite coating material on a large chamber, an ion source (150), preferably a linear ion source, is installed. A raw material supply unit (100) for supplying a reaction gas to be supplied to the ion source is configured to ionize the reaction gas, and a CVD process is performed in which electrons of the generated ions generate plasma to form a coating layer on the roller surface. As will be described later, in addition to the ion source (150), a sputter source is added. (See FIG. 7)

[0041] If the chamber space is large and ternary cations are dispersed and generated, and the generated plasma is not densified, it is difficult to efficiently form a uniform coating layer over a large area. Therefore, the present invention constitutes an ion induction device (200) in which ion source magnets are arranged to confine and densify the plasma in a predetermined space by electromagnetic force. The arrangement of the magnets can be permanent magnets and / or electromagnets. Preferably, permanent magnets are arranged to generate a constant magnetic force to prevent heat generation. However, it can be composed of electromagnets, and an electromagnet can be stacked together with a permanent magnet to complement the magnetic field by the permanent magnet. That is, in order to analyze the density of the plasma in a coating system in which permanent magnets are arranged, or to adjust the plasma distribution from the sample coating result, the electromagnet at a position where the magnetic force can be changed can be driven to complement the magnetic field. The generated ions and plasma form a low-density plasma region (300) at the initial stage of generation, and a high-density plasma region (400) is formed by the ion induction device (200).

[0042] In addition, since it is necessary to strongly attract the densified plasma toward the base material roller, a bias voltage is applied to the base material roller side, and at this time, a very large power bias is applied. The bias voltage applied to the roller in this embodiment is 50 to 500 V as described in FIG. 4, and a bias current of 0.3 to 1.5 A flows. In the case of a small base material other than the roller, a bias voltage is applied to the jig. In the case of a base material of a mold, a bias voltage is applied to the mold through the mold body or the mold fixing member.

[0043] A photograph showing the behavior of the high-density plasma generated by the magnetic field and the strong bias voltage is attached to the upper right part of FIG. 3. Even in a wide space inside the large chamber, the plasma is not dispersed, but is concentrated in the space where the coating layer is to be formed, and the coating layer is formed with a strong attractive force and high energy.

[0044] On the other hand, as described above, a buffer layer is formed so that the ternary nanocomposite coating material is strongly adhered to the base material, and thereby a buffer layer forming system is added. That is, as shown in FIG. 7, a sputter source (sputtering apparatus) (160) is added to the chamber in addition to the ion source (150). A cylinder sputter source equipped with a Cr cylinder target is installed in the chamber to form a Cr-based buffer layer.

[0045] The ion source and the sputter source are respectively arranged in pairs at both ends of the chamber with the base material as the center. Such an arrangement of the coating sources is advantageous for forming a uniform coating layer on the roller rotating at the center.

[0046] The manufacturing process of the ternary nanocomposite coating material using the coating system is as follows. (See FIG. 4)

[0047] First, the surface of the base material is plasma-cleaned. The inside of the chamber is 10 -6 ~10 -5 torr, preferably the pressure at the start of the process is 7.0×10-5 After evacuating to a pressure below torr, an inert gas such as Ar is supplied to the chamber at an operating pressure of 8 to 20 mtorr, and the ion source is driven to clean for 30 to 300 minutes. The voltage applied to the ion source is 500 to 2000 V, the current is 0.3 to 1.8 A, the bias voltage applied to the roller is 50 to 150 kHz, 50 to 500 V, and a bias current of 0.3 to 1.5 A flows.

[0048] After the plasma cleaning is completed, the sputter source is driven together with the ion source to form a Cr-based buffer layer. A bias voltage is applied to the Cr cylinder target, and an inert gas such as Ar and / or nitrogen (N 2 ) gas is flowed, and 300 to 1000 V and 5 to 20 A are applied to the sputter source to form a buffer layer for 40 to 200 minutes. The process temperature is room temperature. The buffer layer can be composed of one or more of Cr, CrN, and Cr-N-C.

[0049] For the initial 20 to 30 minutes of forming the buffer layer, an inert gas such as Ar is supplied to the chamber at an operating pressure of 8 to 20 mtorr, and a bias voltage of 50 to 150 kHz, 80 to 500 V, and a bias current of 0.5 to 2 A are applied to the roller to form a Cr layer (the first gradient layer). Next, while maintaining the sputter source power and the roller bias power as they are, Ar, N 2 , and reducing H2 gas are supplied to the chamber at an operating pressure of 8 to 20 mtorr, and the nitrogen supply ratio is increased in three sections for 10 to 30 minutes to form CrN (the second gradient layer), CrN 2 (the third gradient layer), and CrN 2 (the fourth gradient layer) in the nitriding hardened layer. For the next 10 to 20 minutes, while maintaining the sputter source power and the roller bias power as they are, Ar, N 2 , carbon (C), and H 2 are supplied to form a CrCH carbonitriding hardened layer in the fifth gradient layer. The carbon supply source can use hydrocarbon gas. The buffer layer formed in this way has a thickness of 0.3 to 1.0 μm, strengthening the bonding force and enhancing the impact resistance.

[0050] Next, a ternary nanocomposite coating material of the present invention is formed.

[0051] One or more of hydrocarbon gas, CF 4 gas, TMS (Tetramethylsilane), SiH 4 , Si 2 H 6 , or SiH 2 Cl 2 is supplied to the raw material supply part of the ion source, and hydrogen (H 2 ) is additionally supplied to form a reducing atmosphere. An electric power of 500 - 2000 V and 0.3 - 1.8 A is applied to the ion source, and a bias voltage and current of 50 - 150 kHz, 50 - 500 V, and 0.3 - 1.5 A are applied to the base material to form a ternary nanocomposite coating material containing C - F - Si. Although hydrogen is supplied by the hydrocarbon gas, in the present invention, hydrogen (H 2 ) is separately supplied to further strengthen the reducing atmosphere.

[0052] In the formation of the ternary nanocomposite coating material of the top coating layer, for the initial 240 - 780 minutes, hydrocarbon, reducing hydrogen, and TMS are supplied to form a high - density, high - hardness wear - resistant nanometric coating layer based on CH as the first top coating layer. For the next 240 - 780 minutes, hydrocarbon, CF 4 , reducing hydrogen, and TMS are supplied to form a second top coating layer as an interface continuous layer for forming a nanocomposite carbon containing CFH and an anti - seizure functional layer. Then, for 30 - 180 minutes, hydrocarbon, CF 4 , reducing hydrogen, and TMS are supplied, but CF 4Increase the supply cost further to form an FCH coating layer as the third top coating layer to enhance the seizure resistance of the roller surface. That is, the F component increases toward the surface side of the top coating layer to enhance the seizure resistance of the base material surface. When forming the third top coating layer, the arcing of the driving part must be controlled so as not to inhibit the releasability. The overall thickness of the top coating layer shall be 1 to 3 μm. The process temperature shall be normal temperature.

[0053] On the other hand, when forming the top coating layer, it can also be composed of a ternary nanocomposite coating material excluding Si and including C-F-H. That is, it can be composed of a C-F-H composite coating material as needed, and in this case, the necessary releasability and high hardness can also be exhibited. When Si is included, it is more advantageous due to the improvement of low friction, and the coating material composition can be selected according to the required physical property specifications.

[0054] For the ternary nanocomposite coating layer of C-F-H or the ternary nanocomposite coating layer of C-F-Si, control the supply amount of the reactants so that the composition ratio of F and Si is 0 to 20 at%. The composition ratio of F is preferably 0.1 to 20 at%.

[0055] Since the process temperature is at the normal water level, there is almost no limitation on the type of the base material.

[0056] Perform the process in this way, and a ternary nanocomposite coating layer with a total thickness of 1 to 5 μm including the buffer layer is formed.

[0057] The physical properties of the ternary nanocomposite coating layer formed as described above are summarized in the form in FIG. 5.

[0058] The ternary nanocomposite coating material containing CF-Si according to the present invention exhibits high hardness characteristics of 17 to 27 GPa, has excellent durability due to the adhesive strength of the coating material being 20 N or more, shows a low friction coefficient of 0.12 or less, has a contact angle of 90° or more, and is excellent in seizure resistance, releasability, and chemical resistance. These are superior characteristics compared to conventional nitride-based coating materials.

[0059] In particular, the coating material has a contact angle of 90° or more, so the mating material does not seize during the rolling process of the roller, and other contaminants do not adhere to the material.

[0060] In addition, the ternary nanocomposite coating material of the present invention has an electrical resistance of 1x10 5 ~9.9x10 8 It has a resistance value of Ω, which is sufficient to provide antistatic function for equipment and anti-burning function for foreign matter. The base material such as a roller coated with the nanocomposite coating material of the present invention not only has releasability during operation, but also has the above-mentioned electrical resistance value during resting periods, preventing the generation of static electricity, arcing, and burning of foreign matter.

[0061] In other words, according to the present invention, by forming a ternary nanocomposite coating material on the surface of a base material such as a roller, a continuous process can be performed without maintenance for a long period of time, thereby improving the productivity of an in-line system in the case of secondary battery manufacturing equipment.

[0062] Unless otherwise defined in the above, all technical and scientific terms described herein have the same meaning as commonly understood by a skilled expert in the technical field to which the present invention belongs. In addition, terms defined in commonly used dictionaries are not interpreted abnormally or excessively unless specifically defined. When any part of the specification "includes" any element, this does not mean that other elements are excluded, but that other elements may be included, unless otherwise specified to the contrary. In addition, singular forms may include plural forms depending on the context.

[0063] In addition, in this specification, "on ~" or "on the upper part of ~", "under ~" or "on the lower part of ~" means being above or below the target part, and does not necessarily mean being located on the upper and lower sides based on the gravitational direction.

[0064] The rights of the present invention are not limited to the embodiments described above, but are defined by the claims, and it is obvious that those with ordinary knowledge in the field of the present invention can make various modifications and fabrications within the scope of the rights described in the claims.

[0065] Information on the national research and development project that supported this invention is as follows. Problem specific number; 020142225 Project number; 20142225 Department name; Small and Medium Venture Business Department Name of the organization in charge of problem management (specialty); Startup Promotion Agency, Korea University Sejong Industry-Academia Collaboration Group Name of the research project; 2023 Innovation Field Startup Package (New Industry Startup Cultivation) Name of the research problem; Advanced service for improving the manufacturing competitiveness of secondary batteries through a large-area nanocomposite material plasma deposition system and coating process technology Name of the organization that carried out the problem; Inotiontech Co., Ltd. Research period; 2023.04.27 ~ 2023.12.01

Explanation of symbols

[0066] 1: Base material 2: Buffer layer 3: Top layer 10: Chamber 20: Roller 100: Raw material supply section 150: Ion source 300: Low-density plasma region 200: Ion induction device 400: High-density plasma region 500: Fixture

Claims

1. As a coating material for rollers in secondary battery electrode manufacturing equipment, a C-F-H ternary nanocomposite coating layer; The ternary nanocomposite coating layer comprises: During the formation process, reducing hydrogen is additionally supplied in addition to the C and F components, The F content in the coating layer is 0 to 20 at %, and the coating layer is a gradation coating layer that contains more F components toward the surface. It has a contact angle of 90° or more and a high hardness characteristic of 17 to 27 GPa. A coating material for rollers in secondary battery electrode manufacturing equipment.

2. As a coating material for rollers in secondary battery electrode manufacturing equipment, a C—F—Si ternary nanocomposite coating layer; The ternary nanocomposite coating layer comprises: During the formation process, reducing hydrogen is additionally supplied in addition to the C, F and Si components, The F content in the coating layer is 0 to 20 at %, and the coating layer is a gradation coating layer that contains more F components toward the surface. It has a contact angle of 90° or more and a high hardness characteristic of 17 to 27 GPa. A coating material for rollers in secondary battery electrode manufacturing equipment.

3. A buffer layer including a Cr layer, a CrN layer, a CrN2 layer, and a CrCH layer in this order between the ternary nanocomposite coating layer and the base material; The coating material for rollers in secondary battery electrode manufacturing equipment according to claim 1.

4. Between the ternary nanocomposite coating layer and the base material, a Cr layer, a CrN layer, and a CrN ２ a buffer layer including, in order, a CrCH layer; The coating material for rollers in secondary battery electrode manufacturing equipment according to claim 2.

5. The coating material for the rollers of secondary battery electrode manufacturing equipment has a low friction coefficient of 0.12 or less and a coating adhesion strength of 20 N or more. The coating material for rollers in secondary battery electrode manufacturing equipment according to claim 1.

6. The coating material for the rollers of secondary battery electrode manufacturing equipment has a low friction coefficient of 0.12 or less and a coating adhesion strength of 20 N or more. The coating material for rollers in secondary battery electrode manufacturing equipment according to claim 2.

7. The coating material for the rollers in the secondary battery electrode manufacturing equipment is 1x10 ６ ~9.9x10 ８ Has an electrical resistance of Ω The coating material for rollers in secondary battery electrode manufacturing equipment according to claim 1.

8. The coating material for the rollers in the secondary battery electrode manufacturing equipment is 1x10 ６ ~9.9x10 ８ Has an electrical resistance of Ω The coating material for rollers in secondary battery electrode manufacturing equipment according to claim 2.

9. A manufacturing system for ternary nanocomposite coating materials including C-F-H or C-F-Si, which are applied to rollers in secondary battery electrode manufacturing equipment, A large chamber into which one or more base materials are charged; an ion source applied to said chamber; a sputtering source including a Cr target so that a Cr-based buffer layer is formed on the surface of the base material before the ternary nanocomposite coating material is coated; A raw material supply unit that supplies the ion sources C, F, and H, or C, F, and Si as raw materials, respectively; and a power supply; The power supply applies a bias voltage of 50 to 500 V to the base material in order to attract the generated plasma and electrons to the base material, the ion source includes permanent magnets or electromagnets arranged to form a high density plasma; The base material is then coated with a Cr layer, a CrN layer, and a CrN layer. ２ forming a buffer layer including a CrCH layer in this order; On the buffer layer, a hydrocarbon, CF ４ , and reducing hydrogen (H ２ ) as an ion source material to form a C-F-H ternary nanocomposite coating layer; On the buffer layer, a hydrocarbon, CF ４ , reducing hydrogen (H2) and silicon source, TMS (tetramethylsilane), SiH ４ , Si ２ H ６ or SiH ２ C ２ supplying one or more of the above as an ion source raw material to form a C—F—Si ternary nanocomposite coating layer; The nanocomposite coating layer is formed as a gradation coating layer containing more F components toward the surface side. A nanocomposite coating material manufacturing system comprising:

10. In order to coat the surface of the base material uniformly in a large chamber, a magnetic field is formed by arranging permanent magnets or electromagnets in the ion source, concentrating the plasma in a specified space to form a high-density plasma. The nanocomposite coating material manufacturing system according to claim 9 .

11. The substrate is fixed to a jig, and the jig is configured to be rotatable, so that the substrate rotates during the coating process. The nanocomposite coating material manufacturing system according to claim 9 .

12. Permanent magnets and electromagnets are arranged together, and a magnetic field is generated by the permanent magnets. By selectively driving the electromagnets in a given position, the magnetic field generated by the permanent magnets is supplemented by the magnetic field generated by the electromagnets. The nanocomposite coating material manufacturing system according to claim 10.

13. A method for forming a ternary nanocomposite coating material containing C-F-H by using the nanocomposite coating material production system according to claim 9, comprising the steps of: Before forming the ternary nanocomposite coating material, a voltage of 300 to 1000 V is applied to a sputtering source containing a Cr target, and a bias voltage of 80 to 500 V is applied to the base material. ２ ) is flowed to perform a sputtering process to form a Cr-based buffer layer, In the Cr-based buffer layer forming process, initially, only an inert gas is supplied to form a Cr layer, then an inert gas, nitrogen, and reducing hydrogen are supplied to form a CrN layer, but the nitrogen supply ratio is increased to form a nitrided hardened layer with enhanced N content, and in the final buffer layer forming stage, an inert gas, nitrogen, reducing hydrogen, and hydrocarbon are supplied to form a CrCH carbonitrided hardened layer to form a gradation layer, The raw material supply section of the ion source is supplied with hydrocarbon gas, CF ４ gas, and reducing hydrogen (H ２ ) and A voltage of 500 to 2000 V is applied to the ion source, and a bias voltage of 50 to 500 V is applied to the base material to form a ternary nanocomposite coating material containing C-F-H. ４ By gradually increasing the gas composition ratio, a gradation layer is formed in which the F component increases toward the surface side of the ternary nanocomposite coating material. In the formation of the ternary nanocomposite coating material, initially, a high density, high hardness, wear-resistant nanometric coating layer based on CH is formed as the first top coating layer by supplying hydrocarbon and reducing hydrogen. Next, the hydrocarbon, CF ４ supplying a gas and reducing hydrogen to form a second top coating layer as an interface continuous layer for forming a nanocomposite carbon containing CFH and a seizure-resistant functional layer; Next comes the hydrocarbons, CF ４ , and reducing hydrogen is supplied, but CF ４ The supply ratio of was increased, and the FCH coating layer was formed as the third top coating layer, thereby enhancing the seizure resistance of the base material surface.

13. A method for forming a nanocomposite coating material comprising:

14. A method for forming a ternary nanocomposite coating material containing C—F—Si by using the nanocomposite coating material production system according to claim 9, comprising the steps of: Before forming the ternary nanocomposite coating material, a voltage of 300 to 1000 V is applied to a sputtering source containing a Cr target, a bias voltage of 80 to 500 V is applied to the base material, and an inert gas, nitrogen (N ２ ) is flowed to perform a sputtering process to form a Cr-based buffer layer, In the Cr-based buffer layer forming process, initially, only an inert gas is supplied to form a Cr layer, then an inert gas, nitrogen, and reducing hydrogen are supplied to form a CrN layer, and the nitrogen supply ratio is increased to form a nitrided hardened layer with enhanced N content, and in the final buffer layer forming stage, an inert gas, nitrogen, reducing hydrogen, and hydrocarbon are supplied to form a carbonitrided hardened layer of CrCH, forming a gradation layer; The raw material supply section of the ion source is supplied with hydrocarbon gas, CF ４ Gas, TMS (Tetramethylsilane), SiH ４ , Si ２ H ６ or SiH ２ C ２ One or more of the following is supplied to the reaction vessel to produce reducing hydrogen (H ２ ) and A voltage of 500 to 2000 V is applied to the ion source, and a bias voltage of 50 to 500 V is applied to the base material to form a ternary nanocomposite coating material containing C—F—Si. ４ By gradually increasing the gas composition ratio, a gradation layer is formed in which the F component increases toward the surface side of the ternary nanocomposite coating material. In the formation of ternary nanocomposite coating materials, initially, hydrocarbons, TMS (Tetramethylsilane), and SiH ４ , Si ２ H ６ or SiH ２ C ２ and reducing hydrogen to form a high density, high hardness, wear-resistant nanometric coating layer as a first top coating layer; Next, the hydrocarbon, CF ４ Gas, TMS (Tetramethylsilane), SiH ４ , Si ２ H ６ or SiH ２ C ２ and supplying reducing hydrogen to form a second top coating layer as an interface continuous layer for forming a nanocomposite carbon and a seizure-resistant functional layer; Next comes the hydrocarbons, CF ４ , TMS (Tetramethylsilane), SiH ４ , Si ２ H ６ or SiH ２ C ２ and reducing hydrogen, but CF ４ The supply ratio of was increased and formed as a third top coating layer to enhance the seizure resistance of the base material surface.

13. A method for forming a nanocomposite coating material comprising:

15. Before forming the buffer layer, the base material is plasma cleaned. The voltage applied to the ion source is 500-2000V, the current is 0.3-1.8A, and the bias voltage applied to the base material is 50-150kHz, 50-500V.

15. A method of forming the nanocomposite coating material of claim 14.

16. Before forming the buffer layer, the base material is plasma-cleaned, the voltage applied to the ion source is 500-2000V, the current is 0.3-1.8A, and the bias voltage applied to the base material is 50-150kHz, 50-500V.

15. A method of forming the nanocomposite coating material of claim 14.

Images