Metrology system with high speed position and orientation tracking mode

Abstract

To provide a metrology system for use with a moving system that moves an end tool.SOLUTION: A metrology system 150 includes a sensor structure 160, a light beam source structure LC, and a processing unit. The light beam source structure directs light beams to light beam sensors to indicate the position and orientation of the light beam source structure. In a high speed operating mode (for example, an alternative to a standard speed operating mode), the metrology system determines a region of interest ("ROI") including a measurement spot produced by a light beam, for each light beam sensor of a set of light beam sensors. Measurement signals are processed resulting from the ROIs, and the position and orientation of the light beam source structure are determined. In various implementations, the ROIs are determined (for example, including position and / or size, and the like) at least partially on the basis of position information from the moving system.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a measurement and movement system, and more particularly, to a measurement system used with a movement system, such as a robot, that tracks position and orientation.

Background Art

[0002] In manufacturing, workpiece inspection, and other processes, robotic movement systems that perform specific functions are frequently used. For example, a robotic system or other movement system can be utilized to move an end tool to perform a specific operation (e.g., with respect to workpiece inspection, manufacturing, etc.). In some applications, various types of robots that can be used include an articulated robot, a selective compliance articulated robot arm (SCARA) robot, a Cartesian robot, a cylindrical robot, a spherical robot, etc. As an example of a component included in a robot, a SCARA robot system (which may be a type of articulated robot system, for example) may typically have a base, a first arm portion rotatably coupled to the base, and a second arm portion rotatably coupled to the end of the first arm portion. In various configurations, the end tool may be coupled to the end of the second arm portion (e.g., to perform a certain operation and / or inspection operation). Such a system may include a position sensor (e.g., a rotary encoder) that is utilized to determine / control the positioning of the arm portion and accordingly the positioning of the end tool. In various embodiments, the positioning accuracy of such a system is limited by certain factors (e.g., the performance of the rotary encoder combined with the mechanical stability of the robot system), but is about 100 microns.

[0003] U.S. Patent No. 4,725,965, which is incorporated herein by reference in its entirety (referred to herein as the '965 patent), discloses several calibration techniques for improving the accuracy of a SCARA system. As described in the '965 patent, to calibrate the kinematic model, the arm portion is placed in a first configuration where the end tool is positioned above a fixed reference point. Next, the arm portion is placed in a second angular configuration and nominally positioned such that the end tool is re-aligned with respect to the reference point. The error in the kinematic model is calculated from the displacement of the end tool from the reference point when the arm portion is switched from the first angular configuration to the second angular configuration. And the kinematic model is corrected according to the calculated error. The procedure is repeated until the error reaches zero, at which point the kinematic model of the SCARA robot is considered calibrated. As further explained in the '965 patent, the calibration technique may include the use of a specific camera.

[0004] Techniques such as those described in the '965 patent may be utilized to calibrate a robotic system, but the use of such techniques (e.g., which may require a lot of time and / or may not be able to provide the desired level of accuracy for all possible orientations of the robot during a particular operation) may not be very desirable in certain applications. A system that can improve such problems (e.g., improving the reliability, reproducibility, speed, etc. of position and orientation determination for processes such as workpiece measurement, manufacturing, etc.) is desired. SUMMARY OF THE INVENTION

[0005] This summary is provided to introduce, in a simplified form, a selected set of concepts that are further described below in the detailed description of the invention. This summary is not intended to identify key features of the claimed subject matter, nor is it intended to be used as an aid in determining the scope of the claimed subject matter.

[0006] According to one aspect, a measurement system is provided for use with a movement system that moves an end tool. The movement system includes a movable structure and an operation control system. The movable structure includes an end tool attachment structure configured to have an end tool attached thereto. The operation control system is configured to control the position and orientation of the end tool based at least in part on controlling the movable structure to move at least a portion of the end tool attached to the end tool attachment structure within a movement volume.

[0007] The measurement system includes a sensor structure, a light beam source structure, and a processing unit. The sensor structure includes a plurality of light beam sensors disposed at fixed positions. The light beam source structure is configured to direct a light beam toward the light beam sensors of the sensor structure to indicate the position and orientation of the light beam source structure. The light beam source structure is configured to be coupled to at least one of the end tool or the end tool attachment structure. At least a portion of the light beam directed toward the light beam sensors is configured to generate a measurement spot on the light beam sensors, whereby the light beam sensors generate corresponding measurement signals.

[0008] The processing unit is configured to process measurement signals from the light beam sensors of the sensor structure to determine the position and orientation of the light beam source structure. As part of a first operation mode (e.g., a high-speed operation mode) in which the movement system is configured to move the end tool and the corresponding light beam source structure to a plurality of positions, the measurement system is configured, at each position, to i) determine, for each light beam sensor of a set of light beam sensors, a region of interest each containing a measurement spot generated by a light beam from the light beam source structure, ii) process the measurement signals obtained from the regions of interest of the light beam sensors, and iii) determine the position and orientation of the light beam source structure based at least in part on the processed measurement signals. In various embodiments, determining the region of interest includes determining the position and / or size of the region of interest on each light beam sensor. In various embodiments, the region of interest is determined based at least in part on position information received from the movement system.

[0009] In various embodiments, as part of a second operating mode (e.g., a standard speed operating mode) that replaces a first operating mode in which a mobile system is configured to move an end tool and a corresponding light beam source structure to a plurality of positions, at each position, the measurement system processes measurement signals from the entire detection region of a light beam sensor and determines the position and orientation of the light beam source structure based at least in part on the processed measurement signals.

[0010] According to another aspect, a method of operating a measurement system using a mobile system that moves an end tool is provided. The method includes determining that the measurement system operates in a first operating mode. Thereafter, the measurement system operates in a first operating mode in which the mobile system moves the end tool and a corresponding light beam source structure to a plurality of positions, and at each position, the measurement system: i) operates the light beam source structure to direct a light beam at a light beam sensor of a sensor structure to indicate the position and orientation of the light beam source structure, ii) determines, for each light beam sensor of a set of light beam sensors, a region of interest each containing a measurement spot generated by the light beam from the light beam source structure, iii) processes measurement signals from the regions of interest of the light beam sensors, and iv) determines the position and orientation of the light beam source structure based at least in part on the processed measurement signals. BRIEF DESCRIPTION OF THE DRAWINGS

[0011]

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[0012] FIG. 1 is a block diagram of a first exemplary embodiment of a mobile measurement system 100 that includes a mobile system 110 and a measurement system 150. The mobile system 110 (e.g., a multi-joint robot) includes a movable structure MAC (e.g., a movable arm configuration) and an operation control processing system 140. The measurement system 150 includes a sensor structure 160, an optical beam source structure LC, and a measurement system position orientation processing unit 190. In the configuration of FIG. 1, the optical beam source structure LC (illustrated as directing an optical beam with an arrow, for example, in different directions including the direction toward the optical beam sensors S1 and S2) is coupled to the end tool ETL. As will be described in more detail below, the measurement system 150 can be used to track the position and orientation (e.g., of the end tool ETL as moved by the mobile system 110).

[0013] In the example of FIG. 1, the movable structure MAC includes a lower base portion BSE, arm portions 121-125, motion mechanisms 131-135, position sensors SEN1-SEN5, and an end tool attachment structure ETMC. In various embodiments, some or all of the arm portions 121-125 may have each proximal end of the arm portions 121-125 attached to the respective motion mechanisms 131-135. In the example of FIG. 1, some or all of the motion mechanisms 131-135 (e.g., rotary joints having corresponding motors) enable motion (e.g., rotation) of the respective arm portions 121-125 (e.g., about the respective rotation axes RA1-RA5). In various embodiments, the position sensors SEN1-SEN5 (e.g., rotary encoders) may be used to determine the position (e.g., angular orientation) of the respective arm portions 121-125.

[0014] In various embodiments, the movable structure MAC may have a portion designated as a distal end portion (e.g., the fifth arm portion 125). In the exemplary configuration of FIG. 1, the end tool mounting structure ETMC is located proximate to (e.g., at) the distal end of the fifth arm portion 125 corresponding to the distal end of the movable structure MAC (e.g., designated as the distal end portion). In various alternative embodiments, the distal end portion of the movable structure is not an arm portion, but at least a part of the distal end portion may be an element (e.g., a rotatable element, etc.) corresponding to the distal end of the movable structure where the end tool mounting structure ETMC is disposed.

[0015] In various embodiments, the end tool mounting structure ETMC may include various elements for coupling and maintaining the end tool ETL proximate to the distal end of the movable structure MAC. For example, in various embodiments, the end tool mounting structure ETMC can include automatic coupling connectors, magnetic coupling portions, and / or other coupling elements known in the art for attaching the end tool ETL to the corresponding element. The end tool mounting structure ETMC may also include an electrical connection (e.g., a power connection, one or more signal lines, etc.) for supplying power to and / or transmitting and receiving signals to at least a part of the end tool ETL (e.g., the end tool sensing portion ETSN).

[0016] In various embodiments, the end tool ETL can include an end tool sensing portion ETSN and an end tool stylus ETST having a contact point CP (e.g., that contacts the surface of the workpiece WP). The fifth motion mechanism 135 is disposed proximate to the distal end of the fourth arm portion 124. In various embodiments, the fifth motion mechanism 135 (e.g., a rotary joint having a corresponding motor) may be configured to rotate the fifth arm portion 125 about a rotation axis RA5. In some embodiments, the fifth motion mechanism 135 may alternatively or additionally include a different type of motion mechanism (e.g., a linear actuator) configured to linearly move (e.g., up and down) the fifth arm portion 125. In either case, the end tool ETL is attached (e.g., coupled) to an end tool mounting structure ETMC and has a corresponding end tool position ETP having corresponding coordinates (e.g., x, y, and z coordinates). In various embodiments, the end tool position ETP can correspond to or be proximate to the position of the end tool mounting structure ETMC (e.g., the distal end DE5 of the fifth arm portion 125 or proximate thereto corresponding to the distal end of the movable structure MAC).

[0017] FIG. 2 is a block diagram of a control processing unit 200 of the system of FIG. 1, including an operation control system 140 (which may be a processing system, for example) and including at least a part of an external control system ECS. The operation control processing system 140 is configured to control an end tool position ETP of an end tool ETL at an accuracy level defined as the mobile system accuracy. More specifically, the operation control processing system 140 generally utilizes operation mechanisms 131-135 and position sensors SEN1-SEN5 for detecting and controlling the positions of the arm parts 121-125, and is configured to control the coordinates (for example, x, y, and z coordinates) of the end tool position ETP at the mobile system accuracy, at least partially based on this. In various embodiments, the operation control processing system 140 includes operation mechanism control detection parts 141-145, each of which can receive signals from the position sensors SEN1-SEN5, detect the positions (for example, angular positions, linear positions, etc.) of the respective arm parts 121-125, and / or provide control signals for moving the respective arm parts 121-125 to the respective operation mechanisms 131-135 (including motors, linear actuators, etc.).

[0018] The motion control processing system 140 may also receive a signal from the end tool detection unit ETSN. In various embodiments, the end tool detection unit ETSN may include circuits and / or configurations related to the operation of the end tool ETL (e.g., for detecting the workpiece WP, etc.). As will be described in detail later, in various embodiments, the end tool ETL (e.g., touch probe, scanning probe, camera, etc.) may be used to contact or otherwise detect a surface position / position / point on the workpiece WP, and for this purpose, various corresponding signals may be received, determined, and / or processed by the end tool detection unit ETSN and provided to the motion control processing system 140. In various embodiments, the motion control processing system 140 may include an end tool control detection unit 146 that can provide a control signal to the end tool detection unit ETSN and / or receive a detection signal from the end tool detection unit ETSN. In various embodiments, the end tool control detection unit 146 and the end tool detection unit ETSN may be integrated and / or indistinguishable. In various embodiments, the motion mechanism control detection units 141 to 145 and the end tool control detection unit 146 all provide outputs to, and / or receive control signals from, a motion system position and orientation processing unit 147 that controls and / or determines the overall position and orientation of the movable structure MAC of the motion system 110 and the corresponding position and orientation of the end tool ETL as part of the motion control processing system 140. In various embodiments, the position of the end tool ETL may be referred to as the end tool position ETP. Generally, the motion control system 140 is configured to control the position and orientation of the end tool based at least in part on controlling the movable structure MAC to move at least a portion of the end tool ETL attached to the end tool mounting structure ETMC within the moving volume MV.

[0019] In various embodiments, the measurement system 150 may be included in or otherwise added to the mobile system 110 (e.g., as part of a retrofit structure for addition to an existing mobile system 110). Generally, the measurement system 150 may be utilized to provide determination of the position and orientation of the end tool ETL (e.g., with improved accuracy compared to the accuracy of the mobile system 110). More specifically, as will be described in more detail below, the measurement system 150 may be utilized to determine the measured position coordinates of the end tool position ETP and the relative position indicating the orientation of the end tool ETL with an accuracy higher than the accuracy of the mobile system.

[0020] In various embodiments, the sensor structure 160 of the measurement system 150 includes light beam sensors S1 - S4. In FIG. 1, the light beam sensors S1 and S2 are shown at the left and right ends, respectively, of the illustrated cross-sectional view, and the general positions of the light beam sensors S3 and S4 (e.g., located outside and inside the page, respectively) are indicated by dashed lines. As will be described in more detail below, FIG. 4(a) shows a three-dimensional view of four light beam sensors and a sensor structure 160-4A having a structure similar to the sensor structure 160 of FIG. 1.

[0021] The light beam sensors S1 - S4 are disposed at fixed positions that at least partially define a measurement frame volume MFV (e.g., may be disposed on a frame, wall, or other structure, respectively). The measurement frame volume MFV is configured to be located around at least a portion of a moving volume MV (e.g., at least a portion of the end tool ETL is moved by the mobile system 110). The light beam source structure LC is configured to operate (e.g., by the light beam source control unit 192) to direct light beams to the light beam sensors S1 - S4 of the sensor structure 160 (e.g., indicating the position and orientation of the light beam source structure LC).

[0022] The optical beam source structure LC is configured to be coupled to at least one of the end tool ETL and the end tool mounting structure ETMC. When the end tool ETL is coupled to the end tool mounting structure ETMC, it will then be understood that the optical beam source structure LC is coupled to both the end tool ETL and the end tool mounting structure ETMC. The position and orientation of the optical beam source structure LC indicate the position and orientation of the end tool ETL. As will be described in more detail below with respect to FIGS. 5A(a) to 5B(h), the optical beams directed towards the optical beam sensors S1 to S4 are configured to generate a measurement spot SP on the position on the optical beam sensor that causes the corresponding optical beam sensor to generate a measurement signal. The measurement system position and orientation processing unit 190 is configured to process the measurement signals from the optical beam sensors S1 to S4 of the sensor structure 160, and the measurement signals from the optical beam sensors S1 to S4 indicate the position and orientation of the optical beam source structure LC and the corresponding position and orientation of the end tool ETL.

[0023] In various embodiments, the moving volume MV consists of a volume in which at least a part of at least one of the end tool ETL and / or the optical beam source structure LC can move. In the example of FIG. 1, the moving volume MV is shown as including the volume in which the contact point CP of the end tool ETL can move when inspecting the workpiece. As an alternative example, the moving volume may alternatively include the volume in which the optical beam source structure LC can move when the end tool ETL is moved to inspect the workpiece. In various embodiments, the movement system 110 is configured to move the movable structure MAC so as to move at least a part of the end tool ETL (including, for example, the contact point CP) attached to the end tool mounting structure ETMC along at least two dimensions (for example, the x and y dimensions) within the moving volume MV. In the example of FIG. 1, the part (for example, the contact point CP) of the end tool ETL is movable along three dimensions (for example, the x, y, and z dimensions) by the movement system 110.

[0024] In various embodiments, the latch unit 181 and / or the measurement system orientation processing unit 190 and / or the optical beam source structure control unit 192 may be included as part of an external control system ECS (e.g., as part of an external computer). The optical beam source structure control unit 192 can supply power and / or control signals to the optical beam source structure LC and / or a part thereof (e.g., one or more optical beam sources of the optical beam source structure LC). The latch unit 181 may be included as part of the sensor structure control processing unit 180 (e.g., the sensor structure control processing unit 180 may supply power to the optical beam sensors S1 to S4 of the sensor structure 160, and / or receive measurement signals therefrom, and / or supply control signals thereto, and may supply such signals and / or transmit and receive other signals to and from the measurement system orientation processing unit 190).

[0025] In various embodiments, the latch unit 181 is configured to: i) input at least one input signal related to the end tool position ETP, ii) determine the timing of a trigger signal based on the at least one input signal, and iii) output the trigger signal to at least one of the measurement system orientation processing unit 190 or the optical beam sensors S1 to S4 of the sensor structure 160. In various embodiments, the measurement system orientation processing unit 190 and / or the sensor structure 160 are configured to determine the current measurement signals from the optical beam sensors S1 to S4 in response to the reception of the trigger signal (e.g., as corresponding to the current position and orientation of the optical beam source structure LC and / or the end tool ETL). In various embodiments, the measurement system orientation processing unit 190 is configured to process the measurement signals to correspond to the timing of the trigger signal to determine the position and orientation of the optical beam source structure LC and / or the end tool ETL at the time of the trigger signal.

[0026] In various embodiments, when the position and orientation of the light beam source structure LC are determined, correspondingly, the position and orientation of the end tool may be determined (e.g., according to known geometric relationships, relative positioning, offsets, etc. between the light beam source structure LC and the end tool ETL). In various embodiments, the light beam source structure LC may be directly attached to the end tool ETL (e.g., such that the gap between the end tool ETL and the light beam source structure LC is minimized or eliminated), or attached to or very close to an end tool attachment structure. In the embodiment of FIG. 1, the light beam source structure LC is shown as being at or at least proximate to the end tool position ETP (e.g., a designated reference position of the end tool ETL). Such a configuration reduces the complexity or improves the accuracy when calculating the position and orientation of the end tool ETL based on the determined position and orientation of the light beam source structure LC.

[0027] In various embodiments, the determination of the position and orientation of the end tool ETL may also be utilized when determining specific additional position information (e.g., for determining the position of the contact point CP). As described above, in various embodiments, the measurement of the workpiece surface is performed by contacting the contact point CP of the end tool ETL with the workpiece surface. In connection with such measurements, both the position and orientation of the end tool ETL may be determined, and correspondingly, the position of the contact point CP may be indicated.

[0028] In various embodiments, different types of end tools ETL can provide different types of outputs that can be utilized in relation to the latch portion 181. For example, in an embodiment where the end tool ETL is a touch probe that is used for measuring a workpiece and outputs a touch signal when it contacts the workpiece (e.g., when the contact point CP contacts the workpiece), the latch portion 181 may be configured to input that touch signal or a signal derived therefrom as at least one input signal based on which the timing of a trigger signal is determined. In various embodiments where the end tool ETL is a touch probe, the central axis of the touch probe may correspond to the end tool axis EA. As another example, in an embodiment where the end tool ETL is a scanning probe that is used for measuring a workpiece and provides respective workpiece measurement sample data corresponding to respective sample timing signals, the latch portion 181 may be configured to input that respective sample timing signal or a signal derived therefrom as at least one input signal. As another example, in an embodiment where the end tool ETL is a camera that is used for providing respective workpiece measurement images corresponding to respective workpiece image acquisition signals, the latch portion 181 may be configured to input that workpiece image acquisition signal or a signal derived therefrom as at least one input signal.

[0029] In various embodiments, the measurement system 150 may be configured to determine the position and orientation of the light beam source structure and / or the end tool ETL based on measurement signals from the light beam sensors S1 - S4 of the sensor structure 160. Such a system will be understood to have certain advantages over various alternative systems. For example, in various embodiments, the systems disclosed herein may be smaller and / or less costly and / or more accurate than some alternative systems that utilize alternative techniques (e.g., certain photogrammetry systems, etc.) to track the position and orientation of a moving system. The systems of the present disclosure, unlike alternative systems, do not occupy or block a portion of the operating volume MV, such as by placing scales or fiducial marks on the ground or stage, and do not interfere with the area where the workpiece is being processed or inspected (e.g., within the moving volume MV).

[0030] In various embodiments, the comparison between a photogrammetry system and the measurement system 150 as disclosed herein may be described as follows. In a photogrammetry system, a camera may utilize an incoherent light source for imaging a light source to determine position. In some cases, the position and angle may be calculated from the position of the light source. The effective "lever arm" for determining the angle is the distance between the light sources. It is difficult to increase this lever arm. This is because it necessarily also increases the opposing lever arm between the light source and the lower part of the end tool (e.g., corresponding to the distance between the light source and the contact point CP of the end tool along the end tool axis EA direction). In other words, a photogrammetry structure that attempts to make the measurement of the probe angle easier also makes the position of the end tool more sensitive to this angle. The field of view of the camera in such a system may cover the entire working volume, which corresponds to a low magnification.

[0031] In contrast, in the measurement system 150 disclosed herein, typically, a coherent light source may be utilized. For example, the light source for the light beam source structure LC may be a coherent light source (e.g., a laser light source), and the light beam may be a coherent light beam (e.g., a laser beam). Diffractive optical elements (e.g., which will be described in more detail below in connection with FIG. 3) may be utilized to generate a plurality of diffracted light beams (e.g., which can be dispersed in many directions surrounding the light beam source structure LC). In various embodiments, a relatively small percentage of the plurality of diffracted light beams or light beams provided in other ways may be directed or otherwise received by the diffused light beam sensor of the measurement system 150 (e.g., to generate corresponding measurement spots SP on the light beam sensor). In various embodiments, the light beam sensor may be various types of cameras and / or two-dimensional position detection sensors (e.g., a lensless camera, a position-sensitive detector, an optical position sensor capable of measuring the position of a two-dimensional light spot on the sensor surface, etc.). In operation, high-precision azimuth measurement / determination is made possible by a large lever arm (e.g., which partially corresponds to the distance between the light beam source structure LC and the light beam sensor S) (e.g., corresponding to the angle of an end tool, etc.). In addition, the effective magnification for such operation may be relatively high.

[0032] In various embodiments, a measurement signal from an optical beam sensor (e.g., one corresponding to an image and / or indicating the two-dimensional position of a measurement spot SP formed by an optical beam, where the centroid of each measurement spot is calculated / determined from the perspective of XYZ coordinates) is utilized in combination with known characteristics of the optical beam source structure LC (e.g., laser projection based on known geometric relationships of the optical beams including the relative three-dimensional angles of each optical beam, taking into account the offset of each optical beam at the light source, etc.), and the position and orientation can be calculated / determined (e.g., based on the use of non-linear least squares methods and / or other processing / calculation techniques). In other words, the known vectors of the optical beams can be adapted to known intersection positions (e.g., in XYZ coordinates) on the optical beam sensor (e.g., with respect to the position of the measurement spot SP) to determine the position and orientation of the optical beam source structure LC. In various embodiments, each measurement spot SP on the optical beam sensor may be uniquely identified (e.g., by partially utilizing the approximate position information determined by the movement system 110 and / or based on unique or other distinguishable characteristics of the optical beam (e.g., unique pattern information of the optical beam, a pseudo-random pattern having unique or other distinguishable parts, etc.)).

[0033] It will be understood that such a combination of features and characteristics of the measurement system 150 may result in a more accurate determination of position and orientation than that provided by a photogrammetry system as described above. As some specific advantages, note that the optical beams as utilized in the measurement system 150 have corresponding orientation information (e.g., of the optical beam source structure LC and the end tool ETL) that is lacking in photogrammetry and is more sensitive to orientation. This can significantly improve the accuracy.

[0034] FIG. 3 is a diagram of a first exemplary embodiment of a light beam source section LP1' of a light beam source structure LC (which may be the same as the light beam source structure LC used in the system of FIG. 1). As shown in FIG. 3, the light beam source section LP1' includes a light source LS1, a reflection element RE1, beam splitters BS1A, BS1B, BS1C, diffraction optical elements DOE1B, DOE1C, and lenses LNS1B1, LNS1B2, LNS1C1, LNS1C2. In various embodiments, the light source LS1 may be such that at least a part or all of the light beam in the following description is laser light or may be a laser source. The light source LS1 generates a light beam LB1A, which is reflected by the reflection element RE1 and directed toward the beam splitter BS1A. The beam splitter BS1A splits the light beam into light beams LB1B and LB1C, which are respectively directed toward the diffraction optical elements DOE1B and DOE1C.

[0035] The light beam LB1B is diffracted by the diffraction optical element DOE1B into diffracted light DLB1B, which is split by the beam splitter BS1B into diffracted lights DLB1B1 and DLB1B2. The diffracted light DLB1B1 further diverges after passing through the lens LNS1B1 having the optical axis OA1B1, and the diffracted light DLB1B2 further diverges after passing through the lens LNS1B2 having the optical axis OA1B2. Similarly, the light beam LB1C is diffracted by the diffraction optical element DOE1C into diffracted light DLB1C, which is split by the beam splitter BS1C into diffracted lights DLB1C1 and DLB1C2. The diffracted light DLB1C1 further diverges after passing through the lens LNS1C1 having the optical axis OA1C1, and the diffracted light DLB1C2 further diverges after passing through the lens LNS1C2 having the optical axis OA1C2.

[0036] Orthogonal X, Y, and Z axes are shown (for example, corresponding to the coordinate system of the light beam source section LP1' and / or the light beam source structure). The optical axes OA1B1, OA1C1 are shown parallel to the X axis, and the optical axes OA1B2, OA1C2 are shown parallel to the Y axis.

[0037] In various embodiments, the light beam source unit LP1' may be a first light beam source unit in which the corresponding light beam source structure may include an additional light beam source unit. For example, the light beam source structure may include second and third light beam source units (for example, in some cases, each having a component equal to the first light beam source unit LP1'). In such a configuration, for the second light beam source unit, the optical axes may be parallel to the X-axis and the Z-axis respectively, and for the third light beam source unit, the optical axes may be parallel to the Y-axis and the Z-axis respectively. Therefore, in such a configuration, there may be approximately an equal number of diffracted light beams directed by lenses having optical axes in the X-axis, Y-axis, and Z-axis directions. Such a configuration may result in a relatively uniform distribution of the light beam in the direction from the light beam source structure. In one embodiment, when such a light beam source structure is disposed at the center of a sphere, the intersection points where the light beam intersects the surface of the sphere may be dispersed approximately evenly near the surface of the sphere. In various embodiments, there may be a case where it is desirable for the light beam source structure LC to provide at least a minimum number of light beams dispersed in the directions around the light beam source structure LC (for example, at least 10,000 light beams, or at least 100,000 light beams, etc.). In various embodiments, the desired minimum number of light beams may depend on the light beam source structure LC / light beam sensor distance, the number and size of the light beam sensors, and the range of possible orientations of the light beam source structure LC. In various embodiments, it may be desirable for some or all of the light beams to have similar or approximately equal angular intervals relative to each other.

[0038] In various embodiments, each of the light beams of the light beam source structure (e.g., each of the diffracted light beams DLB in the example of FIG. 3) may have certain known and / or determined characteristics (e.g., relative angular orientation, origin light source point, etc.) that spatially associate each light beam with the light beam source structure. Such characteristics can be used to determine the position and orientation of the light beam source structure based at least in part on the light beams directed toward and detected by the light beam sensors of the sensor structure. It should be noted that with respect to the light beam source portion LP1’, the diffracted light beams may have a constant offset relative to each other. For example, the diffracted light beam DLB1B1 may be modeled / evaluated / specified as having a light source point offset along the Y-axis direction from the modeled / evaluated / specified light source point for the diffracted light beam DLB1C1 (e.g., related to the offset along the Y-axis direction between lenses LNS1B1 and LNS1C1). Such an offset may be included in the position calculation (including the processing / calculation performed by the measurement system position and orientation processing unit 190, for example, to process the measurement signals from the light beam sensors to determine the position and orientation of the light beam source structure LC and / or the end tool ETL, etc.) and / or may be accounted for in other ways. Once the position and orientation of the light beam source structure LC are determined, the known geometric relationship and / or relative position / offset between the light beam source structure LC and the end tool ETL can also be utilized to determine the position and orientation of the end tool ETL. As will be described in more detail below, FIGS. 5A(a) - 5B(h) show certain simplified examples of the light beam B of the light beam source structure LC corresponding to a particular position and orientation of the light beam source structure LC and directed toward the sensors of the sensor structure 160.

[0039] Figures 4(a) and 4(b) are diagrams of respective moving volumes MV-4A and MV-4B surrounded by measurement frame volumes MFV-4A and MFV-4B, at least partially defined by respective sensor structures 160-4A and 160-4B, each sensor structure including a different number of optical beam sensors. In either case, the moving volume MV and the measurement frame volume MFV are represented as cubic volumes having edges and sides parallel to the orthogonal X, Y, and Z axis directions. For simplicity of illustration, the volumes and other aspects are shown in specific relative dimensions, but it will be understood that in various embodiments, the relative dimensions of the volumes and other aspects may vary (e.g., the illustrated dimensions may not be to scale, and in that case, the moving volume MV may be larger relative to the measurement frame volume MFV, etc.).

[0040] Figure 4(a) shows an embodiment having a sensor structure 160-4A that includes four optical beam sensors S1 to S4 (e.g., similar to the embodiment shown in FIG. 1 and also relevant to the embodiments of FIGS. 5A(a) to 5B(h) as will be described in more detail below). The four optical beam sensors S1 to S4 are arranged to be located at a common intermediate Z height along the Z-axis direction (i.e., all having the same Z-axis coordinate value). The optical beam sensors S1 and S2 are arranged on both sides of the measurement frame volume and are parallel to the YZ plane. The optical beam sensors S3 and S4 are arranged on both sides of the measurement frame volume and are parallel to the XZ plane.

[0041] FIG. 4(b) shows an embodiment having a sensor structure 160-4B that includes 14 optical beam sensors S1A to S1D, S2A to S2D, S3A to S3C, and S4A to S4C. In relation to the sensor structure 160-4A of FIG. 4(a), the sensor structure 160-4B of FIG. 4(b) may have higher measurement resolution and / or higher measurement accuracy in the X-axis direction (e.g., corresponding to the sets of three optical beam sensors S3A to S3C, S4A to S4C arranged at different positions along the X-axis direction on each side of the measurement frame volume MFV-4B). Further, in a further comparison with the sensor structure of FIG. 4(a), the sensor structure 160-4B of FIG. 4(b) may have higher measurement resolution and / or higher measurement accuracy in the Y-axis direction (e.g., corresponding to the sets of two optical beam sensors S1B and S1D, and S2B and S2D arranged at different positions along the Y-axis direction on each side of the measurement frame volume MFV-4B, as compared with the configuration of FIG. 4(a) that uses a single optical beam sensor S1 and S2 on each side). Further, compared with the sensor structure of FIG. 4(a), the sensor structure 160-4B of FIG. 4(b) may also have higher measurement resolution and / or higher measurement accuracy in the Z-axis direction (e.g., corresponding to the sets of two optical beam sensors S1A and S1C, and S2A and S2C arranged at different positions along the Z-axis direction on each side of the measurement frame volume MFV-4B, as compared with the configuration of FIG. 4(a) that uses a single optical beam sensor S1 and S2 on each side).

[0042] Figures 5A(a) to 5B(h) are diagrams showing that the light beam source structure LC’ directs four exemplary light beams B1 to B4 to four light beam sensors S1 to S4 of four light beam sensor structures 160’, and generates four corresponding measurement spots SP1 to SP4 for different positions and orientations of the light beam source structure LC’. In various embodiments, the sensor structure 160’ may be the same as that in FIGS. 1 and 4(a) (for example, the four light beam sensors S1 to S4 at least partially define the corresponding cubic measurement frame volume MFV). Figures 5A(a) to 5B(h) show the respective top views 510A to 510H, cross-sectional front views 520A to 520H, cross-sectional side views 530A to 530H, and diagrams 540A to 540H of the positions of the measurement spots (that is, according to the front views of the respective sensor surfaces of the respective light beam sensors S1 to S4).

[0043] In various embodiments, the examples in FIGS. 5A(a) to 5B(h) can also show the operation of sensor structures having a larger number of light beam sensors, and the examples described below can show the operation of four of the total number of light beam sensors in a given configuration (for example, four of the most central light beam sensors, etc.). The examples in FIGS. 5A(a) to 5B(h) further illustrate the operation of the light beam source structure and can include a larger number of light beams (for example, 10, 100, or 1000 light beams, etc., which may in some cases be directed in a three-dimensional direction that is relatively evenly distributed as previously described in connection with FIG. 3). For such embodiments, the examples described below can show the operation of four of the total number of light beams in a given configuration (for example, the four most central light beams and / or four light beams specifically directed along the X-axis and Y-axis directions, etc.). Also, with respect to the examples in FIGS. 5A(a) to 5B(h), for the purpose of simplifying the illustrated examples, it will be understood that the relative sizes of the light beam sensors S1 to S4 are exaggerated, the relative distances between the light beam sensors are reduced, and no offsets are shown between the light source points of the different light beams B1 to B4.

[0044] In the example of FIG. 5A(a), the light beam source structure LC’ and the corresponding light beams B1 to B4 are shown as being at a specified “null” position (e.g., including the corresponding “null” orientation). More specifically, light beams B1 and B2 are each parallel to the X-axis direction and are each directed towards the centers of light beam sensors S1 and S2, respectively. Similarly, light beams B3 and B4 are parallel to the Y-axis direction and are each directed towards the centers of light beam sensors S3 and S4, respectively. Light beams B1 to B4 generate measurement spots SP1 to SP4 that respectively correspond to the centers of each of light beam sensors S1 to S4. In various embodiments, light beam sensors S1 to S4 may be various types of cameras and / or two-dimensional position detection sensors (e.g., optical position sensors capable of two-dimensionally measuring the position of a measurement spot formed by a light beam on the sensor surface).

[0045] Light beam sensors S1 to S4 can output measurement signals indicating that measurement spots SP1 to SP4 are at the centers of light beam sensors S1 to S4. Based on the known geometric relationship between light beams B1 to B4 and the light beam source structure LC’, the measurement signals from light beam sensors S1 to S4 indicate the position and orientation of the light beam source structure LC’ (e.g., corresponding to the position and orientation in the example of FIG. 5A(a)). The measurement signals may be processed (e.g., by the processing unit 190), and based on this processing, the position and orientation of the light beam source structure LC’ and / or the end tool ETL (e.g., see FIG. 1) to which the light beam source structure LC’ is coupled may be determined.

[0046] In the example of FIG. 5A(b) (for example, when compared with the example of FIG. 5A(a)), the light beam source structure LC’ is shown as rotating clockwise in the XY plane. The top view 510B (i.e., of the XY plane) shows the clockwise rotation and the different positions of the light beams B1 - B4 on the light beam sensors S1 - S4. The diagram 540B of the positions of the measurement spots shows the positions SP1 - SP4 of the measurement spots on the light beam sensors S1 - S4 respectively generated by the light beams B1 - B4. More specifically, the measurement spots SP1 - SP4 are each shown as having moved to the right of the center of the respective light beam sensors S1 - S4.

[0047] In the example of FIG. 5A(c) (for example, when compared with the example of FIG. 5A(a)), the light beam source structure LC’ is shown as rotating clockwise in the XZ plane. The cross-sectional front view 520C (i.e., of the XZ plane) shows the clockwise rotation and the different positions of the light beams B1 and B2 on the light beam sensors S1 and S2. In the diagram 540C of the positions of the measurement spots, the measurement spots SP1 and SP2 are each shown as having moved to the upper center and lower center of the respective light beam sensors S1 and S2, and the measurement spots SP3 and SP4 are each shown as remaining at the center of the respective light beam sensors S3 and S4.

[0048] In the example of FIG. 5A(d) (for example, when compared with the example of FIG. 5A(a)), the light beam source structure LC’ is shown as rotating clockwise in the YZ plane. The cross-sectional side view 530D (i.e., of the YZ plane) shows the clockwise rotation and the different positions of the light beams B3 and B4 on the light beam sensors S3 and S4. In the diagram 540D of the positions of the measurement spots, the measurement spots SP1 and SP2 are each shown as remaining at the center of the respective light beam sensors S1 and S2, but the measurement spots SP3 and SP4 are each shown as having moved to the upper center and lower center of the respective light beam sensors S3 and S4.

[0049] Note that the examples of FIGS. 5A(b) to 5A(d) each correspond to at least a change in the orientation of the light beam source structure LC'. In some embodiments, the illustrated changes may not necessarily correspond to a change in position (for example, depending on where the reference point of the light beam source structure LC' is specified, the change in position is determined in relation to that reference point). In the examples of FIGS. 5A(a) to 5B(h), in various embodiments, the reference point of the light beam source structure may be specified as being located at the geometric center of the light beam source structure, or another center.

[0050] In the example of FIG. 5B(e) (for example, when compared with the example of FIG. 5A(a)), the light beam source structure LC' is shown as having moved in the XY plane towards the light beam sensor S4. The top view 510E (i.e., of the XY plane) shows the different positions of the light beams B1 and B2 on the light beam sensors S1 and S2. In the view 540E of the positions of the measurement spots, the measurement spots SP1 and SP2 are shown as having moved to the center right and center left, respectively, of the light beam sensors S1 and S2, and the measurement spots SP3 and SP4 remain at the centers of the light beam sensors S3 and S4, respectively.

[0051] In the example of FIG. 5B(f) (for example, when compared with the example of FIG. 5A(a)), the light beam source structure LC' is shown as having moved in the XY plane towards the light beam sensor S1. The top view 510F (i.e., of the XY plane) shows the different positions of the light beams B3 and B4 on the light beam sensors S3 and S4. In the view 540F of the positions of the measurement spots, the measurement spots SP1 and SP2 remain at the centers of the light beam sensors S1 and S2, respectively, but the measurement spots SP3 and SP4 are shown as having moved to the center right and center left, respectively, of the light beam sensors S3 and S4.

[0052] In the example of FIG. 5B(g), the light beam source structure LC’ is shown as being moved upward in the Z direction (i.e., parallel to the Z axis) (for example, when compared with the example of FIG. 5A(a)). The cross-sectional front view 520G and the cross-sectional side view 530G (i.e., the XZ plane and the YZ plane respectively) show the different positions of the light beams B1 and B2 on the light beam sensors S1 and S2, and the different positions of the light beams B3 and B4 on the light beam sensors S3 and S4, respectively. In the view 540G of the positions of the measurement spots, the measurement spots SP1 to SP4 are shown as having moved to the upper part of the centers of the light beam sensors S1 to S4, respectively.

[0053] In the example of FIG. 5B(h) (for example, when compared with the example of FIG. 5A(a)), the light beam source structure LC’ is shown as being rotated clockwise in the XY plane and moved upward in the Z direction (i.e., parallel to the Z axis). The top view 510H (i.e., of the XY plane) shows the clockwise rotation and the different positions of the light beams B1 to B4 on the light beam sensors S1 to S4. The cross-sectional front view 520H and the cross-sectional side view 530H (i.e., of the XZ plane and the YZ plane respectively) show the different positions of the light beams B1 and B2 on the light beam sensors S1 and S2, and the different positions of the light beams B3 and B4 on the light beam sensors S3 and S4, respectively. In the view 540H of the positions of the measurement spots, the measurement spots SP1 to SP4 are shown as having moved the light beam sensors S1 to S4 to the upper right corners respectively.

[0054] As described above, the optical beam sensors S1 to S4 can output measurement signals indicating the positions of the respective measurement spots SP1 to SP4 on the respective optical beam sensors S1 to S4. Based on the known geometric relationships between the optical beams B1 to B4 and the optical beam source structure LC' (including, for example, directing the known angular orientations of the optical beams B1 to B4 by, in relation to, and in relation to each other by the optical beam source structure LC'), the positions of the measurement spots SP1 to SP4 on the optical beam sensors S1 to S4 indicate the position and orientation of the optical beam source structure LC' (corresponding to the orientations in the examples of FIGS. 5A(a) to 5B(h), for example). The measurement signals from the optical beam sensors S1 to S4 may be processed (e.g., by the processing unit 190), and by this processing, the position and orientation of the optical beam source structure LC' and / or the end tool ETL (see FIG. 1, for example) to which the optical beam source structure LC' is coupled may be determined (e.g., by at least partially utilizing known geometric relationships, etc.).

[0055] Regarding the measurement signals from the optical beam sensors S1 to S4 indicating the position and orientation of the optical beam source structure LC', it is understood that all of the simplified examples of FIGS. 5A(a) to 5B(h) illustrate the case where the optical beams B1 to B4 are respectively directed at the corresponding optical beam sensors S1 to S4. More specifically, in each example, the optical beam B1 is directed at the optical beam sensor S1, the optical beam B2 is directed at the optical beam sensor S2, the optical beam B3 is directed at the optical beam sensor S3, and the optical beam B4 is directed at the optical beam sensor S4. In these examples, when the optical beam source structure LC' is rotated by 90 degrees, 180 degrees, or 270 degrees in the XY plane, similar measurement spots may be generated at similar positions on the optical beam sensors S1 to S4, and it may be desirable to be able to eliminate (e.g., distinguish) the ambiguity regarding such a possibility in some cases.

[0056] For example, with respect to the orientation shown in FIG. 5A(a), when the light beams B1 to B4 are directed toward the respective light beam sensors S1 to S4, the measurement signals indicating that the respective measurement spots SP1 to SP4 are at the centers of the respective light beam sensors S1 to S4 will uniquely indicate that the light beam source structure LC’ is at the position and orientation illustrated in FIGS. 510A to 530A of FIG. 5A(a) (e.g., corresponding to the “null position” in a given embodiment). However, with respect to the top view 510A, when rotated 90 degrees clockwise within the XY plane, the measurement spots SP are similarly generated at the centers of the light beam sensors S1 to S4. More specifically, the light beam B1 generates the measurement spot SP1 at the center of the light beam sensor S4, the light beam B2 generates the measurement spot SP2 at the center of the light beam sensor S3, the light beam B3 generates the measurement spot SP3 at the center of the light beam sensor S1, and the light beam B4 generates the measurement spot SP4 at the center of the light beam sensor S2. It will be understood that similar measurement spots at the centers of the light beam sensors S1 to S4 generated by the respective different measurement beams may occur when the configuration is rotated 180 degrees and 270 degrees in the same clockwise direction within the XY plane with respect to the initial orientation shown in the top view 510A.

[0057] To eliminate the ambiguity between sets of measurement signals resulting from such orientations (e.g., otherwise they might appear relatively identical), it may be desirable for the system to be configured to determine (e.g., at least approximately) which light beam is generally directed at which light beam sensor. As one way to address such issues, position information from the mobile system 110 can be utilized to eliminate the ambiguity. For example, in relation to the measurement system 110 described above with respect to FIGS. 1 and 2, position information determined from position sensors SEN1 - SEN5 (e.g., such as that received by the mobile system position and orientation processor 147) can be used to determine the approximate position and orientation of the end tool ETL and / or the light beam source structure LC (e.g., with the mobile system accuracy). Although the mobile system accuracy may be lower than that desired for a particular application, it may be useful for eliminating the ambiguity (e.g., as described in relation to the above example). More specifically, the accuracy of the mobile system can provide approximate position information (e.g., information indicating the approximate position and direction of the end tool ETL and / or the light beam source structure LC), and this can be used to identify which light beam is generally directed at which light beam sensor.

[0058] Returning to the above example, in the example of the configuration of FIG. 5A(a) where the measurement signals from the optical beam sensors S1 to S4 indicate that all the measurement spots are at the center of the optical beam sensor, the ambiguity in the possible orientations of the optical beam source structure LC’ (e.g., whether it is rotated 0 degrees, 90 degrees, 180 degrees, or 270 degrees as shown in FIG. 5A(a)) can be eliminated by using the position and orientation information from the mobile system. For example, using the position and orientation information from the mobile system 110, it is possible to determine whether the measurement spot at the center of the optical beam sensor S1 is generated by the optical beams B1, B2, B3, or B4. As described above, even when the measurement system accuracy is relatively low, it can be effectively utilized by the measurement system to eliminate the above-mentioned ambiguity (in accordance with the rough position information provided by the mobile system), and the measurement system can effectively provide higher-precision measurements according to the process as described in this specification.

[0059] In various embodiments, the general characteristics of the relationship between the measurement signals of the mobile system 110 and the measurement signals of the measurement system 150 can be described as follows. The position and orientation information (e.g., including measurement values) determined from one or more of the position sensors SEN1 to SEN5 of the mobile system 110 (i.e., with the accuracy of the mobile system) may be characterized by providing relatively coarse-scale information (e.g., including rough-scale measurement values of position and orientation, etc.). The position and orientation information (e.g., including measurement values) determined from the measurement system 150 (e.g., based on the measurement signals from the optical beam sensors) may be characterized by providing relatively fine-scale information (e.g., including fine-scale measurement values of position and orientation). In various embodiments, it is possible to combine the measurement values of the two systems to provide high-precision measurement values in a relatively large non-ambiguous range (e.g., micron-level accuracy over a cubic meter of moving volume, etc.).

[0060] As a specific example, in one exemplary embodiment, the positioning accuracy / positional error potential of the movement system is approximately on the order of 100 microns (e.g., when provided as a rough scale range in a movement / measurement space of 1 cubic meter as the unambiguous range). In this example, the measurement system may be configured to resolve potential distance errors in rough scale measurements, such as having an unambiguous range larger than the potential distance error (e.g., in this example having an unambiguous range exceeding 100 microns and having a fine scale range of micron-level accuracy). According to such exemplary values, the measured values (e.g., position and orientation information) of the two systems can be combined to provide a high-precision measured value (e.g., micron-level accuracy in a moving volume of 1 cubic meter).

[0061] Regarding a measurement system as disclosed herein, such a principle can also be generally explained from the perspective of identifying / eliminating ambiguity as to which light beam of the light beam source structure is directed at which light beam sensor (e.g., for a given measurement spot on a light beam sensor). Regarding the above exemplary values, the positioning accuracy / positional error potential of approximately 100 microns of the movement system (e.g., the unambiguous range provided in a movement / measurement volume of 1 cubic meter as a rough scale range) may be sufficient to identify / determine / eliminate ambiguity as to which light beam is directed at which light beam sensor. The unambiguous range of the measurement system (e.g., in the above example, a range exceeding 100 microns and having micron-level accuracy as a fine scale range) may correspond to a range in which different positions and orientations of the light beam source structure can be clearly determined (e.g., as partially shown by the simplified examples of FIGS. 5A(a) to 5B(h) according to when the measurement spot moves on the light beam sensor or exists at different respective positions).

[0062] As an alternative to, and / or in addition to, the above-described embodiments (e.g., the position information from the movement system is utilized for ambiguity elimination), the light beam may also have certain characteristics that can be utilized for ambiguity elimination (e.g., enabling the determination of which light beam is directed at which light beam sensor). For example, the light beam may be arranged in a pattern (e.g., having unique portions). In various embodiments, the light beam may, in addition to or as an alternative, have different wavelengths (e.g., colors), timings, modulations, structures, and / or other characteristics, and those characteristics may be detected / identified and utilized to identify which light beam is directed at which light beam sensor (e.g., when the light beam sensor includes different color detectors and has corresponding identification capabilities). In various embodiments, one or more characteristics of the light beam (e.g., timing, modulation, etc.) may be controlled by the light beam source structure control unit 192 (e.g., see FIG. 2), and this light beam source structure control unit 192 can provide related signals (e.g., timing signals, etc.) to the sensor structure control processing unit 180 and / or the measurement system orientation processing unit 190 (e.g., for use as part of a process of receiving measurement signals from the light beam sensor and using those measurement signals to determine which light beam is directed at which light beam sensor).

[0063] Figures 6(a) to 6(c) are diagrams showing i) twelve exemplary light beams B of the light beam source structure LC'', and ii) corresponding measurement spots SP on four sensors S1 to S4 of the sensor structure 160'' at different positions and orientations of the light beam source structure LC''. More specifically, in various embodiments, the light beam source structure LC'' provides and directs light beams B1, B2A to B2C, B3A to B3C, and B4A to B4E to form corresponding measurement spots SP1, SP2A to SP2C, SP3A to SP3C, and SP4A to SP4E on the light beam sensors S1 to S4. In the examples of FIGS. 6(a) to 6(c), the light beams are arranged in a pattern (e.g., in the orientation of FIG. 6(a), i) a single light beam B1 is directed towards the light beam sensor S1, ii) three light beams B2A to B2C are directed towards the light beam sensor S2, iii) three light beams B3A to B3C are directed towards the light beam sensor S3, iv) five light beams B4A to B4E are directed towards the light beam sensor S4). Such patterns may include the spacing and orientation (e.g., angular spacing and orientation) between the light beams and / or other characteristics, which can uniquely identify a part of the pattern directed towards the light beam sensor or group of light beam sensors (e.g., for use in determining the orientation and / or position of the light beam sensor structure and / or eliminating ambiguity).

[0064] In the example of FIG. 6(a) (which has a certain similarity to the orientation shown in FIG. 5A(a)), the light beam source structure LC'', and the corresponding light beams B1, B2A to B2C, B3A to B3C, and B4A to B4E are shown as being at a specified "null" position (e.g., including the corresponding "null" orientation). More specifically, the light beam B1 and the central light beam B2B are each parallel to the X-axis direction and are each directed towards the center of the light beam sensors S1 and S2, respectively. Similarly, the central light beams B3B, B4C are parallel to the Y-axis direction and are each directed towards the center of the light beam sensors S3, S4, respectively.

[0065] In the orientation shown in FIG. 6(a), the light beams B1, B2A - B2C, B3A - B3C, and B4A - B4E generate corresponding measurement spots SP1, SP2A - SP2C, SP3A - SP3C, and SP4A - SP4E on the light beam sensors S1 - S4, respectively. As shown in FIG. 640A of the positions of the measurement spots, the measurement spots SP1, SP2B, SP3B, and SP4C are all at the respective centers of the light beam sensors S1, S2, S3, and S4. It should be noted that these measurement spot positions are the same as the measurement spot positions shown in FIG. 5A(a). However, unlike FIG. 5A(a) where only a single measurement spot is generated on each light beam sensor, in FIG. 6(a), depending on the pattern of the light beams supplied and directed by the light beam source structure LC'', different numbers and / or arrays of measurement spots are formed on different light beam sensors.

[0066] For example, the light beam B1 generates only a single measurement spot SP1 at the center of the light beam sensor S1, while the light beams B2A - B2C and B3A - B3C generate a row of three measurement spots SP2A - SP2C and SP3A - SP3C, respectively, crossing the centers of the light beam sensors S2 and S3. Further, the light beams B4A - B4E generate a row of five measurement spots SP4A - SP4E crossing the center of the light beam sensor S4. Such characteristics enable the determination of which light beam is directed at which light beam sensor (e.g., to eliminate ambiguity regarding the above - mentioned problems), and it may be understood that additional position information (e.g., from a moving system) may not be required (although in some embodiments, it may be used in combination with such patterns or other information).

[0067] The optical beam sensors S1 to S4 can output measurement signals indicating that the measurement spots SP1, SP2A to SP2C, SP3A to SP3C, and SP4A to SP4E are at the positions shown on the optical beam sensors S1 to S4. Based on the known geometric relationships between the optical beams B1, B2A to B2C, B3A to B3C, and B4A to B4E and the optical beam source structure LC'', the measurement signals from the optical beam sensors S1 to S4 indicate the position and orientation of the optical beam source structure LC''. The measurement signals may be processed (e.g., by the processing unit 190), and by this processing, the position and orientation of the optical beam source structure LC'' and / or the end tool ETL (see, for example, FIG. 1) to which the optical beam source structure LC'' is coupled may be determined.

[0068] In the example of FIG. 6(b) (e.g., compared to the example of FIG. 6(a)), the optical beam source structure LC'' is shown as being rotated clockwise in the XY plane and moved upward in the Z direction (i.e., parallel to the Z axis and having some similarities to the example of FIG. 5B(h)). The top view 610B (i.e., of the XY plane) shows the clockwise rotation and the top view of the different positions of the optical beams B1, B2A to B2B, B3A to B3B, and B4A to B4C on the optical beam sensors S1 to S4. Note that the optical beams B2C, B3C, and B4D to B4E are no longer directed towards their respective optical beam sensors but instead are directed towards the spaces between the optical beam sensors of the sensor structure (such optical beams may typically occur for a relatively evenly distributed optical beam pattern having a limited size and being directed towards a relatively limited number of optical beam sensors that are at a relatively large distance from the optical beam source structure). The cross-sectional views 620B and 630B (i.e., in the cross-sectional XZ plane and YZ plane, respectively) show the different positions of the optical beams B1 and B2A on the optical beam sensors S1 and S2 and the different positions of the optical beams B3A and B4A on the optical beam sensors S3 and S4, respectively.

[0069] In FIG. 640B of the measurement spot positions, the measurement spots SP1, SP2A to SP2B, SP3A to SP3B, and SP4A to SP4C are each shown as having moved upward and then rightward on the light beam sensors S1 to S4, respectively. Also, in FIG. 640B of the measurement spot positions, it should be noted that (i.e., due to the corresponding light beams B2C, B3C, and B4D to B4E being directed into the space between the light beam sensors), the measurement spots SP2C, SP3C, and SP4D to SP4E formed on the light beam sensors S2 to S4 disappear. This example partially shows the reason why it may be desirable to have a sufficient number and / or relatively even distribution of light beams emitted from the light beam source structure in one or more directions. More specifically, in a given embodiment, based on the size of the light beam sensor (e.g., during a measurement operation) and the possible distance from the light beam source structure, generally, it may be desirable for the light beam source structure to provide a sufficient number and density of light beams in the directions surrounding the light beam source structure. Such factors regarding the light beam source structure can help ensure that at least some of the light beams are directed (e.g., for all possible orientations of the light beam source structure during a measurement operation) to generate corresponding measurement spots and corresponding measurement signals for at least one or all of the light beam sensors of the sensor structure.

[0070] In the example of FIG. 6(c) (for example, when compared with the example of FIG. 6(a)), the light beam source structure LC’’ is shown as being completely rotated 90 degrees clockwise in the XY plane. The top view 610C (i.e., of the XY plane) shows a 90-degree clockwise rotation and the top views of the different positions of the light beams B1, B2A~B2C, B3A~B3C, and B4A~B4E. Due to the 90-degree rotation, the light beam B1 is shown as being directed towards the light beam sensor S4 (instead of the light beam sensor S1 as in the orientation of FIG. 5A(a) for example). The light beams B2A~B2C are shown as being directed towards the light beam sensor S3 (instead of the light beam sensor S2 as in the orientation of FIG. 5A(a) for example). The light beams B3A~B3C are shown as being directed towards the light beam sensor S1 (instead of the light beam sensor S3 as in the orientation of FIG. 5A(a) for example). The light beams B4A~B4E are shown as being directed towards the light beam sensor S2 (instead of the light beam sensor S4 as in the orientation of FIG. 5A(a) for example). The light beam B1 and the central light beam B2B are each parallel to the Y-axis direction and are respectively directed towards the centers of the light beam sensors S4 and S3. Similarly, the central light beams B3B, B4C are each parallel to the X-axis direction and are respectively directed towards the centers of the light beam sensors S1, S2.

[0071] In the orientation shown in FIG. 6(c), the light beams B1, B2A~B2C, B3A~B3C, and B4A~B4E generate corresponding measurement spots SP1, SP2A~SP2C, SP3A~SP3C, and SP4A~SP4E on the light beam sensors S4, S3, S1, and S2 respectively. As shown in FIG. 640C of the positions of the measurement spots, the measurement spots SP1, SP2B, SP3B, and SP4C are all at the respective centers of the light beam sensors S4, S3, S1, and S2. Different from FIGS. 5A(a)~5B(h) where only a single measurement spot is generated on each light beam sensor as described above, in FIG. 6(c), different numbers of measurement spots are provided by the light beam source structure LC’’ and are formed on different light beam sensors according to the pattern of the light beams directed.

[0072] For example, the light beam B1 generates only a single measurement spot SP1 at the center of the light beam sensor S4, while the light beams B2A to B2C and B3A to B3C generate, respectively, a row of three measurement spots SP2A to SP2C and SP3A to SP3C that cross the center of the light beam sensors S3 and S1. Further, the light beams B4A to B4E generate a row of five measurement spots SP4A to SP4E that cross the center of the light beam sensor S2. With such characteristics, it will be understood that it becomes possible to determine which light beam is directed at which light beam sensor (for example, it is possible to eliminate ambiguity regarding problems as described above).

[0073] For example, the measurement signal from the light beam sensor S4 indicates the position of a single measurement spot SP1 at the center of the light beam sensor S4 as uniquely corresponding to the light beam B1 (for example, as compared with the orientation in Fig. 6(a) where the measurement signal from the light beam sensor S1 uniquely indicates the light beam B1 directed at the light beam sensor S1). The measurement signal from the light beam sensor S4 indicates the positions of the measurement spots SP4A to SP4E in the central row of the light beam sensor S4 as uniquely corresponding to the light beams B4A to B4E (for example, as compared with the orientation in Fig. 6(a) where the measurement signal from the light beam sensor S4 uniquely indicates the light beams B4A to B4E directed at the light beam sensor S4). Depending on the pattern of the light beam from the light beam source structure LC’’ having a unique pattern portion or a pattern portion distinguished in some other way, corresponding unique pattern portion measurement spots may be formed on each light beam sensor to which the pattern portion is directed. With such a configuration, it becomes possible to specify which light beam is directed at which light beam sensor by using the measurement signal from the light beam sensor (for example, for eliminating ambiguity and / or determining the position and orientation of the light beam source structure LC’’ with respect to the light beam sensors S1 to S4).

[0074] FIG. 7(a) and FIG. 7(b) are diagrams showing a first arrangement of measurement spots SP formed by light beams from a light beam source structure at first and second distances from a light beam sensor S1, respectively. In the example of FIG. 7(a), the light beam source structure is at a first distance (e.g., 10 cm), which is a relatively short distance from the light beam sensor S1. The light beam source structure emits a pattern of light beams having an angular spacing / angular dispersion such that a large number of measurement spots SP are generated on the light beam sensor S1 at the relatively short distance of FIG. 7(a). In contrast, in the example of FIG. 7(b), the light beam source structure is at a second distance (e.g., 60 cm), which is a relatively long distance from the light beam sensor S1. As a result of the longer distance and angular spacing / angular dispersion of the light beam, fewer measurement spots are generated on the light beam sensor S1. Further, each of the corresponding measurement spots SP in FIG. 7(b) is larger than in FIG. 7(a) (e.g., based on additional divergence of the light beam over the longer distance to the sensor S1 in FIG. 7(b)).

[0075] FIG. 8(a) and FIG. 8(b) are diagrams showing a second arrangement of measurement spots SP formed by light beams from a light beam source structure at first and second distances from a light beam sensor S1, respectively. FIGS. 8(a) and 8(b) show examples similar to those of FIGS. 7(a) and 7(b), except that the light beams and corresponding patterns are more structured. For example, the light beams are arranged such that the measurement spots are generated in evenly spaced rows and columns, the light beams are more collimated, or other structures are applied to generate larger-sized measurement spots at short distances and suppress the size variation at different distances. As shown in FIG. 8(a), the measurement spots SP are generated in relatively evenly spaced rows and columns on the light beam sensor S1, and their area is shown as a relatively similar large area compared to FIG. 8(b).

[0076] In the example of FIG. 8(a), the light beam source structure is at a first distance that is a relatively short distance from the light beam sensor S1 (e.g., 500 mm). The light beam source structure emits a pattern of light beams having an angular spacing / angle dispersion such that a number of measurement spots SP are generated on the light beam sensor S1 at the relatively short distance of FIG. 8(a). In the example of FIG. 8(b), the light beam source structure is at a second distance that is a relatively long distance from the light beam sensor S1 (e.g., 1500 mm). As a result of the longer distance and the angular spacing / angle dispersion of the light beam in FIG. 8(b), fewer measurement spots are generated on the light beam sensor S1. In the examples of FIGS. 8(a) and 8(b), the light beam sensor S1 includes an array of pixels (e.g., an array of 3600 pixels×5400 pixels).

[0077] In various embodiments, it may take a certain amount of time to process / monitor the entire area of each light beam sensor of the sensor structure 160 (e.g., corresponding to the entire pixel array) (e.g., including the time required to monitor / process / read out the data of all pixels of the pixel array of each light beam sensor). In some embodiments, such processing can be characterized by the number of frames per second for each of the light beam sensors. As will be described in more detail below, in some embodiments, in order to improve the overall processing speed, the region of interest may be determined to be composed of a smaller region of the light beam sensor, and the processing / monitoring of this smaller region of interest may be performed more quickly accordingly (e.g., compared to the case of processing / monitoring the entire area of the sensor). As will be described in more detail below, in one embodiment, for each light beam sensor of a set of light beam sensors (e.g., including the light beam sensors on which measurement spots are generated), a region of interest including the measurement spots generated by the light beam from the light beam source structure can be determined.

[0078] In the examples of FIGS. 7(a), 7(b), 8(a), and 8(b), the region of interest ROI is shown as being determined to include the measurement spot SP (e.g., generated by a light beam from a light beam source structure). In certain embodiments, the determination of each region of interest ROI may include determining the size of the region of interest on the light beam sensor S1. For example, as shown in FIG. 7(b), the size of the region of interest ROI is relatively large (to include a relatively large measurement spot SP compared to FIG. 7(a)). The region of interest ROI in FIG. 8(b) may also be somewhat larger than the region of interest ROI in FIG. 8(a) based on a slight difference in the size of the measurement spots, and the region of interest ROI in FIG. 8(b) can still include only a single measurement spot even if somewhat larger (e.g., based on the density of the measurement spots in FIG. 8(b) compared to FIG. 8(a)).

[0079] It is understood that techniques that utilize the region of interest ROI may in some embodiments correspond to monitoring / tracking smaller regions and / or fewer measurement spots (e.g., targeting a single measurement spot of each light beam sensor, or fewer measurement spots than the total number of measurement spots generated on the light beam sensor). According to various examples as described herein, such techniques that utilize a smaller area and / or fewer number of measurement spots can be performed more quickly (e.g., as part of a high-speed mode) and still achieve a desired level of accuracy for determining the position and orientation of the light beam source structure. In certain embodiments, the improvement in speed / measurement rate (e.g., compared to processing the entire area of the light beam sensor) may be improved by a ratio of dividing the total number of pixels in the area of the entire sensor by the number of pixels in the region of interest ROI on the light beam sensor. As one specific numerical example, in some cases, this may correspond to an increase in the measurement rate / speed of about 10 to 150 times depending on the area of the region of interest relative to the total detection area of the light beam sensor.

[0080] Figs. 9(a) to 9(c) are diagrams according to FIGS. 940A to 940C of the positions of measurement spots, illustrating the measurement spots SP on four optical beam sensors S1 to S4 having the same sensor structure as shown in FIGS. 640A to 640C of the positions of the measurement spots in FIGS. 6(a) to 6(c). As shown in Figs. 9(a) to 9(c), the regions of interest ROI1 to ROI4 are determined according to the principle described in this specification in accordance with the first operation mode (i.e., the high-speed operation mode), as will be described in more detail below. As shown in FIG. 940A of the positions of the measurement spots in FIG. 9(a), the measurement spots SP1, SP2A to SP2C, SP3A to SP3C, and SP4A to SP4E are respectively generated on the optical beam sensors S1 to S4 (e.g., generated by the optical beams B1, B2A to B2C, B3A to B3C, and B4A to B4E as described above in connection with FIG. 6(a)). As shown in FIG. 940A of the positions of the measurement spots, all of the measurement spots SP1, SP2B, SP3B, and SP4C are at the centers of the respective optical beam sensors S1, S2, S3, and S4. As described above with respect to FIG. 6(a), i) the optical beam B1 generates the measurement spot SP1 at the center of the optical beam sensor S1, ii) the optical beams B2A to B2C and B3A to B3C respectively generate a column of three measurement spots SP2A to SP2C and SP3A to SP3C crossing the center of the optical beam sensors S2 and S3, and iii) the optical beams B4A to B4E generate a column of five measurement spots SP4A to SP4E crossing the center of the optical beam sensor S4.

[0081] In various embodiments, the region of interest (e.g., including corresponding position and / or size, etc.) is determined based at least in part on position information received from the movement system 110 (e.g., including position information from the motion control system 140). As described herein, the motion control system 140 may provide position information indicating the position of the light beam source structure LC (e.g., within the measurement frame volume MFV) with the accuracy of the movement system, whereby the position of the light beam emitted from the light beam source structure, the position of the measurement spot generated on the light beam sensor, the distance from each light beam sensor to the light beam source structure LC, etc. can be indicated with the accuracy of the movement system (e.g., the fixed position of the light beam sensor relative to the measurement frame volume MFV is known).

[0082] Alternatively, or in addition, other data can be used to determine (e.g., estimate, predict, etc.) such position information. For example, the latest known position data, velocity data, direction data, etc. about the light beam source structure LC (e.g., data determined by the motion control system 140 and / or the measurement system 100) may be combined with the current position data from the movement system 110, the estimated or predicted values of the movement, etc. to determine such position information, which may be used, for example, in determining the region of interest. Regarding embodiments in which the size of the region of interest can be determined based on such position data, in the examples of FIGS. 7(b) and 8(b) (compared to FIGS. 7(a) and 8(a)), a relatively large size of the region of interest is shown, and it should be noted that the distances between the light beam source structure LC and each light beam sensor (e.g., at least part of which is indicated by the position information from the movement system 110) may indicate the size that each region of interest should be.

[0083] As shown in FIG. 9(a), in the light beam sensor S1, the region of interest ROI1 is determined to include the measurement spot SP1 at the position SPPO1 at the position RPO1. As shown in FIG. 9(b), in the light beam sensor S1, the region of interest ROI1 is determined to include the measurement spot SP1 at the position SPPO2 at the position RPO2. As shown in FIG. 9(c), in the light beam sensor S1, the region of interest ROI1 is determined to include the measurement spot SP3B at the position SPPO3 at the position RPO3.

[0084] Regarding the light beam sensors S1 in FIGS. 9(a) and 9(b), it will be understood that the movement of the region of interest ROI1 from the position RPO1 to the position RPO2 corresponds to maintaining the measurement spot SP1 within the region of interest ROI1 by moving the first region of interest ROI1 (e.g., while the measurement spot SP1 moves across at least a part of the detection region of the light beam sensor S1). Similarly, regarding the light beam sensors S2, S3, and S4 in FIGS. 9(a) and 9(b), the movement of the regions of interest ROI2, ROI3, and ROI4 from the position RPO1 to the position RPO2 corresponds to maintaining the corresponding measurement spots SP2B, SP3B, and SP4C within the regions of interest ROI2, ROI3, and ROI4 by moving the respective regions of interest ROI2, ROI3, and ROI4 (e.g., while the measurement spots SP2B, SP3B, and SP4C move across a part of the detection regions of the light beam sensors S2, S3, and S4).

[0085] As shown in FIG. 9(a), in the light beam sensor S2, the region of interest ROI2 is determined to include the measurement spot SP2B at the position SPPO1 at the position RPO1. As shown in FIG. 9(b), in the light beam sensor S2, the region of interest ROI2 is determined to include the measurement spot SP2B at the position SPPO2 at the position RPO2. As shown in FIG. 9(c), in the light beam sensor S2, the region of interest ROI2 is determined to include the measurement spot SP4C at the position SPPO3 at the position RPO3.

[0086] As shown in Fig. 9(a), in the light beam sensor S3, the region of interest ROI3 is determined to include the measurement spot SP3B at the position SPPO1 at the position RPO1. As shown in Fig. 9(b), in the light beam sensor S3, the region of interest ROI3 is determined to include the measurement spot SP3B at the position SPPO2 at the position RPO2. As shown in Fig. 9(c), in the light beam sensor S3, the region of interest ROI3 is determined to include the measurement spot SP2B at the position SPPO3 at the position RPO3.

[0087] As shown in Fig. 9(a), on the light beam sensor S4, the region of interest ROI4 is determined to include the measurement spot SP4C at the position SPPO1 at the position RPO1. As shown in Fig. 9(b), in the light beam sensor S4, the region of interest ROI4 is determined to include the measurement spot SP4C at the position SPPO2 at the position RPO2. As shown in Fig. 9(c), in the light beam sensor S4, the region of interest ROI4 is determined to include the measurement spot SP1 at the position SPPO3 at the position RPO3.

[0088] Regarding the comparison between FIGS. 9(b) and 9(c), it should be noted that for the optical beam sensor S1, the determination of the region of interest ROI1 in FIG. 9(c) is for including measurement spots different from those in FIG. 9(b) (i.e., for including the measurement spot SP3B in FIG. 9(c) as compared with the measurement spot SP1 in FIG. 9(b)). Similarly, for the optical beam sensors S2, S3, and S4, the determination of the regions of interest ROI2, ROI3, and ROI4 in FIG. 9(c) is for including measurement spots different from those included in FIG. 9(b). This can correspond to the movement of the optical beam source structure such that the optical beam that had generated the measurement spots on the optical beam sensor moves (e.g., moves toward the end of the optical beam sensor and goes out beyond the end of the sensor), and thus no measurement spots are generated on the optical beam sensor. In relation to such an event, the region of interest of the optical beam sensor may be determined to include different measurement spots generated by another optical beam currently directed at the optical beam sensor. Thereafter, the region of interest may continue to be set to move / follow as at least a part of the surface / detection region of the optical beam sensor corresponding to the new measurement spots moves.

[0089] The optical beam sensors S1 to S4 can output measurement signals indicating that the measurement spots SP1, SP2B, SP3B, and SP4C within their respective regions of interest ROI are at the positions shown on the optical beam sensors S1 to S4. In various embodiments, the process of determining the position of the measurement spot within the region of interest may be similar to the process executed to determine the position of the measurement spot within the entire region of the sensor, although the region to be processed for the region of interest is small. Based on the known geometric relationships between the optical beams B1, B2B, B3B, and B4C and the optical beam source structure (e.g., illustrated and described in relation to FIGS. 6(a) to 6(c)), the measurement signals from the optical beam sensors S1 to S4 indicate the position and orientation of the optical beam source structure. The measurement signals may be processed (e.g., by the processing unit 190), and by this processing, the position and orientation of the optical beam source structure and / or the end tool ETL (e.g., see FIG. 1) to which the optical beam source structure is coupled may be determined. Regarding the determination of the position and orientation based on a single measurement spot (i.e., in each region of interest), it will be understood that the examples of FIGS. 9(a) and 9(b) are similar to the examples of FIGS. 5A(a) and 5B(h) described above, respectively. The examples of FIGS. 5A(a) and 5B(h) also correspond to the processing based on a single measurement spot and the processing based on similar corresponding positions as shown in FIGS. 9(a) and 9(b), and thus the process of determining the position and direction (e.g., of the optical beam source structure) will be similarly understood.

[0090] In certain embodiments, the system may generally be configured such that a region of interest is not determined for a measurement spot with certain characteristics. For example, in some embodiments, the "zeroth-order" optical beam provided by the optical beam source structure is very bright and may cause specific problems (e.g., problems related to saturation and the resulting occurrence of blind spots). To address this, the system may be configured such that the region of interest is not specified to include regions where the measurement spot has such characteristics.

[0091] Figures 10(a), 10(b), and 10(c) show some simplified examples of alternative or additional techniques for determining the position and orientation of the light beam source structure. In the examples of Figures 10(a), 10(b), and 10(c), it will be understood that the position of the measurement spot may be determined using the region of interest as described above. In Figures 10(a), 10(b), and 10(c), the light beam sensors SX, SY, and SZ are arranged in orthogonal orientations (e.g., relative to each other and each being characterized by being orthogonal to the X, Y, and Z axis directions). The light beam source structure LC is shown as supplying at least the light beams BX, BY, and BZ towards the light beam sensors SX, SY, and SZ, respectively. The light beams BX, BY, and BZ are shown as intersecting the spot positions SPLX, SPLY, and SPLZ on the light beam sensors SX, SY, and SZ, respectively, to form the measurement spots. Since the detection surfaces of the light beam sensors SX, SY, and SZ are not visible in the orientations shown in Figures 10(a), 10(b), and 10(c), it will be understood that the positions SPLX, SPLY, and SPLZ of the measurement spots are shown from the back sides of the light beam sensors SX, SY, and SZ, respectively (e.g., as described above, the regions of interest on the light beam sensors SX, SY, and SZ may be used to determine the position of the measurement spot).

[0092] Figure 10(b) shows a simplified example of one method that can determine the rotation of the light beam source structure using the light beam sensors SX, SY, and SZ. Figure 10(a) shows the initial orientation and position, and Figure 10(b) illustrates an example where the light beam source structure LC has rotated slightly (e.g., about the Z-axis). The corresponding positions of the light beams and measurement spots are indicated by prime designations. As shown in Figure 10(b), the positions of the light beams after rotation are indicated by light beams BX’, BY’, BZ’, and the positions of the measurement spots are indicated by SPLX’, SPLY’, SPLZ’. As shown, the light beam BZ’ and the position of the measurement spot SPLZ’ have not changed relative to the positions in Figure 10(a). In one embodiment, as a method of determining that rotation has occurred, there is a method of determining that the paths of the measurement spots on the light beam sensors SX and SY are parallel to the surface of the light beam sensor SZ having a stationary measurement spot at the position SPLZ’.

[0093] Figure 10(c) shows a similar example excluding the translation of the light beam source structure LC. In Figure 10(c), the changes in the positions of the light beams and measurement spots are indicated by double prime designations (i.e., relative to the example in Figure 10(a)). As shown in Figure 10(c), the positions of the light beams after the translation of the light beam source structure LC are indicated by light beams BX’’, BY’’, and BZ’’, and the positions of the measurement spots are indicated by SPLX’’, SPLY’’, and SPLZ’’. As shown, the light beam BY’’ and the position SPLY’’ have not changed relative to the positions in Figure 10(a). In one embodiment, as a method of determining that translation has occurred, there is a method of determining that the paths of the measurement spots on the light beam sensors SX’’ and SZ’’ are perpendicular to the surface of the light beam sensor SY’’, which is a light beam sensor having a stationary measurement spot.

[0094] FIG. 11 is a flowchart showing one exemplary embodiment of a routine 1100 for operating a measurement system in which either a first operation mode (e.g., high-speed operation mode) or a second operation mode (e.g., standard speed operation mode) is utilized. In decision block 1110, a decision is made as to whether the first operation mode is to be utilized. In various embodiments, such a decision may be made based on an input from a user (e.g., the user may be provided with an option to utilize the first operation mode or the second operation mode through a selection element of the user interface or other means), and / or such a decision may be made at least in part based on an analysis by the measurement system (e.g., based on a desired operating speed, and / or a desired accuracy level for the determination of the position and orientation of the light beam source structure LC, and / or other factors).

[0095] If the second operation mode rather than the first operation mode is utilized, the routine proceeds to block 1130, as will be described in more detail below. If the first operation mode (e.g., high-speed operation mode) is utilized, the routine proceeds to block 1120, and the measurement system operates in a first operation mode in which the movement system moves the end tool and the corresponding light beam source structure to a plurality of positions, and for each position, the measurement system executes the steps of the first operation mode (e.g., as will be described in more detail below with respect to FIG. 12). Alternatively, in block 1130, the measurement system operates in a second operation mode (e.g., standard speed operation mode) in which the movement system moves the end tool and the corresponding light beam source structure to a plurality of positions, and for each position, the measurement system executes the steps of the second operation mode (e.g., as will be described in more detail below with respect to FIG. 13).

[0096] FIG. 12 is a flowchart showing one exemplary embodiment of routine 1200 for a first operation mode (e.g., high-speed operation mode). In block 1210, the light beam source structure operates to direct a light beam at the light beam sensor of the sensor structure to indicate the position and orientation of the light beam source structure. As described above, the light beam source structure is coupled to at least one of an end tool or an end tool attachment structure of a movement system that moves the end tool. The position and orientation of the light beam source structure indicate the position and orientation of the end tool. The sensor structure includes a plurality of light beam sensors disposed at fixed positions. At least a portion of the light beam directed at the light beam sensor generates a measurement spot at a position on the light beam sensor, causing the corresponding light beam sensor to generate a measurement signal.

[0097] In block 1220, for each light beam sensor of a set of light beam sensors, a region of interest is determined (e.g., to reduce the processing required to process measurement signals from the entire detection region of the light beam sensor). In various embodiments, the set of light beam sensors includes at least a portion or all of the light beam sensors at which measurement spots are generated (e.g., in some embodiments, light beam sensors at which no measurement spots are generated may not be included in the set). Each region of interest includes a measurement spot generated by the light beam from the light beam source structure. In block 1230, the measurement signals obtained from the regions of interest of the light beam sensors are processed (e.g., as opposed to processing measurement signals from the entire detection region of the light beam sensors). In block 1240, based at least in part on the processed measurement signals, the position and orientation of the light beam source structure are determined.

[0098] As described above, in various embodiments, the measurement rate of the measurement system 100 may be limited by the processing speed of the optical beam sensors of the sensor structure 160. In some embodiments, the processing speed of the optical beam sensors may be characterized by the number of frames per second or other characteristics. As described above, to achieve a higher measurement rate (e.g., as part of a high-speed operation mode), instead of performing processing based on the entire detection area of each of the optical beam sensors, smaller regions of interest (e.g., monitoring / tracking a single measurement spot on each optical beam sensor) can be utilized.

[0099] As a specific numerical example, in one embodiment, it may be desirable for the measurement system to operate at a measurement rate of 2 kilohertz, in which case the readout speed of the optical beam sensors may correspond to approximately 2,000 frames per second. By utilizing a region of interest to reduce the size of the frames read from the optical beam sensors, a faster measurement speed can be achieved. Position information from the movement system 110 (e.g., the operation control system 140) may be utilized to enable the region of interest to be accurately tracked and / or positioned in relation to the measurement spots being generated.

[0100] In various embodiments, as described above with respect to the examples of FIGS. 9(a) - 9(c), when the measurement spot being tracked by the region of interest moves near the edge of the light beam sensor, the region of interest may leave that measurement spot and move to track another measurement spot on the light beam sensor (e.g., move to include a measurement spot near the center of the light beam sensor or at a location less likely to deviate from the edge). In various embodiments, for at least a portion of the light beam sensors, a plurality of regions of interest may be determined, and each region of interest may include a measurement spot generated on the light beam sensor. In such embodiments, it is understood that even if one measurement spot deviates from the edge of a given light beam sensor, other measurement spots may still continue to be tracked by the associated region of interest on that light beam sensor. In one embodiment, the region of interest may be determined for some or all of the measurement spots generated on the light beam sensor. In various embodiments, a particular measurement process may include switching between a first and a second mode of operation. For example, when the measurement spot approaches the edge of the light beam sensor and the corresponding region of interest is moved to include a different measurement spot on the light beam sensor (e.g., to identify another measurement spot on the light beam sensor to which the region of interest is moved), the light beam sensor may operate in a second mode of operation (e.g., a standard speed mode of operation) in which the entire detection area of the light beam sensor is processed (e.g., at least temporarily determined).

[0101] Generally, the first mode of operation can be executed more quickly (e.g., to determine the position and orientation of the light beam source structure) and can achieve a desired level of accuracy, but the second mode of operation requires more processing time and is generally slower, but can achieve a higher level of accuracy. It will be understood that there is a trade - off between the first and second modes of operation. In some embodiments, the first and second modes of operation can be used in combination (e.g., the second mode of operation is used at specific times during the process of making a high - precision determination of position and orientation, and the first mode of operation is used at high speed at other times during the process).

[0102] FIG. 13 is a flowchart showing one exemplary embodiment of routine 1300 for a second operating mode (e.g., a standard speed operating mode). At block 1310, the light beam source structure operates to direct a light beam at the light beam sensor of the sensor structure to indicate the position and orientation of the light beam source structure. As described above, the light beam source structure is coupled to at least one of an end tool or an end tool attachment structure of a movement system that moves the end tool. The position and orientation of the light beam source structure indicate the position and orientation of the end tool. The sensor structure includes a plurality of light beam sensors arranged at fixed positions. At least a portion of the light beam directed at the light beam sensor generates a measurement spot at a position on the light beam sensor, causing the corresponding light beam sensor to generate a measurement signal.

[0103] At block 1320, measurement signals from the entire detection area of the light beam sensor are processed (rather than reducing processing, for example, by processing only measurement signals from a determined region of interest that is smaller than the entire detection area, as is done in the first / high speed operating mode). At block 1330, based at least in part on the processed measurement signals, the position and orientation of the light beam source structure are determined.

[0104] In various embodiments, routine 1300 determines that measurement system 100 operates in a second operating mode SOM that is an alternative to the first operating mode FOM, and operates measurement system 100 in a second operating mode SOM in which mobile system 110 moves end tool ETL and corresponding light beam source structure LC to a plurality of positions. For each position, measurement system 100 operates light beam source structure LC to direct a light beam at light beam sensors S1 - S4 of sensor structure 160 to indicate the position and orientation of light beam source structure LC, and processes measurement signals from the entire detection areas of light beam sensors S1 - S4 (rather than reducing processing only by processing measurement signals from a determined region of interest ROI that is smaller than the entire detection area), and determines the position and orientation of light beam source structure LC based at least in part on the processed measurement signals.

[0105] Various exemplary embodiments of the present disclosure having various features and elements annotated with reference numerals as seen in FIGS. 1 - 13 are described below. It should be understood that the reference numerals are added to illustrate the exemplary embodiments and the features and elements are not limited to the specific embodiments illustrated in FIGS. 1 - 13.

[0106] As described herein, measurement system 100 is provided for use with mobile system 110 that moves end tool ETL. Mobile system 110 includes movable structure MAC and operation control system 140. Movable structure MAC includes end tool attachment structure ETMC configured to have end tool ETL attached thereto. Operation control system 140 is configured to control the position and orientation of the end tool based at least in part on controlling movable structure MAC to move at least a portion of end tool ETL attached to end tool attachment structure ETMC within a movement volume MV.

[0107] The measurement system 100 includes a sensor structure 160, an optical beam source structure LC, and a processing unit 190. The sensor structure 160 includes a plurality of optical beam sensors arranged at fixed positions (e.g., including optical beam sensors S1 to S4). The optical beam source structure LC is configured to direct an optical beam toward the optical beam sensors of the sensor structure 160 to indicate the position and orientation of the optical beam source structure LC. The optical beam source structure LC is configured to be coupled to at least one of an end tool ETL or an end tool mounting structure ETMC. At least some of the optical beams directed toward the optical beam sensors are configured to generate a measurement spot SP at a position on the optical beam sensor that causes the corresponding optical beam sensor to generate a measurement signal.

[0108] The processing unit 190 is configured to process measurement signals from the optical beam sensors of the sensor structure 160 to determine the position and orientation of the optical beam source structure LC. As part of a first operation mode FOM in which a movement system 110 is configured to move the end tool ETL and the corresponding optical beam source structure LC to a plurality of positions, for each position, the measurement system 100 determines, for each optical beam sensor of a set of optical beam sensors, a region of interest ROI (e.g., to reduce the processing required to process measurement signals from the entire detection region of the optical beam sensor), each region of interest ROI includes a measurement spot SP generated by an optical beam from the optical beam source structure LC, processes the measurement signals resulting from the region of interest ROI of the optical beam sensor (e.g., as opposed to processing measurement signals from the entire detection region of the optical beam sensor), and determines the position and orientation of the optical beam source structure LC based at least in part on the processed measurement signals.

[0109] In various embodiments, the processing unit 190 determines at least one region of interest (ROI) for the first optical beam sensor S1 (e.g., so as to reduce the processing required to process measurement signals from the entire detection area of the first optical beam sensor), and is configured to process measurement signals for the at least one region of interest ROI. Each region of interest ROI includes a measurement spot SP, and each region of interest ROI is moved so as to maintain the corresponding measurement spot SP within the region of interest ROI.

[0110] In various embodiments, determining the region of interest ROI includes determining the position of the region of interest ROI on each optical beam sensor (e.g., optical beam sensors S1 to S4). In various embodiments, the region of interest ROI is determined based at least in part on position information received from the movement system 110. In various embodiments, determining the region of interest ROI includes determining the size of the region of interest ROI on each optical beam sensor (e.g., optical beam sensors S1 to S4). In various embodiments, each region of interest ROI is a very small part of the entire detection area of the optical beam sensor. For example, in one embodiment, each region of interest ROI can be less than 1 / 2, or 1 / 4, or 1 / 8 of the entire detection area of the optical beam sensor.

[0111] In various embodiments, as part of a second operating mode SOM (e.g., an alternative to the first operating mode FOM) in which the movement system 110 is configured to move the end tool ETL and the corresponding optical beam source structure LC to a plurality of positions, for each position, the measurement system 100 processes measurement signals from the entire detection area of the optical beam sensor (e.g., not by reducing the processing by only processing measurement signals from a determined region of interest ROI smaller than the entire detection area), and is configured to determine the position and orientation of the optical beam source structure LC based at least in part on the processed measurement signals.

[0112] In various embodiments, for a first position (e.g., corresponding to FIGS. 6(a) and 9(a)) of the light beam source structure LC where a first light beam B1 is directed at a first position SPPO1 on the first light beam sensor S1 to generate a first measurement spot SP1, the determined region of interest is a first region of interest ROI1 that includes the first measurement spot SP1 at the first position SPPO1. When the light beam source structure LC moves from the first position to the second position (e.g., as in the case corresponding to FIGS. 6(b) and 9(b)), the first light beam B1 moves, and correspondingly, the first measurement spot SP1 on the first light beam sensor S1 moves from the first position SPPO1 to the second position SPPO2. In this case, the determined region of interest is the first region of interest ROI1 that includes the first measurement spot SP1 at the second position SPPO2. To maintain the first measurement spot SP1 within the first region of interest ROI1 (e.g., when the first measurement spot SP1 moves across at least a portion of the detection region of the first light beam sensor S1), the first region of interest ROI1 correspondingly moves from the first position RPO1 to the second position RPO2. In various embodiments, the determination of the region of interest ROI1 at the second position RPO2 is at least partially based on position information from the movement system 110, which indicates the movement of the light beam source structure LC, the corresponding movement of the first light beam B1, the corresponding movement of the first light beam B1 on the first light beam sensor S1, and the corresponding movement of the first measurement spot SP1 on the first light beam sensor S1 (e.g., the movement from the first position SPPO1 to the second position SPPO2). This example is described and annotated with respect to the sensor S1 in FIGS. 9(a) and 9(b), but it will be understood that this description also applies to any of the sensors S2, S3, and / or S4 in FIGS. 9(a) and 9(b), the corresponding regions of interest ROI2, ROI3, and / or ROI4, the corresponding measurement spots SP2B, SP3B, and / or SP4C, and the corresponding light beams B2B, B3B, and / or B4C, respectively (along with the corresponding movements and light beams as shown in FIGS. 6(a) and 6(b)).

[0113] In various embodiments, when the first light beam B1 is directed towards the first light beam sensor S1 at the first position of the light beam source structure LC (e.g., corresponding to FIGS. 6(a) and 9(a), or FIGS. 6(b) and 9(b)) to generate a first measurement spot SP1 at the first position SPPO1 on the first light beam sensor S1, the region of interest determined for the first light beam sensor S1 is the first region of interest ROI1 (e.g., the first position RPO1) that includes the first measurement spot SP1 at the first position SPPO1, and the second light beam B3B is not directed towards the first light beam sensor S1. When the light beam source structure LC moves from the first position to the second position (e.g., corresponding to FIGS. 6(c) and 9(c)), whereby the first light beam B1 is no longer directed towards the first light beam sensor S1 and the second light beam B3B is directed towards the first light beam sensor S1 to generate a second measurement spot SP3B (e.g., position SPPO3), the region of interest determined for the first light beam sensor S1 is the first region of interest ROI1 (e.g., position RPO3), and this region of interest is determined to include the second measurement spot SP3B on the first light beam sensor S1. In various embodiments, at the second position of the light beam source structure LC, when the first light beam B1 is directed towards the second light beam sensor S4 and generates a first measurement spot SP1 at position SPPO3, the region of interest determined for the second light beam sensor S4 is the second region of interest ROI4 (at position RPO3), and this region includes the first measurement spot SP1 at position SPPO3 on the second light beam sensor S4 (e.g., in various embodiments, this position may be designated as the first or second position of the first measurement spot SP1 on the second light beam sensor S4).This example is described and annotated with respect to sensors S1 and S4 of FIGS. 9(a) and 9(c), but this description applies to i) sensors S2 and S3, or S3 and S1, or S4 and S2 in FIGS. 9(a) and 9(c) (and corresponding movements and light beams shown in FIGS. 6(a) and 6(c)), and corresponding regions of interest ROI2 and ROI3, or ROI3 and ROI1, or ROI4 and ROI2, and corresponding measurement spots and light beams, and / or ii) sensors S1 and S4, or S2 and S3, or S3 and S1, or S4 and S2 in FIGS. 9(b) and 9(c) (and corresponding movements and light beams shown in FIGS. 6(b) and 6(c)), and corresponding regions of interest ROI1 and ROI4, or ROI2 and ROI3, or ROI3 and ROI1, or ROI4 and ROI2, and corresponding measurement spots and light beams, as will be understood.

[0114] In various embodiments, the use of the region of interest ROI in the first operating mode FOM reduces the time and processing required for measurement signals from the light beam sensors (e.g., light beam sensors S1 - S4) compared to the second operating mode SOM that uses the entire detection area of the light beam sensor for processing the measurement signal. In various embodiments, when multiple light beams are directed at a first light beam sensor (e.g., light beam sensor S1 of FIG. 9(c)) and multiple measurement spots SP (e.g., measurement spots SP3A, SP3B, SP3C) are generated, measurement signals from measurement spots SP (e.g., measurement spots SP3A and SP3C outside region of interest ROI1) located outside the first region of interest ROI are not processed to determine the position and orientation of the light beam source structure LC. The same is true for light beam sensors S2, S3, S4 of FIGS. 9(a) and 9(b) and light beam sensors S2 and S3 of FIG. 9(c) with examples of measurement spots located outside their respective regions of interest.

[0115] In various embodiments, each of the light beam sensors (e.g., light beam sensors S1 to S4) includes a two-dimensional position detection sensor, and the measurement signal from the light beam sensor indicates the two-dimensional position of the measurement spot SP on the light beam sensor generated by the light beam. In various embodiments, the measurement frame volume MFV is at least partially defined by a plurality of light beam sensors (e.g., light beam sensors S1 to S4) arranged at fixed positions, and this measurement frame volume MFV is configured to surround at least a part of the moving volume MV. In various embodiments, the light beam source structure LC includes one or more diffraction optical elements DOE, and at least a part of the light beam from the light beam source structure LC is the diffracted light beam DLB.

[0116] In various embodiments, the motion control system 140 is configured to detect and control the position and orientation of the end tool ETL at a level of accuracy defined as the motion system accuracy, at least partially based on using a plurality of position sensors SEN included in the movable structure MAC to detect and control the position and orientation of the end tool ETL. The processing unit 190 is operable to determine the position and orientation of the end tool ETL with an accuracy higher than the motion system accuracy, at least partially based on processing the measurement signals from the light beam sensors (e.g., light beam sensors S1 to S4) to determine the position and orientation of the light beam source structure LC, where the position and orientation of the light beam source structure LC indicate the position and orientation of the end tool ETL.

[0117] In various embodiments, at a first position of the light beam source structure LC (e.g., corresponding to FIGS. 6(a) and 9(a), or FIGS. 6(c) and 9(c)), the light beam directed by the light beam source structure LC towards the sensor structure 160 includes a first light beam (e.g., light beam B1 or B3B), and the determination of which light beam sensor the first light beam is directed towards is made at least in part based on the position and orientation detected with movement system accuracy using a plurality of position sensors SEN included in the movable structure MAC. The light beam sensor towards which the first light beam is directed is a first light beam sensor (e.g., light beam sensor S1), a first region of interest ROI (e.g., region of interest ROI1) including a first measurement spot (e.g., measurement spot SP1 or SP3B) generated by the first light beam is determined, and the processing unit 190 is operable to determine the position and orientation of the end tool ETL with an accuracy higher than the movement system accuracy at least in part based on processing a first measurement signal indicating the position of the first measurement spot (e.g., measurement spot SP1 or SP3B) formed on the first light beam sensor by the first light beam from the first region of interest ROI of the first light beam sensor. This example is described and annotated with respect to sensor S1 in FIGS. 9(a) or 9(c), but it will be understood that this description applies to any of sensors S1 - S4, corresponding regions of interest, corresponding measurement spots, and corresponding light beams in FIGS. 9(a) - 9(c) (and also with respect to corresponding movements and light beams as shown in FIGS. 6(a) - 6(c)).

[0118] In various embodiments, for one or more of the light beam sensors included in a set of light beam sensors, a plurality of regions of interest (ROIs) may be determined on each light beam sensor, and each region of interest includes a measurement spot generated by a light beam from a light beam source structure. As an example, in an alternative embodiment of FIG. 9(a), on sensor S2, an additional region of interest including measurement spot SP2A may be determined, and / or an additional region of interest including measurement spot SP2C may be determined. Similarly, on sensor S3, an additional region of interest including measurement spot SP3A may be determined, and / or an additional region of interest including measurement spot SP3C may be determined. Similarly, on sensor S4, an additional region of interest including measurement spot SP4A may be determined, an additional region of interest including measurement spot SP4B may be determined, an additional region of interest including measurement spot SP4D may be determined, and / or an additional region of interest including measurement spot SP4E may be determined.

[0119] As described herein, the size of the region of interest (ROI) may vary (e.g., as described with respect to the examples of FIGS. 7(a), 7(b), 8(a), and 8(b)). As one specific example, the determined region of interest on a light beam sensor generally may be larger because it includes a larger measurement spot generated when the light beam source structure is relatively close to the light beam sensor. Correspondingly, the region of interest specified on a light beam sensor generally may be smaller because it includes a smaller measurement spot generated when the light beam source structure is relatively far from the light beam sensor.

[0120] In some embodiments, it will be appreciated that certain undesirable effects may occur if the size of the determined region of interest is not appropriate. For example, if the determined region of interest is too large, that region of interest may, undesirably, include multiple measurement spots. As another example, if the determined region of interest is too small, that region of interest may, undesirably, include only a portion of a single measurement spot. In the examples of FIGS. 9(a) - 9(c), for simplicity of illustration, all regions of interest are shown as being of the same approximate size, but it will be understood that in various embodiments, the sizes of the regions of interest may vary. In some embodiments, the sizes of the regions of interest (such as those shown in FIGS. 9(a) - 9(c)) may be comparable between different light beam sensors (for example, when the light beam source structure is at approximately the same distance from each light beam sensor, as shown in the corresponding top views of FIGS. 6(a) - 6(c), and / or when the light beam hardly diverges with distance so that the size of the measurement spot hardly changes at different distances, etc.).

[0121] In embodiments where the size of the determined region of interest does not change (i.e., the determined regions of interest are of approximately the same size), the acquisitions by the light beam sensors (for example, acquiring images of the measurement spots) may be synchronized. In such embodiments, algorithms and / or other methods can be configured to address situations where the region of interest does not properly include a single measurement spot when the sizes of the measurement spots vary. For example, if the determined region of interest is too large and that region of interest, undesirably, includes multiple measurement spots, the processing may be configured to separate a single measurement spot from within that region. As another example, if the determined region of interest is too small and that region of interest, undesirably, includes only a portion of a single measurement spot, the processing may be configured to discard the image of the measurement spot (for example, if it is determined to be unreliable).

[0122] In embodiments where the size of the specified region of interest is variable (i.e., when the specified regions of interest have different sizes), it should be noted that in some such embodiments, the timing of acquisition by the light beam sensor (e.g., of an image of the measurement spot) may vary. For example, the acquisition timing may be relatively long for a light beam sensor with a large region of interest and relatively short for a light beam sensor with a small region of interest (e.g., due to timings related to processing / readout of a large area of a large region of interest and a small area of a small region of interest). In certain embodiments, this may cause the light beam sensor to operate asynchronously, in which case the system may be configured to interpolate (e.g., delay) or extrapolate (e.g., which may raise concerns / issues with accuracy in some embodiments) the measurement spot position information from the slower light beam sensor for the larger region of interest. As an alternative, specific techniques for synchronizing the acquisition by the light beam sensor may be utilized. For example, in some embodiments, the acquisition timing of other light beam sensors with smaller regions of interest may be decelerated / delayed to operate in synchronization with the light beam sensor having the largest region of interest, in relation to the light beam sensor having the largest region of interest.

[0123] In various embodiments, at least some of the optical beam sensors may have multiple determined regions of interest at the same time (e.g., each region of interest includes one of a plurality of measurement spots generated on each respective optical beam sensor). In some such embodiments, the number of determined regions of interest may be adjusted or determined based on a tradeoff (e.g., such as between speed and accuracy). In one embodiment, a region of interest may be determined for each measurement spot generated on each optical beam sensor. Such embodiments may be compared to a second operating mode / standard speed operating mode, in which a substantially same number of measurement spots (e.g., in some cases, all of the generated measurement spots) may be determined / utilized, but by using regions of interest, the overall processing may be faster than the second operating mode / standard speed operating mode (e.g., by processing only the regions of interest rather than the entire area of the sensor).

[0124] Preferred embodiments of the present disclosure have been illustrated and described, but numerous variations in the illustrated and described sequence of the features, configurations, and operations will be apparent to those skilled in the art based on the present disclosure. Various alternative forms may be used to implement the principles disclosed herein. In addition, the various implementations described above can be combined to provide further implementations. All U.S. patents and U.S. patent applications referred to herein are hereby incorporated by reference in their entirety. Aspects of the embodiments can be modified, as necessary, to employ concepts from various patents and applications to provide further embodiments.

[0125] In light of the above detailed description, these and other changes can be made to the embodiments. Generally, in the following claims, the terms used should not be construed as limiting the claims to the specific embodiments disclosed herein and the claims should be construed to include all possible embodiments along with the full scope of equivalents to which such claims are entitled.

Claims

1. 1. A metrology system for use with a motion system for moving an end tool, comprising: The mobile system comprises: a movable structure including an end tool mounting structure configured to mount an end tool; a motion control system configured to control a position and orientation of the end tool based at least in part on controlling the moveable structure to move at least a portion of the end tool attached to the end tool mounting structure within a movement volume; and Equipped with The measurement system includes: a sensor structure including a plurality of optical beam sensors disposed at fixed locations; a light beam source structure for directing a light beam to a light beam sensor of the sensor structure to indicate a position and orientation of a light beam source structure; the optical beam source structure is configured to be coupled to at least one of an end tool or the end tool mounting structure; at least a portion of the light beam directed at the light beam sensor is configured to generate a measurement spot at a location on the light beam sensor that causes the light beam sensor to generate a corresponding measurement signal. a light beam source structure; a processor configured to process measurement signals from the light beam sensors of the sensor structure to determine a position and orientation of the light beam source structure; Equipped with As part of a first mode of operation in which the motion system is configured to move the end tool and corresponding light beam source structure to a plurality of positions, for each position, the metrology system: determining a region of interest for each light beam sensor of the set of light beam sensors, the region of interest including a measurement spot generated by a light beam from the light beam source structure; processing measurement signals resulting from the region of interest of the optical beam sensor; determining a position and orientation of the light beam source structure based at least in part on the processed measurement signals; The measurement system is configured as follows.

2. determining the region of interest comprises determining a position of the region of interest for each of the light beam sensors. The measurement system of claim 1 .

3. the region of interest is determined based at least in part on location information received from the mobile system. The measurement system of claim 2 .

4. determining the region of interest comprises determining a size of the region of interest for each of the optical beam sensors. The measurement system of claim 1 .

5. As part of a second mode of operation, which is an alternative to the first mode of operation, in which the motion system is configured to move the end tool and the corresponding light beam source structure to a plurality of positions, for each position, the metrology system is configured to: processing measurement signals from the entire sensing area of ​​the optical beam sensor; and configured to determine a position and orientation of the light beam source structure based at least in part on the processed measurement signal. The measurement system of claim 1 .

6. each region of interest being a small portion of a total sensing area of ​​the optical beam sensor; The measurement system of claim 1 .

7. for a first position of the light beam source structure directing a first light beam to a first position on a first light beam sensor to generate a first measurement spot, the determined region of interest is a first region of interest that includes the first measurement spot at the first position; for a movement of the light beam source structure from the first position to the second position resulting in a movement of the first light beam and a corresponding movement of the first measurement spot on the first light beam sensor from the first position to the second position, the determined region of interest is the first region of interest that includes the first measurement spot at the second position and corresponds to a movement of the first region of interest to maintain the first measurement spot within the corresponding first region of interest. The measurement system of claim 1 .

8. determining the region of interest at the second location is based at least in part on position information from the motion system, the position information being indicative of the movement of the light beam source structure, the corresponding movement of the first light beam, and the corresponding movement of the first measurement spot on the first light beam sensor. The measurement system of claim 7.

9. for a first position of the light beam source structure directing a first light beam to a first location on a first light beam sensor to generate a first measurement spot, the region of interest determined for the first light beam sensor is a first region of interest that includes the first measurement spot at the first location, and a second light beam is not directed to the first light beam sensor; when the light beam source structure moves from the first position to a second position such that the first light beam is no longer directed at the first light beam sensor and the second light beam is directed at the first light beam sensor to generate a second measurement spot on the first light beam sensor, the region of interest determined for the first light beam sensor is the first region of interest determined to include the second measurement spot on the first light beam sensor. The measurement system of claim 1 .

10. the first light beam is directed to a position on a second light beam sensor, and for a second position of the light beam source structure generating a first measurement spot, the region of interest determined for the second light beam sensor is a second region of interest that includes the first measurement spot at that position. The measurement system of claim 9.

11. Utilizing the region of interest in the first mode of operation reduces the time and processing required for the measurement signals from the optical beam sensor compared to a second mode of operation in which the entire sensing area of ​​the optical beam sensor is utilized for the processing of the measurement signals. The measurement system of claim 1 .

12. for a first light beam sensor in which a plurality of measurement spots are generated by a plurality of light beams directed to said first light beam sensor, measurement signals resulting from measurement spots outside a first region of interest are not processed to determine the position and orientation of said light beam source structure; The measurement system of claim 1 .

13. each of the light beam sensors comprises a two-dimensional position detection sensor, the measurement signal from the light beam sensor being indicative of a two-dimensional position of a measurement spot on the light beam sensor generated by a light beam; The measurement system of claim 1 .

14. a metrology frame volume configured to enclose at least a portion of the moving volume and at least partially defined by the plurality of optical beam sensors disposed at the fixed locations; The measurement system of claim 1 .

15. the light beam source structure comprises one or more diffractive optical elements, and at least a portion of the light beams from the light beam source structure are diffracted light beams. The measurement system of claim 1 .

16. the motion control system is configured to detect and control the position and orientation of the end tool with a level of accuracy defined as a motion system accuracy based at least in part on detecting and controlling the position and orientation of the end tool using a plurality of position sensors included in the movable structure; the processing unit is operable to determine a position and orientation of the end tool with a level of accuracy better than the motion system accuracy based at least in part on processing the measurement signals from the light beam sensor to determine a position and orientation of the light beam source structure indicative of the position and orientation of the end tool. The measurement system of claim 1 .

17. for a first position of the light beam source structure, the light beams directed by the light beam source structure to the sensor structure include a first light beam, and a determination of which light beam sensor the first light beam is directed to is based at least in part on a position and orientation sensed with a moving system precision, determined using the plurality of position sensors included in the movable structure; the light beam sensor to which the first light beam is directed is the first light beam sensor on which a first region of interest is determined that includes a first measurement spot generated by the first light beam; the processing unit is operable to determine a position and orientation of the end tool with an accuracy greater than the motion system accuracy based at least in part on processing a first measurement signal from the first region of interest of the first light beam sensor, the first measurement signal being indicative of a position of the first measurement spot formed by the first light beam on the first light beam sensor. The measurement system of claim 16.

18. for one or more of the light beam sensors of the set of light beam sensors, a plurality of regions of interest are determined for each of the one or more light beam sensors, each region of interest including a measurement spot generated by a light beam from the light beam source structure; The measurement system of claim 1 .

19. 1. A method of operating a metrology system for use with a motion system for moving an end tool, comprising the steps of: The mobile system comprises: a movable structure including an end tool mounting structure configured to mount an end tool; a motion control system configured to control a position and orientation of the end tool based at least in part on controlling the moveable structure to move at least a portion of the end tool attached to the end tool mounting structure within a movement volume; and Equipped with The method comprises: determining that the metrology system is to operate in a first mode of operation; operating the metrology system in the first mode of operation in which the motion system moves the end tool and a corresponding optical beam source structure to a plurality of positions; Equipped with For each location, the measurement system: operating the light beam source structure to direct a light beam at a light beam sensor of a sensor structure to indicate a position and orientation of the light beam source structure; the optical beam source structure is coupled to at least one of the end tool mounting structure of the end tool or the motion system that moves the end tool; the position and orientation of the light beam source structure indicates the position and orientation of the end tool; the sensor structure includes a plurality of optical beam sensors disposed at fixed locations; at least a portion of the light beam directed at the light beam sensor generates a measurement spot at a location on the light beam sensor that causes the light beam sensor to generate a corresponding measurement signal; determining a region of interest for each light beam sensor of the set of light beam sensors that includes a measurement spot generated by a light beam from the light beam source structure; processing measurement signals resulting from the region of interest of the optical beam sensor; determining a position and orientation of the light beam source structure based at least in part on the processed measurement signals; method.

20. determining that the metrology system is to operate in a second mode of operation that is an alternative to the first mode of operation; operating the metrology system in a second mode of operation in which the motion system moves the end tool and corresponding light beam source structure to a plurality of positions; Further equipped with For each location, the measurement system: operating the light beam source structure to direct a light beam to a light beam sensor of the sensor structure in a manner indicative of a position and orientation of the light beam source structure; processing measurement signals from the entire sensing area of ​​the optical beam sensor; determining a position and orientation of the light beam source structure based at least in part on the processed measurement signals; 20. The method of claim 19.

21. a sensor structure including a plurality of optical beam sensors arranged at fixed positions; a light beam source structure for directing a light beam to a light beam sensor of the sensor structure to indicate a position and orientation of a light beam source structure; the optical beam source structure is configured to be coupled to at least one of an end tool mounting structure of an end tool or a motion system for moving the end tool; the position and orientation of the light beam source structure indicates the position and orientation of the end tool; at least a portion of the light beam directed at the light beam sensor is configured to generate a measurement spot at a location on the light beam sensor that causes the light beam sensor to generate a corresponding measurement signal. a light beam source structure; a processor configured to process the measurement signals from the light beam sensors of the sensor structure to determine a position and orientation of the light beam source structure; Equipped with As part of a first mode of operation in which the motion system is configured to move the end tool and corresponding light beam source structure to a plurality of positions, for each position, a metrology system is configured to: determining a region of interest for each light beam sensor of the set of light beam sensors that includes a measurement spot generated by a light beam from the light beam source structure; processing measurement signals resulting from the region of interest of the optical beam sensor; determining a position and orientation of the light beam source structure based at least in part on the processed measurement signals; The measurement system is configured as follows.

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