Cultivation apparatus

Abstract

To provide a cultivation apparatus which is excellent in the efficiency of adjusting the concentration of an adjustment target dissolved gas in a culture solution and which is less likely to cause damage to a cultivation target.SOLUTION: A cultivation apparatus comprises: a circulation path having a reactor for cultivating a cultivation target; a pump for circulating a culture solution containing the cultivation target in the circulation path; a branch path formed by branching from a branch portion of the circulation path and joining to a junction portion of the circulation path; a gas concentration adjustment unit for adjusting the concentration of an adjustment target dissolved gas in the culture solution in the branch path by supplying a supply gas to the culture solution in the branch path; and a static mixer provided in the branch path. The gas concentration adjustment unit includes the static mixer and a filter provided between the branch portion and the static mixer, the filter suppressing passage of the cultivation target and allowing passage of the culture solution.SELECTED DRAWING: Figure 1

Description

[Technical Field]

[0001] The present invention relates to an incubation device. [Background technology]

[0002] A culture device is known that has a circulation path with a reactor for cultivating the culture subject, a pump for circulating a culture solution containing the culture subject within the circulation path, and a gas dissolving unit for dissolving carbon dioxide in the culture solution (see, for example, Patent Documents 1 and 2). [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Publication No. 2023-68902 [Patent Document 2] Patent No. 7216239 Summary of the Invention [Problem to be solved by the invention]

[0004] An object of the present invention is to provide a culture apparatus which is excellent in the efficiency of adjusting the concentration of a dissolved gas to be adjusted in a culture solution and which is less likely to damage the culture object. [Means for solving the problem]

[0005] One aspect of the present invention is as follows.

[0006] [1] a circulation path having a reactor for cultivating a culture target; a pump that circulates the culture solution containing the culture subject through the circulation path; a gas concentration adjusting unit that forms a branch path that branches from the branching portion of the circulation path and joins the joining portion of the circulation path, and adjusts the concentration of the dissolved gas to be adjusted in the culture solution in the branch path by supplying a supply gas to the culture solution in the branch path; a static mixer provided in the branch path, The culture device, wherein the gas concentration adjusting unit has the static mixer and a filter provided between the branching unit and the static mixer, the filter preventing the culture target from passing through and allowing the culture solution to pass through.

[0007] [2] The culture apparatus according to [1], further comprising a flow rate adjusting unit that adjusts the flow rate of the culture solution toward the circulation path side and the flow rate of the culture solution toward the branch path side at the branching section.

[0008] [3] The culture device according to [2], wherein the flow rate adjusting unit allows the culture medium to flow simultaneously on both the circulation path side and the branch path side.

[0009] [4] a sensor for measuring the concentration of the dissolved gas to be adjusted in the culture solution; The culture device according to [2] or [3], further comprising a control device electrically connected to the sensor and the three-way valve as the flow rate control unit, and controlling the three-way valve in accordance with the measurement results of the sensor.

[0010] [5] The culture device according to any one of [1] to [4], wherein the gas concentration adjusting unit has a check valve that allows the culture solution to flow from the branching part to the confluence part in the branching path while suppressing the flow in the reverse direction.

[0011] [6] The culture apparatus according to any one of [1] to [5], wherein the branching section and the confluence section are located inside the reactor.

[0012] [7] The culture apparatus according to any one of [1] to [6], wherein the supply gas contains carbon dioxide, and the dissolved gas to be adjusted contains carbon dioxide.

[0013] [8] The culture apparatus according to any one of [1] to [7], wherein the supply gas contains nitrogen and the dissolved gas to be adjusted contains oxygen. [Effects of the Invention]

[0014] According to the present invention, it is possible to provide a culture device that is excellent in the efficiency of adjusting the concentration of a dissolved gas to be adjusted in a culture solution and that is less likely to damage the culture target. [Brief explanation of the drawings]

[0015] [Figure 1] 1 is a schematic diagram showing a culture device according to one embodiment of the present invention. [Figure 2] FIG. 2 is an external view showing an example of the static mixer shown in FIG. [Figure 3] 1. FIG. 4 is an external view showing another example of the static mixer shown in FIG. DETAILED DESCRIPTION OF THE INVENTION

[0016] Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

[0017] As shown in Figure 1, in one embodiment of the present invention, the culture apparatus 1 includes a circulation path 2 having a reactor 2a for cultivating the culture target, a pump 4 for circulating a culture solution 3 containing the culture target within the circulation path 2, a gas concentration adjustment unit 6 that forms a branch path 5 that branches off from a branch point 2b of the circulation path 2 and joins at a confluence point 2c of the circulation path 2, and adjusts the concentration of the dissolved gas to be adjusted in the culture solution 3 within the branch path 5 by supplying a supply gas to the culture solution 3 within the branch path 5, and a static mixer 6a provided in the branch path 5, and the gas concentration adjustment unit 6 includes the static mixer 6a and a (first) filter 6b that is provided between the branch point 2b and the static mixer 6a and that prevents the culture target from passing through but allows the culture solution 3 to pass through.

[0018] According to the above configuration, by supplying a supply gas to the culture solution 3 flowing through the branch path 5 from the branch point 2b to the junction point 2c and stirring the culture solution 3 with the static mixer 6a, the concentration of the dissolved gas to be cultured can be efficiently adjusted while reducing the consumption of the supply gas and power. Furthermore, the culture solution 3 passes through the filter 6b, which prevents the culture solution 3 from passing through the filter 6b, and reaches the static mixer 6a in the branch path 5 (i.e., the culture solution 3, which is substantially isolated from the culture solution by the branch path 5 and the filter 6b, is stirred by the static mixer 6a). This reduces damage to the culture solution due to stirring by the static mixer 6a. Furthermore, since stirring can be performed by the static mixer 6a, it is not necessary to increase the output of the pump 4 to increase the flow rate of the culture solution 3 for stirring. This stabilizes the culture conditions and reduces damage to the culture solution in the reactor 2a due to an increase in the flow rate. Therefore, a culture apparatus 1 can be realized that efficiently adjusts the concentration of the dissolved gas to be cultured in the culture solution 3 and is less likely to damage the culture solution, thereby improving, for example, the yield (and quality) of the culture solution. To enhance the effect of suppressing damage to the culture target, the gas concentration adjusting unit 6 may be configured, as in this embodiment, to have a second filter 6c that is provided between the confluence 2c and the static mixer 6a and that suppresses the passage of the culture target but allows the passage of the culture solution 3. The method of supplying the supply gas to the culture solution 3 in the branch path 5 is not particularly limited, and for example, a method of blowing the supply gas into the culture solution 3 can be used.

[0019] The culture device 1 has a flow rate adjuster 10 that adjusts the flow rate of the culture solution 3 toward the circulation path 2 side and the flow rate of the culture solution 3 toward the branch path 5 side at the branch portion 2b. According to the above configuration, the flow rate adjuster 10 can cause an appropriate amount of culture solution 3 corresponding to the required adjustment amount of the concentration of the dissolved gas to be adjusted in the culture solution 3 to flow from the circulation path 2 to the gas concentration adjuster 6. It is preferable that the flow rate adjuster 10 be configured so that the culture solution 3 can flow toward both the circulation path 2 side and the branch path 5 side at the same time, as in this embodiment.

[0020] The culture apparatus 1 includes a (first) sensor 11 that measures the concentration of a dissolved gas to be adjusted in the culture solution 3, and a control device 12 that is electrically connected to the sensor 11 and a three-way valve serving as a flow rate regulator 10 and controls the three-way valve in accordance with the measurement results from the sensor 11. According to the above configuration, the control device 12, which is comprised of a computer or the like, controls the three-way valve in accordance with the concentration of the dissolved gas to be adjusted in the culture solution 3, thereby allowing an appropriate amount of the culture solution 3 to flow from the circulation path 2 to the gas concentration regulator 6. The sensor 11 may be configured to be provided downstream of the three-way valve in the reactor 2a, as in this embodiment. Furthermore, the culture apparatus 1 may also be configured to include a second sensor 13 that measures the concentration of the dissolved gas to be adjusted in the culture solution 3, and the control device 12 is electrically connected to the sensor 11 and the second sensor 13 and controls the three-way valve serving as the flow rate regulator 10 in accordance with the measurement results from the sensor 11 and the second sensor 13. The second sensor 13 may be configured to be provided upstream of the three-way valve in the reactor 2a, as in this embodiment. The sensor 11 and the second sensor 13 may be configured to measure the pH or temperature, or both, of the culture solution 3 in addition to the concentration of the dissolved gas to be adjusted in the culture solution 3. The control device 12 may be configured to control the three-way valve in accordance with the in vivo metabolism or circadian rhythm of the culture target, the amount of light, or the like, in addition to the measurement results from the sensor 11 (and the second sensor 13). The control device 12 is not limited to control in accordance with the measurement results from the sensor 11 (and the second sensor 13), and may be configured to perform control in accordance with, for example, a preset time schedule.

[0021] The gas concentration adjusting unit 6 includes a (first) check valve 6d that allows the culture solution 3 to flow from the branching portion 2b to the confluence portion 2c in the branching path 5 while suppressing flow in the reverse direction. According to the above configuration, the check valve 6d allows the culture solution 3, whose concentration has been adjusted, to flow stably to the confluence portion 2c, thereby enabling stable adjustment of the concentration of the dissolved gas to be adjusted in the culture solution 3. In this embodiment, the check valve 6d is provided between the branching portion 2b and the static mixer 6a. To enhance the effect of stabilizing the concentration adjustment, the gas concentration adjusting unit 6 may also be configured, as in this embodiment, to include a second check valve 6e that is provided between the confluence portion 2c and the static mixer 6a in the branching path 5 while allowing the culture solution 3 to flow from the branching portion 2b to the confluence portion 2c while suppressing flow in the reverse direction. Furthermore, the gas concentration adjuster 6 may be configured to have the second check valve 6e without the check valve 6d, or may be configured to have neither the check valve 6d nor the second check valve 6e.

[0022] The branching portion 2b and the confluence portion 2c are located inside the reactor 2a. According to the above configuration, the concentration of the dissolved gas to be adjusted in the culture solution 3, which has changed due to the activity of the culture subject in the reactor 2a, can be efficiently adjusted.

[0023] The culture subject may be a microorganism that requires dissolved gases such as carbon dioxide for cultivation, such as hydrogen bacteria (Hydrogenobacter thermophilus, Hydrogenophilus thermoluteolus, etc.). It may also be (micro)algae (cyanobacteria, green algae, etc.) that require dissolved carbon dioxide to be consumed by photosynthesis for cultivation. As the culture solution 3, for example, a liquid medium containing a nitrogen source, a phosphorus source, trace elements, a carbon source, etc. can be used.

[0024] The culture target is cultured in the reactor 2a by consuming the necessary dissolved gases while circulating within the circulation path 2 in a state contained in the culture solution 3. In this embodiment, the reactor 2a has a long flow path that constitutes part of the circulation path 2. The reactor 2a may be configured to have a pipe that forms the flow path inside, as in this embodiment. Furthermore, as in this embodiment, the reactor 2a is preferably a closed system reactor in which the circulation path 2 within the reactor 2a is closed from the outside. The circulation path 2 may be configured to have a tank 2d that stores the culture solution 3, as in this embodiment.

[0025] When the culture target is a microorganism that requires dissolved gas for cultivation, an insufficient concentration of the necessary dissolved gas in the culture solution 3 will result in poor growth of the culture target.

[0026] When the culture subject is a photosynthetic organism, the reactor 2a is preferably a photobioreactor. That is, the culture subject is cultured by receiving light in the reactor 2a. The culture subject exposed to light in the reactor 2a consumes dissolved carbon dioxide in the culture solution 3 through photosynthesis, thereby increasing the dissolved oxygen in the culture solution 3. An insufficient concentration of dissolved carbon dioxide in the culture solution 3 leads to poor growth of the culture subject. Furthermore, an excessive concentration of dissolved oxygen in the culture solution 3 has an adverse effect on the growth of the culture subject. In this embodiment, the reactor 2a is optically transparent, allowing light from an external light source to pass into the reactor 2a.

[0027] When the culture target is a microorganism that requires carbon dioxide for cultivation or a photosynthetic organism, it is preferable that the supply gas contains carbon dioxide and the dissolved gas to be adjusted contains carbon dioxide. According to the above configuration, the carbon dioxide supplied to the branch path 5 of the gas concentration adjuster 6 is agitated by the static mixer 6a, so that the carbon dioxide can be efficiently dissolved in the culture solution 3.

[0028] When the culture target is a photosynthetic organism, it is preferable that the supply gas contains nitrogen and the dissolved gas to be adjusted contains oxygen. According to the above configuration, by supplying nitrogen to the branch path 5 and mixing the nitrogen and the culture solution 3 with the static mixer 6a, the dissolved oxygen in the culture solution 3 is efficiently released into the nitrogen gas bubbles in the culture solution 3, thereby efficiently reducing the dissolved oxygen in the culture solution 3.

[0029] When the culture target is a photosynthetic organism, the supply gas may contain carbon dioxide and nitrogen, and the dissolved gas to be adjusted may contain carbon dioxide and oxygen. In this case, although not shown, the culture apparatus 1 may be configured to have a (first) gas supply source 7 that supplies one of carbon dioxide and nitrogen to the branch path 5 of the gas concentration adjuster 6, and another gas supply source that supplies the other of carbon dioxide and nitrogen to the branch path 5 of the gas concentration adjuster 6. The supply of supply gas from the gas supply source 7 may be configured to be supplied via a pressure adjustment valve 8a, as in this example. The supply of supply gas from the gas supply source 7 and the supply of supply gas from the other gas supply source may be configured to be performed simultaneously, or may be configured to be performed at different times.

[0030] The culture apparatus 1 has a supply path 8 that supplies a supply gas from a gas supply source 7 to a branch path 5 toward a static mixer 6a, and an exhaust path 9 that exhausts the supply gas from the branch path 5, the supply path 8 having a first on-off valve 8b, and the exhaust path 9 having a second on-off valve 9a.

[0031] The gas concentration adjusting unit 6 has a third sensor 6g that measures the concentration of a dissolved gas to be adjusted in the culture solution 3 in a gas concentration adjusting tank 6f (described later), and the control device 12 is electrically connected to the third sensor 6g, the first on-off valve 8b, and the second on-off valve 9a, and controls the first on-off valve 8b and the second on-off valve 9a in accordance with the measurement result by the third sensor 6g. The control device 12 is also electrically connected to the pressure adjusting valve 8a, and controls the pressure adjusting valve 8a in accordance with the measurement result by the third sensor 6g. The control device 12 is not limited to control in accordance with the measurement result of the third sensor 6g, and may be configured to perform control in accordance with, for example, a preset time schedule.

[0032] The filter 6b is formed of, for example, a membranous porous member (porous membrane) having a large number of micropores that prevent the passage of the culture subject and allow the passage of the culture solution 3. The porous member may be hydrophobic and may be formed of, for example, a material such as polytetrafluoroethylene, polypropylene, or polyethylene.

[0033] The static mixer 6a may be operably mounted on the branch path 5 so as to rotate or perform other motions due to fluid pressure from the culture solution 3, but is preferably mounted integrally on the branch path 5. The static mixer 6a can stir the culture solution 3 in the branch path 5 without relying on external power such as electricity. The stirring (mixing) performed by the static mixer 6a may involve, for example, flow division and confluence, or flow direction change, and preferably both. For example, as shown in Figures 2 and 3, the static mixer 6a may have a flow path wall member 6a1 that extends so as to change the flow direction (e.g., twist in a spiral shape around the central axis O) while forming a cross-sectional shape (flow path cross section) that divides the flow from the flow division section 6a2 to the flow confluence section 6a3. The static mixer 6a may also have a configuration that includes multiple flow division sections 6a2 and flow confluence sections 6a3 spaced apart in the flow direction, as shown in Figure 3. For example, the static mixer 6a may have a configuration in which a plurality of flow path wall members 6a1 are shifted in a predetermined direction (direction along the central axis O) as shown in the example of Fig. 3. Furthermore, the static mixer 6a may have a configuration in which a plurality of spirally twisted flow path wall members 6a1 are shifted in a predetermined direction so that the twisting direction is alternately reversed as shown in the example of Fig. 3.

[0034] The gas concentration adjustment tank 6f is a sealed container having an internal space in which the static mixer 6a is disposed, a liquid inlet and a liquid outlet communicating with the internal space, and a gas inlet and a gas outlet communicating with the internal space. The positions of the liquid inlet, liquid outlet, gas inlet, and gas outlet on the sealed container are not particularly limited. For example, as in this embodiment, the liquid outlet may be located vertically above the liquid inlet, and the gas outlet may be located vertically above the gas inlet. To prevent damage to the culture target if bubbles from the supply gas supplied into the culture solution 3 enter the circulation path 2 within the reactor 2a, a gas trap space may be provided in the internal space to separate bubbles by buoyancy from the culture solution 3 discharged from the liquid outlet toward the confluence 2c. In this case, the liquid outlet may be located below the vertical upper end of the internal space, and the space above the liquid outlet may be used as the gas trap space.

[0035] In this embodiment, the culture apparatus 1 includes a circulation path 2, a pump 4, a (first) gas concentration adjustment unit 6 that forms a (first) branch path 5 that branches off from a (first) branch point 2b of the circulation path 2 and joins at a (first) confluence point 2c of the circulation path 2 and adjusts the concentration of a (first) dissolved gas to be adjusted in the culture solution 3 in the branch path 5, and a second gas concentration adjustment unit 15 that forms a second branch path 14 that branches off from a second branch point 2e of the circulation path 2 and joins at a second confluence point 2f of the circulation path 2 and adjusts the concentration of a second dissolved gas to be adjusted in the culture solution 3 in the second branch path 14. In this embodiment, the culture apparatus 1 also includes a second supply path 17 that supplies a second supply gas from the second gas supply source 16 to the second branch path 14 and a second exhaust path 18 that exhausts the second supply gas from the second branch path 14. The second supply path 17 includes a third on-off valve 17a, and the second exhaust path 18 includes a fourth on-off valve 18a. In FIG. 1, the positions of the branch portion 2b and the second branch portion 2e in the circulation path 2 are different, but this is not limiting and they may be configured to be the same. In FIG. 1, the positions of the confluence portion 2c and the second confluence portion 2f in the circulation path 2 are different, but this is not limiting and they may be configured to be the same. The dissolved gas to be adjusted and the second dissolved gas to be adjusted may be the same or different. For example, the supply gas contains carbon dioxide, the dissolved gas to be adjusted contains carbon dioxide, the second supply gas contains nitrogen, and the second dissolved gas to be adjusted contains oxygen. In the present embodiment, the culture apparatus 1 is provided with a (first) static mixer 6a in the branch path 5 of the gas concentration adjuster 6, and no static mixer 6a is provided in the second branch path 14 of the second gas concentration adjuster 15. However, the culture apparatus 1 may be configured such that no static mixer 6a is provided in the branch path 5 of the gas concentration adjuster 6, and a second static mixer is provided in the second branch path 14 of the second gas concentration adjuster 15, or such that the static mixer 6a is provided in the branch path 5 of the gas concentration adjuster 6, and a second static mixer is provided in the second branch path 14 of the second gas concentration adjuster 15.

[0036] Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and the above-described embodiments can be modified in various ways without departing from the gist of the present invention. [Explanation of symbols]

[0037] 1 Culture device 2 Circulation Route 2a Reactor 2b Branch 2c Confluence 2d tank 2e Second branch 2F 2nd Junction 3 Culture solution 4. Pump 5 Branching Paths 6 Gas concentration adjustment section 6a Static Mixer 6a1 Flow path wall member 6a2 Flow division section 6a3 Flow confluence 6b Filter 6c Second filter 6d Check valve 6e Second check valve 6f Gas concentration adjustment tank 6g 3rd sensor 7 Gas supply source 8 Supply Channels 8a Pressure regulating valve 8b First shut-off valve 9. Excretion Route 9a Second shut-off valve 10 Flow rate adjustment section 11 Sensors 12 Control device 13 Second sensor 14 Second Branch Route 15 Second gas concentration adjustment unit 16 Second gas supply source 17 Second Supply Route 17a Third shut-off valve 18 Secondary Emission Pathway 18a Fourth shutoff valve O center axis

Claims

1. a circulation path having a reactor for cultivating a culture target; a pump that circulates the culture solution containing the culture subject through the circulation path; a gas concentration adjusting unit that forms a branch path that branches off from the branching portion of the circulation path and joins the joining portion of the circulation path, and adjusts the concentration of the dissolved gas to be adjusted in the culture solution in the branch path by supplying a supply gas to the culture solution in the branch path; a static mixer provided in the branch path, The culture device, wherein the gas concentration adjusting unit has the static mixer and a filter provided between the branching unit and the static mixer, the filter preventing the culture target from passing through and allowing the culture solution to pass through.

2. The culture apparatus according to claim 1 , further comprising a flow rate adjusting unit that adjusts the flow rate of the culture solution toward the circulation path side and the flow rate of the culture solution toward the branch path side at the branching section.

3. The culture device according to claim 2 , wherein the flow rate adjusting unit allows the culture medium to flow simultaneously on both the circulation path side and the branch path side.

4. a sensor for measuring the concentration of the dissolved gas to be adjusted in the culture solution; The culture device according to claim 2 , further comprising a control device electrically connected to the sensor and the three-way valve as the flow rate adjusting unit, and controlling the three-way valve in accordance with the measurement result by the sensor.

5. The culture apparatus according to claim 1 , wherein the gas concentration adjusting unit has a check valve that allows the culture solution to flow from the branching portion to the confluence portion in the branching path while suppressing a flow in the reverse direction.

6. The culture device according to claim 1 , wherein the branching portion and the confluence portion are located within the reactor.

7. The culture apparatus according to claim 1 , wherein the supply gas contains carbon dioxide and the dissolved gas to be adjusted contains carbon dioxide.

8. The culture apparatus according to claim 1 , wherein the supply gas contains nitrogen and the dissolved gas to be adjusted contains oxygen.

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