Detector

Abstract

To provide a detector capable of achieving higher detection accuracy.SOLUTION: A detector includes a light source device, a detection object body installation part, an electrochromic shutter having a plurality of divisional areas, and an optical sensor including a plurality of detection areas. The plurality of divisional areas in the electrochromic shutter are capable of switching between translucent and opaque per one divisional area. A plurality of light-emitting devices are capable of switching between lighting and non-lighting per one light-emitting device. Each of the light-emitting devices, each of the plurality of divisional areas of the electrochromic shutter and each of the plurality of detection areas overlap when viewed in a Z direction.SELECTED DRAWING: Figure 9

Description

[Technical Field]

[0001] The present disclosure relates to a detection device. [Background technology]

[0002] Patent Document 1 discloses a biosensor including an optical sensor having a photodiode (light detection element), a culture vessel placed above the imaging surface of the optical sensor, and a point light source arranged above the culture vessel. A culture medium and a plurality of target substances (microorganisms) are contained in the culture vessel. In the biosensor of Patent Document 1, light emitted from the point light source passes through the culture medium and the plurality of target substances (microorganisms) in the culture vessel and enters the photodiode. However, with the biosensor of Patent Document 1, it may be difficult to detect the target substances if the culture medium in the culture vessel has low light transmittance. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Patent No. 6830593 Summary of the Invention [Problem to be solved by the invention]

[0004] There is a demand for a detection device that can detect an object to be detected with higher accuracy.

[0005] An object of the present disclosure is to provide a detection device that improves the detection accuracy of a detection target. [Means for solving the problem]

[0006] A detection device of one embodiment of the present invention comprises a light source device including a plurality of light-emitting elements arranged in a plane; a translucent detectable object installation section arranged overlapping one side of the light source device in a first direction and in which a detectable object is installed; an electrochromic shutter arranged overlapping one side of the detectable object installation section in the first direction and having a plurality of divided regions arranged in a plane; and an optical sensor arranged overlapping one side of the electrochromic shutter in the first direction and including a plurality of detection regions arranged in a plane, wherein each of the detection regions includes one or more light detection elements, the plurality of divided regions in the electrochromic shutter can be switched between translucent and non-translucent on a per-divisional basis, and the plurality of light-emitting elements can each be switched between lit and unlit, and each of the plurality of light-emitting elements, each of the plurality of divided regions of the electrochromic shutter, and each of the plurality of detection regions overlap when viewed from the first direction. [Brief explanation of the drawings]

[0007] [Figure 1] FIG. 1 is a perspective view schematically showing a detection device according to an embodiment. [Figure 2] FIG. 2 is a perspective view showing a state in which the top plate is removed from FIG. [Figure 3] FIG. 3 is a schematic diagram of a detection device according to an embodiment. [Figure 4] FIG. 4 is a schematic diagram showing a cross section of an electrochromic shutter. [Figure 5] FIG. 5 is a schematic diagram showing an example of the configuration of an electrochromic shutter. [Figure 6] FIG. 6 is a schematic circuit diagram showing the configuration of a switching element in an electrochromic shutter. [Figure 7] FIG. 7 is a block diagram showing an example of the configuration of a detection device. [Figure 8] FIG. 8 is a schematic diagram showing a projection area of ​​the light emitted from the light emitting element. [Figure 9]FIG. 9 is a schematic diagram of a detection device according to an embodiment. [Figure 10] FIG. 10 is a schematic plan view of the light source device according to the embodiment. [Figure 11] FIG. 11 is a schematic plan view of the electrochromic shutter according to the embodiment. [Figure 12] FIG. 12 is a schematic plan view of the optical sensor according to the embodiment. [Figure 13] FIG. 13 is a schematic diagram showing the operating states of two light-emitting elements and two divided regions of the electrochromic shutter adjacent to each other in the X direction. [Figure 14] FIG. 14 is a flowchart illustrating an example of the detection operation of the detection device according to the embodiment. [Figure 15] FIG. 15 is a schematic diagram showing the order in which the light-emitting elements are turned on. [Figure 16] FIG. 16 is a schematic diagram showing the order in which the divided regions of the electrochromic shutter are opened. [Figure 17] FIG. 17 is a schematic diagram showing the order in which the photodetecting elements of the detecting device perform detection. DETAILED DESCRIPTION OF THE INVENTION

[0008] Modes (embodiments) for carrying out the present invention will be described in detail with reference to the drawings. The present disclosure is not limited to the contents described in the following embodiments. Furthermore, the components described below include those that a person skilled in the art can easily imagine and those that are substantially identical. Furthermore, the components described below can be combined as appropriate. Note that the disclosure is merely an example, and any appropriate modifications that a person skilled in the art can easily conceive while maintaining the gist of the present disclosure are naturally included within the scope of the present disclosure.

[0009] In addition, in order to clarify the explanation, the drawings may show the width, thickness, shape, etc. of each part schematically compared to the actual embodiment, but these are merely examples and do not limit the interpretation of the present disclosure. Furthermore, in this disclosure and each drawing, elements similar to those described above with respect to the previous drawings may be assigned the same reference numerals, and detailed explanations may be omitted as appropriate.

[0010] In the drawings, the XYZ coordinate system has the Z direction (first direction) as the up-down direction, the X direction (second direction) as the left-right direction, and the Y direction (third direction) as the front-to-back direction. The X direction intersects (is perpendicular to) the Y and Z directions, the Y direction intersects (is perpendicular to) the X and Z directions, and the Z direction intersects (is perpendicular to) the X and Y directions. The Z1 side is one side of the first direction, and the Z2 side is the other side of the first direction. The end on the X2 side of the X direction is referred to as one end, and the end on the X1 side is referred to as the other end. Note that a plan view refers to a state viewed from the Z direction (first direction).

[0011] Fig. 1 is a perspective view schematically illustrating a detection device according to an embodiment, and Fig. 2 is a perspective view illustrating a state in which a top plate is removed from Fig. 1.

[0012] As shown in FIGS. 1 and 2, the detection device 100 has, for example, a substantially box-like shape. The detection device 100 includes a housing 3 and a holding member 4. The housing 3 has a top plate 31 and side plates 32 and 33. The holding member 4 has a plate 41 and a base plate 42. A detection target installation unit 110 is placed on the plate 41. A front holding portion 42c and a rear holding portion 42d are provided at the four corners of the base plate 42. The front holding portion 42c and the rear holding portion 42d are biased upward (toward Z1) by a spring 5. Because the detection target installation unit 110 is placed on the plate 41, the plate 41 and the detection target installation unit 110 are biased upward (toward Z1) by the spring 5.

[0013] 3 is a schematic diagram of a detection device according to an embodiment. As shown in FIG. 3, the detection device 100 includes a light source device 7, a detection target installation portion 110, an electrochromic shutter 82, an optical sensor 81, and a spring 5.

[0014] The light source device 7 includes a light source substrate 72 and a plurality of light-emitting elements 71. The light-emitting elements 71 are, for example, light-emitting diodes (LEDs). In this way, the light source device 7 includes a plurality of light-emitting elements 71 arranged in a plane.

[0015] The detectable object installation section 110 includes a mounting substrate 111 and a cover member 112. The detectable object installation section 110 is, for example, a petri dish. The detectable object installation section 110 is translucent. The mounting substrate 111 is disposed on the Z1 side of the light source device 7 and is a translucent substrate on which the detectable object 114 is mounted.

[0016] In this embodiment, the detection target object installation section 110 is disposed upside down compared to a normal detection target object installation section. That is, in a normal detection target object installation section, the mounting substrate is disposed on the lower side and the cover member is disposed on the upper side. In contrast, the detection target object installation section 110 according to this embodiment has the mounting substrate 111 disposed on the upper side and the cover member 112 disposed on the lower side. The optical sensor 81 and the electrochromic shutter 82 are disposed on the upper side (Z1 side) of the upside-down detection target object installation section 110, and the light source device 7 is disposed on the lower side (Z2 side). A culture medium 113 is disposed on the lower side of the mounting substrate 111, and the detection target object 114 is applied to the culture medium 113 (the lower surface of the culture medium 113). The detection target object 114 is, for example, a microorganism such as bacteria or a sample containing a microorganism, and forms a colony on the culture medium 113 over time. The detection target object 114 is not limited to bacteria and may be other minute objects such as cells.

[0017] The optical sensor 81 has an array substrate 811 and sensor pixels 812 (photodetection elements 813, photodiodes). The optical sensor 81 is disposed so as to overlap the electrochromic shutter 82 on the Z1 side. A plurality of sensor pixels 812 are provided on the surface of the array substrate 811 on the Z2 side. The electrochromic shutter 82 will be described later.

[0018] Light L emitted from the light-emitting element 71 passes through the cover member 112, the culture medium 113, the mounting substrate 111, and the divided regions of the electrochromic shutter 82 that are in a light-transmitting state (open state), and is irradiated toward the optical sensor 81. The amount of light irradiated onto the photodetector element 813 (photodiode) of the optical sensor 81 differs between the region overlapping with the detectable object 114 and the region not overlapping with the detectable object 114. This allows the optical sensor 81 to capture an image of the detectable object 114. In this way, the detection device 100 is a device that places the detectable object 114 housed in the detectable object installation section 110 between the light source device 7 and the optical sensor 81, and monitors changes in the detectable object 114 by capturing an image of the detectable object 114 with the optical sensor 81.

[0019] Fig. 4 is a schematic diagram showing a cross section of an electrochromic shutter, and Fig. 5 is a schematic diagram showing an example of the configuration of an electrochromic shutter.

[0020] The electrochromic shutter 82 will be described below. In the following description, the "electrochromic" in electrochromic shutter may be abbreviated to simply "EC." For example, an electrochromic shutter may be referred to as an EC shutter, and an electrochromic material may be referred to as an EC material. EC is an abbreviation for electrochromic.

[0021] 4, the electrochromic shutter 82 includes a first substrate 8211, a second substrate 8212, and an electrochromic material 8215. The EC material 8215 is sandwiched between the first substrate 8211 and the second substrate 8212 in the Z direction. The EC shutter 82 is a device that utilizes the EC material 8215, which can be reversibly controlled to transmit or block light by controlling the applied voltage. Examples of the EC material 8215 include ion-inserted metal oxides such as chromium oxide (Cr2O3) and tungsten oxide (WO3), but the EC material is not limited to these, and other materials that produce a similar phenomenon may also be used.

[0022] The first substrate 8211 and the second substrate 8212 are light-transmitting substrates such as glass substrates. A first electrode 8213 is formed on the surface of the first substrate 8211 facing the EC material 8215. A second electrode 8214 is formed on the surface of the second substrate 8212 facing the EC material 8215. A switching element 8240 is connected to the first electrode 8213. The potential difference between the first electrode 8213 and the second electrode 8214 determines the voltage applied to the EC material 8215. In this embodiment, a constant potential is applied to the second electrode 8214.

[0023] As shown in FIG. 5, the EC shutter 82 has an active area 82AA and a switching circuit area 82SA. A plurality of switching elements 8240 are arranged in a matrix in the active area 82AA. Each of the plurality of switching elements 8240 corresponds to a divided region 820 of the EC shutter 82. Part of the divided region 820 is indicated by a dashed line. Specifically, of the switching elements 8240 shown in FIG. 5, "1-1" corresponds to the divided region 82-1, "2-1" corresponds to the divided region 82-2, and "3-1" corresponds to the divided region 82-3. The divided regions 820 of the EC shutter 82 will be described in detail later.

[0024] In the EC shutter 82, a signal output via a wiring 8231 is applied as a drive signal to the active area 82AA via a gate driver 8221 and a wiring 8235. A signal output via a wiring 8232 is applied to a switching circuit area 82SA via a decoder 8222 and a wiring 8236. The potential of the signal output via a wiring 8233 is applied as an applied potential to the active area 82AA via a switching circuit area 82SA and a wiring 8237. The potential of the signal output via a wiring 8234 is applied as a reset potential to the active area 82AA via a switching circuit area 82SA and a wiring 8237.

[0025] Fig. 6 is a schematic circuit diagram showing the configuration of a switching element in an electrochromic shutter. The switching element 8240 shown in Fig. 6 is a field effect transistor (FET). The gate of the switching element 8240 is connected to a scanning line 8350. One of the source or drain of the switching element 8240 is connected to a transmission path 8370. The other of the source or drain of the switching element 8240 is connected to a first electrode 8213. In other words, the switching element 8240 functions as a switching element that applies, to the first electrode 8213, a potential corresponding to a potential (e.g., an applied potential or a reset potential) due to a signal transmitted via the transmission path 8370 at the timing when a signal (drive signal) is provided to the gate via the scanning line 8350.

[0026] The transmission path 8370 shown in Fig. 6 is any one of the transmission paths Data_1, Data_2, Data_3, ..., Data_n shown in Fig. 5. The wiring 8237 includes multiple transmission paths, such as the transmission paths Data_1, Data_2, Data_3, ..., Data_n shown in Fig. 5. The multiple transmission paths are connected to the wiring 8233 via the switching circuit area 82SA. n is a natural number of 2 or more that indicates the number of switching elements 8240 arranged in the Y direction and the number of transmission paths. Multiple switching elements 8240 arranged in the X direction share the same transmission path.

[0027] A plurality of transmission paths such as transmission paths Data_1, Data_2, Data_3, . . . , Data_n are connected to a wiring 8233 via individual first switching units 8251, 8252, 8253, . . . , 825n. As shown in FIG. 5, transmission path Data_1 is connected to a wiring 8233 via a first switching unit 8251. Transmission path Data_2 is connected to a wiring 8233 via a first switching unit 8252. Transmission path Data_3 is connected to a wiring 8233 via a first switching unit 8253. Similarly, transmission path Data_n is connected to a wiring 8233 via a first switching unit 825n.

[0028] Furthermore, multiple transmission paths such as transmission paths Data_1, Data_2, Data_3, . . . , Data_n are connected to a wiring 8234 via individual second switching units 8261, 8262, 8263, . . . , 826n, respectively. As shown in FIG. 5, transmission path Data_1 is connected to a wiring 8234 via a second switching unit 8261. Transmission path Data_2 is connected to a wiring 8234 via a second switching unit 8262. Transmission path Data_3 is connected to a wiring 8234 via a second switching unit 8263. Similarly, transmission path Data_n is connected to a wiring 8234 via a second switching unit 826n. The positions at which the plurality of transmission paths and the second switching units 8261, 8262, 8263, ···, 826n are connected are closer to the active area 82AA than the positions at which the plurality of transmission paths and the first switching units 8251, 8252, 8253, ···, 825n are connected.

[0029] The first switching units 8251, 8252, 8253, ···, 825n and the second switching units 8261, 8262, 8263, ···, 826n operate under the control of the decoder 8222.

[0030] The decoder 8222 is connected to wiring ASW1, ASW2, ASW3, ···, ASWn that transmits signals for individually controlling the first switching units 8251, 8252, 8253, ···, 825n. As shown in FIG. 5, wiring ASW1 connects the decoder 8222 and the first switching unit 8251. Wiring ASW2 connects the decoder 8222 and the first switching unit 8252. Wiring ASW3 connects the decoder 8222 and the first switching unit 8253. Similarly, wiring ASWn connects the decoder 8222 and the first switching unit 825n. The wiring 8236 includes wiring ASW1, ASW2, ASW3, ···, ASWn.

[0031] The decoder 8222 is also connected to a wiring ASW0 that transmits a signal for collectively controlling the second switching units 8261, 8262, 8263, ..., 826n. The wiring ASW0 connects the decoder 22 to the second switching units 8261, 8262, 8263, ..., 826n. The wiring 8236 includes wiring ASW0 in addition to wiring ASW1, ASW2, ASW3, ..., ASWn.

[0032] The decoder 8222 operates in response to a signal provided from the host 8225 via a wiring 8232, and controls the operations of the first switching units 8251, 8252, 8253, ···, 825n and the second switching units 8261, 8262, 8263, ···, 826n. More specifically, the decoder 8222 functions as a so-called combinational logic circuit, and can control the operations of the first switching units 8251, 8252, 8253, ···, 825n and the second switching units 8261, 8262, 8263, ···, 826n in response to a signal provided via a wiring 8232 that includes fewer wirings than the number of wirings included in the wiring 36.

[0033] The scanning line 8350 shown in FIG. 6 is any one of the scanning lines Gate_1, Gate_2, Gate_3, . . . , Gate_m shown in FIG. 5. The wiring 8235 includes multiple scanning lines, such as the scanning lines Gate_1, Gate_2, Gate_3, . . . , Gate_m shown in FIG. 5. The gate driver 8221 operates in response to a signal provided from the host 8225 via the wiring 8231, and provides driving signals sequentially to the scanning lines Gate_1, Gate_2, Gate_3, . . . , Gate_m. m is a natural number of 2 or more indicating the number of switching elements 8240 arranged in the X direction and the number of scanning lines. Multiple switching elements 8240 arranged in the Y direction share the same scanning line.

[0034] Fig. 7 is a block diagram showing an example of the configuration of a detection device. As shown in Fig. 7, the detection device 100 has an optical sensor 81, an electrochromic shutter 82, a light source device 7, and a host IC 75. The optical sensor 81 has an array substrate 811, a plurality of sensor pixels 812 (photodetection elements 813, photodiodes) formed on the array substrate 811, gate line drive circuits 814A and 814B, a signal line drive circuit 16A, and a detection control circuit 816.

[0035] The array substrate 811 is formed using the substrate 21 as a base. Each of the plurality of sensor pixels 812 is configured to have a photodetector element 813, a plurality of transistors, and various wirings.

[0036] The array substrate 811 has a detection area AA and a peripheral area GA. The detection area AA is an area in which a plurality of sensor pixels 812 (a plurality of photodetection elements 813) are provided. The peripheral area GA is an area between the periphery of the detection area AA and the outer edge of the array substrate 811, and is an area in which a plurality of sensor pixels 812 are not provided. Gate line driving circuits 814A and 814B, a signal line driving circuit 815A, and a detection control circuit 816 are provided in the peripheral area GA.

[0037] Each of the plurality of sensor pixels 812 is an optical sensor having a photodetection element (photodiode) 813 as a sensor element. Each of the photodetection elements 813 outputs an electrical signal according to the light irradiated thereon.

[0038] The detection control circuit 816 is a circuit that supplies control signals Sa, Sb, and Sc to the gate line driving circuits 814A, 814B and the signal line driving circuit 815A, respectively, and controls their operations. The detection control circuit 816 includes a signal processing circuit that processes the detection signals Vdet from the multiple photodetection elements 813.

[0039] The detection control circuit 816 processes the detection signals Vdet from the multiple light detection elements 813, and outputs a sensor value So based on the detection signal Vdet to the host IC 75. In this way, the detection device 100 detects information related to the object 114 to be detected.

[0040] The electrochromic shutter 82 has a plurality of divided regions 820 and a second light-emitting element control circuit 822. Each of the divided regions 820 is arranged to overlap a plurality (for example, four) of light-detecting elements 813. The second light-emitting element control circuit 822 is a circuit that supplies a control signal Sg to each of the divided regions 820 and controls their operation.

[0041] The light source device 7 includes a light source substrate 72, a plurality of light emitting elements 71 formed on the light source substrate 72, gate line driving circuits 814C and 814D, a signal line driving circuit 815B, and a first light emitting element control circuit 74.

[0042] The plurality of light-emitting elements 71 are arranged in a matrix in an area overlapping with the detection area AA of the light source substrate 72. The light source substrate 72 is a drive circuit board that drives each of the light-emitting elements 71 by switching between on (lighted state) and off (non-lighted state). Each of the plurality of light-emitting elements 71 is arranged to overlap with a corresponding divided area 820 of the electrochromic shutter 82.

[0043] The first light emitting element control circuit 74 is a circuit that supplies control signals Sd, Se, and Sf to the gate line driving circuits 814C, 814D and the signal line driving circuit 815B, respectively, and controls their operations.

[0044] The host IC 75 has a sensor value storage circuit 751, a sensor value calculation circuit 752, a light amount setting circuit 753, and a target value storage circuit 759 as control circuits on the optical sensor 81 side. The sensor value storage circuit 751 stores the sensor value So output from the detection control circuit 816 of the optical sensor 81. The sensor value calculation circuit 752 performs a predetermined calculation process on the sensor value So of the light detection element 813.

[0045] In the light intensity setting mode, the light intensity setting circuit 753 compares the sensor values ​​So detected by the plurality of light detection elements 813 with a preset target sensor value So-t acquired from the target value storage circuit 759, and sets the light intensity for detection by the plurality of light-emitting elements 71. The target value storage circuit 759 stores the preset target sensor value So-t.

[0046] The host IC 75 has, as control circuits on the light source device 7 side, a lighting pattern generation circuit 754 and a lighting pattern storage circuit 755. The lighting pattern storage circuit 755 stores information on the light intensity of each of the plurality of light-emitting elements 71 in the light intensity setting mode.

[0047] The lighting pattern generating circuit 754 generates various control signals based on the information on the amount of light from the lighting pattern storage circuit 755 .

[0048] The host IC 75 has an image generation circuit 756 and a memory circuit 757. In the detection mode, the image generation circuit 756 generates an image of the detection target 114 based on the sensor values ​​So output from the multiple light detection elements 813. The memory circuit 757 stores the image data generated by the image generation circuit 756. The host IC 75 is connected to a host PC 758 and transfers the image data to the host PC 758.

[0049] Fig. 8 is a schematic diagram showing a projection area of ​​light emitted from a light-emitting element. Fig. 9 is a schematic diagram of a detection device according to an embodiment. Fig. 10 is a schematic diagram of a light source device according to an embodiment as viewed from above. Fig. 11 is a schematic diagram of an electrochromic shutter according to an embodiment as viewed from above. Fig. 12 is a schematic diagram of an optical sensor according to an embodiment as viewed from above.

[0050] As shown in Fig. 8, a total of 16 light-emitting elements 71 according to this embodiment are provided. That is, the following embodiment will be described assuming that n and m described in Fig. 5 are each 4. The 16 light-emitting elements 71 are arranged in a matrix (row and column) at equal intervals in the X direction (second direction) and the Y direction (third direction). Of these 16 light-emitting elements 71, the distance between adjacent light-emitting elements 71 in the X direction is distance d, and the distance between adjacent light-emitting elements 71 in the Y direction is also distance d.

[0051] 9, the light emitted from one light-emitting element 71 spreads radially upward (toward the Z1 side), and therefore, as shown in FIG. 8, the projection area IA of light projected onto the optical sensor 81 without the electrochromic shutter 82 is a circle with a radius r and centered on the light-emitting element 71. As shown in FIG. 8, adjacent projection areas IAs in the X direction or Y direction have an overlapping portion P indicated by hatching. This overlapping portion P causes the captured image of the object to be detected 114 to become blurred or faint.

[0052] As shown in Fig. 10, a total of 16 light-emitting elements 71 according to this embodiment are provided. Each of the light-emitting elements 71 is lit one by one. That is, for example, during a unit period in which one light-emitting element 71-1 is lit, the other light-emitting elements 71 other than the light-emitting element 71-1 are in a non-lit state. In other words, the multiple light-emitting elements 71 can be switched between lit and non-lit individually.

[0053] As described above, the 16 light-emitting elements 71 are arranged in a matrix (row and column) at equal intervals in the X and Y directions. Specifically, four rows are arranged along the X direction and four columns are arranged along the Y direction. Regarding the rows, for example, the first row is located closest to the Y2 side. In the first row, four light-emitting elements 71 are arranged at equal intervals from the X2 side to the X1 side. Specifically, light-emitting elements 71-1, 71-2, 71-3, and 71-4 are arranged from the X2 side to the X1 side. In the second row, four light-emitting elements 71 are arranged at equal intervals from the X2 side to the X1 side. Specifically, light-emitting elements 71-5, 71-6, 71-7, and 71-8 are arranged from the X2 side to the X1 side. In the third row, four light-emitting elements 71 are arranged at equal intervals from the X2 side to the X1 side. Specifically, light-emitting elements 71-9, 71-10, 71-11, and 71-12 are arranged from the X2 side to the X1 side. In the fourth row, four light-emitting elements 71 are arranged at equal intervals from the X2 side to the X1 side. Specifically, light-emitting elements 71-13, 71-14, 71-15, and 71-16 are arranged from the X2 side to the X1 side.

[0054] Regarding the columns, for example, the first column is located closest to the X2 side. In the first column, four light-emitting elements 71 are arranged at equal intervals from the Y2 side to the Y1 side. Similarly, in the second, third, and fourth columns, four light-emitting elements 71 are arranged at equal intervals from the Y2 side to the Y1 side.

[0055] 11, the electrochromic shutter 82 according to this embodiment is divided into a total of 16 sections in plan view from the Z direction. That is, the electrochromic shutter 82 has 16 divided regions 820 divided in the X and Y directions.

[0056] Each of the divided regions 820 is in a light-transmitting state. In other words, one divided region 820 that overlaps one lit light-emitting element 71 when viewed from the Z direction is in a light-transmitting state, and the divided regions 820 other than this one divided region 820 are in a non-light-transmitting state. In other words, the divided regions 820 in the electrochromic shutter 82 can be switched between light-transmitting and non-light-transmitting on an individual basis. During a period when one divided region 820 is in a light-transmitting state, the other divided regions 820 are in a closed state. In other words, the period when one divided region 820 is in a light-transmitting state is different from the period when the other divided regions 820 are in a light-transmitting state.

[0057] Adjacent divided regions 820 in the X direction or Y direction are arranged with no or a small gap between them. Each of the divided regions 820 has a square shape when viewed from the Z direction. When viewed from the Z direction, the divided regions 820 are arranged in a matrix (row and column) at equal intervals in the X and Y directions. The 16 divided regions 820 are arranged in a lattice pattern at equal intervals in the X and Y directions. Specifically, similar to the arrangement of the light-emitting elements, four rows are arranged along the X direction and four columns are arranged along the Y direction. Regarding the rows, for example, the first row is located closest to the Y2 side. In the first row, four divided regions 820 are arranged at equal intervals from the X2 side to the X1 side. Specifically, divided regions 82-1, 82-2, 82-3, and 82-4 are arranged from the X2 side to the X1 side. In the second row, four divided regions 820 are arranged at equal intervals from the X2 side to the X1 side. Specifically, divided regions 82-5, 82-6, 82-7, and 82-8 are arranged from the X2 side to the X1 side. In the third row, four divided regions 820 are arranged at equal intervals from the X2 side to the X1 side. Specifically, divided regions 82-9, 82-10, 82-11, and 82-12 are arranged from the X2 side to the X1 side. In the fourth row, four divided regions 820 are arranged at equal intervals from the X2 side to the X1 side. Specifically, divided regions 82-13, 82-14, 82-15, and 82-16 are arranged from the X2 side to the X1 side.

[0058] Regarding the columns, for example, the first column is located closest to the X2 side. In the first column, four divided regions 820 are arranged at equal intervals from the Y2 side to the Y1 side. Similarly, in the second, third, and fourth columns, four divided regions 820 are arranged at equal intervals from the Y2 side to the Y1 side.

[0059] In the present invention, the divided region 820 is not limited to a square in plan view, and may be, for example, an equilateral triangle in plan view, or a polygon with five or more sides.

[0060] As shown in FIG. 12 , the optical sensor 81 has multiple detection regions 810. Each detection region 810 includes one or more photodetection elements 813 (photodiodes). In this embodiment, each detection region 810 includes four photodetection elements 813, but the present invention is not limited to this and the number of photodetection elements 813 may be three or less, or five or more. The detection regions 810 are arranged to correspond to the divided regions 820 of the electrochromic shutter 82. Specifically, the outline of the detection region 810 overlaps with the outline of the divided regions 820 of the electrochromic shutter 82 in the Z direction. Therefore, when viewed from the Z direction, the four photodetection elements 813 are arranged to overlap one divided region 820 of the electrochromic shutter 82.

[0061] The detection regions 810 are arranged in a matrix (rows and columns) at equal intervals in the X and Y directions when viewed from the Z direction. The 16 detection regions 810 are arranged in a grid pattern at equal intervals in the X and Y directions. Specifically, similar to the arrangement of the divided regions 820 of the light-emitting elements 71 and the electrochromic shutter 82, four rows are arranged along the X direction and four columns are arranged along the Y direction. Regarding the rows, for example, the first row is located closest to the Y2 side. In the first row, four detection regions 810 are arranged at equal intervals from the X2 side to the X1 side, in the second row, four detection regions 810 are arranged at equal intervals from the X2 side to the X1 side, in the third row, four detection regions 810 are arranged at equal intervals from the X2 side to the X1 side, and in the fourth row, four detection regions 810 are arranged at equal intervals from the X2 side to the X1 side.

[0062] Returning to FIG. 7 , the light-emitting elements 71 overlap with the divided regions 820 of the electrochromic shutter 82 when viewed from the Z direction. The divided regions 820 of the electrochromic shutter 82 overlap with the photodetector elements 813 when viewed from the Z direction. Therefore, each of the multiple light-emitting elements 71, each of the multiple divided regions 820 of the electrochromic shutter 82, and each of the multiple detection regions 810 overlap when viewed from the Z direction. Note that in this embodiment, two or more light-emitting elements 71 may overlap with one divided region 820 of the electrochromic shutter 82. For example, the light-emitting elements 71 are configured with light-emitting diodes (LEDs).

[0063] 9, when viewed in the Z direction, the divided region 82-1 overlaps with the light-emitting element 71-1, the divided region 82-2 overlaps with the light-emitting element 71-2, the divided region 82-3 overlaps with the light-emitting element 71-3, and the divided region 82-4 overlaps with the light-emitting element 71-4. Light L1 emitted from the light-emitting element 71-1 is irradiated onto the entire divided region 82-1 and part of the divided region 82-2. Similarly, light L2 is irradiated onto the entire divided region 82-2, part of the divided region 82-1, and part of the divided region 82-3. Light L3 is irradiated onto the entire divided region 82-3, part of the divided region 82-2, and part of the divided region 82-4. Light L4 is irradiated onto the entire divided region 82-4, part of the divided region 82-3, and part of the divided region 82-1. The irradiation angle of the light emitted from the light emitting element 71 is angle θ1, and 114A is a captured image of the object to be detected.

[0064] Next, the operation timing of the electrochromic shutter 82 and the timing of lighting and non-lighting of the light-emitting elements will be compared and explained. Fig. 13 is a schematic diagram showing the operation states of two light-emitting elements and two divided areas of the electrochromic shutter adjacent in the X direction.

[0065] In Fig. 13, the diagram shown in the upper left corner shows the timing of lighting and non-lighting of the light-emitting element 71-1 (see Fig. 10) and the operating state of the divided region 82-1 (see Fig. 11) of the EC shutter 82. The light-emitting element 71-1 and the divided region 82-1 overlap in the Z direction. In Fig. 13, the diagram shown in the lower right corner shows the timing of lighting and non-lighting of the light-emitting element 71-2 (see Fig. 10) and the operating state of the divided region 82-2 (see Fig. 11) of the EC shutter 82. The light-emitting element 71-2 and the divided region 82-2 overlap in the Z direction.

[0066] The control signal Sg (see FIG. 7) that commands the opening and closing of the shutter is indicated by a solid line, and the transmittance of the shutter is indicated by a dashed line. Note that the highest transmittance of the EC shutter 82 is represented as 100%, and the lowest transmittance is represented as 0%. In this embodiment, the predetermined transmittance that provides satisfactory detection accuracy is 95% or higher, so the transmittance of 95% is represented by a two-dot chain line.

[0067] First, at time T1, the divided region 82-1 of the EC shutter 82 receives a control signal Sg (see FIG. 7 ) that opens (turns on) the shutter, as indicated by the solid line. After receiving the control signal Sg, the transmittance of the divided region 82-1 of the EC shutter 82 gradually increases. At time T2, the transmittance reaches 95%. At time T3, the transmittance saturates at approximately 100%. In this embodiment, a transmittance of 95% or higher is considered to be the light-transmitting state (open state) of the EC shutter 82, and a non-light-transmitting state (closed state) is considered to be a state in which the transmittance is less than 5%, for example. Therefore, at time T2, the divided region 82-1 of the EC shutter 82 enters the light-transmitting state (open state). The time from time T1 to time T2 is determined in advance, for example, by experiment. Therefore, it is determined that the transmittance of the EC shutter 82 has reached 95% at the time (time T2 - time T1) elapses from time T1.

[0068] At time T3, light-emitting element 71-1 changes from a non-lighting state (extinct state) to a lighting state. The lighting state of light-emitting element 71-1 continues from time T3 to time T4. At time T4, light-emitting element 71-1 changes to a non-lighting state.

[0069] At time T5 after time T4, when a control signal Sg to close (turn off) the shutter is received, the transmittance of the divided region 82-1 of the EC shutter 82 gradually decreases from time T5, reaches 95% at time T6, and saturates at around 0% at time T7. Since the transmittance reaches 95% at time T6, the divided region 82-1 of the EC shutter 82 is closed at time T6.

[0070] After time T7, the light-emitting element 71-2 is turned on and off, and the divided region 82-2 of the EC shutter 82 is opened. The changes in the light-emitting state and the unlit state of the light-emitting element 71-2 are the same as those of the light-emitting element 71-1, and the open / closed state of the divided region 82-2 of the EC shutter 82 is the same as that of the divided region 82-1.

[0071] Specifically, first, as shown by the solid line, the divided region 82-2 of the EC shutter 82 receives a control signal Sg that opens (turns ON) the shutter at time T8. After receiving the control signal Sg, the transmittance of the divided region 82-2 of the EC shutter 82 gradually increases, reaches 95% at time T9, and saturates at around 100% at time T10.

[0072] At time T10, the light-emitting element 71-2 changes from a non-lighted state (extinct state) to a lighted state. The light-emitting element 71-2 remains in the lit state from time T10 to time T11. At time T11, the light-emitting element 71-2 changes to the non-lighted state.

[0073] At time T12 after time T11, when a control signal Sg to close (turn off) the shutter is received, the transmittance of divided area 82-2 gradually decreases from time T12, reaches 95% at time T13, and saturates at around 0% at time T14.

[0074] After this, the light emitting element 71-3 and the light emitting element 71-4 are successively turned on in the same manner, and the divided region 82-3 and the divided region 82-4 are similarly turned to the open state.

[0075] Next, an example of the detection operation of the detection device will be described with reference to a flowchart of FIG.

[0076] First, in step S101, the lighting pattern generation circuit 754 (see FIG. 7) turns off all light-emitting elements 71 and turns off (closes) all divided regions 820 of the electrochromic shutter 82. As a result, all 16 light-emitting elements 71 shown in FIG. 10 are turned off, and all 16 divided regions 820 shown in FIG. 11 are turned off.

[0077] Next, the host IC 75 (see FIG. 7) sets the number n of the light emitting element 71 to n=1 (step S102).

[0078] Then, the lighting pattern generation circuit 754 turns ON the control signal for the divided region 820 of the electrochromic shutter 82 corresponding to the number n (step S103). As a result, for example, as described with reference to FIG. 13, the divided region 82-1 of the EC shutter 82 receives the control signal Sg that opens (turns ON) the shutter at time T1.

[0079] Next, after the transmittance of the divided region 820 of the electrochromic shutter 82 in ST103 reaches 95% or more, the lighting pattern generation circuit 754 lights up the light-emitting element 71 corresponding to the number n (step S104). As a result, for example, as described with reference to FIG. 13, at time T3, the light-emitting element 71-1 changes from the non-lighting state (light-off state) to the lighting state.

[0080] Then, the image generation circuit 756 (see FIG. 7) generates divided image data corresponding to the number n and stores it in the storage circuit 757 (step S105). As a result, divided image data corresponding to the divided area 82-1 shown in FIG. 11 is generated and stored.

[0081] Next, the lighting pattern generation circuit 754 turns off the light-emitting element 71 corresponding to the number n (step S106). As a result, for example, as described with reference to FIG. 13, at time T4, the light-emitting element 71-1 changes from the lighting state to the non-lighting state.

[0082] After the light-emitting element 71 is turned off in S106, the lighting pattern generation circuit 754 turns OFF the control signal for the divided region 820 of the electrochromic shutter 82 corresponding to the number n (step S107). As a result, for example, as described with reference to FIG. 13, when a control signal Sg for closing (turning OFF) the shutter is received at time T5 after time T4, the transmittance of the divided region 82-1 of the EC shutter 82 gradually decreases from time T5.

[0083] The host IC 75 determines whether the number n is the final value (step S108), and if it determines that the number n is not the final value, the host IC updates the number n of the light-emitting element to n=n+1 (step S109). For example, it updates n=1 to n=2, and returns to step S103.

[0084] Then, the processes from step S103 to step S107 are performed, and it is determined again whether or not the number n is the final value (step S108), and the processes are repeated until the number n becomes the final value.

[0085] Here, the order in which the light-emitting elements 71 light up, the order in which the divided regions 820 of the electrochromic shutter 82 become light-transmitting, and the order in which the photodetector elements 813 included in the detection region 810 of the optical sensor 81 detect will be described in detail with reference to Figures 15, 16, and 17. Figure 15 is a schematic diagram showing the order in which the light-emitting elements light up. Figure 16 is a schematic diagram showing the order in which the divided regions of the electrochromic shutter open. Figure 17 is a schematic diagram showing the order in which the photodetector elements of the detection device perform detection.

[0086] As shown in Fig. 15, the light-emitting elements 71 in the first row are turned on one by one facing the X1 side, and as shown in Fig. 16, the divided regions 820 in the first row of the electrochromic shutter 82 are turned to a light-transmitting state one by one facing the X1 side, and as shown in Fig. 17, the photodetector 813 detects the detection regions 810 in the first row one by one in sequence. Note that, as mentioned above, when a divided region 820 of the electrochromic shutter 82 is in a "light-transmitting state" or "open state," it means that the light transmittance is 95% or more.

[0087] For example, when light-emitting element 71-1 shown in FIG. 15 is lit as indicated by dotted hatching, divided region 82-1 of electrochromic shutter 82 shown in FIG. 16 becomes light-transmitting, and detection is performed by four photodetection elements 813 included in detection region 810 in the first row and first column shown in FIG. 17. Next, light-emitting element 71-2, which is one position shifted toward the X1 side, turns on, divided region 82-2 becomes light-transmitting, and detection is performed by one detection region 810 overlapping divided region 82-2. Subsequently, this lighting and detection is performed one by one in the first row, and then moves to the second row. Specifically, light-emitting element 71-5 in the second row and first column turns on, divided region 82-5 becomes light-transmitting, and detection is performed by one detection region 810 overlapping divided region 82-5. Detection continues thereafter by detection areas 810 shifted one by one toward the X1 side, and when the second row is completed, similar detection is repeated from the third row to the fourth row, and the detection by the detection area 810 located in the fourth row and fourth column is the final detection.

[0088] 14, when the host IC 75 determines that the number n is the final value (step S108), the image generation circuit 756 generates composite image data by combining all the divided image data (step S110). As a result, composite image data is generated for all the areas shown in FIG. 17. Then, the image generation circuit 756 transfers the composite image data to the host PC 758 (step S111).

[0089] As described above, the detection device 100 includes the light source device 7, the light-transmitting detection target installation portion 110, the electrochromic shutter 82 having the plurality of divided regions 820, and the optical sensor 81 including the plurality of detection regions 810. Each detection region 810 includes one or more photodetection elements 813. Each of the plurality of divided regions 820 in the electrochromic shutter 82 can be switched between light-transmitting and non-light-transmitting, and each of the plurality of light-emitting elements 71 can be switched between lit and unlit. Each of the plurality of light-emitting elements 71, each of the plurality of divided regions 820 in the electrochromic shutter 82, and each of the plurality of detection regions 810 overlap when viewed in the Z direction.

[0090] As mentioned above, when multiple light-emitting elements 71 are arranged, light from different directions may be irradiated onto a single object to be detected 114 from the multiple light-emitting elements 71, which may result in blurring of the image captured by the optical sensor 81.

[0091] In contrast to this, in this embodiment, each of the multiple light-emitting elements 71, each of the multiple divided regions 820 of the electrochromic shutter 82, and each of the multiple detection regions 810 of the optical sensor 81 overlap when viewed in the Z direction. Therefore, by turning on one light-emitting element 71 and putting the divided region 820 that is arranged overlapping with that one light-emitting element 71 into a light-transmitting state, multiple light beams are prevented from entering the detection region 810 that is arranged overlapping with the divided region 820 in the light-transmitting state. This makes it possible to reduce blurring of the image captured by the optical sensor 81.

[0092] The divided regions 820 that overlap in the Z direction with the light-emitting element 71 in the lit state are in a light-transmitting state, and the divided regions 820 that overlap in the Z direction with the light-emitting element 71 in the unlit state are in a light-non-transmitting state.

[0093] According to this, one light-emitting element 71 is turned on, and only the divided region 820 that is arranged overlapping with the one light-emitting element 71 is set to a light-transmitting state, and the divided regions 820 other than the one divided region 820 are set to a non-light-transmitting state. Therefore, the light L that passes through the divided region 820 in the light-transmitting state is limited to the light L emitted from the one light-emitting element 71. This makes it possible to further reduce blurring of the image captured by the optical sensor 81.

[0094] The light-emitting elements 71, divided regions 820, and detection regions 810 are arranged in a matrix along the X direction (second direction) that intersects the Z direction (first direction), and the Y direction (third direction) that intersects the Z direction and the X direction. When N is a natural number, the light-emitting elements 71 and divided regions 820 arranged in N rows are turned on and translucent in order from the end (one end) on the X2 side in the X direction to the end (the other end) on the X1 side, and after the light-emitting elements 71 and divided regions 820 in the N+1 row are turned on and translucent.

[0095] In this way, since each of the divided areas 820 and the detection areas 810 is lit and light-transmitting, light L can be detected in each of the detection areas 810 in turn, and by combining the images detected in all of the detection areas 810, an image with higher detection accuracy can be obtained.

[0096] The plurality of light-emitting elements 71 include, for example, a light-emitting element 71-1 (first light-emitting element) and a light-emitting element 71-2 (second light-emitting element) adjacent to the light-emitting element 71-1 on the X1 side. The plurality of divided regions 820 include, for example, a divided region 82-1 (first divided region) overlapping the light-emitting element 71-1 (first light-emitting element) when viewed from the Z direction, and a divided region 82-2 (second divided region) overlapping the light-emitting element 71-2 (second light-emitting element) when viewed from the Z direction. Before the light-emitting element 71-2 is turned on and the divided region 82-2 is turned on and the light-transmitting state, the light-emitting element 71-1 is turned off and the divided region 82-1 is turned on and the light-transmitting state.

[0097] 13, the time during which the light-emitting element 71-2 is in the lit state and the divided region 82-2 is in the light-transmitting state is between time T10 and time T11. Therefore, the light-emitting element 71-1 is in the non-lit state and the divided region 82-1 is in the non-light-transmitting state before time T10. In other words, after the divided region 82-1 is in the non-light-transmitting state, the light-emitting element 71-2 is in the lit state and the divided region 82-2 is in the light-transmitting state. Therefore, the light L from the light-emitting element 71-2 can be detected by only one detection region 810 that overlaps with the divided region 82-2 in the Z direction, and an image with higher detection accuracy can be obtained.

[0098] Before the light emitting element 71-1 (first light emitting element) starts to light up, the transmittance of the divided region 82-1 (first divided region) starts to increase.

[0099] Specifically, referring to FIG. 13, the time when the light-emitting element 71-1 (first light-emitting element) starts to light up is time T3. The time when the transmittance of the divided region 82-1 (first divided region) starts to increase is time T1. In other words, time T1 occurs before time T3. Here, the response speed of the electrochromic shutter 82 is slower than, for example, a liquid crystal shutter. Therefore, by setting the time (timing) when the transmittance of the divided region starts to increase earlier, multiple light beams are prevented from entering one detection region 810. This makes it possible to further reduce blurring of the image captured by the optical sensor 81.

[0100] When the transmittance of the divided region 82-1 (first divided region) is equal to or greater than a predetermined value relative to the maximum transmittance, the light emitting element 71-1 (first light emitting element) is turned on. The predetermined value is, for example, 95%.

[0101] 13, the time during which the transmittance of divided region 82-1 (first divided region) is equal to or greater than 95% of the predetermined value is from time T2 to time T6. During the range from time T2 to time T6, light-emitting element 71-1 is in the lit state. That is, when light-emitting element 71-1 is in the lit state, divided region 82-1 is always in the light-transmitting state. This prevents multiple light beams from entering one detection region 810, thereby further reducing blurring of the image captured by optical sensor 81.

[0102] After the light emitting element 71-1 (first light emitting element) is turned off, the transmittance of the divided region 82-1 (first divided region) starts to decrease.

[0103] 13, the time when light-emitting element 71-1 (first light-emitting element) enters the non-illuminated state is time T4. The time when the transmittance of divided region 82-1 (first divided region) starts to decrease is time T5. Time T5 occurs after time T4. In other words, when light-emitting element 71-1 is in the non-illuminated state, divided region 82-1 is always in the non-transmitting state. This prevents multiple light beams from entering one detection region 810, thereby further reducing blurring of the image captured by optical sensor 81. [Explanation of symbols]

[0104] 7 Light source device 71 Light-emitting element 81 Optical Sensor 810 detection area 813 Photodetector (photodiode) 82 Electrochromic Shutter 820 Split area 100 Detection device 110 Detectable object installation section 114 Object to be detected L light

Claims

1. a light source device including a plurality of light emitting elements arranged in a plane; a light-transmitting detection target installation portion that is disposed on one side of the light source device in a first direction and that has a detection target installed thereon; an electrochromic shutter disposed on one side of the detection object installation portion in the first direction so as to overlap the detection object installation portion, and having a plurality of divided regions disposed in a planar shape; an optical sensor that is arranged to overlap the electrochromic shutter on one side in the first direction and includes a plurality of detection areas arranged in a plane; One of the detection regions includes one or more light detection elements, the plurality of divided regions of the electrochromic shutter are switchable between light transmitting and non-light transmitting for each divided region, and the plurality of light emitting elements are switchable between lit and non-lit, each of the plurality of light-emitting elements, each of the plurality of divided regions of the electrochromic shutter, and each of the plurality of detection regions overlap when viewed from the first direction; Detection device.

2. Among the plurality of divided regions, a divided region that overlaps with the light-emitting element in a lit state when viewed from the first direction is in a light-transmitting state, and a divided region that overlaps with the light-emitting element in a non-lit state when viewed from the first direction is in a light-nontransmitting state. The detection device according to claim 1 .

3. the plurality of light-emitting elements, the plurality of divided regions, and the plurality of detection regions are arranged in a matrix along a second direction intersecting the first direction and a third direction intersecting the first direction and the second direction, If N is a natural number, then Each of the plurality of light-emitting elements and the plurality of divided regions arranged in N rows is turned on and translucent in order from one end to the other end in the second direction, and after the lighting and translucent states of the N rows are finished, each of the plurality of light-emitting elements and the plurality of divided regions arranged in N+1 rows is turned on and translucent. The detection device according to claim 2 .

4. the plurality of light-emitting elements include a first light-emitting element and a second light-emitting element adjacent to the first light-emitting element on the other end side in the second direction, the plurality of divided regions include a first divided region overlapping the first light-emitting element when viewed from the first direction and a second divided region overlapping the second light-emitting element when viewed from the first direction; the first light-emitting element is turned off and the first divided region is turned off before the second light-emitting element is turned on and the second divided region is turned off, and The detection device according to claim 3 .

5. The transmittance of the first divided region starts to increase before the first light-emitting element starts to light up. The detection device according to claim 4.

6. When the transmittance of the first divided region is equal to or greater than a predetermined value relative to a maximum transmittance, the first light-emitting element is turned on. The detection device according to claim 4.

7. After the first light-emitting element is turned off, the transmittance of the first divided region starts to decrease. The detection device according to claim 4.

8. The predetermined value is 95%. The detection device according to claim 6.

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