Substrate processing apparatus and manufacturing method for the same

Abstract

To suppress the generation of particles at the time of processing a substrate without requiring a large number of man-hours.SOLUTION: A substrate processing apparatus includes: a processing chamber having an inner surface defining a processing space in which a substrate is processed; a plurality of fastening members each having a screw part fastened to the inner surface and a head part having a diameter larger than that of the screw part; an inner wall plate that covers the inner surface, in which the head part of each fastening member is inserted, a form when viewing an insertion direction of them has a long form that is long to one direction, that has a bottom part and a concave part having an upright wall part that is stood from the bottom part; and an elastic member disposed to be interposed between the head part and the upright wall part in a state in which the head part is inserted into the concave part. The elastic member is compressed between the head part and the upright wall part to fix the inner wall plate to the inner surface.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present disclosure relates to a substrate processing apparatus and a method for manufacturing a substrate processing apparatus. [Background technology]

[0002] A known example of a conventional plasma etching processing apparatus includes a mounting table on which a substrate to be processed is placed, a processing vessel that houses the mounting table and processes the substrate on the mounting table, and a gas supply unit that supplies processing gas into the processing vessel (see, for example, Patent Document 1). The gas supply unit of the apparatus described in Patent Document 1 includes a shower plate formed by stacking a base plate and a top plate and having many gas ejection holes formed therein, a plurality of screw members that press and fix the base plate and the top plate together, and covers that are attached to the heads of the screw members to protect the heads. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Laid-Open No. 2011-165718 Summary of the Invention [Problem to be solved by the invention]

[0004] The technology according to the present disclosure suppresses the generation of particles when processing a substrate without requiring a large number of steps. [Means for solving the problem]

[0005] One aspect of the technology disclosed herein comprises a processing chamber having an inner surface that defines a processing space in which a substrate is processed; a plurality of fastening members each having a threaded portion fastened to the inner surface and a head having a larger diameter than the threaded portion; an inner wall plate covering the inner surface, having a recess into which the heads of the fastening members are inserted, and having a shape that is elongated in one direction when viewed from the direction of insertion, the recess having a bottom and a standing wall portion standing up from the bottom; and an elastic member interposed between the heads and the standing wall portion when the heads are inserted into the recess, wherein the elastic member is compressed between the heads and the standing wall portion to fix the inner wall plate to the inner surface. [Effects of the Invention]

[0006] According to the present disclosure, generation of particles during substrate processing can be suppressed without requiring a large number of steps. [Brief explanation of the drawings]

[0007] [Figure 1] 1 is a vertical partial cross-sectional view showing an example of a configuration of a substrate processing apparatus. [Figure 2] FIG. 2 is an enlarged cross-sectional view showing an example of an area [A] surrounded by a square indicated by a double-chain line in FIG. [Figure 3] 3 is a cross-sectional view showing an example of a cross section taken along line BB in FIG. 2. FIG. [Figure 4] 2 is a perspective view showing an example of the front side of an inner wall plate included in the substrate processing apparatus shown in FIG. 1. FIG. [Figure 5] 2 is a perspective view showing an example of the rear side of an inner wall plate included in the substrate processing apparatus shown in FIG. 1. FIG. [Figure 6] 1. FIG. 4 is a perspective view showing an example of a manufacturing process (fastening step) of the substrate processing apparatus shown in FIG. [Figure 7] 1. FIG. 4 is a perspective view showing an example of a manufacturing process (attachment step) of the substrate processing apparatus shown in FIG. [Figure 8] 2 is a plan view showing an example of an inner wall plate included in the substrate processing apparatus shown in FIG. 1, as viewed from the front side. FIG. [Figure 9]2 is a plan view showing an example of an inner wall plate included in the substrate processing apparatus shown in FIG. 1, as viewed from the front side. FIG. [Figure 10] FIG. 10 is a cross-sectional view showing an example of a cross section taken along line DD in FIG. 9(b). [Figure 11] 10 shows a modified example of the configuration of an elastic member included in the substrate processing apparatus shown in FIG. DETAILED DESCRIPTION OF THE INVENTION

[0008] As described above, in conventional plasma etching processing apparatuses, the heads of the multiple screws that secure the base plate and top plate in the gas supply unit are covered with a cover. The inner wall plate that covers the inside surface of the processing vessel is also secured to the processing vessel with multiple screws, and the heads of each screw are covered with a cover. These covers protrude from the top plate or inner wall plate when attached to the heads of the screws. Such a protruding cover, for example, obstructs a portion of the exhaust flow inside the processing vessel, causing the exhaust to stagnate around the cover, making it easier for deposits, primarily from by-products contained in the exhaust, to adhere to the cover. Furthermore, if the deposits adhered to the cover break down into small pieces and peel off, they may adhere to the substrate as particles.

[0009] Furthermore, in the conventional plasma etching processing apparatus described above, when removing the top plate or the inner wall plate, it is necessary to first remove the covers covering the heads of the screws, and then remove the screws using a tool. Furthermore, when attaching the top plate or the inner wall plate, it is necessary to attach the screws using a tool and then cover the heads of the screws with a cover. Therefore, a great deal of labor is required during the manufacturing and maintenance of the plasma etching processing apparatus. Furthermore, the greater the number of screws used to fasten the top plate or the inner wall plate, the greater the labor required during manufacturing and maintenance, and the greater the number of parts, which may lead to increased costs.

[0010] In contrast, the technology according to the present disclosure suppresses the generation of particles during substrate processing without requiring a large number of steps.

[0011] Hereinafter, an embodiment of the technology according to the present disclosure will be described with reference to the drawings. However, the configurations described in the following embodiments are merely examples and are not intended to be limiting. For example, each component included in this configuration can be replaced with any component that can perform the same function. Furthermore, any component may be added.

[0012] FIG. 1 is a vertical partial cross-sectional view showing an example of the configuration of a substrate processing apparatus. FIG. 2 is an enlarged cross-sectional view showing an example of an area [A] surrounded by a square indicated by a double-chain line in FIG. 1. FIG. 3 is a cross-sectional view showing an example of a cross section when cut along line BB in FIG. 2. FIG. 4 is a perspective view showing an example of the front side of an inner wall plate included in the substrate processing apparatus shown in FIG. 1. FIG. 5 is a perspective view showing an example of the back side of an inner wall plate included in the substrate processing apparatus shown in FIG. 1. FIG. 6 is a perspective view showing an example of a manufacturing process (fastening step) of the substrate processing apparatus shown in FIG. 1. FIG. 7 is a perspective view showing an example of a manufacturing process (mounting step) of the substrate processing apparatus shown in FIG. 1. FIG. 8 is a plan view showing an example of an inner wall plate included in the substrate processing apparatus shown in FIG. 1 as viewed from the front side. FIG. 9 is a plan view showing an example of an inner wall plate included in the substrate processing apparatus shown in FIG. 1 as viewed from the front side. FIG. 10 is a cross-sectional view showing an example of a cross section when cut along line DD in FIG. 9(b). 1 to 10, for convenience of explanation, the two mutually orthogonal horizontal directions are referred to as the "X direction" and the "Y direction," and the vertical direction, i.e., the direction orthogonal to the X direction and the Y direction, is referred to as the "Z direction." Furthermore, the direction in which the arrows point is referred to as the "positive side," and the opposite side is referred to as the "negative side."

[0013] The substrate processing apparatus 1 shown in FIG. 1 is an apparatus for processing a rectangular, flat-plate-shaped object to be processed in the manufacturing process of an FPD (flat panel display). In this embodiment, the substrate processing apparatus 1 is a plasma etching apparatus that performs etching on a pattern formed on a substrate G, which is the object to be processed, such as a rectangular glass substrate for an FPD. The FPD is not particularly limited, and examples thereof include an organic electroluminescence (EL) display, a liquid crystal display (LCD), and a plasma display panel (PDP). The substrate processing apparatus 1 includes a processing chamber 2, a substrate mounting table 30, and a shower head 40.

[0014] The processing chamber 2 is made of aluminum. The processing chamber 2 has a rectangular cylindrical shape, and the inside thereof forms a processing space 20 in which the substrate G is processed. Each inner surface 21 that defines the processing space 20 is subjected to an alumite treatment (anodization treatment). In addition, a side wall of the processing chamber 2 is provided with a loading / unloading port 22 for loading / unloading the substrate G into / out of the processing chamber 2, and a gate valve 23 for opening / closing the loading / unloading port 22. In the substrate processing apparatus 1, the substrate G that is etched into a formed pattern is not limited to a glass substrate, and may be, for example, a disk-shaped semiconductor wafer. In this case, the processing chamber 2 is cylindrical.

[0015] A substrate mounting table 30 is disposed within the processing chamber 2. The substrate mounting table 30 has a mounting surface 301 on which a substrate G is mounted. The substrate G is processed while mounted on the mounting surface 301. The mounting surface 301 has a rectangular shape slightly smaller than the substrate G and is configured as a horizontal plane. A shower head 40 is disposed on the ceiling of the processing chamber 2, facing the substrate mounting table 30. The shower head 40 has multiple supply ports (not shown) for supplying processing gas into the processing chamber 2. In the substrate processing apparatus 1, the shower head 40 functions as an upper electrode and the substrate mounting table 30 functions as a lower electrode, thereby generating a high-frequency electric field between the shower head 40 and the substrate mounting table 30. This electric field excites the processing gas discharged into the processing chamber 2, generating plasma. The substrate G is then subjected to an etching process using this plasma.

[0016] 1, the substrate processing apparatus 1 includes inner wall plates 3 that cover each inner surface 21. The inner wall plates 3 can protect the anodized aluminum coating on the inner surface 21. The size of each inner wall plate 3 varies depending on the position of the inner surface 21 that the inner wall plate 3 covers, but here, the inner wall plates 3 that are arranged parallel to the XZ plane and the fastening members 4 that secure the inner wall plates 3 will be described as representative examples. Note that the front surface 39 of the inner wall plate 3 may be anodized.

[0017] As shown in FIG. 2, the inner wall plate 3 is fixed by fastening members 4 fastened to the inner surface 21. The shape of the inner wall plate 3 in a plan view and the shape of the inner wall plate 3 when viewed from the Y direction are rectangular with the longer sides in the X direction (see FIGS. 4 and 5), but are not limited to this. As shown in FIG. 4, in this embodiment, the inner wall plate 3 has, for example, a total length L (long side) of 1000 to 2000 mm, a width W (short side) of 200 to 500 mm, and a thickness t of 2 to 8 mm, but are not limited to these. The inner wall plate 3 is made of a conductive material, and the constituent material is not particularly limited, and for example, any of aluminum and stainless steel metal materials can be used.

[0018] The total number of fastening members 4 for fixing one inner wall panel 3 depends on the size of the inner wall panel 3, but is preferably more than one, and more preferably, for example, three to eight. The fastening member 4 is a bolt having a threaded portion 41 and a head portion 42 with a larger diameter than the threaded portion 41. A male thread 411 is formed on the outer peripheral surface of the threaded portion 41. A screw hole 24 is formed in advance in the inner surface 21. A female thread 241 is formed on the inner peripheral surface of the screw hole 24, which threadably engages with the male thread 411 of the fastening member 4. This threaded engagement fastens the fastening member 4. The male thread 411 and the female thread 241 thread together until the back surface 421 of the head portion 42 abuts against the inner surface 21. At this limit of engagement, the head portion 42 protrudes beyond the inner surface 21. The nominal diameter of the male screw 411 is preferably M6 or more, for example, although it depends on the size of the inner wall plate 3 and the total number of fastening members 4. This allows the fastening members 4 to be fastened to an extent that they can sufficiently fix the inner wall plate 3.

[0019] The front surface 422 of the head 42 is provided with a recess 423 into which a tool (not shown) such as a hex wrench can be inserted. When fastening or releasing the fastening member 4, the work can be performed quickly by inserting the hex wrench into the recess 423. A head groove 424 is formed in the outer peripheral surface of the head 42 along the circumferential direction. An elastic member 5, which will be described later, engages with the head groove 424. The fastening member 4 is made of any metal material selected from aluminum, titanium, and stainless steel. This allows the inner wall plate 3 to be firmly supported.

[0020] As shown in FIG. 2, the inner wall panel 3 has recesses 32 formed on its back surface 31. The number of recesses 32 provided corresponds to the total number of fastening members 4 used to secure the inner wall panel 3 (see FIG. 5). A head 42 of a fastening member 4 is inserted into each recess 32. When viewed from the insertion direction (Y direction) of the head 42 of the fastening member 4, each recess 32 has a longitudinal shape that is long in one direction (e.g., X direction in FIG. 3). The total length of this longitudinal shape is preferably 1.2 to 2.5 times, and more preferably 1.5 to 2 times, the diameter of the head 42. Each recess 32 has a bottom 321 facing the negative side of the Y direction and an upright wall 322 that stands upright from the bottom 321 toward the negative side of the Y direction.

[0021] The vertical wall portion 322 has a vertical wall groove 33 formed along its circumferential direction. An elastic member 5 is disposed in the vertical wall groove 33. As shown in FIG. 3, the elastic member 5 is ring-shaped along the vertical wall groove 33. Furthermore, when the inner wall plate 3 is cut along its thickness direction, i.e., along the Y direction, the vertical wall groove 33 has a rectangular or square cross-sectional shape. This allows the elastic member 5 to be stably disposed in the vertical wall groove 33. The vertical wall groove 33 may have corners of its rectangular or square cross-sectional shape that are C-chamfered to form an inclined surface or R-chamfered to form an arc-shaped surface. Preferably, the elastic member 5 is disposed in the vertical wall groove 33 before the head 42 of the fastening member 4 is inserted into the recess 32 (see FIG. 7(a)). Hereinafter, this arrangement of the elastic member 5 will be referred to as the "pre-insertion arrangement." In the pre-insertion arrangement configuration, the depth of the upright wall groove 33 is preferably deeper than the depth of the head groove 424 of the fastening member 4. This pre-insertion arrangement configuration improves the ease of inserting the head 42 into the recess 32, compared to, for example, a configuration in which the elastic member 5 is pre-placed in the head groove 424 of the fastening member 4 before the head 42 is inserted into the recess 32. The upright wall 322 has a tapered portion 34 formed on the side opposite the bottom 321 across the upright wall groove 33, i.e., on the edge of the opening of the recess 32, where the diameter of the inner side of the recess 32 increases toward the negative side in the Y direction. The tapered portion 34, combined with the pre-insertion arrangement configuration, further improves the ease of inserting the head 42 of the fastening member 4 into the recess 32.

[0022] As described above, the inner wall plate 3 is provided with a plurality of recesses 32, and each recess 32 has a longitudinal shape that is long in one direction when viewed from the Y direction. The inner wall plate 3 thermally expands when a substrate G is processed in the processing space 20. Each recess 32 is formed so that the longitudinal direction of its oval shape coincides with the direction of thermal expansion of the inner wall plate 3. The orientation of each recess 32 will be described below. As shown in FIG. 8(a), two inner wall plates 3 are arranged in the X direction and fixed to the inner surface 21 facing the Y direction positive side of the processing chamber 2. The long side direction of each inner wall plate 3 is parallel to the X direction. Hereinafter, of the two inner wall plates 3, the inner wall plate 3 on the X direction positive side, i.e., the left inner wall plate in FIG. 8, will be referred to as the "inner wall plate 3L," and the inner wall plate 3 on the X direction negative side, i.e., the right inner wall plate in FIG. 8, will be referred to as the "inner wall plate 3R" (the same applies to FIG. 9). In addition, in FIG. 8, a recess 32 is provided on the rear side surface 31 of the portion surrounded by the ellipse indicated by the double chain line (the same applies to FIG. 9).

[0023] The inner wall plate 3L and the inner wall plate 3R each have a right end 35 and a left end 36. In the substrate processing apparatus 1, the right end 35 of the inner wall plate 3L and the left end 36 of the inner wall plate 3R abut against each other. Furthermore, the lower ends 37 of the inner wall plates 3L and 3R each abut against a cover 50 (see FIG. 1) disposed around the substrate mounting table 30. In this abutting state, the inner wall plate 3L tends to expand in the direction of an arrow α1 pointing toward the upper left in FIG. 8(a), and the inner wall plate 3R tends to expand in the direction of an arrow β1 pointing toward the upper right in FIG. 8(a).

[0024] The recesses 32 of the inner wall plate 3L include two first recesses 32A located on the right end 35 side (one side) and three second recesses 32B located away from the right end 35 side of the inner wall plate 3L. Meanwhile, the recesses 32 of the inner wall plate 3R include two first recesses 32A located on the left end 36 side (one side) and two second recesses 32B located away from the left end 36 side of the inner wall plate 3R. In both the inner wall plates 3L and 3R, the first recesses 32A are spaced apart in the Z direction, and the second recesses 32B are spaced apart in the X direction on the lower end 37 side. In consideration of expansion in the arrow directions α1 and β1, the longitudinal direction of each first recess 32A in its oval shape coincides with the short side direction of the inner wall plate 3 (see C1 in the legend in FIG. 8). Each second recess 32B is formed so that the longitudinal direction of its oval shape coincides with the long side direction of the inner wall plate 3 (see C2 in the legend in FIG. 8). The first recess 32A and the second recess 32B formed in this manner can follow the deformation caused by thermal expansion of the inner wall plate 3. This makes it possible to maintain the fixed state of the inner wall plate 3 by the elastic members 5 arranged in the first recess 32A and the second recess 32B, respectively.

[0025] As shown in FIG. 2 , the substrate processing apparatus 1 includes an elastic member 5. When the heads 42 of the fastening members 4 are inserted into the recesses 32 of the inner wall plate 3, the elastic member 5 is disposed between the heads 42 and the standing wall portions 322 of the recesses 32. The elastic member 5 is compressed in the Z direction between the heads 42 and the standing wall portions 322 (standing wall grooves 33) and engages with the head grooves 424 of the heads 42. This fixes the inner wall plate 3 to the inner surface 21 via the elastic member 5 and the fastening members 4. In this fixed state, the inner wall plate 3 can cover the inner surface 21 and also the heads 42 of the fastening members 4 protruding from the inner surface 21. The elastic member 5 is compressed between the heads 42 and the standing wall portions 322. The degree of compression is preferably, for example, 0.2 mm to 1 mm, more preferably 0.2 mm to 0.4 mm.

[0026] As described above, conventionally, when installing an inner wall plate, it was necessary to secure the inner wall plate with multiple screws and then cover the heads of each screw with a cover. Each cover protrudes from the inner wall plate when attached to the head of the screw. This protruding state, for example, obstructs a portion of the exhaust gas flow inside the processing space, causing the exhaust gas to stagnate around the cover. This makes it easier for deposits, primarily caused by by-products contained in the exhaust gas, to adhere to the cover. If this deposit breaks down and peels off, it may adhere to the substrate as particles. In contrast, the fixed inner wall plate 3 can cover the heads 42 of each fastening member 4. This prevents obstruction of the exhaust gas flow within the processing space 20, as in the conventional method, and therefore prevents the deposition of deposits, primarily caused by by-products contained in the exhaust gas. As a result, particle generation can be suppressed.

[0027] As shown in FIG. 3, the elastic member 5 is formed of a spiral body in which a strip-shaped wire is wound in a spiral shape. As a result, when the elastic member 5 is cut along the Y direction, the cross-sectional shape of the elastic member 5 is circular (see FIG. 2). As described above, the elastic member 5 engages with the head groove 424 of the head 42 of the fastening member 4. When the fastening member 4 is cut along its central axis, i.e., along the Y direction, the cross-sectional shape of the head groove 424 is arc-shaped (see FIG. 2). This ensures that the contact area between the elastic member 5 and the head groove 424 is as large as possible, thereby increasing the engagement force between the elastic member 5 and the head groove 424.

[0028] The elastic member 5 is made of an elastic and conductive material, and the constituent material is not particularly limited, but stainless steel, for example, can be used. The inner wall plate 3 and the fastening members 4 are also conductive. As a result, the inner wall plate 3 is electrically connected to the processing chamber 2 via the elastic member 5 and the fastening members 4, and therefore, charging of the inner wall plate 3 can be prevented.

[0029] Next, a description will be given of a method for manufacturing the substrate processing apparatus 1. The method for manufacturing the substrate processing apparatus includes a fastening step and an attachment step.

[0030] [Fascinating process] 6, in the fastening step, the fastening members 4 are fastened to the respective screw holes 24 formed in the inner surface 21 of the processing chamber 2. As described above, this fastening operation is performed by operating the tool inserted into the recess 423 of the head 42 of the fastening member 4.

[0031] [Installation process] As shown in FIG. 7(a), in the mounting process, first, the inner wall plate 3 is prepared. The elastic members 5 are already placed in the recesses 32 of the inner wall plate 3. The inner wall plate 3 is then positioned parallel to the inner surface 21 of the processing chamber 2 to which the fastening members 4 are fastened. At this time, it is preferable to place the inner wall plate 3 on a cover 50 arranged around the substrate mounting table 30 (see FIG. 1). This positions the inner wall plate 3 in the Z direction. This also reduces the overall load of the inner wall plate 3 on the worker performing the mounting process. The heads 42 of the fastening members 4 are positioned opposite the recesses 32 of the inner wall plate 3 into which the heads 42 are to be inserted. In this manner, the recesses 32 function as positioning portions that determine the position of the inner wall plate 3 relative to the inner surface 21 in the mounting process. Then, while maintaining this opposing position, the inner wall plate 3 is pushed toward the inner surface 21, i.e., toward the negative side in the Y direction. 7(b), the head 42 of the fastening member 4 is inserted into the recess 32, and the elastic member 5 is compressed between the head 42 and the vertical wall portion 322 of the recess 32, and engages with the head groove 424 of the head 42. As a result, the inner wall plate 3 is attached to the inner surface 21, i.e., fixed to the inner surface 21, and the inner wall plate 3 covers the inner surface 21 together with the head 42.

[0032] As mentioned above, in the past, when installing an inner wall plate, it was necessary to fasten the inner wall plate with multiple screws using a tool such as a hex wrench, and then cover the head of each screw with a cover one by one. This required a great deal of man-hours to manufacture the substrate processing apparatus. Furthermore, the greater the number of screws used to fasten the inner wall plate, the greater the man-hours required to manufacture the substrate processing apparatus, and there was a risk of increased costs due to the increased number of parts. In contrast, the manufacturing method including the fastening process and the mounting process allows the substrate processing apparatus 1 to be manufactured without requiring the large number of man-hours required in the past. Specifically, it is possible to reduce the number of man-hours and the number of parts by approximately 50%.

[0033] Next, modified examples of the inner wall plate 3 will be described, but the differences from the above-described embodiment will be mainly described, and a description of similar points will be omitted.

[0034] The inner wall plate 3L shown in FIG. 8(b) differs from the inner wall plate 3L shown in FIG. 8(a) in that it further includes one second recess 32D located on the left end 36 side. The second recess 32D is located on the upper end 38 side, opposite the second recesses 32B. Considering expansion in the direction of the arrow α1, the second recess 32D is formed so that the longitudinal direction of its oval shape is inclined relative to the long side direction of the inner wall plate 3 (see C4 in FIG. 8). This inclination angle can be the same as the inclination angle of the diagonal of the inner wall plate 3L, for example. The second recess 32D thus formed can accommodate deformation due to thermal expansion of the inner wall plate 3L. This allows the inner wall plate 3L to be maintained in a fixed state by the elastic member 5 located in the second recess 32D.

[0035] The inner wall plate 3R shown in FIG. 8(b) differs from the inner wall plate 3R shown in FIG. 8(a) in that it further includes one second recess 32C located on the right end 35 side. The second recess 32C is located on the upper end 38 side, opposite the second recesses 32B. Considering expansion in the direction of the arrow β1, the second recess 32C is formed so that the longitudinal direction of its oval shape is inclined relative to the long side direction of the inner wall plate 3 (see C3 in the legend in FIG. 8). This inclination angle can be the same as the inclination angle of the diagonal of the inner wall plate 3R. The second recess 32C thus formed can accommodate deformation due to thermal expansion of the inner wall plate 3R. This allows the inner wall plate 3R to be maintained in a fixed state by the elastic member 5 located in the second recess 32C.

[0036] For example, depending on the installation state of the inner wall plates 3L and 3R, as shown in Fig. 8(c), the inner wall plate 3L may expand in the direction of the arrow α2 pointing to the lower left in Fig. 8(c), and the inner wall plate 3R may expand in the direction of the arrow β2 pointing to the lower right in Fig. 8(c). In consideration of the expansion in the direction of the arrow α2, the inner wall plate 3L shown in Fig. 8(c) differs from the inner wall plate 3L shown in Fig. 8(a) in that the second recesses 32B are spaced apart in the X direction on the side of the upper end 38. Similarly, in consideration of the expansion in the direction of the arrow β2, the inner wall plate 3R shown in Fig. 8(c) differs from the inner wall plate 3R shown in Fig. 8(a) in that the second recesses 32B are spaced apart in the X direction on the side of the upper end 38.

[0037] 9(a) differs from the inner wall plate 3L shown in FIG. 8(c) in that it further includes one second recess 32C located on the left end 36 side. The second recess 32C is located on the lower end 37 side, opposite the second recesses 32B. In consideration of expansion in the direction of the arrow α2, the second recess 32C is formed such that the longitudinal direction of its oval shape is inclined with respect to the long side direction of the inner wall plate 3 (see C3 in the legend in FIG. 9).

[0038] 9(a) differs from the inner wall plate 3R shown in FIG. 8(c) in that it further includes one second recess 32D located on the right end 35 side. The second recess 32D is located on the lower end 37 side, opposite the second recesses 32B. In consideration of expansion in the direction of the arrow β2, the second recess 32D is formed such that the longitudinal direction of its oval shape is inclined with respect to the long side direction of the inner wall plate 3 (see C4 in the legend in FIG. 9).

[0039] Unlike the inner wall plate 3L shown in FIG. 8(c), the inner wall plate 3L shown in FIG. 9(b) is also fixed by an auxiliary member 6 arranged on the left end 36 side of the inner wall plate 3L. Similarly, unlike the inner wall plate 3R shown in FIG. 8(c), the inner wall plate 3R shown in FIG. 9(b) is also fixed by an auxiliary member 6 arranged on the right end 35 side of the inner wall plate 3L. The auxiliary member 6 is arranged on the lower end 37 side opposite to each second recess 32B and is a member that assists in fixing the inner wall plate 3L or the inner wall plate 3R (hereinafter referred to as "inner wall plate 3") to the inner surface 21 of the processing chamber 2. As shown in FIG. 10, in this embodiment, the auxiliary member 6 is a bolt having a threaded portion 61 and a head portion 62 having a larger diameter than the threaded portion 61. A male thread 611 is formed on the outer peripheral surface of the threaded portion 61. In addition, a screw hole 25 is pre-formed in the inner surface 21. A female screw 251 that screws into the male screw 611 of the fastening member 4 is formed on the inner circumferential surface of the screw hole 25. Then, with the threaded portion 61 of the auxiliary member 6 inserted into the through hole 390 of the inner wall plate 3, the male screw 611 screws into the female screw 251. This screwing fastens the fastening member 4, and the head 62 can press the inner wall plate 3 against the inner surface 21. In addition, a cap 7 is attached to the head 62. As a result, the head 62 is covered and protected by the cap 7.

[0040] The fastening position of the auxiliary member 6 is preferably below the height of the mounting surface 301 of the substrate mounting table 30. This prevents particles from adhering to the substrate G on the mounting surface 301, even if deposits adhere to the periphery of the cap 7 attached to the auxiliary member 6 and then break into small pieces and peel off. In this embodiment, the number of auxiliary members 6 arranged is one per inner wall plate 3, but is not limited to this. The nominal diameter of the male screw 611 depends on the size of the inner wall plate 3, the number of fastening members 4 arranged, the number of auxiliary members 6 arranged, etc., but is preferably M6 or larger, for example.

[0041] Next, a modified example of the elastic member 5 will be described, focusing on differences from the embodiment described above, and a description of similar points will be omitted. Fig. 11 shows a modified example of the configuration of the elastic member provided in the substrate processing apparatus shown in Fig. 1.

[0042] 11(a) is different from the elastic member 5 shown in Fig. 3 and is formed of a spiral body in which a wire rod thinner than the elastic member 5 is wound spirally. This makes the elastic member 5A more flexible overall than the elastic member 5, thereby improving the ease of storage in the recess 32.

[0043] 11(b) has a spiral body 51 formed by spirally winding a wire rod, and a ring-shaped insertion member 52 that is inserted inside the spiral body 51. The material of the insertion member 52 is not particularly limited, and may be, for example, fluororubber or silicone rubber. This allows the spiral body 51 to be reinforced.

[0044] 11(c) is made of a material containing a conductive filler. Examples of the filler include various metal materials and carbon black. The elastic member 5C may contain a binder made of a silicone resin that binds the filler together.

[0045] 11(d) has a ring-shaped core 53 made of a thermoplastic elastomer such as a polyurethane-based elastomer, and a metal film 54 made of a conductive metal material and formed on the surface of the core 53. The metal material constituting the metal film 54 is not particularly limited, and aluminum or the like can be used. The method for forming the metal film 54 is not particularly limited, and PVD or the like can be used, for example. In the substrate processing apparatus 1, the elastic members 5A to 5D can be appropriately selected and used depending on various conditions.

[0046] Although the preferred embodiments of the present disclosure have been described above, the present disclosure is not limited to the above-described embodiments and various modifications and variations are possible within the scope of the present disclosure. Furthermore, in the above-described embodiments, the elastic member 5 is pre-placed in the vertical wall groove 33 of the inner wall panel 3 before the head 42 of the fastening member 4 is inserted into the recess 32. However, this is not limited thereto and the elastic member 5 may be pre-placed in the head groove 424 of the head 42 of the fastening member 4. Furthermore, in the above-described embodiments, the elastic member 5 and the elastic members 5A to 5D are all "O"-shaped rings. However, this is not limited thereto and may be, for example, a "C"-shaped ring. If the elastic member 5 is a "C"-shaped ring, it is preferable to position the missing portion so that it does not face the head 42 of the fastening member 4. [Explanation of symbols]

[0047] 1. Substrate processing equipment 2. Processing chamber 20 Processing Space 21 Inner surface 3 Interior wall panels 32 recess 321 Bottom 322 Vertical wall 4 Fastening members 41 Threaded part 42 Head 5 Elastic member G board

Claims

1. a processing chamber having an interior surface defining a processing space in which a substrate is processed; a plurality of fastening members each having a threaded portion fastened to the inner surface and a head portion having a larger diameter than the threaded portion; an inner wall plate covering the inner surface, into which the heads of the fastening members are inserted, having a longitudinal shape that is long in one direction when viewed from the insertion direction, and including a recess having a bottom and a standing wall portion that stands upright from the bottom; an elastic member interposed between the head portion and the upright wall portion when the head portion is inserted into the recess, The elastic member is compressed between the head portion and the standing wall portion to fix the inner wall plate to the inner surface.

2. The substrate processing apparatus according to claim 1 , wherein the inner wall plate, the fastening members, and the elastic members are all electrically conductive.

3. The vertical wall portion has a vertical wall portion groove formed along its circumferential direction, The substrate processing apparatus according to claim 1 , wherein the elastic member is preliminarily arranged along the upright wall groove before the head is inserted into the recess.

4. 4. The substrate processing apparatus according to claim 3, wherein the upright wall portion has a tapered portion formed on a portion opposite the bottom portion across the upright wall portion groove, the tapered portion having an inner diameter of the recess increasing toward the opposite side.

5. 4. The substrate processing apparatus according to claim 3, wherein a cross section of said upright wall groove when said inner wall plate is cut along its thickness direction is rectangular or square.

6. The substrate processing apparatus according to claim 3 , wherein the elastic member is in the shape of a ring along the vertical wall groove.

7. The substrate processing apparatus according to claim 6 , wherein the elastic member is formed of a spiral body made of a wire wound in a spiral shape, and has a ring shape along the vertical wall portion side groove.

8. The substrate processing apparatus according to claim 7 , wherein the elastic member has an insertion member through which the spiral body is inserted.

9. The head portion has a head portion side groove formed along its circumferential direction, The substrate processing apparatus according to claim 3 , wherein the elastic member engages with the head side groove when the head is inserted into the recess.

10. The substrate processing apparatus according to claim 9 , wherein the cross section of the head groove when the fastening member is cut along its central axis is arc-shaped.

11. the inner wall plate thermally expands when the substrate is processed in the processing space, The substrate processing apparatus according to claim 1 , wherein the longitudinal direction of each of the recesses in the longitudinal shape coincides with the direction of thermal expansion of the inner wall plate.

12. The inner wall plate has a rectangular shape in a plan view, The recessed portion includes a first recessed portion disposed on one side of the inner wall plate in the longitudinal direction, and a second recessed portion disposed away from the one side of the inner wall plate, The first recess has a longitudinal direction in the longitudinal shape that coincides with the width direction of the inner wall plate, The substrate processing apparatus according to claim 1 , wherein the longitudinal direction of the longitudinal shape of the second recess coincides with the longitudinal direction of the inner wall plate, or the longitudinal direction of the longitudinal shape is inclined with respect to the longitudinal direction of the inner wall plate.

13. The substrate processing apparatus according to claim 1 , wherein the longitudinal shape is an ellipse.

14. The substrate processing apparatus according to claim 1 , wherein each of the recesses functions as a positioning portion for determining a position of the inner wall plate relative to the inner surface when the inner wall plate is fixed to the inner surface.

15. The substrate processing apparatus according to claim 1 , wherein the elastic member is made of a material containing a conductive filler.

16. 2. The substrate processing apparatus according to claim 1, wherein a metal film made of a conductive metal material is formed on a surface of the elastic member.

17. The substrate processing apparatus according to claim 1 , wherein the fastening member is made of any one of aluminum, titanium, and stainless steel.

18. The substrate processing apparatus according to claim 1 , wherein the inner wall plate is made of a metal material selected from the group consisting of aluminum and stainless steel.

19. an auxiliary member that assists in fixing the inner wall plate to the inner surface; The substrate processing apparatus according to claim 1 , wherein the auxiliary member is configured as a member that is inserted through the inner wall plate and fastened to the inner surface.

20. A method for manufacturing the substrate processing apparatus of claim 1, comprising: a fastening step of fastening the fastening members to the inner surface; and an attachment step of attaching the inner wall plate to the inner surface to cover the inner surface with the inner wall plate, In the mounting process, the head of each fastening member is inserted into the recess, and the elastic member is compressed between the head and the vertical wall portion, thereby fixing the inner wall plate to the inner surface.

Images