Laser system, spectral waveform calculation method, and electronic device manufacturing method

Abstract

To provide a laser system capable of rapidly calculating a convolution spectral waveform and increasing the calculation frequency.SOLUTION: A laser system connectable to an exposure apparatus includes: a spectrometer 19 configured to acquire a measured waveform from an interference pattern of laser light output from the laser system; and a processor 60a configured to calculate a convolution spectral waveform using a first intermediate function obtained through a process of performing deconvolution integration of a spatial image function of the exposure apparatus with an instrument function of the spectrometer, and using the measured waveform.SELECTED DRAWING: Figure 4

Description

[Technical Field]

[0001] The present disclosure relates to a laser system, a spectral waveform calculation method, and a method for manufacturing an electronic device. [Background technology]

[0002] In recent years, semiconductor exposure equipment has been required to improve its resolution in response to the miniaturization and high integration of semiconductor integrated circuits. To this end, the wavelength of light emitted from exposure light sources has been shortened. For example, gas laser devices used for exposure include KrF excimer laser devices that output laser light with a wavelength of approximately 248 nm and ArF excimer laser devices that output laser light with a wavelength of approximately 193 nm.

[0003] The spectral linewidth of the spontaneously oscillating light of KrF excimer laser devices and ArF excimer laser devices is as wide as 350 to 400 pm. Therefore, if a projection lens is constructed using a material that transmits ultraviolet light, such as KrF and ArF laser light, chromatic aberration may occur. As a result, resolution may decrease. Therefore, it is necessary to narrow the spectral linewidth of the laser light output from the gas laser device to a level where chromatic aberration is negligible. Therefore, a line narrow module (LNM) containing a line narrowing element (e.g., an etalon or grating) may be installed inside the laser resonator of the gas laser device to narrow the spectral linewidth. Hereinafter, a gas laser device with a narrowed spectral linewidth is referred to as a line narrowed gas laser device. [Prior art documents] [Patent documents]

[0004] [Patent Document 1] US Patent Application Publication No. 2011 / 200922 [Patent Document 2] Japanese Patent Application Laid-Open No. 2003-243752 [Patent Document 3] Summary of the specification of U.S. Patent Application Publication No. 2007 / 273852

[0005] A laser system according to one aspect of the present disclosure is a laser system connectable to an exposure apparatus, and includes: a spectrometer that acquires a measurement waveform from an interference pattern of laser light output from the laser system; and a processor configured to calculate a convolved spectral waveform using a first intermediate function obtained by a process of deconvolving a spatial image function of the exposure apparatus with an instrument function of the spectrometer; and the measurement waveform.

[0006] A spectral waveform calculation method according to one aspect of the present disclosure includes: making laser light output from a laser system connectable to an exposure apparatus incident on a spectrometer; acquiring a measured waveform from an interference pattern of the laser light by the spectrometer; and calculating a convoluted spectral waveform using a first intermediate function obtained through a process of deconvolving a spatial image function of the exposure apparatus with an instrument function of the spectrometer and the measured waveform.

[0007] A method for manufacturing an electronic device according to one aspect of the present disclosure includes generating laser light using a laser system including a spectrometer that acquires a measurement waveform from an interference pattern of laser light output from a laser system connectable to an exposure apparatus, and a processor configured to calculate a convolved spectral waveform using a first intermediate function obtained by a process of deconvolving a spatial image function of the exposure apparatus with an instrument function of the spectrometer, and the measurement waveform; outputting the laser light to an exposure apparatus; and exposing the laser light onto a photosensitive substrate in the exposure apparatus to manufacture an electronic device. [Brief explanation of the drawings]

[0008] Some embodiments of the present disclosure will now be described, by way of example only, with reference to the accompanying drawings, in which: [Figure 1] FIG. 1 is a schematic diagram showing the configuration of a laser system according to a comparative example. [Figure 2] FIG. 2 is a block diagram illustrating the function of the spectrum measurement processor in the comparative example. [Figure 3]FIG. 3 schematically shows the configuration of the laser system according to the first embodiment. [Figure 4] FIG. 4 is a block diagram illustrating the function of the spectrum measurement processor in the first embodiment. [Figure 5] FIG. 5 schematically shows the configuration of a laser system according to the second embodiment. [Figure 6] FIG. 6 is a block diagram illustrating the function of the spectrum measurement processor in the second embodiment. [Figure 7] FIG. 7 shows a schematic configuration of a laser system according to the third embodiment. [Figure 8] FIG. 8 shows a laser system including a first variation of a wavefront adjuster. [Figure 9] FIG. 9 shows a laser system including a second variation of the wavefront adjuster. [Figure 10] FIG. 10 shows a laser system including a third variation of the wavefront adjuster. [Figure 11] FIG. 11 shows a laser system including a fourth variation of the wavefront adjuster. [Figure 12] FIG. 12 shows a schematic configuration of a laser system according to the fourth embodiment. [Figure 13] FIG. 13 shows a line narrowing module that includes a variation of the mechanism for adjusting the beam width. [Figure 14] FIG. 14 shows a line narrowing module that includes a variation of the mechanism for adjusting the beam width. [Figure 15] FIG. 15 shows a schematic configuration of a laser system according to the fifth embodiment. [Figure 16] FIG. 16 shows a schematic configuration of a laser system according to the sixth embodiment. [Figure 17] FIG. 17 is a graph showing the relationship between the delay time of the oscillation trigger signals to the master oscillator and the power oscillator and the convoluted spectral linewidth of the pulsed laser light output from the power oscillator. [Figure 18]FIG. 18 shows a schematic configuration of an exposure apparatus connected to a laser system. Embodiment

[0009] <Contents> 1. Comparative Example 1.1 Configuration 1.1.1 Laser resonator 1.1.2 Monitor Module 16 1.1.3 Various processing equipment 1.2 Operation 1.2.1 Laser Control Processor 30 1.2.2 Laser resonator 1.2.3 Monitor Module 16 1.2.4 Wavelength measurement control unit 50 1.2.5 Spectral Measurement Processor 60 1.3 Issues with the comparative example 2. Laser system 1a that calculates the convoluted spectral waveform C1(λ) using the deconvoluted spatial image function D(λ) 2.1 Configuration 2.2 Operation 2.3 Explanation of why C0(λ) and C1(λ) are equal to each other 2.4 Effect 3. Laser system 1b: Calculating the convoluted spectral waveform C2(λ) using the Fourier transform F(D(λ)) of the deconvoluted spatial image function D(λ). 3.1 Configuration 3.2 Operation 3.3 Explanation of why C2(λ) is equal to C0(λ) and C1(λ) 3.4 Effect 4. Laser system 1c including a mechanism for adjusting the spectral linewidth by wavefront adjustment 4.1 Configuration 4.2 Operation 4.3 Variations of wavefront adjusters 4.3.1 Wavefront adjuster 15e disposed between output coupling mirror 15 and laser chamber 10 4.3.2 Wavefront adjuster 15h consisting of a deformable mirror 4.3.3 Wavefront adjuster 15e arranged between line-narrowing module 14 and laser chamber 10 4.3.4 Shape-changeable gratings141 4.4 Effect 5. Laser system 1h including a mechanism for adjusting the spectral linewidth by adjusting the beam width 5.1 Configuration 5.2 Operation 5.3 Spectral linewidth adjustment mechanism for changing the beam width by replacing the prisms 144 and 147 5.4 Effect 6. Laser system 1j including a mechanism for adjusting the spectral linewidth by changing the fluorine partial pressure 6.1 Configuration 6.2 Operation 6.3 Effect 7. Laser system 1k including master oscillator MO and power oscillator PO 7.1 Configuration 7.2 Operation 7.2.1 Laser Control Processor 30 7.2.2 Master Oscillator MO 7.2.3 Power Oscillator PO 7.2.4 Spectral Measurement Control Processor 60c 7.3 Effect 8.Other

[0010] Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. The embodiments described below show some examples of the present disclosure and do not limit the content of the present disclosure. Furthermore, not all of the configurations and operations described in each embodiment are necessarily essential as the configurations and operations of the present disclosure. Note that the same components are given the same reference symbols, and redundant explanations will be omitted.

[0011] 1. Comparative Example 1.1 Configuration FIG. 1 shows a schematic configuration of a laser system 1 according to a comparative example. The comparative example of the present disclosure is a configuration that the applicant recognizes as being known only by the applicant, and is not a publicly known example that the applicant acknowledges. The laser system 1 includes a laser chamber 10, a discharge electrode 11a, a power supply 12, a line-narrowing module 14, an output coupling mirror 15, a monitor module 16, a laser control processor 30, a wavelength measurement control unit 50, and a spectrum measurement processor 60. The laser system 1 is connectable to an exposure apparatus 4.

[0012] 1.1.1 Laser resonator The line-narrowing module 14 and the output coupling mirror 15 constitute a laser resonator. The laser chamber 10 is disposed in the optical path of the laser resonator. Windows 10a and 10b are provided at both ends of the laser chamber 10. A discharge electrode 11a and a paired discharge electrode (not shown) are disposed inside the laser chamber 10. The discharge electrode (not shown) is positioned so as to overlap with the discharge electrode 11a in the direction of the V-axis perpendicular to the paper surface. The laser chamber 10 is filled with a laser gas containing, for example, argon gas or krypton gas as a rare gas, fluorine gas as a halogen gas, and neon gas as a buffer gas.

[0013] The power supply 12 includes a switch 13 and is connected to the discharge electrode 11a and a charger (not shown).

[0014] The line narrowing module 14 includes a beam expander 140 and a grating 14c. The beam expander 140 includes multiple prisms 14a and 14b. The prism 14b is supported by a rotation stage 14e. The rotation stage 14e is configured to rotate the prism 14b around an axis parallel to the V axis in accordance with a drive signal output from a driver 51. Rotating the prism 14b changes the selected wavelength of the line narrowing module 14.

[0015] The output coupling mirror 15 is made of a material that transmits light of the wavelength selected by the line narrowing module 14, and one surface thereof is coated with a partially reflective film.

[0016] 1.1.2 Monitor Module 16 The monitor module 16 is disposed in the optical path of the pulsed laser light between the output coupling mirror 15 and the exposure device 4. The monitor module 16 includes beam splitters 16a, 16b, and 17a, an energy sensor 16c, a high-reflection mirror 17b, a wavelength detector 18, and a spectrometer 19.

[0017] Beam splitter 16a is located in the optical path of the pulsed laser beam output from output coupling mirror 15. Beam splitter 16a is configured to transmit a portion of the pulsed laser beam output from output coupling mirror 15 toward exposure device 4 with high transmittance and reflect the other portion. Beam splitter 16b is located in the optical path of the pulsed laser beam reflected by beam splitter 16a. Energy sensor 16c is located in the optical path of the pulsed laser beam reflected by beam splitter 16b.

[0018] Beam splitter 17a is located in the optical path of the pulsed laser beam that has passed through beam splitter 16b. High-reflection mirror 17b is located in the optical path of the pulsed laser beam that has been reflected by beam splitter 17a.

[0019] The wavelength detector 18 is disposed in the optical path of the pulsed laser light transmitted through the beam splitter 17a and includes a diffusion plate 18a, an etalon 18b, a condenser lens 18c, and a line sensor 18d.

[0020] The diffusion plate 18a is located in the optical path of the pulsed laser light that has passed through the beam splitter 17a. The diffusion plate 18a has many projections and recesses on its surface, and is configured to transmit and diffuse the pulsed laser light. The etalon 18b is located in the optical path of the pulsed laser light transmitted through the diffusion plate 18a. The etalon 18b includes two partially reflecting mirrors. The two partially reflecting mirrors face each other with a predetermined air gap between them and are bonded together via a spacer.

[0021] The condenser lens 18c is located in the optical path of the pulsed laser light that has passed through the etalon 18b. Line sensor 18d is located on the optical path of the pulsed laser light that has passed through condenser lens 18c, at the focal plane of condenser lens 18c. Line sensor 18d is a light distribution sensor that includes a large number of light-receiving elements arranged one-dimensionally. Alternatively, instead of line sensor 18d, an image sensor that includes a large number of light-receiving elements arranged two-dimensionally may be used as the light distribution sensor.

[0022] The line sensor 18d receives interference fringes formed by the etalon 18b and the condenser lens 18c. The interference fringes are an interference pattern of pulsed laser light and have a concentric circular shape, and the square of the distance from the center of the concentric circle is proportional to the change in wavelength.

[0023] The spectrometer 19 is disposed in the optical path of the pulsed laser beam reflected by the high-reflection mirror 17b. The spectrometer 19 includes a diffusion plate 19a, an etalon 19b, a condenser lens 19c, and a line sensor 19d. These components are similar in configuration to the diffusion plate 18a, etalon 18b, condenser lens 18c, and line sensor 18d included in the wavelength detector 18, respectively. However, the etalon 19b has a smaller free spectral range than the etalon 18b. The condenser lens 19c has a longer focal length than the condenser lens 18c.

[0024] 1.1.3 Various processing equipment The spectrum measurement processor 60 is a processing device including a memory 61 in which a control program is stored, a CPU (central processing unit) 62 that executes the control program, and a counter 63. The spectrum measurement processor 60 is specially configured or programmed to execute various processes included in the present disclosure. The spectrum measurement processor 60 corresponds to the processor in the present disclosure.

[0025] The memory 61 also stores various data for calculating the spectral linewidth. The various data include the spatial image function A(λ) of the exposure tool 4. The counter 63 counts the number of pulses of the pulsed laser light by counting the number of times an electrical signal including pulse energy data output from the energy sensor 16c is received. Alternatively, the counter 63 may count the number of pulses of the pulsed laser light by counting oscillation trigger signals output from the laser control processor 30.

[0026] The wavelength measurement control unit 50 is a processing device including a memory (not shown) that stores a control program, a CPU (not shown) that executes the control program, and a counter (not shown). The counter included in the wavelength measurement control unit 50 also counts the number of pulses of the pulsed laser light, similar to the counter 63.

[0027] The laser control processor 30 is a processing device including a memory (not shown) in which a control program is stored and a CPU (not shown) that executes the control program. The laser control processor 30 is specially configured or programmed to execute the various processes included in the present disclosure.

[0028] In this disclosure, the laser control processor 30, the wavelength measurement control unit 50, and the spectrum measurement processor 60 are described as separate components, but the laser control processor 30 may also serve as both the wavelength measurement control unit 50 and the spectrum measurement processor 60.

[0029] 1.2 Operation 1.2.1 Laser Control Processor 30 The laser control processor 30 receives setting data for the target pulse energy and target wavelength of the pulsed laser light from an exposure tool controller 40 included in the exposure tool 4 . The laser control processor 30 receives a trigger signal from the exposure device controller 40 .

[0030] The laser control processor 30 transmits setting data for the voltage to be applied to the discharge electrode 11a based on the target pulse energy to the power supply 12. The laser control processor 30 transmits setting data for the target wavelength to the wavelength measurement control unit 50. The laser control processor 30 also transmits an oscillation trigger signal based on the trigger signal to the switch 13 included in the power supply 12.

[0031] 1.2.2 Laser resonator The switch 13 is turned on when it receives an oscillation trigger signal from the laser control processor 30. When the switch 13 is turned on, the power supply 12 generates a pulsed high voltage from the electrical energy stored in a charger (not shown) and applies this high voltage to the discharge electrode 11a.

[0032] When a high voltage is applied to the discharge electrode 11a, a discharge occurs inside the laser chamber 10. The energy of this discharge excites the laser medium inside the laser chamber 10, causing it to transition to a higher energy level. When the excited laser medium then transitions to a lower energy level, it emits light with a wavelength corresponding to the difference in energy levels.

[0033] Light generated inside the laser chamber 10 is emitted to the outside of the laser chamber 10 through windows 10a and 10b. The beam width of the light emitted from the window 10a of the laser chamber 10 is expanded by the beam expander 140 and is incident on the grating 14c. Light incident on the grating 14c from the beam expander 140 is reflected by the multiple grooves of the grating 14c and diffracted in a direction according to the wavelength of the light.

[0034] The beam expander 140 reduces the beam width of the diffracted light from the grating 14c and returns the light to the laser chamber 10 through the window 10a. The output coupling mirror 15 transmits and outputs a portion of the light emitted from the window 10 b of the laser chamber 10 , and reflects the other portion back into the laser chamber 10 .

[0035] In this way, the light emitted from laser chamber 10 travels back and forth between line-narrowing module 14 and output-coupling mirror 15, and is amplified each time it passes through the discharge space inside laser chamber 10. This light is narrowed in line each time it is reflected by line-narrowing module 14. The laser-oscillated, line-narrowed light is output from output-coupling mirror 15 as pulsed laser light.

[0036] 1.2.3 Monitor Module 16 The energy sensor 16c detects the pulse energy of the pulsed laser light and outputs pulse energy data to the laser control processor 30, the wavelength measurement control unit 50, and the spectrum measurement processor 60. The pulse energy data is used by the laser control processor 30 to feedback control the setting data of the voltage applied to the discharge electrode 11a. In addition, the electrical signal containing the pulse energy data can be used by the wavelength measurement control unit 50 and the spectrum measurement processor 60 to count the number of pulses.

[0037] Wavelength detector 18 generates waveform data of interference fringes from the amount of light at each of the light-receiving elements included in line sensor 18d. Wavelength detector 18 may use an integrated waveform obtained by integrating the amount of light at each of the light-receiving elements as the waveform data of interference fringes. Wavelength detector 18 may also generate an integrated waveform multiple times and average the multiple integrated waveforms to use an average waveform as the waveform data of interference fringes. The wavelength detector 18 transmits waveform data of the interference fringes to the wavelength measurement control unit 50 in accordance with a data output trigger output from the wavelength measurement control unit 50 .

[0038] The spectroscope 19 generates an integrated waveform Oi by integrating the amount of light at each of the light receiving elements included in the line sensor 19d over Ni pulses. The spectroscope 19 generates the integrated waveform Oi Na times and averages the Na integrated waveforms Oi to generate an average waveform Oa. The number of integrated pulses Ni is, for example, 5 to 8 pulses, and the number of averaging times Na is, for example, 5 to 8 times.

[0039] The number of integrated pulses Ni and the number of averaging times Na may be counted by the spectrum measurement processor 60, and the spectrometer 19 may generate the integrated waveform Oi and the average waveform Oa in accordance with a trigger signal output from the spectrum measurement processor 60. The memory 61 of the spectrum measurement processor 60 may store setting data for the number of integrated pulses Ni and the number of averaging times Na.

[0040] The spectrometer 19 extracts a portion of the waveform corresponding to the free spectral range from the average waveform Oa. The extracted portion of the waveform indicates the relationship between the distance from the center of the concentric circles that make up the interference fringes and the light intensity. The spectrometer 19 obtains the measured spectrum waveform O(λ) by performing coordinate conversion of this waveform into the relationship between wavelength and light intensity. The process of converting the portion of the average waveform Oa into the relationship between wavelength and light intensity is called conversion to wavelength space.

[0041] The spectrometer 19 transmits the measurement waveform O(λ) to the spectrum measurement processor 60 in accordance with a data output trigger output from the spectrum measurement processor 60. The process of obtaining the measured waveform O(λ) by conversion into wavelength space may be performed by the spectrum measurement processor 60 rather than by the spectrometer 19. Both the process of generating the average waveform Oa and the process of obtaining the measured waveform O(λ) may be performed by the spectrum measurement processor 60 rather than by the spectrometer 19.

[0042] 1.2.4 Wavelength measurement control unit 50 The wavelength measurement control unit 50 receives setting data for the target wavelength from the laser control processor 30. The wavelength measurement control unit 50 also calculates the central wavelength of the pulsed laser beam using waveform data of interference fringes output from the wavelength detector 18. The wavelength measurement control unit 50 feedback-controls the central wavelength of the pulsed laser beam by outputting a control signal to a driver 51 based on the target wavelength and the calculated central wavelength.

[0043] 1.2.5 Spectral Measurement Processor 60 The spectrum measurement processor 60 receives the measurement waveform O(λ) from the spectrometer 19. The spectrum measurement processor 60 calculates an estimated spectrum waveform T0(λ) from the measurement waveform O(λ) as follows.

[0044] FIG. 2 is a block diagram illustrating the function of the spectrum measurement processor 60 in the comparative example. The spectrometer 19 has measurement characteristics specific to the device, and these measurement characteristics are expressed by an instrumental function I(λ) as a function of wavelength λ. Here, when pulsed laser light having an unknown spectral waveform T(λ) is incident on the spectrometer 19 having the instrumental function I(λ) and measured, the measured waveform O(λ) is expressed by the convolution integral of the unknown spectral waveform T(λ) and the instrumental function I(λ) as follows: O(λ)=∫ -∞ ∞ T(x) I(λ-x)dλ where ∫ -∞ ∞ Xdλ represents the integral of X with respect to the variable λ from -∞ to ∞. In other words, the convolution integral means the convolution of two functions. The convolution integral can be expressed using the symbol * as follows: O(λ)=T(λ)*I(λ)

[0045] The Fourier transform F(O(λ)) of the measured waveform O(λ) is equal to the product of the Fourier transforms F(T(λ)) and F(I(λ)) of the two functions T(λ) and I(λ), respectively, as follows: F(O(λ))=F(T(λ))×F(I(λ)) This is called the convolution theorem.

[0046] The spectrum measurement processor 60 measures the instrumental function I(λ) of the spectrometer 19 in advance and stores it in the memory 61. To measure the instrumental function I(λ), coherent light having a wavelength substantially the same as the central wavelength of the pulsed laser light output from the laser system 1 and having a narrow spectral linewidth that can be considered to be substantially a δ function is made incident on the spectrometer 19. The waveform measured by the coherent light by the spectrometer 19 can be used as the instrumental function I(λ).

[0047] The CPU 62 included in the spectrum measurement processor 60 deconvolves the measurement waveform O(λ) of the pulsed laser light using the instrument function I(λ) of the spectrometer 19. Deconvolution refers to a calculation process for estimating an unknown function that satisfies the convolution equation. In other words, the unknown spectral waveform T(λ) of the pulsed laser light incident on the spectrometer 19 is estimated by deconvolution. The waveform obtained by deconvolution is referred to as the estimated spectral waveform T0(λ). The estimated spectral waveform T0(λ) is represented by the symbol * that represents the deconvolution. -1 It is expressed as follows using T0(λ)=O(λ)* -1 I(λ)

[0048] Theoretically, the deconvolution integral can be calculated as follows: First, the following formula is derived from the convolution theorem: F(T0(λ))=F(O(λ)) / F(I(λ)) By performing an inverse Fourier transform on both sides of this equation, the calculation result of the deconvolution integral can be obtained. That is, the symbol for the inverse Fourier transform is F -1 Then, the estimated spectral waveform T0(λ) is expressed as follows: T0(λ)=F -1 (F(O(λ)) / F(I(λ)))

[0049] However, in actual numerical calculations, deconvolution using Fourier transform and inverse Fourier transform is easily affected by noise components contained in the measurement data. For this reason, it is desirable to calculate the deconvolution using an iterative method that can suppress the influence of noise components, such as the Jacobi method or the Gauss-Seidel method.

[0050] The CPU 62 may further calculate a convoluted spectral waveform C0(λ) of the estimated spectral waveform T0(λ) and the spatial image function A(λ) of the exposure tool 4 as follows. C0(λ)=T0(λ)*A(λ)

[0051] The aerial image function A(λ) is a mathematical expression of the aerial image of the pattern projected onto the photosensitive substrate by the exposure tool 4, and is expressed as a function of wavelength λ. An example of the aerial image function A(λ) of a contact hole is shown below. A(λ)=exp(-a λ 2 )·(cos(b·λ)) 2 Here, exp(X) is the power of Napier's number with X as the exponent, and a and b are the following constants: a=1.280 b=2.521 The spectrum measurement processor 60 may receive the spatial image function A(λ) from the exposure tool controller 40 via the laser control processor 30 and store it in the memory 61 .

[0052] The convoluted spectral waveform obtained by convoluting the spectral waveform of the pulsed laser light with the spatial image function A(λ) of the exposure tool 4 may have a high correlation with the critical dimension of the exposure tool 4. As described above, the convoluted spectral waveform C0(λ) calculated using the estimated spectral waveform T0(λ), or its full width at half maximum, can be one of the effective indexes for laser control.

[0053] 1.3 Issues with the comparative example However, calculating the deconvolution integral using the iterative method can take, for example, approximately 2600 μs. When the repetition frequency of the pulsed laser beam is 6 kHz, the repetition period is approximately 166 μs, which makes it difficult to calculate the convolved spectral waveform C0(λ) for each pulse of the pulsed laser beam.

[0054] 2. Laser system 1a that calculates the convoluted spectral waveform C1(λ) using the deconvoluted spatial image function D(λ) 2.1 Configuration Fig. 3 is a schematic diagram showing the configuration of a laser system 1a according to the first embodiment, and Fig. 4 is a block diagram showing the function of a spectrum measurement processor 60a according to the first embodiment.

[0055] The first embodiment differs from the comparative example in that a memory 61a included in a spectroscopic measurement processor 60a stores a deconvolved spatial image function D(λ). The deconvolved spatial image function D(λ) is an example of a first intermediate function in the present disclosure. The memory 61a is an example of a storage medium in the present disclosure. The instrument function I(λ) of the spectrometer 19 and the spatial image function A(λ) of the exposure tool 4 may be stored in a memory (not shown) of the laser control processor 30.

[0056] 2.2 Operation In the first embodiment, the convoluted spectral waveform C1(λ) is calculated in the following manner.

[0057] The laser control processor 30 calculates the deconvolved aerial image function D(λ) by deconvolving the aerial image function A(λ) with the instrument function I(λ). The calculation of the deconvolved aerial image function D(λ) is performed, for example, when the laser control processor 30 receives the aerial image function A(λ) from the exposure tool controller 40. The deconvolved aerial image function D(λ) is expressed by the following equation: D(λ)=A(λ)* -1 I(λ) The deconvolved aerial image function D(λ) can be calculated, for example, using an iterative method.

[0058] The spectrum measurement processor 60a receives the deconvolved spatial spread function D(λ) from the laser control processor 30, stores it in advance in the memory 61a, and reads out the deconvolved spatial spread function D(λ) from the memory 61a when necessary.

[0059] Each time a measurement waveform O(λ) is acquired, the CPU 62 included in the spectrum measurement processor 60a calculates a convolved spectrum waveform C1(λ) by convolving the measurement waveform O(λ) with the deconvolved spatial image function D(λ). The convolved spectrum waveform C1(λ) is expressed by the following equation: C1(λ)=O(λ)*D(λ)

[0060] The CPU 62 may calculate the convolved spectral linewidth, which is the linewidth of the convolved spectral waveform C1(λ). The convolved spectral linewidth may be, for example, the full width at half maximum.

[0061] 2.3 Explanation of why C0(λ) and C1(λ) are equal to each other It will be shown below that the convoluted spectral waveforms C0(λ) and C1(λ) calculated in the comparative example and the first embodiment are equal to each other.

[0062] As described above, the convoluted spectral waveform C0(λ) in the comparative example is given by the following equation: C0(λ)=T0(λ)*A(λ) This formula can be transformed as follows using the convolution theorem: F(C0(λ))=F(T0(λ))×F(A(λ))...Equation 0.1

[0063] As described above, the estimated spectral waveform T0(λ) is expressed as follows: T0(λ)=F -1 (F(O(λ)) / F(I(λ))) By Fourier transforming both sides of this equation, we can transform it as follows: F(T0(λ))=F(O(λ)) / F(I(λ))...Equation 0.2

[0064] From equations 0.1 and 0.2, F(C0(λ)) is expressed as follows: F(C0(λ))=F(O(λ))×F(A(λ)) / F(I(λ)) By performing an inverse Fourier transform on both sides of this equation, the convoluted spectral waveform C0(λ) in the comparative example is given by the following equation. C0(λ)=F -1 (F(O(λ))×F(A(λ)) / F(I(λ)))...Equation 0.3

[0065] On the other hand, as described above, the convoluted spectral waveform C1(λ) in the first embodiment is given by the following equation: C1(λ)=O(λ)*D(λ) This formula can be transformed as follows using the convolution theorem: F(C1(λ))=F(O(λ))×F(D(λ))...Equation 1.1

[0066] As mentioned above, the deconvolved spatial image function D(λ) is expressed as follows: D(λ)=A(λ)* -1 I(λ) In this case, the spatial image function A(λ) of the exposure tool 4 is given by the following equation: A(λ)=D(λ)*I(λ) This formula can be transformed as follows using the convolution theorem: F(A(λ))=F(D(λ))×F(I(λ)) By further modifying this equation, the Fourier transform of the deconvoluted spatial image function D(λ) is expressed as follows: F(D(λ))=F(A(λ)) / F(I(λ))...Equation 1.2

[0067] From equations 1.1 and 1.2, F(C1(λ)) is expressed as follows: F(C1(λ))=F(O(λ))×F(A(λ)) / F(I(λ)) By performing an inverse Fourier transform on both sides of this equation, the convoluted spectral waveform C1(λ) is given by the following equation: C1(λ)=F -1(F(O(λ))×F(A(λ)) / F(I(λ))) Equation 1.3

[0068] From equations 0.3 and 1.3, the convolved spectral waveforms C0(λ) and C1(λ) calculated in the comparative example and the first embodiment are equal to each other.

[0069] 2.4 Effect According to the first embodiment, a laser system 1a connectable to an exposure tool 4 includes a spectrometer 19 and a spectrum measurement processor 60a. The spectrometer 19 acquires a measurement waveform O(λ) from an interference pattern of pulsed laser light output from the laser system 1a. The spectrum measurement processor 60a is configured to calculate a convolved spectrum waveform C1(λ) using a deconvolved spatial image function D(λ) as a first intermediate function obtained through a process of deconvolving a spatial image function A(λ) of the exposure tool 4 with an instrument function I(λ) of the spectrometer 19, and the measurement waveform O(λ). According to this, by using the deconvolved spatial image function D(λ), it is not necessary to perform deconvolution of the measurement waveform O(λ), so that the convolved spectral waveform C1(λ) can be calculated quickly and the calculation frequency can be increased. It may also be possible to calculate the convolved spectral waveform C1(λ) for each pulse of the pulsed laser light.

[0070] According to the first embodiment, the laser system 1a further includes a memory 61a that stores a deconvolved spatial spread function D(λ). The deconvolved spatial spread function D(λ) is the result of deconvolving the spatial spread function A(λ) with the instrumental function I(λ). The spectrum measurement processor 60a reads the deconvolved spatial spread function D(λ) from the memory 61a and calculates a convolved spectral waveform C1(λ) by convolving the deconvolved spatial spread function D(λ) with the measurement waveform O(λ). According to this, by preparing the deconvolved spatial image function D(λ) in advance, it is not necessary to perform deconvolution integration every time a measurement waveform O(λ) is acquired, and therefore the convolved spectral waveform C1(λ) can be calculated at high speed.

[0071] According to the first embodiment, the laser control processor 30 deconvolves the spatial image function A(λ) with the instrument function I(λ) to calculate the deconvolved spatial image function D(λ). Then, the spectrum measurement processor 60a stores the deconvolved spatial image function D(λ) in the memory 61a. According to this, the deconvoluted spatial spread function D(λ) can be calculated in advance using, for example, an iterative method, so that the convoluted spectral waveform C1(λ) can be calculated with high accuracy.

[0072] According to the first embodiment, the laser control processor 30 receives the aerial image function A(λ) from the exposure tool 4 . This allows accurate laser control to be performed, reflecting the characteristics of each exposure device 4.

[0073] According to the first embodiment, the spectroscopic processor 60a further calculates the convolved spectral linewidth, which is the linewidth of the convolved spectral waveform C1(λ). This makes it possible to obtain an index that is effective for laser control from the convoluted spectral waveform C1(λ).

[0074] In other respects, the first embodiment is similar to the comparative example. In the first embodiment, the laser system 1a outputs a pulsed laser beam, but the present disclosure is not limited to this. The laser system 1a may output a continuous wave laser beam.

[0075] 3. Laser system 1b: Calculating the convoluted spectral waveform C2(λ) using the Fourier transform F(D(λ)) of the deconvoluted spatial image function D(λ). 3.1 Configuration Fig. 5 is a schematic diagram showing the configuration of a laser system 1b according to the second embodiment, and Fig. 6 is a block diagram for explaining the function of a spectrum measurement processor 60b according to the second embodiment.

[0076] The second embodiment differs from the first embodiment in that a memory 61b included in a spectroscopic processor 60b stores a Fourier transform F(D(λ)) of the deconvoluted spatial image function D(λ). The Fourier transform F(D(λ)) is an example of a first intermediate function in the present disclosure. The memory 61b is an example of a storage medium in the present disclosure.

[0077] 3.2 Operation In the second embodiment, the convolved spectral waveform C2(λ) is calculated in the following manner.

[0078] The laser control processor 30 calculates the deconvolved spatial image function D(λ) by deconvolving the spatial image function A(λ) with the instrument function I(λ). The calculation of the deconvolved spatial image function D(λ) is performed, for example, by an iterative method. Furthermore, the laser control processor 30 calculates the Fourier transform F(D(λ)) of the deconvolved spatial image function D(λ). The calculation of the Fourier transform F(D(λ)) may be performed by a fast Fourier transform. The calculation of the deconvolved spatial image function D(λ) and its Fourier transform F(D(λ)) is performed, for example, when the laser control processor 30 receives the spatial image function A(λ) from the exposure apparatus controller 40.

[0079] The spectrum measurement processor 60b receives the Fourier transform F(D(λ)) of the deconvoluted spatial image function D(λ) from the laser control processor 30, stores it in advance in memory 61b, and reads out the Fourier transform F(D(λ)) from memory 61b when needed.

[0080] Each time a measurement waveform O(λ) is acquired, the spectrum measurement processor 60b calculates a convolved spectrum waveform C2(λ) using the Fourier transform F(D(λ)) of the deconvolved spatial image function D(λ) and the measurement waveform O(λ) as follows:

[0081] The CPU 62 included in the spectrum measurement processor 60b calculates the Fourier transform F(O(λ)) of the measurement waveform O(λ). The Fourier transform F(O(λ)) can be calculated by fast Fourier transform. The Fourier transform F(O(λ)) corresponds to the second intermediate function in this disclosure.

[0082] Next, CPU 62 calculates the Fourier transform product F(O(λ))×F(D(λ)) by multiplying the Fourier transform F(O(λ)) of the measurement waveform O(λ) by the Fourier transform F(D(λ)) of the deconvoluted spatial image function D(λ).

[0083] Next, the CPU 62 calculates the convolved spectral waveform C2(λ) by performing an inverse Fourier transform on the Fourier transform product F(O(λ))×F(D(λ)). This inverse Fourier transform can be calculated using an inverse fast Fourier transform. The convolved spectral waveform C2(λ) is expressed by the following equation: C2(λ)=F -1 (F(O(λ))×F(D(λ)))

[0084] The CPU 62 may calculate the convolved spectral linewidth, which is the linewidth of the convolved spectral waveform C2(λ). The convolved spectral linewidth may be, for example, the full width at half maximum.

[0085] 3.3 Explanation of why C2(λ) is equal to each of C0(λ) and C1(λ) It will be shown below that the convoluted spectral waveform C2(λ) calculated in the second embodiment is equal to each of the convoluted spectral waveforms C0(λ) and C1(λ) calculated in the comparative example and the first embodiment, respectively.

[0086] As described above, the convoluted spectral waveform C2(λ) in the second embodiment is given by the following equation: C2(λ)=F -1 (F(O(λ))×F(D(λ))) Equation 2.1

[0087] On the other hand, the above formula 1.2 also holds true in the second embodiment. F(D(λ))=F(A(λ)) / F(I(λ))...Equation 1.2

[0088] From Equation 2.1 and Equation 1.2, the convolved spectral waveform C2(λ) is given by the following equation: C2(λ)=F -1 (F(O(λ))×F(A(λ)) / F(I(λ))) Equation 2.3

[0089] According to equations 0.3, 1.3, and 2.3, the convoluted spectral waveform C2(λ) calculated in the second embodiment is equal to each of C0(λ) and C1(λ).

[0090] 3.4 Effect According to the second embodiment, the laser system 1b includes a memory 61b that stores a Fourier transform F(D(λ)) of a deconvolved spatial image function D(λ) as a first intermediate function. The Fourier transform F(D(λ)) is a function obtained by Fourier transforming the result of deconvolving the spatial image function A(λ) with an instrumental function I(λ). The spectrum measurement processor 60b reads the Fourier transform F(D(λ)) from the memory 61b and calculates the Fourier transform F(O(λ)) of the measurement waveform O(λ). The spectrum measurement processor 60b calculates the product F(O(λ))×F(D(λ)) of the Fourier transform F(O(λ)) and the Fourier transform F(D(λ)), and then performs an inverse Fourier transform on the product F(O(λ))×F(D(λ)) to calculate the convolved spectral waveform C2(λ). According to this, by using Fourier transform and inverse Fourier transform instead of the convolution integral O(λ)*D(λ) in the first embodiment, the convolved spectral waveform C2(λ) can be calculated at high speed.

[0091] According to the second embodiment, the laser control processor 30 deconvolves the spatial image function A(λ) with the instrumental function I(λ) to calculate the deconvolved spatial image function D(λ), and then calculates the Fourier transform F(D(λ)) of the deconvolved spatial image function D(λ). The spectrum measurement processor 60b then stores the Fourier transform F(D(λ)) in the memory 61b. According to this, the deconvoluted spatial spread function D(λ) can be calculated in advance using, for example, an iterative method, so that the convoluted spectral waveform C2(λ) can be calculated with high accuracy.

[0092] According to the second embodiment, the spectrum measurement processor 60b uses a fast Fourier transform to Fourier transform the measurement waveform O(λ), and uses an inverse fast Fourier transform to Fourier transform the product F(O(λ))×F(D(λ)). This allows the convoluted spectral waveform C2(λ) to be calculated at high speed. In other respects, the second embodiment is similar to the first embodiment.

[0093] 4. Laser system 1c including a mechanism for adjusting the spectral linewidth by wavefront adjustment 4.1 Configuration 7 is a schematic diagram illustrating a configuration of a laser system 1c according to a third embodiment. The laser system 1c includes a wavefront tuning device 15a that partially reflects pulsed laser light, instead of the output coupling mirror 15. The wavefront tuning device 15a is an example of an adjustment mechanism according to the present disclosure. The laser system 1c includes a spectrum measurement control processor 60c, instead of the spectrum measurement processor 60a. The spectrum measurement control processor 60c is connected to a driver 64 that drives the wavefront tuning device 15a.

[0094] The wavefront adjuster 15a includes a cylindrical plano-convex lens 15b, a cylindrical plano-concave lens 15c, and a linear stage 15d. The cylindrical plano-concave lens 15c is located between the laser chamber 10 and the cylindrical plano-convex lens 15b. The cylindrical plano-convex lens 15b and the cylindrical plano-concave lens 15c are arranged so that the convex surface of the cylindrical plano-convex lens 15b faces the concave surface of the cylindrical plano-concave lens 15c. The convex surface of the cylindrical plano-convex lens 15b and the concave surface of the cylindrical plano-concave lens 15c each have a focal axis parallel to the V-axis. The flat surface opposite the convex surface of the cylindrical plano-convex lens 15b is coated with a partially reflective film. The wavefront adjuster 15a and the line-narrowing module 14 form a laser resonator.

[0095] 4.2 Operation The linear stage 15d moves the cylindrical plano-concave lens 15c along the optical path between the laser chamber 10 and the cylindrical plano-convex lens 15b in accordance with a drive signal output from the driver 64. This changes the wavefront of the light traveling from the wavefront tuning device 15a to the line narrowing module 14. The change in wavefront changes the spectral linewidth of the wavelength selected by the line narrowing module 14 and also changes the convolved spectral linewidth.

[0096] The spectrum measurement control processor 60c receives a target value of the convoluted spectral linewidth from the exposure apparatus controller 40 via the laser control processor 30. The spectrum measurement control processor 60c also calculates the convoluted spectral linewidth using the measurement waveform O(λ). The spectrum measurement control processor 60c transmits a control signal to the driver 64 based on the target value of the convoluted spectral linewidth and the calculated convoluted spectral linewidth to control the wavefront tuning device 15a, thereby performing feedback control of the convoluted spectral linewidth.

[0097] In other respects, the third embodiment is similar to the first embodiment. Alternatively, in the third embodiment, the convolved spectral waveform C2(λ) may be calculated using the Fourier transform F(D(λ)) of the deconvolved spatial image function D(λ), as in the second embodiment. Furthermore, the following variations may be adopted in the third embodiment.

[0098] 4.3 Variations of wavefront adjusters 4.3.1 Wavefront adjuster 15e disposed between output coupling mirror 15 and laser chamber 10 Fig. 8 shows a laser system 1d including a first variation of the wavefront adjuster. Fig. 8 corresponds to a view of the laser system 1d from the same direction as Fig. 7, but some components are simplified or omitted from the illustration.

[0099] 8, a wavefront tuner 15e is disposed between the output coupling mirror 15 and the laser chamber 10. The wavefront tuner 15e is an example of an adjustment mechanism in the present disclosure. The wavefront tuner 15e includes a cylindrical plano-convex lens 15f that does not include a partially reflective film, instead of the cylindrical plano-convex lens 15b. The cylindrical plano-convex lens 15f transmits the light emitted from the laser chamber 10 with high transmittance and causes the light to enter the output coupling mirror 15. The output coupling mirror 15 and the line narrowing module 14 form a laser resonator.

[0100] By moving the cylindrical plano-concave lens 15c included in the wavefront tuning unit 15e, the wavefront of the light traveling from the wavefront tuning unit 15e to the line narrowing module 14 changes. Therefore, the spectral linewidth of the wavelength selected by the line narrowing module 14 changes, and the convolved spectral linewidth also changes.

[0101] 4.3.2 Wavefront adjuster 15h consisting of a deformable mirror 9 shows a laser system 1e including a second variation of the wavefront adjuster. FIG. 9 corresponds to a view of the laser system 1e from the same direction as FIG. 7, but some components are simplified or omitted from the illustration.

[0102] In FIG. 9, the wavefront adjuster 15h is composed of a deformable mirror with high reflectivity. The wavefront adjuster 15h is an example of an adjustment mechanism in the present disclosure. The deformable mirror is a mirror whose curvature of the reflecting surface can be changed by expanding and contracting the expandable portion 15i. The reflecting surface of the deformable mirror is a cylindrical surface, and the focal axis of the reflecting surface is parallel to the V-axis. The wavefront adjuster 15h and the line-narrowing module 14 form a laser resonator.

[0103] Changing the curvature of the reflecting surface of the deformable mirror changes the wavefront of the light traveling from the wavefront tuning unit 15h to the line narrowing module 14. This changes the spectral linewidth of the wavelength selected by the line narrowing module 14, as well as the convolved spectral linewidth.

[0104] A beam splitter 15g serving as an output coupling mirror is disposed in the optical path between the wavefront tuning unit 15h and the laser chamber 10. The beam splitter 15g transmits a portion of the light emitted from the window 10b, thereby allowing the light to travel back and forth between the wavefront tuning unit 15h and the line narrowing module 14. The beam splitter 15g reflects another portion of the light emitted from the window 10b, and outputs the reflected light toward the exposure device 4 as pulsed laser light.

[0105] 4.3.3 Wavefront adjuster 15e arranged between line-narrowing module 14 and laser chamber 10 Fig. 10 shows a laser system 1f including a third variation of the wavefront adjuster. Fig. 10 corresponds to a view of the laser system 1f from the same direction as Fig. 7, but some components are simplified or omitted from the illustration.

[0106] 10, a wavefront tuning device 15e is disposed between the line-narrowing module 14 and the laser chamber 10. The configuration of the wavefront tuning device 15e is similar to that described with reference to Fig. 8. The output coupling mirror 15 and the line-narrowing module 14 form a laser resonator.

[0107] 4.3.4 Shape-changeable gratings141 Fig. 11 shows a laser system 1g including a fourth variation of the wavefront adjuster. Fig. 11 corresponds to a view of the laser system 1g seen from the same direction as Fig. 7, but some components are simplified or omitted from the illustration.

[0108] Laser system 1g includes a line narrowing module 14g, which includes a grating 141. Grating 141 is an example of an adjustment mechanism in the present disclosure. The curvature of envelope surface 141a of the grooves of grating 141 can be changed by expanding and contracting section 142. Envelope surface 141a is a cylindrical surface, and the focal axis of envelope surface 141a is parallel to the V-axis. The output coupling mirror 15 and line narrowing module 14g form a laser resonator.

[0109] Changing the curvature of the envelope surface 141a changes the relative relationship between the envelope surface 141a and the wavefront of the pulsed laser beam, which in turn changes the spectral linewidth of the wavelength selected by the line narrowing module 14g and the convolved spectral linewidth.

[0110] 4.4 Effect According to the third embodiment, the spectrum measurement control processor 60 c receives the target value of the convolved spectral linewidth from the exposure tool 4 via the laser control processor 30 . This allows accurate laser control to be performed in response to requests from the exposure device 4.

[0111] According to the third embodiment, the laser systems 1c to 1g each include an adjustment mechanism, and the spectrum measurement control processor 60c controls the adjustment mechanism based on the convolved spectral linewidth. This allows laser control using an effective index obtained from the convoluted spectral waveform C1(λ).

[0112] According to the third embodiment, the laser systems 1c to 1g each include a laser resonator, and the adjustment mechanism includes a wavefront tuning device 15a, 15e, or 15h or a grating 141 arranged in the optical path of the laser resonator. This allows the convolved spectral linewidth to be controlled by adjusting the wavefront of the light in the laser resonator.

[0113] 5. Laser system 1h including a mechanism for adjusting the spectral linewidth by adjusting the beam width 5.1 Configuration 12 schematically illustrates the configuration of a laser system 1h according to a fourth embodiment. The laser system 1h includes a line-narrowing module 14h capable of adjusting the beam width of light incident on a grating 14c, instead of the line-narrowing module 14. The laser system 1h includes a spectrum measurement control processor 60h, instead of the wavelength measurement control unit 50 and the spectrum measurement processor 60a. The spectrum measurement control processor 60h is connected to a driver 65 that drives the line-narrowing module 14h.

[0114] In the line-narrowing module 14h, not only is the prism 14b supported on the rotation stage 14e, but the prism 14a is also supported on the rotation stage 14d. The rotation stages 14d and 14e are examples of the adjustment mechanism of the present disclosure. The rotation stages 14d and 14e are configured to rotate the prisms 14a and 14b, respectively, around axes parallel to the V axis in accordance with a drive signal output from a driver 65.

[0115] 5.2 Operation When the prisms 14a and 14b are rotated in opposite directions by the rotary stages 14d and 14e, the incident angle of the light onto the grating 14c does not change significantly, but the beam width of the light incident onto the grating 14c changes. Therefore, although the central wavelength of the pulsed laser light does not change significantly, the spectral linewidth and the convolved spectral linewidth change.

[0116] By adjusting the rotation angles of the prisms 14a and 14b, it is possible to change not only the beam width of the light incident on the grating 14c but also the angle of incidence of the light on the grating 14c, thereby changing not only the spectral linewidth and convolved spectral linewidth of the pulsed laser light but also the center wavelength.

[0117] The spectrum measurement control processor 60h receives setting data for the target wavelength from the exposure apparatus controller 40 via the laser control processor 30. The spectrum measurement control processor 60h also calculates the central wavelength of the pulsed laser beam using waveform data of interference fringes output from the wavelength detector 18. The spectrum measurement control processor 60h feedback-controls the central wavelength of the pulsed laser beam by outputting a control signal to a driver 65 based on the target wavelength and the calculated central wavelength.

[0118] The spectrum measurement control processor 60h receives a target value of the convoluted spectral linewidth from the exposure apparatus controller 40 via the laser control processor 30. The spectrum measurement control processor 60h also calculates the convoluted spectral linewidth using the measurement waveform O(λ). The spectrum measurement control processor 60h feedback-controls the convoluted spectral linewidth by outputting a control signal to the driver 65 based on the target value of the convoluted spectral linewidth and the calculated convoluted spectral linewidth.

[0119] In other respects, the fourth embodiment is similar to the first embodiment. Alternatively, in the fourth embodiment, a spectral linewidth adjustment mechanism similar to that in the third embodiment may be added, and the convolved spectral linewidth may be controlled by both wavefront adjustment and beam width adjustment. Alternatively, in the fourth embodiment, the convolved spectral waveform C2(λ) may be calculated using the Fourier transform F(D(λ)) of the deconvolved spatial image function D(λ), as in the second embodiment. Furthermore, the following variations may be adopted in the fourth embodiment.

[0120] 5.3 Spectral linewidth adjustment mechanism for changing the beam width by replacing the prisms 144 and 147 13 and 14 show a line narrowing module 14i including a variation of the mechanism for adjusting the beam width. The line narrowing module 14i includes prisms 143-147.

[0121] 13, prisms 143, 144, 145, and 146 are arranged in this order from the laser chamber 10 side toward the grating 14c. Prism 144 changes both the beam width and traveling direction of the light incident from prism 143 and makes the light incident on prism 145.

[0122] Prism 144 and prism 147 are disposed on a uniaxial stage 148 and are movable by the uniaxial stage 148. The uniaxial stage 148 is an example of an adjustment mechanism in the present disclosure. As shown in FIG. 14 , prism 147 can be disposed in the optical path of the laser resonator in place of prism 144. Like prism 144, prism 147 changes the traveling direction of light incident from prism 143 and makes the light incident on prism 145. However, prism 147 has a different beam width expansion rate from prism 144. For example, prism 147 may make the light incident from prism 143 incident on prism 145 without expanding the beam width.

[0123] By replacing prism 147 with prism 144, the incident angle of light incident on grating 14c from prism 146 does not change significantly, but the beam width of light incident on grating 14c from prism 146 changes. Therefore, before and after replacing prism 147 with prism 144, the central wavelength of the pulsed laser light does not change significantly, but the spectral linewidth and the convolved spectral linewidth change.

[0124] 13 and 14, a rotation stage (not shown) for rotating the prism 145 or 146 around an axis parallel to the V axis may be further provided to adjust the central wavelength of the pulsed laser light.

[0125] 5.4 Effect According to the fourth embodiment, a laser system 1h includes a line-narrowing module 14h including a grating 14c and multiple prisms 14a and 14b. Rotation stages 14d and 14e, which serve as adjustment mechanisms, change the attitudes of the multiple prisms 14a and 14b to change the beam width of light incident on the grating 14c. Alternatively, the laser system 1h includes a line-narrowing module 14i including a grating 14c and a plurality of prisms 144 and 147. A single-axis stage 148 serving as an adjustment mechanism changes the positions of the plurality of prisms 144 and 147, thereby changing the beam width of the light incident on the grating 14c. This allows the convoluted spectral linewidth to be controlled by changing the beam width of the light incident on the grating 14c.

[0126] 6. Laser system 1j including a mechanism for adjusting the spectral linewidth by changing the fluorine partial pressure 6.1 Configuration 15 schematically shows the configuration of a laser system 1j according to a fifth embodiment. The laser system 1j includes a fluorine partial pressure adjusting device 66. The fluorine partial pressure adjusting device 66 is an example of an adjusting mechanism in the present disclosure. The fluorine partial pressure adjusting device 66 includes a fluorine-containing gas supply source, a valve, and an exhaust device (not shown), and is connected to the laser chamber 10 via a gas pipe 66a. The fluorine-containing gas supply source stores a fluorine-containing laser gas having a higher fluorine concentration than the laser gas inside the laser chamber 10. A spectrum measurement control processor 60c is connected to the fluorine partial pressure adjusting device 66.

[0127] 6.2 Operation The fluorine partial pressure adjusting device 66 adjusts the fluorine partial pressure inside the laser chamber 10 in accordance with a control signal output from the spectrum measurement control processor 60c. The spectral linewidth and the convoluted spectral linewidth change depending on the fluorine partial pressure. For example, when fluorine-containing laser gas is supplied into the laser chamber 10, the fluorine partial pressure increases and the convoluted spectral linewidth increases. When some of the gas inside the laser chamber 10 is evacuated, the fluorine partial pressure decreases and the convoluted spectral linewidth decreases.

[0128] The spectrum measurement control processor 60c receives a target value for the convoluted spectral linewidth from the exposure tool controller 40 via the laser control processor 30. The spectrum measurement control processor 60c also calculates the convoluted spectral linewidth using the measurement waveform O(λ). The spectrum measurement control processor 60c feedback-controls the convoluted spectral linewidth by sending a control signal to the fluorine partial pressure regulator 66 based on the target value for the convoluted spectral linewidth and the calculated convoluted spectral linewidth.

[0129] In other respects, the fifth embodiment is similar to the first embodiment. Alternatively, in the fifth embodiment, a spectral linewidth adjustment mechanism similar to that in the third or fourth embodiment may be added, and the convolved spectral linewidth may be controlled by both wavefront adjustment or beam width adjustment and the fluorine partial pressure. Alternatively, in the fifth embodiment, the convolved spectral waveform C2(λ) may be calculated using the Fourier transform F(D(λ)) of the deconvolved spatial image function D(λ), as in the second embodiment.

[0130] 6.3 Effect According to the fifth embodiment, the laser system 1j includes a laser chamber 10 that contains a laser gas containing fluorine. A fluorine partial pressure adjusting device 66 serving as an adjusting mechanism adjusts the fluorine partial pressure inside the laser chamber 10. According to this, by adjusting the fluorine partial pressure inside the laser chamber 10, the convoluted spectral linewidth can be controlled.

[0131] 7. Laser system 1k including master oscillator MO and power oscillator PO 7.1 Configuration 16 is a schematic diagram illustrating the configuration of a laser system 1k according to a sixth embodiment. The laser system 1k includes a master oscillator MO, a power oscillator PO, a monitor module 16, a laser control processor 30, high-reflection mirrors 31 and 32, a wavelength measurement control unit 50, a driver 51, a spectrum measurement control processor 60c, and a synchronization control unit 67. The synchronization control unit 67 is an example of an adjustment mechanism according to the present disclosure. The configurations of the laser control processor 30, the wavelength measurement control unit 50, the driver 51, and the spectrum measurement control processor 60c are the same as those of the corresponding configurations in the third embodiment.

[0132] The master oscillator MO includes a laser chamber 10, a discharge electrode 11a, a power supply 12, a line narrowing module 14, and an output coupling mirror 15. These components are similar to the corresponding components in the third embodiment.

[0133] The high-reflection mirrors 31 and 32 are disposed in the optical path of the pulsed laser beam output from the master oscillator MO. The high-reflection mirrors 31 and 32 are configured so that their positions and orientations can be changed by actuators (not shown). The high-reflection mirrors 31 and 32 constitute a beam steering unit for adjusting the incident position and incident direction of the pulsed laser beam into the power oscillator PO.

[0134] The power oscillator PO is disposed on the optical path of the pulsed laser beam that has passed through the beam steering unit, and includes a laser chamber 20, a discharge electrode 21a, a power supply 22, a rear mirror 24, and an output coupling mirror 25.

[0135] The rear mirror 24 is made of a material that transmits pulsed laser light, and one surface thereof is coated with a partially reflective film. The reflectance of the rear mirror 24 is set higher than the reflectance of the output coupling mirror 25. The rear mirror 24 and the output coupling mirror 25 form a laser resonator. The laser chamber 20 is disposed in the optical path of the laser resonator. Windows 20a and 20b are provided on both ends of the laser chamber 20. A discharge electrode 21a and a paired discharge electrode (not shown) are disposed inside the laser chamber 20. The power supply 22 includes a switch 23 and is connected to the discharge electrode 21a and a charger (not shown).

[0136] In other respects, the above-mentioned components of the power oscillator PO are similar to the corresponding components of the master oscillator MO.

[0137] The monitor module 16 is disposed in the optical path of the pulsed laser light between the output coupling mirror 25 and the exposure device 4. The configuration of the monitor module 16 is similar to the corresponding configuration in the third embodiment. The synchronization control unit 67 is connected to the switches 13 and 23, respectively.

[0138] 7.2 Operation 7.2.1 Laser Control Processor 30 The laser control processor 30 sets a first target pulse energy of the pulsed laser light output from the master oscillator MO. The laser control processor 30 further receives from the exposure tool controller 40 setting data for a second target pulse energy of the pulse laser beam output from the power oscillator PO.

[0139] The laser control processor 30 sends setting data for the applied voltages to the power supplies 12 and 22, respectively, based on the first and second target pulse energies. The laser control processor 30 transmits the trigger signal received from the exposure apparatus controller 40 to the spectrum measurement control processor 60c. The spectrum measurement control processor 60c transmits the trigger signal to the synchronization controller 67, and the synchronization controller 67 transmits first and second oscillation trigger signals based on the trigger signal to the switches 13 and 23, respectively.

[0140] 7.2.2 Master Oscillator MO The operation of the master oscillator MO is similar to that of the laser system 1c in the third embodiment.

[0141] 7.2.3 Power Oscillator PO Switch 23 included in power supply 22 turns on when it receives a second oscillation trigger signal from synchronization control unit 67. When switch 23 turns on, power supply 22 generates a pulsed high voltage from the electrical energy stored in a charger (not shown) and applies this high voltage to discharge electrode 21 a.

[0142] The delay time of the second oscillation trigger signal to switch 23 relative to the first oscillation trigger signal to switch 13 is set so that the timing at which discharge occurs inside laser chamber 20 and the timing at which pulsed laser light output from master oscillator MO enters inside laser chamber 20 are synchronized.

[0143] The pulsed laser light travels back and forth between the rear mirror 24 and the output coupling mirror 25, and is amplified every time it passes through the discharge space inside the laser chamber 20. The amplified pulsed laser light is output from the output coupling mirror 25.

[0144] 7.2.4 Spectral Measurement Control Processor 60c The spectrum measurement control processor 60c receives a target value for the convoluted spectral linewidth from the exposure apparatus controller 40 via the laser control processor 30. The spectrum measurement control processor 60c also calculates the convoluted spectral linewidth using the measurement waveform O(λ). The spectrum measurement control processor 60c sets a delay time for the second oscillation trigger signal relative to the first oscillation trigger signal based on the target value for the convoluted spectral linewidth and the calculated convoluted spectral linewidth, and sends a delay time setting signal to the synchronization controller 67. The synchronization controller 67 sends first and second oscillation trigger signals to the switches 13 and 23, respectively, based on the delay time setting signal and trigger signal received from the spectrum measurement control processor 60c. This feedback-controls the convoluted spectral linewidth.

[0145] FIG. 17 is a graph showing the relationship between the delay time of the second oscillation trigger signal to the power oscillator PO relative to the first oscillation trigger signal to the master oscillator MO and the convoluted spectral linewidth of the pulsed laser light output from the power oscillator PO. The spectral linewidth and the convoluted spectral linewidth change depending on the delay time. The shorter the delay time, the larger the convoluted spectral linewidth becomes, and the longer the delay time, the smaller the convoluted spectral linewidth becomes. Therefore, the convoluted spectral linewidth can be controlled by the delay time set by the spectrum measurement control processor 60c.

[0146] In other respects, the sixth embodiment is similar to the first embodiment. Alternatively, in the sixth embodiment, a spectral linewidth adjustment mechanism similar to that of the third, fourth, or fifth embodiment may be added to the master oscillator MO, and the convoluted spectral linewidth may be controlled by both wavefront adjustment, beam width adjustment, or fluorine partial pressure, and the delay time of the second oscillation trigger signal relative to the first oscillation trigger signal. Alternatively, in the sixth embodiment, a laser device using a solid-state laser rather than a gas laser device may be used as the master oscillator MO, and the convoluted spectral linewidth may be controlled by the delay time of the second oscillation trigger signal relative to the first oscillation trigger signal. Alternatively, in the sixth embodiment, the convoluted spectral waveform C2(λ) may be calculated using the Fourier transform F(D(λ)) of the deconvoluted spatial image function D(λ), as in the second embodiment.

[0147] 7.3 Effect According to the sixth embodiment, the laser system 1k includes a master oscillator MO and a power oscillator PO. A synchronization control unit 67 as an adjustment mechanism adjusts the delay time of the second oscillation trigger signal output to the power oscillator PO relative to the first oscillation trigger signal output to the master oscillator MO. According to this, the convoluted spectral linewidth can be controlled by adjusting the delay time of the second oscillation trigger signal relative to the first oscillation trigger signal.

[0148] 8.Other 18 shows a schematic configuration of an exposure device 4 connected to the laser system 1a. The laser system 1a generates a pulsed laser beam and outputs it to the exposure device 4. In FIG. 18, the exposure apparatus 4 includes an illumination optical system 41 and a projection optical system 42. The illumination optical system 41 illuminates a reticle pattern on a reticle (not shown) placed on a reticle stage RT with pulsed laser light incident from the laser system 1a. The projection optical system 42 reduces and projects the pulsed laser light that has passed through the reticle, forming an image on a workpiece (not shown) placed on a workpiece table WT. The workpiece is a photosensitive substrate such as a semiconductor wafer coated with photoresist. The exposure apparatus 4 exposes the workpiece with pulsed laser light reflecting the reticle pattern by synchronously translating the reticle stage RT and the workpiece table WT. After the reticle pattern is transferred to the semiconductor wafer through the exposure process described above, electronic devices can be manufactured through multiple processes. Instead of the laser system 1a, any of the laser systems 1b to 1h, 1j, and 1k may be used.

[0149] The above description is intended to be illustrative rather than limiting. Thus, it will be apparent to one skilled in the art that modifications can be made to the disclosed embodiments without departing from the scope of the claims. It will also be apparent to one skilled in the art that the disclosed embodiments can be used in combination.

[0150] Terms used throughout this specification and claims should be construed as "open ended" unless expressly stated otherwise. For example, words such as "comprise," "have," "comprise," and "equip" should be construed as meaning "without excluding the presence of elements other than those listed." In addition, the modifier "a" should be construed as meaning "at least one" or "one or more." In addition, the term "at least one of A, B, and C" should be construed as "A," "B," "C," "A+B," "A+C," "B+C," or "A+B+C." Furthermore, it should be construed as including combinations of these with elements other than "A," "B," and "C."

Claims

1. A laser system connectable to an exposure apparatus, comprising: a spectrometer for acquiring a measurement waveform from an interference pattern of the laser light output from the laser system; a processor configured to calculate a convoluted spectral waveform using a first intermediate function obtained by deconvolving an aerial image function of the exposure apparatus with an instrument function of the spectrometer, and the measured waveform; A laser system comprising:

2. 10. The laser system of claim 1, further comprising a storage medium storing the first intermediate function; the first intermediate function is a result of deconvolving the aerial image function with the instrumental function; The processor: reading the first intermediate function from the storage medium; calculating the convolved spectral waveform by convolving the first intermediate function and the measured waveform; Laser system.

3. 3. The laser system of claim 2, The processor: calculating the result as the first intermediate function; storing the first intermediate function in the storage medium; Laser system.

4. 10. The laser system of claim 1, further comprising a storage medium storing the first intermediate function; the first intermediate function is a function obtained by Fourier transforming a result of deconvolution of the aerial image function with the instrumental function, The processor: reading the first intermediate function from the storage medium; calculating a second intermediate function obtained by Fourier transforming the measured waveform; calculating a product of the first intermediate function and the second intermediate function; performing an inverse Fourier transform on the product to calculate the convolved spectral waveform; Laser system.

5. 5. The laser system of claim 4, The processor: Calculating the result, Fourier transforming the result to calculate the first intermediate function; storing the first intermediate function in the storage medium; Laser system.

6. 5. The laser system of claim 4, The processor: Fourier transforming the measured waveform using a fast Fourier transform; inverse Fourier transforming the product using an inverse fast Fourier transform; Laser system.

7. 10. The laser system of claim 1, the processor receives the aerial image function from the exposure apparatus; Laser system.

8. 10. The laser system of claim 1, The processor further calculates a linewidth of the convolved spectral waveform. Laser system.

9. 9. The laser system of claim 8, the processor receives the line width target value from the exposure tool; Laser system.

10. 9. The laser system of claim 8, Further provided with an adjustment mechanism, the processor controls the adjustment mechanism based on the line width. Laser system.

11. 11. The laser system of claim 10, further comprising a laser resonator; the adjustment mechanism includes a wavefront adjuster disposed in an optical path of the laser resonator; Laser system.

12. 11. The laser system of claim 10, further comprising a line narrowing module including a grating and a plurality of prisms; the adjustment mechanism changes the attitude or position of the plurality of prisms to change the beam width of the light incident on the grating. Laser system.

13. 11. The laser system of claim 10, Further comprising a laser chamber containing a laser gas containing fluorine; the adjusting mechanism includes a fluorine partial pressure adjusting device that adjusts the fluorine partial pressure inside the laser chamber. Laser system.

14. 11. The laser system of claim 10, further comprising a master oscillator and a power oscillator; the adjustment mechanism adjusts a delay time of a second oscillation trigger signal output to the power oscillator relative to a first oscillation trigger signal output to the master oscillator. Laser system.

15. A laser beam output from a laser system connectable to an exposure device is incident on a spectroscope; obtaining a measurement waveform from an interference pattern of the laser light by the spectroscope; calculating a convoluted spectral waveform using a first intermediate function obtained by a process of deconvolving the spatial image function of the exposure tool with the instrument function of the spectrometer, and the measured waveform; Spectral waveform calculation method.

16. 16. The spectral waveform calculation method according to claim 15, reading out the first intermediate function from a storage medium storing the first intermediate function, the first intermediate function being a result of deconvolving the spatial image function with the instrumental function; calculating the convolved spectral waveform by convolving the first intermediate function and the measured waveform; Spectral waveform calculation method.

17. 16. The spectral waveform calculation method according to claim 15, reading out the first intermediate function from a storage medium storing the first intermediate function obtained by Fourier transforming a result of deconvoluting the spatial image function with the instrumental function; calculating a second intermediate function obtained by Fourier transforming the measured waveform; calculating a product of the first intermediate function and the second intermediate function; performing an inverse Fourier transform on the product to calculate the convolved spectral waveform; Spectral waveform calculation method.

18. A method for manufacturing an electronic device, comprising: a spectrometer for acquiring a measurement waveform from an interference pattern of laser light output from a laser system connectable to an exposure apparatus; a processor configured to receive a target value of a spectral linewidth from the exposure tool, calculate a convolved spectral waveform using a first intermediate function obtained by deconvolving an aerial image function of the exposure tool with an instrument function of the spectrometer and the measured waveform, calculate a spectral linewidth using the convolved spectral waveform, and control the laser system so that the spectral linewidth becomes the target value; generating the laser light that reflects the spatial image function for each exposure device by the laser system comprising: outputting the laser light to the exposure device; In order to manufacture the electronic device, the laser light is exposed onto a photosensitive substrate in the exposure apparatus. A method for manufacturing an electronic device, comprising:

19. 20. The method of claim 18, further comprising the steps of: The processor: reading out the first intermediate function from a storage medium storing the first intermediate function, the first intermediate function being a result of deconvolving the spatial image function with the instrumental function; calculating the convolved spectral waveform by convolving the first intermediate function and the measured waveform; A method for manufacturing electronic devices.

20. 20. The method of claim 18, further comprising the steps of: The processor: reading out the first intermediate function from a storage medium storing the first intermediate function obtained by Fourier transforming a result of deconvoluting the spatial image function with the instrumental function; calculating a second intermediate function obtained by Fourier transforming the measured waveform; calculating a product of the first intermediate function and the second intermediate function; performing an inverse Fourier transform on the product to calculate the convolved spectral waveform; A method for manufacturing electronic devices.

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