Greenhouse gas treatment method and system adopting the same

Abstract

To provide a greenhouse gas treatment method capable of suppressing generation of CO2, nitrogen oxide (NOx) or other secondary pollution substances.SOLUTION: A greenhouse gas treatment method comprises: introducing greenhouse gas into a reaction chamber, the greenhouse gas being represented by a chemical formula AB, where A is a fluorine atom (F) or a nitrogen atom (N), and B is an atom or group capable of forming a bond with the fluorine atom or the nitrogen atom; introducing a hydrogen-containing compound into the reaction chamber; supplying plasma flame into the reaction chamber to reduce the greenhouse gas so that a nitrogen oxide (NOx) content in the reaction chamber is less than 200 ppm and / or destruction removal efficiency (DRE) of the greenhouse gas in the reaction chamber in a time interval / space is 95% or more.SELECTED DRAWING: Figure 1

Description

Detailed Description of the Invention

[0001] (Prior art disclosure / references) Taiwan Patent Serial No. I364316 discloses a method for treating a gas stream containing perfluorinated compounds from a semiconductor manufacturing process tool, in which a plasma torch is used to generate a plasma from an ionizable gas, and the plasma is injected into a reaction chamber to convert water vapor into heated H + ions and OH - Korean Patent Application Serial No. 1022841430000 discloses a system for removing perfluorocompounds (PFCs) and nitrogen oxides (NOx), which includes a urea water converter that converts supplied urea water into ammonia, and a scrubber that is connected to the urea water converter and generates a plasma arc to remove PFCs contained in target gas, and removes NOx that is generated when the PFCs are removed from the urea water converter into ammonia.

[0002] (Technical field) FIELD OF THE DISCLOSURE The present disclosure relates generally to methods and systems for treating industrial process exhaust gases, and more particularly to methods and systems for treating a greenhouse gas.

[0003] (background) According to the Kyoto Protocol, adopted at the Third Conference of the Parties (COP3) held in Kyoto in 1997, the United Nations Framework Convention on Climate Change (UNFCCC) requires member states to adopt specific plans and schedules for the emissions and removal of six major greenhouse gases. Of these six major greenhouse gases, the removal of fluorine-containing greenhouse gases (e.g., hydrofluorocarbons (HFCs), perfluorocarbons (PFCs), and sulfur hexafluoride (SF6)) and nitrogen-containing greenhouse gases (e.g., nitrous oxide (N2O) and nitrogen trifluoride (NF3)) is the most important. This is because their global warming potential (GWP) is approximately 7,000 to 25,000 times that of carbon dioxide (CO2), their half-lives are approximately 60 to 1,000 times longer than CO2, and their cumulative impact on the atmosphere is irreversible, necessitating more effective control and treatment.

[0004] However, PFCs such as carbon tetrafluoride (CF4), SF6, and NF3 are still widely used as process gases in certain semiconductor processes (such as dry etching processes and chamber cleaning procedures in chemical vapor deposition (CVD) processes). These process gases are emitted as exhaust gases, except for a portion consumed in the manufacturing reactions. With the vigorous development of the semiconductor industry in recent years, exhaust (waste) gases from semiconductor processes have become one of the important sources of greenhouse gases containing fluorine and nitrogen. Various clean technologies have been proposed to treat greenhouse gases that are stable and difficult to decompose, but there are limitations to their removal efficiency depending on the situation. Regardless of which clean technology is used, CO2 and nitrogen oxides (NO x ) (both of which are precursors of PM2.5) and other secondary pollutants is an important issue.

[0005] Therefore, there is a need to provide an advanced method for treating greenhouse gases and a system for applying the same to overcome the shortcomings of the prior art.

[0006] (Disclosure Summary) One embodiment of the present disclosure provides a method for treating greenhouse gases, the method comprising the steps of: introducing a greenhouse gas into a reaction chamber, the greenhouse gas being represented by the chemical formula AB, where A is a fluorine atom (F) or a nitrogen atom (N), and B is an atom or group capable of forming a bond with the fluorine atom or the nitrogen atom; introducing a hydrogen-containing compound into the reaction chamber; providing a plasma flame into the reaction chamber to reduce the greenhouse gas and reduce nitrogen oxides (NO ) in the reaction chamber; x ) is less than 200 ppm, and / or the destruction and removal efficiency (DRE) of greenhouse gases in the reaction chamber within a time interval / space is substantially 95% or more.

[0007] Another embodiment of the present disclosure provides a method for treating greenhouse gases, the method comprising the steps of: introducing a greenhouse gas into a reaction chamber, the greenhouse gas being represented by the chemical formula AB, where A is a fluorine atom (F) or a nitrogen atom (N), and B is an atom or group capable of forming a bond with the fluorine atom or the nitrogen atom; introducing a hydrogen-containing compound into the reaction chamber; and providing a plasma flame in the reaction chamber to reduce the greenhouse gas to form by-products including hydrofluoric acid (HF).

[0008] Yet another embodiment of the present disclosure provides a system for treating greenhouse gases, the system including a reaction chamber, a greenhouse gas source, a hydrogen-containing compound source, and a plasma source. The greenhouse gas source is used to store and introduce a greenhouse gas into the reaction chamber. The hydrogen-containing compound source is used to store and introduce a hydrogen-containing compound into the reaction chamber so that the ratio of the fluorine atomic equivalent concentration or the nitrogen atomic equivalent concentration in the greenhouse gas to the hydrogen atomic equivalent concentration in the hydrogen-containing compound is substantially 3.5 to 0.5. The plasma source supplies a plasma flame to the reaction chamber to reduce the greenhouse gas, and generates NO in the reaction chamber. x The content should be less than 200 ppm and / or by-products containing HF will be formed.

[0009] BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a diagram illustrating a greenhouse gas processing system according to one embodiment of the present disclosure.

[0010] FIG. 2 is a flowchart illustrating a method for treating greenhouse gases using a greenhouse gas treatment system according to one embodiment of the present disclosure.

[0011] FIG. 3 is a statistical histogram showing the DRE of a greenhouse gas after different hydrogen-containing compounds or compounds are introduced into a reaction chamber to react with the greenhouse gas in a plasma according to one embodiment of the present disclosure.

[0012] FIG. 4 is a statistical histogram illustrating the relative reduction of NO in exhaust gases after introducing different hydrogen-containing compounds or compounds into a reaction chamber for reaction with greenhouse gases in a plasma according to one embodiment of the present disclosure.

[0013] Figure 5 shows the NO in the exhaust gas after introducing additional clean dry air (CDA) into the reaction chamber to participate in the reaction under the same conditions. x 1 is a statistical histogram showing the relative increase and decrease rates of content.

[0014] FIG. 6A is a statistical histogram showing the DRE of a greenhouse gas after different single or multiple types of hydrogen-containing compounds are introduced into a reaction chamber and reacted with the greenhouse gas in a plasma to select a preferred plasma operating power from a range between 6 KW and 18 KW, according to one embodiment of the present disclosure.

[0015] Figure 6B shows the NO in the exhaust gas under the same conditions. x 1 is a statistical histogram showing the content.

[0016] In the following embodiments, various specific details are described below, but these embodiments are disclosed only for the purpose of clearly explaining the present invention. However, it should be understood that in some other embodiments, the present invention can be practiced without or even by omitting these specific details. Furthermore, to simplify the drawings, well-known structures and elements are depicted only by way of example.

[0017] (Detailed Description of Disclosure) The present disclosure provides a method and system for treating greenhouse gases, which can increase the DRE of greenhouse gases in a reaction chamber to 95% or more, and can reduce NOx in the reaction chamber. x The content can be reduced to less than 200 ppm. Greenhouse gases can be efficiently removed while reducing the generation of secondary pollutants. These and other aspects of the present disclosure will be better understood with reference to the following detailed description of preferred but non-limiting embodiment(s). The following description is made with reference to the accompanying drawings: Hereinafter, several embodiments of the present disclosure will be disclosed with reference to the accompanying drawings. However, the structures and contents disclosed in the embodiments are for illustrative and explanatory purposes, and the scope of protection of the present disclosure is not limited to the embodiments. It should be noted that the present disclosure does not illustrate all possible embodiments, and that those skilled in the art of the present disclosure can make appropriate modifications or changes based on the specification disclosed below to meet actual needs without departing from the spirit of the present disclosure. The present disclosure can also be applied to other embodiments not disclosed herein.

[0018] Referring to FIG. 1, FIG. 1 illustrates a system 10 for treating greenhouse gases according to one embodiment of the present disclosure. The system 10 for treating greenhouse gases includes a reaction chamber 101, a greenhouse gas source 102, a hydrogen-containing compound source 103, and a plasma source 104. The greenhouse gas source 102 includes a greenhouse gas 112 and devices (e.g., pipelines, gas valves, and other inspection and control devices) for storing and introducing the greenhouse gas 112 into the reaction chamber 101. The hydrogen-containing compound source 103 includes a hydrogen-containing compound 113 and devices (e.g., pipelines, gas valves, and other inspection and control devices) for storing and introducing the hydrogen-containing compound 113 into the reaction chamber 101. The plasma source 104 includes a device for supplying a plasma flame 114 to the reaction chamber 101 and a carrier gas 104a.

[0019] For example, in some embodiments of the present disclosure, the reaction chamber 101 may be a semi-closed cylindrical shell structure, one end of which may be connected to the greenhouse gas source 102, the hydrogen-containing compound source 103, and the plasma source 104, with the reaction gas being discharged from the other end. In this embodiment, the plasma source 104 may include at least one carrier gas 104a (e.g., nitrogen (N)) and a plasma torch 104b extending from one end of the reaction chamber 101 into the reaction chamber 101. The plasma torch 104b may introduce the carrier gas 104a into the reaction chamber 101 and generate a directed plasma jet (e.g., plasma flame 114) within the reaction chamber 101 using a high-current direct current (DC), alternating current (AC), or radio frequency (RF) power source.

[0020] The greenhouse gas source 102 and the hydrogen-containing compound source 103 may be pipeline structures for storing the greenhouse gas 112 and the hydrogen-containing compound 113 and directing them to the reaction chamber 101 through injection holes 105 and 106, respectively, connected to the reaction chamber 101. By adjusting the injection holes 105 and 106, the concentrations of the greenhouse gas 112 and the hydrogen-containing compound 113 in the reaction chamber 101 (before the plasma flame 114 is supplied) can be controlled to maintain an oxygen-poor / hydrogen-rich environment in the reaction chamber 101.

[0021] In some embodiments of the present disclosure, the greenhouse gas 112 can be represented by the chemical formula AB, where A is a fluorine atom (F) or a nitrogen atom (N), and B is an atom or group capable of forming a bond with a fluorine atom or a nitrogen atom. The hydrogen-containing compound 113 can be any gas, liquid, or solid compound that can generate a higher concentration of hydrogen free radicals than its own equivalent concentration after being bombarded by plasma free electrons. The oxygen-poor / hydrogen-rich environment refers to controlling the ratio of the fluorine atom equivalent concentration or nitrogen atom equivalent concentration in the greenhouse gas 112 to the hydrogen atom equivalent concentration in the hydrogen-containing compound 113 in the reaction chamber 101 to be substantially within the range of 3.5 to 0.5.

[0022] In one embodiment, an oxygen-poor / hydrogen-rich environment refers to a ratio of the fluorine atomic equivalent concentration in the greenhouse gas 112 to the hydrogen atomic equivalent concentration in the hydrogen-containing compound 113 in the reaction chamber 101 controlled to about 1.5. In one embodiment, an oxygen-poor / hydrogen-rich environment refers to a ratio of the nitrogen atomic equivalent concentration in the greenhouse gas 112 to the hydrogen atomic equivalent concentration in the hydrogen-containing compound 113 in the reaction chamber 101 controlled to about 3.

[0023] For example, in some embodiments of the present disclosure, the greenhouse gas 112 may include any of SF, CF, NF, trifluoromethane (CHF), tetrafluoroethylene (C2F4), hexafluoroethane (C2F6), octafluoropropane (C3F8), hexafluorobutane, dienes (C4F6), octafluorocyclobutane (c-C4F8), octafluorotetrahydrofuran (C4F8O), octafluorocyclopentene (C5F8), difluoromethane (CH2F2), fluoromethane (CH3F), pentafluoroethane (C2HF5), nitrous oxide (N2O), or any combination of the foregoing compounds. The hydrogen-containing compound 113 may be hydrogen (H), water (H O), hydrogen peroxide (H O), methane (CH), ammonia (NH), urea ((NH) CO·H O), aqueous ammonia (NH OH), or any combination of the above compounds.

[0024] Under the action of the plasma flame 114 provided by the plasma torch 104b, the hydrogen-containing compound 113 can generate a hydrogen-containing gas to reduce the fluorine-containing and / or nitrogen-containing greenhouse gas 112, and the NO in the reaction chamber 101. x By-products 115A containing less than 200 ppm and / or HF are formed. The basic operating principle is as follows.

[0025] Carbon-fluorine (CF) or sulfur-fluorine (SF) bonds in greenhouse gases 112 (e.g., SF or CF) can be temporarily broken by high-energy free electron collisions from the plasma flame 114. When hydrogen-containing compounds 113 (e.g., H, HO, or HO) are introduced, the high-energy plasma from the plasma torch 104b pyrolyzes, atomizes, and ionizes the hydrogen-containing compounds 113 to form hydrogen radicals, creating a reducing atmosphere in the oxygen-poor / hydrogen-rich plasma environment. Because the reduction reaction between fluorine in the greenhouse gas 112 and hydrogen in the reducing atmosphere is exothermic, the hydrogen radicals do not require much energy to easily combine with fluorine to form stable and easily manageable HF products, effectively suppressing the reverse reaction of the broken carbon-fluorine (CF) or sulfur-fluorine (SF) bonds. Therefore, greenhouse gases 112 can be efficiently thermally decomposed. In some embodiments, the destruction and removal efficiency (DRE) of greenhouse gases 112 within the reaction chamber 101 can be increased to 95% or greater, preferably 99% or greater.

[0026] In one exemplary embodiment, a hydrogen-containing compound 113 is used to treat greenhouse gases 112 including SF6. The reaction equation is as follows:

[0027] SF6+4H2→H2S+6HF SF6+3H2→S+6HF Similarly, when treating greenhouse gases 112 containing NO, a hydrogen-containing compound 113 is introduced into the reaction chamber 101, and an oxygen-poor / hydrogen-rich reducing plasma environment is provided using a plasma flame 114. The greenhouse gas 112 (NO) is effectively decomposed by the reduction reaction.

[0028] The high-energy free electrons of the plasma flame 114 can also induce oxidation reactions of the greenhouse gases 112 in the reaction chamber 101. However, the oxygen-poor / hydrogen-rich environment formed by the introduction of the hydrogen-containing compound 113 can reduce the probability of oxidation reactions. In addition, by making the DRE of the high carbon equivalent greenhouse gas 112 95% or more (≧95%), preferably 99% or more (≧99%), and the DRE of N2O 60% or more (≧60%), the secondary pollutants (NO2, NO3, NO4, NO5, NO6) generated by oxidation reactions can be reduced. x This can effectively reduce emissions of greenhouse gases (e.g., CO2).

[0029] Furthermore, in some embodiments of the present disclosure, the greenhouse gas treatment system 10 further includes a by-product cleaning module 120, which is interconnected with the reaction chamber 101 and is used to clean the exhaust gas 115 (including the by-products 115A) generated after treatment. For example, in this embodiment, the by-product cleaning module 120 includes a spray device 121, a circulating water tank 122, and a wet scrubber 123.

[0030] The treated exhaust gas 115 flows out of the reaction chamber 101 and enters the spraying device 121. The spraying device 121 includes at least one set of sprinklers for supplying water mist through a nozzle equipped with a water amount control valve (not shown). The water mist can quickly absorb the heat of the exhaust gas 115 and quickly cool it, dissolving a portion of the by-products 115A (e.g., hydrogen fluoride (HF)) in the exhaust gas 115 to form wastewater that falls into the circulating water tank 122 below, and the wastewater containing a portion of the dissolved by-products 115A is discharged through the bottom drain.

[0031] The remaining exhaust gas 115 is filtered by a filter 124 to remove impurities and solids, and then introduced into a wet scrubber 123. The wet scrubber 123, which is filled with packing material 123A having a high surface area, can further block and filter solid particles (e.g., silicon-containing powder) entrained in the exhaust gas 115. The clean exhaust gas 116 is then discharged to the outside. Furthermore, a booster wind turbine 125 can be installed at the rear end of the wet scrubber 123 to supplement static wind pressure. This allows the exhaust gas 116 to be discharged smoothly when the static pressure of the airflow caused by the exhaust gas 115 is insufficient.

[0032] 2, which is a flowchart illustrating a method for treating a greenhouse gas 112 using the greenhouse gas treatment system 10 according to one embodiment of the present disclosure. The method includes the following steps: As described in step S21, the greenhouse gas 112 is introduced into the reaction chamber 101, and in step S22, a hydrogen-containing compound 113 is introduced into the reaction chamber 101 to provide and maintain an oxygen-poor / hydrogen-rich environment in the reaction chamber 101. For example, the ratio of the fluorine atomic equivalent concentration or the nitrogen atomic equivalent concentration in the greenhouse gas 112 to the hydrogen atomic equivalent concentration in the hydrogen-containing compound 113 is maintained in the range of 3.5 to 0.5.

[0033] In some embodiments of the present disclosure, the greenhouse gas 112 and the hydrogen-containing compound 113 can be introduced into the reaction chamber 101 sequentially, and the order of introducing the greenhouse gas 112 and the hydrogen-containing compound 113 is not particularly limited. Alternatively, in other embodiments of the present disclosure, the greenhouse gas 112 and the hydrogen-containing compound 113 can be introduced into the reaction chamber 101 simultaneously. For example, in a specific embodiment, the greenhouse gas 112 and the hydrogen-containing compound 113 can be pre-mixed in the mixing zone 107 before being introduced into the reaction chamber 101. The step of introducing the hydrogen-containing compound 113 into the reaction chamber 101 can be performed using a gas injection method, a liquid injection method, or a gas / liquid mixed injection method, depending on the state (gas, liquid, or solid) of the hydrogen-containing compound 113.

[0034] As described in step S23, NO in the reaction chamber 101 x A plasma flame 114 is provided within the reaction chamber 101 to reduce greenhouse gases 112 so that the content is less than 200 ppm and by-products including HF are formed. In some embodiments of the present disclosure, the plasma power applied to the plasma torch 104b is maintained in a range between 6 kilowatts (KW) and 18 KW to generate the plasma flame 114 for reducing fluorine-containing and / or nitrogen-containing greenhouse gases 112.

[0035] To confirm the effect of introducing hydrogen-containing compounds 113 on the treatment of greenhouse gases 112, different single or multiple hydrogen-containing compounds 113 (e.g., CH4, H2, NH3) and / or methane-ammonia mixture (CH4 / NH3) are introduced into the reaction chamber 101. Then, the plasma flame 114 used to treat the greenhouse gases 112 containing SF6 creates an oxygen-poor / hydrogen-rich environment in the reaction chamber 101, and the DRE of the greenhouse gases 112 in the reaction chamber 110 is observed.

[0036] The test results are shown in FIG. 3 , which is a statistical histogram showing the DRE of the greenhouse gas 112 after different single or multiple types of hydrogen-containing compounds 113 are introduced into the reaction chamber 110 to react with the greenhouse gas 112 in the plasma according to one embodiment of the present disclosure. In contrast, without the introduction of the hydrogen-containing compounds 113, the DRE of the greenhouse gas 112 is only about 98%. After the introduction of different single types of hydrogen-containing compounds 113 into the reaction chamber 101, the DRE of the greenhouse gas 112 all reached 99% or more. This indicates that the method of treating the greenhouse gas 112 by introducing the hydrogen-containing compounds 113 and creating an oxygen-poor / hydrogen-rich environment in the reaction chamber 101 using the plasma flame 114 can further improve the DRE of the greenhouse gas 112.

[0037] Similarly, the effect of reducing the generation of secondary pollutants can be confirmed by introducing a hydrogen source compound 113 and forming an oxygen-poor / hydrogen-rich environment. In this case, different single or multiple hydrogen-containing compounds 113 (e.g., CH4, H2, NH3, and / or CH4 / NH3) are introduced into the reaction chamber 101, and an oxygen-poor / hydrogen-rich environment is formed in the reaction chamber 101 by the plasma flame 114 used to treat greenhouse gases 112 including SF6. The NO in the exhaust gas 115 after treatment is then reduced. x Observe changes in the content of (e.g., nitric oxide (NO)).

[0038] The test results are shown in FIG. 4. FIG. 4 is a statistical histogram showing the relative reduction rate of NO in the exhaust gas 115 after different single or multiple types of hydrogen-containing compounds 113 are introduced into the reaction chamber 101 and plasma-reacted with the greenhouse gas 112, according to one embodiment of the present disclosure. Compared to the condition where the hydrogen-containing compounds 113 are not introduced, the concentration of residual NO after the greenhouse gas 112 participates in the reaction with the plasma is much higher than the concentration under the condition where the hydrogen-containing compounds 113 (e.g., CH4, H2, NH3) and / or CH4 / NH3 are introduced to form an oxygen-poor / hydrogen-rich environment in the reaction chamber 101. In this embodiment, after the greenhouse gas 112 participates in the reaction with the plasma, the NO concentration rate is relatively reduced by approximately 36-86%. This indicates that the introduction of the hydrogen-containing compounds 113 to form an oxygen-poor / hydrogen-rich environment reduces the NO concentration in the reaction chamber 101. x This shows that the occurrence of

[0039] Referring to FIG. 5, FIG. 5 shows the NO in the exhaust gas 115 after different single or multiple hydrogen-containing compounds 113 (e.g., CH4, H2, NH3, and / or CH4 / NH3) are introduced into the reaction chamber 101 and reacted with the greenhouse gas 112 in the plasma. x 1 is a statistical histogram illustrating the relative increase and decrease in content of NO in the exhaust gas 115 after introducing additional CDA into the reaction chamber 101 to participate in the reaction under the same conditions. xThis is done using statistical histograms showing relative increases and decreases in content.

[0040] The test results in Figure 5 show that after adding CDA to participate in the reaction in the plasma, the NO x The content of NO is significantly increased. x The DRE of the NOx gas in the exhaust gas 115 is reduced due to the dilution of the equivalent concentration of hydrogen atoms in the reaction chamber 101. Furthermore, the oxygen-poor / hydrogen-rich environment created in the reaction chamber 101 reduces the NOx gas in the exhaust gas 115. x It was shown that the content can be reduced.

[0041] 6A and 6B, Fig. 6A is a statistical histogram illustrating the DRE of greenhouse gas 112 after different types of hydrogen-containing compounds 113 are introduced into reaction chamber 101 and reacted with greenhouse gas 112 in plasma to select a preferred plasma operating power from a range of 6 KW to 18 KW according to one embodiment of the present disclosure. Fig. 6B is a statistical histogram showing the NOx content in exhaust gas 115 under the same conditions.

[0042] The test results of FIGS. 6A and 6B show that, when the plasma power is in the range of 6 KW to 18 KW, it is preferable to obtain a better DRE (DRE>95%) of greenhouse gas 112 and NO. x The results show that the system can provide excellent performance under conditions of oxygen-poor / hydrogen-rich conditions, even achieving non-detectable results. This confirms that providing an oxygen-poor / hydrogen-rich environment can effectively treat greenhouse gases 112 and suppress the generation of secondary pollutants.

[0043] According to the above-described embodiment, a method for treating greenhouse gases and a system to which the method is applied are provided. By introducing a hydrogen-containing compound 113, an oxygen-poor / hydrogen-rich environment is created and maintained in the reaction chamber 101, and hydrogen radicals are generated from the hydrogen-containing compound 113 using a plasma flame 114, and the fluorine-containing and / or nitrogen-containing greenhouse gas 112 is reduced while suppressing the oxidation reaction of the greenhouse gas 112. This allows the greenhouse gas 112 to be efficiently removed, and secondary pollutants (NO x The DRE of greenhouse gases 112 in the reaction chamber 101 can be increased to 95% or more, and the NOx emissions in the reaction chamber 101 can be reduced. x The content can be reduced to 200 ppm or less.

[0044] While the invention has been described by way of example and in terms of a preferred embodiment(s), it is to be understood that the invention is not limited thereto. On the contrary, the invention is intended to cover various modifications and similar arrangements and procedures, and the scope of the appended claims should therefore be accorded the broadest interpretation so as to encompass all such modifications and similar arrangements and procedures. [Brief explanation of the drawings]

[0045] [Figure 1] FIG. 1 illustrates a greenhouse gas processing system according to one embodiment of the present disclosure. [Figure 2] 1 is a flowchart illustrating a method for treating greenhouse gases using a greenhouse gas treatment system according to an embodiment of the present disclosure. [Figure 3] 1 is a statistical histogram showing the DRE of a greenhouse gas after different hydrogen-containing compounds or compounds are introduced into a reaction chamber to react with the greenhouse gas in a plasma according to one embodiment of the present disclosure. [Figure 4] 1 is a statistical histogram illustrating the relative reduction of NO in exhaust gases after introducing different hydrogen-containing compounds or compounds into a reaction chamber for reaction with greenhouse gases in a plasma according to one embodiment of the present disclosure. [Figure 5] 1 is a statistical histogram showing the relative increase and decrease rates of NOx content in exhaust gases after introducing additional clean dry air (CDA) into the reaction chamber to participate in the reaction under the same conditions. [Figure 6A] 10 is a statistical histogram showing the DRE of a greenhouse gas after different single or multiple types of hydrogen-containing compounds are introduced into a reaction chamber and reacted with the greenhouse gas in a plasma to select a preferred plasma operating power from a range between 6 KW and 18 KW according to one embodiment of the present disclosure. [Figure 6B] 10 is a statistical histogram showing the NOx content in exhaust gas under the same conditions.

Claims

1. introducing a greenhouse gas represented by the chemical formula AB, wherein A is a fluorine atom (F) or a nitrogen atom (N), and B is an atom or group capable of forming a bond with said fluorine atom or said nitrogen atom, into a reaction chamber; introducing a hydrogen-containing compound into the reaction chamber; A plasma flame is supplied to the reaction chamber to reduce the greenhouse gas, and nitrogen oxides (NO ｘ and / or a time interval / space destruction removal efficiency (DRE) of the greenhouse gas in the reaction chamber is greater than 95%.

2. The greenhouse gas is sulfur hexafluoride (SF ６ ), carbon tetrafluoride (CF ４ ), nitrogen trifluoride (NF ３ ), trifluoromethane (CHF ３ ), tetrafluoroethylene (C ２ F ４ ), hexafluoroethane (C ２ F ６ ), octafluoropropane (C ３ F ８ ), hexafluorobutane, dienes (C ４ F ６ ), octafluorocyclobutane (c-C ４ F ８ ), octafluorotetrahydrofuran (C ４ F ８ O), octafluorocyclopentene (C ５ F ８ ), difluoromethane (CH ２ F ２ ), fluoromethane (CH ３ F), pentafluoroethane (C ２ HF ５ ), nitrous oxide (N ２ 10. The method of claim 1, comprising a compound or mixture selected from the group consisting of:

3. The greenhouse gas is nitrous oxide (N ２ O), 2. The method of claim 1, wherein the ratio of the fluorine atomic equivalent concentration or the nitrogen atomic equivalent concentration in the greenhouse gas to the hydrogen atomic equivalent concentration in the hydrogen-containing compound is 3.5 to 0.5 before the plasma flame is provided.

4. 4. The method of claim 3, wherein the DRE of the greenhouse gas in the reaction chamber during the time interval / space is greater than 95%.

5. N in the reaction chamber during the time interval / space ２ 5. The method of claim 4, wherein the DRE of O is greater than 60%.

6. The hydrogen-containing compound is hydrogen (H ２ ), water (H ２ O), hydrogen peroxide (H ２ O ２ ), methane (CH ４ ), ammonia (NH ３ ), urea ((NH ２ ) ２ CO.H. ２ O), aqueous ammonia (NH ４ 10. The method of claim 1, comprising a compound or mixture selected from the group consisting of: methyl methyl ether, methyl ether (OH), and any combination thereof.

7. 10. The method of claim 1, wherein the step of introducing the hydrogen-containing compound into the reaction chamber comprises gas injection, liquid injection, or mixed gas / liquid injection.

8. 8. The method of claim 7, wherein the step of introducing the hydrogen-containing compound into the reaction chamber comprises premixing the greenhouse gas with the hydrogen-containing compound prior to introduction into the reaction chamber, or introducing the hydrogen-containing compound alone into the reaction chamber.

9. 10. The method of claim 1, wherein the step of providing the plasma flame within the reaction chamber comprises maintaining plasma power applied to a plasma torch in a range between 6 kilowatts (KW) and 18 KW.

10. introducing a greenhouse gas represented by the chemical formula AB, wherein A is a fluorine atom (F) or a nitrogen atom (N), and B is an atom or group capable of forming a bond with said fluorine atom or said nitrogen atom, into a reaction chamber; introducing the hydrogen-containing compound into the reaction chamber so that the ratio of the fluorine atom equivalent concentration or the nitrogen atom equivalent concentration in the greenhouse gas to the hydrogen atom equivalent concentration in the hydrogen-containing compound is 3.5 to 0.5; providing a plasma flame in the reaction chamber to reduce the greenhouse gas, thereby reducing the greenhouse gas and producing by-products including hydrofluoric acid (HF).

11. The greenhouse gas is SF ６ , C.F. ４ , N.F. ３ , CHF ３ , C ２ F ４ , C ２ F ６ , C ３ F ８ , C ４ F ６ , c-C ４ F ８ , C ４ F ８ O.C. ５ F ８ , C.H. ２ F ２ , C.H. ３ F, C ２ HF ５ , N ２ 11. The method of claim 10, comprising a compound or mixture selected from the group consisting of O and any combination thereof.

12. The greenhouse gas is N ２ O and SF ６ 11. The method of claim 10, wherein the DRE of the greenhouse gas in the reaction chamber during the time interval / space is greater than 95%.

13. N in the reaction chamber during the time interval / space ２ 13. The method of claim 12, wherein the DRE of O is greater than 60%.

14. The hydrogen-containing compound is H ２ , H ２ O, H ２ O ２ , C.H. ４ , N.H. ３ , (NH ２ ) ２ CO.H. ２ O, N.H. ４ 11. The method of claim 10, comprising a compound or mixture selected from the group consisting of OH and any combination thereof.

15. The method of claim 10 , wherein introducing the hydrogen-containing compound into the reaction chamber comprises gas injection, liquid injection, or mixed gas / liquid injection.

16. 16. The method of claim 15, wherein introducing the hydrogen-containing compound into the reaction chamber comprises premixing the greenhouse gas with the hydrogen-containing compound prior to introduction into the reaction chamber, or introducing the hydrogen-containing compound alone into the reaction chamber.

17. 11. The method of claim 10, wherein the step of providing the plasma flame within the reaction chamber includes maintaining plasma power applied to a plasma torch in a range between 6 kW and 18 kW.

18. A reaction chamber; a greenhouse gas source for storing and introducing a greenhouse gas into the reaction chamber; a hydrogen-containing compound source used to store and introduce a hydrogen-containing compound into the reaction chamber so that the ratio of the fluorine atom equivalent concentration or the nitrogen atom equivalent concentration in the greenhouse gas to the hydrogen atom equivalent concentration in the hydrogen-containing compound is substantially 3.5 to 0.5; a plasma flame is used to supply a plasma flame to the reaction chamber to reduce the greenhouse gases, and NO ｘ a plasma source that produces by-products containing less than 200 ppm and / or including HF; A greenhouse gas treatment system comprising:

19. 20. The system of claim 18, further comprising a by-products cleaning module interconnected with the reaction chamber and used to clean the by-products.

20. 20. The system of claim 18, wherein the plasma source has a plasma power in the range of 6 KW to 18 KW.

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