Ammonia spraying method and device of photovoltaic glass kiln, electronic equipment and storage medium

Abstract

The embodiment of the invention provides an ammonia spraying method and device for a photovoltaic glass kiln, electronic equipment and a storage medium, and relates to the field of flue gas treatment, and the method comprises the steps that a fire exchange signal of a target kiln is obtained, and a preset fire exchange control period is started with the fire exchange signal as a time reference; wherein each fire changing control period comprises a plurality of control stages, and each control stage is configured with a preset ammonia spraying adjustment parameter; in any control stage in the fire changing control period, kiln operation parameters at the inlet of the target kiln are obtained in real time; calculating to obtain theoretical pure ammonia demand quantity according to the kiln operation parameters in combination with preset target nitrogen oxide emission concentration; according to the theoretical pure ammonia demand quantity and the ammonia spraying adjusting parameters corresponding to the current control stage, target ammonia water flow is obtained through calculation; and controlling an ammonia spraying regulating valve to perform ammonia spraying operation according to the target ammonia water flow. According to the application, the ammonia spraying amount can be accurately controlled in a time-sharing and segmented manner according to the fire exchange working condition of the photovoltaic glass kiln, so that the denitration efficiency is improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of flue gas treatment, in particular to an ammonia injection method and device for a photovoltaic glass kiln, an electronic device and a storage medium. BACKGROUND

[0002] The selective catalytic reduction technology is the mainstream process for removing nitrogen oxides in the flue gas treatment of a photovoltaic glass kiln. In this process, ammonia injection control as a core link undertakes the key function of accurately injecting ammonia into the flue gas to achieve efficient denitrification.

[0003] In the related art, the photovoltaic glass kiln has a special fire changing requirement, which leads to a sharp fluctuation of the combustion condition and the concentration of NOx in the flue gas. The existing ammonia injection control mode, such as adding a static mixer, increasing the size of the reactor or increasing the amount of catalyst, cannot dynamically adjust the ammonia injection amount to accurately match such fluctuations. This leads to excessive ammonia injection to reduce the concentration of NOx, thereby causing ammonia escape to exceed the standard, or to control ammonia escape, thereby causing NOx emission to exceed the standard, which seriously restricts the denitrification efficiency of production. SUMMARY

[0004] The present application provides an ammonia injection method and device for a photovoltaic glass kiln, an electronic device and a storage medium, which can accurately control the ammonia injection amount in time and in sections according to the fire changing condition of the photovoltaic glass kiln, thereby improving the denitrification efficiency.

[0005] To achieve the above-mentioned purpose, the first aspect of the present application provides an ammonia injection method for a photovoltaic glass kiln, comprising: obtaining a fire changing signal of a target kiln, and starting a preset fire changing control period based on the fire changing signal as a time reference; wherein each fire changing control period comprises a plurality of control stages, and each control stage is configured with a preset ammonia injection adjustment parameter; in any control stage in the fire changing control period, obtaining a kiln operation parameter at the entrance of the target kiln in real time; calculating a theoretical pure ammonia demand amount according to the kiln operation parameter and a preset target nitrogen oxide emission concentration; calculating a target ammonia water flow rate according to the theoretical pure ammonia demand amount and the ammonia injection adjustment parameter corresponding to the current control stage; controlling an ammonia injection regulating valve to perform ammonia injection operation according to the target ammonia water flow rate.

[0006] In some embodiments, the real-time acquisition of the kiln operation parameter at the entrance of the target kiln in any control stage in the fire changing control period comprises: The inlet nitrogen oxide concentration, the inlet flue gas flow, the inlet flue gas temperature, the inlet oxygen concentration and the inlet humidity are collected in real time by a plurality of sensors arranged at the inlet flue duct of the target kiln.

[0007] In some embodiments, the theoretical pure ammonia demand is calculated according to the kiln operation parameters and the preset target nitrogen oxide emission concentration, including: The standard dry flue gas amount is calculated according to the inlet flue gas flow, the inlet flue gas temperature and the inlet humidity. The standard inlet nitrogen oxide concentration is calculated according to the inlet nitrogen oxide concentration, the inlet oxygen concentration and the inlet humidity. The theoretical pure ammonia demand is calculated according to the standard dry flue gas amount, the standard inlet nitrogen oxide concentration and the target nitrogen oxide emission concentration.

[0008] In some embodiments, the theoretical pure ammonia demand is calculated according to the standard dry flue gas amount, the standard inlet nitrogen oxide concentration and the target nitrogen oxide emission concentration, including: The concentration difference between the standard inlet nitrogen oxide concentration and the target nitrogen oxide emission concentration is calculated. The concentration difference is multiplied by the standard dry flue gas amount, and then multiplied by a preset chemical reaction molar ratio to obtain the theoretical pure ammonia demand.

[0009] In some embodiments, the target ammonia water flow is calculated according to the theoretical pure ammonia demand and the ammonia injection adjustment parameter corresponding to the current control stage, including: The theoretical pure ammonia demand is multiplied by the ammonia injection adjustment parameter corresponding to the current control stage to obtain an adjusted pure ammonia demand. The target ammonia water flow is calculated according to the adjusted pure ammonia demand and a preset ammonia water concentration.

[0010] In some embodiments, the method further includes: The outlet nitrogen oxide concentration of the target kiln is obtained in real time. The outlet nitrogen oxide concentration is compared with the preset target nitrogen oxide emission concentration to obtain an outlet concentration deviation. The target ammonia water flow is adjusted according to the outlet concentration deviation to obtain a corrected target ammonia water flow. The ammonia injection adjustment valve is controlled to perform ammonia injection operation using the corrected target ammonia water flow.

[0011] In some embodiments, the ammonia injection adjustment valve is controlled to perform ammonia injection operation according to the target ammonia water flow, including: The actual ammonia injection flow rate output by the ammonia injection regulating valve is obtained in real time through an ammonia flow meter; The actual ammonia injection flow rate is compared with the target ammonia flow rate to obtain a flow rate deviation; In response to the flow rate deviation being greater than a preset control deviation value, the ammonia injection regulating valve is adjusted until the flow rate deviation is less than the control deviation value.

[0012] To achieve the above-mentioned purpose, a second aspect of the embodiment of the present application provides an ammonia injection device of a photovoltaic glass kiln, the device comprising: A first obtaining module is configured to obtain a firing change signal of a target kiln, and start a preset firing change control period based on the firing change signal as a time reference; wherein each firing change control period comprises a plurality of control stages, and each control stage is configured with a preset ammonia injection adjusting parameter; A second obtaining module is configured to obtain a kiln operation parameter at an entrance of a target kiln in real time in any control stage in the firing change control period; A first calculating module is configured to calculate a theoretical pure ammonia demand based on the kiln operation parameter and a preset target nitrogen oxide emission concentration; A second calculating module is configured to calculate a target ammonia flow rate based on the theoretical pure ammonia demand and the ammonia injection adjusting parameter corresponding to the current control stage; A control module is configured to control an ammonia injection regulating valve to perform an ammonia injection operation based on the target ammonia flow rate.

[0013] To achieve the above-mentioned purpose, a third aspect of the embodiment of the present application provides an electronic device, the electronic device comprising a memory and a processor, the memory storing a computer program, and the processor implementing the ammonia injection method of the photovoltaic glass kiln as described in the first aspect when executing the computer program.

[0014] To achieve the above-mentioned purpose, a fourth aspect of the embodiment of the present application provides a storage medium, the storage medium being a computer readable storage medium, the storage medium storing a computer program, and the computer program implementing the ammonia injection method of the photovoltaic glass kiln as described in the first aspect when executed by a processor.

[0015] The ammonia injection method of the photovoltaic glass kiln provided by the embodiment of the present application firstly obtains the fire switching signal of the target kiln, takes it as the time reference to start the fire switching control cycle containing multiple control stages, and associates the ammonia injection control logic with the periodic fluctuation of the kiln combustion condition; then, the kiln operation parameters are obtained in real time at each control stage, and the stoichiometric calculation is performed in combination with the target emission concentration to dynamically obtain the theoretical pure ammonia demand, so that the calculation of the required ammonia amount is based on the real-time working condition and the chemical reaction principle, rather than relying on the fixed experience value; next, the final target ammonia water flow is calculated by combining the theoretical pure ammonia demand with the preset ammonia injection adjustment parameter of the current control stage, so that the forward-looking adjustment of the ammonia injection amount is realized, and the technical problem that the traditional control mode cannot adapt to the fire switching condition and leads to the difficulty in stabilizing the nitrogen oxide emission and ammonia escape is effectively solved. In summary, the present application can accurately control the ammonia injection amount in time and in sections according to the fire switching condition of the photovoltaic glass kiln, realize the dynamic matching of the ammonia injection amount and the nitrogen oxide concentration, and further improve the denitration efficiency.

[0016] Other features and advantages of the present application will be set forth in the following description, and in part will become apparent to those skilled in the art from the description, or can be learned by practice of the present application. The objects and other advantages of the present application can be realized and attained by the structure particularly pointed out in the description, claims and drawings. BRIEF DESCRIPTION OF DRAWINGS

[0017] Figure 1 is a flow chart of the ammonia injection method of the photovoltaic glass kiln provided by an embodiment of the present application.

[0018] Figure 2 is a flow chart of the ammonia injection method of the photovoltaic glass kiln provided by another embodiment of the present application.

[0019] Figure 3 is a flow chart of the ammonia injection method of the photovoltaic glass kiln provided by another embodiment of the present application.

[0020] Figure 4 is a flow chart of the ammonia injection method of the photovoltaic glass kiln provided by another embodiment of the present application.

[0021] Figure 5 is a flow chart of the ammonia injection method of the photovoltaic glass kiln provided by another embodiment of the present application.

[0022] Figure 6 is a structural schematic diagram of the ammonia injection device of the photovoltaic glass kiln provided by an embodiment of the present application.

[0023] Figure 7 is a hardware structure schematic diagram of the electronic device provided by an embodiment of the present application. DETAILED DESCRIPTION

[0024] In order to make the purpose, technical scheme and advantages of the present application clearer, the present application will be further described in detail below with reference to the drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and not intended to limit the present application.

[0025] It should be noted that although the functional modules are divided in the device schematic diagram, and the logical sequence is shown in the flowchart, in some cases, the steps shown or described can be performed in a manner different from the module division in the device or the sequence in the flowchart.

[0026] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terms used herein are only for the purpose of describing the embodiments of the present application and are not intended to limit the present application.

[0027] Selective catalytic reduction technology is the mainstream process for removing nitrogen oxides in photovoltaic glass kiln flue gas treatment. In this process, ammonia injection control as the core link, it undertakes the key function of accurately spraying ammonia or ammonia into the flue gas to achieve efficient denitrification.

[0028] In the related art, photovoltaic glass kiln has special fire changing needs, which leads to sharp fluctuations in combustion conditions and NOx concentration in flue gas. The existing ammonia injection control mode, such as adding a static mixer, increasing the size of the reactor or increasing the amount of catalyst, cannot dynamically adjust the ammonia injection amount to accurately match such fluctuations. This leads to excessive ammonia injection to reduce NOx concentration, which in turn causes ammonia escape to exceed the standard, or to control ammonia escape, which leads to NOx emission exceeding the standard, seriously restricting the production denitrification efficiency.

[0029] In order to improve the denitrification efficiency, the embodiments of the present application obtain the fire changing signal of the target kiln as the time reference to start the fire changing control period containing multiple control stages, associate the ammonia injection control logic with the periodic fluctuations of the kiln combustion conditions; then, by real-time acquisition of kiln operating parameters in each control stage, and combining the target emission concentration, stoichiometric calculation is carried out to dynamically derive the theoretical pure ammonia demand, ensuring that the calculation of the required ammonia amount is based on real-time conditions and chemical reaction principles, rather than relying on fixed experience values. Next, by combining the theoretical pure ammonia demand with the preset ammonia injection adjustment parameters of the current control stage, the final target ammonia water flow is calculated, realizing the forward-looking adjustment of the ammonia injection amount, effectively solving the technical problem that the traditional control method cannot adapt to the fire changing conditions, leading to the difficulty of stable compliance of nitrogen oxides emission and ammonia escape. In summary, the present application can accurately control the ammonia injection amount in time and in stages according to the fire changing conditions of the photovoltaic glass kiln, realize the dynamic matching of the ammonia injection amount and the nitrogen oxides concentration, and thus improve the denitrification efficiency.

[0030] The ammonia injection method, device, electronic device and storage medium of the photovoltaic glass kiln provided by the embodiments of the present application will be further described below.

[0031] The ammonia injection method of the photovoltaic glass kiln in the embodiments of the present application will be specifically described below. Referring to FIG. 1, Figure 1 An optional flowchart of the ammonia injection method of the photovoltaic glass kiln provided by the embodiments of the present application is shown in FIG. 2. Figure 1 The method in FIG. 1 can include but is not limited to steps 101 to 105. It can be understood that the order of steps 101 to 105 in the embodiments is not specifically limited, and the order of steps can be adjusted or some steps can be reduced or added according to actual needs. Figure 1 The order of steps 101 to 105 in the embodiments is not specifically limited, and the order of steps can be adjusted or some steps can be reduced or added according to actual needs.

[0032] Step 101: Obtain the firing change signal of the target kiln, and start the preset firing control period based on the firing change signal as the time reference; wherein each firing control period includes multiple control stages, and each control stage is configured with preset ammonia injection adjustment parameters.

[0033] Step 102: Real-time obtain the kiln operation parameters at the entrance of the target kiln in any control stage within the firing control period.

[0034] Step 103: Calculate the theoretical pure ammonia demand according to the kiln operation parameters and the preset target nitrogen oxide emission concentration.

[0035] Step 104: Calculate the target ammonia water flow according to the theoretical pure ammonia demand and the ammonia injection adjustment parameters corresponding to the current control stage.

[0036] Step 105: Control the ammonia injection regulating valve to perform ammonia injection operation according to the target ammonia water flow.

[0037] In step 101 of some embodiments, a first signal of a switch is obtained from the combustion control unit of the target kiln, which is a key time trigger mark indicating that the kiln is about to or is in the process of switching the left and right fire. Once this switch signal is obtained, the pre-set switch control period is started from this point. The switch control period corresponds to the length of time of a complete combustion switching process of the kiln, for example, a 20-minute period. For example, this period can be divided into six stages, such as: preparation period, low fluctuation period, high fluctuation period, high stability period, low stability period and transition period. One or more ammonia injection adjustment parameters are pre-configured for each control stage, which is a factor or a value for correcting the ammonia injection amount, representing the pre-set strategy for adjusting the ammonia amount in the specific stage. For example, in a specific embodiment, the duration of the preparation period can be set to 60 seconds, and the corresponding ammonia injection adjustment parameter can be set to a coefficient of 0.9; the duration of the low fluctuation period can be set to 30 seconds, and the corresponding ammonia injection adjustment parameter can be set to a coefficient of 0.4 to cope with the low NOx concentration condition in this stage; and the ammonia injection adjustment parameters of the high fluctuation period, the high stability period, the low stability period and the transition period can all be set to 0.9, and their respective durations can also be configured accordingly In step 102 of some embodiments, during any control stage in the switch control period started in step 101, a series of kiln operating parameters are continuously and real-time collected by the multiple sensors deployed at the inlet flue of the target kiln. These kiln operating parameters are dynamic data reflecting the current kiln combustion condition and the original state of the flue gas. These parameters specifically include inlet nitrogen oxide concentration, inlet flue gas flow, inlet flue gas temperature, inlet oxygen concentration and inlet humidity. Among them, the inlet nitrogen oxide concentration and the inlet flue gas flow are the core basis for calculating the total amount of nitrogen oxides; while the inlet flue gas temperature, the inlet oxygen concentration and the inlet humidity are indispensable correction parameters for subsequent stoichiometric calculation, which are used to convert the measured value (wet basis) under actual working conditions into the concentration value (dry basis) under standard state, to ensure the accuracy of subsequent theoretical pure ammonia demand calculation.

[0038] In step 103 of some embodiments, stoichiometric calculation is performed by using the kiln operating parameters obtained in step 102 and combining a pre-set target nitrogen oxide emission concentration. The target nitrogen oxide emission concentration is the maximum NOx content allowed at the flue gas outlet as specified by environmental regulations or process standards, and is a control target value expected to be achieved. By comparing the real-time inlet parameters with this target value and combining the total flue gas volume, a theoretical pure ammonia demand is calculated according to the chemical reaction equilibrium principle of selective catalytic reduction (SCR). The theoretical pure ammonia demand represents the mass of pure ammonia required to participate in the reaction to reduce the inlet NOx concentration to the target emission concentration under the current operating conditions.

[0039] Referring to Figure 2 In some embodiments, step 103 can include, but is not limited to, steps 201 to 202.

[0040] In step 201, the standard dry flue gas volume is calculated based on the inlet flue gas flow, inlet flue gas temperature and inlet humidity.

[0041] In step 202, the standard inlet nitrogen oxide concentration is calculated based on the inlet nitrogen oxide concentration, inlet oxygen concentration and inlet humidity.

[0042] In step 203, the theoretical pure ammonia demand is calculated based on the standard dry flue gas volume, standard inlet nitrogen oxide concentration and target nitrogen oxide emission concentration.

[0043] In step 201 of some embodiments, based on the real-time obtained inlet flue gas flow, inlet flue gas temperature and inlet humidity data, a standard operating condition conversion is performed to calculate the standard dry flue gas volume. The inlet flue gas flow is a directly measured volume flow (i.e. wet basis flow) at the actual temperature and humidity, while the standard dry flue gas volume is a normalized flow value under a unified reference (e.g. 0°C, 1 standard atmosphere, dry state). This conversion is based on the gas state equation, which requires the use of absolute temperature scale (unit: Kelvin, K) rather than Celsius temperature scale (unit: °C). Absolute zero corresponds to -273.15°C, so standard temperature 0°C corresponds to 273.15K. In engineering calculations, it is often approximated to 273. If the inlet flue gas flow is defined as , the inlet flue gas temperature is (unit: °C), and the inlet humidity is , a specific calculation method for the standard dry flue gas volume is as follows:

[0044] The purpose of this calculation is to eliminate the direct influence of the fluctuation of flue gas temperature and moisture content on the gas volume, so as to provide a stable and comparable flue gas benchmark quantity for subsequent material balance calculation.

[0045] In step 202 of some embodiments, based on the real-time obtained inlet nitrogen oxide concentration, inlet oxygen concentration and inlet humidity data, a calibration concentration conversion is carried out to calculate the standard inlet nitrogen oxide concentration. The directly measured inlet nitrogen oxide concentration is affected by the dilution of excess air (represented by oxygen concentration) and moisture in the flue gas. Therefore, the standard inlet nitrogen oxide concentration is a concentration value converted by a specific algorithm, which eliminates the dilution effect of excess oxygen and moisture, and is calibrated with a unified reference oxygen content, such as the commonly used 8% reference oxygen content of photovoltaic glass kiln. If the inlet nitrogen oxide concentration is defined as , the inlet oxygen concentration is (volumetric fraction), and the inlet humidity is , the standard inlet nitrogen oxide concentration One specific calculation method is:

[0046] Wherein, 21% represents the volume percentage of oxygen in air.

[0047] In step 203 of some embodiments, the standard dry flue gas quantity calculated in step 201, the standard inlet nitrogen oxide concentration calculated in step 202, and the pre-set target nitrogen oxide emission concentration are combined to finally calculate the theoretical pure ammonia demand . This calculation first subtracts the standard inlet nitrogen oxide concentration from the target nitrogen oxide emission concentration to obtain the net concentration value of nitrogen oxide that needs to be removed; then, this net concentration value is multiplied by the standard dry flue gas quantity to obtain the total mass of nitrogen oxide that needs to be removed per unit time; finally, according to the chemical reaction equation of selective catalytic reduction (SCR), the total mass of nitrogen oxide that needs to be removed is converted to the mass of pure ammonia (NH3) necessary to achieve this removal target according to the fixed chemical reaction molar ratio. For example, the molecular weight of NOx (usually calculated as ) is approximately 46, and the molecular weight of NH3 is approximately 17, and the calculation formula is:

[0048] By the above steps 201 to 203, the embodiment of the application eliminates the interference of temperature, humidity and oxygen content fluctuations in actual working conditions on the calculation reference by first standardizing and converting the measured wet basis flow and concentration, and obtains a standard state total amount of pollutants reflecting the real combustion situation; subsequently, the theoretical mass of the chemical reactant (pure ammonia) required to achieve the target is derived by stoichiometric calculation of the standard total amount and the preset emission target. This calculation method based on first principles (chemical reactions) provides a more accurate, reliable and real-time ammonia demand benchmark compared to traditional lag feedback control or empirical value estimation.

[0049] In step 104 of some embodiments, the theoretical pure ammonia demand calculated in step 103 is combined with the ammonia injection adjustment parameter configured for the specific control phase (from step 101) currently in place. The purpose of this operation is to use the preset adjustment parameter to make a forward-looking correction or optimization of the purely theoretical calculation value. For example, in a control phase known to have low reaction efficiency, the corresponding ammonia injection adjustment parameter may actively lower the theoretical value to prevent ammonia escape. Through this combined operation and further considering the actual concentration of the ammonia water solution used (for example, 25% ammonia water), a target ammonia water flow is finally calculated. This target ammonia water flow is a specific instruction value representing the volume or mass flow of ammonia water solution that needs to be actually injected into the flue through the valve at the next moment.

[0050] Please refer to Figure 3 In some embodiments, step 104 can include, but is not limited to, steps 301 to 302.

[0051] Step 301, multiply the theoretical pure ammonia demand by the ammonia injection adjustment parameter corresponding to the control phase currently in place to obtain the adjusted pure ammonia demand.

[0052] Step 302, calculate the target ammonia water flow according to the adjusted pure ammonia demand and the preset ammonia water concentration.

[0053] In step 301 of some embodiments, the theoretical pure ammonia demand calculated in step 103 is combined with the ammonia injection adjustment parameter configured for the current specific control stage (from step 101). This ammonia injection adjustment parameter is a key feedforward control factor, such as a coefficient of 0.4 or 0.9, representing a preset strategy for adjusting the ammonia quantity within this specific stage. The purpose of this step is to proactively and forward-lookingly correct the purely theoretical calculation value using preset expert experience or historical data. For example, during a "low-fluctuation period" with extremely low NOx concentrations, even if the theoretical pure ammonia demand may still be high due to measurement lag, the low coefficient of 0.4 configured in this stage will proactively and significantly reduce the ammonia injection quantity, thereby preventing ammonia escape due to excessive ammonia injection in advance.

[0054] In step 302 of some embodiments, the final target ammonia flow rate is calculated based on the adjusted pure ammonia demand obtained in step 301 and a preset ammonia concentration value. The adjusted pure ammonia demand is a mass unit (e.g., kg / h) of pure NH3 demand, while the target ammonia flow rate is a volumetric or mass flow rate unit (e.g., L / h or kg / h) of execution command value. Essentially, this step is a unit conversion. For example, if the adjusted pure ammonia demand is 1 kg / h and the preset ammonia concentration is 25% (weight percentage), the calculated target ammonia flow rate is 1 / 0.25 = 4 kg / h. This step converts a chemical reaction demand into an engineering command value that can be directly operated by a physical actuator (such as an ammonia injection regulating valve).

[0055] Through steps 301 to 302 described above, this embodiment combines the theoretical value calculated based on chemical principles with a preset adjustment strategy based on operating condition characteristics. Step 301, through feedforward adjustment parameters, achieves proactive optimization of the theoretically calculated value, ensuring that the ammonia injection quantity is not only based on the current real-time operating conditions but also anticipates and adapts to known fluctuations that will occur during the fire-changing cycle. Step 302 accurately converts the optimized chemical demand into physical execution instructions, providing an executable control basis for achieving precise ammonia injection.

[0056] In step 105 of some embodiments, the ammonia injection regulating valve is controlled according to the final target ammonia flow rate calculated in step 104. This ammonia injection regulating valve is a precision fluid control valve, such as an electro-proportional valve or regulating valve, installed on the ammonia supply pipeline. The opening degree of the ammonia injection regulating valve is precisely adjusted by changing the control signal applied to this valve. The change in valve opening directly changes the actual ammonia injection flow rate, making it as equal to or close as possible to the calculated target ammonia flow rate, thereby completing one ammonia injection operation.

[0057] Please see Figure 4In some embodiments, step 105 may include, but is not limited to, steps 401 to 403.

[0058] Step 401: Obtain the actual ammonia injection flow rate output by the ammonia injection regulating valve in real time through the ammonia water flow meter.

[0059] Step 402: Compare the actual ammonia injection flow rate with the target ammonia water flow rate to obtain the flow rate deviation.

[0060] Step 403: In response to the flow deviation being greater than the preset control deviation value, adjust the ammonia injection regulating valve until the flow deviation is less than the control deviation value.

[0061] In step 401 of some embodiments, to ensure the accurate execution of the ammonia injection operation, an ammonia flow meter can be installed in the downstream pipeline of the ammonia injection regulating valve. This ammonia flow meter monitors the liquid flow through the valve in real time and generates a feedback signal representing the actual ammonia injection flow. This actual ammonia injection flow is the physically actual amount of ammonia injected. It may deviate from the commanded value due to factors such as pipeline pressure fluctuations and valve mechanical errors, so it must be acquired in real time as the basis for closed-loop control.

[0062] In step 402 of some embodiments, the actual ammonia injection flow rate obtained in real time in step 401 is compared with the target ammonia flow rate calculated in step 104, and the result is defined as the flow deviation. This flow deviation is an instantaneous value that quantifies the difference between the actual performance of the valve and the desired control command. For example, if the target ammonia flow rate is 5.0 L / h and the actual ammonia injection flow rate is 4.8 L / h, a flow deviation of +0.2 L / h will occur, and this deviation value will be used as the basis for the next control adjustment.

[0063] In step 403 of some embodiments, the absolute value of the flow deviation obtained in step 402 is compared with a preset control deviation value. The preset control deviation value is a tolerance threshold set to ensure operational stability and prevent frequent valve oscillations due to minor disturbances. When the absolute value of the flow deviation is greater than this preset control deviation value, an adjustment action is triggered. This adjustment action is performed by changing the control signal sent to the ammonia injection regulating valve to increase or decrease its opening, bringing it closer to the target ammonia flow rate. This comparison and adjustment process is continuously cyclically executed until the actual ammonia injection flow rate is adjusted to within the tolerance range of the target ammonia flow rate (i.e., the flow deviation is less than or equal to the control deviation value).

[0064] Through steps 401 to 403 described above, this embodiment of the application introduces real-time feedback of the actual ammonia injection flow rate and compares it with the target value to generate a flow deviation. This deviation is then used to drive the ammonia injection regulating valve in reverse. This method can effectively overcome physical interferences such as pipeline pressure fluctuations, valve nonlinearity, or environmental changes. This ensures that the target ammonia flow rate obtained in step 104 can be accurately executed by the ammonia injection regulating valve, thereby guaranteeing the final control effect and accuracy of the entire precision ammonia injection strategy.

[0065] Please see Figure 5 In some embodiments, the method provided in this application may further include, but is not limited to, steps 501 to 504.

[0066] Step 501: Obtain the nitrogen oxide concentration at the outlet of the target kiln in real time.

[0067] Step 502: Compare the outlet nitrogen oxide concentration with the preset target nitrogen oxide emission concentration to obtain the outlet concentration deviation.

[0068] Step 503: Adjust the target ammonia flow rate according to the outlet concentration deviation to obtain the corrected target ammonia flow rate.

[0069] Step 504: Use the modified target ammonia flow rate to control the ammonia injection regulating valve to perform ammonia injection operation.

[0070] In step 501 of some embodiments, while performing the ammonia injection operation, the nitrogen oxide concentration at the outlet of the target kiln is also acquired in real time using a nitrogen oxide detector deployed at the outlet flue of the denitrification reactor. This outlet nitrogen oxide concentration is the actual concentration of pollutants before they are finally emitted into the atmosphere after ammonia injection and catalytic reduction reaction.

[0071] In step 502 of some embodiments, the outlet nitrogen oxide concentration obtained in real time in step 501 is dynamically compared with the preset target nitrogen oxide emission concentration used in step 103 to obtain the outlet concentration deviation. The outlet concentration deviation quantifies the gap between the actual emission result and the expected target. For example, if the target is 50 mg / Nm³, but the actual measured value is 55 mg / Nm³, a deviation of +5 mg / Nm³ will occur, indicating that the current ammonia injection rate is slightly insufficient.

[0072] In step 503 of some embodiments, the target ammonia flow rate calculated in step 104 is adjusted based on the outlet concentration deviation obtained in step 502. This adjustment process is typically implemented using a feedback controller, such as a PID controller. The controller calculates a correction value based on the magnitude, duration, and rate of change of the outlet concentration deviation. This correction value is then added to the original target ammonia flow rate to form a corrected target ammonia flow rate. The purpose of this step is to compensate for factors that were not fully modeled in previous steps, such as a slow decline in catalyst activity, slight drift of the measurement sensor, or inherent errors in the model calculation.

[0073] In step 504 of some embodiments, the corrected target ammonia flow rate formed in step 503 is used as a new control command to replace the original target ammonia flow rate in order to execute the ammonia injection regulating valve control operation in step 105. The subsequent ammonia injection regulating valve will track this command value corrected by outlet concentration feedback. This step ensures that the final physical execution is based on a command that has taken into account actual emission results and undergone closed-loop correction, thereby making the control more precise.

[0074] Through steps 501 to 504 above, this embodiment of the application adds a feedback control loop based on the outlet nitrogen oxide concentration to the feedforward control constructed in steps 101 to 104. This feedback loop is used to globally calibrate and adjust the overall effect of the feedforward control, so that this method can both respond quickly to the drastic and large-amplitude NOx fluctuations caused by the ignition switching condition through feedforward, and slowly correct and eliminate the small and slowly changing steady-state errors caused by factors such as model inaccuracy, operating condition drift, or catalyst aging through feedback, thereby ensuring that the ammonia injection control can respond quickly and accurately meet the standards in long-term operation.

[0075] Through steps 101 to 105 above, this embodiment of the application acquires the fire-switching signal of the target kiln and uses it as a time reference to initiate a fire-switching control cycle containing multiple control stages, strongly correlating the ammonia injection control logic with the periodic and drastic fluctuations in the kiln's combustion conditions. By acquiring the kiln's operating parameters in real time at each control stage and combining them with the target emission concentration, a stoichiometric calculation is performed to dynamically derive the theoretical pure ammonia requirement, ensuring that the calculation of the required ammonia amount is based on real-time operating conditions and chemical reaction principles, rather than relying on lagging fixed empirical values. By combining this theoretical pure ammonia requirement with the preset ammonia injection adjustment parameters for the current control stage, the final target ammonia flow rate is calculated, achieving proactive adjustment of the ammonia injection amount. For example, during periods of extremely low NOx concentration fluctuations, the ammonia injection amount can be proactively and significantly reduced through preset low ammonia injection adjustment parameters, thereby accurately matching the instantaneous fluctuations in NOx. This method effectively solves the technical problem that traditional control methods cannot adapt to fire-switching conditions, leading to difficulties in achieving stable bidirectional compliance with NOx emissions and ammonia escape standards. This application enables precise time-segmented and segmented control of ammonia injection volume for the fire-changing operation of photovoltaic glass furnaces, thereby improving denitrification efficiency.

[0076] This application also provides an ammonia injection device for a photovoltaic glass furnace, which can realize the above-mentioned ammonia injection method for photovoltaic glass furnaces, as described above. Figure 6 The device includes: The first acquisition module is used to acquire the fire switching signal of the target kiln and start a preset fire switching control cycle based on the fire switching signal; wherein, each fire switching control cycle includes multiple control stages, and each control stage is configured with preset ammonia injection adjustment parameters. The second acquisition module is used to acquire the kiln operating parameters at the inlet of the target kiln in real time during any control stage within the fire switching control cycle. The first calculation module is used to calculate the theoretical pure ammonia demand based on the kiln operating parameters and the preset target nitrogen oxide emission concentration. The second calculation module is used to calculate the target ammonia flow rate based on the theoretical pure ammonia demand and the ammonia injection adjustment parameters corresponding to the current control stage. The control module is used to control the ammonia injection regulating valve to perform ammonia injection operation according to the target ammonia water flow rate.

[0077] In the above embodiments, the descriptions of each embodiment have different focuses. For parts not described in detail in a certain embodiment, the specific implementation of the ammonia injection device for the photovoltaic glass furnace is basically the same as the specific implementation of the ammonia injection method for the photovoltaic glass furnace described above, and will not be repeated here.

[0078] This application also provides an electronic device, including: At least one memory; At least one processor; At least one program; The program is stored in a memory, and the processor executes the at least one program to implement the ammonia injection method for the photovoltaic glass furnace described above in this application. The electronic device can be any smart terminal, including mobile phones, tablets, personal digital assistants (PDAs), in-vehicle computers, etc.

[0079] Please see Figure 7 , Figure 7 The hardware structure of an electronic device according to another embodiment is illustrated. The electronic device includes: The processor 701 can be implemented using a general-purpose CPU (Central Processing Unit), microprocessor, application-specific integrated circuit (ASIC), or one or more integrated circuits, and is used to execute relevant programs to implement the technical solutions provided in the embodiments of this application. The memory 702 can be implemented in the form of ROM (Read-Only Memory), static storage device, dynamic storage device, or RAM (Random Access Memory). The memory 702 can store the operating system and other application programs. When the technical solutions provided in the embodiments of this specification are implemented through software or firmware, the relevant program code is stored in the memory 702 and is called and executed by the processor 701 to execute the ammonia injection method for the photovoltaic glass furnace of the embodiments of this application. The input / output interface 703 is used to implement information input and output; The communication interface 704 is used to enable communication and interaction between this device and other devices. Communication can be achieved through wired means (such as USB, Ethernet cable, etc.) or wireless means (such as mobile network, WIFI, Bluetooth, etc.). Bus 705 transmits information between various components of the device (e.g., processor 701, memory 702, input / output interface 703, and communication interface 704); The processor 701, memory 702, input / output interface 703, and communication interface 704 are connected to each other within the device via bus 705.

[0080] This application embodiment also provides a storage medium, which is a computer-readable storage medium, storing a computer program that, when executed by a processor, implements the above-described ammonia injection method for a photovoltaic glass furnace.

[0081] Memory, as a non-transitory computer-readable storage medium, can be used to store non-transitory software programs and non-transitory computer-executable programs. Furthermore, memory may include high-speed random access memory, and may also include non-transitory memory, such as at least one disk storage device, flash memory device, or other non-transitory solid-state storage device. In some embodiments, memory may optionally include memory remotely located relative to the processor, and these remote memories can be connected to the processor via a network. Examples of such networks include, but are not limited to, the Internet, intranets, local area networks, mobile communication networks, and combinations thereof.

[0082] The embodiments described in this application are for the purpose of more clearly illustrating the technical solutions of the embodiments of this application, and do not constitute a limitation on the technical solutions provided by the embodiments of this application. As those skilled in the art will know, with the evolution of technology and the emergence of new application scenarios, the technical solutions provided by the embodiments of this application are also applicable to similar technical problems.

[0083] Those skilled in the art will understand that the technical solutions shown in the figures do not constitute a limitation on the embodiments of this application, and may include more or fewer steps than shown, or combine certain steps, or different steps.

[0084] The device embodiments described above are merely illustrative. The units described as separate components may or may not be physically separate; that is, they may be located in one place or distributed across multiple network units. Some or all of the modules can be selected to achieve the purpose of this embodiment according to actual needs.

[0085] Those skilled in the art will understand that all or some of the steps in the methods disclosed above, as well as the functional modules / units in the systems and devices, can be implemented as software, firmware, hardware, or suitable combinations thereof.

[0086] The terms “first,” “second,” “third,” “fourth,” etc. (if present) in the specification and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of this application described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms “comprising” and “having,” and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0087] It should be understood that in this application, "at least one (item)" means one or more, and "more than" means two or more. "And / or" is used to describe the relationship between related objects, indicating that three relationships can exist. For example, "A and / or B" can represent three cases: only A exists, only B exists, and both A and B exist simultaneously, where A and B can be singular or plural. The character " / " generally indicates that the preceding and following related objects are in an "or" relationship. "At least one (item) of the following" or similar expressions refer to any combination of these items, including any combination of single or plural items. For example, at least one (item) of a, b, or c can represent: a, b, c, "a and b", "a and c", "b and c", or "a and b and c", where a, b, and c can be single or multiple.

[0088] In the several embodiments provided in this application, it should be understood that the disclosed apparatus and methods can be implemented in other ways. For example, the apparatus embodiments described above are merely illustrative; for instance, the division of the units described above is only a logical functional division, and in actual implementation, there may be other division methods. For example, multiple units or components may be combined or integrated into another system, or some features may be ignored or not executed. The coupling or direct coupling or communication connection between the shown or discussed units may be through some interfaces, or indirect coupling or communication connection between the apparatus or units, and may be electrical, mechanical, or other forms.

[0089] The units described above as separate components may or may not be physically separate. The components shown as units may or may not be physical units; that is, they may be located in one place or distributed across multiple network units. Some or all of the units can be selected to achieve the purpose of this embodiment according to actual needs.

[0090] Furthermore, the functional units in the various embodiments of this application can be integrated into one processing unit, or each unit can exist physically separately, or two or more units can be integrated into one unit. The integrated unit can be implemented in hardware or as a software functional unit.

[0091] If the integrated unit is implemented as a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of this application, in essence, or the part that contributes to the prior art, or all or part of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes multiple instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute all or part of the steps of the methods of the various embodiments of this application. The aforementioned storage medium includes various media capable of storing programs, such as USB flash drives, portable hard drives, read-only memory (ROM), random access memory (RAM), magnetic disks, or optical disks.

[0092] The preferred embodiments of the present application have been described above with reference to the accompanying drawings, but this does not limit the scope of the claims of the present application. Any modifications, equivalent substitutions, and improvements made by those skilled in the art without departing from the scope and substance of the embodiments of the present application shall be within the scope of the claims of the present application.

Claims

1. A method for injecting ammonia into a photovoltaic glass furnace, characterized in that, include: The target kiln fire-switching signal is acquired, and a preset fire-switching control cycle is started using the fire-switching signal as a time reference; wherein, each fire-switching control cycle includes multiple control stages, and each control stage is configured with preset ammonia injection adjustment parameters. During any of the control phases within the fire switching control cycle, the kiln operating parameters at the target kiln inlet are acquired in real time. The theoretical pure ammonia demand is calculated based on the kiln operating parameters and the preset target nitrogen oxide emission concentration. The target ammonia flow rate is calculated based on the theoretical pure ammonia demand and the ammonia injection adjustment parameters corresponding to the current control stage. The ammonia injection operation is performed by controlling the ammonia injection regulating valve according to the target ammonia water flow rate.

2. The ammonia injection method for a photovoltaic glass furnace according to claim 1, characterized in that, During any of the control phases within the fire switching control cycle, the kiln operating parameters at the target kiln inlet are acquired in real time, including: Multiple sensors deployed at the inlet flue of the target kiln are used to collect in real time the inlet nitrogen oxide concentration, inlet flue gas flow rate, inlet flue gas temperature, inlet oxygen concentration, and inlet humidity.

3. The ammonia injection method for a photovoltaic glass furnace according to claim 2, characterized in that, The calculation of the theoretical pure ammonia demand based on the kiln operating parameters and a preset target nitrogen oxide emission concentration includes: The standard dry flue gas volume is calculated based on the inlet flue gas flow rate, the inlet flue gas temperature, and the inlet humidity. The standard inlet nitrogen oxide concentration is calculated based on the inlet nitrogen oxide concentration, the inlet oxygen concentration, and the inlet humidity. The theoretical pure ammonia requirement is calculated based on the standard dry flue gas volume, the standard inlet nitrogen oxide concentration, and the target nitrogen oxide emission concentration.

4. The ammonia injection method for a photovoltaic glass furnace according to claim 3, characterized in that, The calculation of the theoretical pure ammonia requirement based on the standard dry flue gas volume, the standard inlet nitrogen oxide concentration, and the target nitrogen oxide emission concentration includes: Calculate the concentration difference between the standard inlet nitrogen oxide concentration and the target nitrogen oxide emission concentration; Multiply the concentration difference by the standard dry flue gas volume, and then multiply by the preset chemical reaction molar ratio to obtain the theoretical pure ammonia requirement.

5. The ammonia injection method for a photovoltaic glass furnace according to claim 1, characterized in that, The step of calculating the target ammonia flow rate based on the theoretical pure ammonia demand and the ammonia injection adjustment parameters corresponding to the current control stage includes: Multiply the theoretical pure ammonia demand by the ammonia injection adjustment parameter corresponding to the current control stage to obtain the adjusted pure ammonia demand. The target ammonia flow rate is calculated based on the adjusted pure ammonia demand and the preset ammonia concentration.

6. The ammonia injection method for a photovoltaic glass furnace according to claim 1, characterized in that, The method further includes: The nitrogen oxide concentration at the outlet of the target kiln is acquired in real time. The outlet nitrogen oxide concentration is compared with the preset target nitrogen oxide emission concentration to obtain the outlet concentration deviation; Based on the outlet concentration deviation, the target ammonia flow rate is adjusted to obtain the corrected target ammonia flow rate; The ammonia injection operation is performed by controlling the ammonia injection regulating valve using the modified target ammonia flow rate.

7. The ammonia injection method for a photovoltaic glass furnace according to claim 1, characterized in that, The step of controlling the ammonia injection regulating valve to perform ammonia injection operation according to the target ammonia water flow rate includes: The actual ammonia injection flow rate output by the ammonia injection regulating valve is obtained in real time using an ammonia water flow meter. The actual ammonia injection flow rate is compared with the target ammonia water flow rate to obtain the flow rate deviation; In response to the flow deviation being greater than a preset control deviation value, the ammonia injection regulating valve is adjusted until the flow deviation is less than the control deviation value.

8. An ammonia injection device for a photovoltaic glass furnace, characterized in that, The device includes: The first acquisition module is used to acquire the fire switching signal of the target kiln and start a preset fire switching control cycle based on the fire switching signal; wherein, each fire switching control cycle includes multiple control stages, and each control stage is configured with preset ammonia injection adjustment parameters. The second acquisition module is used to acquire the kiln operating parameters at the inlet of the target kiln in real time during any of the control stages within the fire switching control cycle. The first calculation module is used to calculate the theoretical pure ammonia demand based on the kiln operating parameters and the preset target nitrogen oxide emission concentration. The second calculation module is used to calculate the target ammonia flow rate based on the theoretical pure ammonia demand and the ammonia injection adjustment parameters corresponding to the current control stage. The control module is used to control the ammonia injection regulating valve to perform ammonia injection operation according to the target ammonia water flow rate.

9. An electronic device, characterized in that, The device includes a memory and a processor, the memory storing a computer program, characterized in that the processor executes the computer program to implement the ammonia injection method for the photovoltaic glass furnace according to any one of claims 1 to 7.

10. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by the processor, it implements the ammonia injection method for the photovoltaic glass furnace according to any one of claims 1 to 7.

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