Dual plenum showerhead with center to edge adjustment

Abstract

A dual zone process gas distribution showerhead is disclosed. In at least one embodiment, the dual zone showerhead includes an inner zone and an outer zone surrounding the inner zone. At least a first plenum is in the first zone and is coupled to a first gas inlet port. In at least one embodiment, the outer zone includes at least a second plenum coupled to a second gas inlet port. In at least one embodiment, the first plenum is coupled to a first plurality of apertures in the inner zone. In at least one embodiment, the second plenum is coupled to a second plurality of apertures in the outer zone.

Description

[Background technology]

[0001] [Priority claim] This application claims the benefit of priority to U.S. Provisional Application No. 63 / 269,532, filed March 17, 2022, and entitled "Dual Plenum Showerhead With Center To Edge Tunability," which is incorporated by reference in its entirety.

[0002] Process tools are used to deposit and etch films on substrates such as semiconductor wafers. For example, deposition may be performed to deposit conductive, dielectric, or other types of films using chemical vapor deposition (CVD), plasma-enhanced CVD (PECVD), atomic layer deposition (ALD), plasma-enhanced ALD (PEALD), and / or other deposition processes. Deposition may be performed in a wafer process tool, such as a PECVD tool. Other processes, such as plasma etch processes, may also be performed in a wafer processing tool with appropriate gases. A process tool may include multiple stations for processing multiple wafers at a time. The process may be performed in a vacuum chamber maintained at a high vacuum.

[0003] A process tool may include a process gas distribution manifold known as a showerhead (so named because of its resemblance to a household showerhead). The showerhead allows for the distribution of process gases into a vacuum chamber of the process tool. The process gases may be directed to a wafer positioned below the showerhead, which is typically mounted on a wafer pedestal. Currently, process showerheads may emit one or more process gases at a uniform flow rate across the diameter of the showerhead. It may be desirable to regulate the flow rate of a process gas or process gases by providing a separate gas delivery system within the same showerhead. [Brief description of the drawings]

[0004] The materials described herein are illustrative and not limited by the accompanying drawings. For simplicity and clarity of illustration, elements shown in the drawings are not necessarily drawn to scale. For example, dimensions of some elements may be exaggerated relative to other elements for clarity. Also, various physical features may be represented in simplified "ideal" forms and shapes for clarity of discussion, but it should nevertheless be understood that actual embodiments may only approximate the illustrated ideals. For example, smooth surfaces and square intersections may be depicted while ignoring the finite roughness, corner rounding, and imperfect corner intersection characteristics characteristic of structures formed by nanofabrication techniques. Additionally, where considered appropriate, reference labels have been repeated between the figures to indicate corresponding or similar elements.

[0005] [Figure 1A] FIG. 1A is a cross-sectional view in the xz plane of a dual-zone, dual plenum gas distribution showerhead according to at least one embodiment.

[0006] [Figure 1B] FIG. 1B is a cross-sectional view in the yz plane of the dual-zone, dual plenum showerhead shown in FIG. 1A according to at least one embodiment.

[0007] [Figure 1C] FIG. 1C is a cross-sectional view in the xz plane of a dual-zone, quadruple plenum process gas distribution showerhead according to at least one embodiment.

[0008] [Figure 2A] FIG. 2A is a cross-sectional view in the xz plane of a dual-zone, quadruple plenum process gas distribution showerhead according to at least one embodiment.

[0009] [Figure 2B]FIG. 2B is a top view in the xy plane of the dual-zone, quadruple plenum process gas distribution showerhead shown in FIG. 2A according to at least one embodiment.

[0010] [Figure 3A] FIG. 3A is a cross-sectional view in the yz plane of a dual-zone, quadruple plenum process gas distribution showerhead according to at least one embodiment.

[0011] [Figure 3B] FIG. 3B is a top view of the dual-zone, quadruple plenum process gas distribution showerhead shown in FIG. 3A according to at least one embodiment.

[0012] [Figure 4] FIG. 4 is a side view of a process tool including a dual-zone, dual-plenum process gas distribution showerhead according to at least one embodiment.

[0013] [Diagram 5] FIG. 5 is a flowchart summarizing an exemplary method for operating a dual-zone, multi-plenum process gas distribution showerhead according to at least one embodiment. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0014] Numerous specific details (such as construction schemes) will be described herein to provide a thorough understanding of at least one embodiment. It will be apparent to one of ordinary skill in the art that at least one embodiment may be practiced without these specific details. In other instances, well-known features (such as gas delivery line tube fittings, heating elements, and snap switches) will not be described in detail in order to not unnecessarily obscure at least one embodiment. Additionally, it should be understood that at least one embodiment depicted in the figures is an illustrative representation and is not necessarily drawn to scale.

[0015] In some instances, well-known methods and devices are shown in block diagram form rather than in detail to avoid obscuring the disclosure. Throughout this specification, references to "an embodiment," "at least one embodiment," "one embodiment," or "some embodiments" mean that a particular feature, structure, function, or characteristic described in connection with an embodiment is included in at least one embodiment. Thus, the appearance of the phrases "in an embodiment," "in at least one embodiment," "in one embodiment," or "some embodiments" in various places throughout this specification are not necessarily referring to the same embodiment. Furthermore, particular features, structures, functions, or characteristics may be combined in any suitable manner in one or more embodiments. For example, a first embodiment may be combined with a second embodiment if the particular features, structures, functions, or characteristics associated with the two embodiments are not mutually exclusive.

[0016] Here, "coupled" and "connected," along with their derivatives, may be used herein to describe a functional or structural relationship between components. These terms are not intended as synonyms for each other. Rather, in certain embodiments, "connected" may be used to indicate that two or more elements are in direct physical, optical, or electrical contact with each other. "Coupled" may be used to indicate that two or more elements are in direct or indirect (through other intervening elements) physical, electrical, or magnetic contact and / or that two or more elements cooperate or interact with each other (e.g., in a cause and effect relationship).

[0017] Here, as used herein, "over," "under," "between," and "on" refer to the relative location of one component or material to another component or material where such physical relationship is noteworthy. Unless these terms are modified to "directly" or "directly," one or more intervening components or materials may be present. A similar distinction is made in the context of component assemblies. As used throughout this specification and in the claims, a list of items joined by "at least one of" or "one or more of" may mean any combination of the listed terms.

[0018] As used herein, "adjacent" may generally refer to the location of one thing next to (e.g., immediately adjacent or nearby with one or more things between) or adjacent to (e.g., touching) another thing.

[0019] Unless otherwise indicated by the clear context of their use, the terms "substantially equal," "approximately equal," and "nearly equal" mean that there is no more than an incidental difference between the two items so described, where such difference is typically less than ±10% of the stated value.

[0020] To address the limitations described herein, a dual zone, multi-plenum showerhead is disclosed. In at least one embodiment, the dual zone, multi-plenum showerhead includes an inner zone and an outer zone. In some embodiments, the outer zone is at a perimeter portion of the showerhead surrounding the inner zone. In at least one embodiment, the inner zone may include one plenum or two plenums that are adjacent and confined within the inner zone. In at least one embodiment, the outer zone may include one plenum or two plenums that are adjacent and confined within the outer zone. In at least one embodiment, the showerhead may include up to four plenums (e.g., two plenums in the inner zone and two plenums in the outer zone). In at least one embodiment, the multiple plenums are fluidly isolated from one another to ensure that gases having different compositions remain separate within the showerhead and do not mix before exiting the showerhead. In at least one embodiment, the dual zone showerhead advantageously provides center-to-edge tunability of process gas flow rate and composition.

[0021] FIG. 1A is a cross-sectional view in the xz plane of a dual-zone, dual-plenum gas distribution showerhead (hereinafter showerhead 100) having a body 101 including an inner zone 102 and an outer zone 104 according to at least one embodiment. In at least one embodiment, the body 101 may include an upper surface 103 and a lower surface 105. Here, a "showerhead" may generally refer to a device similar to a household showerhead that sprays fluids. In at least one embodiment, the showerhead distributes process gases into a process chamber. In at least one embodiment, the outer zone 104 is at the periphery of the inner zone 102. Here, a "zone" may generally refer to a portion or region of the body 101 within which a plenum distribution system may be confined. Here, a "body" may generally refer to the main structural components or shell of the showerhead 100, which has the overall shape of the showerhead 100. In at least one embodiment, the body 101 may be a solid structure in which the fluidic substructure (such as multiple plenums and apertures) may be machined or additively formed, for example, by molding, casting, or 3D printing. Herein, the "upper surface" and "lower surface" with respect to the body 101 may generally refer to the upper and lower boundaries of the top and bottom of the body 101, respectively. In at least one embodiment, the lower surface may include multiple apertures. In at least one embodiment, the lower surface may be referred to as a "faceplate" (defined below). In at least one embodiment, the upper and lower surfaces may be substantially smooth or may have a texture. In at least one embodiment, the upper and lower surfaces may have a relatively rough finish, for example with machining marks (e.g., surface roughness of 10 microns or more), or may have a polished finish, such as a plated metal layer. Herein, the "inner zone" may generally refer to a zone in the central portion of the body (such as the body of a showerhead). Here, "outer zone" may generally refer to the outer periphery of the body of the showerhead. In at least one embodiment, the showerhead 100 includes a body 101, which generally has a cylindrical shape including a height h1 and a diameter D1.

[0022] Here, "plenum" may generally refer to a distribution reservoir in the form of a cavity, chamber, or channel for containing or passing a fluid (e.g., gas or liquid) to which multiple channels or apertures are fluidly coupled to distribute the fluid. Here, "fluidly coupled" may generally refer to two fluid-holding structures that are mechanically coupled such that fluid flows or is distributed within both structures. In at least one embodiment, a pipe is fluidly coupled to a tank. Here, "plena" may generally refer to multiple plenums (e.g., the plural of "plenum"). Here, "aperture" may generally refer to an opening in a wall or surface. In at least one embodiment, the body 101 may include an assembly of parts. In at least one embodiment, the body 101 may comprise a metal, such as a chemically resistant aluminum alloy and a chemically resistant steel alloy, such as stainless steel or Hastelloy, a ceramic material, such as aluminum oxide, or a chemically and heat resistant polymer, such as Ultem polyimide, polyetheretherketone (PEEK), Teflon, PEF, FPA, or other fluorinated hydrocarbon.

[0023] In at least one embodiment, the cylindrical shape may have a circular cross section that may advantageously fit the standard circular shape of a wafer substrate. In at least one embodiment, the showerhead 100 may have a square or rectangular shape (not shown), in which case D1 may be replaced with a width. For the showerhead 100, the inner zone 102 has a diameter D2, which is shown as part of D1. It may be understood that the diameter D2 does not indicate the location of a physical edge or sidewall between the inner zone 102 and the outer zone 104. Rather, D2 may be a construct to indicate an area where there may be no fluid-transporting structures contained within the two zones.

[0024] In at least one embodiment, the outer zone 104 has an annular shape extending at D1 between D2 and the sidewall 106. In at least one embodiment, both the central zone 102 and the peripheral zone 104 have a single plenum distribution system, where "single plenum distribution system" may generally refer to one fluid distribution manifold in the inner zone 102 and the outer zone 104. In at least one embodiment, each individual plenum may include multiple outlet apertures or nozzles, each unique to the other. In at least one embodiment, the inner plenum 108 is confined within the inner zone 102 and the outer plenum 110 is confined within the outer zone 104.

[0025] In at least one embodiment, the inner plenum 108 and the outer plenum 110 are shown as adjacent but spaced apart, with the inner plenum 108 being fluidly isolated from the outer plenum 110. In at least one embodiment, the inner plenum 108 and the outer plenum 110 may each include an integral cavity that extends into the body 101. In at least one embodiment, the outer plenum 110 may have an annular structure that surrounds the inner plenum 108. In at least one embodiment, the inner plenum 108 and / or the outer plenum 110 include separate channels that may be created, for example, by machining a series of parallel tunnels partially or completely through the body 101.

[0026] In at least one embodiment, the inner plenum 108 is fluidly coupled to an inner inlet port 112 extending through a top surface 113 of the body 101. In at least one embodiment, the inner plenum 108 is also fluidly coupled to a first plurality of apertures 114. In at least one embodiment, the inner inlet port 112, the inner plenum 108, and the apertures 114 form an inner fluid distribution manifold. In at least one embodiment, the apertures 114 may extend between the inner plenum 108 and a central portion of the lower surface 105. In at least one embodiment, the lower surface 105 includes a faceplate.

[0027] In at least one embodiment, in the outer zone 104, the outer plenum 110 is fluidly coupled to the outer inlet port 120 and the second plurality of apertures 122. In at least one embodiment, the outer inlet port 120, the outer plenum 110, and the apertures 122 form an outer fluid distribution manifold, which is fluidly isolated from the inner fluid distribution manifold. Here, "fluidically isolated" may generally refer to the absence of a fluid path between two or more fluid carrying structures, such as the inner plenum 108 and the outer plenum 110. In at least one embodiment, the fluids in each structure may be isolated from each other. In at least one embodiment, the apertures 122 may extend between the outer plenum 110 and an outer periphery portion of the lower surface 105. Here, "faceplate" may generally refer to the lower surface of a process gas distribution showerhead (such as the showerhead 100) that includes a plurality of apertures (such as the apertures 114 and 122) arranged in a particular pattern. 1B illustrates a plan view of the underside 105 according to at least one embodiment. In at least one embodiment, the inner plenum 108 and the outer plenum 110 are independent of one another in that they are mechanically and fluidly decoupled from one another and instead are coupled to separate inner and outer inlet ports 112 and 120, respectively, and outlet apertures 114 and 122, respectively.

[0028] FIG. 1B is a cross-sectional view in the yz plane of the dual zone, dual plenum showerhead 100 according to at least one embodiment. In at least one embodiment, the cross-sectional view in FIG. 1B is taken from the yz plane through the body 101. In at least one embodiment, the inner plenum 108 is shown from the yz cross-sectional perspective and includes a plurality of inner distribution channels 124 spaced apart by a spacing s1. The spacing s1 may range from zero to 10 mm, with each adjacent inner distribution channel 124 overlapping to form a continuous inner plenum 108. In at least one embodiment, each of the multiple inner distribution channels 124 may be fluidly interconnected with one another.

[0029] In at least one embodiment, each of the inner distribution channels 124 may be substantially coplanar as shown. Here, "coplanar" may generally refer to a structure that is substantially contained within a plane or at the same z-height within a larger host structure (such as the showerhead body 101). In at least one embodiment, each central axis of the three-dimensional inner distribution channel may be coplanar, but may have structures slightly above and below the plane. In at least one embodiment, the coplanarity may be defined by multiple structures having the same z-height above a reference plane, such as the lower surface 105. In at least one embodiment, each of the inner distribution channels 124 may be substantially parallel to each other. In at least one embodiment, the cut plane of FIG. 1B does not include a view of the inner inlet port 112. In at least one embodiment, the aperture 114 fluidly coupled to the inner distribution channel 124 may extend to a central portion of the lower surface 105. In at least one embodiment, the inner distribution channel 124 may be formed by machining into a channel of the body 101.

[0030] In at least one embodiment, the outer zone 104 may include a second plurality of outer distribution channels 126. In at least one embodiment, each channel of the second plurality of outer distribution channels 126 (hereinafter, the outer distribution channels 126) may extend substantially parallel to the inner distribution channels 124. In at least one embodiment, the outer distribution channels 126 are coplanar with the inner distribution channels 124.

[0031] In at least one embodiment, the outer distribution channels 126 may be fluidly coupled to one another by cross channels (not shown) or by overlapping diameters relative to the inner distribution channels 124. In at least one embodiment, the outer distribution channels 126 may be fluidly coupled to an aperture 122 that extends to a perimeter portion of the lower surface 105.

[0032] FIG. 1C is a cross-sectional view of a dual-zone, quadruple plenum gas distribution showerhead 150 (hereinafter showerhead 150) including an inner zone 152 and an outer zone 154 according to at least one embodiment. In at least one embodiment, the outer zone 154 can be around the periphery of the inner zone 152, similar to the showerhead 100 shown in FIG. 1A. In some embodiments, the showerhead 150 includes a body 151, which has a generally cylindrical shape including a height h1 and a diameter D1, as described for the showerhead 100 of FIG. 1A. In at least one embodiment, the diameter D1 can extend to a sidewall 156 that extends between an upper surface 153 and a lower surface 155. In at least one embodiment, the outer zone 154 surrounds the inner zone 152 and is shown in the figures as two cross-sectional portions located on either side of the inner zone 152.

[0033] In at least one embodiment, both the central zone 152 and the peripheral zone 154 have a dual plenum distribution system, where "dual plenum distribution system" may generally refer to two fluid distribution manifolds that may be adjacent to one another within a confined space. In at least one embodiment, each distribution manifold may include multiple, unique exit apertures or nozzles coupled to its plenum. In at least one embodiment, the dual plenum distribution system allows for two independently controlled process gas feeds into a single showerhead.

[0034] In at least one embodiment, in relation to the showerhead 150, the inner zone 152 includes an inner upper plenum 158 and an inner lower plenum 160 confined within the inner zone 152. In at least one embodiment, the inner upper plenum 158 and the inner lower plenum 160 are shown in a stacked configuration, with the inner upper plenum 158 being in a plane of a z-height h2 above a lower plane through which the inner lower plenum 160 may extend. In at least one embodiment, the inner upper plenum 158 and the inner lower plenum 160 are fluidly isolated from one another. In at least one embodiment, the inner upper plenum 158 and the inner lower plenum 160 each include an integral cavity that extends within the body 151. In at least one embodiment, the inner upper plenum 158 and / or the inner lower plenum 160 include separate multiple channels that may be created, for example, by machining a series of parallel tunnels partially or completely through the body 151.

[0035] In at least one embodiment, the inner upper plenum 158 is fluidly coupled to the inlet 162 and the inner plurality of apertures 164 to form an inner fluid distribution manifold. In at least one embodiment, the apertures 164 may extend between the inner upper plenum 158 and the lower surface 155. In at least one embodiment, the inner lower plenum 160 is fluidly coupled to the inlet 168 on the upper surface 153 and the second plurality of apertures 170 to form a second fluid distribution manifold. In at least one embodiment, the apertures 170 may extend between the inner lower plenum 160 and the lower surface 155. In at least one embodiment, the distribution plenums 158 and 160 are independent of one another in that they are mechanically and fluidly decoupled from one another and instead are coupled to separate inlets 162 and 168, and outlet apertures 164 and 170, respectively.

[0036] In at least one embodiment, apertures 164 may be interspersed among apertures 170 as shown, or apertures 164 and 170 may be arranged in two interpenetrating arrays on lower surface 155. In at least one embodiment, apertures 164 and 170 may be arranged in two interpenetrating arrays to provide overlapping gas distribution coverage from showerhead 150. In at least one embodiment, gas species entering through inlets 162 and 168, respectively, may be independently controlled, for example by separate mass flow controllers. In at least one embodiment, inner zone 152 may include embedded heating elements to control the temperature within inner zone 152.

[0037] In at least one embodiment, the outer zone 154 includes an outer upper plenum 172 and an outer lower plenum 174. In at least one embodiment, the outer upper plenum 172 and the outer lower plenum 174 are fluidly isolated from one another. In at least one embodiment, the outer upper plenum 172 and the outer lower plenum 174 may be a continuous cavity. In at least one embodiment, the outer upper plenum 172 and the outer lower plenum 174 may include multiple separate tunnels, as described for the inner upper plenum 158 and the inner lower plenum 160. In at least one embodiment, a first outer zone distribution manifold may include an outer upper plenum 172 fluidly coupled to an outer inlet 176 and an aperture 178. In at least one embodiment, a second outer zone distribution manifold may include an outer lower plenum 174 fluidly coupled to an inlet 180 and an aperture 182.

[0038] In at least one embodiment, the outer upper plenum 172 may extend in a plane at a z-height h3 above the lower plane in which the outer lower plenum 174 may extend, as shown. In at least one embodiment, h3 may be substantially equal to height h2. Similar to the apertures 164 and 170 in the inner zone 152, the apertures 178 and 182 in the outer zone 154 may be arranged in two interpenetrating arrays. In at least one embodiment, the array shape may be the same for both interpenetrating arrays including the apertures 178 and 182, respectively. In at least one embodiment, the apertures 178 and 182 may be arranged in two interpenetrating square arrays, where adjacent apertures 178 or 182 are equidistant from each other (e.g., the apertures 178 and 182 have the same pitch). In at least one embodiment, other suitable shapes may be within the scope of the disclosure as well. In at least one embodiment, the apertures 178 and 182 may be arranged in two interpenetrating hexagonal arrays.

[0039] In at least one embodiment, similar to the inner zone 152, two independently controlled separate process gas sources may be coupled to the outer zone inlet 176 and the outer zone inlet 180 of the first and second outer zone distribution manifolds, respectively. In at least one embodiment, overlapping sprays of two process gases may be emitted simultaneously from the apertures 178 and 182, respectively, within a limited range. In at least one embodiment, the spray range may be defined by the wafer substrate below the showerhead 150. Although not shown, in at least one embodiment, the outer zone 154 may also include a heating element independent of the heating elements in the inner zone 152. In at least one embodiment, such a heating element may heat the outer zone 154 independently from the inner zone 152, allowing for separate temperature control of both the inner zone 152 and the outer zone 154.

[0040] In at least one embodiment, the same or different process gases may be coupled to both the inner zone 152 and the outer zone 154, while the two process gases coupled to the outer zone inlets 176 and 180 may be controlled independently from the process gases coupled to the inner zone inlets 162 and 168, allowing for adjustment of the flow and temperature of the process gases across the diameter D1 of the showerhead 150. In at least one embodiment, a first pair of process gases coupled to the inner zone 152 may have a first composition, mass flow rate, and temperature. In at least one embodiment, a second pair of process gases coupled to the outer zone 154 may have a second composition, mass flow rate, and temperature. In at least one embodiment, the pair of process gases may include an inert gas, such as argon or nitrogen, or a reactive gas, such as oxygen, ammonia, or nitrous oxide. In at least one embodiment, the second gas may include a vapor of a reactive precursor. In at least one embodiment, a first process gas may have substantially the same composition as a second process gas, but the gases are regulated at different mass or volumetric flow rates.

[0041] In at least one embodiment, the showerhead 100 may optimize a deposition or etch process performed on a wafer substrate by allowing center-to-edge tuning of the flow rates and temperatures of the first and second process gases. Here, "tune" or "tuning" may generally refer to the act of adjusting parameters to optimize a process. In at least one embodiment, a process may be optimized when the flow of process gas over the periphery (e.g., outer portion) of the wafer is tuned by decreasing the gas flow at the periphery relative to the flow of the same process gas over the inner portion of the wafer. In at least one embodiment, the showerhead 150 may have the capability to provide variable process gas composition, flow rates, and temperature across the diameter of the wafer.

[0042] FIG. 2A is a cross-sectional view in the xz plane of a dual-zone, quadruple plenum gas distribution showerhead 200 (hereinafter, showerhead 200) according to at least one embodiment. In at least one embodiment, the showerhead 200 includes a body 201. In at least one embodiment, the body 201 includes an inner zone 202 and an outer zone 204. In at least one embodiment, the outer zone 204 surrounds the inner zone 202, as shown in FIG. 2B. In at least one embodiment, the body 201 further includes an upper surface 203 and a lower surface 205. In at least one embodiment, the lower surface 205 may be the faceplate of the showerhead 200. In at least one embodiment, the body 201 may have a cylindrical shape (see FIG. 2B) having an overall diameter D3 and a height h3. The diameter D3 may extend to the sidewall 207. In at least one embodiment, the body 201 may have other suitable shapes, such as a square or hexagonal shape. In at least one embodiment, a boundary between the inner zone 202 and the outer zone 204 is shown, but the inner zone 202 and the outer zone 204 may be continuous within the body 201. In at least one embodiment, the boundary is shown for illustrative purposes only. In at least one embodiment, the inner zone 202 may have a diameter D4 that is a portion of D3. In at least one embodiment, the outer zone 204 may be an annular perimeter region of the body 201 that surrounds the inner zone 202. In at least one embodiment, in the cross-sectional view of the figure, the outer zone 204 is divided into two cross sections located on either side of the inner zone 202, but may be viewed as an annular portion on the circumference of the body 201. In at least one embodiment, an inner dual plenum system 206 (depicted in a dashed box) is contained within the inner zone 202. In at least one embodiment, each of the multiple plenums in the dual plenum system 206 includes a first multiple inner distribution channel 208 and a second multiple inner distribution channel 210. In at least one embodiment, each of the first plurality of inner distribution channels 208 may be fluidly interconnected with one another.Meanwhile, each of the second plurality of inner distribution channels 210 may also be fluidly interconnected with one another, but are fluidly isolated from distribution channel 208. In at least one embodiment, inner distribution channel 208 is shaded a darker gray than inner distribution channel 210 (shaded a lighter gray).

[0043] In at least one embodiment, the inner distribution channels 208 are shown extending substantially perpendicular to the inner distribution channels 210, but may extend at an oblique angle. In at least one embodiment, each of the inner distribution channels 208 may be oriented parallel to one another and have a horizontal spacing s1 (e.g., in the x-direction). In at least one embodiment, each of the inner distribution channels 208 may be coplanar as shown. In at least one embodiment, each of the inner distribution channels 210 may also be oriented parallel to one another and may also be coplanar. In at least one embodiment, the inner distribution channels 208 and the inner distribution channels 210 may be in different planes of the body 201, separated vertically by a z-height h4.

[0044] In at least one embodiment, the inner distribution channel 208 may be formed by a machining process, such as drilling a series of slots in the body 201. In at least one embodiment, other methods may include milling the inner distribution channel 208 into separate halves of the body 201 and assembling the two halves together into a unitary body 201. In at least one embodiment, the inner distribution channel 208 is fluidly coupled to an inner inlet port 212 on the top surface 203, where "inlet port" may generally refer to an opening on the top surface of the showerhead 200 and provides a means for coupling the showerhead to a tube or hose that connects to a gas source.

[0045] In at least one embodiment, the inner distribution channels 208 are fluidly interconnected. In at least one embodiment, one or more cross channels (not shown) may interconnect the inner distribution channels 208. In at least one embodiment, the inner inlet port 212 is shown coupled to each of the inner distribution channels 208 in the cross-sectional view of the figures, but may be interconnected to each of all of the inner distribution channels 208. In at least one embodiment, the spacing distance s1 may be reduced to allow adjacent inner distribution channels 208 to overlap each other (as well as the inner distribution channels 210) to allow fluidic connection between adjacent channels.

[0046] In at least one embodiment, collectively, the inner distribution channels 208 may be non-contiguous portions of a single upper plenum. In at least one embodiment, multiple inner distribution channels 210 may be interconnected by one or more cross channels (not shown) and may be non-contiguous portions of a single lower plenum. In at least one embodiment, the inner distribution channels 210 may be fluidly coupled to an inner inlet port 214.

[0047] In at least one embodiment, the inner distribution channel 208 is fluidly coupled to an aperture 216 that extends below the inner distribution channel 208 to the lower surface 205. In at least one embodiment, the inner distribution channel 210 is fluidly coupled to an aperture 220 that also extends to the lower surface 205. In at least one embodiment, the apertures 216 and 220 provide an outlet for process gases that enter the dual plenum system through the inner inlet ports 212 and 214. In at least one embodiment, the apertures 216 may be arranged in a first array having a square, hexagonal, or other suitable shape, while the apertures 220 may be arranged in a second array that interpenetrates the first array of apertures 216. In at least one embodiment, the array may extend in two dimensions on the lower surface 205. Here, "aperture" may generally refer to an opening that extends through the faceplate of the showerhead and is coupled to the inner inlet ports 212 and 214. In at least one embodiment, each aperture may act as an individual nozzle from which process gases may be ejected in collective jets that may join together and flow over the wafer substrate below.

[0048] In at least one embodiment, the outer zone 204 may include a third plurality of outer distribution channels 222 and a fourth plurality of outer distribution channels 224. In at least one embodiment, each of the third plurality of outer distribution channels 222 may extend substantially perpendicular to each of the fourth plurality of outer distribution channels 224 (hereinafter, outer distribution channels 224). In at least one embodiment, the outer distribution channels 222 may run at an angle to the outer distribution channels 224. In some embodiments, each of the outer distribution channels 222 may be coplanar in a first plane. In at least one embodiment, each of the outer distribution channels 224 may be coplanar in a second plane separated from the first plane by a z-height h5. In at least one embodiment, h5 may be the same as h4.

[0049] In at least one embodiment, the outer distribution channels 222 may be fluidly coupled to one another by cross-channels (not shown) similar to those described with respect to the inner distribution channels 208 and 210. In at least one embodiment, the outer distribution channels 224 may be similarly interconnected. In at least one embodiment, the outer distribution channels 222 are fluidly coupled to the outer inlet port 226 and aperture 230, while the outer distribution channel 224 is fluidly coupled to the outer inlet port 228 and aperture 232. In at least one embodiment, the apertures 230 and 232 extend to openings on the lower surface 205.

[0050] FIG. 2B is a plan view in the xy plane of a dual-zone, quad-plenum showerhead 200, showing the cross pattern of the inner distribution channels 208 and 210, and the outer distribution channels 222 and 224, according to at least one embodiment. The cut plane may cut through the inner distribution channel 208 and the outer distribution channel 222. Although not in the same plane, the inner distribution channel 210 and the outer distribution channel 224 are both in a lower plane and are shown for illustrative purposes. In at least one embodiment, the outer zone 204 comprises an annular portion of the periphery of the body 201 that surrounds the inner zone 202. In at least one embodiment, the inner distribution channels 208 and 210 each run parallel to one another, while the channel 208 runs in an orthogonal direction (e.g., in the x and y directions, respectively) to the channel 210. In at least one embodiment, the inner distribution channel 208 may run at an oblique angle to the inner distribution channel 210. For ease of viewing, inner distribution channel 208 is shaded in a darker grey than that used to shade inner distribution channel 210. In at least one embodiment, inner distribution channel 208 lies in a higher vertical plane than inner distribution channel 210 (which is below the plane of the figure).

[0051] In at least one embodiment, as described above, each inner distribution channel 208 and each inner distribution channel 210 may be interconnected to adjacent channels 208 and 210, respectively, by a cross channel. In at least one embodiment, the interconnecting cross channels are not shown for clarity. In at least one embodiment, the spacing s1 between the inner distribution channels 208 and the spacing s2 between the inner distribution channels 210 may be reduced to allow overlap between adjacent channels. In at least one embodiment, the inner distribution channel 208 is fluidly isolated from the inner distribution channel 210. In at least one embodiment, the inner distribution channel 208 and the inner distribution channel 210 are blind channels and do not intersect the sidewall 207. In at least one embodiment, the channels 208 and 210 may intersect the sidewall 207 or have apertures in the sidewall 207.

[0052] In at least one embodiment, the outer distribution channels 222 and 224 are similarly arranged in the outer zone 204. In at least one embodiment, the outer distribution channels 222 extend parallel to each other in the plane of the drawing in which they are coplanar. In at least one embodiment, the outer distribution channels 224 extend parallel to each other in a plane below the plane of the drawing in which they are coplanar. In at least one embodiment, the outer distribution channel 224 is orthogonal to the outer distribution channel 222 as shown, but may extend in an oblique direction to the channel 222. In at least one embodiment, the outer distribution channel 222 and the outer distribution channel 224 are blind channels and do not have an intersection with an external sidewall. In at least one embodiment, some or all of the inner distribution channel 222 and / or the inner distribution channel 224 may have an intersection with an external sidewall.

[0053] In at least one embodiment, apertures 216 and 220 are shown in plan view in the inner zone 202, extending below the inner distribution channels 208 and 210, respectively, which are shown with white openings. In at least one embodiment, apertures 216 alternate where inner distribution channels 208 intersect with inner distribution channels 210. In at least one embodiment, inner distribution channels 210 running horizontally in plan view (e.g., in the x direction) may include additional apertures 220 hidden from view by inner distribution channels 208 running in the y direction. In at least one embodiment, apertures 216 and 220 are distributed in two interpenetrating square arrays due to the equidistant spacing between the apertures and the equidistant orthogonal spacings s1 and s2 between the distribution channels. In at least one embodiment, apertures 216 and 220 may be distributed in arrays of other suitable shapes, such as hexagonal shapes.

[0054] 3A is a cross-sectional view in the yz plane of a dual-zone, quad-plenum showerhead 300 (hereafter showerhead 300) according to at least one embodiment, which includes a body 301 subdivided into an inner zone 302 and an outer zone 304, with the outer zone 304 surrounding the inner zone 302, as shown in FIG. 3B. In at least one embodiment, the body 301 includes an upper surface 303 and a lower surface 305. In at least one embodiment, the showerhead 300 may be substantially similar to the showerhead 200. In at least one embodiment, the body 301 may have a cylindrical shape (see, e.g., FIG. 2B) and may have dimensions similar to the showerhead 100 or 200. In at least one embodiment, the boundary between inner zone 302 and outer zone 304 is shown in the cross-sectional view of Figure 3A, however, inner zone 302 and outer zone 304 may be continuous regions within body 301, or outer zone 304 may be an annular peripheral region of body 301 that surrounds inner zone 302. In at least one embodiment, the boundary line is shown for illustrative purposes.

[0055] In at least one embodiment, an inner dual plenum system 306 (depicted in a dashed box) is contained within the inner zone 302. In at least one embodiment, each of the multiple plenums in the dual plenum system 306 includes a first plurality of inner distribution channels 308 that may extend in an upper plane within the inner zone 302 and a second plurality of inner distribution channels 310 that may extend in a lower plane within the inner zone 302. In at least one embodiment, the inner distribution channels 308 and the inner distribution channels 310 may be non-coplanar. In at least one embodiment, each of the first plurality of inner distribution channels 308 may be fluidly interconnected with each other. Meanwhile, each of the second plurality of inner distribution channels 310 may also be fluidly interconnected with each other, but fluidly isolated from the distribution channels 308. Here, the inner distribution channels 308 are shaded a darker gray than the inner distribution channels 310 (shaded a lighter gray).

[0056] In at least one embodiment, each of the inner distribution channels 308 may be substantially coplanar in the upper plane, as shown. In at least one embodiment, each of the inner distribution channels 308 may be substantially parallel to each other. In at least one embodiment, each of the inner distribution channels 310 may be coplanar in the lower plane and may be substantially parallel to each other and to the inner distribution channels 308. In at least one embodiment, the upper and lower planes may be separated by a z-height h6. In at least one embodiment, the inner distribution channels may be fluidly coupled to each other by cross channels (not shown) or overlapping diameters, as described above.

[0057] In at least one embodiment, the cross-sectional view of FIG. 3A may not include an inlet port, as the inlet ports may be substantially the same as the inner inlet ports 212 and 214 shown in FIG. 2A. In at least one embodiment, an aperture 312 fluidly coupled to the inner distribution channel 308 may extend between the inner distribution channel 308 and the lower surface 305. In at least one embodiment, the aperture 312 may be substantially the same as the aperture 216 shown in FIG. 2A. In at least one embodiment, the aperture 316 may be fluidly coupled to the inner distribution channel 310 and may extend between the inner distribution channel 310 and the faceplate 314. In at least one embodiment, the inner distribution channel 308 and the inner distribution channel 310 may be formed by machining into a channel of the body 301.

[0058] In at least one embodiment, the outer dual plenum system 318 is contained within the outer zone 304 and is shown in a dashed box in both left and right sections of the outer zone 304. In at least one embodiment, the outer zone 304 may include a third plurality of outer distribution channels 320 that may extend in an upper plane within the outer zone 304. In at least one embodiment, the fourth plurality of outer distribution channels 322 may extend in a lower plane within the outer zone 304. In at least one embodiment, the upper plane may be separated from the lower plane by a z-height h6. In at least one embodiment, h6 may be the same as h5. In at least one embodiment, the outer distribution channel 320 may be substantially non-coplanar with the outer distribution channel 322 as shown. In at least one embodiment, each channel of the third plurality of outer distribution channels 320 may extend substantially parallel to each channel of the fourth plurality of outer distribution channels 322 (hereinafter, outer distribution channel 322). In at least one embodiment, the outer distribution channel 320 is coplanar with the inner distribution channel 308. In at least one embodiment, the outer distribution channel 322 may be coplanar with the inner distribution channel 310.

[0059] In at least one embodiment, the outer distribution channels 320 may be fluidly coupled to one another by cross-channels (not shown) in a manner similar to that described with respect to the inner distribution channels 308 and 310. In at least one embodiment, the outer distribution channels 322 may be similarly interconnected. In at least one embodiment, the outer distribution channels 320 are fluidly coupled to an outer inlet port (not shown in the cutaway view of the figures). In at least one embodiment, the outer inlet port (not shown) fluidly coupled to the outer distribution channel 320 may be substantially similar to the outer inlet port 226 shown in FIG. 2A, for example. In at least one embodiment, the outer distribution channel 320 may be fluidly coupled to an aperture 324 that extends to the lower surface 305. In at least one embodiment, the outer distribution channel 322 may be fluidly coupled to an aperture 326 that also extends to the lower surface 305.

[0060] 3B is a plan view of a dual-zone, quad-plenum showerhead 300. As mentioned above, the outer zone 304 comprises an annular portion of the periphery of the body 301 that surrounds the inner zone 302, according to at least one embodiment. In at least one embodiment, the inner distribution channel 308 may extend in a plane that is vertically displaced from the lower plane in which the inner distribution channel 310 may extend. In at least one embodiment, the outer distribution channels 308 and 320 are in the plane of the figure, while the inner distribution channel 310 and the outer distribution channel 322 are below the plane of the figure. In at least one embodiment, the plan view shows the inner distribution channels 308 and 310 extending parallel to one another. In at least one embodiment, the outer distribution channels 320 and 322 also extend parallel to one another. Here, inner distribution channel 308 and outer distribution channel 320 are shaded in dark grey, and inner distribution channel 310 and outer distribution channel 322 are shaded in light grey to make it easier to distinguish between the upper and lower channels.

[0061] In at least one embodiment, each inner distribution channel 308 and each inner distribution channel 310 may be interconnected to adjacent channels that are in the same plane. Cross channels (not shown) may be employed to interconnect adjacent coplanar channels. In at least one embodiment, adjacent channels may be merged to form a continuous plenum by decreasing the spacing s4 between the inner distribution channels 308 and / or the spacing s4 between the inner distribution channels 310. In at least one embodiment, the channels may merge, but the pitch p1 between adjacent apertures 312, 316, 324, and 326 may be maintained at a desired pitch. In at least one embodiment, the inner distribution channel 308 is fluidly isolated from the inner distribution channel 310. In at least one embodiment, the outer distribution channel 320 and the outer distribution channel 322 are similarly isolated. In at least one embodiment, the inner distribution channels 308 and 310, and the outer distribution channels 320 and 322 may be blind channels. In at least one embodiment, channels 308 and 310 may intersect an exterior sidewall, forming an opening in sidewall 307, for example.

[0062] In at least one embodiment, in the plan view of FIG. 3B, apertures 312 and 316 (shown as open circles) extend below the inner distribution channels 308 and 310, respectively. In at least one embodiment, the apertures 312 may have a uniform pitch p1, which is similar for the apertures 316. In at least one embodiment, the apertures 312 and 316 are distributed in two interpenetrating square arrays due to the equidistant spacing between the apertures (e.g., pitch p1). In at least one embodiment, the apertures 312 and 316 may be arranged in any suitable shape. In at least one embodiment, the apertures 324 and 326 may also be distributed in two interpenetrating square arrays. In at least one embodiment, the apertures 324 and 326 may be distributed in arrays of other suitable shapes, such as hexagonal shapes.

[0063] FIG. 4 is a side view of a process tool 400 according to at least one embodiment. In at least one embodiment, the process tool 400 may include a vacuum chamber 402. The vacuum chamber 402 includes a showerhead 100. Here, a "process tool" may generally refer to a device including a vacuum chamber in which a semiconductor wafer may be placed for processing. Here, a "vacuum chamber" may generally refer to a large vessel whose interior may be evacuated to a high vacuum to support semiconductor devices (and other devices including other materials suitable for similar processing) and in which processing operations such as CVD and plasma etching processes using high vacuum are performed. Although the illustrated embodiment shows a showerhead 100, in at least one embodiment, 200 or 300 may also be illustrated similarly. In at least one embodiment, a wafer chuck 404 is also included in the vacuum chamber 402. Here, a "wafer chuck" may generally refer to a mechanism including a stage for mounting a wafer substrate undergoing processing. In at least one embodiment, the wafer chuck may include a vacuum clamp or an electrostatic clamp for securing the wafer substrate to the wafer chuck. Here, a "wafer substrate" may generally refer to a semiconductor wafer having a size ranging from 3 cm to 50 cm. In at least one implementation, a wafer substrate 406 is mounted on a wafer chuck 404. In at least one embodiment, the wafer chuck may generally be positioned below the showerhead 100 as shown. In at least one embodiment, the showerhead 100 is a dual zone showerhead including an inner zone 102 and an outer zone 104. In at least one embodiment, the inner zone 102 includes a plenum 108, which is fluidly coupled to an inner inlet port 112 and an aperture 114. In at least one embodiment, a first process gas source 408 is fluidly coupled to the inner inlet port 112 through a gas delivery line 410.

[0064] As used herein, a "process gas source" may generally refer to a pressurized vessel or collection of vessels containing inert and reactive gases and vapors. As used herein, a "gas" may generally refer to a substance that is in the gas phase at room temperature. As used herein, a "vapor" may generally refer to a substance that is in the gas phase by heating a solid or liquid substance to an elevated temperature. In at least one embodiment, the vapor must generally be maintained at an elevated temperature above the vaporization temperature to prevent condensation.

[0065] In at least one embodiment, the process gas source 408 includes one or more pressurized gas tanks or vessels. In at least one embodiment, the process gas source 408 may contain a process gas comprised of one or more gaseous substances, such as, for example, an inert gas (e.g., argon, nitrogen), and / or a reactive gas, such as oxygen, ammonia, etc. In at least one embodiment, the process gas source 408 may also be heated to an elevated temperature to maintain a sublimated or otherwise vaporized reactive precursor vapor. In at least one embodiment, multiple process gas sources may be fluidly coupled to the gas delivery line 410. A flow controller 412 may be included in line with the gas delivery line 410 to control the mass or volumetric flow rate of the process gas flowing therethrough. Here, the "gas delivery line" may generally refer to a tube or pipe that carries the gas flowing from a source to an apparatus or chamber. In at least one embodiment, other flow control components may be included. Here, the "flow controller" may generally refer to a fluid flow controller, such as a simple valve, a mass flow controller, a volumetric flow controller, etc. In at least one embodiment, a flow controller may also refer to a composite assembly of multiple gas regulating components. In at least one embodiment, the flow controller 412 may be part of a gas box that may include, for example, multiple valves, filters, mixers, heating elements, etc., to pre-condition the process gas.

[0066] In at least one embodiment, a second process gas source 414 may be fluidly coupled to the outer inlet port 120 through a gas delivery line 416. In at least one embodiment, the process gas source 414 may also include one or more pressurized gas tanks or vessels containing one or more gases and / or vapors, similar to that described with respect to the process gas source 408. In at least one embodiment, a flow controller 418 may be integrated in-line with the gas delivery line 416. In at least one embodiment, the flow controller 418 may provide the same functionality as the flow controller 412. In at least one embodiment, the flow controller 412 may be operated independently from the flow controller 418 to provide individually controlled process gas flows to the inner zone 102 and the outer zone 104 of the showerhead 100. In at least one embodiment, during operation, at least one process gas may emanate from a separate set of apertures, including the aperture 114 in the inner zone 102 and the aperture 122 in the outer zone 104. In at least one embodiment, the flow rates of process gases flowing through apertures 114 and 122 may be advantageously adjusted by adjusting flow controllers 412 and 418, respectively. In at least one embodiment, the adjusted process gas flows enable optimal delivery of process gases over the inner and outer portions of wafer substrate 406.

[0067] FIG. 5 is a process flow chart 500 summarizing an exemplary method for using a dual-zone, multi-plenum process gas distribution showerhead (such as any of showerheads 100, 200, or 300) according to at least one embodiment. In at least one embodiment, in operation 501, a process tool (such as process tool 400 shown in FIG. 4) may be provided for processing one or more wafer substrates (such as wafer substrate 406 shown in FIG. 4). In at least one embodiment, the process tool may include a vacuum chamber including a wafer chuck for mounting the wafer substrate within the confines of the vacuum chamber, as described above. In at least one embodiment, the wafer chuck may be positioned beneath the process gas distribution showerhead (hereinafter, the “showerhead”). In at least one embodiment, the showerhead may be a dual-zone, multi-plenum showerhead.

[0068] In at least one embodiment, the showerhead may include an inner zone and an outer zone (e.g., inner zone 102 and outer zone 104 shown in FIG. 1A), which include inner and outer inlet ports (e.g., inner inlet port 112 and outer inlet port 120 shown in FIG. 1A), respectively. In at least one embodiment, within the inner zone, the inner inlet port may be fluidly coupled to an inner plenum. In at least one embodiment, the inner plenum may be fluidly coupled to a first plurality of apertures on an inner region of the lower surface of the showerhead (e.g., lower surface 105 shown in FIG. 1A). In at least one embodiment, within the outer zone, the outer inlet port may be fluidly coupled to an outer plenum. In at least one embodiment, the outer plenum may be fluidly coupled to a second plurality of apertures on a perimeter of the lower surface, which may include a faceplate. In at least one embodiment, the first plurality of apertures and the second plurality of apertures may be operable to distribute process gases over a wafer substrate. In at least one embodiment, the apertures may act as nozzles to direct a flow of gas downward over a wafer substrate positioned directly beneath the faceplate of the showerhead, as shown in FIG.

[0069] Continuing to refer to operation 501, in at least one embodiment, a first process gas delivery line is connected to the inner inlet port and a second process gas delivery line is connected to the outer inlet port. In at least one embodiment, the first gas delivery line may be fluidly coupled to a first process gas source. In at least one embodiment, the second gas delivery line may be fluidly coupled to the same first process gas source or to a second process gas source containing a different gas than the first process gas source. In at least one embodiment, the first and second process gas sources may include one or more pressurized vessels containing inert or reactive gases and / or vapors. In at least one embodiment, the first and second process gases may have substantially the same composition according to some embodiments. In at least one embodiment, the first and second process gases may have substantially different compositions.

[0070] In at least one embodiment, in operation 502, a first flow of process gas is established through a first gas delivery line coupled to an inner inlet port of a gas distribution showerhead. In at least one embodiment, the inner inlet port is coupled to an inner plenum (e.g., plenum 108), which is coupled to a set of inner apertures (e.g., apertures 122 shown in FIG. 1A). In at least one embodiment, the process gas may exit through the inner apertures into the vacuum chamber. In at least one embodiment, the inner apertures may act as nozzles, directing the gas flow downward toward a central region of the wafer substrate below.

[0071] In at least one embodiment, in operation 503, a second flow of the same or a different process gas is established through a second gas delivery line coupled to a second plenum (e.g., outer plenum 110 shown in FIG. 1A). In at least one embodiment, the second plenum is fluidly coupled to a set of outer apertures at the periphery of the faceplate. In at least one embodiment, the same or a different process gas may enter the vacuum chamber through the outer apertures and be directed to the periphery region of the wafer substrate below by action of nozzles in the outer apertures.

[0072] In at least one embodiment, in operation 504, the flow rate of the process gas through the inner aperture and the outer aperture may be adjusted to optimize the CVD or etching process performed on the wafer substrate. In at least one embodiment, a dual-zone showerhead advantageously adjusts the flow rate of the process gas over the wafer substrate from center to edge. In at least one embodiment, the adjusting process may be performed by adjustment of a first flow controller coupled to the first gas delivery line. In at least one embodiment, a second flow controller may be coupled to the second gas delivery line to independently adjust the flow of the second gas.

[0073] The following examples are provided to illustrate at least one embodiment. The examples can be combined with other examples. Thus, at least one embodiment can be combined with another embodiment without changing the scope of the at least one embodiment.

[0074] Example 1 is a gas distribution showerhead including a body including an upper surface, a lower surface, an inner zone, and an outer zone surrounding the inner zone, a first plenum in the inner zone, the first plenum fluidly coupled to a first inlet port beyond the upper surface, and a second plenum in the outer zone, the second plenum fluidly coupled to a second inlet port beyond the upper surface, wherein the first plenum is fluidly coupled to a first plurality of apertures, the first plurality of apertures being within a central portion of the lower surface, and the second plenum is fluidly coupled to a second plurality of apertures, the second plurality of apertures being within a peripheral portion of the lower surface.

[0075] Example 2 includes all of the features of example 1, wherein the first plenum includes a first chamber in the inner zone and the second plenum includes a second chamber in the outer zone.

[0076] Example 3 includes all of the features of example 2, and further includes a third plenum in the inner zone, the third plenum fluidly coupled to the third inlet port and the third plurality of apertures.

[0077] Example 4 includes all of the features of example 3, wherein the third plurality of apertures is within a central portion of the lower surface.

[0078] Example 5 includes all of the features of example 4, and further includes a fourth plenum in the outer zone, the fourth plenum fluidly coupled to the fourth inlet port and the fourth plurality of apertures.

[0079] Example 6 includes all of the features of example 5, wherein the fourth plurality of apertures is within the perimeter portion of the lower surface.

[0080] Example 7 includes all of the features of example 6, wherein the first plenum includes a first plurality of channels in the inner zone and the second plenum includes a second plurality of channels in the outer zone.

[0081] Example 8 includes all of the features of example 7, wherein each one of the first plurality of channels are substantially parallel to each other and each one of the second plurality of channels are substantially parallel to each other.

[0082] Example 9 includes all of the features of example 8, wherein the third plenum includes a third plurality of channels in the inner zone.

[0083] Example 10 includes all of the features of example 9, wherein each one of the third plurality of channels are substantially parallel to each other.

[0084] Example 11 includes all of the features of example 10, wherein each one of the first plurality of channels is substantially coplanar with each one of the third plurality of channels.

[0085] Example 12 includes all of the features of example 10, wherein each one of the first plurality of channels is substantially non-coplanar with each one of the third plurality of channels.

[0086] Example 13 includes all of the features of example 12, wherein each of the first plurality of channels is substantially coplanar in a first plane within the inner zone, each of the third plurality of channels is substantially coplanar in a second plane within the inner zone, and the first plane is above the second plane.

[0087] Example 14 includes all of the features of example 13, wherein each one of the first plurality of channels is substantially parallel to each one of the third plurality of channels.

[0088] Example 15 includes all of the features of example 13, wherein each one of the first plurality of channels is substantially orthogonal to each one of the third plurality of channels.

[0089] Example 16 includes all of the features of example 9, wherein the fourth plenum includes a fourth plurality of channels in the outer zone.

[0090] Example 17 includes all of the features of example 16, wherein each one of the fourth plurality of channels are substantially parallel to each other.

[0091] Example 18 includes all of the features of example 17, wherein each one of the second plurality of channels is substantially coplanar with each one of the fourth plurality of channels.

[0092] Example 19 includes all of the features of example 17, wherein each one of the second plurality of channels is substantially non-coplanar with each one of the fourth plurality of channels.

[0093] Example 20 includes all of the features of example 19, wherein each of the second plurality of channels is substantially coplanar in a third plane in the outer zone, each of the fourth plurality of channels is substantially coplanar in a fourth plane in the outer zone, and the third plane is above the fourth plane.

[0094] Example 21 includes all of the features of example 20, wherein each one of the second plurality of channels is substantially parallel to each one of the fourth plurality of channels.

[0095] Example 22 includes all of the features of example 20, wherein each one of the channels of the second plurality is substantially orthogonal to each one of the channels of the fourth plurality.

[0096] Example 23 is a system including: a process tool including a vacuum chamber; and a gas distribution showerhead in the vacuum chamber, the gas distribution showerhead including a body including an upper surface, a lower surface, an inner zone, and an outer zone surrounding the inner zone; a first plenum in the inner zone, the first plenum fluidly coupled to a first inlet port beyond the upper surface; and a second plenum in the outer zone, the second plenum fluidly coupled to a second inlet port beyond the upper surface, wherein the first plenum is fluidly coupled to the first plurality of apertures, the first plurality of apertures within a central portion of the lower surface, and the second plenum is fluidly coupled to the second plurality of apertures, the second plurality of apertures within a peripheral portion of the lower surface.

[0097] Example 24 includes all of the features of example 23, wherein the first plenum is fluidly coupled to a first process gas source and the second plenum is fluidly coupled to a second process gas source.

[0098] Example 25 includes all of the features of example 24, and further includes a first flow controller between a first process gas source and the first plenum, a second flow controller between a second process gas source and the second plenum, the first flow controller operable to adjust a flow rate of the first process gas, and the second flow controller operable to adjust a flow rate of the second process gas.

[0099] Example 26 is a method for using a gas distribution showerhead, the method including flowing a first process gas from a first process gas source coupled to a first plenum of the gas distribution showerhead, flowing a second process gas from a second process gas source coupled to a second plenum of the gas distribution showerhead, adjusting a first flow rate of the first process gas through the first plenum of the gas distribution showerhead, and adjusting a second flow rate of the second process gas through the second plenum of the gas distribution showerhead, the gas distribution showerhead having an upper surface; a body including a lower surface, an inner zone, and an outer zone surrounding the inner zone; a first plenum in the inner zone, the first plenum fluidly coupled to a first inlet port beyond the upper surface; and a second plenum in the outer zone, the second plenum fluidly coupled to a second inlet port beyond the upper surface, the first plenum fluidly coupled to a first plurality of apertures, the first plurality of apertures within a central portion of the lower surface, the second plenum fluidly coupled to a second plurality of apertures, the second plurality of apertures within a peripheral portion of the lower surface.

[0100] Example 27 includes all of the features of example 26, except that the first process gas is substantially the same as the second process gas.

[0101] Example 28 includes all of the features of example 27, further including flowing a third process gas from a third process gas source coupled to the third plenum, the third plenum adjacent the first plenum in the inner zone.

[0102] Example 29 includes all of the features of example 28, further including flowing a fourth process gas from a fourth process gas source coupled to the fourth plenum, the fourth plenum adjacent the second plenum in the outer zone.

[0103] Example 30 includes all of the features of example 29, except that the third process gas is substantially the same as the fourth process gas; the first process gas source is coupled to the first plenum and the second plenum; and the second process gas source is coupled to the third plenum and the fourth plenum.

[0104] Example 31 includes all of the features of Example 30, wherein flowing the first process gas from the first process gas source includes flowing the first process gas through a first plenum and a second plenum, and flowing the second process gas from the second process gas source includes flowing the second process gas through a third plenum and a fourth plenum.

[0105] In addition to what is described herein, various modifications may be made to the at least one embodiment without departing from its scope. Thus, the description of the at least one embodiment herein should be construed as an example and not as limiting the scope of the at least one embodiment, which should instead be determined with reference to the following claims.

Claims

1. 1. A gas distribution showerhead comprising: a body including an upper surface, a lower surface, an inner zone, and an outer zone surrounding the inner zone; a first plenum in the inner zone coupled to a first inlet port beyond the top surface; a second plenum in the outer zone, the second plenum coupled to a second inlet port beyond the top surface; the first plenum is coupled to a first plurality of apertures; the first plurality of apertures are within a central portion of the lower surface; the second plenum is coupled to a second plurality of apertures; the second plurality of apertures are within a perimeter portion of the lower surface.

2. 10. The gas distribution showerhead of claim 1, the first plenum includes a first chamber within the inner zone; the second plenum includes a second chamber in the outer zone.

3. 3. The gas distribution showerhead of claim 2, further comprising a third plenum within the inner zone; The third plenum is coupled to a third inlet port and a third plurality of apertures.

4. 4. The gas distribution showerhead of claim 3, the third plurality of apertures are in the central portion of the lower surface.

5. 5. The gas distribution showerhead of claim 4, further comprising a fourth plenum within the outer zone; The fourth plenum is coupled to a fourth inlet port and a fourth plurality of apertures.

6. 6. The gas distribution showerhead of claim 5, the fourth plurality of apertures are within the perimeter portion of the lower surface.

7. 7. The gas distribution showerhead of claim 6, the first plenum includes a first plurality of channels within the inner zone; the second plenum includes a second plurality of channels in the outer zone.

8. 8. The gas distribution showerhead of claim 7, each of the first plurality of channels being substantially parallel to one another; wherein each one of the second plurality of channels are substantially parallel to one another.

9. 9. The gas distribution showerhead of claim 8, the third plenum includes a third plurality of channels in the inner zone.

10. 10. The gas distribution showerhead of claim 9, the third plurality of channels being substantially parallel to one another.

11. 11. The gas distribution showerhead of claim 10, a first plurality of channels that are substantially coplanar with a second plurality of channels that are substantially coplanar with a third plurality of channels;

12. 11. The gas distribution showerhead of claim 10, a first plurality of channels that are substantially non-coplanar with a second plurality of channels that are substantially non-coplanar with a third plurality of channels;

13. 13. The gas distribution showerhead of claim 12, each of the first plurality of channels being substantially coplanar within a first plane within the inner zone; each of the third plurality of channels being substantially coplanar within a second plane within the inner zone; The gas distribution showerhead, wherein the first plane is above the second plane.

14. 14. The gas distribution showerhead of claim 13, wherein each one of the first plurality of channels is substantially parallel to each one of the third plurality of channels.

15. 14. The gas distribution showerhead of claim 13, wherein each one of the first plurality of channels is substantially orthogonal to each one of the third plurality of channels.

16. 10. The gas distribution showerhead of claim 9, the fourth plenum includes a fourth plurality of channels in the outer zone.

17. 17. The gas distribution showerhead of claim 16, the fourth plurality of channels being substantially parallel to one another.

18. 20. The gas distribution showerhead of claim 17, wherein each one of the second plurality of channels is substantially coplanar with each one of the fourth plurality of channels.

19. 20. The gas distribution showerhead of claim 17, a fourth plurality of channels disposed adjacent to the second plurality of channels and arranged in a first direction;

20. 20. The gas distribution showerhead of claim 19, each of the second plurality of channels being substantially coplanar in a third plane within the outer zone; each one of the fourth plurality of channels being substantially coplanar in a fourth plane within the outer zone; the third plane is above the fourth plane.

21. 21. The gas distribution showerhead of claim 20, wherein each one of the second plurality of channels is substantially parallel to each one of the fourth plurality of channels.

22. 21. The gas distribution showerhead of claim 20, wherein each one of the second plurality of channels is substantially orthogonal to each one of the fourth plurality of channels.

23. 1. A system comprising: a process tool including a vacuum chamber; a gas distribution showerhead within the vacuum chamber, a body including an upper surface, a lower surface, an inner zone, and an outer zone surrounding the inner zone; a first plenum in the inner zone coupled to a first inlet port beyond the top surface; a second plenum in the outer zone, the second plenum coupled to a second inlet port beyond the top surface; and Equipped with the first plenum is coupled to a first plurality of apertures; the first plurality of apertures are within a central portion of the lower surface; the second plenum is coupled to a second plurality of apertures; the second plurality of apertures are within a perimeter portion of the lower surface.

24. 24. The system of claim 23, the first plenum is coupled to a first process gas source; The second plenum is coupled to a second process gas source.

25. 25. The system of claim 24, a first flow controller between the first process gas source and the first plenum; a second flow controller between the second process gas source and the second plenum; the first flow controller is operable to adjust a flow rate of a first process gas; The second flow controller is operable to adjust the flow rate of a second process gas.

26. 1. A method for using a gas distribution showerhead, comprising: flowing a first process gas from a first process gas source coupled to a first plenum of the gas distribution showerhead; flowing a second process gas from a second process gas source coupled to a second plenum of the gas distribution showerhead; adjusting a first flow rate of the first process gas through the first plenum of the gas distribution showerhead; and adjusting a second flow rate of the second process gas through the second plenum of the gas distribution showerhead, the gas distribution showerhead comprising: a body including an upper surface, a lower surface, an inner zone, and an outer zone surrounding the inner zone; a first plenum in the inner zone coupled to a first inlet port beyond the top surface; a second plenum in the outer zone, the second plenum coupled to a second inlet port beyond the top surface; the first plenum is coupled to a first plurality of apertures; the first plurality of apertures are within a central portion of the lower surface; the second plenum is coupled to a second plurality of apertures; The method, wherein the second plurality of apertures are within a perimeter portion of the lower surface.

27. 27. The method of claim 26, The method, wherein the first process gas is substantially the same as the second process gas.

28. 28. The method of claim 27, further comprising flowing a third process gas from a third process gas source coupled to the third plenum; The method of claim 1, wherein the third plenum is adjacent to the first plenum in the inner zone.

29. 29. The method of claim 28, further comprising flowing a fourth process gas from a fourth process gas source coupled to the fourth plenum; The method of claim 1, wherein the fourth plenum is adjacent to the second plenum in the outer zone.

30. 30. The method of claim 29, the third process gas is substantially the same as the fourth process gas; the first process gas source is coupled to the first plenum and the second plenum; The method wherein the second process gas source is coupled to the third plenum and to the fourth plenum.

31. 31. The method of claim 30, flowing the first process gas from the first process gas source includes flowing the first process gas through the first plenum and the second plenum; The method, wherein flowing the second process gas from the second process gas source includes flowing the second process gas through the third plenum and the fourth plenum.

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