Particle discharge device and method for wet cleaning of a particle discharge device

Abstract

The present invention relates to a particle ejector (1) for separating particles from a process gas stream and to a method for wet cleaning the particle ejector (1).

Description

[Technical Field]

[0001] The present invention provides a particle extraction apparatus for separating particles from a process gas stream, comprising: The particle discharge device comprises: an apparatus housing having a vertically oriented vertical axis; and a filter separating the apparatus housing into a process chamber having particles to be separated and a clean gas chamber containing the process gas from which the particles have been removed; a particle inlet disposed in the process chamber; and a particle outlet disposed in the process chamber; a clean gas outlet disposed within the clean gas chamber; Regarding particle ejection devices.

[0002] Additionally, the present invention provides a method for wet cleaning a particle exhaust system to separate particles from a process gas stream, the method comprising: The particle discharge device comprises: an apparatus housing having a vertically oriented vertical axis; a filter separating the apparatus housing into a process chamber having particles to be separated and a clean gas chamber containing the process gas from which the particles have been removed; a particle inlet disposed in the process chamber; and a particle outlet disposed in the process chamber; a clean gas outlet disposed within the clean gas chamber; This is about the method.

[0003] In the unprinted prior art, the particle ejector is provided with a filter that can be removed for cleaning, and for this purpose the particle ejector is preferably arranged on a lifting column that is suitable for lowering the filter to a height that is comfortable for the operator in order to remove it. Summary of the Invention [Problem to be solved by the invention]

[0004] It is therefore an object of the present invention to provide a particle discharge device and method that allows cleaning in place (CIP) without removing the filter. [Means for solving the problem]

[0005] This problem is posed by particle exhaust devices of the type mentioned at the beginning: The particle discharge device comprises: a clean gas chamber cleaning device for wet cleaning a filter having a filter surface inclined relative to a vertical axis during a cleaning operation, the clean gas chamber cleaning device being disposed in the clean gas chamber and comprising at least one clean gas chamber cleaning nozzle; and a bypass device having a bypass channel therethrough; The problem can be solved by providing a bypass channel having a bypass inlet connected to the clean gas chamber and a bypass outlet connected to the process chamber, wherein the bypass device further comprises a bypass channel blocking element, which can optionally be positioned in a blocked position to prevent fluid from passing through the bypass channel or in at least one open position to allow fluid to pass through. Advantageously, this embodiment of the particle ejection device allows for clean-in-place (CIP) cleaning of the particle ejection device. This also eliminates the need for an expensive lifting column for the particle ejection device.

[0006] The cleaning operation refers to the operation of the particle discharger when the filtering process is interrupted, in which particles are cleaned from the filter by at least one cleaning device arranged in the particle discharger. The process during the cleaning operation sequence is called the wet cleaning process.

[0007] Wet cleaning refers to cleaning the filter during a cleaning operation using a cleaning fluid that is configured as a liquid, in particular water.

[0008] The drying process refers to the process of drying the filter after the wet cleaning process.

[0009] In contrast to a cleaning operation, a running operation refers to an operation in which particles introduced into the particle ejector by the process gas are removed from the process gas stream by a filter.

[0010] Dry cleaning refers to cleaning the filter with a gas, especially air, during operating operation.

[0011] In an advantageous development of the particle ejection device in this respect, the bypass device comprises a blocking element drive assigned to the bypass channel blocking element, which moves the bypass channel blocking element from the blocking position to the open position and vice versa, thereby achieving further automation of the particle ejection device.

[0012] Furthermore, a process chamber cleaning device having at least one process chamber cleaning nozzle is preferably arranged in the process chamber, and the at least one process chamber cleaning nozzle is preferably movable radially relative to the vertical axis toward the device housing wall and in the opposite direction. This further development of the particle exhaust device ensures that not only can the clean gas chamber be automatically cleaned using the clean gas cleaning device, but also the process gas chamber can be automatically cleaned using the process gas cleaning device. Thus, not only the upper side of the filter arranged in the clean gas chamber, but also the bottom side of the filter arranged in the process chamber can be cleaned, which means that particles that clog the filter can be removed from the filter.

[0013] According to a further preferred embodiment of the particle ejection device, the particle ejection is arranged in the region of the device housing base. The arrangement of the particle ejection in the device housing base facilitates, on the one hand, emptying of the particle ejection device, and, on the other hand, the cleaning fluid, which is preferably configured as a cleaning liquid, flows out of the particle ejection device via the particle ejection by gravity.

[0014] According to a further advantageous development of the particle discharge device, the filter is connected to the inner surface of the device housing wall at its edge region, so that a cleaning fluid collector is formed in the edge region of the device housing wall and connected to the bypass inlet, preferably with a lowest portion, and the bypass inlet at the lowest portion of the cleaning fluid collector is connected to this cleaning fluid collector. Based on a filter having a filter plane inclined relative to the vertical axis, i.e., a normal vector to the filter plane is angled relative to the vertical axis, the cleaning fluid collector with its lowest portion is formed in the edge region of the filter adjacent to the inner surface of the device housing wall. During the wet cleaning process carried out in the cleaning operation when the filtering process is interrupted, a clean gas chamber cleaning device arranged in the clean gas chamber and preferably including at least one clean gas chamber cleaning nozzle sprays a cleaning fluid configured as a cleaning liquid for wet cleaning, which cleans the filter and flows out through the upper side of the filter facing the clean gas chamber. The cleaning liquid is then collected in the lowest part of the cleaning fluid collection section, where the cleaning fluid can continue to flow through the bypass device via the bypass inlet and the bypass channel following the bypass inlet, and be led into the process chamber. Therefore, such a design of the particle discharge device ensures that the particle discharge device can be cleaned in place.

[0015] Preferably, the particle discharge device is provided downstream of the clean gas outlet with a conveying device that variably adjusts the process gas flow. In addition to treating the granules in the treatment device, the conveying device can variably adjust the process gas flow that transports particles from the treatment device, particularly configured as a fluidizer, into the particle discharge device. In this regard, the conveying device has a control unit and a conveying unit. To adjust the process gas flow, either the conveying unit, which is preferably configured as a blower, or the control unit, which is preferably equipped with an adjustment function, can be adjusted. Preferably, the control unit is configured as a regulating valve with a control unit drive or as a regulating flap with a control unit drive. On the one hand, it is possible to equalize the fluctuations of the blower in transporting the process gas flow, and on the other hand, via the control unit configured as a regulating valve or regulating flap, it is possible to adjust the passage cross-sectional area and thus the process gas flow due to the resulting pressure loss.

[0016] According to a further advantageous development of the particle discharge device, the particle discharge device includes a dry cleaning device suitable for cleaning the filter during operation. This allows the filter to be easily yet effectively cleaned if a high pressure drop across the filter is detected during operation. Whether the filter is already clogged with particles can be determined, inter alia, by measuring the pressure difference between the process chamber and the clean gas chamber, with the particle discharge device having a measuring device suitable for detecting the pressure difference for this purpose. Other measurement methods are also possible.

[0017] Finally, the particle discharge device preferably comprises a control unit with regulating functions, which control unit is particularly suitable for controlling and / or regulating the particle discharge device. In particular, the control device is configured to control and / or regulate the conveying device and / or the shut-off element drive and / or the control unit drive and / or the dry cleaning drive and / or the clean gas chamber cleaning device and / or the process chamber cleaning device. Advantageously, this allows automated operation.

[0018] Furthermore, this problem is amplified in the case of methods of the type mentioned at the beginning. A particle ejector, a clean gas chamber cleaning device for wet cleaning a filter having a filter surface inclined relative to a vertical axis during a cleaning operation, the clean gas chamber cleaning device being disposed in the clean gas chamber and comprising at least one clean gas chamber cleaning nozzle; and a bypass device having a bypass channel therethrough; This can be solved by In this case, the bypass channel has a bypass inlet connected to the clean gas chamber and a bypass outlet connected to the process chamber, and in this case the bypass device further comprises a bypass channel blocking element, which can optionally be arranged in a blocked position to prevent fluid from passing through the bypass channel or in at least one open position to allow fluid to pass through, and in this case during a cleaning operation the clean gas chamber cleaning device applies a cleaning fluid configured as a cleaning liquid and the bypass channel blocking element moves from the blocked position to the open position, so that the cleaning fluid can flow from the cleaning chamber at least partially through the bypass channel to the process chamber. Advantageously, this method enables CIP cleaning of the particle discharge device, which can save considerable investment costs, for example for expensive lifting columns.

[0019] According to advantageous developments of the method in this respect, the bypass channel blocking element is moved from the blocking position to the open position before, during or after application of the cleaning fluid. Advantageously, after opening the bypass channel blocking element, the cleaning fluid configured as cleaning liquid continues to flow through the bypass device via the bypass inlet and the bypass channel leading to the bypass inlet and into the process chamber, from where it can be applied, for example, through the particle discharge.

[0020] According to a further advantageous embodiment of the method, the cleaning fluid is discharged from the treatment chamber via the particle discharge, which allows for easy application of the cleaning fluid configured as a cleaning liquid.

[0021] Furthermore, preferably, after wet cleaning, the filter is dried by flowing unloaded process gas through the particle discharge device, with the blocking element remaining in an open position at least at the beginning of the drying process to allow the unloaded process gas to at least partially flow through the bypass device. According to an advantageous development in this regard, the unloaded process gas is heated before flowing through the particle discharge device, resulting in evaporation or vaporization of the cleaning fluid coupled to the filter after wet cleaning. After wet cleaning, most of the filter openings are clogged with cleaning liquid, resulting in a very large pressure loss through the filter. For this reason, the bypass channel blocking element remains open or is opened to allow the unloaded process gas to bypass the filter and flow into the clean gas chamber. As the drying process progresses, the bypass channel blocking element can be further closed, with the result that most of the unloaded process gas is forced to flow by the filter. This means that the bypass channel blocking element is moved from its initial open position to an open position that more strongly prevents fluid passage. This significantly shortens the drying process. The heated process gas also heats the filter, causing the cleaning fluid that clogs the filter after wet cleaning to evaporate or vaporize. Once the cleaning liquid has evaporated or vaporized and the filter is dry, the drying process can be stopped.

[0022] The invention will be explained in more detail below with reference to the accompanying drawings. [Brief explanation of the drawings]

[0023] [Figure 1] FIG. 1 is a process flow diagram of a granule producing apparatus having a particle ejector. [Figure 2] FIG. 1 is a perspective view of a particle ejection device. [Figure 3] FIG. 2 is a bottom view of the particle ejection device. [Figure 4] 4 is a cross-sectional view of the particle ejector taken through section BB shown in FIG. 3. [Figure 5] FIG. 5 is an enlarged view of section D of the particle ejector shown in FIG. 4. DETAILED DESCRIPTION OF THE INVENTION

[0024] Unless otherwise stated, the following description relates to the preferred embodiment of particle ejection device 1 depicted in the drawings.

[0025] FIG. 1 shows a process flow diagram of a granule producing apparatus 2 with a particle discharge apparatus 1 for producing granules, referred to as particles P, particularly for the pharmaceutical industry.

[0026] The granule production device 2 shown as an example comprises a storage container 3 for the starting material AS, which is configured as a mobile suspension tank 4. The storage container 3 is connected to a granulator 8 via a first conveying line 7a with a conveying device 6 configured as a pump 5. In the granulator 8, granules are produced from the starting material AS. In an embodiment not shown, the starting materials AS are fed to the granulator 8 separately from one another.

[0027] The granules produced in the granulator 8 are sieved in a sieving device 9 connected to the granulator 8 and then conveyed to a fluidizer 11 configured as a fluidized bed dryer 10 by means of a second conveying line 7b through which a process gas PG configured as a carrier gas TG flows. In the fluidizer 11, the sieved granules are further processed, in particular dried, in a fluidized state using the process gas PG. For fluidization in the fluidizer 11, the granule generator 2 comprises a conveying device 13 configured as a conveying unit 14 that generates a process gas flow. The conveying unit 14 is preferably configured as a blower 12 or as a ventilation device.

[0028] After treatment in the fluidizer 11, the treated granules, also referred to as particles P, are transported by process gas PG through a third transport line 7c using a transport device 13 to the product discharge device 1. For variable adjustment of the process gas flow, the transport device 13 is equipped with a control unit 17 configured as a regulating valve 16, in addition to a transport unit 12 with an upstream filter device 15. The particles P transported into the particle discharge device 1 by the process gas PG are removed from the process gas flow in a filter 24, whereupon the particles P are collected in a collection vessel 19, referred to as clean gas RG, and the cleaned process gas PG is transported by the transport device 13 from the granule generator 2, for example, to the ambient environment. The process gas flow can further be variably adjusted in the granule generator 2 via a corresponding control or regulating valve 20.

[0029] A negative pressure is maintained in the granule producing device 2 by the arrangement of the conveying device 13 downstream of the fluidizing device 11 and downstream of the particle discharging device 1. The negative pressure is suitably between 50 mbar and 500 mbar, preferably about 100 mbar.

[0030] FIG. 2 shows in perspective view a particle ejector 1 for separating particles P from a process gas stream.

[0031] The particle ejection device 1 comprises an apparatus housing 21 having a vertically oriented vertical axis AA. In the illustrated embodiment, the apparatus housing 21 has an apparatus housing wall 28, which comprises an apparatus housing cover 54, an apparatus housing section 22 having a cylindrical configuration, an apparatus housing section 23 having a conical configuration, and an apparatus housing base 30.

[0032] In the illustrated embodiment, a filter 24 is disposed within the cylindrical apparatus housing section 22, and the filter separates the apparatus housing 21 into a process chamber 25 for containing particles P separated from the process gas stream and a clean gas chamber 26 for containing the particle-cleaned process gas PG. Here, the process gas chamber 25 extends across the conical apparatus housing section 23 and the partially cylindrical apparatus housing section 22, while the clean gas chamber 26 extends entirely across the cylindrical apparatus housing section 22.

[0033] In the illustrated embodiment, the filter 24 is configured as a metal filter 27 and is arranged in a filter plane CC inclined relative to the vertical axis AA, i.e., a normal vector 51 to the filter plane CC forms an angle 52 with the vertical axis AA. The angle 52 preferably has an angular dimension of 1° to 20°, in particular 3° to 10°. In a non-illustrated embodiment, the filter 24 is realized as a woven fabric filter. Furthermore, the filter 24 is connected to the inner surface 36 of the device housing wall 28 at its edge region 35. As a result, a cleaning fluid collector 37 connected to a bypass inlet 38 is formed on the inner surface 36 of the device housing wall 28 at the edge region 35. Preferably, as in the illustrated embodiment, the cleaning fluid collector 37 has a lowest portion 39, and the bypass inlet 38 is connected to the cleaning fluid collector 37 at the lowest portion 39 of the cleaning fluid collector 37.

[0034] The particle ejection device 1 also comprises a bypass device 44 through which a bypass channel 43 passes, the bypass channel 43 comprising a bypass inlet 38 connected to the clean gas chamber 26 and a bypass outlet 45 connected to the process chamber 25. The bypass device 44 further comprises a bypass channel blocking element 46 which can optionally be arranged in a blocked position to prevent the passage of fluid through the bypass channel 44 or in at least one open position to allow the passage of fluid. To optionally move the bypass channel blocking element 46 from the blocked position to the open position or vice versa, the bypass device 44 preferably comprises a blocking element drive 49 assigned to the bypass channel blocking element 46.

[0035] Furthermore, the particle discharge device 1 includes: a clean gas chamber cleaning device 42 arranged in the clean gas chamber 26 and comprising at least one clean gas chamber cleaning nozzle 41 for wet cleaning the filter 24 having a filter surface CC inclined relative to the vertical axis AA during a cleaning operation; That is, a normal vector 51 to the filter surface CC has an angle 52 with respect to the vertical axis AA. The angle 52 preferably has an angular dimension of 1° to 20°, in particular 3° to 10°. As a result, a cleaning fluid configured as a cleaning liquid can effectively flow over the upper side 53 of the filter during the cleaning operation towards the cleaning fluid collector 37 and then through the bypass channel 44 from the clean gas chamber 26 to the treatment chamber 25.

[0036] As can be seen in the cross-sectional view of the particle discharge apparatus 1 taken along the line BB in FIG. 3 , a process chamber cleaning apparatus 48 having at least one process chamber cleaning nozzle 47 is disposed within the process chamber 25. In the illustrated embodiment, the process chamber cleaning apparatus 48 is configured as a cleaning lance 55, such that the at least one process chamber cleaning nozzle 47 is movable radially relative to the vertical axis AA toward and away from the apparatus housing wall 28. This allows the process chamber cleaning apparatus 48 to be moved out of the process chamber 25 from the vertical axis AA toward the apparatus housing wall 28 during operation, and allows a process chamber cleaning apparatus head (not shown) to be inserted flush with the apparatus housing wall 28 so as not to disturb the separation of particles from the process gas during operation. Furthermore, to prevent clogging of the at least one process chamber cleaning nozzle 47 by particles P during operation of the particle discharge apparatus 1, a fluid, preferably a process gas PG, constantly flows through the process chamber cleaning apparatus 48. During a cleaning operation, the process chamber cleaning device 48 extends along a vertical axis AA within the process chamber 25 to clean the filter 24 from adhering particles P at the filter lower surface 56 .

[0037] In the cylindrical device housing part 22, the particle discharge device 1 comprises a particle inlet 31 arranged in the process chamber 25. During operation, particles are fed to the particle discharge device 1 through the particle inlet 31 and are discharged from the fluidizer 11 by the process gas via the conveying line 7c.

[0038] In the conical device housing part 23, the particle discharge device 1 has a particle discharge part 33 arranged in the area 32 of the device housing base 29. During operation, particles removed from the process gas PG via the filter 24 are discharged out of the particle discharge device 1 via the particle discharge part 32 and collected in the collection container 19.

[0039] Furthermore, an apparatus housing cover 54 is arranged on the apparatus housing 21 for inspection purposes, and has a manhole socket 29 that is closed during both operating and cleaning operations, as well as a clean gas outlet 34 connected to the clean gas chamber 26, as shown in the enlarged view of cross section D of the particle discharger 1 shown in FIG. 4 . Downstream of the clean gas outlet 34, the particle discharger 1 comprises a conveying device 13 configured as a blower 12 for variably adjusting the process gas flow. In this regard, the conveying device 13 comprises a conveying unit 12 and a control unit 17, which in the illustrated embodiment is configured as an adjusting valve 16 with a control unit drive 50. In an embodiment not shown, the control device 17 is realized as an adjusting flap with a control unit drive 50.

[0040] Furthermore, the particle discharge device 1 comprises a dry cleaning device 57 for the wet cleaning filter 24 . In the embodiment shown, the dry cleaning device 57 is configured as a regulating valve 59 with a dry cleaning device drive 58. In an embodiment not shown, the dry cleaning device 57 is realized as a regulating flap with a dry cleaning device drive 58.

[0041] During operation, when particles P introduced into the particle exhaust system 1 using the process gas PG are removed from the process gas stream through the filter 24, the filter 24 becomes clogged with particles P. This increases the pressure drop across the filter 24 to the extent that dry or wet cleaning of the filter is required to remove the particles P from the filter.

[0042] Dry cleaning is performed particularly during operational operation, with the regulating valve 16 closed and the regulating valve 59 open, so that the filter 24 is subjected to a pressure surge due to the negative pressure prevailing in the particle discharge device 1. This pressure surge at least partially cleans the particles P adhering to the filter 24 from the filter 24. Immediately after dry cleaning is performed, the regulating valve 16 is opened and the regulating valve 59 is closed, continuing to separate the particles P from the process gas flow. Dry cleaning can be performed at any time and with any frequency during operational operation. In an embodiment not shown, the dry cleaning device is designed so that compressed air is used for cleaning.

[0043] The cleaning operation is an operation of the particle discharger in which particles are cleaned from the filter when the filtering process is interrupted. During the cleaning operation, the regulating valves 16 and 59 and the particle inlet 31 are preferably closed, if possible.

[0044] The method for wet cleaning of the particle discharge device 1 is carried out in a cleaning operation, in which the clean gas chamber cleaning nozzle 41 of the clean gas chamber cleaning device 42 sprays a cleaning fluid configured as a cleaning liquid into the clean gas chamber 26 when the filtering process is interrupted, thereby removing particles P adhering to the filter 24 from the filter 24 and thus cleaning the filter 24.

[0045] The filter 24 is arranged with a filter plane CC inclined relative to the vertical axis AA, i.e., the normal vector 51 to the filter plane CC has an angle 52 with respect to the vertical axis AA, so that sprayed cleaning liquid, such as water or another solvent, can flow onto the upper side 53 of the filter in the direction of the edge region 35 of the filter 24 and the cleaning fluid collection section 37 configured in the device housing wall 28.

[0046] The bypass channel blocking element 46 moves from the blocking position to the open position before, during, or after application of the cleaning fluid. Preferably, the bypass channel blocking element moves to the open position before applying the cleaning fluid during a cleaning operation so that cleaning fluid collected in the cleaning fluid collection section 37 can flow from the clean gas chamber 26 at least partially through the bypass channel 43 to the process gas chamber 25.

[0047] The cleaning fluid is then preferably exhausted from the process chamber 25 via particle exhaust 33. In an embodiment not shown, the cleaning fluid is exhausted from the process chamber 25 via a cleaning fluid exhaust system.

[0048] After wet cleaning, the filter 24 is dried. To dry the filter 24, unloaded process gas PG flows through the particle exhaust device 1, with the bypass channel blocking element 46 remaining in an open position at least at the beginning of the drying process to allow the unloaded process gas PG to flow at least partially through the bypass device 44. In this case, the unloaded process gas PG is preferably heated before flowing through the particle exhaust device 1, thereby evaporating or vaporizing the cleaning fluid coupled to the filter 24 after wet cleaning. As the drying process progresses, the bypass channel blocking element 46 is preferably further closed until it reaches its blocking position at the end of the drying process.

Claims

1. A particle extractor (1) for separating particles (P) from a process gas stream, comprising: The particle discharge device (1) comprises: a device housing (21) having a vertically oriented vertical axis (A-A); a filter (24) separating the device housing (21) into a process chamber (25) having particles (P) to be separated and a clean gas chamber (26) containing a process gas (PG) from which particles have been removed; A particle inlet (31) disposed in the process chamber (25), and a particle outlet (33) disposed in the process chamber (25), a clean gas outlet (34) disposed within the clean gas chamber (26); In the particle discharge device (1), The particle discharge device (1) comprises: a clean gas chamber cleaning device (42) arranged in the clean gas chamber (26) and comprising at least one clean gas chamber cleaning nozzle (41) for wet cleaning a filter having a filter surface (C-C) inclined relative to a vertical axis (A-A) during a cleaning operation; and a bypass device (44) through which a bypass channel (43) passes; the bypass channel (43) comprises a bypass inlet (38) connected to the clean gas chamber (26) and a bypass outlet (45) connected to the process chamber (25); the bypass device (44) further comprises a bypass channel blocking element (46), which is optionally positionable in a blocking position to prevent the passage of fluid through the bypass channel (43), or in at least one open position to allow the passage of fluid; A particle discharge device (1) characterized in that:

2. 2. The particle discharge device (1) according to claim 1, characterized in that the bypass device (44) comprises a blocking element drive (49) assigned to the bypass channel blocking element (46), which moves the bypass channel blocking element (46) from a blocking position to an open position or vice versa.

3. a process chamber cleaning device (48) having at least one process chamber cleaning nozzle (47) disposed within the process chamber (25); 3. The particle discharge device (1) according to claim 1 or 2, characterized in that at least one process chamber cleaning nozzle (47) is movable radially relative to the vertical axis (A-A) towards the device housing wall (28) and in the opposite direction.

4. Particle discharge device (1) according to any one of claims 1 to 3, characterized in that the particle discharge (33) is arranged in the area (32) of the device housing base (30).

5. the filter (24) is connected at its edge region (35) to an inner surface (36) of the device housing wall (28), so that a cleaning fluid collector (37) is formed in the edge region (35) of the device housing wall (28), the cleaning fluid collector (37) being connected to the bypass inlet (38); Preferably, the cleaning fluid collector (37) has a lowest part (39), and the bypass inlet (38) is connected to the cleaning fluid collector (37) at the lowest part (39) of the cleaning fluid collector (37).

6. 6. The particle discharge device (1) according to claim 1, further comprising a conveying device (13) arranged downstream of the clean gas outlet (34) for variable adjustment of the process gas flow.

7. 7. Particle discharge device (1) according to claim 6, characterized in that the conveying device comprises a control unit (17), preferably with an adjustment function, and a conveying unit (14).

8. 8. The particle discharge device (1) according to claim 7, characterized in that the control unit (17) is formed as a regulating valve (16) with a control unit drive (50) or as a control flap with a control unit drive (50).

9. The particle discharge device (1) according to any one of claims 1 to 8, characterized in that the particle discharge device (1) comprises a dry cleaning device suitable for cleaning the filter during operational operation.

10. 1. A method for wet cleaning a particle discharge device (1) for separating particles (P) from a process gas stream, comprising: The particle discharge device (1) comprises: a device housing (21) having a vertically oriented vertical axis (A-A); a filter (24) separating the device housing (21) into a process chamber (25) having particles (P) to be separated and a clean gas chamber (26) containing a process gas (PG) from which particles have been removed; A particle inlet (31) disposed in the process chamber (25) and a particle outlet (33) disposed in the process chamber (25), a cleaning gas outlet (34) disposed within the clean gas chamber (26); In the method, The particle discharge device (1) comprises: a clean gas chamber cleaning device (42) arranged in the clean gas chamber (26) and comprising at least one clean gas chamber cleaning nozzle (41) for wet cleaning a filter having a filter surface (C-C) inclined relative to a vertical axis (A-A) during a cleaning operation; and a bypass device (44) through which a bypass channel (43) passes; the bypass channel (43) comprises a bypass inlet (38) connected to the cleaning chamber (26) and a bypass outlet (45) connected to the process chamber (25); the bypass device (44) further comprises a bypass channel blocking element (46), which is optionally positionable in a blocking position to prevent the passage of fluid through the bypass channel (43) or in at least one open position to allow the passage of fluid; During a cleaning operation, the clean gas chamber cleaning device (42) applies a cleaning fluid configured as a cleaning liquid, and the bypass channel blocking element (46) moves from a blocking position to an open position, so that cleaning fluid can flow from the cleaning chamber (26) at least partially through the bypass channel (43) to the process chamber (25). A method characterized by:

11. 11. The method of claim 10, wherein the bypass channel blocking element (46) moves from a blocking position to an open position before, during, or after application of a cleaning fluid.

12. 12. Method according to claim 10 or 11, characterized in that a cleaning fluid is discharged from the processing chamber (25) via the particle discharge (33).

13. After wet cleaning, the filter (24) is dried by flowing unloaded process gas (PG) through the particle ejector (1), 13. The method according to any one of claims 10 to 12, characterized in that at least at the beginning of the drying process, the shut-off element (46) remains in an open position so that unloaded process gas (PG) can at least partially flow through the bypass device (44).

14. 14. The method of claim 13, wherein the bypass channel blocking element is further closed as the drying process progresses.

15. 15. The method according to claim 13 or 14, characterized in that the unloaded process gas (PG) is heated before flowing through the particle ejector (1), so that cleaning fluid coupled to the filter (24) after wet cleaning is evaporated or vaporized.

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