Baking apparatus

Abstract

To improve a recovery rate of a volatile matter volatilized from an object.SOLUTION: The firing apparatus includes an accommodation portion having an internal space for accommodating an object, equipment to which the accommodation portion is detachably attached and which has an equipment flow path communicating with the internal space, a pump connected to the equipment flow path and configured to discharge gas in the internal space, a trap portion disposed in the internal space and configured to trap a volatile component volatilized from the object, a heating portion configured to heat the object, and a cooling portion configured to cool the trap portion.SELECTED DRAWING: Figure 2

Description

[Technical Field]

[0001] The present disclosure relates to a baking apparatus. [Background technology]

[0002] Conventionally, there are techniques for removing and recovering volatile substances (impurities) such as metals contained in workpieces (for example, Patent Document 1). In the heat treatment device of Patent Document 1, the workpieces are heated in a heating chamber to vaporize the impurities contained in the workpieces. The gaseous impurities are then guided to a cooling chamber connected to the heating chamber, where they are cooled, recovering the solid or liquid impurities. A vacuum pump creates an airflow that guides the gaseous impurities from the heating chamber to the cooling chamber. [Prior art documents] [Patent documents]

[0003] [Patent Document 1] Japanese Patent Application Publication No. 2019-109014 Summary of the Invention [Problem to be solved by the invention]

[0004] However, if the degree of vacuum in the heating and cooling chambers is set high enough that the volatiles behave like molecular flow, the proportion of volatiles that reach the cooling chamber will be small, resulting in a lower recovery rate of volatiles. [Means for solving the problem]

[0005] The present disclosure can be realized in the following forms.

[0006] (1) According to one aspect of the present disclosure, a calcination device is provided. The calcination device includes a storage unit having an internal space for storing an object, equipment to which the storage unit is detachably attached and having a flow path communicating with the internal space, a pump connected to the flow path and discharging gas from the internal space, a trap unit disposed in the internal space for trapping volatiles volatilized from the object, a heating unit for heating the object, and a cooling unit for cooling the trap unit. According to this aspect, the trap unit is disposed in the same space as the internal space in which the object is stored. This allows the volatiles to be efficiently trapped by the trap unit. The recovery rate of the volatiles can be improved even when the internal space is set to a high degree of vacuum to the extent that the volatiles exhibit molecular flow behavior. (2) In the firing apparatus of the above embodiment, the storage unit may have a valve that opens and closes the opening of the internal space. According to this embodiment, by closing the valve and removing the storage unit from the equipment, the firing apparatus can be transported without exposing the internal space to the atmosphere. (3) In the baking apparatus of the above embodiment, the storage unit may include a cylindrical portion having the opening and a container detachably connected to the cylindrical portion, the internal space including a first internal space of the cylindrical portion and a second internal space of the container, the object being stored in the second internal space, the heating unit disposed around the container and heating the object by radiating electromagnetic waves, and a wall portion disposed between the heating unit and the trap unit and preventing the electromagnetic waves from reaching the trap unit. This embodiment can heat the object in the second internal space while suppressing a temperature rise in the trap unit due to the electromagnetic waves being irradiated thereto. This allows for both heating of the object and cooling of the trap unit. (4) In the firing apparatus of the above embodiment, the trap unit may be disposed in the first internal space, and the cooling unit may be disposed around the cylindrical unit. The container and the cylindrical unit are separable. Therefore, according to this embodiment, the recovery of the target material in the container and the recovery of the volatile matter trapped by the trap unit in the cylindrical unit can be performed separately, thereby improving work efficiency. (5) In the baking apparatus of the above aspect, the trap unit has a plurality of annular parts, each of which has an outer circumferential portion and an extending portion disposed between the outer circumferential portion and its own axis, the plurality of annular parts are disposed at intervals from one another so that their respective axes are coaxial with the axis of the trap unit, and when the trap unit is viewed along the axis, the extending portion of one annular part of the plurality of annular parts does not have to overlap with the extending portion of an adjacent annular part. This aspect increases the probability that volatiles will reach the trap unit, thereby improving the recovery rate of volatiles. The present disclosure may be realized in various forms other than those described above, for example, in the form of a method for recovering volatile matter. [Brief explanation of the drawings]

[0007] [Figure 1] 1 is a flowchart showing the steps for producing a guest-free silicon clathrate. [Figure 2] FIG. 2 is a cross-sectional view showing the general configuration of a firing device. [Figure 3] FIG. [Figure 4] FIG. 2 is a diagram illustrating the configuration of a heating unit. [Figure 5] FIG. 2 is a perspective view of a cylindrical portion and a cooling portion. [Figure 6] 10A and 10B are diagrams illustrating another embodiment of the wall portion and another embodiment of the cooling portion. DETAILED DESCRIPTION OF THE INVENTION

[0008] A. Implementation: A1. Manufacturing method: Fig. 1 is a flowchart showing the steps of producing a guest-free silicon clathrate. In the first step S1 of Fig. 1, a silicon clathrate in which the host is a clathrate of Si (silicon) is produced. In this embodiment, a case in which Na (sodium) is used as the guest is described as an example. A so-called guest-free silicon clathrate, in which the guest of a silicon clathrate using Na as the guest has been completely removed, can be used as a negative electrode material for lithium-ion batteries.

[0009] In the first step S1, a mixture of Si and Na is fired at a high temperature of, for example, 850°C, and then fired at a low temperature of, for example, 450°C to obtain Na. 20 Si 136 is produced. 20 Si 136 is a compound in which the cage-like framework of Si contains both sites where the guest remains and sites where the guest has left.

[0010] In the second step S2, silicon clathrate is placed in the storage section 2, which will be described later, and the silicon clathrate is heated while the storage section 2 is depressurized. As a result, the guest Na is released from the silicon clathrate, and guest-free silicon clathrate is produced. In this embodiment, the second step S2 uses a firing apparatus 1, which will be described next. The firing apparatus 1 is designed to recover the released guest Na. The second step S2 will be described in detail later.

[0011] The third step S3 and the fourth step S4 are steps for transporting the separated Na without exposing it to the atmosphere. In the third step S3, the inside of the storage unit 2, which will be described later, is replaced with an inert gas. In the fourth step S4, the storage unit 2, which will be described later, is removed from the equipment 5, which will be described later. The third step S3 and the fourth step S4 will also be described in detail later together with the second step S2.

[0012] A2. Baking equipment: FIG. 2 is a schematic cross-sectional view showing the general configuration of the firing apparatus 1 used in the second step S2. In FIG. 2, arrows indicating mutually orthogonal X, Y, and Z directions are shown. The Z direction is a vertically upward direction. The arrows indicating the X, Y, and Z directions are also shown in other figures as appropriate so that the illustrated directions correspond to those in FIG. 2. In the following description, when specifying the direction, the direction indicated by the arrow in each figure is indicated by "+" and the opposite direction is indicated by "-", and positive and negative signs are used in combination to indicate the direction. Hereinafter, the +Z direction will also be referred to as "up" and the -Z direction as "down."

[0013] As shown in FIG. 2, the firing apparatus 1 includes an accommodation section 2, equipment 5, a vacuum pump 52 as a pump, a first trap section 30 and a second trap section 40 as trap sections, a heating section 6, a cooling section 7, and a wall section 91.

[0014] The storage unit 2 has an internal space 3, an opening 2a of the internal space 3, and a valve 22 that opens and closes the opening 2a. The internal space 3 stores silicon clathrate as an object. In this embodiment, the storage unit 2 has a container 10 and a cylindrical portion 20. The internal space 3 includes a first internal space 3A of the cylindrical portion 20 and a second internal space 3B of the container 10. The second internal space 3B communicates with the first internal space 3A. The silicon clathrate is stored in the second internal space 3B of the container 10.

[0015] The container 10 is detachably connected to the cylindrical portion 20 by a connecting member (not shown). The container 10 is made of a material that has high transmittance of electromagnetic waves irradiated from a lamp heater 64 (described later). This allows the silicon clathrate inside the container 10 to be heated efficiently. In this embodiment, quartz glass is used as the material for the container 10. The container 10 has a container body 10a and a container neck 10b. The container body 10a has a cylindrical shape with a bottom. The container neck 10b has a cylindrical shape. The container neck 10b is in communication with the container body 10a.

[0016] The tube portion 20 has a cylindrical shape. The tube portion 20 is disposed coaxially with the axis CX of the container 10. The tube portion 20 is detachably connected to the container neck 10b of the container 10 by a connecting member (not shown). An opening at one end of the tube portion 20 in the Y direction, which is the direction along the axis CX, is the opening 2a of the internal space 3. An opening at the other end of the tube portion 20 in the Y direction is connected to the second internal space 3B of the container 10. As a result, when the tube portion 20 is connected to the container 10, the first internal space 3A and the second internal space 3B form a single internal space 3.

[0017] The cylindrical portion 20 has an outer cylindrical portion 21 that defines the second internal space 3B. A valve 22 is disposed at an opening 2a of the cylindrical portion 20.

[0018] FIG. 3 is a diagram illustrating the valve 22. The valve 22 includes a valve seat 23, a valve element 24, a biasing member 25, and a seat 26. The valve seat 23 is formed at the end of the outer cylindrical portion 21. The seat 26 has an annular shape and is fixed to the inside of the outer cylindrical portion 21. The seat 26 is disposed coaxially with the axis CX and has a through-hole that penetrates the seat 26 in the thickness direction. The biasing member 25 and the valve element 24 are disposed between the valve seat 23 and the seat 26. One end of the biasing member 25, which is, for example, a spring, is fixed to the seat 26. When the valve 22 is in a closed state, the biasing member 25 presses the valve element 24 against the valve seat 23. When the valve element 24 is moved away from the valve seat 23 by a push rod 84 (described later), the valve 22 enters an open state.

[0019] As shown in FIG. 2, the equipment 5 has a rotation mechanism 53, a flow path 54, and a valve opening / closing mechanism 80. The flow path 54 is a flow path with a circular cross section through which gas flows. The storage unit 2 is detachably attached to the equipment 5. The rotation mechanism 53 rotates the attached storage unit 2 about an axis CX. When the storage unit 2 is attached to the equipment 5, the flow path 54 communicates with the internal space 3 of the storage unit 2. The vacuum pump 52 is connected to the flow path 54. The vacuum pump 52 exhausts gas from the internal space 3. Specifically, the gas from the internal space 3 flows through the flow path 54 and is exhausted to the outside by the vacuum pump 52.

[0020] The valve opening / closing mechanism 80 opens the valve 22 in the cylindrical portion 20. The valve opening / closing mechanism 80 has a motor 81, a camshaft 82, a cam 83, and a push rod 84. The camshaft 82 rotates by the driving force of the motor 81. The rotational motion of the camshaft 82 is converted into linear motion of the push rod 84 by the cam 83. This causes the push rod 84 to move back and forth along the axis CX. As described above, when the push rod 84 moves the valve disc 24 of the valve 22 in a direction away from the valve seat 23, the valve 22 opens.

[0021] FIG. 4 is a diagram illustrating the configuration of the heating unit 6. FIG. 4 is a plan view of the container 10 viewed along the Y direction. As shown in FIG. 4, the heating unit 6 is arranged around the container 10. The heating unit 6 has a plurality of lamp heaters 64 and a plurality of reflectors 66. Each lamp heater 64 irradiates electromagnetic waves, specifically near-infrared rays, toward the container 10. Each reflector 66 reflects the electromagnetic waves irradiated from the lamp heater 64 toward the container 10. The silicon clathrate contained in the container 10 is heated by the electromagnetic waves irradiated from the lamp heaters 64 and the electromagnetic waves reflected from the reflectors 66.

[0022] As shown in FIG. 2, the wall 91 is disposed between the heating unit 6 and the first trap unit 30. The wall 91 prevents the electromagnetic waves emitted from the heating unit 6 from being irradiated onto the first trap unit 30. This makes it possible to suppress a rise in temperature of the first trap unit 30. The wall 91 of this embodiment has a hole through which the container neck 10b is inserted and has a generally hemispherical shape. Furthermore, the wall 91 of this embodiment is formed of a material that reflects the electromagnetic waves emitted from the lamp heater 64, similar to the reflector 66. In other words, the wall 91 of this embodiment blocks the electromagnetic waves by reflecting them.

[0023] The first trap section 30 is disposed in the internal space 3. More specifically, the first trap section 30 is disposed inside the container neck 10b. The first trap section 30 is used to trap Na. The first trap section 30 has a cylindrical shape. The first trap section 30 has a plurality of through holes 31 formed radially through the side surface of the cylinder. The first trap section 30 has a larger surface area than a case in which the plurality of through holes 31 are not formed. This allows Na to be collected efficiently. The first trap section 30 is formed of a material that is less reactive with Na and less susceptible to corrosion. For example, stainless steel can be used as the material of the first trap section 30.

[0024] The second trap section 40 is disposed in the internal space 3. Specifically, the second trap section 40 is disposed in the first internal space 3A of the cylindrical section 20. The second trap section 40 is used to trap Na. Like the first trap section 30, the second trap section 40 is formed of a material that is less reactive with Na and less susceptible to corrosion. For example, stainless steel can be used as the material for the second trap section 40.

[0025] The second trap section 40 has a plurality of annular parts 41. Each annular part 41 has a through hole 41a disposed at the center, an outer peripheral part 41b, a plurality of extending parts 41c, and a fixing part 42. Each extending part 41c extends radially from the outer peripheral part 41b as a base. Note that some of the extending parts 41c are connected to the inner peripheral part 41d that defines the through hole 41a. Each of the plurality of annular parts 41 is fixed by the fixing part 42 at intervals so that its axis is coaxial with the axis of the tubular part 20. In other words, the axis of each annular part 41 is the axis of the second trap section 40. The axis of the second trap section 40 coincides with the axis CX.

[0026] When viewed from the direction along the axis CX, which is the axis of the second trap section 40, each annular part 41 is arranged so that its own extending portion 41c does not overlap with the extending portion 41c of at least the adjacent annular part 41. That is, the multiple annular parts 41 are arranged so that their phases are shifted in the arrangement order. By including multiple annular parts 41, the second trap section 40 can have a larger surface area than when including a single annular part 41. This improves the recovery rate of sodium. Furthermore, when viewed from the direction along the axis CX, two adjacent annular parts 41 are arranged so that their respective extending portions 41c do not overlap with each other. This increases the probability that gaseous sodium reaches the second trap section 40, thereby improving the recovery rate of the guest. Furthermore, the multiple annular parts 41 are separably fixed to each annular part 41 by fixing parts 42. As a result, after sodium is recovered, the annular parts 41 are separated into individual annular parts 41, and sodium can be recovered from each annular part 41, making sodium recovery easier.

[0027] 5 is a perspective view of the cylindrical portion 20 and the cooling portion 7. The cooling portion 7 is provided mainly to cool the second trap portion 40. As shown in FIG. 5, the cooling portion 7 is arranged around the cylindrical portion 20. The cooling portion 7 has two cooling units 71 and cooling fins 21a formed on the outer cylindrical portion 21 of the cylindrical portion 20.

[0028] The two cooling units 71 are arranged to surround the outer cylindrical portion 21. Each of the two cooling units 71 has a structure that allows it to be attached by sliding in the radial direction of the outer cylindrical portion 21. This allows the cylindrical portion 20 to be easily attached and detached from the equipment 5. Each cooling unit 71 has an outer wall 72, an inlet pipe 73, and a plurality of partition walls 74. The outer wall 72 is provided with the inlet pipe 73 that introduces cooling air into the interior of the outer wall 72. The partition walls 74 are formed inside the outer wall 72 and are spaced apart in the Y direction parallel to the axis CX.

[0029] The cooling fins 21a attached to the outer cylindrical portion 21 of the cylindrical portion 20 are composed of multiple partition walls spaced apart in the Y direction. When cooling air is introduced into the inlet pipe 73 from a blower (not shown) of the equipment 5, the cooling air flows between the cooling fins 21a and the multiple partition walls 74 and flows out of the outer wall 72 of the cooling unit 71. The cylindrical portion 20 is cooled by heat transfer with the cooling air. The cooling of the cylindrical portion 20 also cools the second trap portion 40 disposed within the cylindrical portion 20 and the first trap portion 30 disposed adjacent to the second trap portion 40. In addition to cooling the second trap portion 40 and the first trap portion 30, the cooling portion 7 also cools the gas flowing through the internal space 3 and the flow path 54. Cooling the gas flowing through the internal space 3 and the flow path 54 can, for example, prevent high-temperature gas from flowing into the vacuum pump 52, thereby protecting the vacuum pump 52.

[0030] A3. Details of steps 2 to 4: In the second step S2, first, silicon clathrate is placed in the container 10 shown in FIG. 2. The cylindrical section 20 is then attached to the container 10. After the first trap section 30 and the second trap section 40 are attached to the storage section 2, the storage section 2 is then attached to the equipment 5. The valve 22 of the cylindrical section 20 is set to an open state by the valve opening / closing mechanism 80. This forms a gas flow path from the internal space 3 through the flow path 54 to the vacuum pump 52.

[0031] Next, the gas in the internal space 3 is discharged by the vacuum pump 52 until the pressure in the internal space 3 reaches the target pressure. The target pressure is, for example, 1×10 -2 The pressure is about 10 Pa or less. The container 2 is rotated around the axis CX by the rotation mechanism 53, while the silicon clathrate in the container 10 is heated by the heating unit 6 until it reaches the target temperature. By rotating, the silicon clathrate is stirred, and all of the silicon clathrate can be heated evenly. The target temperature is, for example, about 430°C. The target pressure and target temperature are set based on the characteristics of the vapor pressure of Na. For example, the vapor pressure of Na at a temperature of 200°C is 1×10 -2The pressure in the internal space 3 is set to the target pressure, and the temperature of the container 10 is set to the target temperature, so that Na remaining in the silicon clathrate volatilizes.

[0032] Furthermore, the temperature of the tubular section 20 is adjusted to a target temperature by cooling by the cooling section 7. The target temperature is, for example, about 100°C or higher and 200°C or lower. The target temperature is set so that the temperatures of the first trap section 30 and the second trap section 40 are low enough that Na is trapped in the first trap section 30 and the second trap section 40. In this disclosure, "trapping" refers to Na, which is a gas, coming into contact with the first trap section 30 or the second trap section 40, which has a low temperature, solidifying, and adhering to the first trap section 30 or the second trap section 40. In other words, the target temperature is set based on the freezing point of Na.

[0033] Here, the pressure in the internal space 3 of the storage unit 2 is low enough that gas molecules exhibit molecular flow behavior. Therefore, the proportion of Na vaporized and generated in the gaseous Na that reaches the vacuum pump 52 is smaller than in the case of viscous flow. Even if a trap unit is located in a position that allows sufficient recovery of Na when viscous flow occurs, Na may not be sufficiently recovered when molecular flow occurs. The inventors discovered that by positioning the trap unit close to the silicon clathrate, Na can be sufficiently recovered even when molecular flow occurs. Specifically, in the firing apparatus 1, the first trap unit 30 and the second trap unit 40 are located in the same space as the internal space 3 that accommodates the silicon clathrate. This allows Na vaporized from the silicon clathrate to be trapped by the first trap unit 30 or the second trap unit 40, which are located close to each other. This improves the recovery rate of Na.

[0034] In the firing apparatus 1, the distance between the first trap section 30 and the second trap section 40 and the silicon clathrate is shortened, and therefore the distance between the heating section 6 for heating the silicon clathrate and the first trap section 30 and the second trap section 40 is also shortened. Therefore, in this embodiment, the wall section 91 is provided. This suppresses the temperature rise of the first trap section 30 and the second trap section 40 caused by the heating section 6, and allows efficient cooling by the cooling section 7.

[0035] After the desorption of Na from the silicon clathrate in the second step S2 is completed, the gas in the internal space 3 is replaced with an inert gas such as Ar (argon) in the third step S3. Next, the push rod 84 of the valve opening / closing mechanism 80 is controlled to move away from the valve element 24, thereby setting the valve 22 in a closed state. In this embodiment, the volatile material to be recovered is Na, which is highly reactive. Therefore, when Na is exposed to the atmosphere, it reacts with substances in the atmosphere and easily becomes a compound. Therefore, by replacing the internal space 3 with an inert gas and then closing the valve 22, Na can be avoided from being exposed to the atmosphere and Na can be recovered as a pure substance.

[0036] In a fourth step S4, the container 2 is removed from the equipment 5. The removed container 2 is carried to a glove box. Then, Na is recovered in the glove box. In this way, expensive Na can be recovered and Na, which is a pure substance, can be recycled.

[0037] According to the embodiment described above, the calcination apparatus 1 includes the storage unit 2 having the internal space 3, the equipment 5 for detachably mounting the storage unit 2, a vacuum pump 52, a first trap unit 30, a second trap unit 40, a heating unit 6, and a cooling unit 7. The silicon clathrate containing Na contained in the storage unit 2 is heated by the heating unit 6 in the internal space 3, which has a high degree of vacuum, thereby releasing Na. The released Na is trapped by the first trap unit 30 or the second trap unit 40, which is cooled by the cooling unit 7. The first trap unit 30 and the second trap unit 40 are arranged in the same space as the internal space 3 in which the silicon clathrate is contained. Therefore, the volatilized Na can be efficiently trapped by the first trap unit 30 and the second trap unit 40. The recovery rate of Na can be improved even when the internal space 3 is a vacuum, which is a molecular flow region.

[0038] Furthermore, the storage unit 2 has a valve 22 that opens and closes the opening 2a of the internal space 3. As a result, by closing the valve 22 and removing the storage unit 2 from the equipment 5, it is possible to transport the storage unit 2 without exposing the internal space 3 to the atmosphere.

[0039] The firing device 1 also includes a wall 91 that blocks electromagnetic waves and is disposed between the heating unit 6 and the first trapping unit 30. This allows the silicon clathrate in the second internal space 3B to be heated while suppressing a temperature rise in the first trapping unit 30. Therefore, in the firing device 1 in which the silicon clathrate and the first trapping unit 30 are placed close to each other, it is possible to both heat the silicon clathrate and cool the first trapping unit 30.

[0040] The second trap section 40 has a plurality of annular parts 41, which are arranged at intervals from one another. When the second trap section 40 is viewed along the axis CX, the extending portion 41c of one annular part 41 of the plurality of annular parts 41 is arranged so as not to overlap with the extending portion 41c of an adjacent annular part 41. This increases the probability that gaseous Na reaches the second trap section 40, thereby improving the recovery rate of Na.

[0041] B. Other embodiments of the wall section and other embodiments of the cooling section: 6 is a diagram illustrating an embodiment (B1) that is another embodiment of the wall portion 91 and an embodiment (B2) that is another embodiment of the cooling portion 7. The same components as those in the above embodiments are given the same reference numerals, and detailed descriptions thereof will be omitted as appropriate.

[0042] (B1) Other embodiments of the wall: As shown in "B1" in FIG. 6, in this embodiment, a pipe 58 and a wall 291 are provided as the wall. The pipe 58 has a cylindrical shape that houses the first trap section 30. The wall 291 in this embodiment is located near the boundary between the tubular section 20 and the container 10. The wall 291 has a disk shape with a through-hole formed in the center, through which the container neck section 10b is inserted. The wall 291 is located approximately perpendicular to the axis CX. As in the above embodiment, the pipe 58 and the wall 291 in this embodiment are also formed of a material that reflects electromagnetic waves emitted from the lamp heater 64. The pipe 58 and the wall 291 in this embodiment can also prevent electromagnetic waves from being irradiated to the first trap section 30 and the second trap section 40.

[0043] (B2) Other embodiments of the cooling unit: As shown in "B2" in FIG. 6, in this embodiment, a plurality of heat pipes 271 are provided as the cooling section. The plurality of heat pipes 271 are arranged around the first trap section 30 at equal intervals in the circumferential direction. The number of heat pipes 271 is, for example, 12. Each heat pipe 271 is rod-shaped and arranged so that its longitudinal axis is parallel to the axis CX. Specifically, the plurality of heat pipes 271 are fixed by being inserted into a metal plate 272 having a plurality of through holes formed therein for inserting the plurality of heat pipes 271. Note that an O-ring that tightly fits the outer periphery of the heat pipe 271 may be provided inside each through hole of the metal plate 272. The working fluid inside the heat pipe 271 circulates between a high-temperature section located in the second internal space 3B and a low-temperature section located in the first internal space 3A, thereby transferring heat from the high-temperature section to the low-temperature section, thereby cooling the first trap section 30.

[0044] C. Other Embodiments: (C1) The cooling unit 7 in the above embodiment performs air-cooling. The cooling method of the cooling unit 7 may be water-cooling instead of air-cooling. Specifically, a water channel may be formed on the outer periphery of the outer cylindrical portion 21, and a coolant may be flowed through this water channel to cool the cylindrical portion 20. The cooling unit 7 may also be configured to perform both air-cooling and water-cooling. Furthermore, as shown in another embodiment (B2), the cooling unit 7 may be configured to perform a combination of at least two of cooling by the heat pipe 271, air-cooling, and water-cooling. The equipment 5 may also be equipped with a cooling unit for cooling the flow path 54. This can improve the cooling capacity.

[0045] (C2) In the above embodiment, the calcination apparatus 1 includes two trap sections: the first trap section 30 and the second trap section 40. In another embodiment, the calcination apparatus 1 may include either the first trap section 30 or the second trap section 40. By including either one of these, Na can be recovered in a recyclable manner. In a configuration including two trap sections, the first trap section 30 and the second trap section 40, as in the above embodiment, volatiles that were not completely recovered by the first trap section 30 can be recovered by the second trap section 40. This prevents Na from reaching the vacuum pump 52, thereby protecting the vacuum pump 52. Furthermore, in a configuration in which the calcination apparatus 1 does not include the first trap section 30 disposed in the container 10 but includes the second trap section 40 disposed in the tubular section 20, the recovery of guest-free clathrate in the container 10 and the recovery of Na in the tubular section 20 can be performed separately, improving work efficiency. In this case, a valve may be provided at the axial end of the cylindrical portion 20 where no valve 22 is provided. By closing the two valves at both ends of the cylindrical portion 20, Na can be sealed.

[0046] (C3) In the above embodiment, the first trap section 30 is cylindrical, and the second trap section 40 has a structure including a plurality of annular parts 41. The shapes of the trap sections are not limited to the above combination. Specifically, for example, the trap section disposed in the vessel 10 and the trap section disposed in the tubular section 20 may have the same shape and structure, or the trap section disposed in the vessel 10 may have a structure including a plurality of annular parts 41, and the trap section disposed in the tubular section 20 may be cylindrical. Furthermore, the shapes of the trap sections are not limited to the above. Guests can be trapped by setting the trap section below the freezing point.

[0047] (C4) In the above embodiment, the storage unit 2 includes the container 10 and the cylindrical portion 20. In another embodiment, the storage unit 2 may include only the container 10, without including the cylindrical portion 20. Even when the cylindrical portion 20 is not included, volatiles can be trapped by disposing a trap unit in the container 10 and cooling the trap unit. Note that, when the storage unit 2 includes the cylindrical portion 20 as in the above embodiment, the cylindrical portion 20 can be efficiently cooled by disposing the cooling unit 7 around the cylindrical portion 20, as described above.

[0048] (C5) The wall portion 91 in the above embodiment reflects electromagnetic waves. As another embodiment of the wall portion 91, the wall portion 91 may block electromagnetic waves by absorbing the electromagnetic waves.

[0049] (C6) In the manufacturing method of the above embodiment, a silicon clathrate in which no voids are formed is manufactured. As another manufacturing method, a method may be used in which a process is added to form voids in the silicon clathrate, which are spaces different from the spaces into which the guest enters. Furthermore, the guest is not limited to Na. Furthermore, the manufacturing method of the silicon clathrate is not limited to the above. Furthermore, the target object is not limited to silicon clathrate, and the firing apparatus 1 can be used in the process of volatilizing and recovering volatiles from the target object.

[0050] The present disclosure is not limited to the above-described embodiments and can be realized in various configurations without departing from the spirit thereof. For example, the technical features of the embodiments corresponding to the technical features in each aspect described in the Summary of the Invention section can be appropriately replaced or combined to solve some or all of the above-described problems or achieve some or all of the above-described effects. Furthermore, if a technical feature is not described as essential in this specification, it can be appropriately deleted. [Explanation of symbols]

[0051] 1...baking device, 2...accommodation section, 2a...opening, 3...internal space, 3A...first internal space, 3B...second internal space, 5...equipment, 6...heating section, 7...cooling section, 10...container, 10a...container body, 10b...container neck, 20...tubular section, 21...outer tubular section, 21a...cooling fin, 22...valve, 23...valve seat section, 24...valve body, 25...biasing member, 26...seat section, 30...first trap section, 31...through hole, 40...second trap section, 41...annular part, 41a...through hole Hole, 41b...outer periphery, 41c...extension portion, 41d...inner periphery, 42...fixed portion, 52...vacuum pump, 53...rotation mechanism, 54...flow path, 58...pipe, 64...lamp heater, 66...reflector, 71...cooling unit, 72...outer wall, 73...inlet pipe, 74...partition wall, 80...valve opening / closing mechanism, 81...motor, 82...camshaft, 83...cam, 84...push rod, 91, 291...wall portion, 271...heat pipe, 272...metal plate

Claims

1. A baking device, a storage section having an internal space for storing an object; equipment to which the storage unit is detachably attached and having a flow path communicating with the internal space; a pump connected to the flow path and configured to discharge gas from the internal space; a trap portion disposed in the internal space for trapping volatiles volatilized from the object; a heating unit for heating the object; a cooling unit for cooling the trap unit.

2. The baking device according to claim 1, The baking apparatus, wherein the accommodation section has a valve that opens and closes an opening of the internal space.

3. The baking device according to claim 2, the storage section includes a cylindrical section having the opening and a container detachably connected to the cylindrical section, the internal space includes a first internal space of the cylindrical portion and a second internal space of the container, The object is accommodated in the second internal space, the heating unit is disposed around the container and heats the object by radiating electromagnetic waves; The baking apparatus includes a wall portion disposed between the heating portion and the trap portion, the wall portion preventing the electromagnetic waves from being irradiated onto the trap portion.

4. The baking device according to claim 3, the trap portion is disposed in the first internal space, The baking device, wherein the cooling section is arranged around the cylindrical section.

5. The baking device according to any one of claims 1 to 4, The trap portion has a plurality of annular parts, Each of the plurality of annular components has an outer periphery and an extension disposed between the outer periphery and its axis; the plurality of annular parts are arranged at intervals from one another so that their axes are coaxial with the axis of the trap portion; A baking device in which, when the trap portion is viewed along the axis, the extension portion of one of the plurality of circular ring components does not overlap with the extension portion of an adjacent circular ring component.

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